JP2002083808A5 - - Google Patents

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Publication number
JP2002083808A5
JP2002083808A5 JP2001196819A JP2001196819A JP2002083808A5 JP 2002083808 A5 JP2002083808 A5 JP 2002083808A5 JP 2001196819 A JP2001196819 A JP 2001196819A JP 2001196819 A JP2001196819 A JP 2001196819A JP 2002083808 A5 JP2002083808 A5 JP 2002083808A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2001196819A
Other languages
Japanese (ja)
Other versions
JP2002083808A (ja
Filing date
Publication date
Application filed filed Critical
Publication of JP2002083808A publication Critical patent/JP2002083808A/ja
Publication of JP2002083808A5 publication Critical patent/JP2002083808A5/ja
Withdrawn legal-status Critical Current

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JP2001196819A 2000-06-28 2001-06-28 溶剤プリウェットを用いたコーティング・プロセス Withdrawn JP2002083808A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US60545400A 2000-06-28 2000-06-28
US09/605454 2000-06-28

Publications (2)

Publication Number Publication Date
JP2002083808A JP2002083808A (ja) 2002-03-22
JP2002083808A5 true JP2002083808A5 (https=) 2008-05-08

Family

ID=24423722

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001196819A Withdrawn JP2002083808A (ja) 2000-06-28 2001-06-28 溶剤プリウェットを用いたコーティング・プロセス

Country Status (1)

Country Link
JP (1) JP2002083808A (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7605907B2 (en) 2007-03-27 2009-10-20 Asml Netherlands B.V. Method of forming a substrate for use in calibrating a metrology tool, calibration substrate and metrology tool calibration method

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2901211B2 (ja) * 1991-09-24 1999-06-07 松下電子工業株式会社 半導体装置の製造方法
JPH05243140A (ja) * 1992-02-27 1993-09-21 Fujitsu Ltd 回転塗布装置及び回転塗布方法
JPH05310933A (ja) * 1992-05-13 1993-11-22 Toshiba Corp 溶媒可溶性ポリイミドの製造方法
JPH08330296A (ja) * 1995-05-31 1996-12-13 Sanyo Electric Co Ltd 半導体装置の製造方法

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