JP2001259304A - Purification apparatus for water containing volatile organic compound - Google Patents
Purification apparatus for water containing volatile organic compoundInfo
- Publication number
- JP2001259304A JP2001259304A JP2000083568A JP2000083568A JP2001259304A JP 2001259304 A JP2001259304 A JP 2001259304A JP 2000083568 A JP2000083568 A JP 2000083568A JP 2000083568 A JP2000083568 A JP 2000083568A JP 2001259304 A JP2001259304 A JP 2001259304A
- Authority
- JP
- Japan
- Prior art keywords
- raw water
- volatile organic
- organic compounds
- gas
- purifying
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
- Y02A50/00—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE in human health protection, e.g. against extreme weather
- Y02A50/20—Air quality improvement or preservation, e.g. vehicle emission control or emission reduction by using catalytic converters
Landscapes
- Treating Waste Gases (AREA)
- Degasification And Air Bubble Elimination (AREA)
- Physical Water Treatments (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、トリクロロエチレ
ン、トリクロロエタン等の揮発性有機化合物により汚染
された地下水等の浄化に使用される揮発性有機化合物含
有水の浄化装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus for purifying water containing volatile organic compounds used for purifying groundwater or the like contaminated with volatile organic compounds such as trichloroethylene and trichloroethane.
【０００２】[0002]
【従来の技術】揮発性有機化合物、特にトリクロロエチ
レン、トリクロロエタン等の有機塩素系化合物は、電子
部品や機械金属部品等の洗浄、クリーニング用洗剤、各
種化学品の溶剤や原料等として工業的に広く使用されて
いる。この有機塩素系化合物のなかには発ガン性のある
ものや発ガン性の疑いのあるもの、オゾン層の破壊の原
因となるものなどが多く含まれている。このため、この
有機塩素系化合物による地下水等の汚染が大きな社会問
題になっている。2. Description of the Related Art Volatile organic compounds, especially organochlorine compounds such as trichloroethylene and trichloroethane, are widely used industrially as detergents for cleaning and cleaning electronic parts and mechanical metal parts, and as solvents and raw materials for various chemicals. Have been. Many of these organochlorine-based compounds include those that are carcinogenic, those that are suspected of carcinogenic, and those that cause destruction of the ozone layer. For this reason, contamination of groundwater and the like by the organochlorine compound has become a major social problem.
【０００３】揮発性有機化合物により汚染された地下水
等の浄化方法としては、曝気処理と活性炭による吸着処
理とを組み合わせた吸着法が一般的である。吸着法によ
る浄化では、揮発性有機化合物を含む原水に空気が細か
い気泡状態で注入される。原水中の揮発性有機化合物
は、原水中の多数の気泡表面で、濃度の高い原水側から
濃度の低い空気側へ移動する。これにより、原水中の揮
発性有機化合物が除去される。即ち、原水が浄化され
る。[0003] As a method for purifying groundwater or the like contaminated with volatile organic compounds, an adsorption method in which aeration treatment and adsorption treatment with activated carbon are combined is generally used. In the purification by the adsorption method, air is injected into raw water containing a volatile organic compound in the form of fine bubbles. Volatile organic compounds in raw water move from the high-concentration raw water side to the low-concentration air side on the surface of many bubbles in the raw water. Thereby, volatile organic compounds in the raw water are removed. That is, the raw water is purified.
【０００４】一方、揮発性有機化合物により汚染された
空気（排ガス）は、活性炭による吸着処理で浄化された
後、大気中へ放出される。[0004] On the other hand, air (exhaust gas) contaminated by volatile organic compounds is purified by adsorption treatment with activated carbon and then released into the atmosphere.
【０００５】[0005]
【発明が解決しようとする課題】このような吸着法によ
る原水浄化では、一応、原水中の揮発性有機化合物が除
去される。しかし、原水中の有機化合物濃度が高い場合
は、複数の曝気装置を設置して、曝気処理を何段階も繰
り返すことにより、浄化効率を高める必要がある。その
ため、装置の設置面積が増大し、設置上の制約が非常に
大きくなる。また、曝気装置の設置数の増大に伴い設置
コストも増大する。In the purification of raw water by such an adsorption method, volatile organic compounds in the raw water are temporarily removed. However, when the concentration of the organic compound in the raw water is high, it is necessary to increase the purification efficiency by installing a plurality of aerators and repeating the aeration process in several stages. For this reason, the installation area of the device increases, and the restrictions on the installation become very large. In addition, the installation cost increases as the number of aeration devices installed increases.
【０００６】本発明の目的は、浄化効率が高く、しか
も、設置面積及び設置コストの低減が可能な揮発性有機
化合物含有水の浄化装置を提供することにある。An object of the present invention is to provide an apparatus for purifying water containing a volatile organic compound, which has high purification efficiency and can reduce the installation area and the installation cost.
【０００７】[0007]
【課題を解決するための手段】上記目的を達成するため
に、本発明の揮発性有機化合物含有水の浄化装置は、揮
発性有機化合物を含有する原水を上から下へ流通させる
一方、その原水中に含まれる揮発性有機化合物を除去す
るための媒体ガスを下から上へ流通させる処理塔本体
と、処理塔本体内に複数段に配置されており、処理塔本
体内に導入された原水を各段に一時的に滞留させると共
に、処理塔本体内に導入された媒体ガスを各段の滞留水
中に気泡化させて下から上へ通過させるように、各段の
それぞれに多数の気液通過孔が設けられた複数の漏れ棚
とを備えている。In order to achieve the above object, the apparatus for purifying water containing a volatile organic compound according to the present invention allows raw water containing a volatile organic compound to flow from top to bottom while the raw water containing the volatile organic compound flows from top to bottom. A processing tower body for flowing a medium gas for removing volatile organic compounds contained in water from below to above, and a plurality of stages are arranged in the processing tower body, and raw water introduced into the processing tower body is removed. A large number of gas-liquid passes through each stage so that the medium gas introduced into the processing tower body is bubbled into the accumulated water in each stage and passed from bottom to top while being temporarily retained in each stage. A plurality of leak shelves provided with holes.
【０００８】本発明の揮発性有機化合物含有水の浄化装
置では、処理塔本体内に複数段に配置された漏れ棚を、
原水が上段側から下段側へ順番に通過する毎に段階的に
曝気処理を受け、浄化度を高める。即ち、単一装置内で
垂直方向の多段曝気処理を受けることにより、原水が高
効率で浄化される。従って、高い浄化効率が得られ、し
かも、設置面積の増大が回避される。また、設置コスト
も、独立した曝気装置を平面的に多段配置する場合に比
べると安価となる。。In the apparatus for purifying water containing volatile organic compounds according to the present invention, the leak shelves arranged in a plurality of stages in the treatment tower main body are
Each time the raw water passes from the upper side to the lower side in order, it undergoes aeration treatment step by step to increase the degree of purification. That is, the raw water is purified with high efficiency by being subjected to the vertical multi-stage aeration treatment in a single device. Therefore, high purification efficiency is obtained, and an increase in installation area is avoided. Also, the installation cost is lower than in the case where the independent aerators are arranged in multiple stages in a plane. .
【０００９】処理塔本体は、原水をスプレーノズルによ
り噴霧状にして本体内に導入する構成が好ましい。この
構成により浄化効率が向上する。The treatment tower main body is preferably configured such that raw water is sprayed by a spray nozzle and introduced into the main body. This configuration improves the purification efficiency.
【００１０】前記媒体ガスは空気を使用することができ
る。[0010] The medium gas may be air.
【００１１】処理塔本体内を通過した媒体ガス、即ち原
水中の揮発性有機化合物により汚染された排ガスは、活
性炭吸着塔等を用いたガス処理ユニットにより浄化して
大気中へ放出する。[0011] The medium gas that has passed through the inside of the processing tower body, that is, the exhaust gas contaminated by the volatile organic compounds in the raw water, is purified by a gas processing unit using an activated carbon adsorption tower or the like and released to the atmosphere.
【００１２】[0012]
【発明の実施の形態】以下に本発明の好ましい実施形態
を図面に基づいて説明する。図１は本発明の実施形態に
係る揮発性有機化合物含有水の浄化装置の概略構成図、
図２は同分離除去装置に使用されている漏れ棚の拡大断
面図である。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a schematic configuration diagram of a device for purifying volatile organic compound-containing water according to an embodiment of the present invention,
FIG. 2 is an enlarged sectional view of a leak shelf used in the separation and removal apparatus.
【００１３】本実施形態に係る揮発性有機化合物含有水
の浄化装置は、トリクロロエチレン、トリクロロエタン
等の有機塩素系化合物に汚染された地下水、井戸水等の
浄化処理に使用される。The apparatus for purifying water containing volatile organic compounds according to this embodiment is used for purifying groundwater, well water, etc., which are contaminated with organic chlorine compounds such as trichloroethylene and trichloroethane.
【００１４】この浄化装置は、図１に示すように、トリ
クロロエチレン、トリクロロエタン等の有機塩素系化合
物を含む原水Ｗを、媒体ガスとしての空気Ｇにより浄化
処理する漏れ棚ユニットＡと、その浄化処理に伴って汚
染された空気Ｇ、即ち排ガスＧ′を浄化処理するガス処
理ユニットＢとを備えている。As shown in FIG. 1, the purifying apparatus includes a leak shelf unit A for purifying raw water W containing an organic chlorine compound such as trichloroethylene and trichloroethane with air G as a medium gas. A gas processing unit B for purifying the contaminated air G, that is, the exhaust gas G 'is provided.
【００１５】漏れ棚ユニットＡは、原水Ｗを空気Ｇと向
流接触させて浄化処理する縦型の原水処理塔１０と、原
水処理塔１０に原水Ｗを導入するためのポンプ２０と、
原水処理塔１０に空気Ｇを導入するためのファン３０と
を備えている。The leak shelf unit A includes a vertical raw water treatment tower 10 for purifying raw water W by bringing the raw water W into countercurrent contact with air G, a pump 20 for introducing the raw water W into the raw water treatment tower 10,
A fan 30 for introducing air G into the raw water treatment tower 10 is provided.
【００１６】原水処理塔１０は、円筒形状の処理塔本体
１１と、処理塔本体１１の内部に複数段に水平配置され
た漏れ棚１２，１２・・とを備えている。処理塔本体１
１内の上部には、原水Ｗを処理塔本体１１内に散布する
スプレー１３が、最上段の漏れ棚１２の上方に位置して
設けられている。一方、処理塔本体１１の下部には、空
気Ｇを処理塔本体１１内に導入するためのヘッダ１４
が、最下段の漏れ棚１２の下方に位置して設けられてい
る。The raw water treatment tower 10 includes a treatment tower main body 11 having a cylindrical shape, and leak shelves 12, 12,... Horizontally arranged in a plurality of stages inside the treatment tower main body 11. Processing tower body 1
A spray 13 for spraying the raw water W into the treatment tower main body 11 is provided at an upper portion in the upper part 1 above the leak shelf 12 at the uppermost stage. On the other hand, a header 14 for introducing air G into the processing tower main body 11 is provided at a lower portion of the processing tower main body 11.
Is provided below the lowermost leak shelf 12.
【００１７】スプレー１３により処理塔本体１１の上部
内に導入された原水Ｗは、漏れ棚１２，１２・・を上か
ら下へ順番に通過しつつ処理塔本体１１内を上から下へ
流通し、最下部から処理塔本体１１の外へ浄化処理水
Ｗ′として排出される。一方、ヘッダ１４を介して処理
塔本体１１の下部内に導入された空気Ｇは、原水Ｗとは
逆に、漏れ棚１２，１２・・を下から上へ順番に通過し
つつ処理塔本体１１内を下から上へ流通し、最上部から
処理塔本体１１の外へ排ガスＧ′として排出される。The raw water W introduced into the upper part of the processing tower body 11 by the spray 13 flows through the inside of the processing tower body 11 from top to bottom while passing through the leak shelves 12 in order from top to bottom. , Is discharged from the lowermost portion to the outside of the treatment tower main body 11 as purified treated water W '. On the other hand, the air G introduced into the lower part of the processing tower main body 11 via the header 14, opposite to the raw water W, passes through the leak shelves 12, 12,. The gas circulates from the bottom to the top, and is discharged from the uppermost part to the outside of the treatment tower main body 11 as an exhaust gas G ′.
【００１８】漏れ棚１２，１２・・は、処理塔本体１１
内に導入された原水Ｗをその上方に一時的に滞留させな
がら下方へ通過させる。また、処理塔本体１１内に導入
された空気Ｇを、気泡状態にして原水Ｗの滞留層中に下
方から注入して上方へ通過させる。この原水Ｗと空気Ｇ
の向流通過のために、各漏れ棚１２には、図２に示すよ
うに、多数の気液通過孔１２ａ，１２ａ・・が、所定の
ピッチで分散して設けられている。各気液通過孔１２ａ
は、垂直方向の貫通孔であり、下から上に向かって内径
が漸減するテーパ孔が、空気Ｇの気泡化を促進する効果
が大きいとされている。The leak shelves 12, 12,...
The raw water W introduced therein is passed downward while temporarily staying above the raw water W. Further, the air G introduced into the treatment tower main body 11 is made into a bubble state, injected into the stagnant layer of the raw water W from below, and passed upward. This raw water W and air G
As shown in FIG. 2, a number of gas-liquid passage holes 12a, 12a,... Are dispersedly provided at a predetermined pitch in each of the leak shelves 12. Each gas-liquid passage hole 12a
Is a through hole in the vertical direction, and a tapered hole whose inner diameter gradually decreases from bottom to top is said to have a large effect of promoting the formation of air G bubbles.
【００１９】排ガスＧ′を浄化処理するガス処理ユニッ
トＢは、気液分離器４０と、活性炭吸着塔５０と、ファ
ン６０とを備えており、ファン６０の作動により、原水
処理塔１０の最上部から排出される排ガスＧ′を、気液
分離器４０及び活性炭吸着塔５０に順番に通過させて大
気中へ放出する。気液分離器４０は、排ガスＧ′中の水
分を除去する。活性炭吸着塔５０は、水分を除去された
排ガスＧ′中の有機塩素系化合物を吸着除去する。The gas treatment unit B for purifying the exhaust gas G 'includes a gas-liquid separator 40, an activated carbon adsorption tower 50, and a fan 60. The exhaust gas G 'discharged from is passed through the gas-liquid separator 40 and the activated carbon adsorption tower 50 in order, and is discharged into the atmosphere. The gas-liquid separator 40 removes moisture in the exhaust gas G '. The activated carbon adsorption tower 50 adsorbs and removes organic chlorine-based compounds in the exhaust gas G 'from which water has been removed.
【００２０】次に、本実施形態に係る揮発性有機化合物
含有水の浄化装置の運転方法及び機能について説明す
る。Next, an operation method and functions of the apparatus for purifying water containing volatile organic compounds according to this embodiment will be described.
【００２１】運転中は、ポンプ２０及びファン３０，６
０が作動する。ポンプ２０が作動することにより、トリ
クロロエチレン、トリクロロエタン等の有機塩素系化合
物により汚染された地下水等が井戸等から汲み上げら
れ、原水Ｗとして原水処理塔１０内に上部から導入され
る。原水処理塔１０内に上部から導入された原水Ｗは、
原水処理塔１０内の漏れ棚１２，１２・・を上から下へ
順番に通過する。During operation, the pump 20 and the fans 30, 6
0 activates. When the pump 20 is operated, groundwater and the like contaminated with an organochlorine compound such as trichloroethylene and trichloroethane are pumped up from a well or the like, and introduced into the raw water treatment tower 10 as raw water W from above. Raw water W introduced from above into the raw water treatment tower 10
Pass through the leak shelves 12, 12,... In the raw water treatment tower 10 in order from top to bottom.
【００２２】一方、ファン３０，６０が作動することに
より、媒体ガスとしての空気Ｇが原水処理塔１０内に下
部から導入される。原水処理塔１０内に下部から導入さ
れた空気Ｇは、原水処理塔１０内の漏れ棚１２，１２・
・を下から上へ順番に通過する。On the other hand, when the fans 30 and 60 operate, air G as a medium gas is introduced into the raw water treatment tower 10 from below. The air G introduced from below into the raw water treatment tower 10 is leaked from the leak shelves 12, 12.
・ Pass from bottom to top in order.
【００２３】各段の漏れ棚１２では、その上に所定の層
厚Ｔで原水Ｗが滞留する。滞留水は多数の気液通過孔１
２ａ，１２ａ・・を通って下方へ流出するが、流出量と
等量の原水Ｗが上方から供給されるため、滞留水の層厚
Ｔは一定に維持される。この滞留水中には、下方から多
数の気液通過孔１２ａ，１２ａ・・を通って空気Ｇが注
入される。注入された空気Ｇは、滞留水中で細かな気泡
になり、滞留水中の有機塩素系化合物は、この気泡中に
移行する。有機塩素系化合物を放出した滞留水は、多数
の気液通過孔１２ａ，１２ａ・・から順次下方へ流出す
る。In each of the leak shelves 12, raw water W has a predetermined thickness T and stays thereon. The accumulated water has many gas-liquid passage holes 1
The raw water W flows out downward through the passages 2a, 12a,..., But the amount of raw water W is supplied from above, and the layer thickness T of the stagnant water is kept constant. Air G is injected into the stagnant water from below through many gas-liquid passage holes 12a. The injected air G becomes fine bubbles in the staying water, and the organochlorine compound in the staying water moves into the bubbles. The retained water that has released the organochlorine-based compound flows out sequentially downward through a number of gas-liquid passage holes 12a.
【００２４】原水処理塔１０内に導入された原水Ｗは、
原水処理塔１０内の漏れ棚１２，１２・・を上から下へ
順番に通過することにより、有機塩素系化合物を空気Ｇ
中へ移行させる形で段階的に減らし、最終的には有機塩
素系化合物を殆ど含まない状態となって、原水処理塔１
０の最下部から浄化処理水Ｗ′として放流される。The raw water W introduced into the raw water treatment tower 10 is
By passing through the leak shelves 12, 12,... In the raw water treatment tower 10 in order from top to bottom, the organic chlorine-based compound is
The raw water treatment tower 1 is gradually reduced by being transferred to the inside, and finally contains almost no organic chlorine-based compound.
0 is discharged as purified treated water W 'from the bottom.
【００２５】浄化処理水Ｗ′中の有機塩素系化合物濃度
が放流許容値（規制値）まで低下しない場合は漏れ棚ユ
ニットＡの出側に適数の別の漏れ棚ユニットを増設す
る。If the concentration of the organochlorine compound in the purified water W 'does not decrease to the discharge allowable value (regulated value), an appropriate number of other leak shelf units are added to the outlet side of the leak shelf unit A.
【００２６】一方、原水処理塔１０内に導入された空気
Ｇは、原水処理塔１０内の漏れ棚１２，１２・・を下か
ら上へ順番に通過することにより、原水Ｗ中の有機塩素
系化合物を段階的に吸着してその量を増やし、最終的に
は原水処理塔１０の最上部から排ガスＧ′としてガス処
理ユニットＢへ送られる。On the other hand, the air G introduced into the raw water treatment tower 10 passes through the leak shelves 12, 12,... The compound is adsorbed in a stepwise manner to increase the amount thereof, and finally sent from the uppermost portion of the raw water treatment tower 10 to the gas treatment unit B as an exhaust gas G '.
【００２７】ガス処理ユニットＢでは、気液分離器４０
により排ガスＧ′中の水分が除去され、活性炭吸着塔５
０により排ガスＧ′中の有機塩素系化合物が吸着除去さ
れた後、その排ガスＧ′が大気中へ放出される。In the gas processing unit B, the gas-liquid separator 40
The water in the exhaust gas G 'is removed by the
After the organic chlorine-based compound in the exhaust gas G 'is adsorbed and removed according to 0, the exhaust gas G' is released into the atmosphere.
【００２８】本発明者らによる実験では、スプレーノズ
ルを組み合わせた６段の漏れ棚構造により、トリクロロ
エチレン及びトリクロロエタンのいずれについても９２
％以上の除去率が得られることが確認されている。内訳
はスプレーノズルで７０％以上、漏れ棚１段につき約２
０％の除去率となる。In an experiment conducted by the present inventors, it was found that a 6-stage leak shelf structure combining spray nozzles provided 92% for both trichloroethylene and trichloroethane.
It has been confirmed that a removal rate of not less than% can be obtained. Breakdown is more than 70% for spray nozzle, about 2 per leak shelf
The removal rate is 0%.
【００２９】スプレーノズル１３により噴霧される原水
Ｗの水滴径は、原水Ｗ中の有機化合物の除去の点からは
細かい方がよいが、極度に細かくしようとすると原水Ｗ
中の混入物によるノズル詰まりによるトラブル発生や、
ポンプ２０の吐出圧力を高くすることによるコスト増加
が問題になるので、平均水滴径で０．３〜１ｍｍが好ま
しい。The water droplet diameter of the raw water W sprayed by the spray nozzle 13 is preferably small from the viewpoint of removing organic compounds from the raw water W. However, if the raw water W is to be extremely fine,
Troubles caused by nozzle clogging due to contaminants inside,
Since an increase in cost due to an increase in the discharge pressure of the pump 20 becomes a problem, the average water droplet diameter is preferably 0.3 to 1 mm.
【００３０】漏れ棚１２，１２・・・の段数は、原水Ｗ
中の有機化合物の除去率の点からは多いほうが良いが、
多すぎると原水処理塔１０のコスト増大が問題になると
共に、ファン３０の吐出圧力を高くする必要よりファン
３０のコスト及び運転費用が高くなるため、５〜１０段
が好ましい。The number of stages of the leak shelves 12, 12,...
It is better to increase the rate of removal of organic compounds inside,
If the amount is too large, the cost of the raw water treatment tower 10 will increase, and the cost and operating cost of the fan 30 will be higher than when the discharge pressure of the fan 30 is increased.
【００３１】各漏れ棚１２における気液通過孔１２ａ，
１２ａ・・は、原水Ｗ中の有機化合物の除去率の点から
は個々の孔径Ｄを小さくして個数を多くするのが良い
が、余りにも微細な場合は原水Ｗの流通性が悪化し、多
すぎる場合は加工コストの増加が問題になる。この観点
から、孔径Ｄについては３〜１０ｍｍが好ましく、個数
については、棚面積に対する合計孔面積の比率で表して
０．３〜０．６が好ましい。The gas-liquid passage holes 12a,
12a · · ·, from the viewpoint of the removal rate of organic compounds in the raw water W, it is better to reduce the individual pore diameter D and increase the number, but if too fine, the flowability of the raw water W deteriorates, If it is too large, an increase in processing cost becomes a problem. In this respect, the hole diameter D is preferably from 3 to 10 mm, and the number is preferably from 0.3 to 0.6 expressed as a ratio of the total hole area to the shelf area.
【００３２】また、気液通過孔１２ａ，１２ａ・・の孔
径Ｄ及びピッチＰは、漏れ棚１２の上に滞留させる原水
Ｗの層厚Ｔに影響を与えるので、所定の層厚Ｔが得られ
るように、吸着水Ｗの導入量に基づいて上記範囲内で選
択される。吸着水Ｗの層厚Ｔとしては最下段で３０〜６
０ｍｍが好ましい。この層厚Ｔが小さすぎると、原水Ｗ
中の有機化合物の除去率が低下し、大きすぎる場合はフ
ァン３０，６０の動力が大きくなり、経済性が低下す
る。The hole diameter D and the pitch P of the gas-liquid passage holes 12a, 12a... Affect the layer thickness T of the raw water W retained on the leak shelf 12, so that a predetermined layer thickness T is obtained. As described above, the selection is made within the above range based on the amount of the adsorbed water W introduced. The thickness T of the adsorbed water W is 30 to 6 at the bottom.
0 mm is preferred. If the layer thickness T is too small, the raw water W
If the removal rate of the organic compound in the inside is reduced, and if it is too large, the power of the fans 30 and 60 is increased, and the economic efficiency is reduced.
【００３３】また、原水処理塔１０内における、原水Ｗ
と媒体ガスである空気Ｇとの体積比は、原水Ｗ中の有機
化合物の除去の点からは、空気Ｇの比率が高いほどよい
が、空気Ｇの比率が高くなると、ガス処理ユニットＢ及
びファン３０，６０のコスト増加が問題になるので、原
水Ｗ１リットルに対する空気Ｇの体積で表して、０．１
〜０．２ｍ2 が好ましい。In the raw water treatment tower 10, raw water W
From the viewpoint of removing organic compounds in the raw water W, the volume ratio between the air G and the medium gas is preferably higher as the ratio of the air G is higher. Since the cost increase of 30, 60 becomes a problem, the volume of air G per liter of raw water W is 0.1%.
~ 0.2 m 2 is preferred.
【００３４】[0034]
【発明の効果】以上に説明した通り、本発明の揮発性有
機化合物含有水の浄化装置は、複数段の漏れ棚による垂
直方向の多段曝気処理により、原水を高効率で浄化でき
る。しかも、その浄化効率に比して設置面積が小さく、
設置面積による制約が非常に小さい。また、設置コスト
も、その浄化効率に比して安価となる。従って、経済性
に非常に優れる。As described above, the apparatus for purifying water containing volatile organic compounds according to the present invention can purify raw water with high efficiency by vertical multi-stage aeration using a plurality of leak shelves. Moreover, the installation area is small compared to its purification efficiency,
Very limited by installation area. In addition, the installation cost is lower than the purification efficiency. Therefore, it is very economical.
【図１】本発明の実施形態にかかる揮発性有機化合物含
有水の浄化装置の概略構成図である。FIG. 1 is a schematic configuration diagram of an apparatus for purifying water containing volatile organic compounds according to an embodiment of the present invention.
【図２】同浄化装置に使用されている漏れ棚の拡大断面
図である。FIG. 2 is an enlarged sectional view of a leak shelf used in the purifying apparatus.
Ａ 漏れ棚ユニット Ｂ ガス処理ユニット １０ 原水処理塔 １１ 処理塔本体 １２ 漏れ棚 １２ａ 気液通過孔 １３ スプレー １４ ヘッダ ２０ ポンプ ３０ ファン ４０ 気液分離器 ５０ 活性炭吸着塔 ６０ ファン A Leak shelf unit B Gas treatment unit 10 Raw water treatment tower 11 Treatment tower main body 12 Leak shelf 12a Gas-liquid passage hole 13 Spray 14 Header 20 Pump 30 Fan 40 Gas-liquid separator 50 Activated carbon adsorption tower 60 Fan
フロントページの続き Ｆターム(参考） 4D002 AA21 AC10 BA04 CA07 DA41 EA02 EA05 FA01 4D011 AA15 AB01 AB04 AC02 AC04 AC06 AD01 AD03 4D037 AA01 AB14 BA23 BB01 BB04 BB05 CA01 4G066 AA05B CA33 DA02 Continued on the front page F term (reference) 4D002 AA21 AC10 BA04 CA07 DA41 EA02 EA05 FA01 4D011 AA15 AB01 AB04 AC02 AC04 AC06 AD01 AD03 4D037 AA01 AB14 BA23 BB01 BB04 BB05 CA01 4G066 AA05B CA33 DA02
Claims (5)
その有機化合物を分離除去する揮発性有機化合物含有水
の浄化装置であって、 前記原水を上から下へ流通させる一方、その原水中に含
まれる揮発性有機化合物を除去するための媒体ガスを下
から上へ流通させる処理塔本体と、 処理塔本体内に複数段に配置されており、処理塔本体内
に導入された原水を各段に一時的に滞留させると共に、
処理塔本体内に導入された媒体ガスを各段の滞留水中に
気泡化させて下から上へ通過させるように、各段のそれ
ぞれに多数の気液通過孔が設けられた複数の漏れ棚とを
備えることを特徴とする揮発性有機化合物含有水の浄化
装置。An apparatus for purifying volatile organic compound-containing water that separates and removes an organic compound from raw water containing a volatile organic compound, wherein the raw water is circulated from top to bottom, and A processing tower body for flowing a medium gas for removing volatile organic compounds contained therein from below to above, and a plurality of stages disposed in the processing tower body, and raw water introduced into the processing tower body is supplied to each stage. While temporarily staying at
A plurality of leak shelves provided with a large number of gas-liquid passage holes in each stage so that the medium gas introduced into the processing tower body is bubbled into the stagnant water of each stage and passed from bottom to top. An apparatus for purifying water containing volatile organic compounds, comprising:
ルにより噴霧状にして本体内に導入する構成である請求
項１に記載の揮発性有機化合物含有水の浄化装置。2. The apparatus for purifying water containing volatile organic compounds according to claim 1, wherein the main body of the treatment tower is configured such that raw water is sprayed by a spray nozzle and introduced into the main body.
載の揮発性有機化合物含有水の浄化装置。3. The apparatus for purifying water containing volatile organic compounds according to claim 1, wherein the medium gas is air.
浄化するガス処理ユニットを備える請求項１に記載の揮
発性有機化合物含有水の浄化装置。4. The apparatus for purifying water containing a volatile organic compound according to claim 1, further comprising a gas treatment unit for purifying a medium gas that has passed through the inside of the treatment tower main body.
有する請求項４に記載の揮発性有機化合物含有水の浄化
装置。5. The apparatus for purifying water containing a volatile organic compound according to claim 4, wherein the gas treatment unit has an activated carbon adsorption tower.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000083568A JP3643979B2 (en) | 2000-03-24 | 2000-03-24 | Purification equipment for water containing volatile organic compounds |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000083568A JP3643979B2 (en) | 2000-03-24 | 2000-03-24 | Purification equipment for water containing volatile organic compounds |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001259304A true JP2001259304A (en) | 2001-09-25 |
| JP3643979B2 JP3643979B2 (en) | 2005-04-27 |
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ID=18600183
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000083568A Expired - Fee Related JP3643979B2 (en) | 2000-03-24 | 2000-03-24 | Purification equipment for water containing volatile organic compounds |
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| Country | Link |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012157808A (en) * | 2011-01-31 | 2012-08-23 | Anest Iwata Corp | Vacuum-evaporation-based voc recovery apparatus and method |
| JP2014240075A (en) * | 2014-09-09 | 2014-12-25 | アネスト岩田株式会社 | Vacuum-evaporation-based voc recovery apparatus and method |
| JP2015006672A (en) * | 2014-09-09 | 2015-01-15 | アネスト岩田株式会社 | Vacuum-evaporation-based voc recovery apparatus and method |
-
2000
- 2000-03-24 JP JP2000083568A patent/JP3643979B2/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012157808A (en) * | 2011-01-31 | 2012-08-23 | Anest Iwata Corp | Vacuum-evaporation-based voc recovery apparatus and method |
| JP2014240075A (en) * | 2014-09-09 | 2014-12-25 | アネスト岩田株式会社 | Vacuum-evaporation-based voc recovery apparatus and method |
| JP2015006672A (en) * | 2014-09-09 | 2015-01-15 | アネスト岩田株式会社 | Vacuum-evaporation-based voc recovery apparatus and method |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3643979B2 (en) | 2005-04-27 |
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