JP2001329385A - Method for producing etched article and device therefor - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a device for producing an etched article in which the uneveness of stripes is hard to occur. SOLUTION: Both sides of a continuously running metallic sheet 1 are coated with photosensitive resin by a photosensitive resin coating device, a shadow mask pattern is baked and exposed to both sides of the metallic sheet 1 coated with the photosensitive resin. The baked and exposed photosensitive resin is developed and is dried by a developing device, and the lower face of the developed metallic sheet 1 is subjected to etching by an etching device. While a coating roller is rotated in the direction opposite to the running direction of the metallic sheet 1, an etching resisting protective film is reciprocated in the vertical direction to the running direction, and the face already subjected to the etching in the etched metallic sheet is coated with the etching resisting protective film.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for producing an etched product using etching.

[0002]

2. Description of the Related Art Heretofore, there has been a shadow mask as an etching product of this kind. A method of manufacturing the shadow mask is to apply a photosensitive resin to both sides of a continuously running metal plate and apply the photosensitive resin. Exposure is performed by printing a shadow mask pattern on both sides of the metal plate. Thereafter, the exposed and exposed photosensitive resin is developed, dried and heated, and one of the surfaces of the metal plate is etched. Apply with a moving roll coater. Further, a shadow mask is formed by etching the other surface of the metal plate, which is not etched and is not coated with the etching-resistant protective film.

[0003]

Further, it is necessary to change the material width of the metal plate depending on the size of the shadow mask.

On the other hand, since the length of the roll coater is constant, if the material width of the metal plate is changed and the anti-etching protection film is applied by this roll coater, the trace of the material width of the previously applied metal plate is shown by the roll coater. When a metal plate with a wide material width is used, a deviation in the film thickness of the etching-resistant protective film occurs at a position corresponding to an end in the width direction of the metal plate with a narrow material width. There is a problem that the hole diameter at the position of the deviation of the film thickness of the etching protection film may change, thereby causing the stripes to be uneven in the shadow mask.

SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and has as its object to provide a method and an apparatus for manufacturing an etched product in which streaking is unlikely to occur.

[0006]

According to the present invention, there is provided an etching-resistant protective film coating step of applying an etching-resistant protective film to one surface of a continuously running metal plate while moving the film in a direction perpendicular to the running direction. A photosensitive resin coating step of coating a photosensitive resin on at least the other surface of the metal plate coated with the etching resistant protective film, and an exposure step of printing and exposing a pattern on the other surface of the metal plate coated with the photosensitive resin. A developing step of developing and drying the printed and exposed photosensitive resin, and an etching step of etching the developed metal plate. In order to apply an anti-etching protection film perpendicular to the running direction of the metal plate, even if metal plates with different material widths are used, the metal sheet after the previous metal plate will be protected from etching. Since it arrive is eliminated, there is no thickness unevenness of the etching resistant protective film due to the material width of the previous metal plate, banding does not occur in the etching thereof.

Further, the present invention provides a photosensitive resin coating step of coating a photosensitive resin on both sides of a continuously running metal plate, and an exposure step of printing and exposing a pattern on both sides of the metal plate coated with the photosensitive resin. And a developing step of developing and drying the printed and exposed photosensitive resin, and an etching step of etching any one surface of the developed metal plate,
A step of applying an etching-resistant protective film to one of the surfaces of the etched metal plate while moving the film in a direction perpendicular to the traveling direction. Since the etching-resistant protective film is applied to the running metal plate perpendicularly to the running direction of the metal plate, even if a metal plate of a different material width is used, the metal plate after the previous metal plate has the etching-resistant protection. Since the film does not reach the film, the thickness of the etching-resistant protective film due to the previous material width of the metal plate does not become uneven, and no unevenness occurs in the etched product.

Further, the step of applying an etching-resistant protective film includes:
The coating is performed by reciprocating in a direction perpendicular to the running direction of the metal plate, and the etching-resistant protective film is uniformly applied without causing unevenness in the running direction of the metal plate.

Further, in the etching-resistant protective film applying step, the etching-resistant protective film is applied by a roll coater having a roll, and since the position where the end of the roll hits the end of the width of the metal plate is not constant, the metal is not fixed. An etching-resistant protective film is applied uniformly without causing line unevenness in the running direction of the plate.

[0010] Further, the pattern is a shadow mask pattern, which is a shadow mask free from stripes.

[0011]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the apparatus for manufacturing an etched product according to the present invention will be described below with reference to the drawings.

As shown in FIG. 1, reference numeral 1 denotes a long strip-shaped metal plate, and the metal plate 1 runs continuously.

On the upstream side (not shown) of the metal plate 1, a photosensitive resin coating device as a photosensitive resin coating means for coating a photosensitive resin serving as a resist on both surfaces of the metal plate 1, a shadow mask pattern An exposure device as exposure means for printing and exposing both surfaces of the metal plate coated with the photosensitive resin, and a developing device as developing means for developing and drying the printed and exposed photosensitive resin are sequentially provided. I have.

As shown in FIG. 1, there is provided a protective film sticking device 2 for sticking a protective film for preventing any one surface, for example, the upper surface of the metal plate 1 on which the photosensitive resin has been developed, from being etched. ing.

An etching chamber 3 as an etching means for etching the other surface, for example, the lower surface, on which the protective film is not adhered, with an etching solution, is provided downstream of the protective film attaching device 2.

Further, on the downstream side of the etching chamber 3, a washing chamber 4 for washing the etching solution of the metal plate 1 etched in the etching chamber 3 with water, a resist peeling for peeling the resist on the lower surface of the etched metal plate 1 A chamber 5, and a stripping and rinsing chamber 6 for washing the resist stripped in the resist stripping chamber 5 with water;
Are sequentially arranged.

Further, a drying furnace 7 for washing and drying the resist after drying is provided on the downstream side of the peeling and rinsing chamber 6, and a protective film attached by the protective film attaching apparatus 2 is provided downstream of the drying furnace 7. A protective film peeling device 8 for peeling off is provided.

Further, a roll coater 9 as an etching-resistant protective film forming means for forming an etching-resistant coating film on the etched lower surface of the metal plate 1 is provided downstream of the protective film peeling device 8. Downstream of the coater 9, a protective film drying furnace 10 for drying the etching resistant coating film applied by the roll coater 9 is provided.

Further, downstream of the protective film drying furnace 10, an etching chamber for etching an unetched upper surface of the metal plate 1 with an etchant, a rinsing chamber for rinsing the etchant with water, an upper surface of the etched metal plate A resist stripping chamber for stripping the resist, and a stripping washing chamber for washing the resist stripped in the resist stripping chamber with water.

As shown in FIG. 2, the roll coater 9 includes a reversing roller 11 for reversing the front and back of the metal plate 1 and two receiving rollers 12 for pressing the unetched upper surface of the metal plate 1 from above. , 12, reciprocating in the direction perpendicular to the running direction to the lower surface where etching has already been completed and is located between the receiving rollers 12, 12, and rotates in opposition to the running direction of the metal plate 1 to protect against etching. A coating roller 13 coated with a film and having a rotation axis in a direction perpendicular to the running direction of the metal plate 1, an etching-resistant protective liquid in which the lower side of the coating roller 13 is immersed, and a direction change for changing the direction of the metal plate 1 It has a roller 15.

Next, the operation of the above embodiment will be described.

First, a photosensitive resin application step of applying a photosensitive resin to both surfaces of the metal plate 1 using a photosensitive resin application device (not shown) is performed, and a shadow mask pattern coated with the photosensitive resin in the photosensitive resin application step is formed. Both surfaces of the metal plate coated with the photosensitive resin are exposed and baked by an exposure device in an exposure step, exposed in this exposure step, and the photosensitive resin baked and exposed in the exposure step is developed in a development step by a developing device. dry.

Next, a protective film is attached to the upper surface of the metal plate 1 on which the shadow mask pattern is formed by a protective film attaching device, and only the lower surface where the protective film is not attached is etched with an etching solution by the etching chamber 3. .

Then, the etching solution is washed in the washing chamber 4, the resist on the surface etched in the resist stripping chamber 5 is stripped, the resist stripped in the stripping chamber 5 is washed with water, and dried in the drying furnace 7. The protective film is peeled off by the protective film peeling device 8.

The metal film 1 from which the protective film has been peeled off
The coating roller 13 is rotated in the running direction of the metal plate 1 while the metal plate 1 is pressed from the upper surface by the receiving rollers 12 and 12 while the coating roller 13 rotates in the running direction of the metal plate 1. On the other hand, the etching-resistant protective film is uniformly transferred and applied to the lower surface of the metal plate 1 which has been etched by reciprocating vertically, and the etching-resistant protective film is dried in the protective film drying furnace 10.

Thereafter, the unetched upper surface of the metal plate 1 is etched with an etching solution in an etching chamber, and the etching solution is washed with a washing chamber.
The resist on the upper surface of the metal plate etched in the resist stripping chamber is stripped, and the resist stripped in the resist stripping chamber is washed with water in a stripping and washing chamber to form a shadow mask as an etching product.

The amplitude of the reciprocating motion of the coating roller 13 is preferably 50 mm to 100 mm, and the cycle of the amplitude is desirably 1 to 3 minutes per reciprocation. 800mm width
According to an experiment in which a shadow mask is manufactured by alternately changing the metal plate 1 with the metal plate 1, it is possible to obtain a shadow mask having no unevenness as compared with the conventional method. As an experiment, a metal plate 1 having a width of 800 mm was produced by stopping the reciprocating movement of the metal plate 1 of the coating roller 13 in the vertical direction for about one month, and then producing a metal plate 1 having a width of 800 mm.
And the thickness of the etching-resistant protective film in the width direction of the metal plate 1 was measured. On the other hand, as one corresponding to the present embodiment, a metal plate 1 having a width of 600 mm is produced for about one month in a state where the coating roller 13 is reciprocated perpendicularly to the running direction of the metal plate 1, and then the width is 800 mm. Metal plate 1
And the thickness of the etching-resistant protective film in the width direction of the metal plate 1 was measured.

The results of these experiments are shown in FIG.
The width corresponding to the conventional example is 600m initially produced.
100 mm, which is the position corresponding to the end of the metal plate 1
The thickness of the etching-resistant protective mask at the position of 00 mm is thinner than the other positions. When the other surface of the metal plate 1 is etched in this state, a portion where the thickness of the etching-resistant protective film is thin becomes a streak. Although unevenness is caused when a shadow mask is formed, in this embodiment, since the thickness of the etching-resistant protective film is constant, no unevenness occurs, and a shadow mask having no unevenness is obtained. .

In the conventional method, the positional relationship between the ends of the metal plate 1 that is in contact with the coating roller 13 is always the same, and the cause is that the coating roller 13 is worn by the end of the metal plate 1. For this reason, the coating roller 13 is reciprocated in a direction perpendicular to the traveling direction of the metal plate 1 to relatively shift the positional relationship where the end of the metal plate 1 contacts the coating roller 13, and the end of the metal plate 1 is moved. Is prevented from being fixed at a fixed position of the coating roller 13 to prevent the end of the metal plate 1 from reaching the coating roller 13.

[0030]

According to the present invention, since an etching-resistant protective film is applied to a metal plate which continuously travels in a step of applying an etching-resistant protective film while moving the metal plate perpendicularly to the running direction of the metal plate, different material widths are used. Even if a metal plate is used, the material width of the previous metal plate will not reach the etching protection film of the metal plate, so that the unevenness of the thickness of the etching protection film due to the material width of the previous metal plate will be reduced. And prevents unevenness in the etched product.

[Brief description of the drawings]

FIG. 1 is a block diagram showing an apparatus for manufacturing a shadow mask according to an embodiment of the present invention.

FIG. 2 is a block diagram showing the same roll coater.

FIG. 3 is a graph showing a relationship between an etching-resistant protective film thickness and a width direction of a metal plate according to the first embodiment.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 Metal plate 3 Etching chamber as an etching means 9 Roll coater as an anti-etching protection film coating means

Claims (10)

[Claims] 1. An etching-resistant protective film applying step of applying an etching-resistant protective film to one surface of a continuously running metal plate while moving the metal film perpendicularly to the running direction, and a metal having an etching-resistant protective film applied to one surface thereof. A photosensitive resin application step of applying a photosensitive resin to at least the other side of the plate, an exposure step of printing and exposing a pattern to the other side of the metal plate coated with the photosensitive resin, A method for producing an etched product, comprising: a developing step of developing and drying; and an etching step of etching the developed metal plate. 2. A photosensitive resin application step of applying a photosensitive resin to both sides of a continuously running metal plate; an exposure step of printing and exposing a pattern to both sides of the metal plate to which the photosensitive resin has been applied; A developing step of developing and drying the exposed photosensitive resin; an etching step of etching any one surface of the developed metal plate; and an etching-resistant protective film on any one surface of the etched metal plate in a running direction. A process for applying an etching-resistant protective film, which is applied while moving in a vertical direction with respect to the etching product. 3. The method for producing an etched product according to claim 1, wherein in the step of applying an etching-resistant protective film, the application is performed by reciprocating perpendicularly to a running direction of the metal plate. 4. The method for producing an etched product according to claim 1, wherein in the step of applying an etching-resistant protective film, the etching-resistant protective film is applied by a roll coater. 5. The method according to claim 1, wherein the pattern is a shadow mask pattern. 6. An anti-etching protection film applying means for applying an anti-etching protection film to a continuously running metal plate while moving the anti-etching protection film in a direction perpendicular to the running direction, a photosensitive resin applying means for applying a photosensitive resin, Exposure means for printing and exposing a pattern on the metal plate coated with the photosensitive resin, developing means for developing and drying the printed and exposed photosensitive resin, and etching means for etching the developed metal plate A manufacturing apparatus for an etched product. 7. A photosensitive resin coating means for applying a photosensitive resin to both sides of a continuously running metal plate, an exposure means for printing and exposing a pattern to both sides of the metal plate coated with the photosensitive resin, Developing means for developing and drying the exposed photosensitive resin; etching means for etching any one surface of the developed metal plate; and an etching-resistant protective film on any one surface of the etched metal plate in a running direction. An etching-resistant protective film applying means for applying while moving in a vertical direction with respect to the etching product. 8. The apparatus according to claim 6, wherein the etching-resistant protective film applying means applies the material by reciprocating relative to the running direction of the metal plate. 9. The apparatus according to claim 6, wherein the etching-resistant protective film applying means has a roll coater for applying the etching-resistant protective film. 10. The apparatus according to claim 6, wherein the pattern is a shadow mask pattern.