JP2001249460A5 - - Google Patents
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- JP2001249460A5 JP2001249460A5 JP2000318057A JP2000318057A JP2001249460A5 JP 2001249460 A5 JP2001249460 A5 JP 2001249460A5 JP 2000318057 A JP2000318057 A JP 2000318057A JP 2000318057 A JP2000318057 A JP 2000318057A JP 2001249460 A5 JP2001249460 A5 JP 2001249460A5
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- JP
- Japan
- Prior art keywords
- group
- radiation
- acid
- atom
- substituted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 230000005855 radiation Effects 0.000 description 11
- 125000004432 carbon atom Chemical group C* 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 6
- 125000006165 cyclic alkyl group Chemical group 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000002253 acid Substances 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O ammonium group Chemical group [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 150000007514 bases Chemical class 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 125000004437 phosphorous atom Chemical group 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000318057A JP4272805B2 (ja) | 1999-12-27 | 2000-10-18 | ポジ型感放射線性組成物 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11-370355 | 1999-12-27 | ||
| JP37035599 | 1999-12-27 | ||
| JP2000318057A JP4272805B2 (ja) | 1999-12-27 | 2000-10-18 | ポジ型感放射線性組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001249460A JP2001249460A (ja) | 2001-09-14 |
| JP2001249460A5 true JP2001249460A5 (https=) | 2006-01-12 |
| JP4272805B2 JP4272805B2 (ja) | 2009-06-03 |
Family
ID=26582222
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000318057A Expired - Lifetime JP4272805B2 (ja) | 1999-12-27 | 2000-10-18 | ポジ型感放射線性組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4272805B2 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7214465B2 (en) | 2002-01-10 | 2007-05-08 | Fujifilm Corporation | Positive photosensitive composition |
| JP7519205B2 (ja) * | 2019-04-24 | 2024-07-19 | 住友化学株式会社 | カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
| KR20250055600A (ko) | 2022-09-30 | 2025-04-24 | 후지필름 가부시키가이샤 | 감활성광선성 또는 감방사선성 수지 조성물, 감활성광선성 또는 감방사선성막, 패턴 형성 방법 및 전자 디바이스의 제조 방법 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3238465B2 (ja) * | 1991-04-30 | 2001-12-17 | 株式会社東芝 | パターン形成用レジストおよびパターン形成方法 |
| JP3549592B2 (ja) * | 1994-11-02 | 2004-08-04 | クラリアント インターナショナル リミテッド | 放射線感応性組成物 |
| JP3942263B2 (ja) * | 1997-03-05 | 2007-07-11 | 信越化学工業株式会社 | 高分子化合物、化学増幅ポジ型レジスト材料及びパターン形成方法 |
| JP3991462B2 (ja) * | 1997-08-18 | 2007-10-17 | Ｊｓｒ株式会社 | 感放射線性樹脂組成物 |
| JPH11167199A (ja) * | 1997-12-03 | 1999-06-22 | Fuji Photo Film Co Ltd | ポジ型フォトレジスト組成物 |
| JP3955385B2 (ja) * | 1998-04-08 | 2007-08-08 | Ａｚエレクトロニックマテリアルズ株式会社 | パターン形成方法 |
| TWI250379B (en) * | 1998-08-07 | 2006-03-01 | Az Electronic Materials Japan | Chemical amplified radiation-sensitive composition which contains onium salt and generator |
| US6200728B1 (en) * | 1999-02-20 | 2001-03-13 | Shipley Company, L.L.C. | Photoresist compositions comprising blends of photoacid generators |
| JP4023086B2 (ja) * | 1999-12-27 | 2007-12-19 | 和光純薬工業株式会社 | スルホニウム塩化合物 |
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2000
- 2000-10-18 JP JP2000318057A patent/JP4272805B2/ja not_active Expired - Lifetime