JP2000277758A - Manufacture of package for housing optical semiconductor element - Google Patents

Manufacture of package for housing optical semiconductor element

Info

Publication number
JP2000277758A
JP2000277758A JP11080523A JP8052399A JP2000277758A JP 2000277758 A JP2000277758 A JP 2000277758A JP 11080523 A JP11080523 A JP 11080523A JP 8052399 A JP8052399 A JP 8052399A JP 2000277758 A JP2000277758 A JP 2000277758A
Authority
JP
Japan
Prior art keywords
fixing member
base
metal fixing
semiconductor element
optical semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11080523A
Other languages
Japanese (ja)
Other versions
JP3764599B2 (en
Inventor
Takashi Sawai
隆 澤井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP08052399A priority Critical patent/JP3764599B2/en
Priority to US09/535,288 priority patent/US6420205B1/en
Publication of JP2000277758A publication Critical patent/JP2000277758A/en
Application granted granted Critical
Publication of JP3764599B2 publication Critical patent/JP3764599B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched

Landscapes

  • Semiconductor Lasers (AREA)
  • Light Receiving Elements (AREA)
  • Led Device Packages (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a manufacturing method for a package to house an optical semiconductor element, in which a cylindrical fixing member is brazed and attached firmly to a base body and whose reliability is made extremely high. SOLUTION: A cylindrical metal fixing member 8, to which an optical fiber member is connected, is brazed and attached to a base body 1 in which an optical semiconductor element 3 is housed. At this time, the metal fixing member 8 is removed, in which a nickel-plated layer 12 and a gold-plated layer 13 are applied sequentially to the surface and to which a trunsmissive member 9 is attached at the inside via a glass 14 is heated and treated in a reduced atmosphere, and nickel oxide which is formed on the surface of the gold-plated layer 13.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は光半導体素子を収容
するための光半導体素子収納用パッケージに関するもの
である。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical semiconductor element housing package for housing an optical semiconductor element.

【0002】[0002]

【従来の技術】従来、光半導体素子を収容するための光
半導体素子収納用パッケージは、一般に酸化アルミニウ
ム質焼結体等のセラミックス材から成り、上面に光半導
体素子を収容するための凹部を有する基体と、該基体の
側部に形成された貫通孔と、前記基体の貫通孔周辺の外
表面にロウ付け取着され、内部に光信号が伝達される空
間を有する鉄ーニッケル合金(鉄:50重量%、ニッケ
ル:50重量%)等の金属材料から成る筒状の固定部材
と、前記筒状固定部材の内部にガラスを介して取着され
た筒状固定部材の内部を塞ぐ透光性部材と、前記基体の
凹部内側から外表面にかけて被着導出されているタング
ステンやモリブデン、マンガン等から成り、光半導体素
子の電極がボンディングワイヤ等の電気的接続手段を介
して接続される複数個の配線導体層と、前記基体の上面
に取着され、前記凹部を塞ぐ蓋体とから構成されてお
り、前記基体の凹部内に光半導体素子をガラス、樹脂、
ロウ材等の接着剤を介して接着固定するとともに該光半
導体素子の各電極をボンディングワイヤ等の電気的接続
手段を介して配線導体層に電気的に接続し、しかる後、
前記基体の上面に蓋体をガラス、樹脂、ロウ材等から成
る封止材を介して接合させ、基体と蓋体とから成る容器
内部に光半導体素子を気密に収容するとともに筒状固定
部材に光ファイバー部材をYAG等のレーザー光線を使
用して溶接接続させることによって製品としての光半導
体装置となる。
2. Description of the Related Art Conventionally, an optical semiconductor element housing package for housing an optical semiconductor element is generally made of a ceramic material such as an aluminum oxide sintered body and has a concave portion for housing the optical semiconductor element on an upper surface. An iron-nickel alloy (iron: 50) which has a base, a through hole formed in a side portion of the base, and a space which is brazed and attached to an outer surface around the through hole of the base and has a space for transmitting an optical signal therein. (Weight%, nickel: 50% by weight) or the like, and a translucent member for closing the inside of the cylindrical fixing member attached to the inside of the cylindrical fixing member via glass. And tungsten, molybdenum, manganese, etc., which are attached and led from the inside of the concave portion to the outer surface of the base, and the electrodes of the optical semiconductor element are connected via electrical connection means such as bonding wires. Pieces of the wiring conductor layer, is attached to the upper surface of the substrate, are composed of a lid for closing said recess, glass optical semiconductor elements in a recess of the base body resin,
Each electrode of the optical semiconductor element is electrically connected to a wiring conductor layer via an electrical connection means such as a bonding wire while being fixedly adhered through an adhesive such as a brazing material, and thereafter,
A lid is bonded to the upper surface of the base via a sealing material made of glass, resin, brazing material, or the like, and the optical semiconductor element is hermetically accommodated inside a container formed of the base and the lid, and is attached to the cylindrical fixing member. An optical semiconductor device as a product is obtained by welding and connecting the optical fiber member using a laser beam such as YAG.

【0003】かかる光半導体装置は外部電気回路から供
給される駆動信号に基づいて光半導体素子に所定の光励
起を起こさせ、該励起した光を透光性部材を介し光ファ
イバー部材に授受させるとともに該光ファイバー部材の
光ファイバー内を伝達させることによって高速通信等に
使用される。
In such an optical semiconductor device, a predetermined optical excitation is caused in an optical semiconductor element based on a drive signal supplied from an external electric circuit, and the excited light is transmitted to and received from an optical fiber member through a light transmitting member. It is used for high-speed communication and the like by transmitting the light through the optical fiber of the member.

【0004】また上述の光半導体素子収納用パッケージ
は、筒状固定部材の基体へのロウ付け取着が下記の方法
によって行われている。即ち、 (1)まず筒状固定部材の表面に、基体へのロウ付け取
着を確実、強固とするためにニッケルめっき層及び金め
っき層を順次被着させる。
In the above-mentioned package for housing an optical semiconductor element, the cylindrical fixing member is brazed to the base by the following method. That is, (1) First, a nickel plating layer and a gold plating layer are sequentially applied on the surface of the cylindrical fixing member in order to securely and firmly attach to the base by brazing.

【0005】前記ニッケルめっき層は筒状固定部材への
金めっき層の被着を強固とするための下地部材であり、
電解めっき法や無電解めっき法を採用することによって
筒状固定部材の外表面に約0.5〜5μmの厚みに被着
される。
The nickel plating layer is a base member for firmly attaching the gold plating layer to the cylindrical fixing member,
By adopting the electrolytic plating method or the electroless plating method, it is attached to the outer surface of the cylindrical fixing member to a thickness of about 0.5 to 5 μm.

【0006】また前記金めっき層は筒状固定部材に対す
るロウ材の濡れ性を良好とする作用をなし、電解めっき
法や無電解めっき法を採用することによってニッケルめ
っき層上に約1〜3μmの厚みに被着される。
The gold plating layer has an effect of improving the wettability of the brazing material to the cylindrical fixing member, and is formed on the nickel plating layer by an electrolytic plating method or an electroless plating method. Deposited in thickness.

【0007】(2)次に前記筒状固定部材の内部に透光
性部材をガラスを介して取着し、筒状固定部材の内部を
塞ぐ。
(2) Next, a translucent member is attached to the inside of the cylindrical fixing member via glass, and the inside of the cylindrical fixing member is closed.

【0008】前記筒状固定部材への透光性部材の取着は
筒状固定部材の内部に透光性部材の融点より低い融点を
有する、例えば、低融点ハンダガラスを塗布するととも
に該塗布した低融点ハンダガラス上に透光性部材を載置
し、しかる後、これを大気中、約450℃の温度に加熱
し、低融点ガラスを溶融させることによって行われる。
The light-transmitting member is attached to the cylindrical fixing member by applying a low-melting point solder glass having a melting point lower than the melting point of the light-transmitting member, for example, to the inside of the cylindrical fixing member. This is performed by placing a light-transmissive member on low-melting-point solder glass and then heating it to a temperature of about 450 ° C. in air to melt the low-melting-point glass.

【0009】(3)そして最後に前記基体の貫通孔周辺
の外表面に金―錫合金等からなる低融点ロウ材を介して
筒状固定部材をロウ付け取着し、これによって製品とし
ての光半導体素子収納用パッケージが完成する。
(3) Finally, a cylindrical fixing member is brazed and attached to the outer surface of the substrate around the through hole through a low melting point brazing material made of a gold-tin alloy or the like. The package for housing the semiconductor element is completed.

【0010】前記基体への筒状固定部材のロウ付けは基
体の貫通孔周辺の外表面に筒状固定部材を、間に金―錫
合金(金:80重量%、錫:20重量%)等からなる低
融点ロウ材を挟んで載置し、しかる後、これを約300
℃の温度に加熱し、低融点ロウ材を溶融させることによ
って行われる。
[0010] The cylindrical fixing member is brazed to the base by mounting the cylindrical fixing member on the outer surface around the through-hole of the base, with a gold-tin alloy (gold: 80% by weight, tin: 20% by weight) or the like. Is placed with a low melting point brazing material consisting of
It is performed by heating to a temperature of ° C. to melt the low melting point brazing material.

【0011】[0011]

【発明が解決しようとする課題】しかしながら、この従
来の光半導体素子収納用パッケージの製造方法において
は、筒状固定部材の内部に透光性部材をガラスを介して
取着させる際、ガラス付けの熱及び雰囲気によって筒状
固定部材の外表面に被着されているニッケルめっき層の
一部が金めっき層中を拡散するとともに金めっき層表面
に露出し、これが酸化されて金めっき層表面に酸化ニッ
ケルが多量に形成されていまい、その結果、前記酸化ニ
ッケルはロウ材との濡れ性が悪いことから筒状固定部材
に対するロウ材の接合強度が大幅に低下し、基体に筒状
固定部材を強固にロウ付け取着することができないとい
う欠点を有していた。
However, in this conventional method of manufacturing a package for housing an optical semiconductor element, when a light-transmitting member is attached to the inside of a cylindrical fixing member via glass, the glass is attached. Due to heat and atmosphere, part of the nickel plating layer adhered to the outer surface of the cylindrical fixing member diffuses in the gold plating layer and is exposed on the gold plating layer surface, and is oxidized and oxidized on the gold plating layer surface. A large amount of nickel may be formed. As a result, since the nickel oxide has poor wettability with the brazing material, the joining strength of the brazing material to the cylindrical fixing member is significantly reduced, and the cylindrical fixing member is firmly attached to the base. Has the disadvantage that it cannot be brazed and attached.

【0012】そこで上記欠点を解消するために筒状固定
部材の内部に透光性部材をガラスを介して取着させた後
に筒状固定部材の表面にニッケルめっき層及び金めっき
層を順次被着させることが考えられる。
In order to solve the above-mentioned drawback, a translucent member is attached to the inside of the cylindrical fixing member via glass, and then a nickel plating layer and a gold plating layer are sequentially deposited on the surface of the cylindrical fixing member. It is possible to make it.

【0013】しかしながら、前記筒状固定部材の内部に
透光性部材を取着させるガラスは低融点ハンダガラスで
あり、該低融点ハンダガラスは耐薬品性に劣ることから
筒状固定部材の内部に透光性部材をガラスを介して取着
させた後、筒状固定部材の表面にニッケルめっき層及び
金めっき層を被着させるとガラスがめっき液の薬品によ
って溶け、その結果、透光性部材が筒状固定部材より外
れてしまうという欠点が誘発される。
However, the glass for attaching the translucent member inside the cylindrical fixing member is a low melting point solder glass, and since the low melting point solder glass is inferior in chemical resistance, the glass is fixed inside the cylindrical fixing member. After attaching the translucent member via the glass, and then applying a nickel plating layer and a gold plating layer on the surface of the cylindrical fixing member, the glass is melted by the chemical of the plating solution, and as a result, the translucent member Is detached from the cylindrical fixing member.

【0014】本発明は上記欠点に鑑み案出されたもの
で、その目的は基体に筒状固定部材を強固にロウ付け取
着し、信頼性を極めて高いものとなした光半導体素子収
納用パッケージの製造方法を提供することにある。
SUMMARY OF THE INVENTION The present invention has been devised in view of the above-mentioned drawbacks, and has as its object to provide a highly reliable optical semiconductor device housing package in which a cylindrical fixing member is firmly brazed and attached to a base. It is to provide a manufacturing method of.

【0015】[0015]

【課題を解決するための手段】本発明は、上面に光半導
体素子を収容するための凹部を有する基体と、該基体の
側部に形成された貫通孔と、前記基体の貫通孔周辺の外
表面にロウ付けされ、一端に光ファイバー部材が接続さ
れる筒状の金属製固定部材と、前記筒状の金属製固定部
材の内部に取着され、金属製固定部材の内部を塞ぐ透光
性部材と、前記基体の上面に取着され、前記凹部を塞ぐ
蓋体とから成る光半導体素子収納用パッケージであっ
て、前記筒状の金属製固定部材が下記(a)乃至(d)
の工程によって基体の貫通孔周辺の外表面にロウ付けさ
れていることを特徴とするものである。
According to the present invention, there is provided a base having a concave portion for accommodating an optical semiconductor element on an upper surface, a through hole formed in a side portion of the base, and an outer portion around the through hole of the base. A cylindrical metal fixing member brazed to the surface and having one end connected to an optical fiber member; and a translucent member attached to the inside of the cylindrical metal fixing member and closing the inside of the metal fixing member. And a lid attached to the upper surface of the base and closing the recess, wherein the cylindrical metal fixing member is formed of the following (a) to (d).
Is brazed to the outer surface around the through-hole of the substrate by the step of.

【0016】(a)筒状の金属製固定部材の表面にニッ
ケルめっき層と金めっき層を順次被着させる工程と、
(b)金属製固定部材の内部に透光性部材をガラスを介
して取着する工程と、(c)金属製固定部材を還元雰囲
気中で加熱処理する工程と、(d)金属製固定部材を基
体の貫通孔周辺の外表面にロウ材を介してロウ付け取着
する工程。
(A) a step of sequentially depositing a nickel plating layer and a gold plating layer on the surface of a cylindrical metal fixing member;
(B) attaching a translucent member to the inside of the metal fixing member via glass; (c) heating the metal fixing member in a reducing atmosphere; and (d) metal fixing member. And brazing the outer surface around the through-hole of the base through a brazing material.

【0017】本発明の光半導体素子収納用パッケージの
製造方法によれば、金属製固定部材に透光性部材をガラ
スを介して取着した後、金属製固定部材を還元雰囲気中
で加熱処理するため金めっき層の表面に下地のニッケル
めっき層の拡散および酸化によってロウ材と濡れ性が悪
い酸化ニッケルが多量に形成されているとしても該酸化
ニッケルは還元によって完全に除去されることとなり、
その結果、筒状の金属製固定部材に対するロウ材の接合
強度が大幅に向上し、基体に筒状の金属製固定部材を極
めて強固にロウ付け取着することができる。
According to the method of manufacturing a package for housing an optical semiconductor element of the present invention, after a translucent member is attached to a metal fixing member via glass, the metal fixing member is heated in a reducing atmosphere. Therefore, even if a large amount of nickel oxide having poor wettability with the brazing material is formed on the surface of the gold plating layer by diffusion and oxidation of the underlying nickel plating layer, the nickel oxide is completely removed by reduction,
As a result, the joining strength of the brazing material to the cylindrical metal fixing member is greatly improved, and the cylindrical metal fixing member can be extremely firmly brazed and attached to the base.

【0018】[0018]

【発明の実施の形態】次に、本発明を添付図面に基づき
詳細に説明する。図1乃至図4は本発明の製造方法によ
って作製された光半導体素子収納用パッケージの一実施
例を示し、1は基体、2は蓋体である。この基体1と蓋
体2とで内部に光半導体素子3を収容するための容器が
構成される。
Next, the present invention will be described in detail with reference to the accompanying drawings. 1 to 4 show an embodiment of an optical semiconductor element housing package manufactured by the manufacturing method of the present invention, wherein 1 is a base, and 2 is a lid. The base 1 and the lid 2 constitute a container for housing the optical semiconductor element 3 therein.

【0019】前記基体1はその上面に光半導体素子3を
収容するための空所を形成する凹部1aが設けてあり、
該凹部1a底面には光半導体素子3が搭載固定される。
The base 1 is provided on its upper surface with a concave portion 1a forming a space for accommodating the optical semiconductor element 3,
The optical semiconductor element 3 is mounted and fixed on the bottom surface of the concave portion 1a.

【0020】前記基体1は、例えば、酸化アルミニウム
質焼結体等のセラミックスより成り、酸化アルミニウ
ム、酸化珪素、酸化マグネシウム、酸化カルシウム等の
原料粉末に適当な有機バインダー、溶剤等を添加混合し
て泥漿物を作るとともに、該泥漿物をドクターブレード
法やカレンダーロール法を採用することによってセラミ
ックグリーンシート(セラミック生シート)となし、し
かる後、前記セラミックグリーンシートに適当な打ち抜
き加工を施すとともにこれを複数枚積層し、約1500
℃の温度で焼成することによって製作される。
The base 1 is made of, for example, ceramics such as an aluminum oxide sintered body, and is mixed with a raw material powder such as aluminum oxide, silicon oxide, magnesium oxide, and calcium oxide by adding an appropriate organic binder, a solvent, and the like. The slurry is made into a ceramic green sheet (ceramic green sheet) by employing a doctor blade method or a calender roll method, and then the ceramic green sheet is subjected to an appropriate punching process, and then the slurry is formed. Laminate multiple sheets, about 1500
It is manufactured by firing at a temperature of ° C.

【0021】また前記基体1は凹部1aの内面から基体
1の外側面にかけて複数個の配線層4が被着形成されて
おり、該配線層4の凹部1a内に露出する領域には光半
導体素子3の各電極がボンディングワイヤ5を介して電
気的に接続され、また基体1の外側面に形成されている
領域には外部電気回路と接続される外部リード端子6が
銀ロウ等のロウ材を介してロウ付け取着されている。
A plurality of wiring layers 4 are formed on the substrate 1 from the inner surface of the concave portion 1a to the outer surface of the substrate 1, and a region of the wiring layer 4 exposed in the concave portion 1a has an optical semiconductor element. 3 are electrically connected to each other through bonding wires 5, and external lead terminals 6 connected to an external electric circuit are made of a brazing material such as silver brazing in a region formed on the outer surface of the base 1. It is attached via brazing.

【0022】前記配線層4は光半導体素子3の各電極を
外部電気回路に接続する際の導電路として作用し、タン
グステンやモリブデン、マンガン等の高融点金属粉末に
より形成されている。
The wiring layer 4 functions as a conductive path for connecting each electrode of the optical semiconductor element 3 to an external electric circuit, and is formed of a high melting point metal powder such as tungsten, molybdenum, and manganese.

【0023】前記配線層4は、例えば、タングステンや
モリブデン、マンガン等の高融点金属粉末に適当な有機
バインダー、溶剤等を添加混合して得た金属ペーストを
基体1となるセラミックグリーンシートに予め従来周知
のスクリーン印刷法により所定パターンに印刷塗布して
おくことによって基体1の凹部1a内から基体1の外側
面にかけて被着形成される。
The wiring layer 4 is formed by adding a metal paste obtained by adding a suitable organic binder, a solvent, and the like to a high melting point metal powder such as tungsten, molybdenum, manganese, or the like to a ceramic green sheet serving as the base 1 beforehand. By printing and applying a predetermined pattern by a well-known screen printing method, the coating is formed from the inside of the concave portion 1 a of the base 1 to the outer surface of the base 1.

【0024】また前記配線層4はその露出する表面にニ
ッケル、金等の耐蝕性に優れ、かつロウ材との濡れ性に
優れる金属を1μm乃至20μmの厚みにメッキ法によ
り被着させておくと、配線層4の酸化腐蝕を有効に防止
することができるとともに配線層4への外部リード端子
6のロウ付けを強固となすことができる。従って、前記
配線層4はその露出する表面にニッケル、金等の耐蝕性
に優れ、かつロウ材との濡れ性に優れる金属を1μm乃
至20μmの厚みに被着させておくことが好ましい。
The wiring layer 4 is preferably provided with a metal having excellent corrosion resistance such as nickel and gold and excellent wettability with a brazing material to a thickness of 1 μm to 20 μm by a plating method on the exposed surface. In addition, the oxidation corrosion of the wiring layer 4 can be effectively prevented, and the brazing of the external lead terminals 6 to the wiring layer 4 can be firmly performed. Therefore, it is preferable that a metal having excellent corrosion resistance, such as nickel and gold, and excellent in wettability with a brazing material is applied to the exposed surface of the wiring layer 4 to a thickness of 1 μm to 20 μm.

【0025】更に前記配線層4には外部リード端子6が
銀ロウ等のロウ材を介してロウ付け取着されており、該
外部リード端子6は容器内部に収容する光半導体素子3
の各電極を外部電気回路に電気的に接続する作用をな
し、外部リード端子6を外部電気回路に接続することに
よって容器内部に収容される光半導体素子3は配線層4
及び外部リード端子6を介して外部電気回路に接続され
ることとなる。
Further, an external lead terminal 6 is attached to the wiring layer 4 by brazing via a brazing material such as silver brazing, and the external lead terminal 6 is connected to the optical semiconductor element 3 contained in the container.
The optical semiconductor element 3 accommodated in the container by connecting the external lead terminals 6 to the external electric circuit is electrically connected to the external electric circuit.
And the external lead terminal 6 is connected to an external electric circuit.

【0026】前記外部リード端子6は鉄ーニッケルーコ
バルト合金や鉄ーニッケル合金等の金属材料からなり、
例えば、鉄ーニッケルーコバルト合金等の金属材料から
成るインゴット(塊)に圧延加工法や打ち抜き加工法
等、従来周知の金属加工法を施すことによって所定の形
状に形成される。
The external lead terminal 6 is made of a metal material such as an iron-nickel-cobalt alloy or an iron-nickel alloy.
For example, an ingot made of a metal material such as an iron-nickel-cobalt alloy is formed into a predetermined shape by applying a conventionally known metal working method such as a rolling method or a punching method.

【0027】前記外部リード端子6はまたその露出する
表面にニッケル、金等の耐蝕性に優れ、かつロウ材との
濡れ性に優れる金属を1μm乃至20μmの厚みにメッ
キ法により被着させておくと、外部リード端子6の酸化
腐蝕を有効に防止することができるとともに外部リード
端子6を外部電気回路に接続する際、その接続を確実、
強固となすことができる。従って、前記外部リード端子
6はその露出する表面にニッケル、金等の耐蝕性に優
れ、かつロウ材との濡れ性に優れる金属を1μm乃至2
0μmの厚みに被着させておくことが好ましい。
The external lead terminal 6 is coated with a metal having excellent corrosion resistance and excellent wettability with a brazing material to a thickness of 1 μm to 20 μm by a plating method on the exposed surface thereof. In addition, when the external lead terminal 6 is connected to an external electric circuit, the connection can be reliably prevented.
It can be made strong. Therefore, the external lead terminal 6 is made of a metal having excellent corrosion resistance such as nickel and gold and excellent wettability with a brazing material of 1 μm to 2 μm on the exposed surface.
Preferably, it is applied to a thickness of 0 μm.

【0028】前記外部リード端子6が取着された基体1
はまたその側部に貫通孔1bが形成されており、貫通孔
1bには筒状の金属製固定部材8が挿入固定され、更に
金属製固定部材8の内側の一部には透光性部材9が取着
されている。
The base 1 on which the external lead terminals 6 are attached
Further, a through hole 1b is formed in a side portion thereof. A cylindrical metal fixing member 8 is inserted and fixed in the through hole 1b, and a translucent member is further provided in a part of the inside of the metal fixing member 8. 9 is attached.

【0029】前記基体1の側部に形成されている貫通孔
1bは、例えば、基体1となるセラミッググリーンシー
トに予め打ち抜き加工法により孔を形成しておくことに
よって、或いは基体1の側部に孔あけ加工を施すことに
よって基体1の側部に所定形状に形成される。
The through-hole 1b formed in the side of the base 1 may be formed, for example, by forming a hole in a ceramic green sheet to be the base 1 in advance by a punching method, or Is formed into a predetermined shape on the side portion of the base 1 by performing a drilling process.

【0030】また前記基体1の外側面で貫通孔1bの周
辺には筒状の金属製固定部材8が取着されており、該金
属製固定部材8は、光ファイバー部材11を基体1に固
定する際の下地固定部材として作用するとともに光半導
体素子3が励起した光を光ファイバー部材11に伝達さ
せる作用をなし、鉄ーニッケルーコバルト合金や鉄ーニ
ッケル合金等の金属材料で形成されている。
A cylindrical metal fixing member 8 is attached to the outer surface of the base 1 around the through hole 1b, and the metal fixing member 8 fixes the optical fiber member 11 to the base 1. It functions as a base fixing member at the time and transmits light excited by the optical semiconductor element 3 to the optical fiber member 11, and is made of a metal material such as an iron-nickel-cobalt alloy or an iron-nickel alloy.

【0031】なお、前記金属製固定部材8は、例えば、
鉄ーニッケルーコバルト合金等のインゴット(塊)をプ
レス加工により筒状とすることによって形成される。
The metal fixing member 8 is, for example,
It is formed by forming an ingot (lump) such as an iron-nickel-cobalt alloy into a tubular shape by press working.

【0032】また前記金属製固定部材8の基体1外側面
への取着は、基体1の外側面で貫通孔1bの周辺に予め
タングステンやモリブデン等からなる金属層を被着させ
ておき、該金属層に筒状の金属製固定部材8に設けたフ
ランジをロウ付けすることによって行われる。
In attaching the metal fixing member 8 to the outer surface of the base 1, a metal layer made of tungsten, molybdenum, or the like is previously applied to the outer surface of the base 1 around the through hole 1b. This is performed by brazing a flange provided on the cylindrical metal fixing member 8 to the metal layer.

【0033】更に前記筒状の金属製固定部材8は、その
内側の一部に透光性部材9が取着されており、該透光性
部材9は金属製固定部材8の内側を塞ぎ、基体1と蓋体
2とからなる容器の気密封止を保持させるとともに金属
製固定部材8の内部空間を伝達する光半導体素子3の励
起した光をそのまま金属製固定部材8に取着接続される
光ファイバー部材11に伝達させる作用をなす。
Further, a light-transmitting member 9 is attached to a part of the inside of the cylindrical metal fixing member 8, and the light-transmitting member 9 closes the inside of the metal fixing member 8. Light excited by the optical semiconductor element 3 that transmits the internal space of the metal fixing member 8 is attached and connected to the metal fixing member 8 as it is while maintaining the hermetic sealing of the container including the base 1 and the lid 2. It functions to transmit the light to the optical fiber member 11.

【0034】前記透光性部材9は、例えば、酸化珪素、
酸化鉛を主成分とした鉛系及びホウ酸、ケイ砂を主成分
としたホウケイ酸系の非晶質ガラスで形成されており、
該非晶質ガラスは結晶軸が存在しないことから光半導体
素子3の励起する光を透光性部材9を通過させて光ファ
イバー部材11に授受させる場合、光半導体素子3の励
起した光は透光性部材9で複屈折を起こすことはなくそ
のまま光ファイバー部材11に授受されることとなり、
その結果、光半導体素子3が励起した光の光ファイバー
部材11への授受が高効率となって光信号の伝送効率を
高いものとなすことができる。
The light transmitting member 9 is made of, for example, silicon oxide,
It is made of lead-based and boric acid containing lead oxide as a main component, and borosilicate-based amorphous glass containing silica sand as a main component.
Since the amorphous glass has no crystal axis, the light excited by the optical semiconductor element 3 is transmitted and received by the optical fiber member 11 through the light transmitting member 9. The birefringence does not occur in the member 9 and is transmitted and received to the optical fiber member 11 as it is,
As a result, the transmission and reception of the light excited by the optical semiconductor element 3 to and from the optical fiber member 11 becomes high, and the transmission efficiency of the optical signal can be made high.

【0035】前記筒状の金属製固定部材8は更にその外
側の一端に光ファイバー部材11に取着されているフラ
ンジがYAG等のレーザー光線を使用して溶接され、こ
れによって光半導体素子3に光信号を伝達するための光
ファイバー部材11が基体1に固定されることとなる。
The flange fixed to the optical fiber member 11 is welded to the outer end of the cylindrical metal fixing member 8 using a laser beam such as YAG. The optical fiber member 11 for transmitting the light is fixed to the base 1.

【0036】また更に前記基体1の上面には、例えば、
鉄ーニッケルーコバルト合金や鉄ーニッケル合金等の金
属材料から成る蓋体2が接合され、これによって基体1
と蓋体2とからなる容器の内部に光半導体素子3が気密
に封止されることとなる。
Further, on the upper surface of the substrate 1, for example,
A lid 2 made of a metal material such as an iron-nickel-cobalt alloy or an iron-nickel alloy is joined, and
The optical semiconductor element 3 is hermetically sealed inside a container formed of the cover 2 and the cover 2.

【0037】前記蓋体2は、例えば、鉄ーニッケルーコ
バルト合金等のインゴット(塊)に圧延加工法や打ち抜
き加工法等、従来周知の金属加工法を施すことによって
所定の形状に形成される。
The lid 2 is formed in a predetermined shape by subjecting an ingot such as an iron-nickel-cobalt alloy to a conventionally known metal working method such as a rolling method or a punching method. .

【0038】かくして本発明の光半導体素子収納用パッ
ケージによれば、基体1の凹部1aに光半導体素子3を
載置固定するとともに光半導体素子3の各電極をボンデ
イングワイヤ5を介して配線層4に電気的に接続し、次
に基体1の上面に蓋体2を接合させ、基体1と蓋体2と
から成る容器内部に光半導体素子3を収容し、最後に基
体1に取着させた筒状の金属製固定部材8に光ファイバ
ー部材11を取着接続させることによって最終製品とし
ての光半導体装置となる。
Thus, according to the package for housing an optical semiconductor element of the present invention, the optical semiconductor element 3 is placed and fixed in the concave portion 1a of the base 1, and each electrode of the optical semiconductor element 3 is connected to the wiring layer 4 via the bonding wire 5. Then, the lid 2 was joined to the upper surface of the base 1, and the optical semiconductor element 3 was accommodated in a container composed of the base 1 and the lid 2, and finally attached to the base 1. By attaching and connecting the optical fiber member 11 to the tubular metal fixing member 8, an optical semiconductor device as a final product is obtained.

【0039】かかる光半導体装置は外部電気回路から供
給される駆動信号に基づいて光半導体素子3に所定の光
励起を起こさせ、該励起した光を透光性部材9を介し光
ファイバー部材11に授受させるとともに該光ファイバ
ー部材11の光フアイバー内を伝達させることによって
高速通信等に使用される。
The optical semiconductor device causes the optical semiconductor element 3 to perform predetermined light excitation based on a drive signal supplied from an external electric circuit, and transmits and receives the excited light to and from the optical fiber member 11 through the translucent member 9. In addition, by transmitting the light through the optical fiber of the optical fiber member 11, it is used for high-speed communication and the like.

【0040】次に前記光半導体素子収納用パッケージに
おける金属製固定部材の基体への取着について図5
(a)乃至(c)に基づき説明する。まず図5(a)に
示すごとく、筒状の金属製固定部材8の表面に、基体1
へのロウ付け取着を確実、強固とするためにニッケルめ
っき層12及び金めっき層13を順次被着させる。
Next, the attachment of the metal fixing member to the base in the package for housing an optical semiconductor element will be described with reference to FIG.
A description will be given based on (a) to (c). First, as shown in FIG. 5A, the base 1 is attached to the surface of the cylindrical metal fixing member 8.
The nickel plating layer 12 and the gold plating layer 13 are successively applied in order to securely and firmly attach to the brazing layer.

【0041】前記ニッケルめっき層12は金属製固定部
材8への金めっき層13の被着を強固とするための下地
部材であり、電解めっき法や無電解めっき法を採用する
ことによって金属製固定部材8の表面に約0.5〜5μ
mの厚みに被着される。
The nickel plating layer 12 is a base member for firmly attaching the gold plating layer 13 to the metal fixing member 8. The nickel plating layer 12 is made of metal by adopting an electrolytic plating method or an electroless plating method. About 0.5 to 5μ on the surface of the member 8
m.

【0042】前記ニッケルめっき層12はこれを電解め
っき法を採用することによって形成する場合、金属製固
定部材8を、例えば、硫酸ニッケル、塩化ニッケル、ホ
ウ酸(NiSO4 ・6H2 O+NiCl2 +6H2 O+
3 BO3 )からなるニッケルめっき浴中に浸漬すると
ともに金属製固定部材8に電流密度0.1〜2A/dm
2 程度のめっき用電力を印加することによって行われ
る。
[0042] The nickel plating layer 12 if formed by employing the electrolytic plating method which, a metal securing member 8, for example, nickel sulfate, nickel chloride, boric acid (NiSO 4 · 6H 2 O + NiCl 2 + 6H 2 O +
H 3 BO 3 ) and a current density of 0.1 to 2 A / dm on the metal fixing member 8.
It is performed by applying about 2 electric power for plating.

【0043】また前記金めっき層13は金属製固定部材
8に対するロウ材の濡れ性を良好とする作用をなし、電
解めっき法や無電解めっき法を採用することによってニ
ッケルめっき層上に約1〜3μmの厚みに被着される。
The gold plating layer 13 has an effect of improving the wettability of the brazing material with respect to the metal fixing member 8, and is formed on the nickel plating layer by an electrolytic plating method or an electroless plating method. Deposited to a thickness of 3 μm.

【0044】前記金めっき層13はこれを電解めっき法
を採用することによって形成する場合、表面にニッケル
めっき層12が被着された金属製固定部材8を、例え
ば、シアン化金カリウムおよび燐酸カリウムからなる金
めっき浴中に浸漬するとともに金属製固定部材8に電流
密度0.2〜1.5A/dm2 程度のめっき用電力を印
加することによって行われる。
When the gold plating layer 13 is formed by employing an electrolytic plating method, the metal fixing member 8 having the nickel plating layer 12 adhered to the surface thereof may be made of, for example, gold potassium cyanide and potassium phosphate. The plating is performed by immersing the metal fixing member 8 in a gold plating bath and applying a plating power having a current density of about 0.2 to 1.5 A / dm 2 to the metal fixing member 8.

【0045】次に図5(b)に示すごとく、前記金属製
固定部材8の内部に透光性部材9をガラス14を介して
取着し、金属製固定部材8の内部を塞ぐ。
Next, as shown in FIG. 5B, a translucent member 9 is attached to the inside of the metal fixing member 8 via the glass 14 to close the inside of the metal fixing member 8.

【0046】前記金属製固定部材8への透光性部材9の
取着は金属製固定部材8の内部に透光性部材9の融点よ
り低い融点を有する、例えば、低融点ハンダガラス14
を塗布するとともに該塗布した低融点ハンダガラス14
上に透光性部材9を載置し、しかる後、これを大気中、
約450℃の温度に加熱し、低融点ハンダガラス14を
溶融させることによって行われる。この場合、ガラス付
けの熱及び雰囲気によって金属製固定部材8の表面に被
着されているニッケルめっき層12はその一部が金めっ
き層13中を拡散して金めっき層13の表面に露出し、
該金めっき層13の表面に露出したニッケルは酸化され
酸化ニッケルとなって金めっき層13表面に多量に形成
されてしまう。
Attachment of the light transmitting member 9 to the metal fixing member 8 has a melting point lower than the melting point of the light transmitting member 9 inside the metal fixing member 8, for example, a low melting point solder glass 14.
And the applied low melting point solder glass 14
The translucent member 9 is placed on the upper part, and thereafter, this is
This is performed by heating to a temperature of about 450 ° C. to melt the low melting point solder glass 14. In this case, the nickel plating layer 12 adhered to the surface of the metal fixing member 8 due to the heat and atmosphere of the glass is partially diffused in the gold plating layer 13 to be exposed on the surface of the gold plating layer 13. ,
The nickel exposed on the surface of the gold plating layer 13 is oxidized to nickel oxide and formed in a large amount on the surface of the gold plating layer 13.

【0047】次に前記金属製固定部材8を還元雰囲気中
で加熱処理し、金めっき層13の表面に多量に形成され
ている酸化ニッケルを還元し、除去する。
Next, the metal fixing member 8 is heat-treated in a reducing atmosphere to reduce and remove a large amount of nickel oxide formed on the surface of the gold plating layer 13.

【0048】前記還元雰囲気としては水素雰囲気、窒素
雰囲気、或いは水素と窒素の混合雰囲気が好適であり、
加熱処理の温度としては金属製固定部材8に透光性部材
9を取着するガラス14の融点よりも低い温度、例え
ば、200〜420℃の範囲がよい。
The reducing atmosphere is preferably a hydrogen atmosphere, a nitrogen atmosphere, or a mixed atmosphere of hydrogen and nitrogen.
The temperature of the heat treatment is preferably lower than the melting point of the glass 14 for attaching the translucent member 9 to the metal fixing member 8, for example, in the range of 200 to 420 ° C.

【0049】前記金属製固定部材8は金めっき層13の
表面に形成されているロウ材に対し濡れ性が悪い酸化ニ
ッケルが還元雰囲気中での加熱処理によって除去される
ことから金めっき層13のロウ材に対する濡れ性は極め
て良好なものとなっている。
The metal fixing member 8 has a low wettability with respect to the brazing material formed on the surface of the gold plating layer 13, and is removed by heat treatment in a reducing atmosphere. The wettability to the brazing material is extremely good.

【0050】そして最後に前記金属製固定部材8を基体
1の貫通孔1b周辺に予め被着させておいた金属層にロ
ウ材15を介しロウ付け取着することによって図5
(c)に示すごとく基体1への金属製固定部材8のロウ
付け取着が完了する。
Finally, the metal fixing member 8 is brazed and attached to the metal layer previously attached to the periphery of the through hole 1b of the base 1 through the brazing material 15 as shown in FIG.
As shown in (c), the brazing attachment of the metal fixing member 8 to the base 1 is completed.

【0051】前記金属製固定部材8の基体1へのロウ付
け取着は基体1の貫通孔1b周辺に被着されている金属
層上に間に金―錫合金(金:80重量%、錫:20重量
%)等からなる低融点のロウ材15を挟んで載置し、し
かる後、これを約300℃の温度に加熱し、低融点のロ
ウ材15を溶融させることによって行われる。この場
合、金属製固定部材8は金めっき層13の表面に形成さ
れているロウ材に対し濡れ性が悪い酸化ニッケルが還元
雰囲気中での加熱処理によって除去されていることから
金めっき層13とロウ材15とは極めて強固に接合し、
これによって金属製固定部材8は基体1に極めて強固に
ロウ付け取着されることとなる。
The metal fixing member 8 is attached to the base 1 by brazing. A gold-tin alloy (gold: 80% by weight, tin) is interposed between a metal layer provided around the through hole 1b of the base 1. : 20% by weight) and the like, and then placed on the low melting point brazing material 15 and then heated to a temperature of about 300 ° C. to melt the low melting point brazing material 15. In this case, the metal fixing member 8 has a low wettability with respect to the brazing material formed on the surface of the gold plating layer 13 and has been removed by heat treatment in a reducing atmosphere. Very firmly joined to the brazing material 15,
As a result, the metal fixing member 8 is very firmly brazed and attached to the base 1.

【0052】なお、本発明は上述の実施例に限定される
ものではなく、本発明の要旨を逸脱しない範囲であれば
種々の変更は可能であり、例えば、上述の実施例では、
光半導体素子3が光を励起する場合について説明した
が、これが光ファイバー部材11を介して伝達された光
を光半導体素子3が電気信号に変換し、該変換された電
気信号を外部に取り出すようにした場合にも適用可能で
ある。
It should be noted that the present invention is not limited to the above-described embodiment, and various changes can be made without departing from the gist of the present invention.
Although the case where the optical semiconductor element 3 excites light has been described, the optical semiconductor element 3 converts the light transmitted through the optical fiber member 11 into an electric signal, and extracts the converted electric signal to the outside. It is also applicable to the case where it is done.

【0053】また上述の実施例では基体1を酸化アルミ
ニウム質焼結体等のセラミックスで形成したが、これを
鉄―ニッケル―コバルト合金等の金属材料で形成しても
よい。
In the above-described embodiment, the base 1 is formed of ceramics such as an aluminum oxide sintered body, but may be formed of a metal material such as an iron-nickel-cobalt alloy.

【0054】[0054]

【発明の効果】本発明の光半導体素子収納用パッケージ
の製造方法によれば、金属製固定部材に透光性部材をガ
ラスを介して取着した後、金属製固定部材を還元雰囲気
中で加熱処理するため金めっき層の表面に下地のニッケ
ルめっき層の拡散および酸化によってロウ材と濡れ性が
悪い酸化ニッケルが多量に形成されているとしても該酸
化ニッケルは還元雰囲気中での加熱処理によって完全に
除去されることとなり、その結果、筒状の金属製固定部
材に対するロウ材の接合強度が大幅に向上し、基体に筒
状の金属製固定部材を極めて強固にロウ付け取着するこ
とができる。
According to the method of manufacturing a package for housing an optical semiconductor element of the present invention, after a translucent member is attached to a metal fixing member via glass, the metal fixing member is heated in a reducing atmosphere. Even if a large amount of nickel oxide having poor wettability with the brazing material is formed on the surface of the gold plating layer by diffusion and oxidation of the underlying nickel plating layer due to the treatment, the nickel oxide can be completely treated by heat treatment in a reducing atmosphere. As a result, the joining strength of the brazing material to the cylindrical metal fixing member is greatly improved, and the cylindrical metal fixing member can be extremely firmly brazed and attached to the base. .

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の光半導体素子収納用パッケージの一実
施例を示す断面図である。
FIG. 1 is a cross-sectional view showing an embodiment of a package for housing an optical semiconductor element of the present invention.

【図2】図1に示す光半導体素子収納用パッケージの要
部断面図である。
FIG. 2 is a sectional view of a main part of the package for housing an optical semiconductor element shown in FIG. 1;

【図3】図1に示す光半導体素子収納用パッケージの側
面図である。
FIG. 3 is a side view of the package for housing an optical semiconductor element shown in FIG. 1;

【図4】図1に示す光半導体素子収納用パッケージの蓋
体を除いた状態の平面図である。
FIG. 4 is a plan view of the package for storing an optical semiconductor element shown in FIG. 1 in a state where a lid is removed.

【図5】(a)乃至(c)は図1に示す光半導体素子収
納用パッケージの金属製固定部材を基体にロウ付け取着
する際の各工程毎の要部断面図である。
5 (a) to 5 (c) are cross-sectional views of main parts in each step when a metal fixing member of the package for storing an optical semiconductor element shown in FIG. 1 is brazed and attached to a base.

【符号の説明】[Explanation of symbols]

1・・・基体 1a・・凹部 1b・・貫通孔 2・・・蓋体 3・・・光半導体素子 4・・・配線層 8・・・筒状の金属製固定部材 9・・・透光性部材 11・・・光ファイバー部材 12・・・ニッケルめっき層 13・・・金めっき層 14・・・ガラス 15・・・ロウ材 DESCRIPTION OF SYMBOLS 1 ... Base 1a ... Depression 1b ... Through-hole 2 ... Lid 3 ... Optical semiconductor element 4 ... Wiring layer 8 ... Cylindrical metal fixing member 9 ... Light transmission Functional member 11: Optical fiber member 12: Nickel plating layer 13: Gold plating layer 14: Glass 15: Brazing material

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】上面に光半導体素子を収容するための凹部
を有する基体と、該基体の側部に形成された貫通孔と、
前記基体の貫通孔周辺の外表面にロウ付けされ、一端に
光ファイバー部材が接続される筒状の金属製固定部材
と、前記筒状の金属製固定部材の内部に取着され、金属
製固定部材の内部を塞ぐ透光性部材と、前記基体の上面
に取着され、前記凹部を塞ぐ蓋体とから成る光半導体素
子収納用パッケージであって、前記筒状の金属製固定部
材が下記(a)乃至(d)の工程によって基体の貫通孔
周辺の外表面にロウ付けされていることを特徴とする光
半導体素子収納用パッケージの製造方法。 (a)筒状の金属製固定部材の表面にニッケルめっき層
と金めっき層を順次被着させる工程と、(b)金属製固
定部材の内部に透光性部材をガラスを介して取着する工
程と、(c)金属製固定部材を還元雰囲気中で加熱処理
する工程と、(d)金属製固定部材を基体の貫通孔周辺
の外表面にロウ材を介してロウ付け取着する工程。
1. A base having a concave portion for accommodating an optical semiconductor element on an upper surface, a through hole formed in a side portion of the base,
A cylindrical metal fixing member brazed to the outer surface around the through hole of the base, and an optical fiber member connected to one end; and a metal fixing member attached to the inside of the cylindrical metal fixing member. And a lid attached to the upper surface of the base and closing the recess, wherein the cylindrical metal fixing member is formed of the following (a). And (d) brazing the outer surface around the through hole of the base body to the optical semiconductor element housing package. (A) a step of sequentially depositing a nickel plating layer and a gold plating layer on the surface of a cylindrical metal fixing member; and (b) attaching a translucent member to the inside of the metal fixing member via glass. (C) heating the metal fixing member in a reducing atmosphere, and (d) brazing the metal fixing member to the outer surface around the through hole of the base via a brazing material.
JP08052399A 1999-03-24 1999-03-24 Manufacturing method of optical semiconductor element storage package Expired - Fee Related JP3764599B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP08052399A JP3764599B2 (en) 1999-03-24 1999-03-24 Manufacturing method of optical semiconductor element storage package
US09/535,288 US6420205B1 (en) 1999-03-24 2000-03-24 Method for producing package for housing photosemiconductor element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP08052399A JP3764599B2 (en) 1999-03-24 1999-03-24 Manufacturing method of optical semiconductor element storage package

Publications (2)

Publication Number Publication Date
JP2000277758A true JP2000277758A (en) 2000-10-06
JP3764599B2 JP3764599B2 (en) 2006-04-12

Family

ID=13720687

Family Applications (1)

Application Number Title Priority Date Filing Date
JP08052399A Expired - Fee Related JP3764599B2 (en) 1999-03-24 1999-03-24 Manufacturing method of optical semiconductor element storage package

Country Status (1)

Country Link
JP (1) JP3764599B2 (en)

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH054112U (en) * 1991-07-01 1993-01-22 日本電気株式会社 Semiconductor laser module
JPH0567844A (en) * 1991-02-28 1993-03-19 Oki Electric Ind Co Ltd Semiconductor laser module
JPH06268085A (en) * 1993-03-12 1994-09-22 Shinko Electric Ind Co Ltd Cap having light transmission window
JPH08146276A (en) * 1994-11-16 1996-06-07 Kyocera Corp Holder with lens
JPH1040419A (en) * 1996-04-25 1998-02-13 Matsushita Electric Ind Co Ltd Method for transmitting, receiving and generating computer graphics animation data, and recording medium
JPH1041417A (en) * 1996-07-26 1998-02-13 Kyocera Corp Package for housing optical semiconductor elements
JPH1041418A (en) * 1996-07-26 1998-02-13 Kyocera Corp Package for housing optical semiconductor elements
JPH1051036A (en) * 1996-07-31 1998-02-20 Kyocera Corp Package for accommodating optical semiconductor element
JPH10173079A (en) * 1996-12-12 1998-06-26 Kyocera Corp Package for housing of optical semiconductor element
JPH1174612A (en) * 1997-08-27 1999-03-16 Kyocera Corp Package for optical semiconductor element

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0567844A (en) * 1991-02-28 1993-03-19 Oki Electric Ind Co Ltd Semiconductor laser module
JPH054112U (en) * 1991-07-01 1993-01-22 日本電気株式会社 Semiconductor laser module
JPH06268085A (en) * 1993-03-12 1994-09-22 Shinko Electric Ind Co Ltd Cap having light transmission window
JPH08146276A (en) * 1994-11-16 1996-06-07 Kyocera Corp Holder with lens
JPH1040419A (en) * 1996-04-25 1998-02-13 Matsushita Electric Ind Co Ltd Method for transmitting, receiving and generating computer graphics animation data, and recording medium
JPH1041417A (en) * 1996-07-26 1998-02-13 Kyocera Corp Package for housing optical semiconductor elements
JPH1041418A (en) * 1996-07-26 1998-02-13 Kyocera Corp Package for housing optical semiconductor elements
JPH1051036A (en) * 1996-07-31 1998-02-20 Kyocera Corp Package for accommodating optical semiconductor element
JPH10173079A (en) * 1996-12-12 1998-06-26 Kyocera Corp Package for housing of optical semiconductor element
JPH1174612A (en) * 1997-08-27 1999-03-16 Kyocera Corp Package for optical semiconductor element

Also Published As

Publication number Publication date
JP3764599B2 (en) 2006-04-12

Similar Documents

Publication Publication Date Title
US6420205B1 (en) Method for producing package for housing photosemiconductor element
JP3500304B2 (en) Semiconductor element support member and semiconductor element storage package using the same
JP3619393B2 (en) Optical semiconductor element storage package
JP2000277642A (en) Manufacture of optical semiconductor element housing package
JP2746809B2 (en) Package for storing optical semiconductor elements
JP3715818B2 (en) Manufacturing method of optical semiconductor element storage package
JP3764599B2 (en) Manufacturing method of optical semiconductor element storage package
JP2000277759A (en) Manufacture of package for housing optical semiconductor element
JP2000277641A (en) Manufacture of optical semiconductor element housing package
JP3709084B2 (en) Optical semiconductor element storage package
JP2000277643A (en) Manufacture of optical semiconductor element housing package
JP3297617B2 (en) Package for storing optical semiconductor elements
JP3457906B2 (en) Optical semiconductor element storage package
JP3709082B2 (en) Optical semiconductor element storage package
JP3706484B2 (en) Optical semiconductor element storage package
JP3762122B2 (en) Optical semiconductor element storage package
JP3709095B2 (en) Optical semiconductor element storage package
JP3488838B2 (en) Package for storing semiconductor elements
JP2000236103A (en) Package for housing optical semiconductor element
JP2003037196A (en) Package for housing optical semiconductor element
JP3981256B2 (en) Optical semiconductor element storage package
JP2685159B2 (en) Electronic component storage package
JP2000277653A (en) Manufacture of wiring substrate
JP2001102472A (en) Package for semiconductor element
JP2000243879A (en) Package for housing optical semiconductor element

Legal Events

Date Code Title Description
A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20050218

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20050524

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050725

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20060117

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20060120

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090127

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100127

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110127

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110127

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120127

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120127

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130127

Year of fee payment: 7

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140127

Year of fee payment: 8

LAPS Cancellation because of no payment of annual fees