JP2001358283A - Current shunt and composite semiconductor device comprising it - Google Patents

Current shunt and composite semiconductor device comprising it

Info

Publication number
JP2001358283A
JP2001358283A JP2000177654A JP2000177654A JP2001358283A JP 2001358283 A JP2001358283 A JP 2001358283A JP 2000177654 A JP2000177654 A JP 2000177654A JP 2000177654 A JP2000177654 A JP 2000177654A JP 2001358283 A JP2001358283 A JP 2001358283A
Authority
JP
Japan
Prior art keywords
current
shunt
current shunt
conductor patterns
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000177654A
Other languages
Japanese (ja)
Inventor
Tadao Takano
忠夫 高野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nihon Inter Electronics Corp
Original Assignee
Nihon Inter Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Inter Electronics Corp filed Critical Nihon Inter Electronics Corp
Priority to JP2000177654A priority Critical patent/JP2001358283A/en
Publication of JP2001358283A publication Critical patent/JP2001358283A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4911Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain
    • H01L2224/49111Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain the connectors connecting two common bonding areas, e.g. Litz or braid wires

Landscapes

  • Measuring Instrument Details And Bridges, And Automatic Balancing Devices (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a highly reliable current shunt having good heat dissipation properties, and a small composite semiconductor device in which wiring length is shortened using that current shunt. SOLUTION: A resistive metallic body 4 is sandwiched by current terminals 5A, 5B to constitute a current shunt 3. A pair of conductor patterns 9A, 9B for current and conductor patterns 11A, 11B for detecting voltage are provided continuously to each other on a wiring insulation board 1. The current terminal 5A is bonded to the conductor pattern 9A for current and between the conductor patterns 11A, 11B for detecting voltage by means of a bonding wire 10.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】本発明は、電気回路中に流れる電流を計測
する電流シャントと、その電流シャントを使用した複合
半導体装置に関するものである。
The present invention relates to a current shunt for measuring a current flowing in an electric circuit and a composite semiconductor device using the current shunt.

【0002】[0002]

【従来の技術】電流シャントの使用例を図2に示す。図
において、電界効果トランジスタ(以下、単にトランジ
スタと記す。)QのドレインDとソースS間に電源Eと
負荷Lを直列に接続し、トランジスタQのソースS側に
は電流シャントSHが接続してある。
2. Description of the Related Art FIG. 2 shows an example of using a current shunt. In the figure, a power supply E and a load L are connected in series between a drain D and a source S of a field effect transistor (hereinafter, simply referred to as a transistor) Q, and a current shunt SH is connected to a source S side of the transistor Q. is there.

【0003】上記の回路において、トランジスタQのゲ
ートGにオン信号を加えると、該トランジスタQはオン
し、ドレイン電流IDにより負荷Lに電力が供給され
る。上記回路で電流シャントSHの役割は、ドレイン電
流IDが流れることにより該電流シャントSHの両端電
圧VSHを検出し、トランジスタQにどの位の電流が流
れているかを監視することである。
In the above circuit, when an ON signal is applied to the gate G of the transistor Q, the transistor Q is turned on and power is supplied to the load L by the drain current ID. The role of the current shunt SH in the above circuit is to detect the voltage VSH across the current shunt SH when the drain current ID flows and to monitor how much current is flowing through the transistor Q.

【0004】図2の回路で何らかの原因により規定値以
上のドレイン電流IDが流れた場合、電流シャントSH
で検出された電圧VSHによって、トランジスタQのゲ
ートGに入力される信号を制御し、ドレイン電流IDを
少なくするか、該トランジスタQをオフさせてドレイン
電流IDを遮断し、該トランジスタQ若しくは負荷Lの
電流破壊を未然に防止するようにしている。
When a drain current ID exceeding a specified value flows for some reason in the circuit of FIG.
The signal input to the gate G of the transistor Q is controlled by the voltage VSH detected at step (1) to reduce the drain current ID, or to turn off the transistor Q to cut off the drain current ID, and to set the transistor Q or the load L To prevent current destruction.

【0005】次に、上記回路に使用されている電流シャ
ントSHの構造例を図3に示す。この図では複合半導体
装置の全体の構成は省略してあるが、所定のパッケージ
内に複数の半導体チップが配線絶縁基板1の導体パター
ン(図示せず)上に搭載されている。上記配線絶縁基板
1上に、図2の回路構成で電流シャントSHが搭載され
るが、該電流シャントSHの配置及びその構成のみを示
したのが図3である。
Next, FIG. 3 shows an example of the structure of the current shunt SH used in the above circuit. Although the overall configuration of the composite semiconductor device is omitted in this figure, a plurality of semiconductor chips are mounted on a conductor pattern (not shown) of the wiring insulating substrate 1 in a predetermined package. The current shunt SH is mounted on the wiring insulating substrate 1 in the circuit configuration shown in FIG. 2, and FIG. 3 shows only the arrangement and the configuration of the current shunt SH.

【0006】図において、配線絶縁基板1上に部品搭載
パターン2が形成され、該パターン2上に電流シャント
3が半田固着されている。上記電流シャント3の構成
は、金属からなる抵抗金属体4の上面に一対の電流端子
5A,5Bと、該電流端子5A,5Bとは分離した位置
に一対の電圧検出端子6A,6Bが対向配置されてい
る。
In FIG. 1, a component mounting pattern 2 is formed on a wiring insulating substrate 1, and a current shunt 3 is fixed on the pattern 2 by soldering. The configuration of the current shunt 3 is such that a pair of current terminals 5A and 5B are provided on the upper surface of a resistance metal body 4 made of metal, and a pair of voltage detection terminals 6A and 6B are opposed to each other at a position separated from the current terminals 5A and 5B. Have been.

【0007】上記抵抗金属体4の下面には、絶縁層7を
介して金属層8が設けられている。また、上記電流シャ
ント3の電流端子5A,5Bと、配線絶縁基板1上に形
成した一対の電流用導体パターン9A,9Bとをボンデ
ィングワイヤ10によりボンディングしてある。さら
に、電圧検出端子6A,6Bは、配線絶縁基板1上に設
けられた一対の電圧検出用導体パターン11A,11B
とボンディングワイヤ10によりボンディングされてい
る。
A metal layer 8 is provided on the lower surface of the resistance metal body 4 with an insulating layer 7 interposed therebetween. The current terminals 5A and 5B of the current shunt 3 and the pair of current conductor patterns 9A and 9B formed on the wiring insulating substrate 1 are bonded by bonding wires 10. Further, the voltage detection terminals 6A, 6B are connected to a pair of voltage detection conductor patterns 11A, 11B provided on the wiring insulating substrate 1.
And a bonding wire 10.

【0008】[0008]

【発明が解決しようとする課題】従来の電流シャント及
びそれを使用した複合半導体装置は、上記のように構成
されているので、次のような解決すべき課題があった。 (1)電流シャント3の上面に配置される電流端子5
A,5B、電圧検出端子6A,6Bが上面の両側に対向
して配置されているため、これらの端子5A,5B,5
A,5Bから導体パターン9A,9B,11A,11B
へのボンディングワイヤ10による接続は両側に振り分
けられてしまう。換言すれば、一対の導体パターン9
A,9B及び一対の導体パターン11A,11Bが互い
に隣接した位置に形成されていないために配線長が長く
なってしまう。また、配線方向が一方向に制限されてし
まい、部品配置設計の自由度が失われてしまう。 (2)電流シャント3の抵抗金属体4の下面に絶縁層7
が介在するため、該抵抗金属体4の放熱性が悪くなり、
温度の上昇を防ぐにはその分、該抵抗金属体4の表面積
を大きくしなければならない。そのためそれを搭載する
部品搭載パターン2も大きくなり、複合半導体装置の小
型化が困難となる。 (3)長期間の使用により絶縁層7の劣化が見られ電流
シャント3の信頼性を低下させる面がある。
Since the conventional current shunt and the composite semiconductor device using the same are configured as described above, there are the following problems to be solved. (1) Current terminal 5 arranged on the upper surface of current shunt 3
A, 5B and the voltage detection terminals 6A, 6B are arranged on both sides of the upper surface so as to face each other.
A, 5B to conductor patterns 9A, 9B, 11A, 11B
The connection to the bonding wire 10 is distributed to both sides. In other words, the pair of conductor patterns 9
Since A and 9B and the pair of conductor patterns 11A and 11B are not formed at positions adjacent to each other, the wiring length becomes long. In addition, the wiring direction is limited to one direction, and the degree of freedom in component layout design is lost. (2) an insulating layer 7 on the lower surface of the resistance metal body 4 of the current shunt 3
Intervening, the heat radiation of the resistance metal body 4 is deteriorated,
To prevent the temperature from rising, the surface area of the resistance metal body 4 must be increased accordingly. Therefore, the component mounting pattern 2 on which it is mounted also becomes large, and it is difficult to reduce the size of the composite semiconductor device. (3) The insulating layer 7 is deteriorated due to long-term use, and the reliability of the current shunt 3 is reduced.

【0009】[0009]

【発明の目的】本発明は上記のような課題を解決すため
になされたもので、電流シャントの電流端子から配線絶
縁基板上の導体パターンへの接続方向の自由度が高く、
かつ、配線長を短くすることができる複合半導体装置及
び放熱性に優れ、かつ、劣化がなく信頼性の高い電流シ
ャントを提供することを目的とするものである。
SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and has a high degree of freedom in the direction of connection from the current terminals of a current shunt to a conductor pattern on a wiring insulating substrate.
It is another object of the present invention to provide a composite semiconductor device capable of shortening the wiring length and a highly reliable current shunt with excellent heat dissipation and no deterioration.

【0010】[0010]

【課題を解決するための手段】本発明は、抵抗金属体を
電流端子によりサンドイッチ状に挟んで電流シャントを
構成し、配線絶縁基板上には互いに隣接するように一対
の電流用導体パターン及び電圧検出用導体パターンを設
け、電流端子と電流用導体パターン及び同じく電圧検出
端子と電圧検出用導体パターン間をボンディングワイヤ
にてボンディングする。これにより電流シャントは絶縁
層が介在しないので、放熱性が向上し、かつ、劣化のお
それもないので信頼性が向上する。また、接続方向も一
方向に限定されず、設計の自由度を増加させ、配線長も
短くなり、かつ、小型化を実現した複合半導体装置が得
られる。
According to the present invention, a resistance shunt is sandwiched between current terminals to form a current shunt, and a pair of current conductor patterns and a voltage are formed on a wiring insulating substrate so as to be adjacent to each other. A conductor pattern for detection is provided, and the current terminal and the conductor pattern for current, and between the voltage detection terminal and the conductor pattern for voltage detection are bonded by bonding wires. As a result, since the current shunt does not have the insulating layer interposed, the heat dissipation is improved, and the reliability is improved because there is no fear of deterioration. In addition, the connection direction is not limited to one direction, and a composite semiconductor device with increased design flexibility, reduced wiring length, and reduced size can be obtained.

【0011】[0011]

【実施例】以下に、本発明の実施例を、図1を参照して
説明する。図において、複合半導体装置全体の構成は省
略してある。上記複合半導体装置の配線絶縁基板1上に
は、該基板1に搭載される部品に対応した導体パターン
が設けられている。
An embodiment of the present invention will be described below with reference to FIG. In the figure, the configuration of the entire composite semiconductor device is omitted. On the wiring insulating substrate 1 of the composite semiconductor device, a conductor pattern corresponding to a component mounted on the substrate 1 is provided.

【0012】すなわち、図において、電流シャント3の
下面となる一方の主面に対応した電流用導体パターン9
Bと、該電流シャント3の図では上面となる他方の主面
と接続する電流用導体パターン9Aが図示のように隣接
して設けられる。上記導体パターン9Bは、相対的に広
い面積の基幹部導体パターン12から延在するように設
けられている。
That is, in the figure, the current conductor pattern 9 corresponding to one main surface serving as the lower surface of the current shunt 3 is shown.
B and a current conductor pattern 9A connected to the other main surface, which is the upper surface in the drawing of the current shunt 3, are provided adjacent to each other as shown. The conductor pattern 9B is provided so as to extend from the base conductor pattern 12 having a relatively large area.

【0013】また、上記配線絶縁基板1上に、上記電流
用導体パターン9A,9Bとは略90度方向を変えた位
置に、一対の電圧検出用導体パターン11A,11Bが
隣接して設けられている。
On the wiring insulating substrate 1, a pair of voltage detecting conductor patterns 11A and 11B are provided adjacent to each other at positions substantially 90 degrees different from the current conductor patterns 9A and 9B. I have.

【0014】次に、電流シャント3の構造について説明
する。電流シャント3は、抵抗金属体4を電流端子5
A,5Bによりサンドイッチ状に挟んだ構造を有する。
該抵抗金属体4は、例えばマンガニンを使用する。マン
ガニンは周知のようにMn;12〜18%、Ni;1.
5〜4%、Cu;残部の組成をもつ銅合金である。電気
比抵抗が室温付近で約42×10↑−6Ωcmと高い。
また、温度係数も極めて小さい素材である。なお、上記
の実施例ではマンガニンを使用したが、勿論マンガニン
に変えて比抵抗の高い金属材料を使用することもでき
る。
Next, the structure of the current shunt 3 will be described. The current shunt 3 connects the resistance metal body 4 to the current terminal 5
A and 5B have a sandwiched structure.
The resistance metal body 4 uses, for example, manganin. Manganin is known as Mn; 12-18%, Ni;
5-4%, Cu; a copper alloy having the balance of the composition. The electric resistivity is as high as about 42 × 10 6 Ωcm near room temperature.
In addition, the material has a very small temperature coefficient. Although manganin is used in the above embodiment, a metal material having a high specific resistance can be used instead of manganin.

【0015】上記の抵抗金属体4の両主面の例えば銅か
らなる層を設けて一対の電流端子5A,5Bとする。以
上の構成からなる電流シャント3を基幹部導体パターン
12上に比較的高温の半田により固着する。次いで、電
流シャント3の電流端子5Aと電流用導体パターン9A
及び電圧検出用導体パターン11A,11B間をボンデ
ィングワイヤ10によりボンディングする。
A pair of current terminals 5A and 5B is formed by providing a layer made of, for example, copper on both main surfaces of the resistance metal body 4. The current shunt 3 having the above-described configuration is fixed on the core conductor pattern 12 by relatively high-temperature solder. Next, the current terminal 5A of the current shunt 3 and the current conductor pattern 9A
The bonding between the voltage detection conductor patterns 11A and 11B is performed by the bonding wire 10.

【0016】以上の構成によれば、配線絶縁基板1上の
一対の電流用導体パターン9A,9B及び一対の電圧検
出用導体パターンは、互いに隣接して形成することがで
きるため、ボンディングワイヤ10の配線長を短くする
ことができる。また、配線方向が従来のように一方向に
制限されることがなくなり、設計の自由度が増加する。
According to the above configuration, the pair of current conductor patterns 9A and 9B and the pair of voltage detection conductor patterns on the wiring insulating substrate 1 can be formed adjacent to each other. The wiring length can be reduced. Further, the wiring direction is not limited to one direction as in the related art, and the degree of freedom in design increases.

【0017】さらに、電流シャント3には従来のように
絶縁層が介在していないので、放熱性が良く、劣化のお
それもなく信頼性が向上する。さらに絶縁層がない分、
装置の小型化を図ることができる。
Furthermore, since the current shunt 3 does not have an insulating layer as in the prior art, heat dissipation is good, and the reliability is improved without fear of deterioration. Since there is no insulating layer,
The size of the device can be reduced.

【0018】また、電流シャント3の上側の電流端子5
Aと電流用導体パターン9A間を必要に応じて板材から
なる端子を用いることにより大容量の電流シャント3に
対応することもできる。
The current terminal 5 on the upper side of the current shunt 3
A large-capacity current shunt 3 can be used by using a terminal made of a plate material between A and the current conductor pattern 9A as necessary.

【0019】[0019]

【発明の効果】本発明は上記のように構成したので、電
流シャントの電流端子から配線絶縁基板上の導体パター
ンへの接続方向の自由度が増加し、かつ、配線長を短く
した小型の複合半導体装置が得られると共に、放熱性に
優れ、かつ、劣化がなく信頼性の高い電流シャントが得
られるなどの優れた効果がある。
Since the present invention is constructed as described above, the degree of freedom in the connection direction from the current terminal of the current shunt to the conductor pattern on the wiring insulating substrate is increased, and the size of the compact composite is reduced. A semiconductor device is obtained, and excellent effects such as obtaining a highly reliable current shunt with excellent heat dissipation and no deterioration are obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例を示す複合半導体装置の要部
を示す斜視図である。
FIG. 1 is a perspective view showing a main part of a composite semiconductor device according to an embodiment of the present invention.

【図2】上記複合半導体装置に内蔵される電流シャント
を説明するための回路図である。
FIG. 2 is a circuit diagram for explaining a current shunt built in the composite semiconductor device.

【図3】従来の複合半導体装置の要部を示す斜視図であ
る。
FIG. 3 is a perspective view showing a main part of a conventional composite semiconductor device.

【符号の説明】[Explanation of symbols]

1 配線絶縁基板 3 電流シャント 4 抵抗金属体 5A,5B 電流端子 9A,9B 電流用導体パターン 10 ボンディングワイヤ 11A,11B 電圧検出用導体パターン 12 基幹部導体パターン DESCRIPTION OF SYMBOLS 1 Wiring insulating board 3 Current shunt 4 Resistance metal body 5A, 5B Current terminal 9A, 9B Current conductor pattern 10 Bonding wire 11A, 11B Voltage detection conductor pattern 12 Base conductor pattern

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】電気抵抗体に電流を流し、該抵抗体の電圧
降下を利用して電流又は電圧を検出する電流シャントに
おいて、平板状の電気抵抗体の両主面に電流端子を設
け、一方の主面から他方の主面に向かって該電気抵抗体
の板厚方向に電流が流れるようにしたことを特徴とする
電流シャント。
1. A current shunt in which a current flows through an electric resistor and a current or a voltage is detected by utilizing a voltage drop of the resistor, current terminals are provided on both main surfaces of a flat electric resistor. A current shunt characterized in that a current flows in the thickness direction of the electric resistor from the main surface to the other main surface.
【請求項2】複合半導体装置の配線絶縁基板上に一対の
電圧検出用導体パターンと、電流を流すための一対の電
流用導体パターンとを隣接して設け、該電流用導体パタ
ーンの一方に電流シャントの一方の主面を固着し、該電
流シャントの他方の主面上と前記電流用導体パターンの
他方とを導体で接続し、前記電圧検出用導体パターンの
一方は、前記電流シャントの一方の主面と、前記電圧検
出用導体パターンの他方は、前記電流シャントの他方の
主面とを、それぞれ導体で接続したことを特徴とする複
合半導体装置。
2. A pair of voltage detection conductor patterns and a pair of current conductor patterns for flowing current are provided adjacent to each other on a wiring insulating substrate of the composite semiconductor device, and a current is supplied to one of the current conductor patterns. One main surface of the shunt is fixed, and the other main surface of the current shunt and the other of the current conductor patterns are connected by a conductor, and one of the voltage detection conductor patterns is one of the current shunts. A composite semiconductor device, wherein a main surface and the other main surface of the current shunt are connected to each other by a conductor, respectively.
JP2000177654A 2000-06-13 2000-06-13 Current shunt and composite semiconductor device comprising it Pending JP2001358283A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000177654A JP2001358283A (en) 2000-06-13 2000-06-13 Current shunt and composite semiconductor device comprising it

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20180233896A1 (en) * 2017-02-13 2018-08-16 Siemens Aktiengesellschaft Supply device for an electrical module having a fuse element
CN110447079A (en) * 2017-03-30 2019-11-12 Koa株式会社 Examine flow resistor
CN113039642A (en) * 2018-11-16 2021-06-25 株式会社日立制作所 Power semiconductor device

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JPH0446501U (en) * 1990-08-27 1992-04-21
JPH06186254A (en) * 1992-12-16 1994-07-08 Mitsubishi Electric Corp Chip-type resistor for current detection
JPH1140744A (en) * 1997-07-22 1999-02-12 Sharp Corp Power semiconductor device
JP2000286102A (en) * 1999-03-30 2000-10-13 Sony Corp Passive components and fixed resistor
JP2000299205A (en) * 1999-04-12 2000-10-24 Matsushita Electric Ind Co Ltd Chip resistor and manufacturer thereof

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JPH0446501U (en) * 1990-08-27 1992-04-21
JPH06186254A (en) * 1992-12-16 1994-07-08 Mitsubishi Electric Corp Chip-type resistor for current detection
JPH1140744A (en) * 1997-07-22 1999-02-12 Sharp Corp Power semiconductor device
JP2000286102A (en) * 1999-03-30 2000-10-13 Sony Corp Passive components and fixed resistor
JP2000299205A (en) * 1999-04-12 2000-10-24 Matsushita Electric Ind Co Ltd Chip resistor and manufacturer thereof

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20180233896A1 (en) * 2017-02-13 2018-08-16 Siemens Aktiengesellschaft Supply device for an electrical module having a fuse element
CN110447079A (en) * 2017-03-30 2019-11-12 Koa株式会社 Examine flow resistor
DE112018001784T5 (en) 2017-03-30 2019-12-19 Koa Corporation Current sensing resistor
CN113039642A (en) * 2018-11-16 2021-06-25 株式会社日立制作所 Power semiconductor device
CN113039642B (en) * 2018-11-16 2024-06-18 株式会社日立制作所 Power semiconductor device

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