JP2001296416A5 - - Google Patents

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Publication number
JP2001296416A5
JP2001296416A5 JP2000113012A JP2000113012A JP2001296416A5 JP 2001296416 A5 JP2001296416 A5 JP 2001296416A5 JP 2000113012 A JP2000113012 A JP 2000113012A JP 2000113012 A JP2000113012 A JP 2000113012A JP 2001296416 A5 JP2001296416 A5 JP 2001296416A5
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JP
Japan
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JP2000113012A
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Japanese (ja)
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JP2001296416A (ja
JP4390119B2 (ja
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Priority to JP2000113012A priority Critical patent/JP4390119B2/ja
Priority claimed from JP2000113012A external-priority patent/JP4390119B2/ja
Publication of JP2001296416A publication Critical patent/JP2001296416A/ja
Publication of JP2001296416A5 publication Critical patent/JP2001296416A5/ja
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Publication of JP4390119B2 publication Critical patent/JP4390119B2/ja
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Expired - Fee Related legal-status Critical Current

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JP2000113012A 2000-04-14 2000-04-14 回折光学素子の製造方法 Expired - Fee Related JP4390119B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000113012A JP4390119B2 (ja) 2000-04-14 2000-04-14 回折光学素子の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000113012A JP4390119B2 (ja) 2000-04-14 2000-04-14 回折光学素子の製造方法

Publications (3)

Publication Number Publication Date
JP2001296416A JP2001296416A (ja) 2001-10-26
JP2001296416A5 true JP2001296416A5 (cg-RX-API-DMAC7.html) 2007-06-07
JP4390119B2 JP4390119B2 (ja) 2009-12-24

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ID=18625060

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000113012A Expired - Fee Related JP4390119B2 (ja) 2000-04-14 2000-04-14 回折光学素子の製造方法

Country Status (1)

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JP (1) JP4390119B2 (cg-RX-API-DMAC7.html)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4668666B2 (ja) * 2005-04-12 2011-04-13 株式会社リコー 光情報記憶媒体用原盤の製造方法、光情報記憶媒体用スタンパの製造方法、スタンパ、光情報記憶媒体用成形基板の製造方法及び光情報記憶媒体用成形基板
FR2981460B1 (fr) * 2011-10-18 2016-06-24 Commissariat Energie Atomique Procede de realisation d'un dispositif optique refractif ou diffractif
CN104090376A (zh) * 2014-06-20 2014-10-08 温州大学 高数值孔径短焦距台阶相位型厚fzp的设计方法
CN104330840B (zh) * 2014-07-07 2016-05-04 中国空空导弹研究院 一种多台阶微透镜制作方法以及光学元件台阶制作方法
CN104237983B (zh) * 2014-09-30 2016-09-28 中国空空导弹研究院 高效制作高精度多台阶微透镜阵列的方法
CN104237984B (zh) * 2014-09-30 2016-11-16 中国空空导弹研究院 高精度多台阶微透镜阵列的制作方法
KR102585150B1 (ko) * 2018-03-06 2023-10-06 어플라이드 머티어리얼스, 인코포레이티드 3d 기능성 광학 물질 적층 구조를 구축하는 방법
KR102249518B1 (ko) * 2019-08-29 2021-05-07 한국광기술원 마스터 금형, 마스터 금형 제조 장치 및 방법
WO2021224450A1 (en) * 2020-05-08 2021-11-11 Nil Technology Aps Multi-level structures and methods for manufacturing the same

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