JP2001332473A5 - - Google Patents
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- Publication number
- JP2001332473A5 JP2001332473A5 JP2000151356A JP2000151356A JP2001332473A5 JP 2001332473 A5 JP2001332473 A5 JP 2001332473A5 JP 2000151356 A JP2000151356 A JP 2000151356A JP 2000151356 A JP2000151356 A JP 2000151356A JP 2001332473 A5 JP2001332473 A5 JP 2001332473A5
- Authority
- JP
- Japan
- Prior art keywords
- charged particle
- particle beam
- electron optical
- optical system
- beam exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000151356A JP2001332473A (ja) | 2000-05-23 | 2000-05-23 | 荷電粒子線露光装置及び該装置を用いたデバイス製造方法 |
US09/808,175 US6566664B2 (en) | 2000-03-17 | 2001-03-15 | Charged-particle beam exposure apparatus and device manufacturing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000151356A JP2001332473A (ja) | 2000-05-23 | 2000-05-23 | 荷電粒子線露光装置及び該装置を用いたデバイス製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2001332473A JP2001332473A (ja) | 2001-11-30 |
JP2001332473A5 true JP2001332473A5 (fr) | 2005-08-04 |
Family
ID=18656925
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000151356A Pending JP2001332473A (ja) | 2000-03-17 | 2000-05-23 | 荷電粒子線露光装置及び該装置を用いたデバイス製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2001332473A (fr) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6768125B2 (en) * | 2002-01-17 | 2004-07-27 | Ims Nanofabrication, Gmbh | Maskless particle-beam system for exposing a pattern on a substrate |
JP3803105B2 (ja) * | 2004-09-07 | 2006-08-02 | 株式会社日立ハイテクノロジーズ | 電子ビーム応用装置 |
JP4657740B2 (ja) * | 2005-01-26 | 2011-03-23 | キヤノン株式会社 | 荷電粒子線光学系用収差測定装置、該収差測定装置を具備する荷電粒子線露光装置及び該装置を用いたデバイス製造方法 |
JP5506560B2 (ja) * | 2010-06-18 | 2014-05-28 | キヤノン株式会社 | 描画装置及びデバイス製造方法 |
JP5836646B2 (ja) * | 2011-05-31 | 2015-12-24 | キヤノン株式会社 | 描画装置、および、物品の製造方法 |
US11302511B2 (en) * | 2016-02-04 | 2022-04-12 | Kla Corporation | Field curvature correction for multi-beam inspection systems |
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2000
- 2000-05-23 JP JP2000151356A patent/JP2001332473A/ja active Pending
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