JP2002057137A5 - - Google Patents

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Publication number
JP2002057137A5
JP2002057137A5 JP2000242905A JP2000242905A JP2002057137A5 JP 2002057137 A5 JP2002057137 A5 JP 2002057137A5 JP 2000242905 A JP2000242905 A JP 2000242905A JP 2000242905 A JP2000242905 A JP 2000242905A JP 2002057137 A5 JP2002057137 A5 JP 2002057137A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2000242905A
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Japanese (ja)
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JP3961749B2 (ja
JP2002057137A (ja
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Publication date
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Priority to JP2000242905A priority Critical patent/JP3961749B2/ja
Priority claimed from JP2000242905A external-priority patent/JP3961749B2/ja
Priority to US09/915,289 priority patent/US6616512B2/en
Publication of JP2002057137A publication Critical patent/JP2002057137A/ja
Publication of JP2002057137A5 publication Critical patent/JP2002057137A5/ja
Application granted granted Critical
Publication of JP3961749B2 publication Critical patent/JP3961749B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2000242905A 2000-07-28 2000-08-10 基板洗浄装置及び基板処理装置、基板処理方法 Expired - Lifetime JP3961749B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2000242905A JP3961749B2 (ja) 2000-08-10 2000-08-10 基板洗浄装置及び基板処理装置、基板処理方法
US09/915,289 US6616512B2 (en) 2000-07-28 2001-07-27 Substrate cleaning apparatus and substrate polishing apparatus with substrate cleaning apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000242905A JP3961749B2 (ja) 2000-08-10 2000-08-10 基板洗浄装置及び基板処理装置、基板処理方法

Publications (3)

Publication Number Publication Date
JP2002057137A JP2002057137A (ja) 2002-02-22
JP2002057137A5 true JP2002057137A5 (enrdf_load_stackoverflow) 2005-08-04
JP3961749B2 JP3961749B2 (ja) 2007-08-22

Family

ID=18733846

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000242905A Expired - Lifetime JP3961749B2 (ja) 2000-07-28 2000-08-10 基板洗浄装置及び基板処理装置、基板処理方法

Country Status (1)

Country Link
JP (1) JP3961749B2 (enrdf_load_stackoverflow)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100423206C (zh) * 2003-07-02 2008-10-01 上海思恩电子技术有限公司 用加热化学气体产生的雾状化学剂处理基片的方法及系统
JP4733616B2 (ja) * 2006-11-01 2011-07-27 積水化学工業株式会社 表面処理装置
JP5844681B2 (ja) * 2011-07-06 2016-01-20 東京エレクトロン株式会社 基板液処理装置及び基板液処理方法
CN102989736B (zh) * 2012-11-26 2015-03-18 北京七星华创电子股份有限公司 一种排风装置
JP6338275B2 (ja) * 2014-06-27 2018-06-06 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法および基板処理装置
CN110587471B (zh) * 2019-10-22 2021-08-27 武汉新芯集成电路制造有限公司 一种自清洁防护罩
CN112005890B (zh) * 2020-09-14 2022-04-15 王芝林 一种生态养猪场用室内水帘风机降温系统
JP7527729B2 (ja) * 2020-11-16 2024-08-05 株式会社ディスコ 加工装置
CN118500062B (zh) * 2024-07-18 2024-10-01 常州市星干干燥设备有限公司 一种pfa氟树脂粉末干燥设备

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