JP2001237234A5 - - Google Patents
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- JP2001237234A5 JP2001237234A5 JP2000048934A JP2000048934A JP2001237234A5 JP 2001237234 A5 JP2001237234 A5 JP 2001237234A5 JP 2000048934 A JP2000048934 A JP 2000048934A JP 2000048934 A JP2000048934 A JP 2000048934A JP 2001237234 A5 JP2001237234 A5 JP 2001237234A5
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000048934A JP4633881B2 (ja) | 2000-02-21 | 2000-02-21 | プラズマ処理装置及びそれを用いた処理方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000048934A JP4633881B2 (ja) | 2000-02-21 | 2000-02-21 | プラズマ処理装置及びそれを用いた処理方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001237234A JP2001237234A (ja) | 2001-08-31 |
| JP2001237234A5 true JP2001237234A5 (nl) | 2006-06-22 |
| JP4633881B2 JP4633881B2 (ja) | 2011-02-16 |
Family
ID=18570944
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000048934A Expired - Fee Related JP4633881B2 (ja) | 2000-02-21 | 2000-02-21 | プラズマ処理装置及びそれを用いた処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4633881B2 (nl) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3773189B2 (ja) * | 2002-04-24 | 2006-05-10 | 独立行政法人科学技術振興機構 | 窓型プローブ、プラズマ監視装置、及び、プラズマ処理装置 |
| JP4838736B2 (ja) * | 2007-01-25 | 2011-12-14 | 株式会社日立ハイテクノロジーズ | プラズマ処理装置 |
| JP5162269B2 (ja) * | 2008-02-08 | 2013-03-13 | 株式会社アルバック | 真空処理装置 |
| US9767988B2 (en) | 2010-08-29 | 2017-09-19 | Advanced Energy Industries, Inc. | Method of controlling the switched mode ion energy distribution system |
| US11615941B2 (en) | 2009-05-01 | 2023-03-28 | Advanced Energy Industries, Inc. | System, method, and apparatus for controlling ion energy distribution in plasma processing systems |
| US9685297B2 (en) * | 2012-08-28 | 2017-06-20 | Advanced Energy Industries, Inc. | Systems and methods for monitoring faults, anomalies, and other characteristics of a switched mode ion energy distribution system |
| US9105447B2 (en) * | 2012-08-28 | 2015-08-11 | Advanced Energy Industries, Inc. | Wide dynamic range ion energy bias control; fast ion energy switching; ion energy control and a pulsed bias supply; and a virtual front panel |
| CN105578696B (zh) * | 2015-12-23 | 2018-03-16 | 哈尔滨工业大学 | 一种测量空心阴极节流孔区等离子体密度的方法 |
| JP6541623B2 (ja) * | 2016-06-20 | 2019-07-10 | 東京エレクトロン株式会社 | プラズマ処理装置、及び波形補正方法 |
| TWI767088B (zh) | 2017-11-17 | 2022-06-11 | 新加坡商Ａｅｓ全球公司 | 電漿處理系統，用於調變其中的電源的控制方法及相關的電漿處理控制系統 |
| KR20200100642A (ko) | 2017-11-17 | 2020-08-26 | 에이이에스 글로벌 홀딩스 피티이 리미티드 | 플라즈마 프로세싱을 위한 이온 바이어스 전압의 공간 및 시간 제어 |
| US10607813B2 (en) | 2017-11-17 | 2020-03-31 | Advanced Energy Industries, Inc. | Synchronized pulsing of plasma processing source and substrate bias |
| US11670487B1 (en) | 2022-01-26 | 2023-06-06 | Advanced Energy Industries, Inc. | Bias supply control and data processing |
| US11942309B2 (en) | 2022-01-26 | 2024-03-26 | Advanced Energy Industries, Inc. | Bias supply with resonant switching |
| US11978613B2 (en) | 2022-09-01 | 2024-05-07 | Advanced Energy Industries, Inc. | Transition control in a bias supply |
| CN117572136A (zh) * | 2024-01-16 | 2024-02-20 | 国科大杭州高等研究院 | 适用于电推力器响应时间测量的检测系统 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03224226A (ja) * | 1989-10-18 | 1991-10-03 | Matsushita Electric Ind Co Ltd | プラズマ加工方法およびそれに用いる装置 |
| JPH08106992A (ja) * | 1994-03-24 | 1996-04-23 | Hitachi Ltd | プラズマ処理方法およびその装置 |
| FR2738984B1 (fr) * | 1995-09-19 | 1997-11-21 | Centre Nat Rech Scient | Procede et dispositif de mesure d'un flux d'ions dans un plasma |
| JP2000208485A (ja) * | 1999-01-11 | 2000-07-28 | Hitachi Ltd | プラズマ処理方法および装置 |
| JP2000208295A (ja) * | 1999-01-11 | 2000-07-28 | Hitachi Ltd | プラズマ計測電極およびそれを用いた計測方法 |
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2000
- 2000-02-21 JP JP2000048934A patent/JP4633881B2/ja not_active Expired - Fee Related