JP2001264511A - Antireflection member - Google Patents
Antireflection memberInfo
- Publication number
- JP2001264511A JP2001264511A JP2000082516A JP2000082516A JP2001264511A JP 2001264511 A JP2001264511 A JP 2001264511A JP 2000082516 A JP2000082516 A JP 2000082516A JP 2000082516 A JP2000082516 A JP 2000082516A JP 2001264511 A JP2001264511 A JP 2001264511A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- refractive index
- index layer
- antifouling
- antireflection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、防汚性を有する反
射防止部材に関するものである。さらに詳しくは防汚剤
を速やかに定着させる構成に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an antireflection member having antifouling properties. More specifically, the present invention relates to a configuration for quickly fixing an antifouling agent.
【0002】[0002]
【従来の技術】レンズ等の反射防止膜付き光学部材で
は、汗、指紋等による汚れが付着しやすく、一度付着し
た汚れを除去することは困難であった。これらの問題を
解決する手段として、フルオロアルキルシラン等の薄膜
を用いた防汚層あるいは撥水層が提案されている。2. Description of the Related Art In an optical member having an anti-reflection film such as a lens, dirt due to sweat, fingerprints and the like easily adheres, and it is difficult to remove dirt once adhered. As means for solving these problems, an antifouling layer or a water repellent layer using a thin film of fluoroalkylsilane or the like has been proposed.
【0003】特開平5−215905号公報にあるよう
に真空蒸着法を用いて形成するフルオロアルキルシラザ
ンや、特開平6−122778号公報にあるようにプラ
ズマCVD法を用いて形成するフルオロアルキルシラン
や、特開平8−209118号公報にあるようにフッ素
化合物とオルガノポリシロキサンの混合物などの撥水層
の場合には、材料自体の強力な反応性あるいはプラズマ
のアシスト作用に起因する高い定着性により、材料本来
の撥水性能を発現させることができた。[0003] As disclosed in JP-A-5-215905, a fluoroalkylsilazane formed by using a vacuum evaporation method, as disclosed in JP-A-6-122778, a fluoroalkylsilane formed by using a plasma CVD method, In the case of a water-repellent layer such as a mixture of a fluorine compound and an organopolysiloxane as disclosed in JP-A-8-209118, the material itself has a strong reactivity or a high fixing property caused by a plasma assisting action. The original water repellency of the material could be exhibited.
【0004】しかし、防汚性能に関する要求が高まり、
表面滑り性のよい防汚材料や特開平9−61605号公
報にあるようにエーテル結合を有する柔軟な分子構造を
持つフッ素化合物を用いた防汚層が開発されると、材料
自体の防汚性能は格段に向上したが同時にその低い反応
性が災いして定着性が低くなり、指紋拭き取り性などで
材料本来の防汚性能を発現できなかった。However, the demand for antifouling performance has increased,
When an antifouling layer having a surface slippery material or a fluorine compound having a flexible molecular structure having an ether bond as disclosed in JP-A-9-61605 is developed, the antifouling performance of the material itself is improved. However, at the same time, the low reactivity was aggravated by the poor reactivity and the fixing property was lowered, and the original antifouling performance of the material could not be exhibited due to the fingerprint wiping property and the like.
【0005】エーテル結合に代表されるように材料自体
が柔軟な分子構造をもつことが、防汚性能を発現させる
うえで本質的役割を担っており、末端の官能基の反応性
が高すぎると3次元的な架橋が発生し、柔軟な構造すな
わち防汚性を阻害することがわかってきた。[0005] The material itself has a flexible molecular structure as represented by an ether bond, which plays an essential role in exhibiting antifouling performance, and if the reactivity of the terminal functional group is too high. It has been found that three-dimensional crosslinking occurs and inhibits a flexible structure, that is, an antifouling property.
【0006】[0006]
【発明が解決しようとする課題】しかしながら、前記防
汚性能に優れる防汚剤は浸透性にすぐれ、反応性が若干
弱いことから定着性に劣り、下地材料に染み込んでしま
う等の現象が発生して材料本来の防汚性能が発現しない
欠点があった。However, the above-mentioned antifouling agent having excellent antifouling performance has excellent penetrability and is slightly weak in reactivity, so that it has poor fixability and soaks in a base material. Therefore, there is a disadvantage that the original antifouling performance of the material is not exhibited.
【0007】本発明は上記の欠点を鑑み、指紋拭き取り
性等の防汚性能に優れた反射防止部材を提供することに
ある。The present invention has been made in view of the above-mentioned drawbacks, and has as its object to provide an antireflection member having excellent antifouling performance such as fingerprint wiping properties.
【0008】[0008]
【課題を解決するための手段】基材上の少なくとも片面
に、低屈折率の単層、高屈折率層と低屈折率層を交互に
積層した、或いは中間屈折率層、高屈折率層、低屈折率
層、防汚層を積層した反射防止層を設けた反射防止部材
において、最上層の低屈折率層と防汚層の中間に金属ま
たはセラミックス等からなる中間層を積層したことを特
徴とする。A low refractive index single layer, a high refractive index layer and a low refractive index layer are alternately laminated on at least one surface of a substrate, or an intermediate refractive index layer, a high refractive index layer, An anti-reflection member provided with an anti-reflection layer in which a low-refractive-index layer and an anti-fouling layer are laminated, characterized in that an intermediate layer made of metal or ceramics is laminated between the low-refractive-index layer on the top layer and the anti-fouling layer. And
【0009】前記中間層がTi、Al、Si、Ni、C
r、Ag、Pt等の蒸着法あるいはスパッタ法からなる
金属膜であることを特徴とする。The intermediate layer is made of Ti, Al, Si, Ni, C
It is characterized by being a metal film formed by vapor deposition or sputtering of r, Ag, Pt or the like.
【0010】前記中間層が酸化チタン、酸化アルミニウ
ム、酸化マグネシウム等の蒸着法あるいはスパッタ法か
らなる酸化物膜であることを特徴とする。The intermediate layer is an oxide film formed by vapor deposition or sputtering of titanium oxide, aluminum oxide, magnesium oxide, or the like.
【0011】上記中間層が防汚剤の浸透を防ぎバリアー
層の役目を果たし、あるいは末端の官能基の反応を促進
する触媒的効果を発揮することにより、防汚剤の定着性
をあげることで防汚性能を向上させる。The intermediate layer functions as a barrier layer by preventing permeation of the antifouling agent, or by exerting a catalytic effect of accelerating the reaction of the terminal functional group, thereby improving the fixability of the antifouling agent. Improves antifouling performance.
【0012】[0012]
【発明の実施の形態】以下に本発明を詳細に説明する。
基材の片面に、ハードコート層、反射防止層、防汚層を
積層した場合を図1に示す。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail.
FIG. 1 shows a case where a hard coat layer, an antireflection layer, and an antifouling layer are laminated on one surface of a substrate.
【0013】基材1はプラスチック、ガラスからなるデ
ィスプレー用部材あるいはメガネレンズや、ポリエステ
ル、ポリカーボネート、ポリアセチルセルロース等のフ
ィルム基材が目的・用途により適宜選択される。As the substrate 1, a display member made of plastic or glass, a spectacle lens, or a film substrate made of polyester, polycarbonate, polyacetyl cellulose or the like is appropriately selected depending on the purpose and application.
【0014】ハードコート層2としてはアクリル系やシ
リコン系の樹脂材料を用いる。紫外線硬化や熱硬化法を
用いて3〜20μmの厚さに塗工する。このハードコー
ト層に平均粒径0.01〜3μmの透明な粒子を分散さ
せて、アンチグレアと呼ばれる光拡散性の処理を施すこ
ともできる。As the hard coat layer 2, an acrylic or silicon resin material is used. Coating is performed to a thickness of 3 to 20 μm using an ultraviolet curing method or a heat curing method. Transparent particles having an average particle size of 0.01 to 3 μm can be dispersed in the hard coat layer to perform a light diffusion treatment called antiglare.
【0015】反射防止層3の高屈折率材料としては、酸
化チタン、酸化ジルコニウム、酸化ニオブ、ITO等が
あげられるが、屈折率n=1.80以上のものであれば
特に限定されるものではない。Examples of the high refractive index material of the antireflection layer 3 include titanium oxide, zirconium oxide, niobium oxide, and ITO, but are not particularly limited as long as the refractive index is n = 1.80 or more. Absent.
【0016】反射防止層3の低屈折率材料としては、酸
化珪素、弗化マグネシウム、弗化カルシウム、弗化バリ
ウム等あげられるが、屈折率n=1.60以下のもので
あれば特に限定されるものではない。Examples of the material having a low refractive index for the antireflection layer 3 include silicon oxide, magnesium fluoride, calcium fluoride and barium fluoride. However, the material is not particularly limited as long as the material has a refractive index n = 1.60 or less. Not something.
【0017】これらの材料を真空蒸着法、スパッタリン
グ法、イオンプレーティング法等を用いて成膜する。各
層の厚さは光学膜厚で10〜200nmである。These materials are formed by a vacuum evaporation method, a sputtering method, an ion plating method or the like. Each layer has an optical thickness of 10 to 200 nm.
【0018】中間層4は金属膜としては、Ti、Al、
Si、Ni、Cr、Ag、Pt等が、セラミックス膜と
しては酸化チタン、酸化アルミニウム、酸化珪素、酸化
マグネシウム等があげられる。The intermediate layer 4 is made of Ti, Al,
Si, Ni, Cr, Ag, Pt, etc., and the ceramic film include titanium oxide, aluminum oxide, silicon oxide, magnesium oxide and the like.
【0019】これらの材料を真空蒸着法、スパッタリン
グ法、イオンプレーティング法等を用いて成膜する。た
だし、反射防止機能を阻害しないよう、層の厚さは光学
膜厚で10nm以下である必要がある。These materials are formed by vacuum deposition, sputtering, ion plating, or the like. However, the thickness of the layer needs to be 10 nm or less in optical film thickness so as not to impair the antireflection function.
【0020】防汚層5はパーフルオロポリエーテル基を
含有する平均分子量1000〜10000の有機シラン
化合物からなる防汚剤が使用される。The antifouling layer 5 is made of an antifouling agent comprising an organic silane compound having a perfluoropolyether group and having an average molecular weight of 1,000 to 10,000.
【0021】特に、Rf −(OC3 F6 )n −O−(C
F2 )m −(CH2 )l −O−(CH2 )s −Si
(R)3 (但し、Rf は炭素数1〜16の直鎖状または
分岐状パーフルオロアルキル基であり、特にCF3 −、
C2 F5 −、C3 F7 −が好ましい。In particular, R f- (OC 3 F 6 ) n -O- (C
F 2) m - (CH 2 ) l -O- (CH 2) s -Si
(R) 3 (where R f is a linear or branched perfluoroalkyl group having 1 to 16 carbon atoms, particularly CF 3 −,
C 2 F 5 − and C 3 F 7 − are preferred.
【0022】Rは加水分解基であり、−Cl、−Br、
−I、−OR1 、−OOCR1 、−OC(R1 )C=C
(R2 )2 、−ON=C(R1 )2 、−ON=CR3 、
−N(R2 )2 、−R2 NOCR1 等が好ましい。R is a hydrolyzing group, -Cl, -Br,
-I, -OR 1, -OOCR 1, -OC (R 1) C = C
(R 2 ) 2 , -ON = C (R 1 ) 2 , -ON = CR 3 ,
-N (R 2) 2, -R 2 NOCR 1 and the like are preferable.
【0023】R1 はアルキル基等の炭素数1〜10の脂
肪族炭化水素基、またはフェニル基等の炭素数6〜20
の芳香族炭化水素基、R2 は水素原子またはアルキル基
等の炭素数1〜5の脂肪族炭化水素基、R3 はアルキリ
デン基等の炭素数3〜6の二価の脂肪族炭化水素基であ
る。R 1 is an aliphatic hydrocarbon group having 1 to 10 carbon atoms such as an alkyl group, or 6 to 20 carbon atoms such as a phenyl group.
R 2 is a C 1-5 aliphatic hydrocarbon group such as a hydrogen atom or an alkyl group; R 3 is a C 3-6 divalent aliphatic hydrocarbon group such as an alkylidene group It is.
【0024】上記の有機シラン化合物中の加水分解基
は、1種類のみならず、2種類以上の混合系として用い
ることも可能である。特に、−OCH3 、−OC2 H
5 、−OOCCH3 、−NH2 が好ましい。また、nは
1〜50の整数、mは0〜3の整数、Iは0〜3の整
数、sは0〜6の整数、ただし、6≧m+l>0であ
る。)(以下化合物1と称する)またはその重合体が好
適である。The hydrolyzable groups in the above-mentioned organosilane compounds can be used not only as one kind but also as a mixture of two or more kinds. In particular, -OCH 3, -OC 2 H
5, -OOCCH 3, -NH 2 are preferred. Further, n is an integer of 1 to 50, m is an integer of 0 to 3, I is an integer of 0 to 3, s is an integer of 0 to 6, provided that 6 ≧ m + 1> 0. (Hereinafter referred to as Compound 1) or a polymer thereof is preferred.
【0025】作業環境や、膜厚の制御の点から、防汚層
形成時には希釈溶媒を用いないPVD法によることが好
ましく、特に真空蒸着法によることが好ましい。形状膜
厚で5〜10nm程度成膜する。From the viewpoint of the working environment and the control of the film thickness, it is preferable to use the PVD method without using a diluting solvent when forming the antifouling layer, and it is particularly preferable to use the vacuum evaporation method. A film having a thickness of about 5 to 10 nm is formed.
【0026】[0026]
【実施例】次に本発明を、具体例をあげて詳細に説明す
る。Now, the present invention will be described in detail with reference to specific examples.
【0027】(実施例1)透明プラスチックフィルム基
材1のトリアセチルセルロース80μm上に、ハードコ
ート層2として多官能性アクリル樹脂を紫外線照射硬化
法により形成した後、反射防止層3の高屈折率層として
TiO2 を低屈折率層としてSiO2 を真空蒸着法によ
り交互に積層し、中間層4として各種金属をDCマグネ
トロンスパッタリング法を用いて2nm成膜した。更に
防汚層5として、化合物1であるパーフルオロポリエー
テル基を含有する有機シラン化合物を真空蒸着法により
10nm程度成膜した。(Example 1) A polyfunctional acrylic resin was formed as a hard coat layer 2 on a transparent plastic film substrate 1 of triacetyl cellulose 80 μm by an ultraviolet irradiation curing method, and then a high refractive index of the antireflection layer 3 was obtained. As a layer, TiO 2 was alternately laminated as a low-refractive index layer by SiO 2 as a low refractive index layer, and various metals were formed as an intermediate layer 4 to a thickness of 2 nm by DC magnetron sputtering. Further, as the antifouling layer 5, an organic silane compound containing a perfluoropolyether group as the compound 1 was formed into a film having a thickness of about 10 nm by a vacuum evaporation method.
【0028】これらの反射防止部材の防汚性能を下表に
示す。接触角測定は協和界面科学(株)製CA−X型接
触角計を用いた。指紋拭き取り性は、指紋の付着のしづ
らさと市販のティッシュペーパーを用いて拭き取りの容
易さを相対比較した。概して接触角は高く、優れた指紋
拭き取り性を示した。The antifouling performance of these antireflection members is shown in the table below. The contact angle was measured using a CA-X type contact angle meter manufactured by Kyowa Interface Science Co., Ltd. The fingerprint wiping property was compared with the easiness of wiping using a commercially available tissue paper with respect to the difficulty of attaching a fingerprint. In general, the contact angle was high, showing excellent fingerprint wiping properties.
【0029】(実施例2)実施例1と同様の反射防止積
層体に、中間層4として各種酸化物を真空蒸着法を用い
て2nm成膜した。更に防汚層5として、化合物1のパ
ーフルオロポリエーテル基を含有する有機シラン化合物
を真空蒸着法により10nm程度成膜した。Example 2 On the same anti-reflection laminate as in Example 1, various oxides were formed to a thickness of 2 nm as the intermediate layer 4 by using a vacuum evaporation method. Further, as the antifouling layer 5, an organic silane compound containing a perfluoropolyether group of the compound 1 was formed to a thickness of about 10 nm by a vacuum evaporation method.
【0030】これらの反射防止部材の防汚性能を下表に
示す。概して接触角は高く、優れた指紋拭き取り性を示
した。The antifouling performance of these antireflection members is shown in the table below. In general, the contact angle was high, showing excellent fingerprint wiping properties.
【0031】(比較例3)実施例1と同様の反射防止積
層体に、防汚層5として、化合物1のパーフルオロポリ
エーテル基を含有する有機シラン化合物を真空蒸着法に
より10nm程度成膜した。Comparative Example 3 An organic silane compound containing a perfluoropolyether group of Compound 1 was formed as an antifouling layer 5 to a thickness of about 10 nm on the same antireflection laminate as in Example 1 by a vacuum evaporation method. .
【0032】これらの反射防止部材の防汚性能を下表に
示す。概して接触角は低く、指紋拭き取り性も若干劣っ
た。The antifouling performance of these antireflection members is shown in the table below. Generally, the contact angle was low, and the fingerprint wiping properties were slightly inferior.
【0033】[0033]
【表1】 [Table 1]
【0034】[0034]
【発明の効果】以上に説明したように本発明の構成によ
れば、指紋拭き取り性等の防汚性能に優れた反射防止部
材を提供することが可能となる。As described above, according to the constitution of the present invention, it is possible to provide an antireflection member having excellent antifouling performance such as fingerprint wiping properties.
【図1】本発明の実施例を示す概略断面図である。FIG. 1 is a schematic sectional view showing an embodiment of the present invention.
1 基材 2 ハードコート層 3 反射防止層 4 中間層 5 防汚層 Reference Signs List 1 base material 2 hard coat layer 3 antireflection layer 4 intermediate layer 5 antifouling layer
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C23C 14/08 C23C 14/14 B 14/14 D G02B 1/10 A Fターム(参考) 2K009 AA02 AA05 AA15 BB28 CC01 CC03 CC14 CC24 CC42 DD03 DD04 EE05 4F100 AA05D AA18E AA19E AA20D AA20E AA21C AA21E AA27C AB10E AB11E AB12E AB13E AB16E AB24E AG00A AJ06A AK01A AK25B AK41A AK45A AK52B AK52E BA05 BA07 BA10A BA10E DE01B EH66 GB90 JB13B JB14B JK12B JL06 JL06E JN01B JN06 JN18C JN18D 4K029 AA11 BA03 BA04 BA07 BA12 BA13 BA17 BA35 BA43 BA44 BA46 BA48 BA62 BB02 BC08 BD00 CA01 CA05 ──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) C23C 14/08 C23C 14/14 B 14/14 D G02B 1/10 A F-term (Reference) 2K009 AA02 AA05 AA15 BB28 CC01 CC03 CC14 CC24 CC42 DD03 DD04 EE05 4F100 AA05D AA18E AA19E AA20D AA20E AA21C AA21E AA27C AB10E AB11E AB12E AB13E AB16E AB24E AG00A AJ06A AK01A AK25B AK41A AK45A AK52B AK52E BA05 BA07 BA10A BA10E DE01B EH66 GB90 JB13B JB14B JK12B JL06 JL06E JN01B JN06 JN18C JN18D 4K029 AA11 BA03 BA04 BA07 BA12 BA13 BA17 BA35 BA43 BA44 BA46 BA48 BA62 BB02 BC08 BD00 CA01 CA05
Claims (3)
層、高屈折率層と低屈折率層を交互に積層した、或いは
中間屈折率層、高屈折率層、低屈折率層、防汚層を積層
した反射防止層を設けた反射防止部材において、最上層
の低屈折率層と防汚層の中間に金属またはセラミックス
等からなる中間層を積層したことを特徴とする反射防止
部材。1. A low refractive index monolayer, a high refractive index layer and a low refractive index layer alternately laminated on at least one surface of a substrate, or an intermediate refractive index layer, a high refractive index layer, and a low refractive index layer. An anti-reflection member provided with an anti-reflection layer in which an anti-reflection layer is laminated, wherein an intermediate layer made of metal or ceramics is laminated between the low-refractive-index layer of the uppermost layer and the anti-reflection layer. Element.
r、Ag、Pt等の蒸着法あるいはスパッタ法からなる
金属膜であることを特徴とする請求項1記載の反射防止
部材。2. The method according to claim 1, wherein the intermediate layer comprises Ti, Al, Si, Ni, C
2. The anti-reflection member according to claim 1, wherein the anti-reflection member is a metal film formed by vapor deposition or sputtering of r, Ag, Pt, or the like.
ム、酸化マグネシウム等の蒸着法あるいはスパッタ法か
らなる酸化物膜であることを特徴とする請求項1記載の
反射防止部材。3. The anti-reflection member according to claim 1, wherein said intermediate layer is an oxide film formed by vapor deposition or sputtering of titanium oxide, aluminum oxide, magnesium oxide, or the like.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000082516A JP4023065B2 (en) | 2000-03-23 | 2000-03-23 | Anti-reflective member |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000082516A JP4023065B2 (en) | 2000-03-23 | 2000-03-23 | Anti-reflective member |
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JP2001264511A true JP2001264511A (en) | 2001-09-26 |
JP4023065B2 JP4023065B2 (en) | 2007-12-19 |
Family
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010535286A (en) * | 2007-08-02 | 2010-11-18 | セコ コーポレイション リミテッド | Multilayer thin film manufacturing method using dry vacuum deposition |
JP2012088700A (en) * | 2010-10-01 | 2012-05-10 | Carl Zeiss Vision Gmbh | Optical lens with scratch-resistant antireflection layer |
JP2012172263A (en) * | 2011-02-23 | 2012-09-10 | Samsung Electronics Co Ltd | Method for surface coating and device for the same |
KR101244883B1 (en) | 2012-03-19 | 2013-03-18 | 한국기계연구원 | Anti-reflecting board having anti-fingerprint function and manufacturing method thereof |
JP2022087009A (en) * | 2020-11-30 | 2022-06-09 | デクセリアルズ株式会社 | Optical laminate and article |
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2000
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Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2010535286A (en) * | 2007-08-02 | 2010-11-18 | セコ コーポレイション リミテッド | Multilayer thin film manufacturing method using dry vacuum deposition |
JP2012088700A (en) * | 2010-10-01 | 2012-05-10 | Carl Zeiss Vision Gmbh | Optical lens with scratch-resistant antireflection layer |
US9817155B2 (en) | 2010-10-01 | 2017-11-14 | Carl Zeiss Vision International Gmbh | Optical lens with scratch-resistant anti-reflective layer |
JP2012172263A (en) * | 2011-02-23 | 2012-09-10 | Samsung Electronics Co Ltd | Method for surface coating and device for the same |
KR101244883B1 (en) | 2012-03-19 | 2013-03-18 | 한국기계연구원 | Anti-reflecting board having anti-fingerprint function and manufacturing method thereof |
JP2022087009A (en) * | 2020-11-30 | 2022-06-09 | デクセリアルズ株式会社 | Optical laminate and article |
JP7213323B2 (en) | 2020-11-30 | 2023-01-26 | デクセリアルズ株式会社 | optical laminate, article |
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