JP2002060926A5 - Method for manufacturing light emitting device - Google Patents
Method for manufacturing light emitting device Download PDFInfo
- Publication number
- JP2002060926A5 JP2002060926A5 JP2001128812A JP2001128812A JP2002060926A5 JP 2002060926 A5 JP2002060926 A5 JP 2002060926A5 JP 2001128812 A JP2001128812 A JP 2001128812A JP 2001128812 A JP2001128812 A JP 2001128812A JP 2002060926 A5 JP2002060926 A5 JP 2002060926A5
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- JP
- Japan
- Prior art keywords
- emitting device
- light emitting
- manufacturing light
- manufacturing
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Description
【特許請求の範囲】
【請求項1】
成膜室に設けられた基板に有機EL材料を蒸着し、前記成膜室より前記基板を取り出した後、
前記成膜室に設けられた部品に対して赤外光、紫外光もしくは可視光を照射することにより該部品に付着した蒸着材料を昇華させ、排気することを特徴とする発光装置の作製方法。
【請求項2】
請求項1において、前記蒸着材料を昇華させる際、前記成膜室内にハロゲン族元素を含むガスを流すことを特徴とする発光装置の作製方法。
【請求項3】
請求項1又は請求項2において、前記昇華された蒸着材料は排気中にプラズマに晒されることを特徴とする発光装置の作製方法。
【請求項4】
請求項3において、前記プラズマは酸素プラズマであることを特徴とする発光装置の作製方法。
[Claims]
(1)
After depositing an organic EL material on a substrate provided in a film formation chamber and taking out the substrate from the film formation chamber,
A method for manufacturing a light-emitting device, wherein a component provided in the film formation chamber is irradiated with infrared light, ultraviolet light, or visible light to sublimate a vapor deposition material attached to the component and exhaust the material.
(2)
2. The method for manufacturing a light-emitting device according to claim 1, wherein a gas containing a halogen group element is flowed into the film formation chamber when the deposition material is sublimated.
(3)
3. The method for manufacturing a light-emitting device according to claim 1, wherein the sublimated deposition material is exposed to plasma in an exhaust gas.
(4)
4. The method according to claim 3, wherein the plasma is oxygen plasma.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001128812A JP4785269B2 (en) | 2000-05-02 | 2001-04-26 | Manufacturing method of light emitting device and cleaning method of film forming device |
Applications Claiming Priority (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000133221 | 2000-05-02 | ||
JP2000133229 | 2000-05-02 | ||
JP2000-133229 | 2000-05-02 | ||
JP2000133229 | 2000-05-02 | ||
JP2000133221 | 2000-05-02 | ||
JP2000-133221 | 2000-05-02 | ||
JP2001128812A JP4785269B2 (en) | 2000-05-02 | 2001-04-26 | Manufacturing method of light emitting device and cleaning method of film forming device |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011114537A Division JP4890654B2 (en) | 2000-05-02 | 2011-05-23 | Manufacturing method of light emitting device and cleaning method of film forming device |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2002060926A JP2002060926A (en) | 2002-02-28 |
JP2002060926A5 true JP2002060926A5 (en) | 2008-05-01 |
JP4785269B2 JP4785269B2 (en) | 2011-10-05 |
Family
ID=27343302
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001128812A Expired - Fee Related JP4785269B2 (en) | 2000-05-02 | 2001-04-26 | Manufacturing method of light emitting device and cleaning method of film forming device |
Country Status (1)
Country | Link |
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JP (1) | JP4785269B2 (en) |
Families Citing this family (29)
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SG149680A1 (en) | 2001-12-12 | 2009-02-27 | Semiconductor Energy Lab | Film formation apparatus and film formation method and cleaning method |
JP2004006311A (en) * | 2002-04-15 | 2004-01-08 | Semiconductor Energy Lab Co Ltd | Method and apparatus for manufacturing light-emitting device |
US7309269B2 (en) | 2002-04-15 | 2007-12-18 | Semiconductor Energy Laboratory Co., Ltd. | Method of fabricating light-emitting device and apparatus for manufacturing light-emitting device |
TWI336905B (en) * | 2002-05-17 | 2011-02-01 | Semiconductor Energy Lab | Evaporation method, evaporation device and method of fabricating light emitting device |
DE60305246T2 (en) * | 2002-07-19 | 2006-09-14 | Lg Electronics Inc. | Thermal PVD coating source for organic electroluminescent layers |
US20040040504A1 (en) | 2002-08-01 | 2004-03-04 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing apparatus |
TWI277363B (en) | 2002-08-30 | 2007-03-21 | Semiconductor Energy Lab | Fabrication system, light-emitting device and fabricating method of organic compound-containing layer |
JP4515060B2 (en) * | 2002-08-30 | 2010-07-28 | 株式会社半導体エネルギー研究所 | Manufacturing apparatus and method for producing layer containing organic compound |
KR101006938B1 (en) * | 2002-09-20 | 2011-01-10 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | Fabrication system and manufacturing method of light emitting device |
US7211461B2 (en) | 2003-02-14 | 2007-05-01 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing apparatus |
US7091453B2 (en) | 2003-02-27 | 2006-08-15 | Dainippon Screen Mfg. Co., Ltd. | Heat treatment apparatus by means of light irradiation |
JP4493926B2 (en) | 2003-04-25 | 2010-06-30 | 株式会社半導体エネルギー研究所 | Manufacturing equipment |
US7211454B2 (en) | 2003-07-25 | 2007-05-01 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing method of a light emitting device including moving the source of the vapor deposition parallel to the substrate |
JP5264013B2 (en) * | 2004-08-13 | 2013-08-14 | 株式会社半導体エネルギー研究所 | Organic semiconductor layer deposition system |
WO2006016669A1 (en) | 2004-08-13 | 2006-02-16 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing semiconductor device |
KR100965408B1 (en) * | 2004-12-02 | 2010-06-24 | 엘아이지에이디피 주식회사 | Apparatus for depositing organic and inorganic material of oled |
JP4827842B2 (en) * | 2005-06-15 | 2011-11-30 | 株式会社アルバック | Sealing apparatus and sealing method |
KR20070043541A (en) * | 2005-10-21 | 2007-04-25 | 삼성에스디아이 주식회사 | Apparatus of thin film evaporation and method for thin film evaporation using the same |
KR100727470B1 (en) * | 2005-11-07 | 2007-06-13 | 세메스 주식회사 | Apparatus and method for deposition organic compounds |
KR100842183B1 (en) * | 2006-12-29 | 2008-06-30 | 두산메카텍 주식회사 | Vapordeposition source scaning appauatus |
JP2009167020A (en) * | 2008-01-10 | 2009-07-30 | Hitachi Maxell Ltd | Method for cleaning member to be cleaned and method for manufacturing optical element |
US8409672B2 (en) | 2008-04-24 | 2013-04-02 | Semiconductor Energy Laboratory Co., Ltd. | Method of manufacturing evaporation donor substrate and method of manufacturing light-emitting device |
WO2012053532A1 (en) * | 2010-10-20 | 2012-04-26 | 株式会社アルバック | Apparatus for organic film formation and method for organic film formation |
JP5875851B2 (en) * | 2011-12-20 | 2016-03-02 | 株式会社アルバック | Thin film manufacturing method, thin film manufacturing apparatus |
WO2018077388A1 (en) * | 2016-10-25 | 2018-05-03 | Applied Materials, Inc. | Measurement assembly for measuring a deposition rate, evaporation source, deposition apparatus, and method therefor |
JP2017036512A (en) * | 2016-11-07 | 2017-02-16 | 株式会社半導体エネルギー研究所 | Deposition device |
JP6387198B1 (en) * | 2017-04-14 | 2018-09-05 | 堺ディスプレイプロダクト株式会社 | Manufacturing method and manufacturing apparatus for organic EL display device |
CN113227436A (en) * | 2018-12-21 | 2021-08-06 | 应用材料公司 | Vapor deposition apparatus and method for coating a substrate in a vacuum chamber |
CN115584475B (en) * | 2022-10-28 | 2024-06-07 | 富联科技(兰考)有限公司 | Method for cleaning coating equipment and coating equipment |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4059946B2 (en) * | 1996-12-06 | 2008-03-12 | 株式会社アルバック | Organic thin film forming apparatus and organic material recycling method |
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2001
- 2001-04-26 JP JP2001128812A patent/JP4785269B2/en not_active Expired - Fee Related
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