JP2001301109A - Barrier film - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a barrier film excellent not only in gas barrier properties against oxygen gas and steam but also in transparency, flexibility or the like. SOLUTION: The barrier film is constituted by providing a membrane comprising an inorganic oxide on one surface of a base material film and further providing a transparent coating film, which comprises a resin composition containing a thermosetting epoxy resin and curing agent on the membrane.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a barrier film, and more particularly to a barrier film having excellent barrier properties against oxygen gas and water vapor, and further having excellent transparency and flexibility.

[0002]

2. Description of the Related Art Conventionally, various packing materials have been developed and proposed for filling and packaging various articles such as food and drink, pharmaceuticals, chemicals, daily necessities, miscellaneous goods, and the like.
In order to prevent the contents from deteriorating or the like, the above-mentioned packaging material is strongly required to have mainly a barrier property against oxygen gas or water vapor gas, that is, a so-called gas barrier property. By the way, as a material having a barrier property against oxygen gas or water vapor gas, for example, aluminum foil, an aluminum vapor-deposited resin film obtained by vacuum-depositing aluminum on a plastic film by a vacuum vapor deposition method or the like, and a polyvinyl alcohol ( PVA), ethylene-vinyl alcohol copolymer (EVOH), polyacrylonitrile (PAN), polyvinylidene chloride (P
VDC) or a resin film or sheet having a gas barrier property such as a gas barrier laminate formed with a coating film of the resin having a gas barrier property, or a base film such as a plastic film. For example, using a physical vapor deposition method (PVD method) such as a vacuum deposition method, a deposition film provided with a deposition film of an inorganic oxide such as silicon oxide or aluminum oxide, or a low-temperature plasma chemical vapor deposition method For example, a vapor-deposited film provided with a vapor-deposited film of an inorganic oxide such as silicon oxide using a chemical vapor deposition method (CVD method) is known. These barrier materials are laminated with other plastic films or materials such as paper base materials, etc., for example, and filled and packed with various articles such as food and drink, pharmaceuticals, chemicals, daily necessities, miscellaneous goods, etc. To provide useful packaging materials.

[0003]

However, the above-mentioned barrier materials have oxygen gas barrier properties, water vapor gas barrier properties, etc., and can be expected to have a certain effect. The fact is that it is not satisfactory enough. For example, the above-mentioned aluminum foil is a gas barrier material having an excellent gas barrier property against oxygen gas, water vapor gas, and the like.
In addition to the problem of disposal after use, there is also the problem that the contents cannot be visually recognized from the outside in the packaged product filled with the contents because it is basically an opaque material. There is. Next, as for the aluminum-deposited resin film obtained by vacuum-depositing aluminum on the plastic film by a vacuum deposition method or the like, similarly to the aluminum foil described above, the contents are discarded after use, and the contents are visually recognized from the outside. Not only is there a problem that it cannot be obtained, but the gas barrier property is inferior to that of aluminum foil, so that it is not necessarily a satisfactory barrier material.

Further, the above-mentioned polyvinyl alcohol (PV)
A), ethylene-vinyl alcohol copolymer (EVO)
H) and the like, or in a gas barrier laminate having a coating film of a resin having gas barrier properties such as a resin having gas barrier properties or a coating film of the resin having gas barrier properties, is widely used as a resin-based barrier material. However, it shows relatively excellent oxygen gas barrier properties under absolutely dry conditions, but does not have sufficient water vapor gas barrier properties.Moreover, under high humidity conditions, the oxygen gas barrier properties are significantly deteriorated. Therefore, it cannot be said that the barrier material is sufficiently satisfactory under practical conditions. Further, a film or sheet of a resin having a gas barrier property such as the above-mentioned polyacrylonitrile (PAN) or polyvinylidene chloride (PVDC), or a gas barrier laminate formed by coating a coating film of the resin having the gas barrier property In the same manner as above, it is widely used as a resin-based barrier material, but in the incineration treatment after use, in particular, there is a problem of generating toxic gas due to incomplete oxidation, which is preferable in terms of environmental protection. Further, since it is a resin-based material, the gas barrier property is not always sufficient, and it cannot be used for filling and packaging contents that require a high degree of gas barrier property.

Next, on one surface of the above-mentioned base film such as a plastic film, an inorganic material such as silicon oxide, aluminum oxide or the like is formed by a physical vapor deposition method (PVD method) such as a vacuum evaporation method. For the deposited film provided with an oxide deposited film, the gas barrier property against oxygen gas, water vapor gas, etc. is remarkably improved, and since the deposited film of the inorganic oxide is transparent, the filled and packaged contents can be used. This has the advantage of being visible from the outside. However, whether or not the effect of the gas barrier property of oxygen gas or the like can be remarkably improved depends largely on whether or not the base film has heat resistance. For example, as a substrate film, polyethylene terephthalate
In the case of using a heat-resistant base film such as a film, it is possible to form a vapor-deposited film by a vacuum vapor-deposition method or the like to remarkably improve the gas barrier effect of oxygen gas or the like. However, when a base film having poor heat resistance such as a biaxially oriented polypropylene film, a non-oriented polypropylene film, or a low-density polyethylene film is used, forming a vapor-deposited film by a vacuum vapor-deposition method or the like is a technical problem. Although it is possible, it is extremely difficult to significantly improve the effect of the gas barrier property of oxygen gas or the like, and thus it cannot be said that the gas barrier property is always sufficiently satisfactory.

Furthermore, an inorganic material such as silicon oxide or aluminum oxide is formed on one surface of the base film such as the plastic film by using a vapor phase growth method (CVD method) such as a low-temperature plasma chemical vapor deposition method. With respect to a vapor-deposited film provided with a vapor-deposited oxide film, there is little thermal damage to the base film during the formation of the vapor-deposited film, and an inorganic oxide vapor-deposited film can be formed on various plastic films. , Which has been receiving much attention in recent years. For example, there has been proposed a method of forming a silicon oxide vapor-deposited film on a polyolefin resin molded article having poor heat resistance by using a plasma chemical vapor deposition method (see Japanese Patent Application Laid-Open No. 5-287103). However, in the above method, especially when vapor-deposited on a biaxially stretched polypropylene film or the like, after laminating the sealant film, the oxygen gas barrier property is 10 cc / m ² · da.
In fact, it is not less than y · atm, and it cannot be said that a sufficiently satisfactory oxygen gas barrier property can always be achieved. Further, in the above, in order to improve the oxygen gas barrier property, the thickness of the inorganic oxide vapor-deposited film must be formed to 1000 ° or more, and in such a case, the polyolefin having poor heat resistance. There is a problem that it is necessary to solve the problem of strength deterioration due to the plasma reaction of the base resin film. Further, when the thickness of the deposited film of the inorganic oxide is increased, the deposited film itself exhibits a yellow tint, and when used as a packaging material for filling and packaging foods and drinks, there is a problem that the commercial product is affected. Not only are there any problems, but there is a problem that post-processing suitability is poor, there is no resistance to bending or impact, cracks occur in the deposited film due to physical or thermal influences, and the inherent gas barrier properties deteriorate. Then, in order to improve the oxygen gas barrier property, for example, Japanese Patent Application Laid-Open No. 7-285
191 and JP-A-6-316025, etc.
Although a technique of laminating a film such as an ethylene-vinyl alcohol copolymer or polyvinyl alcohol on a vapor-deposited film is disclosed, the adhesion between the vapor-deposited film and the resin film is insufficient, and the high humidity There is a problem that the lower oxygen barrier property is insufficient. Further, for example, Japanese Patent Application Laid-Open No. 10-292
No. 63, etc., a method of improving the barrier property by a combination of a vapor-deposited film and a sol-gel-based ceramic layer has also been proposed. Deterioration is undeniable. Accordingly, an object of the present invention is to provide a barrier film having excellent gas barrier properties against oxygen gas and water vapor, and further having excellent transparency, flexibility and the like.

[0007]

As a result of various studies to solve the above-mentioned problems, the present inventor focused on thermosetting epoxy resins, and firstly developed a base such as a transparent plastic film having heat resistance. On one surface of the material film, one or two or more multilayer films of inorganic oxide thin films are provided by physical vapor deposition, chemical vapor deposition, in particular, plasma enhanced chemical vapor deposition. A transparent core made of a resin composition containing a thermosetting epoxy resin and a curing agent is formed on a thin film of an inorganic oxide.
A barrier film is manufactured by providing a coating film, and a laminated material is manufactured by arbitrarily laminating a material such as another plastic film or a paper base material or the like on the barrier film. Thereafter, using the laminated material, to produce a packaging container by bag making or box making, in the packaging container, for example, food and drink, pharmaceuticals, chemicals, daily necessities,
Various products such as miscellaneous goods and other products are filled and packaged to produce a packaged product.The product has excellent gas barrier properties against oxygen gas and water vapor, and prevents the contents from deteriorating and reforming. It has distribution, storage suitability, etc., and is excellent in transparency, so that the contents can be visually recognized from the outside, and further, it has excellent flexibility, laminate strength, etc. The present invention has been completed by finding that a useful barrier film capable of producing an excellent good packaging product at low cost can be produced.

That is, according to the present invention, a thin film of an inorganic oxide is provided on one surface of a base film, and a resin composition containing a thermosetting epoxy resin and a curing agent is further provided on the thin film of the inorganic oxide. The present invention relates to a barrier film provided with a transparent coating film made of a material.

[0009]

BEST MODE FOR CARRYING OUT THE INVENTION The above-mentioned present invention will be described below in more detail with reference to the drawings and the like. The layer structure of the barrier film according to the present invention will be described more specifically with reference to the drawings. FIG. 1, FIG. 2, FIG. 3, and FIG.
FIG. 5 is a schematic cross-sectional view illustrating a few examples of the layer structure of the barrier film according to the present invention, and FIG. 5 illustrates an example of the layer structure of a laminate using the barrier film according to the present invention. It is a schematic sectional drawing.

First, the barrier film 1 according to the present invention
As shown in FIG. 1, on one surface of the base film 2,
A thin film 3 of an inorganic oxide is provided, and a transparent coating film 4 of a resin composition containing a thermosetting epoxy resin and a curing agent is further provided on the thin film 3 of the inorganic oxide. It has a basic structure. Thus, specific examples of the barrier film according to the present invention are as follows:
As shown in FIG. 2, on one surface of the base film 2, one layer of the inorganic oxide vapor-deposited thin film 3a formed by physical vapor deposition or a multilayer film (not shown) of two or more layers is provided. Further, a barrier film 1a having a configuration in which a transparent coating film 4 made of a resin composition containing a thermosetting epoxy resin and a curing agent is provided on the vapor-deposited thin film 3a of the inorganic oxide. . As another example of the barrier film according to the present invention, as shown in FIG. 3, one surface of a base material film 2 is coated with one of the inorganic oxide vapor-deposited thin films 3b by chemical vapor deposition. Layer or a multilayer film (not shown) of two or more layers, and a transparent core made of a resin composition containing a thermosetting epoxy resin and a curing agent on the inorganic oxide deposited thin film 3b. And a barrier film 1b having a configuration in which the thin film 4 is provided. Further, regarding the barrier film according to the present invention,
To exemplify another example, as shown in FIG. 4, a vapor-deposited thin film 3a of an inorganic oxide by physical vapor deposition and a vapor-deposited thin film of an inorganic oxide by chemical vapor deposition on one surface of a base film 2. 3b, a multilayer film 3c comprising two or more layers, and a transparent coating of a resin composition containing a thermosetting epoxy resin and a curing agent on the inorganic oxide deposited thin film 3b constituting the multilayer film 3c. A barrier film 1c having a configuration in which the film 4 is provided can be given. The above examples illustrate only a few examples of the barrier film according to the present invention, and it is needless to say that the present invention is not limited thereto. Although the barrier film according to the present invention is not shown, for example, in the barrier film shown in FIG. 4, an inorganic oxide vapor-deposited thin film is first provided by a chemical vapor deposition method, Either a vapor-deposited thin film of inorganic oxide is provided by a phase growth method to form a multilayer film, or a vapor-deposited thin film of an inorganic oxide is first provided by a physical vapor deposition method, and then an inorganic thin film is formed by a chemical vapor deposition method. A multilayer film may be formed by providing a vapor deposited thin film of an oxide.

Next, an example of a laminated material using the barrier film according to the present invention will be exemplified. As shown in FIG. 5, the case where the barrier film 1 shown in FIG. 1 is used will be described. On the surface of the coating film 4 constituting the barrier film 1 shown in FIG. 1 described above, if necessary, for example, a printed picture layer 5 is provided, and at least a heat-sealing resin layer 6 is further provided. The laminated material A having the provided configuration can be given. In addition, in FIG.
Symbols such as 3 have the same meaning as described above. The above example is
This is an example of the laminated material according to the present invention, and the present invention is not limited thereto.

Next, in the present invention, the materials, materials, manufacturing methods and the like constituting the barrier film and the laminate according to the present invention will be described. First, the barrier film and the laminate according to the present invention will be described. As the base film to be used, films or sheets of various resins having transparency and excellent in heat resistance, toughness and the like can be used. Specifically, for example, polyethylene, ethylene-α-olefin copolymer, polyolefin resin such as polypropylene, acid-modified polyolefin resin obtained by modifying the polyolefin resin with an unsaturated ethylenic carboxylic acid, polyethylene terephthalate Polyester resin such as polyethylene naphthalate, nylon 6, nylon 66, MX
Polyamide resin such as D nylon 6, polyimide resin, polyarylate resin, polyethersulfone resin, polycarbonate resin, polystyrene resin, polyvinyl alcohol, ethylene-vinyl acetate copolymer Various resins such as polyvinyl alcohol-based resin such as saponified part, polyacrylonitrile-based resin, polyvinyl chloride-based resin, polyvinyl acetal-based resin, polyvinyl butyral-based resin, fluorine-based resin and others Film or sheet
Can be used. Thus, in the present invention,
As the resin film or sheet, for example,
Using one or more of the above resins, inflation
A method of forming the above resin alone using a film forming method such as an application method, a T-die method, or the like, or a method of forming a multilayer co-extrusion film using two or more different resins. Further, a resin film or sheet is produced by a method of using two or more kinds of resins and mixing them before forming a film to form a film, and further, for example, a tenter method, or Various resin films or sheets stretched uniaxially or biaxially using a tuber method or the like can be used. In the present invention, the thickness of the substrate film is about 5 to 100 μm, more preferably,
About 10 to 50 μm is desirable. In the above, when forming a resin into a film, for example, the processability, heat resistance, weather resistance, mechanical properties, dimensional stability, antioxidant properties, slip properties, mold release properties, flame retardancy, anti-mold For the purpose of improving and modifying properties, electrical properties, etc., various plastic compounding agents and additives can be added.
From a very small amount to several tens%, it can be arbitrarily added according to the purpose. In the above, as a general additive, for example, a lubricant, a crosslinking agent, an antioxidant, an ultraviolet absorber, a filler, a reinforcing agent, a reinforcing agent, an antistatic agent, a flame retardant, a flame retardant, a foaming agent, A fungicide, a pigment, and the like can be used, and further, a modifying resin and the like can be used.

In the present invention, the base film is
If necessary, for example, corona discharge treatment, ozone treatment,
Pretreatment such as low-temperature plasma treatment using oxygen gas, nitrogen gas, or the like, glow discharge treatment, oxidation treatment using chemicals, or the like, and the like can be arbitrarily performed. The surface pretreatment may be performed in a separate step before forming the inorganic oxide thin film. For example, in the case of a surface treatment such as a low-temperature plasma treatment or a glow discharge treatment, the inorganic oxide As a pre-process for forming a thin film of the object, it can be performed in a pre-process by an in-line process.
There is an advantage that the manufacturing cost can be reduced. The above surface pretreatment is to be performed as a method for improving the adhesion between the base film and the inorganic oxide thin film, but as a method for improving the adhesion, other, for example, the substrate Primer on the film surface in advance
A coating agent layer, an undercoat agent layer, a vapor-deposited anchor coating agent layer, or the like can be arbitrarily formed. As the coating agent layer for the above pretreatment, for example, a resin composition containing a polyester-based resin, a polyurethane-based resin, or the like as a main component of the vehicle can be used. Also,
In the above, as a method of forming the coating agent layer, for example,
Using a coating agent such as a solvent type, an aqueous type, or an emulsion type, a coating method such as a roll coating method, a gravure roll coating method, a kiss coating method, or the like is used. The coating can be carried out as a post-process after the biaxial stretching of the base material film or by in-line processing of the biaxial stretching. In the present invention, it is preferable to use a biaxially oriented polypropylene film, a biaxially oriented polyethylene terephthalate film, or a biaxially oriented nylon film as the substrate film.

Next, in the present invention, the inorganic oxide thin film constituting the barrier film, the laminate and the like according to the present invention will be described. The inorganic oxide thin film is basically a metal oxide. Is amorphous
Any thinned film can be used. For example, silicon (S
i), aluminum (Al), magnesium (Mg),
Calcium (Ca), potassium (K), tin (Sn),
Sodium (Na), boron (B), titanium (Ti),
A thin film in which an oxide of a metal such as lead (Pb), zirconium (Zr), or yttrium (Y) is made amorphous can be used. Thus, a thin film obtained by converting the above metal oxide into an amorphous state can be referred to as a metal oxide, such as silicon oxide, aluminum oxide, and magnesium oxide.
SiO _X, AlO _X, MO _X (In the formula, M represents a metal element, the value of X is in the range respectively by the metal element is different.) As such MgO _X represented by. Also,
As the range of the value of X, silicon (Si) is 0 to
2. Aluminum (Al) is 0 to 1.5, magnesium (Mg) is 0 to 1, calcium (Ca) is 0 to
1, potassium (K) is 0-0.5, tin (Sn) is
0-2, sodium (Na) is 0-0.5, boron (B) is 0-1,5, titanium (Ti) is 0-2, lead (Pb) is 0-1, zirconium ( Zr) is from 0 to 2,
Yttrium (Y) can have a value in the range of 0 to 1.5. In the above, when X = 0, it is a perfect metal, it is not transparent and cannot be used at all, and the upper limit of the range of X is a completely oxidized value. In the present invention, silicon (S) is generally used as a packaging material.
i), except for aluminum (Al), few examples are used. Silicon (Si) has a value in the range of 1.0 to 2.0, and aluminum (Al) has a value in the range of 0.5 to 1.5. Can be used.

In the present invention, as the inorganic oxide thin film, one layer of the above-described inorganic oxide thin film,
Alternatively, an inorganic oxide thin film composed of a multilayer film of two or more inorganic oxide thin films is used. In the present invention, a method for forming one or two or more layers of inorganic oxide thin films will be described. Examples of the method include a vacuum deposition method, a sputtering method, and an ion plating method. And other physical vapor deposition methods (Physi
cal Vapor Deposition method, PVD
Method) or a chemical vapor deposition method such as a plasma chemical vapor deposition method, a thermal chemical vapor deposition method, or a photochemical vapor deposition method.
medical Vapor Deposition method, C
VD method). In the present invention, to further explain the film-forming method, for example, using a metal oxide as a raw material as described above, a vacuum vapor deposition method of heating and vaporizing and vapor-depositing on a substrate film, or ,
Oxidation reaction deposition method of using metal or metal oxide as a raw material, introducing oxygen to oxidize and depositing on the base film, and plasma-assisted oxidation reaction deposition method of assisting the oxidation reaction with plasma A vapor-deposited thin film can be formed using the method described above. Further, in the present invention, when forming a deposited film of silicon oxide, a deposited thin film can be formed by a plasma chemical vapor deposition method using organosiloxane as a raw material. In the present invention, the thickness of the inorganic oxide thin film varies depending on the type of metal or metal oxide used, and the like. For example, the thickness of one layer of the inorganic oxide thin film is 50 to 1000Å, preferably 1
It is desirable to arbitrarily select and form the thickness within the range of about 00 to 500 °, and the thickness of the multilayer film of two or more inorganic oxide thin films is about 100 to 4000 °, preferably 120 to 2000 °. The position is the desired one.

In the present invention, a specific example of a method for forming a multilayer film of one or two or more inorganic oxide thin films is shown in FIG. 6. FIG. 6 shows an example of a roll-up type vacuum evaporator. It is a schematic block diagram. As shown in FIG. 6, a base film 113 unwound from an unwinding roll 112 in a vacuum chamber 111 is coated with a coating drum 114.
Through the evaporation chamber-115, where the evaporation source heated in the crucible 116 is evaporated, and, if necessary, the above-mentioned cooled core is discharged while oxygen or the like is ejected from the oxygen outlet 117. A vapor-deposited thin film of an inorganic oxide is formed on the substrate film 113 on the singing drum 114 through masks 118, 118, and then the substrate film 113 on which the vapor-deposited thin film of the inorganic oxide is formed is vacuumed. It is sent into the chamber 111, and further, the take-up roll 119
Thus, the base film 113 having a vapor-deposited thin film of an inorganic oxide can be manufactured. Thus, in the present invention, the above-mentioned film formation is repeated, or, although not shown, the above-mentioned winding type vacuum evaporator is connected in two or more to continuously evaporate. By doing so, an inorganic oxide thin film composed of a multilayer film of two or more layers of an inorganic oxide vapor-deposited thin film can be formed.

Further, in the present invention, the inorganic oxide thin film may be formed, for example, by using a monomer gas for vapor deposition of an organic silicon compound or the like as a raw material on one surface of a base film, and using an argon gas as a carrier gas. Gas, helium gas, or other inert gas is used, and oxygen gas is used as an oxygen supply gas, and oxidation is performed using a low-temperature plasma chemical vapor deposition (CVD) method using a low-temperature plasma generator or the like. It can be manufactured by a method of forming a deposited thin film of an inorganic oxide such as silicon. In the above, as the low-temperature plasma generator, for example, a generator such as a high-frequency plasma, a pulse wave plasma, or a microwave plasma can be used. Thus, in the present invention, a highly active and stable plasma is obtained. For this purpose, it is desirable to use a generator using a high-frequency plasma method. Specifically, an example of a method of forming a vapor-deposited inorganic oxide thin film by the above-mentioned plasma enhanced chemical vapor deposition method will be described. FIG. 1 is a schematic configuration diagram of a plasma enhanced chemical vapor deposition apparatus showing an outline of a method of forming a thin film. As shown in FIG. 7, in the present invention, the plasma enhanced chemical vapor deposition apparatus 21 is used.
Unloading roll arranged in one vacuum chamber-212.
The base film 214 is fed out from the roll 213, and the base film 214 is further conveyed on the peripheral surface of the cooling / electrode drum 216 at a predetermined speed via the auxiliary roll 215. Thus, in the present invention, the gas supply devices 217, 218
Also, an oxygen gas, an inert gas, a monomer gas for vapor deposition such as an organic silicon compound, and the like are supplied from a raw material volatilizing supply device 219 and the like, and a raw material supply nozzle is prepared while adjusting a vapor-deposited mixed gas composition composed of them. The mixed gas composition for vapor deposition is introduced into the vacuum chamber-212 through 220, and the glow-discharge plasma 221 is applied onto the base film 214 transferred onto the cooling / electrode drum 216. Plasma is generated and irradiated with the plasma to form a vapor-deposited thin film of an inorganic oxide such as silicon oxide, thereby forming a film. In the present invention, at this time, the cooling / electrode drum 216 is connected to the power supply 222 disposed outside the chamber.
, And a magnet 223 is disposed in the vicinity of the cooling / electrode drum 216 to promote the generation of plasma. Then, the above-described vapor deposition of an inorganic oxide such as silicon oxide is performed. Base film 2 with thin film formed
Reference numeral 14 denotes a take-up roll 22 via an auxiliary roll 215.
4 to produce a vapor-deposited inorganic oxide thin film by the plasma enhanced chemical vapor deposition method according to the present invention. Thus, in the present invention, the above-described film formation is repeated or, although not shown, the above-described plasma chemical vapor deposition apparatus is connected in two or more to continuously deposit. Thus, an inorganic oxide thin film composed of a multilayer film of two or more layers of an inorganic oxide thin film can be formed. In the figure, 225 is
Represents a vacuum pump. The above exemplification is merely an example, and it goes without saying that the present invention is not limited thereby.

In the above, a monomer for vapor deposition of an organic silicon compound or the like for forming a vapor deposited thin film of an inorganic oxide such as silicon oxide.
As the gas, for example, 1.1.3.3-tetramethyldisiloxane, hexamethyldisiloxane, vinyltrimethylsilane, methyltrimethylsilane, hexamethyldisilane, methylsilane, dimethylsilane, trimethylsilane, diethylsilane, propylsilane, Phenylsilane, vinyltriethoxysilane, vinyltrimethoxysilane, tetramethoxysilane, tetraethoxysilane, phenyltrimethoxysilane, methyltriethoxysilane, octamethylcyclotetrasiloxane, and the like can be used. In the present invention, among the organic silicon compounds as described above, the use of 1.1.3.3-tetramethyldisiloxane or hexamethyldisiloxane as a raw material is advantageous in terms of handleability and formed deposited film. It is a particularly preferable raw material in view of its properties and the like. In the above, for example, an argon gas, a helium gas, or the like can be used as the inert gas.

In the present invention, in the case of the silicon oxide vapor-deposited thin film formed as described above, the silicon oxide vapor-deposited thin film has the formula SiO _x (where X represents a number of 0 to 2). Is a continuous vapor-deposited thin film mainly composed of silicon oxide represented by the formula:
_X (where X represents a number from 1.3 to 1.9) is preferably a thin film mainly composed of a deposited silicon oxide film. In the above, the value of X changes depending on the molar ratio of the monomer gas to the oxygen gas, the energy of the plasma, and the like. In general, as the value of X decreases, the gas permeability decreases, but the value of the film itself increases. It has a yellow color and poor transparency. Further, the above-described deposited silicon oxide thin film has silicon (Si) and oxygen (O) as essential constituent elements, and furthermore, one of carbon (C) and hydrogen (H), or
It is composed of a deposited film of silicon oxide containing both elements as trace constituent elements and has a thickness of 50 to 100
0%, and the composition ratio between the essential constituent elements and the trace constituent elements continuously changes in the film thickness direction. Further, when the silicon oxide vapor-deposited thin film contains a compound made of carbon, the carbon content is reduced in the depth direction of the film thickness. Thus, in the present invention, for the above-mentioned evaporated silicon oxide thin film, for example, an X-ray photoelectron spectrometer (Xray Photoelectron Sp)
, Electroncopy, XPS), Secondary Ion Mass Spectrometer (Secondary Ion Mass Spe
The above physical properties are confirmed by performing elemental analysis of a deposited silicon oxide thin film using a method of performing analysis by ion etching in the depth direction using a surface analysis device such as a chromoscopic (SIMS, SIMS) or the like. Is what you can do. In the present invention, the thickness of the deposited silicon oxide thin film is desirably 1000 ° or less, and specifically, the thickness is 50 to 50 °.
0 degree, more preferably 100-300 degree, and thus, in the above, 300 degree, and even 500 degree
If it is thicker, cracks and the like are likely to occur in the film, which is not preferable.
If it is less than this, it is difficult to achieve the effect of the barrier property, which is not preferable. In the above description, the film thickness can be measured by a fundamental parameter method using, for example, a fluorescent X-ray analyzer (model name: RIX2000) manufactured by Rigaku Corporation. Further, in the above, as a means for changing the thickness of the deposited silicon oxide thin film, increasing the volume velocity of the deposited film,
That is, it can be performed by a method of increasing the amounts of the monomer gas and the oxygen gas, a method of reducing the deposition rate, or the like. In the case where a thin film of an inorganic oxide is formed by a plasma enhanced chemical vapor deposition method on a substrate film having poor heat resistance, such as the above-described substrate film, when the deposition rate is reduced, the substrate is exposed to plasma. It is not preferable because the time becomes longer and the base film or the like deteriorates.
It is preferable to form a deposited film at a deposition rate of 200 n / min.

Further, in the present invention, as a method of forming a multilayer film of two or more inorganic oxide thin films, the above-mentioned physical vapor deposition such as a vacuum deposition method, a sputtering method, an ion plating method, etc. Inorganic oxide thin film composed of a combination of a chemical vapor deposition (PVD) method and a chemical vapor deposition method (CVD method) such as a plasma chemical vapor deposition method, a thermal chemical vapor deposition method, or a photochemical vapor deposition method. Is formed into a film by laminating two or more layers, thereby making it possible to produce an inorganic oxide thin film composed of two or more inorganic oxide thin films.
That is, although not shown, first, a first inorganic oxide thin film is formed using the above-mentioned roll-up type vacuum evaporator, and then the above-described plasma chemical vapor deposition is performed on the inorganic oxide thin film. Forming a second inorganic oxide thin film using the apparatus;
With the first and second inorganic oxide thin films, an inorganic oxide thin film composed of a multilayer film of two or more inorganic oxide thin films can be formed. In the above, the order of film formation may be any, for example, first, film formation using a winding vacuum vapor deposition machine, then may be formed using a plasma chemical vapor deposition apparatus, Film formation may be performed in the reverse order.

According to the present invention, the surface of the deposited inorganic oxide thin film formed as described above is, for example,
Various surface treatments can be performed to improve the surface properties of the resin composition containing the above-mentioned thermosetting epoxy resin and a curing agent in order to improve the adhesion between the transparent coating film and the like. Things. As the above surface treatment method,
For example, there are methods such as corona discharge treatment, ozone treatment, low-temperature plasma treatment using oxygen gas or nitrogen gas, glow discharge treatment, and chemical treatment of the surface of a deposited thin film of an inorganic oxide. . Note that the above surface treatment may be performed in a separate step after forming the inorganic oxide vapor-deposited thin film, but the surface treatment is performed in-line as a post-treatment of the vapor deposition process of forming the inorganic oxide vapor-deposited thin film. In such a case, the processing method is advantageous in terms of manufacturing cost. In the present invention, examples of the method for modifying the surface properties of the inorganic oxide vapor-deposited thin film include, for example, one or more of various resins such as polyester resin, urethane resin, melamine resin, acrylic resin, and others. It can also be carried out by a method in which an anchor coating agent containing at least one species as a main component of the vehicle is coated to form an anchor coating agent layer. In the above, the thickness of the anchor coating agent layer is 0.1 to 10 μm, more preferably 0.5 to 10 μm.
About 2 μm is desirable. In the present invention, examples of the method of coating the above-mentioned anchor coating agent include a solvent coating method and an emulsion coating method.

Next, in the present invention, a transparent coating film made of a resin composition containing a thermosetting epoxy resin and a curing agent which constitute the barrier film, the laminate, etc. according to the present invention will be described. To form the transparent coating film, one or more thermosetting epoxy resins are used as a main component of the vehicle, and one or more curing agents are added thereto. , Optional additives such as fillers, stabilizers, plasticizers, antioxidants, light stabilizers such as ultraviolet absorbers, dispersants, thickeners, desiccants, lubricants, antistatic agents, etc., A resin composition composed of a solvent type, an aqueous type or an emulsion type having a solid content of about 3 to 30% by weight is prepared by sufficiently kneading with a solvent, a diluent or the like. In the present invention, the above resin composition is used, for example, a roll coat method, a gravure roll coat method, a direct gravure roll coat method, an air doctor coat method, a rod coat method. Method, kiss roll coat method, squeeze roll coat method, reverse roll coat method, curtain flow coat method, fonten method, transfer coat method, spray coat method Coating by a coating method such as a dip coating method, a dip coating method, and the like, followed by heat drying and further aging treatment to obtain the thermosetting epoxy resin and the curing agent according to the present invention. A transparent coating film can be formed from the resin composition containing the resin composition. In the above, the thickness of the transparent coating film is about 0.1 to 50 μm, more preferably 0.1 to 50 μm.
About 5 to 5 μm is desirable. In the present invention, the above film thickness is not preferable because if the film thickness is too large, the transparency, flexibility, flexibility and the like of the transparent coating film will be lost.

In the present invention, examples of the thermosetting epoxy resin constituting the resin composition containing the thermosetting epoxy resin and the curing agent include, for example, a molecular weight of about 300 to 10,000 having an epoxy group at a terminal. An oligomeric resin, and depending on the type of raw material for producing the resin, one or more of glycidyl ether type epoxy resin, glycidyl ester type epoxy resin, glycidylamine type epoxy resin, etc.
More than one species can be used. In the above description, the glycidylamine type epoxy resin has a nitrogen atom in the molecule, but other epoxy resins do not have a nitrogen atom. Therefore, in the present invention, the glycidylamine type epoxy resin has a problem that the stability is relatively poor, and the glycidylamine type epoxy resin easily gels at the stage of the reaction with the curing agent. It is desirable to use a tell-type epoxy resin or a glycidyl ester-type epoxy resin. The above glycidyl ester
The tell-type epoxy resin can be produced by reacting alcohols or phenols having an alcoholic hydroxyl group with epichlorohydrin or dichlorohydrin to epoxidize. The glycidyl ester type epoxy resin can be produced by epoxidation by reacting an active hydrogen-containing compound having a carboxylic acid as a functional group with epichlorohydrin or dichlorohydrin. In the above reaction, usually, the reaction can be carried out in the presence of an alkali and a method of epoxidation in one reaction or a method of epoxidation through two or more reactions, and the like. In
For example, a catalyst such as a tertiary amine, a quaternary amine, and triphenylphosphine can be used. Further, in the present invention, as a method for producing an epoxy resin, a method of liquid-phase oxidation of a compound having a double bond with hydrogen peroxide or a peracid, a method of air-oxidizing a compound having a double bond, an ylide It can be manufactured by the method used.

In the present invention, an example of producing the glycidyl ether type epoxy resin is as follows.
Bisphenol A and shrimp chlorohydrin were mixed at a mixing ratio of 2 mol or more to the former 1 mol and the temperature was 5 to 150 mol / l.
It can be produced by reacting in the range of ° C. As the above-mentioned reaction solvent, any solvent may be used as long as it can dissolve the raw materials, but it is desirable to use alcohols. Specifically, for example, methanol, ethanol, etc. , Lower alcohols such as n-propanol and isopropanol, and further, glycol ethers such as 2-methoxyethanol and 2-ethoxyethanol, or
Polyhydric alcohols and the like can be used. Thus,
As the glycidyl ether type epoxy resin produced as described above, bisphenol A type, bisphenol F type, brominated bisphenol A are used based on the basic skeleton.
Bisphenol A type, bisphenol S type, bisphenol AF type, biphenyl type, naphthalene type, bifunctional epoxy resin having two epoxy groups in a molecule of fluorene type, phenol novolak type, Orthocreso
Examples thereof include a polyfunctional epoxy resin having three or more epoxy groups in a molecule of a lunavolak type, a DPP novolak type, a tris-hydroxyphenylmethane type, or a tetraphenylolethane type. Further, in the present invention,
Examples of the above glycidyl ether type epoxy resin include 1.2-ethanediol, 1.2-propanediol, 1.3-propanediol, 1.4-butanediol, and 1.5. -Bentandiole, diethylene glycol-
, Triethylene glycol, polyethylene glycol
Aliphatic epoxy resin produced by reacting a divalent or higher valent aliphatic alcohol such as phenol or polypropylene glycol with epichlorohydrin or dichlorohydrin to epoxidize it. . In the present invention, the glycidyl ester type epoxy resin includes an aromatic carboxylic acid or an aliphatic carboxylic acid having two or more carboxyl groups (—COOH) in a molecule, and epichlorohydrin, or It can be produced by reacting with dichlorohydrin and epoxidizing it. As the aromatic carboxylic acid, for example, phthalic acid, isophthalic acid, terephthalic acid and the like can be used. In the present invention, the glycidyl ether type epoxy resin or the glycidyl ester type epoxy resin as described above can be used as a mixture of one or more kinds. Thus, in the present invention, the epoxy resin as described above has a molecular weight of 300 to 10,000.
0 (number average molecular weight) and the degree of polymerization (n) is 0.1
And the epoxy equivalent is from 100 to 10,000.
0 g / eq, viscosity is 20-40,000 ps
It is desirable to use the one that is the most significant.

Next, in the present invention, as a curing agent constituting the resin composition containing the above-mentioned thermosetting epoxy resin and a curing agent, for example, diethylenetriamine, triethylenetriamine, meta-xylylenediamine, isophoronediamine, Unmodified polyamines such as 3-bisaminomethylcyclohexane and diaminodiphenylmethane, polyamides, ketimines, and epoxy modified products (epoxy adducts)
Polyaddition-type polyamines such as modified polyamines, etc .; polyaddition-type acid anhydrides such as dodecenyl succinic anhydride, polyazeleic anhydride, hexahydrophthalic anhydride, methyltetrahydrophthalic anhydride; novolac phenolic resins; Polyaddition type polyphenols such as polymer, polysulfide, polyaddition type polymercaptan such as thioester, isocyanate prepolymer, polyaddition type isocyanate such as blocked isocyanate, and polyaddition of carboxylic acid-containing polyester resin. -Type organic acid, benzyldimethylamine, 2.4.6-trisdimethylaminomethylphenol, 2-methylimidazole, aromatic sulfonyl salt, aromatic diazonium salt, etc., catalyst type curing agent, resole type phenol Resin, methylol group-containing urea resin, methylol group-containing melamine tree Condensation type curing agent and the like, to one without the other, or the like can be used two or more kinds. Thus,
In the present invention, among the above-mentioned curing agents, in particular, a coating obtained by curing an epoxy resin using a polyamine-based curing agent has an effect of improving adhesion to a vapor-deposited thin film of an inorganic oxide. A high and thin film is desirable because it has a high effect of improving the barrier properties, flexibility, flexibility, and the like of the deposited inorganic oxide thin film. Furthermore, the polyamine-based curing agent has the advantage that the reactivity with the epoxy-based resin is high and the curing time is short, and
Among the polyamine-based curing agents, aliphatic polyamines have good room-temperature curability, and aromatic polyamines have a property that the reaction is basically slow and heat is required for curing. In the present invention, using a curing agent as described above, by performing a curing reaction with the epoxy resin, to form a three-dimensional cross-linked structure in the resin film, physical properties of the epoxy resin film, particularly, mechanical strength, Electrical properties, heat resistance, chemical resistance, flexibility, adhesion, gas barrier,
Other properties can be effectively improved.

Next, in the present invention, as a solvent constituting the resin composition containing the thermosetting epoxy resin and the curing agent, any solvent that can solubilize the epoxy resin and the curing agent can be used. Yes, for example, aliphatic hydrocarbon solvents, aromatic hydrocarbon solvents, ester solvents, ketone solvents, alcohol solvents, and the like can be used. The above solvents can be used alone or as a mixture of two or more solvents. Thus, in the present invention, methanol, ethanol, n-propanol,
One or more of lower alcohols such as isopropanol, glycol ethers such as 2-methoxyethanol and 2-ethoxyethanol, and polyhydric alcohols;
It is desirable to use more than one species. In the present invention, the curing reaction of the epoxy resin with the curing agent is usually performed in a resin composition using the above-described solvent, and is performed at room temperature or while heating. When the temperature is too high, a gelling reaction occurs and the coating property of the resin composition after the curing reaction deteriorates. In the present invention, during the preparation of the resin composition, if necessary, a nitrogen gas stream may be introduced into the reaction vessel to perform gas replacement to remove the influence of oxygen gas. In the above resin composition, the amount of the curing agent to be added can be arbitrarily selected depending on the number of epoxy groups of the epoxy resin. For example, in the case of a polyamine curing agent, 0.1 to 0.8 epoxy Equivalents are common. The addition amount of the curing agent determines the three-dimensional structure of the epoxy resin, and is a factor that affects the physical properties of the cured film.

In the present invention, a cured film of an epoxy resin cured with a curing agent has a problem that it is rather fragile. In particular, in the present invention, an epoxy-based thin film is deposited on a vapor-deposited thin film of an inorganic oxide. Since a cured film made of a resin is formed, various additives are optionally added when adjusting the resin composition in order to impart flexibility to the cured film made of the epoxy resin. It is desirable to adjust the flexibility of the cured coating. For example, dibutyl phthalate, an organic acid ethylene glycol
And a plasticizer such as an ethylene oxide adduct of tetrahydrofurfuryl alcohol, leaving a long-chain unreacted compound in the cured film of the epoxy resin, and curing with the epoxy resin. Flexibility can be imparted to the coating. Alternatively, a flexibility-imparting agent such as a long-chain compound is added, and at the time of curing, the flexibility-imparting agent such as the long-chain compound reacts with the epoxy group of the epoxy resin to form a cured film of the epoxy resin. Flexibility can be imparted. Furthermore, a diluent such as butyl glycidyl ether terallyl glycidyl ether, diglycidyl ether, butanediol glycidyl ether, or the like can be added to impart flexibility to the cured coating of the epoxy resin. Also, mica powder, silica or quartz powder, calcium carbonate, alumina, zirconium silicate, iron oxide,
By adding a filler such as glass powder, flexibility can be imparted to the cured film of the epoxy resin. Furthermore, a resin such as polyethylene, polypropylene, ethylene-vinyl acetate copolymer, acid-modified polyolefin, polyamide resin, and the like can be added to impart flexibility to the cured film of the epoxy resin.

Next, in the present invention, the heat-sealing resin forming the heat-sealing resin layer constituting the laminated material using the barrier film according to the present invention includes:
Resin films or sheets that can be fused and mutually fused by heat can be used. Specifically, for example,
Low density polyethylene, medium density polyethylene, high density polyethylene, linear (linear) low density polyethylene, polypropylene, ethylene-vinyl acetate copolymer, ionomer resin, ethylene-acrylic acid copolymer, ethylene-ethyl acrylate A copolymer, an ethylene-methacrylic acid copolymer, an ethylene-methyl methacrylate copolymer, an ethylene-propylene copolymer, a methyl pentene polymer, a polybutene polymer, a polyolefin resin such as polyethylene or polypropylene is converted to acrylic acid or methacrylic. Acid-modified polyolefin resin modified with an unsaturated carboxylic acid such as acid, maleic acid, maleic anhydride, fumaric acid, itaconic acid, polyvinyl acetate resin, poly (meth) acrylic resin, polyvinyl chloride resin, Other resin films or sheets It can be used. Thus,
The above film or sheet can be used in the form of a coating film of a composition containing the resin.
As the thickness of the film or film or sheet,
It is preferably about 5 μm to 300 μm, more preferably about 10 μm.
The order of μm to 150 μm is desirable.

In the present invention, the above-mentioned heat seal
It is particularly preferable to use an ethylene / α-olefin copolymer polymerized using a metallocene catalyst as the heat-sealing resin forming the hydrophilic resin layer. Thus, as the ethylene / α-olefin copolymer polymerized using the above metallocene catalyst, for example, a catalyst obtained by combining a metallocene complex such as a catalyst obtained by combining zirconocene dichloride and methylalumoxane with alumoxane, And an ethylene-α-olefin copolymer obtained by polymerization using a metallocene catalyst. Metallocene catalyst, the current catalyst,
The active sites are heterogeneous and are called multi-site catalysts, whereas the active sites are uniform and are also called single-site catalysts. Specifically, the product name "Kernel" manufactured by Mitsubishi Chemical Corporation, the product name "Evolu" manufactured by Mitsui Petrochemical Industry Co., Ltd., the product name "EXACT" manufactured by EXXON CHEMICAL, USA (EXACT) ", a product name" AFFINITY ", a product name" Engage (E) "manufactured by DOW CHEMICAL, USA.
NGAGE) or the like, and an ethylene / α-olefin copolymer polymerized by using a metallocene catalyst. Thus, in the present invention, as the resin of the ethylene / α-olefin copolymer polymerized by using the above-mentioned metallocene catalyst, a film or sheet or a composition containing the copolymer is used. -It can be used in the form of a coating film or the like, thereby functioning as a heat-sealing resin film or sheet constituting the innermost layer, and thus its low-temperature heat sheet. This makes it possible to prevent the occurrence of cracks or the like occurring in the inorganic oxide thin film or the like in post-processing such as bag making. The thickness of the film or film or sheet is about 3 μm to 300 μm, preferably
5 μm to 100 μm is desirable. In the present invention, the ethylene-α-olefin copolymer obtained by polymerization using the above-mentioned metallocene catalyst is further added to, for example, a partially crosslinked ethylene-propylene rubber (EPDM),
Ethylene-propylene rubber (EPR), styrene-butadiene-styrene block copolymer (SBS), styrene-isobutylene-styrene block copolymer
(SIS), using a heat-sealing resin layer of a resin composition obtained by adding one or more thermoplastic elastomers such as styrene-ethylene-butylene-styrene block copolymer (SEBS). Can also. Further, in the present invention, an ethylene-α-olefin copolymer obtained by polymerization using the above metallocene catalyst,
A heat-sealing resin layer can be formed by laminating two or more layers with a polyolefin resin such as low-density polyethylene, linear low-density polyethylene, and others, for example, by coextrusion or tandem extrusion. It is.

Next, in the present invention, the above-mentioned heat seal
As a method of laminating a conductive resin layer, for example,
Dry lamination using a laminating adhesive layer with an adhesive for lamination, or extruding laminating using a melt-extruded resin layer with a melt-extruded adhesive resin. . In the above, as the adhesive for laminating, for example, one liquid,
Alternatively, two-pack type cured or non-cured vinyl type, (meth) acrylic type, polyamide type, polyester type, polyether type, polyurethane type, epoxy type, rubber type, etc., solvent type, aqueous type, etc. Alternatively, an adhesive for laminating such as an emulsion type can be used. Examples of the coating method of the adhesive for laminating include direct gravure roll coating, gravure roll coating, kiss coating, reverse roll coating and the like. Method, Fonten method, transfer roll coating method, etc., and the coating amount is about 0.1 to 10 g / m ² (dry state), more preferably. , 1 to 6 g / m ² (dry state). In the present invention, for example, an adhesion promoter such as a silane coupling agent can be optionally added to the adhesive for laminating. Next, in the above, as the melt-extruded adhesive resin,
The thermoplastic resin forming the above-mentioned thermoplastic resin layer can be used in the same manner. Thus, in the present invention, it is preferable to use a low-density polyethylene, particularly a linear low-density polyethylene, and an acid-modified polyethylene as the melt-extruded adhesive resin. The thickness of the melt-extruded resin layer by the above-mentioned melt-extruded adhesive resin is about 5 to 100 μm, more preferably 10 to 50 μm.
μm is desirable. In the present invention, when it is necessary to obtain a stronger adhesive strength when performing lamination by the extrusion lamination method, for example, an anchor coat agent or the like may be applied to the coating thin film surface. Can be coated. Specific examples of the above-mentioned anchor coating agent include organic titanium-based anchor coating agents such as alkyl titanate, isocyanate-based anchor coating agents, and polyethyleneimine-based anchor coating agents. -Agent,
Various kinds of aqueous or oily anchor coating agents such as polybutadiene-based anchor coating agents and others can be used. Thus, in the present invention, the above anchor
Coating agents include, for example, roll coat, gravure coat,
An anchor coating agent layer can be formed by coating with a knife coating, dip coating, spray coating, or other coating methods, and drying the solvent, diluent and the like. In the above, the coating amount of the anchor coating agent is preferably about 0.1 to 5 g / m ² (dry state).

In the laminated material using the barrier film according to the present invention, a printed pattern layer composed of, for example, characters, figures, patterns, symbols, etc. may be formed on any of the layers constituting the laminated material. it can. As the print pattern layer, for example, a normal gravure ink composition, an offset ink composition,
Using a letterpress ink composition, a screen ink composition, and other ink compositions, for example, a gravure printing method,
Using a printing method such as an offset printing method, a letterpress printing method, a silk screen printing method, etc., and forming a desired printing pattern composed of, for example, characters, figures, patterns, symbols, etc. Can be.

In the present invention, when a laminate or the like is formed using the barrier film according to the present invention, for example, low-density polyethylene, medium-density polyethylene, Film or sheet of resin such as high-density polyethylene, linear low-density polyethylene, polypropylene, ethylene-propylene copolymer, or polyvinyl alcohol-based resin having a barrier property against oxygen, water vapor, etc., ethylene- Resin film or sheet such as saponified vinyl acetate copolymer
A colorant such as a pigment or the like may be added to the resin, and other desired additives may be added and kneaded to form a film, and various light-shielding colored resin films or sheets may be used. These materials can be used alone or in combination of two or more. The thickness of the above-mentioned film or sheet is arbitrary, but is usually preferably about 5 μm to 300 μm, more preferably about 10 μm to 100 μm.

In the present invention, since the packaging container is usually subjected to severe physical and chemical conditions, strict packaging suitability is required for the laminated material constituting the packaging container. And various conditions such as deformation prevention strength, drop impact strength, pinhole resistance, heat resistance, sealability, quality maintenance, workability, hygiene, etc. are required. When manufacturing a laminate using the barrier film according to the present invention, a material that satisfies the above-mentioned conditions can be arbitrarily selected and used. High density polyethylene, medium density polyethylene, high density polyethylene, linear low density polyethylene, polypropylene, ethylene-propylene copolymer, ethylene-vinyl acetate copolymer, ionomer resin, ethylene-acryl Ethyl acrylate copolymer, ethylene -
Acrylic or methacrylic acid copolymer, methylpentene polymer, polybutene resin, polyvinyl chloride resin, polyvinyl acetate resin, polyvinylidene chloride resin, vinyl chloride-vinylidene chloride copolymer, poly (meth) acryl Resin, polyacrylonitrile resin, polystyrene resin, acrylonitrile-styrene copolymer (AS resin), acrylonitrile-butadiene-styrene copolymer (ABS resin), polyester resin, polyamide resin, polycarbonate Resin, polyvinyl alcohol resin, saponified ethylene-vinyl acetate copolymer, fluorine resin, diene resin, polyacetal resin, polyurethane resin, nitrocellulose
And any other known resin film or sheet. In addition, for example, films such as cellophane, synthetic paper, various paper base materials, and the like can be used. In the present invention, the above-mentioned film or sheet may be any of unstretched and uniaxially or biaxially stretched. The thickness is arbitrary, but is from several μm to 30 μm.
It can be used by selecting from a range of about 0 μm. Further, in the present invention, the film or sheet may be any film such as an extruded film, an inflation film, or a coating film. In the present invention, any one of the layers constituting the laminated material according to the present invention may be formed by, for example, offset printing, gravure printing, silk screen printing, or any other desired method including characters, figures, patterns, symbols, etc. It goes without saying that a print pattern layer can also be formed.

Next, in the present invention, a method for making a bag or a box using the above-described laminated material will be described. For example, when the packaging container is a soft packaging bag made of a plastic film or the like, Using a laminated material manufactured by such a method, the heat-sealing resin layer of the inner layer is made to face the surface, and it is folded or the two sheets are overlapped, and furthermore, the peripheral edge portion is formed. A bag can be formed by providing a seal portion by heat sealing. Thus, as the bag making method, the above-mentioned laminated material is folded with its inner layer facing the surface, or two of them are overlapped,
Further, the peripheral end portion of the outer periphery is formed, for example, by a side seal type, a two-side seal type, a three-side seal type, a four-side seal type, an envelope-attached seal type, and a gasket-attached seal type ( According to the present invention, a heat seal is formed according to a heat seal form such as a (pyrro-seale type), a pleated seal type, a flat bottom seal type, a square bottom seal type, and the like. Various forms of packaging containers can be manufactured. Others, for example, self-supporting packaging bags (standing pouches)
And the like can be manufactured, and in the present invention, a tube container and the like can be manufactured using the above-mentioned laminated material. In the above, as a method of heat sealing, for example, a bar seal, a rotary roll seal, a belt seal, an impulse seal, a high frequency seal, an ultrasonic seal,
Can be performed by a known method such as In the present invention, a spout such as a one-piece type, a two-piece type, etc., or a zipper for opening and closing can be arbitrarily attached to the packaging container as described above.

In the present invention, the packaging container manufactured as described above can be used for various foods and beverages, chemicals such as adhesives and adhesives, cosmetics, pharmaceuticals, and other various articles, particularly,
It is used for filling and packaging of liquid or viscous articles such as liquid seasonings. Further, the laminated material according to the present invention,
For example, it can be used as a lid material by being bonded to a flange portion of a plastic molded container.

[0036]

The present invention will be described more specifically with reference to the following examples. Production Example of Vapor Deposition Film 1 Electron beam (EB) gun using silicon monoxide (SiO) as a vapor deposition source on a corona-treated surface of a biaxially stretched polyethylene terephthalate film (one-side corona-treated surface product) having a thickness of 12 μm. The evaporation source is heated by using a
A 0 ° evaporated thin film was formed. The deposition rate is 220 m / m
went in. The surface tension of the formed thin film of silicon oxide having a thickness of 500 ° was 70 dyn.

Example of Production of Vapor Deposition Film 2 On a corona-treated surface of a biaxially stretched polyethylene terephthalate film (one-side corona-treated surface product) having a thickness of 12 μm, an electron beam was deposited using aluminum oxide (Al ₂ O ₃ ) as a vapor deposition source. The vapor deposition source was heated by a vacuum (EB) gun, and a vapor deposition thin film having a thickness of 200 ° was formed by a vacuum vapor deposition method. The deposition rate is 4
The test was performed at 80 m / min. The above-formed film thickness of 200Å
The biaxially stretched polyethylene terephthalate film on which the aluminum oxide vapor-deposited thin film was formed was aged at 40 ° C./90% humidification for 24 hours. By the above aging treatment, the surface tension of the deposited aluminum oxide thin film having a thickness of 200 ° was improved from 58 dyn to 72 dyn.

Production Example of Vapor Deposition Film 3 A biaxially stretched polyethylene terephthalate film (one-side corona treated surface product) having a thickness of 12 μm was coated on the corona-treated surface by plasma chemical vapor deposition (PECVD) to a thickness of 180 μm.
A silicon oxide vapor-deposited thin film was formed. In the above, the reaction gas mixture ratio is hexamethyldisiloxane / oxygen gas / helium = 1/3/3 (unit: slm).
The deposition rate was 100 m / min. In the above, after the vapor deposition, a surface treatment was performed on the vapor-deposited thin film of silicon oxide with oxygen plasma using a glow discharge plasma processing apparatus. As a result, the surface tension of the deposited silicon oxide thin film was 41 dyn before the plasma treatment and 67 dy after the plasma treatment.
n.

Preparation of Resin Composition A 510 g of a glycidyl ether derivative of bisphenol A was placed in a reaction vessel, and then 2 L of 1-ethoxy-2-
Propanol was added, and the mixture was stirred with a magnetic stirrer while introducing nitrogen gas, and gradually dissolved at 80 ° C.
After dissolution, while maintaining the temperature at 80 ° C., 83 g of triethylenetetramine was added to 1 L of n-propanol solution, and the epoxy resin was cured while stirring with a magnetic stirrer. The reaction is performed for 1 hour, and after the reaction is completed,
The temperature is increased to 120 ° C. and the excess solvent is distilled off under reduced pressure,
A 5% solution (n-propanol) of an epoxy resin obtained by addition polymerization of a polyamine was prepared.

Preparation of Resin Composition B 250 g of a glycidyl ether derivative of 1.4-butanediol was placed in a reaction vessel, and 1 L of 2-butoxyethanol was added thereto. The mixture was stirred with a stirrer and gradually dissolved at 65 ° C. After the dissolution, while maintaining the temperature at 80 ° C., 70 g of triethylenetetramine was added to 0.7 L of n-propanol solution, and the epoxy resin was cured while stirring with a magnetic stirrer. The reaction was carried out for 2 hours. After completion of the reaction, the temperature was raised to 110 ° C., excess solvent was distilled off under reduced pressure, and a 5% solution (n-propanol) of an epoxy resin obtained by addition polymerization of polyamine was prepared. did.

Examples 1, 2, 3, 4, 5, 6 The above-prepared resin composition A was applied to the vapor-deposited thin film surfaces of the vapor-deposited films 1, 2, and 3 produced above at a thickness of 0.4 g / m ^2.
The coating amount (dry weight) was coated by a gravure coating method to form a transparent coating film, and barrier films 1, 2, and 3 were manufactured. It was set to 3. Further, the resin composition A prepared above was coated on the vapor-deposited thin film surfaces of the vapor-deposited films 1, 2, and 3 produced above with a thickness of 0.8.
A transparent coating film was formed by coating with a gravure coating method at a coating amount (dry weight) of g / m ² , and barrier films 4, 5, and 6 were produced. 4, 5,
6. In the above, each sample was prepared at 90 ° C. for 2 hours.
A time curing reaction was performed.

Examples 7, 8, and 9 The above-prepared resin composition B was applied to the vapor-deposited thin film surfaces of the vapor-deposited films 1, 2, and 3 produced above at a thickness of 0.6 g / m ^2.
The coating amount (dry weight) was coated by a gravure coating method to form a transparent coating film, and barrier films 7, 8 and 9 were produced. It was set to 9. In the above, each sample was cured at 80 ° C. for 4 hours.

Comparative Examples 1, 2, and 3 The vapor-deposited films 1, 2, and 3 produced as described above were used as barrier films as they were, and Comparative Examples 1, 2, and 3, respectively.
That is, without coating any of the above-prepared resin compositions A and B on the vapor-deposited thin film surfaces of the vapor-deposited films 1, 2 and 3 produced above, they were directly used as barrier films, and Comparative Examples 1 and 2, respectively. 2, 3.

Using the barrier films according to Examples 1 to 9 and the barrier films according to Comparative Examples 1 to 3,
In the barrier films according to the above Examples 1 to 9, on the transparent coating film, and Comparative Examples 1 to
In the barrier film according to (3), a thickness of about 3.3 is formed on the vapor-deposited thin film by a gravure roll coating method.
An adhesive layer made of a polyester-based urethane adhesive of 5 g / m ² (dry state) is formed, and then a low-density polyethylene film having a thickness of 50 μm is dry-laminated through the adhesive layer, and is heated at 40 ° C. The aging treatment was performed for 4 days to produce laminated materials.

EXPERIMENTAL EXAMPLE 1 A barrier film according to Examples 1 to 9 and a laminated material manufactured using the same, a barrier film according to Comparative Examples 1 to 3, and manufactured using the same The oxygen permeability and the water vapor permeability of the laminated material were measured, and the oxygen permeability of each laminated material was measured by bending each laminated material 10 times using a gelbo flex tester. It was measured. The above-mentioned oxygen permeability was measured at 23 ° C., 90 ° C. using an oxygen permeability meter OX-TRAN (trade name) manufactured by Mocon, USA.
% RH. The above-mentioned water vapor permeability was measured at 40 ° C. and 90% RH using a water vapor permeability measuring instrument “PERMATRAN” (trade name, manufactured by MOCON, USA). In addition,
In the present invention, the thickness of the deposited inorganic oxide thin film is determined by a fluorescent X-ray analyzer (trade name, manufactured by Rigaku Corporation, trade name: RIX300).
0) was measured by the fundamental parameter method. The above measurement results are shown in Table 1 below.

[0046] In Table 1 above, oxygen means oxygen permeability, the oxygen permeability is a unit of [cc / m ² · day · atm], and water vapor means water vapor permeability. The water vapor permeability is a unit of [g / m ² · day · atm].

As is clear from the results shown in Table 1 above, the barrier films according to Examples 1 to 9 and
In the laminate, the oxygen permeability and the water vapor permeability are 1.0 cc / m ² · day · atm or less and 1.0 cc / m ² · day · atm, respectively.
g / m ² · day · atm. In contrast,
In the barrier films and the laminates according to Comparative Examples 1 to 3, the results were inferior in both oxygen permeability and water vapor permeability. This is presumed to be due to the formation of the transparent coating film in the present invention, and in particular, it was found that the effect of improving the water vapor permeability was high. In the bending test, 10 consecutive bendings were performed.
In contrast to those of Example 1,
Any of the items according to No. 9 to 5.0 is 5.0 cc / m ² · d.
The oxygen barrier property of ay · atm or less was maintained. This suggests that, in the present invention, the transparent coating film has greatly improved the flexibility which was a drawback of the conventional barrier film.

Experimental Example 2 Adhesive strength was measured for the laminates using the barrier films according to Examples 1 to 9 and the laminates using the barrier films according to Comparative Examples 1 to 3.
The above adhesive strength was measured by. The above measurement results are shown in Table 2 below.

[0049]

As is clear from the results shown in Table 2 above, those according to Examples 1 to 9 were 400 g / 15 mm
Good adhesive strength over the width was shown. On the other hand, those according to Comparative Examples 1 and 2 showed a good adhesive strength of 400 g / 15 mm width or more, while those according to Comparative Example 3
It was 0 g / 15 mm width or less, and the adhesive strength was considerably low. From these results, in the present invention, in the present invention, the transparent coating film does not cause a decrease in the adhesive strength in the dry lamination method between the vapor-deposited thin film of the inorganic oxide and the sealant film. It was understood that the barrier film formed with the inorganic oxide vapor-deposited thin film using the (CVD method) also has an effect of improving the adhesive strength. This is because a transparent coating film made of a resin composition containing an epoxy resin having excellent adhesive strength to a metal material or the like is formed by a vapor-deposited thin film of an inorganic oxide formed by a chemical vapor deposition (CVD) method. It is presumed that this effect is exhibited also in the adhesiveness and the like.

[0051]

As apparent from the above description, the present invention focuses on a thermosetting epoxy resin, and firstly, a physical vapor phase is applied to one surface of a base film such as a heat-resistant transparent plastic film. One or two or more multilayer films of inorganic oxide thin films are formed by a growth method, a chemical vapor deposition method, particularly a plasma chemical vapor deposition method, and then a thermosetting is performed on the inorganic oxide thin film. A barrier film is produced by providing a transparent coating film made of a resin composition containing a conductive epoxy resin and a curing agent, and the barrier film is replaced with another plastic film or a paper base, etc. The laminated material is arbitrarily laminated to produce a laminated material. Thereafter, the laminated material is used, and the laminated material is formed into a bag or a box to produce a packaging container. Goods, pharmaceuticals, chemicals, daily necessities, miscellaneous goods , Filling and packaging various other products to produce packaged products, excellent gas barrier properties against oxygen gas and water vapor, etc. It has storage suitability, etc., and is excellent in transparency, so that the contents can be visually recognized from the outside, and furthermore, it is excellent in flexibility, laminating strength, etc., and there is no bag breakage, and it is extremely excellent. A useful barrier film capable of producing good packaging products at low cost can be produced.

[Brief description of the drawings]

FIG. 1 is a schematic cross-sectional view illustrating an example of the layer configuration of a barrier film according to the present invention.

FIG. 2 is a schematic cross-sectional view illustrating an example of the layer configuration of the barrier film according to the present invention.

FIG. 3 is a schematic cross-sectional view illustrating an example of the layer configuration of the barrier film according to the present invention.

FIG. 4 is a schematic cross-sectional view illustrating an example of the layer configuration of the barrier film according to the present invention.

FIG. 5 is a schematic cross-sectional view illustrating an example of the layer configuration of a laminate using the barrier film according to the present invention.

FIG. 6 is a schematic diagram showing an example of a roll-up type vacuum evaporator showing an outline of a method for forming a vapor-deposited inorganic oxide thin film by physical vapor deposition.

FIG. 7 is a schematic configuration diagram showing an example of a plasma chemical vapor deposition apparatus showing an outline of a method for forming a vapor-deposited thin film of an inorganic oxide by a plasma chemical vapor deposition method.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Barrier film 1a Barrier film 1b Barrier film 1c Barrier film 2 Base film 3 Inorganic oxide thin film 3a Inorganic oxide vapor-deposited thin film 3b Inorganic oxide vapor-deposited thin film 3c Multilayer film 4 Transparent coating film 5 Print pattern 6 Heat-sealing resin layer

──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI Theme coat ゛ (Reference) C23C 14/10 C23C 14/10 16/40 16/40 F-term (Reference) 4F006 AA12 AA35 AA38 AB74 BA05 DA01 4F100 AA00B AA18B AA19B AA20B AH03H AH06B AK07A AK42A AK48A AK53C AK53K AT00A BA03 BA07 BA10A BA10C CA02C CC00C EH66B EJ38A EJ61B GB15 GB23 GB66 JA07C JB13C JD03 JD04 JK06 JK13 JK17 JM02B JN01 JN01C YY00 YY00B YY00C 4K029 AA11 AA25 BA43 BA44 BA46 BB02 BC00 BD00 CA01 DB05 EA01 FA05 GA01 GA03 4K030 AA06 AA09 AA14 AA16 BA42 BA44 BB12 CA07 CA12 DA02 DA08 FA01 HA03 HA04 LA01 LA24

Claims (14)

[Claims] An inorganic oxide thin film is provided on one surface of a base film, and a transparent resin made of a resin composition containing a thermosetting epoxy resin and a curing agent is provided on the inorganic oxide thin film. A barrier film provided with a toting film. 2. The barrier film according to claim 1, wherein the base film comprises a biaxially oriented polypropylene film, a biaxially oriented polyethylene terephthalate film, or a biaxially oriented nylon film. . 3. The method according to claim 1, wherein the inorganic oxide thin film comprises one or more multilayer films of the inorganic oxide vapor-deposited thin film formed by physical vapor deposition. Barrier film. 4. The inorganic oxide thin film is composed of one or more multilayer films of a deposited thin film of silicon oxide, aluminum oxide, or magnesium oxide formed by physical vapor deposition, and has a thickness of at least one. 4. The barrier film according to claim 3, wherein the angle is within a range of 100 to 1000 °. 5. The inorganic oxide thin film according to claim 1, wherein the inorganic oxide thin film is formed of one or two or more multilayer films of an inorganic oxide vapor-deposited thin film formed by a chemical vapor deposition method. Barrier film. 6. The barrier according to claim 5, wherein the inorganic oxide thin film is composed of one or two or more multilayer films of silicon oxide deposited by plasma enhanced chemical vapor deposition. Film. 7. The inorganic oxide thin film is composed of one or two or more multilayer films of silicon oxide deposited by plasma enhanced chemical vapor deposition using an organosilicon compound as a monomer gas for deposition. The barrier film according to any one of claims 5 to 6, characterized in that: 8. The inorganic oxide thin film has silicon (Si) and oxygen (O) as essential constituent elements, and further has carbon (C)
One of hydrogen and hydrogen (H), or one of them, as a trace constituent element.
A layer or a multilayer film of two or more layers, and the thickness thereof is in the range of 50 ° to 500 °, and the composition ratio of the essential constituent elements and the trace constituent elements continuously changes in the film thickness direction. The barrier film according to any one of claims 5 to 7, wherein the barrier film is formed. 9. The method according to claim 1, wherein the inorganic oxide thin film is composed of two or more multilayer films of inorganic oxide vapor-deposited thin films formed by physical vapor deposition and chemical vapor deposition.
3. The barrier film described in any one of items 1 to 2. 10. A two-layered inorganic oxide thin film in which an inorganic oxide vapor-deposited thin film is first provided by a chemical vapor deposition method, and then an inorganic oxide vapor-deposited thin film is provided by a physical vapor deposition method. The barrier film according to claim 9, comprising the multilayer film. 11. A two-layered inorganic oxide thin film in which an inorganic oxide vapor-deposited thin film is first provided by physical vapor deposition, and then an inorganic oxide vapor-deposited thin film is provided by chemical vapor deposition. The barrier film according to claim 9, comprising the multilayer film. 12. A thermosetting epoxy resin comprising an epoxy group having a molecular weight of 300 to 10,000 obtained by epoxidizing a compound having an alcoholic hydroxyl group with epichlorohydrin.
The above-mentioned claim, which comprises a difunctional or polyfunctional glycidyl ether type epoxy resin having at least two secondary amino groups, and wherein the curing agent comprises a polyamine having at least two secondary amino groups in its molecule. The barrier film described in any one of 1 to 11. 13. The transparent coating film having a thickness of 0.1 to 0.1.
The barrier film according to any one of claims 1 to 12, wherein the thickness is within a range of 10 µm. 14. The barrier film having an oxygen permeability of 1,
cc / m ² · day · atm (23 ° C./0% RH) or less, water vapor permeability, 1 g / m ² · day · atm
(40 ° C./100% RH) or less.