JP2002038291A - Anode for manufacturing metallic foil - Google Patents

Anode for manufacturing metallic foil

Info

Publication number
JP2002038291A
JP2002038291A JP2001265606A JP2001265606A JP2002038291A JP 2002038291 A JP2002038291 A JP 2002038291A JP 2001265606 A JP2001265606 A JP 2001265606A JP 2001265606 A JP2001265606 A JP 2001265606A JP 2002038291 A JP2002038291 A JP 2002038291A
Authority
JP
Japan
Prior art keywords
electrode
anode
metal foil
piece
conductive spacer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001265606A
Other languages
Japanese (ja)
Inventor
Hirokatsu Shimizu
宏勝 清水
Ryuichi Otogawa
隆一 音川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Osaka Soda Co Ltd
Original Assignee
Daiso Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daiso Co Ltd filed Critical Daiso Co Ltd
Priority to JP2001265606A priority Critical patent/JP2002038291A/en
Publication of JP2002038291A publication Critical patent/JP2002038291A/en
Pending legal-status Critical Current

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  • Electroplating Methods And Accessories (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide an anode for manufacturing a metal foil, which improves a production efficiency and a product quality of the metal foil, because the anode can be partially or totally repaired or exchanged easily, when the electrode has partially deteriorated or has come to an end of the life, and because a high current can be applied by means of preventing a concentration of the current, since a current obstructed part due to an attaching jig of an electrode piece to an electrode base is not generated. SOLUTION: The anode for manufacturing metal foil comprises several pieces of electrode 6 consisting of rectangular, thin metal sheet with a same or shorter length as a width of the electrode base 5, which are arranged in parallel at an inner face of the electrode base with an arc-shaped cross section and releasably attached to the electrode base. An electro-conductive spacer 9 made from thin metal sheet is placed between the electrode base and each piece of electrode. An electro-conductive spacer and the electrode base are tightened with at least one stud bolt 7 which is integrated to the piece of electrode and a nut 8 threadedly engaged to the bolt.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、円筒形の回転陰極とこ
れの外側に対向状に配された断面円弧状の陽極を備え、
両電極間に通電することにより、回転する陰極表面に金
属を電解析出させ、この金属析出層を陰極表面から連続
的に剥離して金属箔を製造する金属箔製造装置に関し、
より詳しくは同装置の主構成要素である陽極の改良に関
するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention comprises a cylindrical rotating cathode and an anode having an arcuate cross-section disposed outside the rotating cathode.
By applying a current between both electrodes, a metal is electrolytically deposited on the rotating cathode surface, and a metal foil manufacturing apparatus for manufacturing a metal foil by continuously peeling off the metal deposition layer from the cathode surface.
More specifically, the present invention relates to improvement of an anode which is a main component of the apparatus.

【0002】[0002]

【従来の技術】プリント配線基板等に用いる銅箔を電着
法で製造するには、通常、上記構成の金属箔製造装置に
おいて、回転する陰極表面に銅を電解析出させ、この銅
析出層を陰極表面から連続的に引き剥がして、銅箔とし
て巻き取る方法が広く用いられている。
2. Description of the Related Art In order to produce a copper foil used for a printed wiring board or the like by an electrodeposition method, copper is generally electrolytically deposited on the surface of a rotating cathode in a metal foil producing apparatus having the above-mentioned structure. Has been widely used, which is continuously peeled off from the cathode surface and wound up as a copper foil.

【0003】この銅箔電解製造装置の主構成要素である
陽極としては、従来から、鉛または鉛合金製のものが使
用されて来たが、鉛電極は比較的消耗が速く、溶け出し
た鉛による電解液の汚染、製品品質の低下等の問題があ
るため、最近、これに代わって、断面円弧状の電極板上
に貴金属酸化物からなる電極活性被覆層を設けた不溶性
陽極が種々提案されている。
[0003] As the anode, which is a main component of the copper foil electrolytic manufacturing apparatus, those made of lead or a lead alloy have conventionally been used. Recently, various insoluble anodes having an electrode active coating layer made of a noble metal oxide on an electrode plate having an arc-shaped cross section have been proposed instead. ing.

【0004】[0004]

【発明が解決しようとする課題】近年、プリント回路基
板の高密度化に伴い、より薄く、より均一な厚さの銅箔
が求められるようになって来ている。上述のような不溶
性陽極の採用により、電解液の汚染、製品品質の低下等
の問題はある程度改善されたが、不溶性陽極を用いた場
合でも、電極活性被覆層の局部的な消耗のためその補修
が必要となる。しかし電極板は断面円弧状の一体物であ
るため、消耗部を補修するには電極板全体を取り替えな
ければならず、作業効率の上で問題がある。
In recent years, as the density of printed circuit boards has increased, thinner and more uniform copper foils have been required. The use of the insoluble anode as described above has alleviated problems such as contamination of the electrolytic solution and deterioration of product quality.However, even when an insoluble anode is used, it is repaired due to local consumption of the electrode active coating layer. Is required. However, since the electrode plate is a unitary member having an arc-shaped cross section, it is necessary to replace the entire electrode plate in order to repair the consumable part, and there is a problem in work efficiency.

【0005】この問題を解決するために、特開平5−2
02498号公報では、断面円弧状の電極基体の内面に
金属薄板製の複数枚の不溶性電極片を円弧方向に横並び
状に配置し、ねじ等の治具で着脱自在に固着してなる不
溶性陽極が提案されている。この陽極では、消耗部の補
修の際は、電極片を取り外して容易にこれを再活性化す
ることができるが、電極片の厚さは2mm以下と非常に
薄いため、消耗した電極活性被覆層を剥離する作業が困
難となる。また、電極基体と電極片の通電を良好に保つ
ために数多くのねじが必要となり、電極片の着脱に手間
がかかるばかりでなく、ねじ部分は通電不能であるため
通電斑を生じる原因となるなどの問題がある。
In order to solve this problem, Japanese Patent Laid-Open Publication No.
In Japanese Patent Application Publication No. 02498, an insoluble anode formed by arranging a plurality of insoluble electrode pieces made of a thin metal plate side by side in an arc direction on the inner surface of an electrode substrate having an arc-shaped cross section and removably fixed with a jig such as a screw. Proposed. With this anode, when repairing a consumable part, the electrode piece can be removed and easily reactivated, but the thickness of the electrode piece is very thin, 2 mm or less, so the exhausted electrode active coating layer The operation of peeling off becomes difficult. In addition, a large number of screws are required to maintain good conduction between the electrode base and the electrode pieces, which not only takes time and effort to attach and detach the electrode pieces, but also causes the occurrence of spots due to the fact that the screw parts are not energized. There is a problem.

【0006】特開平6−346270号公報では、断面
円弧状の電極基体の内面に金属薄板製の複数枚の不溶性
電極短片を円弧方向および幅方向に隙間なく隣接配置し
た電極が提案されている。この構成では、電極短片を電
極基体に固定するのに電極短片に一体化したボルトを電
極基体の貫通孔に通しナットで締め付けるが、電流はボ
ルトのみを通して流れるため未通電部が生じ、通電面積
が限定される。また、ボルトとナットの締め付けによる
電極短片の変形を防ぐため、電極短片と電極基体の間に
絶縁性のゴムを挿入することが提案されているが、通電
に伴う発熱により、ゴムが劣化する可能性が大きい。
Japanese Patent Application Laid-Open No. 6-346270 proposes an electrode in which a plurality of insoluble electrode short pieces made of a thin metal plate are arranged adjacent to each other on the inner surface of an electrode base having an arc-shaped cross section without any gap in the arc direction and width direction. In this configuration, a bolt integrated with the electrode short piece is passed through the through-hole of the electrode base and fastened with a nut to fix the electrode short piece to the electrode base. Limited. In addition, in order to prevent the deformation of the electrode short piece due to the tightening of the bolt and the nut, it has been proposed to insert an insulating rubber between the electrode short piece and the electrode base. Great nature.

【0007】[0007]

【課題を解決するための手段】本発明は、上記従来技術
の諸問題を解決すべく工夫されたものであって、断面円
弧状の電極基体の内面に、同基体の幅に等しいかまたは
それ以下の長さを有する短冊状の金属薄板製の複数枚の
電極片を並列状に配置して電極基体に着脱自在に固着し
てなる陽極において、電極基体と各電極片の間に金属薄
板製の導電性スペーサを介在させ、電極片に一体化した
少なくとも1本のスタッドボルトとこれに螺合するナッ
トで導電性スペーサーと電極基体を締め付けてなること
を特徴とする金属箔製造用陽極である。
SUMMARY OF THE INVENTION The present invention has been devised in order to solve the above-mentioned problems of the prior art, and has an inner surface of an electrode substrate having an arc-shaped cross section and having a width equal to or less than the width of the substrate. In an anode in which a plurality of strip-shaped sheet metal pieces having the following lengths are arranged in parallel and removably fixed to the electrode base, a metal sheet formed between the electrode base and each electrode piece. A conductive spacer and an electrode base are fastened by at least one stud bolt integrated with the electrode piece and a nut screwed to the stud bolt, the conductive spacer and the electrode base being interposed. .

【0008】本発明による金属箔製造用陽極において、
電極片および/または導電性スペーサは、白金族金属ま
たは白金族金属酸化物を含む電極活性物質被覆層が被着
されたものである。
In the anode for producing a metal foil according to the present invention,
The electrode piece and / or the conductive spacer is provided with an electrode active material coating layer containing a platinum group metal or a platinum group metal oxide.

【0009】導電性スペーサーの厚さは、0.2〜6m
mであってよく、好ましくは0.3〜3mm、より好ま
しくは0.5〜2mmである。
The thickness of the conductive spacer is 0.2 to 6 m.
m, preferably 0.3 to 3 mm, more preferably 0.5 to 2 mm.

【0010】導電性スペーサーの材質は、白金、チタ
ン、タンタル、ニオブ、ジルコニウムまたはこれらのい
ずれかを主体とする合金であってよい。
[0010] The material of the conductive spacer may be platinum, titanium, tantalum, niobium, zirconium or an alloy mainly composed of any of these.

【0011】電極活性物質は、好ましくは、金属換算で
イリジウムを60〜95重量%、タンタルを40〜5重
量%含有する、酸化イリジウムと酸化タンタルの混合物
からなる。
The electrode active material preferably comprises a mixture of iridium oxide and tantalum oxide containing 60 to 95% by weight of iridium and 40 to 5% by weight of tantalum in terms of metal.

【0012】電極片および/または導電性スペーサは、
表面に厚さ0.5〜15μmのタンタルまたはタンタル
合金層を形成した後、更にその上に電極活性物質被覆層
を形成してなるものであってもよい。ここで使用される
タンタル金属はアモルファス、結晶性(α−タンタル、
β−タンタル)のいずれの状態のものであってもよい。
The electrode pieces and / or the conductive spacers
After forming a tantalum or tantalum alloy layer having a thickness of 0.5 to 15 μm on the surface, an electrode active material coating layer may be further formed thereon. The tantalum metal used here is amorphous, crystalline (α-tantalum,
β-tantalum).

【0013】電極片は電極基体の曲率に合わせて湾曲し
ていてもよい。また、電極片は更に複数枚に分割されて
いてもよい。
The electrode piece may be curved in accordance with the curvature of the electrode base. Further, the electrode piece may be further divided into a plurality of pieces.

【0014】電極片および電極基体の材質としては、金
属チタンやチタン−タンタル、チタン−タンタル−ニオ
ブ、チタン−パラジウム等のチタン基合金が好適であ
り、電極片に被覆する電極活性層を形成する物質として
は、イリジウム酸化物またはこれとチタン、タンタル、
ニオブ、タングステン、ジルコニウム等バルブ金属との
混合酸化物が好適である。代表的な例としてはイリジウ
ム−タンタル混合酸化物、イリジウム−チタン混合酸化
物等が挙げられる。この際、金属換算でイリジウムを6
0〜95重量%、タンタルを40〜5重量%含有する、
酸化イリジウムと酸化タンタルの混合酸化物が耐久性に
優れている。電極片の上に厚さ0.5〜15ミクロンの
タンタルまたはタンタル合金層を形成した後、更にその
上に電極活性物質被覆層を形成すれば更に陽極としての
耐久性が向上する。
The material of the electrode piece and the electrode base is preferably a titanium-based alloy such as titanium metal, titanium-tantalum, titanium-tantalum-niobium, and titanium-palladium, and forms an electrode active layer covering the electrode piece. The substance may be iridium oxide or titanium, tantalum,
A mixed oxide with a valve metal such as niobium, tungsten or zirconium is preferred. Representative examples include iridium-tantalum mixed oxide, iridium-titanium mixed oxide, and the like. At this time, iridium is converted to 6
0 to 95% by weight, containing 40 to 5% by weight of tantalum;
A mixed oxide of iridium oxide and tantalum oxide has excellent durability. After forming a tantalum or tantalum alloy layer having a thickness of 0.5 to 15 microns on the electrode piece, and further forming an electrode active material coating layer thereon, the durability as an anode is further improved.

【0015】本発明による陽極は、銅、ニッケルなどの
金属箔を製造するのに好適に用いられる。
The anode according to the present invention is suitably used for producing a metal foil of copper, nickel or the like.

【0016】[0016]

【作用】本発明による金属箔製造用陽極では、断面円弧
状の電極基体の内面に、同基体の幅に等しいかまたはそ
れ以下の長さを有する短冊状の金属薄板製の複数枚の電
極片を円弧方向に横並び状に配置し、電極基体に着脱自
在に固着してあるので、電極が局部的に劣化した場合や
電極が寿命に達した場合、陽極を容易に部分的あるいは
全体的に補修または交換することができる。更に上記短
冊状の電極片を複数枚に分割すれば、電極片の中央部と
端部の劣化の程度に応じて電極片の分割片の交換が可能
となる。
In the anode for producing a metal foil according to the present invention, a plurality of strip-shaped metal sheet electrodes each having a length equal to or less than the width of the electrode base are provided on the inner surface of the electrode base having an arc-shaped cross section. Are arranged side by side in the arc direction and are detachably fixed to the electrode base, so that if the electrode is locally deteriorated or the electrode has reached the end of its service life, the anode can be easily repaired partially or entirely. Or can be replaced. Further, if the strip-shaped electrode piece is divided into a plurality of pieces, the divided pieces of the electrode piece can be exchanged according to the degree of deterioration of the central portion and the end portion of the electrode piece.

【0017】本発明の金属箔製造用陽極において、電極
基体に電極片を取り付けるには、電極基体と各電極片の
間に金属薄板製の導電性スペーサを介在させ、電極片に
一体化した少なくとも1本のスタッドボルトとこれに螺
合するナットで導電性スペーサーと電極基体を締め付け
るため、電極片の電極基体への取り付け冶具による未通
電部は発生せず、通電面積が広くなり、したがって電流
が集中するのを防ぎ、大量の電流を流すことができる。
In the anode for producing a metal foil according to the present invention, in order to attach the electrode piece to the electrode base, at least the metal sheet conductive spacer is interposed between the electrode base and each electrode piece to be integrated with the electrode base. Since the conductive spacer and the electrode base are fastened with one stud bolt and a nut screwed to the stud bolt, no current-carrying portion due to a jig for mounting the electrode piece to the electrode base is not generated, and the current-carrying area is increased, and thus the current is increased. Concentration can be prevented and a large amount of current can flow.

【0018】また、導電性スペーサは金属薄板でできて
いるので、給電部分の焼けつきの恐れがない。
Further, since the conductive spacer is made of a thin metal plate, there is no risk of burning of the power supply portion.

【0019】さらに、通電量に応じた導電性スペーサー
を使うことで、均一かつ安定した通電を確保することが
できる。導電性スペーサの両面に電極活性被覆層を設け
ると、表面の電気伝導性が長時間維持される。
Further, by using a conductive spacer according to the amount of current, uniform and stable current can be secured. When the electrode active coating layers are provided on both surfaces of the conductive spacer, the electric conductivity of the surface is maintained for a long time.

【0020】この結果、金属箔製品をより効率的に得る
ことができ、かつ金属箔製品の品質を向上することがで
きる。
As a result, a metal foil product can be obtained more efficiently, and the quality of the metal foil product can be improved.

【0021】[0021]

【発明の実施の形態】以下に実施例を示し、本発明をさ
らに詳細に説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described in more detail with reference to the following examples.

【0022】実施例1 図1および図2において、金属箔製造装置(1) は、直径
約2000mm、幅1500mmの円筒状の回転陰極
(2) と、これの外側に対向状に配された断面半円弧状の
陽極(3) と、これらを収容する電解槽(10)と、得られた
金属箔を巻き取る巻取器(11)とを主たる構成要素とする
ものである。
Example 1 In FIGS. 1 and 2, a metal foil producing apparatus (1) is a cylindrical rotating cathode having a diameter of about 2000 mm and a width of 1500 mm.
(2), an anode (3) having a semicircular cross section arranged opposite to the outside thereof, an electrolytic cell (10) for accommodating them, and a winder (11) for winding the obtained metal foil. ) As the main components.

【0023】陽極(3) は電解槽(10)内にて電解液中に没
し、円弧中央部にて左右に2分割され、分割部に電解液
流通用のスリット(4) が形成されている。陽極(3) の各
分割部は、厚さ25mmのチタン製の断面四半円弧状の
電極基体(5) の内面に、同基体(5) の幅に等しい長さを
有する短冊状の金属薄板製の複数枚の電極片(6) (長さ
1500mm、幅100mm、厚さ3mm)を、基体の
幅方向に向け、かつ基体の円弧方向に横並び状に配置し
たものである。複数の電極片(6) によって電極基体(5)
の内面全面は覆われている。各電極片(6) はその外面す
なわち電極基体(5) との対向面に溶接で一体化された導
電性金属、チタン製のスタッドボルト(7) と、これに螺
着されたナット(8) とで電極基体(5) に着脱自在に固着
されている。電極片(6) の電解面すなわち内面と陰極
(2) の表面との間隔は10mmである。スタッドボルト
(7) は、各電極片に対して長さ方向に150mm間隔で
9本設置されている。
The anode (3) is immersed in the electrolytic solution in the electrolytic cell (10), is divided into two parts at the center of the arc, and a slit (4) for flowing the electrolytic solution is formed in the divided part. I have. Each divided portion of the anode (3) is made of a strip-shaped thin metal plate having a length equal to the width of the base (5) on the inner surface of a 25 mm-thick titanium electrode base (5) having a quarter-arc cross section. (1500 mm long, 100 mm wide, 3 mm thick) are arranged side by side in the width direction of the base and in the arc direction of the base. Electrode base (5) with multiple electrode pieces (6)
Is entirely covered. Each electrode piece (6) has a stud bolt (7) made of conductive metal or titanium integrated by welding on its outer surface, that is, a surface facing the electrode substrate (5), and a nut (8) screwed to the stud bolt. Thus, it is detachably fixed to the electrode base (5). Electrode surface of electrode piece (6)
The distance from the surface of (2) is 10 mm. Stud
In (7), nine electrodes are provided at 150 mm intervals in the length direction for each electrode piece.

【0024】複数の電極片(6) は下記の電極活性物質の
被覆操作を5回繰り返して作製した酸化イリジウムを活
性物質とする電極である。まず、材料としてのチタン板
を超音波洗浄により脱脂した後、#30のアランダムを
用いて全面に圧力4kgf/cm で約10分間ブラ
スト処理を施し、この処理材料板を流水中で一昼夜洗
い、乾燥した。こうして得られた前処理チタン板の、電
極として使用される面(表面)に、下記に示す液組成の
電極活性物質被覆液を塗布し、これを100℃で10分
間乾燥し、さらに電気炉中で500℃で20分間焼成し
た(電極活性物質被覆層の重量組成比はIr/Ta=7
/3)。
The plurality of electrode pieces (6) are electrodes using iridium oxide as an active substance, which is produced by repeating the following coating operation of an electrode active substance five times. First, a titanium plate as a material is degreased by ultrasonic cleaning, and then blasted at a pressure of 4 kgf / cm 2 for about 10 minutes using an # 30 alundum, and the treated material plate is washed in running water for 24 hours. And dried. An electrode active material coating solution having the following liquid composition was applied to the surface (surface) of the pretreated titanium plate thus obtained, which was used as an electrode, and dried at 100 ° C. for 10 minutes. At 500 ° C. for 20 minutes (the weight composition ratio of the electrode active material coating layer is Ir / Ta = 7).
/ 3).

【0025】 電極活性物質用原料液 TaCl 0.32g H IrCl ・6H O 1.00g 35% HCl 1.0ml n−CH (CH OH 10.0mlThe material liquid TaCl electrode active material 5 0.32g H 2 IrCl 6 · 6H 2 O 1.00g 35% HCl 1.0ml n-CH 3 (CH 2) 3 OH 10.0ml

【0026】電極として使用されない面(裏面)の導電
性スペーサに触れる部分には白金をメッキした。
A portion of the surface (back surface) not used as an electrode, which is in contact with the conductive spacer, was plated with platinum.

【0027】電極基体(5) と各電極片(6) の間には金属
薄板製の導電性スペーサ(9) が介在されている。導電性
スペーサ(9) は中心に直径10mmの孔を有する直径2
5mm、厚さ1mmの円盤状のものであり、中心の孔に
ボルト(7) が挿通されている。
A conductive spacer (9) made of a thin metal plate is interposed between the electrode substrate (5) and each of the electrode pieces (6). The conductive spacer (9) has a diameter of 2 mm with a hole of 10 mm in the center.
It is a disk having a thickness of 5 mm and a thickness of 1 mm, and a bolt (7) is inserted through a central hole.

【0028】導電性スペーサ(9) の両面には白金メッキ
を施した。
Both surfaces of the conductive spacer (9) were plated with platinum.

【0029】上記構成の金属箔製造装置(1) において、
電解液として、硫酸:100g/L、硫酸銅:250g
/L、添加剤として、にかわを含む水溶液を調製し、こ
れを電解槽(10)に陰極面での流速が2m/sとなるよう
に供給し、両電極(2) (3) 間に80A/dm の電流
密度で通電し、陰極(2) を回転し、陰極(2) の表面に銅
を電解析出させ、この厚さ35μmの析出銅層を陰極表
面から連続的に剥離して銅箔を製造した。得られた金属
箔を巻取器(11)に巻き取った。
In the metal foil manufacturing apparatus (1) having the above structure,
As the electrolyte, sulfuric acid: 100 g / L, copper sulfate: 250 g
/ L, an aqueous solution containing glue as an additive was prepared and supplied to the electrolytic cell (10) so that the flow rate at the cathode surface was 2 m / s, and 80 A was applied between the electrodes (2) and (3). / Dm 2 , the cathode (2) is rotated, copper is electrolytically deposited on the surface of the cathode (2), and the deposited copper layer having a thickness of 35 μm is continuously peeled off from the cathode surface. Copper foil was manufactured. The obtained metal foil was wound around a winder (11).

【0030】100時間連続電解後に、銅箔の厚みを膜
厚計を用いて幅方向に1cm間隔で測定した。銅箔の厚
さ測定結果を表1に示す通りである。
After 100 hours of continuous electrolysis, the thickness of the copper foil was measured at 1 cm intervals in the width direction using a film thickness gauge. Table 1 shows the results of measuring the thickness of the copper foil.

【0031】実施例2 材料としてのチタン板を実施例1と同様の操作で前処理
した後、得られた前処理チタン板をスパッタリング装置
に入れ、ターゲットから20mmの位置に配置し、タン
タルスパッタリングを行った。得られた被膜のX線回折
を測定した結果、α−タンタルの回折パターンが認めら
れた。こうしてスパッタリングにより形成したタンタル
中間層の表面に、実施例1と同じ操作により電極活性物
質を被覆して電極片を作成し、実施例1と同様の導電性
スペーサを使用して、電極片を電極基体に取付けて陽極
を作製した。この陽極について、実施例1と同様の操作
で電解銅箔製造試験を行った。銅箔の厚さ測定結果は表
1に示す通りである。
Example 2 After pretreating a titanium plate as a material by the same operation as in Example 1, the obtained pretreated titanium plate was put into a sputtering apparatus, placed at a position 20 mm from a target, and tantalum sputtering was performed. went. As a result of measuring the X-ray diffraction of the obtained coating film, a diffraction pattern of α-tantalum was recognized. The surface of the tantalum intermediate layer thus formed by sputtering is coated with an electrode active material by the same operation as in Example 1 to form an electrode piece, and the electrode piece is formed using the same conductive spacer as in Example 1. An anode was prepared by attaching to a substrate. This anode was subjected to an electrolytic copper foil production test in the same manner as in Example 1. The results of measuring the thickness of the copper foil are shown in Table 1.

【0032】比較例1 電極基体(5) と各電極片(6) の間には金属薄板製の導電
性スペーサ(9) を介在しない点を除いて、実施例1と同
様の操作により陽極を作製した。この陽極について、実
施例1と同様の操作で電解銅箔製造試験を行った。銅箔
の厚さ測定結果は表1に示す通りである。
COMPARATIVE EXAMPLE 1 An anode was formed in the same manner as in Example 1, except that a conductive spacer (9) made of a thin metal plate was not interposed between the electrode substrate (5) and each electrode piece (6). Produced. This anode was subjected to an electrolytic copper foil production test in the same manner as in Example 1. The results of measuring the thickness of the copper foil are shown in Table 1.

【0033】[0033]

【表1】 [Table 1]

【0034】銅箔の厚さのバラツキが1%以内のものを
「良」とし、1%を越え2%以内のものを「可」とし、
2%を越えるものを「不可」とした。
If the variation in the thickness of the copper foil is within 1%, it is regarded as "good", and if it exceeds 1% and within 2%, it is regarded as "acceptable".
Those exceeding 2% were regarded as "impossible".

【0035】表1から明らかなように、電極基体と電極
片の間に導電性スペーサを介在させた各実施例では、ス
ペーサのない比較例1に比較して、電極基体から電極片
への通電が良好でかつ均一であり、安定した電極活性物
質の消耗により寿命が長く、箔の厚さの均一性について
も、遙かに良好な箔が得られた。
As is clear from Table 1, in each of the embodiments in which the conductive spacer was interposed between the electrode base and the electrode piece, the current flow from the electrode base to the electrode piece was larger than in Comparative Example 1 having no spacer. Was good and uniform, the life was long due to stable consumption of the electrode active material, and a much better foil was obtained with a uniform thickness of the foil.

【0036】比較例1では電流が集中する部分の電極活
性物質の寿命が短くなるため箔厚のバラツキが大きくな
ると考えられる。
In Comparative Example 1, it is considered that the variation in foil thickness is increased because the life of the electrode active material in the portion where the current is concentrated is shortened.

【0037】[0037]

【発明の効果】本発明による金属箔製造用陽極では、電
極が局部的に劣化した場合や電極が寿命に達した場合、
陽極を容易に部分的あるいは全体的に補修または交換す
ることができ、電極片の電極基体への取り付け冶具によ
る未通電部は発生せず、したがって電流が集中するのを
防ぎ、大量の電流を流すことができる。この結果、金属
箔製品をより効率的に得ることができ、かつ金属箔製品
の品質を向上することができる。
According to the anode for manufacturing a metal foil according to the present invention, when the electrode is locally deteriorated or when the electrode reaches the end of its life,
The anode can be repaired or replaced easily or partially or completely, and no current-carrying part due to the jig for attaching the electrode piece to the electrode base does not occur. Therefore, current concentration is prevented and a large amount of current flows. be able to. As a result, a metal foil product can be obtained more efficiently, and the quality of the metal foil product can be improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 金属箔製造装置の例を示す垂直断面図であ
る。
FIG. 1 is a vertical sectional view showing an example of a metal foil manufacturing apparatus.

【図2】 陽極の例を示す垂直断面図である。FIG. 2 is a vertical sectional view showing an example of an anode.

【図3】 陽極の例を示す斜視図である。FIG. 3 is a perspective view showing an example of an anode.

【符号の説明】[Explanation of symbols]

1:金属箔製造装置 2:円筒状の回転陰極 3:陽極 5:電極基体 6:電極片 7:スタッドボルト 8:ナット 9:導電性スペーサ 10:電解槽 1: Metal foil production apparatus 2: Cylindrical rotating cathode 3: Anode 5: Electrode base 6: Electrode piece 7: Stud bolt 8: Nut 9: Conductive spacer 10: Electrolytic tank

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 断面円弧状の電極基体の内面に、同基体
の幅に等しいかまたはそれ以下の長さを有する短冊状の
金属薄板製の複数枚の電極片を並列状に配置して電極基
体に着脱自在に固着してなる陽極において、電極基体と
各電極片の間に金属薄板製の導電性スペーサを介在さ
せ、電極片に一体化した少なくとも1本のスタッドボル
トとこれに螺合するナットで導電性スペーサーと電極基
体を締め付けてなることを特徴とする金属箔製造用陽
極。
1. An electrode comprising a plurality of strip-shaped thin metal plates having a length equal to or less than the width of an electrode substrate arranged in parallel on an inner surface of an electrode substrate having an arc-shaped cross section. In the anode detachably fixed to the base, a conductive spacer made of a thin metal plate is interposed between the electrode base and each electrode piece, and screwed to at least one stud bolt integrated with the electrode piece. An anode for producing a metal foil, wherein a conductive spacer and an electrode substrate are fastened with a nut.
【請求項2】 電極片および/または導電性スペーサ
が、白金族金属または白金族金属酸化物を含む電極活性
物質被覆層が被覆されてなる、請求項1記載の金属箔製
造用陽極。
2. The anode according to claim 1, wherein the electrode pieces and / or the conductive spacers are coated with an electrode active material coating layer containing a platinum group metal or a platinum group metal oxide.
【請求項3】 導電性スペーサーの厚さが0.2〜6m
mである、請求項1または2記載の金属箔製造用陽極。
3. The conductive spacer has a thickness of 0.2 to 6 m.
The anode for producing a metal foil according to claim 1 or 2, wherein m is m.
【請求項4】 電極活性物質が、金属換算でイリジウム
を60〜95重量%、タンタルを40〜5重量%含有す
る、酸化イリジウムと酸化タンタルの混合物からなる、
請求項2または3記載の金属箔製造用陽極。
4. An electrode active material comprising a mixture of iridium oxide and tantalum oxide containing 60 to 95% by weight of iridium and 40 to 5% by weight of tantalum in terms of metal.
The anode for producing a metal foil according to claim 2.
【請求項5】 電極片および/または導電性スペーサ
が、表面に厚さ0.5〜15μmのタンタルまたはタン
タル合金層を形成した後、更にその上に電極活性物質被
覆層を形成してなる、請求項2〜4のいずれかに記載の
金属箔製造用陽極。
5. An electrode piece and / or a conductive spacer formed by forming a tantalum or tantalum alloy layer having a thickness of 0.5 to 15 μm on a surface, and further forming an electrode active material coating layer thereon. The anode for producing a metal foil according to claim 2.
【請求項6】 電極片が更に複数枚に分割されている、
請求項1〜5のいずれかに記載の金属箔製造用陽極。
6. The electrode piece is further divided into a plurality of pieces.
The anode for producing a metal foil according to claim 1.
JP2001265606A 2001-09-03 2001-09-03 Anode for manufacturing metallic foil Pending JP2002038291A (en)

Priority Applications (1)

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Publications (1)

Publication Number Publication Date
JP2002038291A true JP2002038291A (en) 2002-02-06

Family

ID=19092048

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Country Status (1)

Country Link
JP (1) JP2002038291A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003231987A (en) * 2002-02-07 2003-08-19 Daiso Co Ltd Device for manufacturing metallic foil
JP2004332102A (en) * 2003-04-18 2004-11-25 Nippon Stainless Kozai Kk Insoluble electrode for metallic foil production
US8238072B2 (en) * 2004-03-19 2012-08-07 Creative Technology Corporation Bipolar electrostatic chuck
CN108796591A (en) * 2017-04-28 2018-11-13 株式会社大阪曹达 Electrode structural body
CN109576739A (en) * 2017-09-29 2019-04-05 株式会社大阪曹达 The manufacturing device of electroplating electrode and electrolytic metal foil
CN115418684A (en) * 2022-10-09 2022-12-02 铜陵市华创新材料有限公司 Titanium anode slot structure required by electrolytic copper foil and manufacturing process

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02263999A (en) * 1989-02-14 1990-10-26 Imperial Chem Ind Plc <Ici> Electrolytic process
JPH02282491A (en) * 1989-04-21 1990-11-20 Daiso Co Ltd Oxygen generating anode and production thereof
JPH05202498A (en) * 1992-01-28 1993-08-10 Permelec Electrode Ltd Insoluble electrode structural body
JPH06346270A (en) * 1993-06-10 1994-12-20 Tdk Corp Electroplating method and split insoluble electrode for electroplating
JPH08209396A (en) * 1994-12-30 1996-08-13 Ishifuku Metal Ind Co Ltd Composite electrode for electrolysis

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02263999A (en) * 1989-02-14 1990-10-26 Imperial Chem Ind Plc <Ici> Electrolytic process
JPH02282491A (en) * 1989-04-21 1990-11-20 Daiso Co Ltd Oxygen generating anode and production thereof
JPH05202498A (en) * 1992-01-28 1993-08-10 Permelec Electrode Ltd Insoluble electrode structural body
JPH06346270A (en) * 1993-06-10 1994-12-20 Tdk Corp Electroplating method and split insoluble electrode for electroplating
JPH08209396A (en) * 1994-12-30 1996-08-13 Ishifuku Metal Ind Co Ltd Composite electrode for electrolysis

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003231987A (en) * 2002-02-07 2003-08-19 Daiso Co Ltd Device for manufacturing metallic foil
JP2004332102A (en) * 2003-04-18 2004-11-25 Nippon Stainless Kozai Kk Insoluble electrode for metallic foil production
JP4532093B2 (en) * 2003-04-18 2010-08-25 日本ステンレス工材株式会社 Insoluble electrode for metal foil production
US8238072B2 (en) * 2004-03-19 2012-08-07 Creative Technology Corporation Bipolar electrostatic chuck
CN108796591B (en) * 2017-04-28 2021-10-29 株式会社大阪曹达 Electrode structure
JP2018188679A (en) * 2017-04-28 2018-11-29 株式会社大阪ソーダ Electrode structure
CN108796591A (en) * 2017-04-28 2018-11-13 株式会社大阪曹达 Electrode structural body
CN109576739A (en) * 2017-09-29 2019-04-05 株式会社大阪曹达 The manufacturing device of electroplating electrode and electrolytic metal foil
KR20190038325A (en) * 2017-09-29 2019-04-08 가부시키가이샤 오사카소다 Electrode for plating and apparatus for manufacturing electrolytic metal foil
JP2019065339A (en) * 2017-09-29 2019-04-25 株式会社大阪ソーダ Plating electrode and manufacturing apparatus of electrolytic metal foil
CN109576739B (en) * 2017-09-29 2022-09-27 株式会社大阪曹达 Electrode for electroplating and apparatus for manufacturing electrolytic metal foil
KR102525857B1 (en) * 2017-09-29 2023-04-26 가부시키가이샤 오사카소다 Electrode for plating and apparatus for manufacturing electrolytic metal foil
CN115418684A (en) * 2022-10-09 2022-12-02 铜陵市华创新材料有限公司 Titanium anode slot structure required by electrolytic copper foil and manufacturing process

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