JP2001337095A - Automatic analyzer - Google Patents

Automatic analyzer

Info

Publication number
JP2001337095A
JP2001337095A JP2000164732A JP2000164732A JP2001337095A JP 2001337095 A JP2001337095 A JP 2001337095A JP 2000164732 A JP2000164732 A JP 2000164732A JP 2000164732 A JP2000164732 A JP 2000164732A JP 2001337095 A JP2001337095 A JP 2001337095A
Authority
JP
Japan
Prior art keywords
cleaning
washing
reaction
reaction vessel
sound wave
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000164732A
Other languages
Japanese (ja)
Inventor
Kenji Inayoshi
健治 稲吉
Hiroyasu Uchida
裕康 内田
Takeshi Shibuya
武志 渋谷
Katsuhiro Kanbara
克宏 神原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP2000164732A priority Critical patent/JP2001337095A/en
Publication of JP2001337095A publication Critical patent/JP2001337095A/en
Pending legal-status Critical Current

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  • Automatic Analysis And Handling Materials Therefor (AREA)

Abstract

PROBLEM TO BE SOLVED: To achieve a higher cleaning effect in a cleaning means for a dispensing nozzle and a reaction vessel by improving the cleaning of the dispensing nozzle as supply means of a reagent and a specimen to be analyzed or the reaction vessel for the reaction between the reagent and the specimen in view of the insufficiency thereof that causes contamination and the like and a problem noted in the results in the fields of biochemistry and immunological analyzers. SOLUTION: The apparatus is provided with a cleaning mechanism in which respective cleaning sections are provided with sound wave generation means and retention parts and irradiates cleaning water or a cleaning solution used for cleaning with a sound wave to cause a convection. In the automatic analyzer thus obtained accomplishes the cleaning of the dispensing nozzle and the reaction vessels with the cleaning solution or cleaning water prepared under the convection caused by the irradiation with the sound wave, thereby improving the cleaning effect.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、試薬を用い分析対
象である検体の成分を定量分析する分析装置に係り、特
に試薬と検体の分注用に用いられる分注用ノズル、試薬
と検体を反応させる反応容器の洗浄を行う機能を備えた
自動分析装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an analyzer for quantitatively analyzing components of a sample to be analyzed by using a reagent, and more particularly to a dispensing nozzle used for dispensing a reagent and a sample, and a dispensing nozzle and a reagent. The present invention relates to an automatic analyzer having a function of washing a reaction vessel to be reacted.

【0002】[0002]

【従来の技術】血液等の成分を定量分析する検体検査の
自動化が進められてきているが、このような検体検査
は、血液を遠心分離により分離させた血清をサンプリン
グ機構により反応容器に分注し、次に検査項目に対応し
た試薬を別のサンプリング機構により反応容器に分注
し、反応容器内で混合、攪拌、反応させ、反応容器内の
反応液を光度計により吸光度を測定することで検体検査
が行われる。また、試薬及び検体の分注に用いられる分
注用ノズル、試薬及び検体の混合、攪拌、反応に用いら
れる反応容器は洗浄し繰り返し使用される。一般に分注
用ノズルの洗浄は、特開平9−80057号公報に記載
のように試薬または検体の分注後、洗浄水の滞留部に分
注用ノズルを浸し、この洗浄水により洗い流す方法であ
る。また、反応容器の洗浄は、特開平5−072213
号公報に記載のように、反応容器中に洗浄液及び洗浄水
を一定時間溜めては排出する吸引吐出動作を繰り返し行
うことで内壁を洗い流す方法が用いられている。
2. Description of the Related Art Automated sample tests for quantitative analysis of components such as blood have been promoted. In such sample tests, serum obtained by separating blood by centrifugation is dispensed into a reaction container by a sampling mechanism. Then, the reagent corresponding to the test item is dispensed into the reaction vessel by another sampling mechanism, mixed, stirred, and reacted in the reaction vessel, and the reaction solution in the reaction vessel is measured for absorbance by a photometer. A sample test is performed. The dispensing nozzle used for dispensing the reagent and the sample, and the reaction container used for mixing, stirring, and reacting the reagent and the sample are washed and used repeatedly. Generally, washing of a dispensing nozzle is a method in which after dispensing a reagent or a specimen, the dispensing nozzle is immersed in a stagnant portion of washing water as described in Japanese Patent Application Laid-Open No. 9-80057 and rinsed with the washing water. . Further, the washing of the reaction vessel is described in JP-A-5-07213.
As described in Japanese Patent Application Laid-Open Publication No. H11-107, a method is used in which the inner wall is washed away by repeatedly performing a suction / discharge operation in which a washing liquid and washing water are stored in a reaction vessel for a certain period of time and then discharged.

【0003】[0003]

【発明が解決しようとする課題】生化学や免疫分析装置
の分野では、試薬や分析対象である検体の供給手段であ
る分注用ノズルの洗浄が不十分であると、吸引量及び吐
出量のバラツキやコンタミネーション等を発生させ、ま
た、試薬と検体を反応させる反応容器の洗浄が不十分で
もコンタミネーション等が発生し、分析結果に問題を引
き起こすことになる。
In the field of biochemistry and immunoanalyzers, if the dispensing nozzle, which is a means for supplying a reagent or a sample to be analyzed, is not sufficiently washed, the amount of suction and the amount of ejection will be reduced. Even if the reaction vessel for reacting the reagent with the sample is not sufficiently washed, contamination or the like will occur, causing a problem in the analysis result.

【0004】そこで本発明の目的は、洗浄し繰り返し使
用される分注用ノズル及び反応容器の洗浄手段におい
て、より洗浄効果の高い洗浄手段を確立することにあ
る。
Accordingly, an object of the present invention is to establish a washing means having a higher washing effect in a dispensing nozzle and a washing means for a reaction vessel which are washed and used repeatedly.

【0005】[0005]

【課題を解決するための手段】上記目的は、各洗浄部に
音波発生手段及び滞留部を設け、音波を滞留部内の洗浄
に用いる洗浄水または洗浄液に照射し、対流を起こさせ
る洗浄機構を備えることで達成される。
The object of the present invention is to provide a sonic wave generating means and a retaining section in each cleaning section, and to provide a cleaning mechanism for irradiating a cleaning water or a cleaning liquid used for cleaning the retaining section with a sound wave to cause convection. Is achieved by

【0006】[0006]

【発明の実施の形態】以下本発明を実施例により詳細に
説明する。図1は本発明を適用した自動分析装置の概略
図である。試薬は、分注用ノズル1aにより試薬格納部
2に複数備えられた試薬容器3から、分析対象である検
体は、分注用ノズル1bにより検体格納部4に複数備え
られた検体容器5から反応ディスク6上に複数配置され
た反応容器7に分注され、反応容器7内で試薬及び検体
の混合、攪拌、反応が行われる。試薬及び検体が分注さ
れた反応容器7は、反応ディスク駆動部8の回転、停止
動作により、一定サイクルで図示していない攪拌部に移
送される。攪拌部では、試薬及び検体を分注した反応容
器7にヘラを入れ、ヘラを回転、振動させることで攪拌
が行われる。攪拌された試薬及び検体は反応容器7内で
反応液となり、図示していない分析部に移送され、光度
計により吸光度が測定され検体検査が行われる。測定後
の反応容器7は、複数のノズルを備えた洗浄機構11と
反応槽9に圧電素子10を設けた箇所に移送され、そこ
で洗浄が行われる。こうした一連の動作は各反応容器に
対し繰り返し行われており、また、試薬の分注用に用い
られる分注用ノズル1a及び検体の分注用に用いられる
分注用ノズル1bの洗浄も、分注後圧電素子10及び滞
留部を設けた各ノズル洗浄槽12において洗浄が行われ
る構成である。尚、本実施例の自動分析装置は、上記記
載の部品を含めすべての部品が制御部21により制御さ
れている。
BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described in detail with reference to examples. FIG. 1 is a schematic diagram of an automatic analyzer to which the present invention is applied. A reagent reacts from a plurality of reagent containers 3 provided in the reagent storage unit 2 by the dispensing nozzle 1a, and a sample to be analyzed is reacted from a plurality of sample containers 5 provided in the sample storage unit 4 by the dispensing nozzle 1b. The mixture is dispensed into a plurality of reaction vessels 7 arranged on the disk 6, and mixing, stirring, and reaction of the reagent and the sample are performed in the reaction vessels 7. The reaction container 7 into which the reagent and the sample have been dispensed is transferred to a stirring unit (not shown) in a fixed cycle by the rotation and stop operation of the reaction disk drive unit 8. In the stirring section, a spatula is put into the reaction container 7 into which the reagent and the sample are dispensed, and the spatula is rotated and vibrated to perform stirring. The stirred reagent and sample become a reaction solution in the reaction container 7 and are transferred to an analysis unit (not shown), where the absorbance is measured by a photometer, and a sample test is performed. After the measurement, the reaction vessel 7 is transferred to a cleaning mechanism 11 having a plurality of nozzles and a place where the piezoelectric element 10 is provided in the reaction tank 9, where the cleaning is performed. Such a series of operations is repeatedly performed for each reaction vessel, and the washing of the dispensing nozzle 1a used for dispensing the reagent and the dispensing nozzle 1b used for dispensing the sample are also performed separately. After the injection, cleaning is performed in each nozzle cleaning tank 12 provided with the piezoelectric element 10 and the retaining portion. In the automatic analyzer according to the present embodiment, all parts including the above-described parts are controlled by the control unit 21.

【0007】以下各洗浄部について詳細に説明する。図
2は、本実施例により分注用ノズルの洗浄を行うノズル
洗浄槽の概略構成図である。ノズル洗浄槽12には、分
注用ノズル1の先端を浸せる洗浄水13の滞留部があ
り、給水用バルブ14及び排水用バルブ15を開閉さ
せ、洗浄毎に滞留部内の洗浄水13を交換する。また、
ノズル洗浄槽12の側面には、分注ノズル1の先端を洗
浄水13に浸した際の洗浄水13の水面と同等の高さに
圧電素子10が設けられている。尚、ノズル洗浄槽12
の側面に設置された圧電素子10、圧電素子10を駆動
させる圧電素子駆動回路16は、ノズル洗浄槽12内の
洗浄水13とは独立しており、洗浄時に発生したコンタ
ミが圧電素子10に付着するのを防止できる構造であ
る。洗浄水13がノズル洗浄槽12に定量溜まったとこ
ろで、洗浄する分注用ノズル1の先端を洗浄水13に浸
すと共に、圧電素子駆動回路16を動作させ、音波17
を圧電素子10から分注用ノズル1に向け照射する。こ
の照射された音波17により、ノズル洗浄槽12に溜め
られた洗浄水13は矢印の向きに対流18を起こし、洗
浄水13に分注用ノズル1の先端を浸すだけで、試薬あ
るいは検体が付着した分注用ノズル1を容易に洗浄する
ことができる。続いて、音波17を所定時間照射後、排
水用バルブ15を開けノズル洗浄槽12内の洗浄水13
をすべて排水し、排水用バルブ15を開けたまま洗浄水
13を新たに供給することで、同位置ですすぎも行うこ
とができる。尚、洗浄水13の低減または処理速度の向
上を図るならば、ノズル洗浄槽12に溜まった洗浄水1
3を一定量流し続けたまま、分注用ノズル1を洗浄水1
3の水面より高い位置に移動し、洗浄水13を供給する
ことですすぎを行っても良い。
Hereinafter, each cleaning section will be described in detail. FIG. 2 is a schematic configuration diagram of a nozzle cleaning tank for cleaning a dispensing nozzle according to the present embodiment. The nozzle cleaning tank 12 has a stagnant portion for washing water 13 into which the tip of the dispensing nozzle 1 is immersed. The water supply valve 14 and the drain valve 15 are opened and closed, and the washing water 13 in the stagnant portion is replaced each time washing is performed. I do. Also,
A piezoelectric element 10 is provided on the side surface of the nozzle cleaning tank 12 at a height equivalent to the level of the cleaning water 13 when the tip of the dispensing nozzle 1 is immersed in the cleaning water 13. The nozzle cleaning tank 12
The piezoelectric element 10 and the piezoelectric element driving circuit 16 for driving the piezoelectric element 10 are provided independently of the cleaning water 13 in the nozzle cleaning tank 12. It is a structure that can be prevented. When a fixed amount of the cleaning water 13 is accumulated in the nozzle cleaning tank 12, the tip of the dispensing nozzle 1 to be cleaned is immersed in the cleaning water 13 and the piezoelectric element drive circuit 16 is operated to generate a sound wave 17
From the piezoelectric element 10 to the dispensing nozzle 1. The radiated sound wave 17 causes the cleaning water 13 stored in the nozzle cleaning tank 12 to generate a convection 18 in the direction of the arrow. The used dispensing nozzle 1 can be easily washed. Subsequently, after irradiating a sound wave 17 for a predetermined time, the drain valve 15 is opened and the cleaning water 13 in the nozzle cleaning tank 12 is opened.
Is completely drained, and the washing water 13 is newly supplied while the drain valve 15 is opened, so that rinsing can be performed at the same position. If the cleaning water 13 is to be reduced or the processing speed is to be improved, the cleaning water 1 accumulated in the nozzle cleaning tank 12 is not required.
While continuing to flow a fixed amount of 3, the dispensing nozzle 1
Rinsing may be performed by moving to a position higher than the water surface of No. 3 and supplying the washing water 13.

【0008】図3は、本実施例により反応容器の洗浄を
行う反応槽の概略構成図である。反応槽9内には、水を
代表とする一定温度に保たれた反応槽水19が循環され
ており、この反応槽水19に反応容器7は浸されてい
る。また、反応槽9には、反応容器7の洗浄時に反応容
器7内に分注される洗浄液20の液面と同等の高さに圧
電素子10が設置されている。成分分析を終えた反応容
器7は、反応容器7内の反応液を洗浄機構11により排
出され、替わりに洗浄液20が分注され、圧電素子駆動
回路16を動作させることで、反応槽9に設置された圧
電素子10から反応容器7内の洗浄液20に向け音波1
7が照射される。この照射された音波17により、反応
容器7内の洗浄液20は対流を起こし、反応容器7内に
残ったコンタミを洗い流すことができる。音波17を所
定時間照射後、反応容器7内の洗浄液20を洗浄機構1
1で排出し、反応ディスク6を回転することで洗浄機構
11の他のノズルから反応容器7内に洗浄水13を分注
し、前記同様反応容器7に音波17を照射することで反
応容器7内の洗浄水13に対流を起こしすすぎを行う。
この一定時間溜めて排出する吸引吐出動作を繰り返すこ
とで、反応容器7内の洗浄が行われる。
FIG. 3 is a schematic structural view of a reaction tank for cleaning a reaction vessel according to the present embodiment. In the reaction tank 9, reaction tank water 19 maintained at a constant temperature represented by water is circulated, and the reaction vessel 7 is immersed in the reaction tank water 19. Further, in the reaction tank 9, the piezoelectric element 10 is installed at the same height as the level of the cleaning liquid 20 dispensed into the reaction container 7 when the reaction container 7 is washed. After the component analysis, the reaction solution in the reaction container 7 is discharged by the cleaning mechanism 11, the cleaning solution 20 is dispensed instead, and the piezoelectric element drive circuit 16 is operated to install the reaction solution in the reaction vessel 9. The sound wave 1 is directed from the piezoelectric element 10 to the cleaning liquid 20 in the reaction vessel 7.
7 is irradiated. The radiated sound waves 17 cause the convection of the cleaning liquid 20 in the reaction container 7, so that the contamination remaining in the reaction container 7 can be washed away. After irradiating the sound wave 17 for a predetermined time, the cleaning solution 20 in the reaction vessel 7 is washed with the cleaning mechanism 1.
The washing water 13 is dispensed from the other nozzle of the washing mechanism 11 into the reaction vessel 7 by rotating the reaction disk 6 and the reaction vessel 7 is irradiated with the sound wave 17 in the same manner as described above. A convection is generated in the washing water 13 in the inside, and rinsing is performed.
The inside of the reaction vessel 7 is washed by repeating the suction and discharge operation of collecting and discharging the liquid for a certain period of time.

【0009】上記図1、図2の実施例では、洗浄を行う
分注用ノズルあるいは反応容器の形状及び洗浄箇所は一
定のため、各洗浄部に固定し一体構造とすることが可能
であり、音波の強度及び方向等もかえることなく適度な
音波を液体に照射し、対流を起こさせ洗浄を行うことが
できる。
In the embodiments shown in FIGS. 1 and 2, since the shape of the dispensing nozzle or the reaction vessel for washing and the washing location are fixed, it is possible to fix it to each washing section to form an integral structure. Irradiation of an appropriate sound wave to the liquid without changing the strength and direction of the sound wave can cause convection and cleaning.

【0010】[0010]

【発明の効果】自動分析装置において、試薬や検体の供
給に用いられる分注用ノズル、試薬と検体を混合、攪
拌、反応させる反応容器の洗浄は、音波を照射し対流を
起こした洗浄液または洗浄水で行うため、洗浄効果の向
上が図れる。
In the automatic analyzer, the dispensing nozzle used for supplying the reagent and the sample, and the reaction vessel for mixing, stirring, and reacting the reagent and the sample are washed with a washing solution or a washing liquid which is irradiated with a sound wave to cause convection. Since the cleaning is performed with water, the cleaning effect can be improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】発明を適用した化学分析装置の概略図。FIG. 1 is a schematic diagram of a chemical analyzer to which the invention is applied.

【図2】本発明を適用したノズル洗浄槽の概略構成図。FIG. 2 is a schematic configuration diagram of a nozzle cleaning tank to which the present invention is applied.

【図3】本発明を適用した反応槽の概略構成図。FIG. 3 is a schematic configuration diagram of a reaction tank to which the present invention is applied.

【符号の説明】[Explanation of symbols]

1a、1b…分注用ノズル、2…試薬容器、3…試薬格
納部、4…検体容器、5…検体格納部、6…反応ディス
ク、7…反応容器、8…反応ディスク駆動部、9…反応
槽、10…圧電素子、11…洗浄機構、12…ノズル洗
浄槽、13…洗浄水、14…給水用バルブ、15…排水
用バルブ、16…圧電素子駆動回路、17…音波、18
…対流、19…反応槽水、20…洗浄液、21…制御
部。
1a, 1b: dispensing nozzle, 2: reagent container, 3: reagent storage unit, 4 ... sample container, 5: sample storage unit, 6: reaction disk, 7: reaction container, 8: reaction disk drive unit, 9 ... Reaction tank, 10: piezoelectric element, 11: cleaning mechanism, 12: nozzle cleaning tank, 13: cleaning water, 14: water supply valve, 15: drain valve, 16: piezoelectric element drive circuit, 17: sound wave, 18
... convection, 19 ... reaction tank water, 20 ... washing liquid, 21 ... control part.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 渋谷 武志 茨城県ひたちなか市大字市毛882番地 株 式会社日立製作所計測器グループ内 (72)発明者 神原 克宏 茨城県ひたちなか市大字市毛882番地 株 式会社日立製作所計測器グループ内 Fターム(参考) 2G058 CB04 CD04 CE08 EA02 EA04 ED03 FB03 FB06 FB07 FB15 GA02  ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Takeshi Shibuya 882-mo, Ichiki-shi, Hitachinaka-shi, Ibaraki Prefecture Within the measuring instruments group of Hitachi, Ltd. F term in the Hitachi Measuring Instruments Group (reference) 2G058 CB04 CD04 CE08 EA02 EA04 ED03 FB03 FB06 FB07 FB15 GA02

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 試薬や分析対象である検体を分注する分
注用ノズルと、それらの混合液である反応液を収容する
反応容器とを繰り返し使用するために洗浄する洗浄手段
を具備し、反応液の吸光度を測定することで成分分析を
行う自動分析装置において、前記洗浄手段は液体に音波
を照射することで発生する対流を用いた洗浄手段とする
ことを特徴とする自動分析装置。
1. A washing means for washing a dispensing nozzle for dispensing a reagent or a sample to be analyzed and a reaction container containing a reaction solution which is a mixed solution thereof for repeated use, An automatic analyzer in which component analysis is performed by measuring the absorbance of a reaction solution, wherein the washing means is a washing means using convection generated by irradiating a liquid with a sound wave.
【請求項2】 請求項1記載の自動分析装置において、
前記分注用ノズルの洗浄を行うノズル洗浄槽に、洗浄水
を溜めることが可能な滞留部と音波発生手段を設け、滞
留部内の洗浄水に音波発生手段で音波を照射し、対流を
発生させた洗浄水に分注用ノズルを浸すことで洗浄を行
う洗浄手段を備えたことを特徴とする自動分析装置。
2. The automatic analyzer according to claim 1, wherein
A nozzle cleaning tank for cleaning the dispensing nozzle is provided with a stagnant portion and a sound wave generation unit capable of storing cleaning water, and the cleaning water in the stagnation unit is irradiated with sound waves by the sound wave generation unit to generate convection. An automatic analyzer comprising a washing means for washing by immersing a dispensing nozzle in washed water.
【請求項3】 請求項1記載の自動分析装置において、
試薬及び検体の分注された前記反応容器は、反応槽に浸
された反応容器を滞留部とし、反応槽に設けた音波発生
手段から反応容器内に分注された洗浄液に音波を照射
し、洗浄液に対流を起こさせることで反応容器内の洗浄
を行う洗浄手段を備えたことを特徴とする自動分析装
置。
3. The automatic analyzer according to claim 1, wherein
The reaction vessel into which the reagent and the sample have been dispensed, the reaction vessel immersed in the reaction vessel as a stagnant portion, and irradiates the washing solution dispensed into the reaction vessel from the sound wave generation means provided in the reaction vessel with sound waves, An automatic analyzer comprising a washing means for washing a reaction vessel by causing convection in a washing solution.
JP2000164732A 2000-05-30 2000-05-30 Automatic analyzer Pending JP2001337095A (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1895309A1 (en) 2006-08-31 2008-03-05 Hitachi High-Technologies Corporation Automatic analyzer
JP2008249435A (en) * 2007-03-29 2008-10-16 Olympus Corp Analyzer
JP2009121873A (en) * 2007-11-13 2009-06-04 Hitachi High-Technologies Corp Automatic analyzer
CN114236129A (en) * 2021-12-20 2022-03-25 江苏集萃纳米应用技术研究所有限公司 In-vitro immunodiagnosis reagent background luminescence processing system

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1895309A1 (en) 2006-08-31 2008-03-05 Hitachi High-Technologies Corporation Automatic analyzer
JP2008249435A (en) * 2007-03-29 2008-10-16 Olympus Corp Analyzer
JP2009121873A (en) * 2007-11-13 2009-06-04 Hitachi High-Technologies Corp Automatic analyzer
CN114236129A (en) * 2021-12-20 2022-03-25 江苏集萃纳米应用技术研究所有限公司 In-vitro immunodiagnosis reagent background luminescence processing system
CN114236129B (en) * 2021-12-20 2022-09-23 江苏集萃中科纳米科技有限公司 In-vitro immunodiagnosis reagent background luminescence processing system

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