JP2000243337A5 - - Google Patents
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- Publication number
- JP2000243337A5 JP2000243337A5 JP1999041510A JP4151099A JP2000243337A5 JP 2000243337 A5 JP2000243337 A5 JP 2000243337A5 JP 1999041510 A JP1999041510 A JP 1999041510A JP 4151099 A JP4151099 A JP 4151099A JP 2000243337 A5 JP2000243337 A5 JP 2000243337A5
- Authority
- JP
- Japan
- Prior art keywords
- electron optics
- charged particle
- particle beam
- exposure apparatus
- beam exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002245 particle Substances 0.000 description 26
- 230000003287 optical Effects 0.000 description 8
- 230000004075 alteration Effects 0.000 description 4
- 230000000903 blocking Effects 0.000 description 3
- 230000000875 corresponding Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000005286 illumination Methods 0.000 description 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP04151099A JP4143204B2 (ja) | 1999-02-19 | 1999-02-19 | 荷電粒子線露光装置及び該装置を用いたデバイス製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP04151099A JP4143204B2 (ja) | 1999-02-19 | 1999-02-19 | 荷電粒子線露光装置及び該装置を用いたデバイス製造方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2000243337A JP2000243337A (ja) | 2000-09-08 |
JP2000243337A5 true JP2000243337A5 (fr) | 2007-03-01 |
JP4143204B2 JP4143204B2 (ja) | 2008-09-03 |
Family
ID=12610380
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP04151099A Expired - Fee Related JP4143204B2 (ja) | 1999-02-19 | 1999-02-19 | 荷電粒子線露光装置及び該装置を用いたデバイス製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4143204B2 (fr) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4017935B2 (ja) | 2002-07-30 | 2007-12-05 | 株式会社日立ハイテクノロジーズ | マルチビーム型電子線描画方法及び装置 |
JP3803105B2 (ja) * | 2004-09-07 | 2006-08-02 | 株式会社日立ハイテクノロジーズ | 電子ビーム応用装置 |
JP2008066359A (ja) * | 2006-09-05 | 2008-03-21 | Canon Inc | 荷電ビームレンズアレイ、露光装置及びデバイス製造方法 |
JP2010061936A (ja) * | 2008-09-03 | 2010-03-18 | Hitachi High-Technologies Corp | 荷電粒子ビーム用軌道補正器、および荷電粒子ビーム用軌道補正器の製作方法 |
-
1999
- 1999-02-19 JP JP04151099A patent/JP4143204B2/ja not_active Expired - Fee Related
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