JP2001237265A - Board for connecting electric apparatus - Google Patents

Board for connecting electric apparatus

Info

Publication number
JP2001237265A
JP2001237265A JP2000043765A JP2000043765A JP2001237265A JP 2001237265 A JP2001237265 A JP 2001237265A JP 2000043765 A JP2000043765 A JP 2000043765A JP 2000043765 A JP2000043765 A JP 2000043765A JP 2001237265 A JP2001237265 A JP 2001237265A
Authority
JP
Japan
Prior art keywords
wiring
acf
substrate
lead
electric component
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000043765A
Other languages
Japanese (ja)
Inventor
Hitoshi Suda
仁 須田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP2000043765A priority Critical patent/JP2001237265A/en
Publication of JP2001237265A publication Critical patent/JP2001237265A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector

Abstract

PROBLEM TO BE SOLVED: To solve the problems incident to thermocompression of an ACF that 1) bubbles are generated, and 2) density of conductive particles is decreased by outflow of ACF. SOLUTION: In the board for connecting an electric apparatus where protrusion electrodes provided on the lower surface of an electric component is connected with wiring provided on a flexible insulating board through an anisotropic conductive film by thermocompression, a wall having a delivery part for guiding molten binder and bubbles generated at the time of thermocompression is provided at a position space apart from the wiring on the inside of the abutting position of the protrusion electrodes.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は液晶表示装置、携帯
電話、電子計算機など電気装置の接続に用いる基板に関
し、就中、可撓性絶縁基板にて構成される電気装置の接
続に用いる基板に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate used for connecting an electric device such as a liquid crystal display device, a portable telephone, and an electronic computer, and more particularly to a substrate used for connecting an electric device formed of a flexible insulating substrate. .

【0002】[0002]

【従来の技術】現在は、フレキシブル即ち可撓性で且つ
絶縁性を有する薄板を基板として用い、電気部品を搭載
して回路を構成したり、電気的な配線をしたりして、こ
れを液晶表示装置や携帯電話、電子計算機などに組み込
むための基板として用いられている。
2. Description of the Related Art At present, a thin plate having flexibility, that is, a flexible and insulating property is used as a substrate, and electric components are mounted on the substrate to form a circuit or to perform electric wiring. It is used as a substrate to be incorporated in a display device, a mobile phone, an electronic computer, and the like.

【0003】従来の技術について図2及び図3を参照し
て説明する。図2は従来の技術を説明するための一部分
を示した平面図、図3は図2のA−A断面を示す部分的
断面図である。
[0003] The prior art will be described with reference to FIGS. 2 and 3. FIG. 2 is a plan view showing a part for explaining a conventional technique, and FIG. 3 is a partial cross-sectional view showing an AA cross section of FIG.

【0004】従来のフレキシブルな即ち可撓性を有する
絶縁薄板を基板として電気機器の組み込みに用いる構造
の例を説明する。図示する如く、可撓性で且つ絶縁性薄
板基板1に設けられた導電体で形成される配線2が先ず
準備される。配線2は設計を具体化するように任意の形
状を有しているのは当然である。
A description will be given of an example of a conventional structure in which a flexible insulating thin plate is used as a substrate for incorporating an electric device. As shown in the drawing, a wiring 2 formed of a conductor provided on a flexible and insulating thin plate substrate 1 is first prepared. It is natural that the wiring 2 has an arbitrary shape so as to embody the design.

【0005】電気部品3はその下面に突起電極4が設け
られており、配線2の一部よりなる配線電極5と接続さ
れる。その接続方法は、電気部品3の専有面積より僅か
に大きな面積の異方性導電膜(以下ACFと称する)7
が設けられ、その後、電気部品3で加熱圧着して固定さ
れる。更には、基板全体は電気部品3を設置する領域以
外の大部分を覆って配線2の保護膜6が設けられてい
る。
The electric component 3 has a protruding electrode 4 provided on the lower surface thereof, and is connected to a wiring electrode 5 which is a part of the wiring 2. The connection method uses an anisotropic conductive film (hereinafter referred to as ACF) 7 having an area slightly larger than the occupied area of the electric component 3.
Is provided, and is then heat-pressed and fixed with the electric component 3. Further, a protective film 6 for the wiring 2 is provided so as to cover most of the entire substrate except for a region where the electric component 3 is provided.

【0006】ACFは導電性粒子を接着剤中に分散した
フィルムであり、接続したい電極、本例であれば、電気
部品3の突起電極4と配線2の一部である配線電極5の
間に挟み、加熱圧着によって導電性粒子(図示しない)
を介し電気的に接続し、接着剤によって両電極4、5間
を固定保持する方法に用いられる。
The ACF is a film in which conductive particles are dispersed in an adhesive. An ACF is provided between an electrode to be connected, in this case, a projecting electrode 4 of the electric component 3 and a wiring electrode 5 which is a part of the wiring 2. Conductive particles (not shown) by sandwiching and heating and pressing
Are electrically connected via a wire, and are used for a method of fixing and holding the two electrodes 4 and 5 with an adhesive.

【0007】このACFを用いる方法は微細な間隔で電
極を多く設けた電気部品などの電極の取り出しに便利で
ある。しかし、次の問題点を有する。1)加熱時に発泡
する。2)ACFの接着剤層が溶融して流れ出し含まれ
ている導電性粒子の密度が低下する。
The method using the ACF is convenient for taking out electrodes such as electric parts provided with many electrodes at fine intervals. However, it has the following problems. 1) Foams when heated. 2) The density of the conductive particles contained in the adhesive layer of the ACF melted out and reduced.

【0008】問題点1)の説明をするために、図2、3
中に気泡8を示した。気泡8は、例えば配線電極間に存
在すると温度の上昇及び加工によって気泡8の大きさは
変化しその結果、突起電極4と配線電極5とが剥離する
力となり信頼性に影響を与える。更には、気泡8の存在
は外部の湿気が直接的に電極に影響を与える事となり解
決すべき問題点である。
To explain the problem 1), FIGS.
Bubbles 8 were shown inside. When the bubbles 8 are present between the wiring electrodes, for example, the size of the bubbles 8 changes due to an increase in temperature and processing, and as a result, the protrusion electrode 4 and the wiring electrode 5 are separated from each other, which affects reliability. Further, the presence of the bubbles 8 is a problem to be solved because external moisture directly affects the electrodes.

【0009】また電気部品3の下に潜り込んで固定され
た気泡8は、上記した剥離の力となるがそれよりも、気
泡の電気部品との接触部面積だけ絶縁性樹脂即ち接着剤
のない部分が発生することによる耐湿性の問題が大きい
のである。
The air bubbles 8 sunk under the electric part 3 and fixed thereon serve as the above-mentioned peeling force. The problem of the moisture resistance due to the occurrence of is large.

【0010】問題点1)を解決するために特開平7−3
7936は、液晶パネル基板上にITO電極とTABリ
ードとを接合部に気泡無く貼付できるACFボンダーを
提案している。ACFを貼り付ける装置に工夫をし単に
押さえて貼付するのではなく摺接移動させて張り付けを
するための装置である。即ち、加圧に供する押圧部が流
線型に形成され発生した気泡を貼付時に除去してしまう
方法である。
In order to solve the problem 1), Japanese Patent Laid-Open No. 7-3
No. 7936 proposes an ACF bonder which can attach an ITO electrode and a TAB lead on a liquid crystal panel substrate without bubbles at a joint portion. This is a device for devising a device for attaching the ACF and moving it in a sliding contact, instead of simply holding down and attaching the device. In other words, this is a method in which a pressing portion provided for pressurization is formed in a streamline shape and generated bubbles are removed at the time of sticking.

【0011】問題点2)を解決するために特開平9−2
44047は、フリップチップ方式の液晶表示装置に於
いて駆動用ICを実装する際、ACFを加熱するときに
ICのバンプの下から流出する導電粒子の数を抑制する
構造を提案している。具体的には、図2、図3で示せば
配線電極5に突起電極4より小さい広がりの流出防止壁
を設けてACFの流出防止する構造が開示されている。
To solve the problem 2), Japanese Patent Application Laid-Open No. 9-2
No. 44047 proposes a structure for suppressing the number of conductive particles flowing out from under the bumps of an IC when heating a ACF when mounting a driving IC in a flip-chip type liquid crystal display device. Specifically, as shown in FIGS. 2 and 3, there is disclosed a structure in which the wiring electrode 5 is provided with an outflow preventing wall which is smaller than the protruding electrode 4 to prevent the ACF from flowing out.

【0012】[0012]

【発明が解決しようとする課題】本発明は前記したAC
Fを用いて電気部品を基板に接続固定する際に、1)加
熱時に発泡する。2)ACFの接着剤層が溶融して流れ
出し含まれている導電性粒子の密度が低下する。という
問題点を解決又は、軽微な症状にするものである。
SUMMARY OF THE INVENTION The present invention relates to the AC
When connecting and fixing an electric component to a substrate using F, 1) foaming occurs during heating. 2) The density of the conductive particles contained in the adhesive layer of the ACF melted out and reduced. It is intended to solve the problem described above or to make it a minor symptom.

【0013】ACFの発泡は皆無にすることは出来な
い。発泡の原因は不明であるが、a)基板を介して或い
は接続したい電気部品を介して加熱し、ACFを間接的
に加熱するとき均一性が欠除し、その結果気泡が発生す
るものと考えられている。ACFボンダーだけで解決し
ようとしても困難である。特に、チップオンフィルム
(以下COFと称する)で代表される電気部品からの加
熱エネルギーをACFに与えようとする方法では、平行
度だけでは不可能である。
ACF foaming cannot be completely eliminated. Although the cause of the foaming is unknown, a) It is considered that when the ACF is heated through a substrate or an electrical component to be connected and the ACF is indirectly heated, the uniformity is lost, and as a result, bubbles are generated. Have been. It is difficult to solve the problem with the ACF bonder alone. In particular, in a method in which heating energy from an electric component represented by a chip-on-film (hereinafter, referred to as COF) is applied to the ACF, it is impossible only by the degree of parallelism.

【0014】又、ACFの接着剤が溶融したときに流れ
出してしまうことも完全には防止できない。それは、部
品の幅は夫々差があるということと、フィルム状にして
用いるACFの幅を部品毎に変更して最適の幅を貼付で
きないことなどから、必要幅より大きめの幅を選んでし
まうことになり加熱圧着工程で結局余分な量が排出され
るのである。その結果、金属粒子がそれと共に一部排出
されてしまうことになる。
Further, it is not possible to completely prevent the ACF adhesive from flowing out when it is melted. The reason for this is that the width of each part is different, and the width of the ACF used in the form of a film is changed for each part and the optimum width cannot be attached. Therefore, an extra amount is eventually discharged in the heating and pressing process. As a result, some of the metal particles are discharged together therewith.

【0015】本発明は上記した問題点の少なくとも一つ
を解決するものである。又、従来の工程作業方法と比較
して工数を悪くしない基板の構造を提供するものであ
る。更には、本発明によって管理された方向に余分なA
CFが吐き出されることによって歩留まりが向上しコス
ト低減に寄与する基板を提供するものである。
The present invention solves at least one of the above problems. It is another object of the present invention to provide a structure of a substrate that does not deteriorate the number of steps as compared with a conventional process operation method. Further, extra A in the direction controlled by the present invention
The purpose of the present invention is to provide a substrate that contributes to a reduction in cost by improving the yield by discharging CF.

【0016】[0016]

【課題を解決するための手段】本発明は、電気部品の下
面に設けられた突起電極と、可撓性絶縁基板に設けられ
た配線とを、異方性導電膜を介して熱圧着により接続固
定した電気装置の接続に用いる基板に於いて、前記電気
部品の突起電極の当接する位置より内側にして前記配線
より離間した位置に熱圧着時に発生する気泡及び前記バ
インダーの溶融体を導く導出壁を設けたことを特徴とす
る電気装置の接続に用いる基板にある。
According to the present invention, a projecting electrode provided on the lower surface of an electric component and a wiring provided on a flexible insulating substrate are connected by thermocompression bonding via an anisotropic conductive film. In a substrate used for connection of a fixed electric device, a lead-out wall for introducing bubbles generated during thermocompression bonding and a melt of the binder to a position inside the position where the protruding electrode of the electric component comes into contact with and separated from the wiring. A substrate used for connection of an electric device.

【0017】本発明は、可撓性絶縁基板に設けられた配
線材料で前記配線及び前記導出壁を形成したことを特徴
とする電気装置の接続に用いる基板にある。
According to the present invention, there is provided a substrate used for connection of an electric device, wherein the wiring and the lead-out wall are formed of a wiring material provided on a flexible insulating substrate.

【0018】また、本発明は前記導出壁は電気部品の外
側にして前記配線を構成した配線群から離間した位置に
導出壁の吐出部を設けたを形成したことを特徴とする電
気装置の接続に用いる基板にある。
Further, the present invention is characterized in that the lead-out wall is provided outside the electric component and a discharge portion of the lead-out wall is formed at a position separated from the wiring group constituting the wiring. Substrate.

【0019】[0019]

【発明の実施の形態】図1は本発明の一実施の形態を説
明するための平面図である。本発明による電気装置の接
続に用いる基板は、可撓性であって絶縁性の薄板基板1
1に配線12が配置されており、電気部品13は配線端
部にして電気部品に設けられた突起電極14に対応する
位置に設けられた配線電極15と電気的に接続される。
FIG. 1 is a plan view for explaining an embodiment of the present invention. The substrate used to connect the electric device according to the present invention is a flexible and insulating thin substrate 1
1, a wiring 12 is arranged, and an electric component 13 is electrically connected to a wiring electrode 15 provided at a position corresponding to a projecting electrode 14 provided on the electric component at a wiring end.

【0020】本発明による基板は、一般的に広い面積の
保護膜16が設置されている。保護膜16は、電気部品
13を設置する領域より僅かに大きな面積の開口部が設
けられその上からACF17を介して電気部品13が接
続される。従来の技術の項目でACFについて説明した
ので本項ではそれを省く。又同様に、図では導電性粒子
を省略している。
The substrate according to the present invention is generally provided with a protective film 16 having a large area. The protective film 16 is provided with an opening having an area slightly larger than a region where the electric component 13 is provided, and the electric component 13 is connected thereto via the ACF 17 from above. Since the ACF has been described in the section of the prior art, it is omitted in this section. Similarly, the conductive particles are omitted in the figure.

【0021】本発明の特徴は、図示するように導出壁1
9が設けられていることである。導出壁19は、薄板基
板1に設けられた導電性の金属であって配線12と同じ
材料で構成される。この材料は、銅箔に金メッキをした
ものであっても、導出壁19に金が存在しなくても同じ
材料と定義するものである。即ち、配線12として用い
た材料のどの導電体部分であってもそれを導出壁19の
材料と呼ぶのである。
The feature of the present invention is as shown in FIG.
9 is provided. The lead-out wall 19 is a conductive metal provided on the thin plate substrate 1 and is made of the same material as the wiring 12. This material is defined as the same material even if copper foil is plated with gold or gold is not present on the lead-out wall 19. That is, any conductive portion of the material used for the wiring 12 is referred to as the material of the lead-out wall 19.

【0022】導出壁19の形状は、配線電極15の先端
より内側で、電気的に短絡を防止できる離間距離がある
位置に配置される。しかも少なくとも1ケの吐出部20
を有している。その吐出部20は、配線12が粗である
位置に設けるのが適している。本発明による導出壁19
と吐出部20の相関は、矩形の導出壁19を作り吐出部
20を両側に配置できるように設計するのが汎用性のあ
る使い方である。
The shape of the lead-out wall 19 is located inside the tip of the wiring electrode 15 at a position where there is a separation distance that can prevent an electrical short circuit. Moreover, at least one discharge unit 20
have. The discharge unit 20 is suitably provided at a position where the wiring 12 is rough. Outgoing wall 19 according to the invention
The correlation between the discharge section 20 and the discharge section 20 is a versatile use in which a rectangular outlet wall 19 is formed and the discharge section 20 is designed to be arranged on both sides.

【0023】具体的な数値を示すと、電気部品13は
縦、横、厚さが夫々3mm、11mm、0.6mmであ
り保護膜16の開口部は縦、横が3.25mm、12m
mであり、その厚さは0.01mmであった。ACFの
縦、横、厚さは3.5mm、13mm、0.03mmで
あった。配線12は幅80μmで厚さが15μmの数値
でその先端に配線電極15が120本、長辺に並んでい
た。又突起電極14はその高さが14μmの台形をして
おり当然の事ながら上記配線電極に対応していた。
Specifically, the electric component 13 is 3 mm, 11 mm and 0.6 mm in length, width and thickness, respectively, and the opening of the protective film 16 is 3.25 mm and 12 m in length and width.
m and its thickness was 0.01 mm. The length, width, and thickness of the ACF were 3.5 mm, 13 mm, and 0.03 mm. The wiring 12 had a value of 80 μm in width and 15 μm in thickness, and had 120 wiring electrodes 15 at its tip and arranged along the long side. The protruding electrode 14 has a trapezoidal shape with a height of 14 μm, and naturally corresponds to the wiring electrode.

【0024】ACFは上記具体例であればその厚さ方向
の約15%程度溶融して流れ出す。導出壁の内側の領域
は、導出壁に従って流れ配線の密度が粗な領域に排出さ
れる。又、導出壁の外側即ち配線群が電気部品の下まで
入り込んでいる領域はACFとして全体の10%にも満
たない面積であるので流出する率は約15%と前記内側
の領域と同じであるが流出する絶対量が少ないのは当然
である。
In the specific example described above, the ACF melts and flows out by about 15% in the thickness direction. The area inside the outlet wall is discharged to an area where the density of the flow wiring is coarse according to the outlet wall. The area outside the lead-out wall, that is, the area where the wiring group enters under the electric component is less than 10% of the entire area of the ACF, so that the outflow rate is about 15%, which is the same as the inside area. It is natural that the absolute amount of effluent is small.

【0025】発泡による気泡は、全体が均一に発生する
とすれば絶対量の大きな導出壁の内側に発生しそれは
「押し倉饅頭」の如くに吐出部から押し出され、不用意
に事故を起こさない管理された領域に導かれることが多
い。一方、導出壁の外側即ち部品の下面まで達している
配線群の領域は10%しか発泡の影響を受けず大部分は
導出壁で処理されるので、影響はなくなる。小さいもの
が集約されて大きくなる泡は、殆どが導出壁の内側で発
生し外側には影響を与えないとも表現できるもである。
If the entire bubble is generated uniformly, it is generated inside the outlet wall having a large absolute amount, and is pushed out from the discharge portion like a "punched bun" to prevent accidental accidental occurrence. In many cases, it is led to the specified area. On the other hand, the area of the wiring group that reaches the outside of the outlet wall, that is, the lower surface of the component, is affected by foaming only by 10% and is mostly processed by the outlet wall. Bubbles that are small and aggregated and become large can be described as mostly occurring inside the outlet wall and not affecting the outside.

【0026】[0026]

【発明の効果】本発明によれば、電気部品の下に吐出部
を持った導出壁を設けることに特徴を有する。この導出
壁は、薄板基板をエッチングして配線を作るとき、この
部分のパターンを同一マスクに写し込んだパターンを用
いれば全くこの工程に於ける工数は増加しない。
According to the present invention, an outlet wall having a discharge portion is provided under an electric component. This lead-out wall does not increase the man-hour in this step at all if a pattern in which the pattern of this portion is transferred to the same mask is used when wiring is formed by etching the thin plate substrate.

【0027】又材料費に関しては、銅箔をエッチングし
て配線を作るときに不要領域としてエッチオフされる部
分でありこれも費用は掛からない。
The material cost is a portion which is etched off as an unnecessary region when a wiring is formed by etching a copper foil, and this cost is not required.

【0028】従って工数も、材料費も変化しない構造の
電気装置の接続に用いる基板と言うことが出来る。
Therefore, it can be said that the substrate is used for connecting an electric device having a structure in which the number of steps and the material cost do not change.

【0029】本発明によれば、発泡によりACFの一部
に残る泡については、導出壁内では大きくなっても「押
し倉饅頭」効果で出て行く確率が高くなるし、ACFの
接着剤が出て行く場所は予め決められた安全な場所へ吐
出部から排出される。しかも当然の事ながら、導出壁で
囲繞される領域の外側では泡の発生自体が少ないので、
特に配線間に影響を与えないのである。
According to the present invention, the probability of foam remaining in a part of the ACF due to foaming in the outlet wall even if it becomes large in the outlet wall increases due to the “pressing bun” effect. The exit location is discharged from the discharge unit to a predetermined safe location. Moreover, naturally, the generation of bubbles is small outside the area surrounded by the outlet wall,
In particular, there is no effect between the wirings.

【0030】溶融したACFを構成する接着剤が流出す
る際に混入された導電性粒子も共に流出し密度が低下す
ることについては、流出量を導出壁で大部分と、少量の
領域に分割することによって、外側の配線部分から流出
するACFの量そのものが少ないので導電性粒子だけが
特に多く流出することがなかった。従って、ACFを貼
付したときの密度と接着を終わったときの密度との差は
ー20%(貼付時の80%の意)程度であり、巷間言わ
れているように貼付時の20%〜30%にまで低下する
ことはなかった。
Regarding the fact that the conductive particles mixed in when the adhesive constituting the melted ACF flows out also flow out and the density is reduced, the outflow is divided into a large portion and a small amount in the outlet wall. As a result, the amount of the ACF flowing out of the outer wiring portion itself is small, so that only the conductive particles do not flow particularly large. Therefore, the difference between the density when the ACF is applied and the density when the ACF is completed is about -20% (meaning 80% at the time of application), and as is widely known, 20% or less at the time of application. It did not drop to 30%.

【0031】又、導出壁の内側は導電性粒子の存在は必
要ではない。即ち、必要な領域は突起電極と配線電極と
で挟まれた部分だけであるからである。従って導出壁の
内側は接着剤の効果さえあれば機能を満足するのであ
る。
Further, the presence of the conductive particles is not necessary inside the outlet wall. That is, the necessary region is only a portion sandwiched between the protruding electrode and the wiring electrode. Therefore, the inside of the outlet wall satisfies the function as long as there is an effect of the adhesive.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の説明をするための平面図。FIG. 1 is a plan view for explaining the present invention.

【図2】従来例を説明するための平面図。FIG. 2 is a plan view for explaining a conventional example.

【図3】従来例を説明するための図2のA−A断面図。FIG. 3 is a sectional view taken along line AA of FIG. 2 for explaining a conventional example.

フロントページの続き Fターム(参考) 5E319 AA03 AB05 AC03 BB16 CC61 GG20 5E336 AA04 BB01 BB12 BC28 CC34 CC55 CC58 DD13 EE08 GG12 GG30 5E338 AA01 AA12 BB61 CC01 CD11 EE11 EE33 EE51 5F044 KK03 KK09 LL09 Continued on the front page F-term (reference) 5E319 AA03 AB05 AC03 BB16 CC61 GG20 5E336 AA04 BB01 BB12 BC28 CC34 CC55 CC58 DD13 EE08 GG12 GG30 5E338 AA01 AA12 BB61 CC01 CD11 EE11 EE33 EE51 5F044 KK03 KK09

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 電気部品の下面に設けられた突起電極
と、可撓性絶縁基板に設けられた配線とを、異方性導電
膜を介して熱圧着により接続固定した電気装置の接続に
用いる基板に於いて、前記電気部品の突起電極の当接す
る位置より内側にして前記配線より離間した位置に熱圧
着時に発生する気泡及び前記バインダーの溶融体を導く
導出壁を設けたことを特徴とする電気装置の接続に用い
る基板。
An electric device in which a projection electrode provided on a lower surface of an electric component and a wiring provided on a flexible insulating substrate are connected and fixed by thermocompression bonding via an anisotropic conductive film. In the substrate, a lead-out wall for guiding bubbles generated at the time of thermocompression bonding and a melt of the binder is provided at a position inside the contact position of the protruding electrode of the electric component and separated from the wiring at a position inside. A substrate used to connect electrical devices.
【請求項2】 可撓性絶縁基板に設けられた配線材料で
前記配線及び前記導出壁を形成したことを特徴とする請
求項1記載の電気装置の接続に用いる基板。
2. The substrate used for connecting an electric device according to claim 1, wherein the wiring and the lead-out wall are formed of a wiring material provided on a flexible insulating substrate.
【請求項3】 前記導出壁は電気部品の外側にして前記
配線を構成した配線群から離間した位置に導出壁の吐出
部を設けたを形成したことを特徴とする請求項1記載の
電気装置の接続に用いる基板。
3. The electric device according to claim 1, wherein the lead-out wall is provided outside the electric component and a discharge portion of the lead-out wall is provided at a position separated from a wiring group forming the wiring. Substrate used for connection.
JP2000043765A 2000-02-22 2000-02-22 Board for connecting electric apparatus Pending JP2001237265A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000043765A JP2001237265A (en) 2000-02-22 2000-02-22 Board for connecting electric apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000043765A JP2001237265A (en) 2000-02-22 2000-02-22 Board for connecting electric apparatus

Publications (1)

Publication Number Publication Date
JP2001237265A true JP2001237265A (en) 2001-08-31

Family

ID=18566628

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000043765A Pending JP2001237265A (en) 2000-02-22 2000-02-22 Board for connecting electric apparatus

Country Status (1)

Country Link
JP (1) JP2001237265A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004312000A (en) * 2003-04-01 2004-11-04 Hewlett-Packard Development Co Lp Assembly of electrically interconnected parts and method of forming the same
WO2005027603A1 (en) * 2003-09-09 2005-03-24 Sony Chemicals Corporation Electronic component mounting module
US7262496B2 (en) 2003-09-24 2007-08-28 Seiko Epson Corporation Wiring base with wiring extending inside and outside of a mounting region
JP2013048292A (en) * 2008-07-02 2013-03-07 Panasonic Corp Method for connecting substrates, flip chip mounting body, and structure for connecting substrates
US11495774B2 (en) 2020-01-22 2022-11-08 Seiko Epson Corporation Electro-optical device and electronic apparatus

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004312000A (en) * 2003-04-01 2004-11-04 Hewlett-Packard Development Co Lp Assembly of electrically interconnected parts and method of forming the same
WO2005027603A1 (en) * 2003-09-09 2005-03-24 Sony Chemicals Corporation Electronic component mounting module
US7262496B2 (en) 2003-09-24 2007-08-28 Seiko Epson Corporation Wiring base with wiring extending inside and outside of a mounting region
US7547580B2 (en) 2003-09-24 2009-06-16 Seiko Epson Corporation Method for manufacturing a semiconductor wiring base that includes a wiring base with wiring extending inside and outside of a mounting region
JP2013048292A (en) * 2008-07-02 2013-03-07 Panasonic Corp Method for connecting substrates, flip chip mounting body, and structure for connecting substrates
US11495774B2 (en) 2020-01-22 2022-11-08 Seiko Epson Corporation Electro-optical device and electronic apparatus

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