JP2002025994A5 - - Google Patents

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Publication number
JP2002025994A5
JP2002025994A5 JP2000199992A JP2000199992A JP2002025994A5 JP 2002025994 A5 JP2002025994 A5 JP 2002025994A5 JP 2000199992 A JP2000199992 A JP 2000199992A JP 2000199992 A JP2000199992 A JP 2000199992A JP 2002025994 A5 JP2002025994 A5 JP 2002025994A5
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JP
Japan
Prior art keywords
unit
heat treatment
holder
lid
temperature detection
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JP2000199992A
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English (en)
Japanese (ja)
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JP2002025994A (ja
JP3641193B2 (ja
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Priority to JP2000199992A priority Critical patent/JP3641193B2/ja
Priority claimed from JP2000199992A external-priority patent/JP3641193B2/ja
Publication of JP2002025994A publication Critical patent/JP2002025994A/ja
Publication of JP2002025994A5 publication Critical patent/JP2002025994A5/ja
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Publication of JP3641193B2 publication Critical patent/JP3641193B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2000199992A 2000-06-30 2000-06-30 縦型熱処理装置及び熱処理方法並びに保温ユニット Expired - Fee Related JP3641193B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000199992A JP3641193B2 (ja) 2000-06-30 2000-06-30 縦型熱処理装置及び熱処理方法並びに保温ユニット

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000199992A JP3641193B2 (ja) 2000-06-30 2000-06-30 縦型熱処理装置及び熱処理方法並びに保温ユニット

Publications (3)

Publication Number Publication Date
JP2002025994A JP2002025994A (ja) 2002-01-25
JP2002025994A5 true JP2002025994A5 (enrdf_load_stackoverflow) 2004-12-16
JP3641193B2 JP3641193B2 (ja) 2005-04-20

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ID=18697932

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000199992A Expired - Fee Related JP3641193B2 (ja) 2000-06-30 2000-06-30 縦型熱処理装置及び熱処理方法並びに保温ユニット

Country Status (1)

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JP (1) JP3641193B2 (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7203588B2 (ja) * 2018-12-17 2023-01-13 東京エレクトロン株式会社 熱処理装置
CN114127897B (zh) * 2019-06-27 2025-08-12 株式会社国际电气 隔热结构体、基板处理装置、半导体装置的制造方法、基板处理方法以及存储介质

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH084000Y2 (ja) * 1991-03-28 1996-01-31 信越化学工業株式会社 複層セラミックスヒ−タ−
JP3449630B2 (ja) * 1993-07-15 2003-09-22 株式会社日立国際電気 半導体製造装置
JP3423131B2 (ja) * 1995-11-20 2003-07-07 東京エレクトロン株式会社 熱処理装置及び処理装置
JPH10208855A (ja) * 1997-01-23 1998-08-07 Toshiba Ceramics Co Ltd 面状ヒータ

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