JP2001274498A - Package for housing optical semiconductor element - Google Patents

Package for housing optical semiconductor element

Info

Publication number
JP2001274498A
JP2001274498A JP2000087322A JP2000087322A JP2001274498A JP 2001274498 A JP2001274498 A JP 2001274498A JP 2000087322 A JP2000087322 A JP 2000087322A JP 2000087322 A JP2000087322 A JP 2000087322A JP 2001274498 A JP2001274498 A JP 2001274498A
Authority
JP
Japan
Prior art keywords
sealing glass
optical semiconductor
glass
lead terminal
sealing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000087322A
Other languages
Japanese (ja)
Inventor
Shuichi Shinchi
修一 新地
Junko Yoshihara
純子 吉原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2000087322A priority Critical patent/JP2001274498A/en
Publication of JP2001274498A publication Critical patent/JP2001274498A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/48463Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
    • H01L2224/48465Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond the other connecting portion not on the bonding area being a wedge bond, i.e. ball-to-wedge, regular stitch

Landscapes

  • Semiconductor Lasers (AREA)
  • Light Receiving Elements (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a package in which an optical semiconductor element is operated normally and stably for a long period by a method wherein a base which is composed of a metal and a lead terminal are bonded strongly via a sealing glass. SOLUTION: This optical semiconductor package is provided with lead terminals 3 ends on one side of which are inserted into through holes 1a in a container body 1 and which are bonded via the sealing glass 4. The sealing glass 4 is composed of a porous glass with a mean pore size of 3 to 15 μm and at a porosity of 3 to 7%.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、LD(半導体レー
ザ),PD(フォトダイオード)等の光半導体素子を気
密に封止して収納するための光半導体素子収納用パッケ
ージであって、封止用ガラスを溶融してリード端子を接
合固定するものに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical semiconductor device housing package for hermetically sealing and housing optical semiconductor devices such as LDs (semiconductor lasers) and PDs (photodiodes). The present invention relates to a method of melting lead glass and joining and fixing lead terminals.

【0002】[0002]

【従来の技術】従来から、図1(a),(b)および図
2に示すような封止用ガラスを溶融してリード端子を固
定する光半導体素子収納用パッケージ(以下、光半導体
パッケージという)が用いられている。この光半導体パ
ッケージは、50アロイ{Fe50wt(重量)%−N
i50wt%合金}等の金属材料から成り、その上面の
略中央部にLD,PD等の光半導体素子2を収容する空
所を形成するための開口(凹部)を有する箱状の容器本
体1と、50アロイ等の金属部材から成り、容器本体1
の側壁の貫通孔1aに挿入固定され、側壁の外側端部よ
り光ファイバーが挿入固定されるとともに内側に球状レ
ンズ部材6が封止用ガラスを介して接合される筒状の金
属製固定部材(以下、固定部材という)5と、容器本体
1の上面に取着され、光半導体素子2を気密に封止する
蓋体8とを有して成る。
2. Description of the Related Art Conventionally, an optical semiconductor element housing package (hereinafter referred to as an optical semiconductor package) for fixing a lead terminal by melting a sealing glass as shown in FIGS. 1 (a), 1 (b) and 2 has been known. ) Is used. This optical semiconductor package is made of 50 alloy @ Fe50 wt (weight)%-N
a box-shaped container main body 1 made of a metal material such as i50 wt% alloy}, and having an opening (recess) for forming a space for accommodating the optical semiconductor element 2 such as an LD or PD at a substantially central portion of the upper surface thereof; , 50 alloy, etc., and the container body 1
A cylindrical metal fixing member (hereinafter, referred to as a fixing member) in which an optical fiber is inserted and fixed from the outer end of the side wall, and a spherical lens member 6 is bonded to the inside through a sealing glass. , A fixing member) 5 and a lid 8 attached to the upper surface of the container body 1 and hermetically sealing the optical semiconductor element 2.

【0003】また、容器本体1の外側面には、光半導体
素子2と外部電気回路との電気的接続を行うための、鉄
(Fe)−ニッケル(Ni)−コバルト(Co)合金等
の金属からなるリード端子3が、その一端が貫通孔1b
に挿入されて硼珪酸系ガラス等から成る封止用ガラス4
を介して溶着される。
Further, a metal such as an iron (Fe) -nickel (Ni) -cobalt (Co) alloy for making an electrical connection between the optical semiconductor element 2 and an external electric circuit is provided on an outer surface of the container body 1. Terminal 3 made of
Glass 4 made of borosilicate glass etc.
Is welded through.

【0004】この容器本体1及び固定部材5は、外表面
に酸化腐食を防止するとともに各部接合用のロウ材の濡
れ性を改善するNiメッキ層,Auメッキ層が順次施さ
れている。筒状の固定部材5は容器本体1の貫通孔1a
の内側にAu−Sn合金ロウ材等の低融点のロウ材で取
着されている。
The outer surface of the container body 1 and the fixing member 5 is provided with a Ni plating layer and an Au plating layer in order to prevent oxidative corrosion and to improve the wettability of a brazing material for joining various parts. The cylindrical fixing member 5 is a through hole 1a of the container body 1.
Is attached with a low melting point brazing material such as an Au-Sn alloy brazing material.

【0005】上記リード端子3の接合は、基体1にリー
ド端子3の幅または直径より若干大きな直径の貫通孔1
bをあけておき、この貫通孔1bにリング状の封止用ガ
ラス4を介してリード端子3の一端を挿入し、しかる後
封止用ガラス4を加熱溶融し固化させることによって行
われる。また、封止用ガラス4は硼珪酸系ガラス等から
成り、一般に9×10-6/℃程度の線熱膨張係数を有
し、その組成は酸化硼素(B23),酸化珪素(SiO
2),酸化亜鉛(ZnO)等を含むものである。
[0005] The lead terminal 3 is joined to the base 1 by a through hole 1 having a diameter slightly larger than the width or diameter of the lead terminal 3.
In this case, one end of the lead terminal 3 is inserted into the through-hole 1b through the ring-shaped sealing glass 4, and then the sealing glass 4 is heated and melted to be solidified. The sealing glass 4 is made of borosilicate glass or the like and generally has a linear thermal expansion coefficient of about 9 × 10 −6 / ° C., and its composition is boron oxide (B 2 O 3 ), silicon oxide (SiO 2 ).
2 ), zinc oxide (ZnO) and the like.

【0006】[0006]

【発明が解決しようとする課題】しかしながら、上記従
来の光半導体パッケージにおいては、リード端子3の封
止用ガラス4による接合用として硼珪酸系ガラスを使用
していたため、封止用ガラス4によるリード端子3の溶
着の際に、金属から成るリード端子3と基体1との接着
強度が不充分であった。そのため、リード端子3の封止
用ガラス4による接合部で気密性が破れるという問題点
が発生していた。
However, in the above-mentioned conventional optical semiconductor package, since the borosilicate glass is used for joining the lead terminals 3 with the sealing glass 4, the lead made of the sealing glass 4 is used. When the terminals 3 were welded, the bonding strength between the lead terminals 3 made of metal and the base 1 was insufficient. Therefore, there has been a problem that the airtightness is broken at the joint of the lead terminal 3 with the sealing glass 4.

【0007】また、リード端子3等の金属部材を封止用
ガラス4で接着する際の接着強度を向上させるために
は、封止用ガラス4の加熱溶融時の温度、即ち融点を高
く設定して金属部材との濡れ性を良好にし、さらに接合
反応層を十分に作る必要がある。
In order to improve the bonding strength when the metal members such as the lead terminals 3 are bonded with the sealing glass 4, the temperature of the sealing glass 4 at the time of heating and melting, that is, the melting point is set high. Therefore, it is necessary to improve the wettability with the metal member and to sufficiently form a bonding reaction layer.

【0008】しかしながら、上記従来の硼珪酸系ガラス
からなる封止用ガラス4では、融点を高くするとガラス
の粘性が大きく低下しリード端子3を伝わって封止用ガ
ラス4が外部に流れ出し、基体1とリード端子3との接
合部の封止用ガラス4が不足してそこに貫通孔を生じ、
封止直後に気密不良が発生していた。
However, in the conventional sealing glass 4 made of borosilicate glass, when the melting point is increased, the viscosity of the glass is greatly reduced, and the sealing glass 4 flows to the outside through the lead terminals 3 and the base 1 Insufficient sealing glass 4 at the joint between the lead terminal 3 and the lead terminal 3 creates a through hole there,
Improper airtightness occurred immediately after sealing.

【0009】従って、本発明は上記事情に鑑みて完成さ
れたものであり、その目的は、基体1とリード端子3と
の接合を強固とし、光半導体パッケージの内部に収納す
る光半導体素子を長期間にわたり正常かつ安定的に動作
させ得るものとすることである。
Accordingly, the present invention has been completed in view of the above circumstances, and an object of the present invention is to make the bonding between the base 1 and the lead terminals 3 strong and to lengthen the optical semiconductor element housed inside the optical semiconductor package. That is, it can operate normally and stably over a period.

【0010】[0010]

【課題を解決するための手段】本発明の光半導体素子収
納用パッケージは、上面に開口が形成され内部に光半導
体素子を収容するとともに側部に複数の貫通孔が設けら
れた容器本体と、一つの前記貫通孔に挿入固定され、前
記側部の外側端部より光ファイバーが挿入固定される筒
状の金属製固定部材と、該金属製固定部材の内側に挿入
固定されたレンズ部材と、他の前記貫通孔に挿通され、
平均気孔径が3〜15μmかつ気孔率が3〜7%の封止
用ガラスを前記貫通孔に充填することによって接合され
たリード端子と、前記容器本体の上面に取着され、前記
光半導体素子を気密に封止する蓋体とを具備したことを
特徴とする。
According to the present invention, there is provided a package for housing an optical semiconductor device, comprising: a container body having an opening formed in an upper surface for housing the optical semiconductor device therein and having a plurality of through holes formed in side portions; A cylindrical metal fixing member that is inserted and fixed in one of the through holes and an optical fiber is inserted and fixed from the outer end of the side portion, a lens member that is inserted and fixed inside the metal fixing member, and the like. Is inserted through the through hole of
A lead terminal joined by filling the through-hole with a sealing glass having an average pore diameter of 3 to 15 μm and a porosity of 3 to 7%, and the optical semiconductor element attached to an upper surface of the container body; And a lid that hermetically seals the lid.

【0011】本発明は、上記の構成により、基体とリー
ド端子とを封止用ガラスで接合する際の加熱溶融温度を
高温(900℃程度)にしても、封止用ガラス内部に多
数存在する微細な気泡により封止用ガラスの粘度は大き
く低下することはなく、その結果リード端子を伝わって
封止用ガラスが外部に流れ出すことがなく、基体とリー
ド端子との接合部のガラスが不足してそこに貫通孔を生
じるという不具合が解消される。また、基体とリード端
子とを封止用ガラスで接合する際の加熱溶融温度を高温
にすることで、金属部材と封止用ガラスとの濡れ性を良
好にして接合反応層を十分に作ることができ、金属から
成る基体とリード端子とを封止用ガラスを介して強固に
接合させることが可能となり、光半導体パッケージ内部
に収納する光半導体素子を長期間にわたり正常かつ安定
的に作動させることができる。
According to the present invention, a large number of the above-described structures exist inside the sealing glass even when the heating and melting temperature at the time of joining the base and the lead terminal with the sealing glass is high (about 900 ° C.). The viscosity of the sealing glass does not significantly decrease due to the fine bubbles, and as a result, the sealing glass does not flow to the outside through the lead terminal, and the glass at the junction between the base and the lead terminal runs short. The problem that a through hole is formed there is eliminated. In addition, by increasing the heating and melting temperature when joining the base and the lead terminal with the sealing glass, the wettability between the metal member and the sealing glass is improved, and the bonding reaction layer is sufficiently formed. It is possible to firmly join the base made of metal and the lead terminal via the glass for sealing, and to operate the optical semiconductor element housed in the optical semiconductor package normally and stably for a long period of time. Can be.

【0012】本発明において、好ましくは、前記貫通孔
の内表面および前記貫通孔で接合される前記リード端子
の接合部表面のそれぞれの算術平均粗さが0.3〜10
μmであることを特徴とする。これにより、さらに封止
用ガラスによる接合強度が増大する。
In the present invention, preferably, the arithmetic average roughness of the inner surface of the through-hole and the surface of the joint of the lead terminal joined by the through-hole is 0.3 to 10 respectively.
μm. This further increases the bonding strength of the sealing glass.

【0013】[0013]

【発明の実施の形態】本発明の光半導体パッケージにつ
いて以下に説明する。本発明の光半導体パッケージ全体
の基本構成は図1,図2のものと同様であり、50アロ
イ,Fe−Ni−Co合金等の金属材料から成り、その
上面の略中央部にLD,PD等の光半導体素子2を収容
する空所を形成するための開口(凹部)を有する箱状の
容器本体1と、50アロイ,Fe−Ni−Co合金等の
金属部材から成り、容器本体1の側壁の貫通孔1aに挿
入固定され、側壁の外側端部より光ファイバーが挿入固
定されるとともに内側に球状レンズ部材6が封止用ガラ
スを介して接合される筒状の固定部材5と、容器本体1
の上面に取着され、光半導体素子2を気密に封止する蓋
体8とを有して成る。
DESCRIPTION OF THE PREFERRED EMBODIMENTS An optical semiconductor package according to the present invention will be described below. The basic configuration of the entire optical semiconductor package of the present invention is the same as that shown in FIGS. 1 and 2 and is made of a metal material such as 50 alloy, Fe--Ni--Co alloy, and LD, PD, etc. A box-shaped container main body 1 having an opening (recess) for forming a space for accommodating the optical semiconductor element 2 and a metal member such as a 50 alloy, an Fe—Ni—Co alloy, and a side wall of the container main body 1 A cylindrical fixing member 5 into which an optical fiber is inserted and fixed from the outer end of the side wall, and a spherical lens member 6 is bonded inside via a sealing glass;
And a lid 8 hermetically sealing the optical semiconductor element 2.

【0014】また、容器本体1の外側面には、光半導体
素子2と外部電気回路との電気的接続を行うための、5
0アロイ,Fe−Ni−Co合金等の金属からなるリー
ド端子3が、その一端が貫通孔1bに挿入されて硼珪酸
系ガラス等から成る封止用ガラス4を介して溶着され、
リード端子3の前記一端はボンディングワイヤ等を介し
て光半導体素子2の電極に接続される。このリード端子
3の断面形状は、図1に示したような矩形状、または多
角形状、円形状、楕円形状等種々の形状とし得る。
An outer surface of the container main body 1 is provided with an optical semiconductor device 2 and an electric circuit for external connection.
One end of a lead terminal 3 made of a metal such as an alloy 0, an Fe—Ni—Co alloy is inserted into the through hole 1b and welded through a sealing glass 4 made of a borosilicate glass or the like.
The one end of the lead terminal 3 is connected to an electrode of the optical semiconductor element 2 via a bonding wire or the like. The cross-sectional shape of the lead terminal 3 can be various shapes such as a rectangular shape as shown in FIG. 1, a polygonal shape, a circular shape, and an elliptical shape.

【0015】この容器本体1及び固定部材5は、外表面
に酸化腐食を防止するとともに各部接合用のロウ材の濡
れ性を改善するために、厚さ2〜5μm程度のNiメッ
キ層,厚さ1μm以上のAuメッキ層が順次施されてい
る。筒状の固定部材5は容器本体1の貫通孔1aの内側
にAu−Sn合金ロウ材等の低融点の金属ロウ材で取着
されている。
The container body 1 and the fixing member 5 have a Ni plating layer having a thickness of about 2 to 5 μm and a thickness of about 2 to 5 μm in order to prevent oxidative corrosion on the outer surface and to improve the wettability of a brazing material for joining each part. Au plating layers of 1 μm or more are sequentially applied. The cylindrical fixing member 5 is attached to the inside of the through hole 1a of the container body 1 with a low melting point metal brazing material such as an Au-Sn alloy brazing material.

【0016】上記リード端子3の接合は、基体1にリー
ド端子3の幅または直径より若干大きな直径の貫通孔1
bをあけておき、この貫通孔1bにリング状の封止用ガ
ラス4を介してリード端子3の一端を挿通させ、しかる
後封止用ガラス4を加熱溶融し固化させることによって
行われる。なお、図2において、パッケージとは光半導
体パッケージを意味する。
The lead terminal 3 is joined to the base 1 by a through hole 1 having a diameter slightly larger than the width or diameter of the lead terminal 3.
In this case, one end of the lead terminal 3 is inserted into the through hole 1b through the ring-shaped sealing glass 4, and then the sealing glass 4 is heated and melted to be solidified. In FIG. 2, the package means an optical semiconductor package.

【0017】本発明の基体1およびリード端子3は、そ
れらが強固に接合されるためには、貫通孔1bの内表面
およびリード端子3の接合部表面のそれぞれの算術平均
粗さが0.3〜10μmであることが好ましく、0.3
μm未満では、表面が平滑なため溶融した封止用ガラス
4が広がりすぎたり濡れ性が劣化してメニスカスが形成
されにくくなる。その結果接合強度が低下する。算術平
均粗さが10μmを超えると、表面の凹凸が大きくな
り、基体1およびリード端子3の強度が低下し易くな
る。
In order for the base 1 and the lead terminal 3 of the present invention to be firmly bonded, the arithmetic average roughness of each of the inner surface of the through hole 1b and the surface of the joint of the lead terminal 3 is 0.3. -10 μm, preferably 0.3 μm
If it is less than μm, the molten sealing glass 4 spreads too much and the wettability deteriorates due to the smooth surface, so that a meniscus is hardly formed. As a result, the bonding strength decreases. If the arithmetic average roughness exceeds 10 μm, the unevenness of the surface becomes large, and the strengths of the base 1 and the lead terminals 3 tend to decrease.

【0018】上記のように基体1およびリード端子3の
接合部表面を粗面化(凹凸化)するには、それらの接合
部表面に厚さ1〜5μm程度の酸化層を形成するのがよ
い。1μm未満では、酸化層が薄すぎるため封止用ガラ
ス4との反応層が薄くなり、強固な接合ができなくな
る。5μmを超えると、強度の弱い酸化層が反応層に残
存し、反応層自体の強度が低下する。
In order to roughen the surface of the joint between the base 1 and the lead terminal 3 (roughness) as described above, it is preferable to form an oxide layer having a thickness of about 1 to 5 μm on the surface of the joint. . If the thickness is less than 1 μm, the oxide layer is too thin, so that the reaction layer with the sealing glass 4 becomes thin, so that strong bonding cannot be performed. If it exceeds 5 μm, an oxide layer having a low strength remains in the reaction layer, and the strength of the reaction layer itself decreases.

【0019】上記基体1およびリード端子3の接合部表
面の酸化層は、500〜600℃の酸化雰囲気中で10
〜20分程度予め熱処理するといった方法により形成し
得る。
The oxide layer on the surface of the joint between the substrate 1 and the lead terminal 3 is formed in an oxidizing atmosphere at 500 to 600 ° C.
It can be formed by a method of performing a heat treatment in advance for about 20 minutes.

【0020】本発明において、容器本体1は図1のよう
な一体的に構成された箱状のものに限らず、板状の基体
(底板)と、その基体上面の周縁部に光半導体素子2を
囲むように接合された枠体とから構成されていてもよ
い。また、レンズ部材としては、球状レンズ部材6以外
に半球状レンズ部材,非球面状レンズ部材,ロッド状レ
ンズ部材等種々のものが使用し得る。
In the present invention, the container body 1 is not limited to an integrally formed box-shaped one as shown in FIG. 1, but a plate-shaped base (bottom plate) and an optical semiconductor element 2 provided on the peripheral edge of the upper surface of the base. And a frame joined so as to surround the frame. As the lens member, in addition to the spherical lens member 6, various members such as a hemispherical lens member, an aspherical lens member, and a rod-shaped lens member can be used.

【0021】また、本発明では、リード端子3を基体1
の貫通孔1aに接合させる多孔質の封止用ガラス4は以
下のようにして作製される。平均粒径2〜5μm(最大
粒径70μm程度)の硼珪酸系ガラス等の粉末を、適当
な有機樹脂バインダ,溶剤等に混合し造粒後、リング状
となるように型に充填してプレス成型し、成形体を作製
する。その成形体を500〜600℃で仮焼し、有機樹
脂バインダ成分を除去した後、基体1の貫通孔1aにリ
ング状の封止用ガラス4を挿入設置し、その中心孔にリ
ード端子3の一端を挿入させて組み込む。次に、900
℃程度の温度で封止用ガラス4を加熱溶融させることに
より、3〜15μm程度の平均気孔径を有し、かつ気孔
率(封止用ガラス4中のボイド面積比率)が3〜7%の
多孔質の封止用ガラス4と成る。
In the present invention, the lead terminal 3 is connected to the base 1.
The porous sealing glass 4 to be bonded to the through hole 1a is manufactured as follows. A powder such as borosilicate glass having an average particle size of 2 to 5 μm (maximum particle size of about 70 μm) is mixed with an appropriate organic resin binder, a solvent, and the like, granulated, filled into a mold so as to form a ring, and pressed. It is molded to produce a molded body. After the molded body is calcined at 500 to 600 ° C. to remove the organic resin binder component, a ring-shaped sealing glass 4 is inserted into the through hole 1 a of the base 1, and the lead terminal 3 is inserted into the center hole. Insert and insert one end. Next, 900
By heating and melting the sealing glass 4 at a temperature of about 0 ° C., the sealing glass 4 has an average pore diameter of about 3 to 15 μm and a porosity (a void area ratio in the sealing glass 4) of 3 to 7%. The result is a porous sealing glass 4.

【0022】封止用ガラス4の平均気孔径が3μm未満
では、封止用ガラス4の高温(900℃程度)での流動
性が高くなり、即ちガラスの粘度が低下して、基体1の
貫通孔1aとリード端子3との接合部の気密封止が困難
となる。一方、15μmを超えると、封止用ガラス4の
強度が低下して気密封止の信頼性が低下する。
When the average pore diameter of the sealing glass 4 is less than 3 μm, the fluidity of the sealing glass 4 at a high temperature (about 900 ° C.) becomes high, that is, the viscosity of the glass decreases and the penetration of the base 1 It becomes difficult to hermetically seal the joint between the hole 1a and the lead terminal 3. On the other hand, if it exceeds 15 μm, the strength of the sealing glass 4 decreases, and the reliability of hermetic sealing decreases.

【0023】封止用ガラス4の気孔率が3%未満では、
封止用ガラス4の高温(900℃程度)での流動性が高
くなり、即ちガラスの粘度が低下して、基体1の貫通孔
1aとリード端子3との接合部の気密封止が困難とな
る。一方、7%を超えると、封止用ガラス4の強度が低
下して気密封止の信頼性が低下する。
If the porosity of the sealing glass 4 is less than 3%,
The fluidity of the sealing glass 4 at a high temperature (about 900 ° C.) increases, that is, the viscosity of the glass decreases, and it is difficult to hermetically seal the joint between the through hole 1 a of the base 1 and the lead terminal 3. Become. On the other hand, if it exceeds 7%, the strength of the sealing glass 4 decreases, and the reliability of hermetic sealing decreases.

【0024】上記平均気孔径および気孔率は、溶着後の
封止用ガラス4の断面写真を観察し実測することにより
特定できる。
The above average pore diameter and porosity can be specified by observing a cross-sectional photograph of the sealing glass 4 after welding and actually measuring it.

【0025】また、封止用ガラス4の上下方向での厚さ
(高さ)d(図2)は、光半導体パッケージのサイズ、
構造にもよるが、0.1〜1.0mm程度がよく、0.
1mm未満では、封止用ガラス4の流動性が低下して溶
着が不充分となり接合強度が低下する。1.0mmを超
えると、接合部の機械的強度が低下し易くなる。
The thickness (height) d (FIG. 2) of the sealing glass 4 in the vertical direction is determined by the size of the optical semiconductor package,
Although it depends on the structure, it is preferably about 0.1 to 1.0 mm.
If it is less than 1 mm, the fluidity of the sealing glass 4 is reduced, the welding is insufficient, and the bonding strength is reduced. If it exceeds 1.0 mm, the mechanical strength of the joint tends to decrease.

【0026】本発明の封止用ガラス4は硼珪酸系ガラス
(軟化点700℃程度)等から成り、硼珪酸系ガラスの
場合その組成および組成範囲は、酸化珪素(SiO2
を55〜65重量%、酸化硼素(B23)を18〜28
重量%、酸化ナトリウムを4〜10重量%、酸化アルミ
ニウムを2〜8重量%、酸化カリウムを1〜6重量%、
酸化リチウムを1〜6重量%、酸化バリウムを0.5〜
3重量%含むものである。
The sealing glass 4 of the present invention is made of borosilicate glass (softening point: about 700 ° C.). In the case of borosilicate glass, its composition and composition range are silicon oxide (SiO 2 ).
55 to 65 wt%, boron oxide and (B 2 O 3) 18~28
% By weight, 4 to 10% by weight of sodium oxide, 2 to 8% by weight of aluminum oxide, 1 to 6% by weight of potassium oxide,
Lithium oxide 1-6 wt%, barium oxide 0.5-
It contains 3% by weight.

【0027】上記組成範囲としたのは以下の理由によ
る。酸化珪素が55重量%未満では、封止用ガラス4の
耐薬品性が劣化し、気密封止の信頼性が低下する。酸化
珪素が65重量%を超える場合、封止用ガラス4の軟化
溶融温度が高くなり、組み立て工程で金属部材の酸化が
進行し製品強度が低下する。
The reason for setting the above composition range is as follows. If the silicon oxide content is less than 55% by weight, the chemical resistance of the sealing glass 4 deteriorates, and the reliability of hermetic sealing decreases. If the silicon oxide content exceeds 65% by weight, the softening and melting temperature of the sealing glass 4 increases, and the oxidation of the metal member proceeds in the assembling process, thereby lowering the product strength.

【0028】酸化硼素が18重量%未満では、封止用ガ
ラス4の軟化溶融温度が高くなり、組み立て工程で金属
部材の酸化が進行し製品強度が低下する。酸化硼素が2
8重量%を超えると、封止用ガラス4の耐薬品性が劣化
し、気密封止の信頼性が低下する。
When the content of boron oxide is less than 18% by weight, the softening and melting temperature of the sealing glass 4 becomes high, and the oxidation of the metal member proceeds in the assembling process, thereby lowering the product strength. Boron oxide is 2
When the content exceeds 8% by weight, the chemical resistance of the sealing glass 4 is deteriorated, and the reliability of hermetic sealing is reduced.

【0029】酸化ナトリウムが4重量%未満では、封止
用ガラス4の軟化溶融温度が高くなり、組み立て工程で
金属部材の酸化が進行し製品強度が低下する。酸化ナト
リウムが10重量%を超えると、封止用ガラス4の耐薬
品性が劣化し、気密封止の信頼性が低下する。
If the content of sodium oxide is less than 4% by weight, the softening and melting temperature of the sealing glass 4 becomes high, and the oxidation of the metal member proceeds in the assembling process, and the product strength decreases. If the content of sodium oxide exceeds 10% by weight, the chemical resistance of the glass for sealing 4 deteriorates, and the reliability of hermetic sealing decreases.

【0030】酸化アルミニウムが2重量%未満では、封
止用ガラス4の耐薬品性が劣化し、気密封止の信頼性が
低下する。酸化アルミニウムが8重量%を超えると、封
止用ガラス4の軟化溶融温度が高くなり、組み立て工程
で金属部材の酸化が進行し製品強度が低下する。
If the content of aluminum oxide is less than 2% by weight, the chemical resistance of the sealing glass 4 is deteriorated, and the reliability of hermetic sealing is reduced. If the aluminum oxide content exceeds 8% by weight, the softening and melting temperature of the sealing glass 4 increases, and the oxidation of the metal member proceeds in the assembling process, resulting in a reduction in product strength.

【0031】酸化カリウムが1重量%未満では、封止用
ガラス4の軟化溶融温度が高くなり、組み立て工程で金
属部材の酸化が進行し製品強度が低下する。酸化カリウ
ムが6重量%を超えると、封止用ガラス4の耐薬品性が
劣化し、気密封止の信頼性が低下する。
When the content of potassium oxide is less than 1% by weight, the softening and melting temperature of the sealing glass 4 becomes high, and the oxidation of the metal member proceeds in the assembling process, thereby lowering the product strength. If the content of potassium oxide exceeds 6% by weight, the chemical resistance of the sealing glass 4 deteriorates, and the reliability of hermetic sealing decreases.

【0032】酸化リチウムが1重量%未満では、封止用
ガラス4の軟化溶融温度が高くなり、組み立て工程で金
属部材の酸化が進行し製品強度が低下する。酸化リチウ
ムが6重量%を超えると、封止用ガラス4の耐薬品性が
劣化し、気密封止の信頼性が低下する。
When the content of lithium oxide is less than 1% by weight, the softening and melting temperature of the sealing glass 4 becomes high, and the oxidation of the metal member proceeds in the assembling process, thereby lowering the product strength. If the lithium oxide content exceeds 6% by weight, the chemical resistance of the sealing glass 4 deteriorates, and the reliability of hermetic sealing decreases.

【0033】酸化バリウムが0.5重量%未満では、封
止用ガラス4の軟化溶融温度が高くなり、組み立て工程
で金属部材の酸化が進行し製品強度が低下する。酸化バ
リウムが3重量%を超えると、封止用ガラス4の耐薬品
性が劣化し、気密封止の信頼性が低下する。
When the barium oxide content is less than 0.5% by weight, the softening and melting temperature of the sealing glass 4 becomes high, and the oxidation of the metal member proceeds in the assembling process, thereby lowering the product strength. If the content of barium oxide exceeds 3% by weight, the chemical resistance of the sealing glass 4 deteriorates, and the reliability of hermetic sealing decreases.

【0034】さらに、封止用ガラス4として上記硼珪酸
系ガラス以外のものでもよいが、酸化鉛(PbO)を含
むガラスはリード端子3の接合後のNiメッキ層,Au
メッキ層の半田濡れ性等の特性が劣化するため、酸化鉛
を含まないガラスが好適である。
Further, the sealing glass 4 may be other than the borosilicate glass, but the glass containing lead oxide (PbO) may be made of Ni plating layer after the lead terminal 3 is bonded, Au
Glass that does not contain lead oxide is preferable because the properties such as solder wettability of the plating layer deteriorate.

【0035】かくして、本発明は、封止用ガラスの加熱
溶融温度を高温(900℃程度)にしても、封止用ガラ
ス内部に多数存在する微細な気泡により封止用ガラスの
粘度は大きく低下することはなく、その結果リード端子
を伝わって封止用ガラスが外部に流れ出すことがなく、
基体とリード端子との接合部のガラスが不足してそこに
貫通孔を生じるという不具合が解消される。また、封止
用ガラスの加熱溶融温度を高温にすることで、金属部材
と封止用ガラスとの濡れ性を良好にして接合反応層を十
分に作ることができ、金属から成る基体とリード端子と
を封止用ガラスを介して強固に接合させることが可能と
なり、光半導体素子を長期間にわたり正常かつ安定的に
作動させることができる。
Thus, according to the present invention, even if the melting temperature of the sealing glass is set to a high temperature (about 900 ° C.), the viscosity of the sealing glass is greatly reduced due to a large number of fine bubbles inside the sealing glass. The result is that the sealing glass does not flow outside through the lead terminals,
This eliminates the problem that the glass at the joint between the base and the lead terminal is insufficient and a through hole is formed there. In addition, by increasing the heat melting temperature of the sealing glass, the wettability between the metal member and the sealing glass can be improved, and the bonding reaction layer can be sufficiently formed. Can be firmly joined via the sealing glass, and the optical semiconductor element can be normally and stably operated for a long period of time.

【0036】本発明において、金属部材と封止用ガラス
との上記接合反応層は、金属部材表面から1μm以上の
厚さで形成されていることが好ましく、1μm未満では
接合強度が劣化する。
In the present invention, the bonding reaction layer between the metal member and the sealing glass is preferably formed with a thickness of 1 μm or more from the surface of the metal member, and if it is less than 1 μm, the bonding strength is deteriorated.

【0037】なお、本発明は上記実施形態に限定される
ものではなく、その要旨を逸脱しない範囲内で種々の変
更を行っても何ら差し支えない。
The present invention is not limited to the above-described embodiment, and various changes may be made without departing from the scope of the present invention.

【0038】[0038]

【発明の効果】本発明は、容器本体の貫通孔に一端が挿
入され封止用ガラスを介して接合されたリード端子を具
備する光半導体パッケージにおいて、封止用ガラスは、
平均気孔径が3〜15μmかつ気孔率が3〜7%の多孔
質ガラスから成ることにより、封止用ガラスの加熱溶融
温度を高温(900℃程度)にしても、封止用ガラス内
部に多数存在する微細な気泡により封止用ガラスの粘度
は大きく低下することはなく、その結果リード端子を伝
わって封止用ガラスが外部に流れ出すことがなく、基体
とリード端子との接合部のガラスが不足してそこに貫通
孔を生じるという不具合が解消される。また、封止用ガ
ラスの加熱溶融温度を高温にすることで、金属部材と封
止用ガラスとの濡れ性を良好にして接合反応層を十分に
作ることができ、金属から成る基体とリード端子とを封
止用ガラスを介して強固に接合させることが可能とな
り、光半導体素子を長期間にわたり正常かつ安定的に作
動させることができる。
According to the present invention, there is provided an optical semiconductor package having a lead terminal, one end of which is inserted into a through hole of a container body and which is joined via a glass for sealing.
The porous glass having an average pore diameter of 3 to 15 μm and a porosity of 3 to 7% allows a large number of particles to be formed inside the sealing glass even when the heating and melting temperature of the sealing glass is high (about 900 ° C.). The viscosity of the sealing glass does not significantly decrease due to the fine bubbles that are present, and as a result, the sealing glass does not flow to the outside through the lead terminal, and the glass at the joint between the base and the lead terminal is reduced. The problem of shortage and the formation of a through hole there is eliminated. In addition, by increasing the heat melting temperature of the sealing glass, the wettability between the metal member and the sealing glass can be improved, and the bonding reaction layer can be sufficiently formed. Can be firmly joined via the sealing glass, and the optical semiconductor element can be normally and stably operated for a long period of time.

【0039】また本発明は、好ましくは、貫通孔の内表
面および貫通孔で接合されるリード端子の接合部表面の
それぞれの算術平均粗さが0.3〜10μmであること
により、さらに封止用ガラスによる接合強度が増大す
る。
Further, the present invention preferably further provides a sealing device in which the arithmetic average roughness of each of the inner surface of the through-hole and the surface of the joint of the lead terminal joined by the through-hole is 0.3 to 10 μm. The bonding strength of the glass for use increases.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の光半導体パッケージを示し、(a)は
光半導体パッケージの斜視図、(b)は光半導体パッケ
ージの断面図である。
1A and 1B show an optical semiconductor package of the present invention, wherein FIG. 1A is a perspective view of the optical semiconductor package, and FIG. 1B is a cross-sectional view of the optical semiconductor package.

【図2】本発明のリード端子の接合部の断面図である。FIG. 2 is a cross-sectional view of a joint of a lead terminal according to the present invention.

【符号の説明】[Explanation of symbols]

1:容器本体 2:光半導体素子 3:リード端子 4:封止用ガラス 5:固定部材 6:球状レンズ部材 8:蓋体 1: container body 2: optical semiconductor element 3: lead terminal 4: sealing glass 5: fixing member 6: spherical lens member 8: lid

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】上面に開口が形成され内部に光半導体素子
を収容するとともに側部に複数の貫通孔が設けられた容
器本体と、一つの前記貫通孔に挿入固定され、前記側部
の外側端部より光ファイバーが挿入固定される筒状の金
属製固定部材と、該金属製固定部材の内側に挿入固定さ
れたレンズ部材と、他の前記貫通孔に挿通され、平均気
孔径が3〜15μmかつ気孔率が3〜7%の封止用ガラ
スを前記貫通孔に充填することによって接合されたリー
ド端子と、前記容器本体の上面に取着され、前記光半導
体素子を気密に封止する蓋体とを具備したことを特徴と
する光半導体素子収納用パッケージ。
1. A container body having an opening formed in an upper surface and accommodating an optical semiconductor element therein and having a plurality of through-holes formed in a side portion, and being inserted and fixed in one of the through-holes, and being outside the side portion. A cylindrical metal fixing member into which an optical fiber is inserted and fixed from the end, a lens member inserted and fixed inside the metal fixing member, and the other through-hole, which has an average pore diameter of 3 to 15 μm A lead terminal joined by filling the through-hole with sealing glass having a porosity of 3 to 7%, and a lid attached to an upper surface of the container body and hermetically sealing the optical semiconductor element. And a package for housing an optical semiconductor element.
【請求項2】前記貫通孔の内表面および前記貫通孔で接
合される前記リード端子の接合部表面のそれぞれの算術
平均粗さが0.3〜10μmであることを特徴とする請
求項1記載の光半導体素子収納用パッケージ。
2. The arithmetic mean roughness of each of an inner surface of said through hole and a surface of a joint of said lead terminal joined by said through hole is 0.3 to 10 μm. Package for storing optical semiconductor elements.
JP2000087322A 2000-03-27 2000-03-27 Package for housing optical semiconductor element Pending JP2001274498A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000087322A JP2001274498A (en) 2000-03-27 2000-03-27 Package for housing optical semiconductor element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000087322A JP2001274498A (en) 2000-03-27 2000-03-27 Package for housing optical semiconductor element

Publications (1)

Publication Number Publication Date
JP2001274498A true JP2001274498A (en) 2001-10-05

Family

ID=18603350

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000087322A Pending JP2001274498A (en) 2000-03-27 2000-03-27 Package for housing optical semiconductor element

Country Status (1)

Country Link
JP (1) JP2001274498A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005108689A (en) * 2003-09-30 2005-04-21 Kyocera Corp Glass for seal, electrochemical ceramic element unit, and manufacturing method of electrochemical ceramic element unit
JP2011151252A (en) * 2010-01-22 2011-08-04 Tdk Corp Electronic component
CN114388991A (en) * 2020-10-20 2022-04-22 泰星能源解决方案有限公司 Secondary battery

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005108689A (en) * 2003-09-30 2005-04-21 Kyocera Corp Glass for seal, electrochemical ceramic element unit, and manufacturing method of electrochemical ceramic element unit
JP4537031B2 (en) * 2003-09-30 2010-09-01 京セラ株式会社 Electrochemical ceramic element unit and method for producing electrochemical ceramic element unit
JP2011151252A (en) * 2010-01-22 2011-08-04 Tdk Corp Electronic component
CN114388991A (en) * 2020-10-20 2022-04-22 泰星能源解决方案有限公司 Secondary battery

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