JP2001236827A - Conductive paste - Google Patents

Conductive paste

Info

Publication number
JP2001236827A
JP2001236827A JP2000052125A JP2000052125A JP2001236827A JP 2001236827 A JP2001236827 A JP 2001236827A JP 2000052125 A JP2000052125 A JP 2000052125A JP 2000052125 A JP2000052125 A JP 2000052125A JP 2001236827 A JP2001236827 A JP 2001236827A
Authority
JP
Japan
Prior art keywords
conductive paste
powder
conductive
epoxy resin
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000052125A
Other languages
Japanese (ja)
Inventor
Junichi Kikuchi
純一 菊池
秀次 ▲桑▼島
Hideji Kuwajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP2000052125A priority Critical patent/JP2001236827A/en
Publication of JP2001236827A publication Critical patent/JP2001236827A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a conductive paste of superior in solderability, embedding property, and migration, that is embedded in layers interconnection through holes or blind holes of multi-layered printed circuit board for connecting layers. SOLUTION: The conductive paste is composed of a binder and conductive powder which does not contain solvents. The paste when cured shows a glass transition temperature of 40 to 180 deg.C. The binder preferably consists of an epoxy resin and its curing agent, where the epoxy resin is preferably liquid at room temperature. The conductive powder may be copper or copper alloy powder almost coated with silver, but exposed in part, having an aspect ratio in the range of 1 to 1.5 and the average longer diameter of the particles of 1 to 20 μm.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、多層プリント配線
板の層間接続用の貫通孔又は非貫通孔に埋め込んで使用
される導電ペーストに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a conductive paste used by being embedded in a through hole or a non-through hole for interlayer connection of a multilayer printed wiring board.

【0002】[0002]

【従来の技術】従来の多層プリント配線板は、加熱加圧
による多層化積層工程を経て得られた多層基板に、層間
接続用の貫通孔又は非貫通孔を形成した後、図1に示す
ようにその孔に対して銅めっき1を施すか、導電ペース
ト2を印刷又は充填するなどの方法で製造していた。な
お図1において3は銅箔である。
2. Description of the Related Art In a conventional multilayer printed wiring board, through holes or non-through holes for interlayer connection are formed in a multilayer substrate obtained through a multi-layer lamination process by heating and pressing, as shown in FIG. In this method, copper plating 1 is applied to the holes, or a conductive paste 2 is printed or filled. In FIG. 1, reference numeral 3 denotes a copper foil.

【0003】従来の導電ペーストは、電子材料、199
4年10月号の42〜46項に記載されているように、
金、銀、銅、カーボン等の導電性粉末を用い、それにバ
インダ、有機溶剤及び必要に応じて添加剤を加えてペー
スト状に混合して作製していた。特に高導電性が要求さ
れる分野では、金粉又は銀粉が一般的に用いられてい
る。
Conventional conductive pastes include electronic materials, 199
As described in the October, 4th issue, paragraphs 42-46,
It has been prepared by using a conductive powder of gold, silver, copper, carbon or the like, adding a binder, an organic solvent, and an additive as needed, and mixing them into a paste. Particularly in a field where high conductivity is required, gold powder or silver powder is generally used.

【0004】銀粉を含有する導電ペーストは、導電性が
良好なことから印刷配線板、電子部品等の電気回路や電
極の形成に使用されているが、これらは高温多湿の雰囲
気下で電界が印可されると、電気回路や電極にマイグレ
ーションと称する銀の電析が生じ電極間又は配線間が短
絡するという欠点が生じる。このマイグレーションを防
止するための方策はいくつか行われており、導体の表面
に防湿塗料を塗布するか又は導電ペーストに含窒素化合
物などの腐食抑制剤を添加するなどの方策が検討されて
いるが十分な効果の得られるものではなかった。
[0004] A conductive paste containing silver powder is used for forming electric circuits and electrodes of printed wiring boards and electronic parts because of its good conductivity. However, these pastes can be applied with an electric field in a high-temperature and high-humidity atmosphere. In this case, silver deposition called migration occurs in an electric circuit or an electrode, resulting in a short circuit between the electrodes or the wiring. Several measures have been taken to prevent this migration, and measures such as applying a moisture-proof paint to the surface of the conductor or adding a corrosion inhibitor such as a nitrogen-containing compound to the conductive paste have been studied. It was not enough effect.

【0005】また、導通抵抗の良好な導体を得るには銀
粉の配合量を増加しなければならず、銀粉が高価である
ことから導電ペーストも高価になるという欠点があっ
た。銀被覆銅粉を使用すればマイグレーションを改善で
き、これを用いれば安価な導電ペーストが得られること
になる。しかし銀被覆を均一にかつ厚く被覆するとマイ
グレーションの改善効果はない。しかも得られる導電ペ
ーストの塗膜に、直接はんだ付けを適用することができ
ないという欠点があった。
Further, in order to obtain a conductor having good conduction resistance, the amount of silver powder must be increased, and the silver paste is expensive, so that the conductive paste becomes expensive. The use of silver-coated copper powder can improve migration, and the use of silver-coated copper powder results in an inexpensive conductive paste. However, if the silver coating is coated uniformly and thickly, there is no effect of improving migration. In addition, there is a disadvantage that soldering cannot be directly applied to the obtained conductive paste coating film.

【0006】公知の導電ペーストは、前記のように半田
付けが直接適用することができないため、導電ペースト
の塗膜に活性化処理を施して無電解めっきを行うか又は
塗膜を陰極としてめっき液中に電気銅めっきを施した後
に、銅面上にはんだ付けされる。かかる場合、塗膜と銅
めっきとの層間の結合が確実でないと実用的ではない。
従って、無電解めっき又は電気めっきを施す必要のない
はんだ付け可能な導電ペーストが開発されれば、回路形
成工程が大幅に短縮されるので、そのメリットは大き
い。
[0006] Since the known conductive paste cannot be directly applied by soldering as described above, the coating of the conductive paste is subjected to an activation treatment to perform electroless plating, or a plating solution is formed by using the coating as a cathode. After electroplating inside, it is soldered onto the copper surface. In such a case, it is not practical unless bonding between the coating film and the copper plating is ensured.
Therefore, if a solderable conductive paste that does not need to be subjected to electroless plating or electroplating is developed, the circuit forming process is greatly shortened, and the merit thereof is great.

【0007】[0007]

【発明が解決しようとする課題】請求項1記載の発明
は、はんだ付け性に優れる導電ペーストを提供するもの
である。請求項2及び3記載の発明は、層間接続用の貫
通孔又は非貫通孔への埋め込み性及びはんだ付け性の向
上効果に優れる導電ペーストを提供するものである。請
求項4、5及び6記載の発明は、導電性、マイグレーシ
ョン性、層間接続用の貫通孔又は非貫通孔への埋め込み
性の向上効果及びはんだ付け性の向上効果に優れる導電
ペーストを提供するものである。
SUMMARY OF THE INVENTION The first aspect of the present invention provides a conductive paste having excellent solderability. The second and third aspects of the present invention provide a conductive paste which is excellent in the effect of improving the embedding property into a through hole or a non-through hole for interlayer connection and the solderability. The invention according to claims 4, 5 and 6 provides a conductive paste which is excellent in conductivity, migration property, effect of improving the embedding property in through holes or non-through holes for interlayer connection, and effect of improving solderability. It is.

【0008】[0008]

【課題を解決するための手段】本発明は、バインダ及び
導電粉を含む導電ペーストにおいて、導電ペースト硬化
物のガラス転移点(以下Tgとする)が40〜180℃
である溶剤を含まない導電ペーストに関する。また、本
発明は、バインダが、エポキシ樹脂組成物とその硬化剤
を含むものからなる導電ペーストに関する。また、本発
明は、エポキシ樹脂組成物が、常温で液状のエポキシ樹
脂又は常温で固形のエポキシ樹脂と可撓性付与剤とを含
み、かつエポキシ樹脂と可撓性付与剤の配合割合が、エ
ポキシ樹脂が50〜90重量%及び可撓性付与剤が10
〜50重量%である導電ペーストに関する。
According to the present invention, in a conductive paste containing a binder and a conductive powder, the cured product of the conductive paste has a glass transition point (hereinafter referred to as Tg) of 40 to 180 ° C.
And a conductive paste containing no solvent. Further, the present invention relates to a conductive paste comprising a binder containing an epoxy resin composition and a curing agent thereof. Further, the present invention provides an epoxy resin composition containing a liquid state epoxy resin at room temperature or a solid state epoxy resin at room temperature and a flexibility-imparting agent, and the mixing ratio of the epoxy resin and the flexibility-imparting agent is epoxy. 50 to 90% by weight of resin and 10 of flexibility imparting agent
5050% by weight.

【0009】また、本発明は、導電粉が、銅粉又は銅合
金粉の一部を露出して表面が大略銀で被覆され、かつ形
状が略球状である導電ペーストに関する。また、本発明
は、導電粉が、アスペクト比が1〜1.5及び長径の平
均粒径が1〜20μmで、かつ銅粉又は銅合金粉が露出
面積が10〜60%の略球状導電粉である導電ペースト
に関する。また、本発明は、バインダと導電粉の配合割
合が、導電ペーストの固形分に対して、バインダが5〜
15重量%及び導電粉が85〜95重量%である導電ペ
ーストに関する。
The present invention also relates to a conductive paste in which the conductive powder exposes a part of the copper powder or the copper alloy powder and has a surface substantially covered with silver and a substantially spherical shape. In addition, the present invention provides a substantially spherical conductive powder in which the conductive powder has an aspect ratio of 1 to 1.5, an average major particle diameter of 1 to 20 μm, and an exposed area of copper powder or copper alloy powder of 10 to 60%. A conductive paste. Further, in the present invention, the blending ratio of the binder and the conductive powder is such that the binder is 5 to the solid content of the conductive paste.
The present invention relates to a conductive paste containing 15% by weight and 85 to 95% by weight of a conductive powder.

【0010】[0010]

【発明の実施の形態】導電ペーストの塗膜に直接はんだ
付けするためには、導電ペースト硬化物のTgが40〜
180℃の範囲、好ましくは40〜140℃の範囲とさ
れ、40℃未満であると導電性及び信頼性が低下する。
一方180℃を越えるとはんだ付けができないという欠
点が生じる。導電ペースト硬化物のTgが40〜180
℃の範囲である場合、はんだフラックスを導電ペースト
の塗膜表面に塗布後はんだ付けする際、導電ペースト硬
化物のTgがはんだの温度よりも低いため、導電ペース
トの塗膜表面が軟化し、導電ペーストの塗膜表面はバイ
ンダよりも導電粉の占める割合が多くなり、導電ペース
トの塗膜に直接はんだ付けが可能になるものと考えられ
る。
BEST MODE FOR CARRYING OUT THE INVENTION For directly soldering to a conductive paste coating, the cured conductive paste has a Tg of 40 to 40.
The temperature is set in the range of 180 ° C, preferably in the range of 40 to 140 ° C. If the temperature is lower than 40 ° C, the conductivity and the reliability are reduced.
On the other hand, when the temperature exceeds 180 ° C., there is a disadvantage that soldering cannot be performed. Tg of cured conductive paste is 40 to 180
When the temperature is in the range of ° C, when the soldering flux is applied to the surface of the conductive paste coating and then soldered, the Tg of the cured conductive paste is lower than the temperature of the solder. It is considered that the proportion of the conductive powder on the surface of the paste coating film is larger than that of the binder, so that soldering can be directly performed on the conductive paste coating film.

【0011】導電ペースト硬化物のTgを40〜180
℃の範囲にするためには、エポキシ樹脂組成物としてエ
ポキシ樹脂の他に可撓性付与剤を含むものを用いること
が好ましい。エポキシ樹脂と可撓性付与剤の配合割合
は、エポキシ樹脂が50〜90重量%及び可撓性付与剤
が10〜50重量%の範囲であるものが好ましく、エポ
キシ樹脂が60〜80重量%及び可撓性付与剤が20〜
40重量%の範囲であるものがさらに好ましい。
The Tg of the cured conductive paste is 40 to 180.
In order to control the temperature in the range of ° C., it is preferable to use an epoxy resin composition containing a flexibility-imparting agent in addition to the epoxy resin. The mixing ratio of the epoxy resin and the flexibility-imparting agent is preferably in the range of 50 to 90% by weight of the epoxy resin and 10 to 50% by weight of the flexibility-imparting agent, and 60 to 80% by weight of the epoxy resin. Flexibility imparting agent is 20 to
Those in the range of 40% by weight are more preferred.

【0012】本発明におけるバインダは、エポキシ樹脂
組成物及びその硬化剤を用いることが好ましい。エポキ
シ樹脂は常温で液状のものが好ましい。常温で結晶化す
るものは液状物と混合することで結晶化を回避できる。
本発明における常温で液状エポキシ樹脂とは、例えば常
温で固形のものでも常温で液状のエポキシ樹脂と混合す
ることで常温で安定して液状となるものも含む。なお本
発明において常温とは温度が約25℃を示すものを意味
する。
The binder in the present invention preferably uses an epoxy resin composition and a curing agent therefor. The epoxy resin is preferably liquid at room temperature. Those that crystallize at room temperature can avoid crystallization by mixing with a liquid.
The epoxy resin that is liquid at ordinary temperature in the present invention includes, for example, a resin that is solid at ordinary temperature and becomes liquid at ordinary temperature by mixing with an epoxy resin that is liquid at ordinary temperature. In the present invention, the normal temperature means a temperature of about 25 ° C.

【0013】本発明に用いられるエポキシ樹脂は、公知
のものが用いられ、分子量中にエポキシ基を2個以上含
有する化合物、例えばビスフェノールA、ビスフェノー
ルAD、ビスフェノールF、ノボラック、クレゾールノ
ボラック類とエピクロルヒドリンとの反応により得られ
るポリグリシジルエーテル、ジヒドロキシナフタレンジ
グリシジルエーテル、ブタンジオールジグリシジルエー
テル、ネオペンチルグリコールジグリシジルエーテル等
の脂肪族エポキシ樹脂やジグリシジルヒダントイン等の
複素環式エポキシ、ビニルシクロヘキセンジオキサイ
ド、ジシクロペンタンジエンジオキサイド、アリサイク
リックジエポキシアジペイトのような脂環式エポキシ樹
脂が挙げられる。
As the epoxy resin used in the present invention, known resins are used, and compounds containing two or more epoxy groups in the molecular weight, such as bisphenol A, bisphenol AD, bisphenol F, novolak, cresol novolaks and epichlorohydrin Aliphatic epoxy resins such as polyglycidyl ether, dihydroxynaphthalenediglycidyl ether, butanediol diglycidyl ether, neopentyl glycol diglycidyl ether, and heterocyclic epoxies such as diglycidyl hydantoin, vinylcyclohexene dioxide, Alicyclic epoxy resins such as cyclopentanedienedoxide and alicyclic diepoxy adipate are exemplified.

【0014】可撓性付与剤も公知のものが用いられ、分
子量中にエポキシ基を1個だけ有する化合物、例えばn
−ブチルグリシジルエーテル、バーサティック酸グリシ
ジルエステル、スチレンオキサイド、エチルヘキシルグ
リシジルエーテル、フェニルグリシジルエーテル、クレ
ジルグリシジルエーテル、ブチルフェニルグリシジルエ
ーテル等のような通常のエポキシ樹脂が挙げられる。こ
れらのエポキシ樹脂及び可撓性付与剤は、単独又は2種
以上を混合して用いることができる。
As the flexibility-imparting agent, known ones are used, and compounds having only one epoxy group in the molecular weight, for example, n
And ordinary epoxy resins such as butyl glycidyl ether, versidic acid glycidyl ester, styrene oxide, ethylhexyl glycidyl ether, phenyl glycidyl ether, cresyl glycidyl ether, butylphenyl glycidyl ether and the like. These epoxy resins and flexibility-imparting agents can be used alone or in combination of two or more.

【0015】バインダに添加される硬化剤としては、例
えばメンセンジアミン、イソフオロンジアミン、メタフ
ェニレンジアミン、ジアミノジフェニルメタン、ジアミ
ノジフェニルスルホン、メチレンジアニリン等のアミン
類、無水フタル酸、無水トリメリット酸、無水ピロメリ
ット酸、無水コハク酸、テトラヒドロ無水フタル酸等の
酸無水物、イミダゾール、ジシアンジアミド等の化合物
系硬化剤、ポリアミド樹脂、フェノール樹脂、尿素樹脂
等の樹脂系硬化剤が用いられるが、必要に応じて、潜在
性アミン硬化剤等の硬化剤と併用して用いてもよく、ま
た3級アミン、イミダゾール類、トリフェニルホスフィ
ン、テトラフェニルホスフェニルボレート等といった一
般にエポキシ樹脂とフェノール系硬化剤との硬化促進剤
として知られている化合物を添加してもよい。
Examples of the curing agent to be added to the binder include amines such as mensendiamine, isophoronediamine, metaphenylenediamine, diaminodiphenylmethane, diaminodiphenylsulfone, methylenedianiline, phthalic anhydride, trimellitic anhydride, and the like. Acid anhydrides such as pyromellitic anhydride, succinic anhydride, and tetrahydrophthalic anhydride, compound-based curing agents such as imidazole and dicyandiamide, and resin-based curing agents such as polyamide resins, phenol resins, and urea resins are used. Accordingly, it may be used in combination with a curing agent such as a latent amine curing agent, and generally, a tertiary amine, imidazoles, triphenyl phosphine, tetraphenyl phosphenyl borate, and the like can be used in combination with an epoxy resin and a phenolic curing agent. Known as a curing accelerator The compound may be added.

【0016】上記の硬化剤の含有量は、導電ペースト硬
化物のTgの点でエポキシ樹脂100重量部に対して
0.1〜20重量部の範囲であることが好ましく、1〜
10重量部の範囲であることがさらに好ましい。
The content of the above curing agent is preferably in the range of 0.1 to 20 parts by weight with respect to 100 parts by weight of the epoxy resin in terms of Tg of the cured conductive paste.
More preferably, it is in the range of 10 parts by weight.

【0017】本発明に用いられるバインダには、上記の
材料以外に必要に応じてチキソ剤、カップリング剤、消
泡剤、粉末表面処理剤、沈降防止剤等を添加して均一に
混合して得られる。必要に応じて添加されるチキソ剤、
カップリング剤、消泡剤、粉末表面処理剤、沈降防止剤
等の含有量は、導電ペーストに対して0.01〜1重量
%の範囲であることが好ましく、0.03〜0.5重量
%の範囲であることがさらに好ましい。
To the binder used in the present invention, a thixotropic agent, a coupling agent, an antifoaming agent, a powder surface treating agent, an anti-settling agent, etc. are added, if necessary, in addition to the above-mentioned materials, followed by uniform mixing. can get. Thixotropic agents added as needed,
The content of the coupling agent, the defoaming agent, the powder surface treating agent, the anti-settling agent and the like is preferably in the range of 0.01 to 1% by weight based on the conductive paste, and is preferably 0.03 to 0.5% by weight. % Is more preferable.

【0018】銅粉又は銅合金粉は、アトマイズ法で作製
された粉体を用いることが好ましく、その粒径は小さい
ほど好ましく、例えば平均粒径が1〜20μmの粉体が
好ましく、1〜10μmの粉体がさらに好ましい。
As the copper powder or copper alloy powder, powder produced by an atomizing method is preferably used, and the smaller the particle size, the better. For example, a powder having an average particle size of 1 to 20 μm is preferable, and a powder having an average particle size of 1 to 10 μm is preferable. Is more preferable.

【0019】銅粉又は銅合金粉の表面に銀を被覆するに
は、置換めっき、電気めっき、無電解めっき等の方法が
あり、銅粉又は銅合金粉と銀の付着力が高いこと及びラ
ンニングコストが安価であることから、置換めっきで被
覆することが好ましい。銅粉又は銅合金粉の表面への銀
の被覆量は、耐マイグレーション性、コスト、導電性向
上等の点から銅粉又は銅合金粉に対して5〜25重量%
の範囲が好ましく、10〜23重量%の範囲がさらに好
ましい。
There are methods such as displacement plating, electroplating, and electroless plating for coating the surface of the copper powder or copper alloy powder with silver. Since the cost is low, it is preferable to cover with displacement plating. The amount of silver coating on the surface of the copper powder or copper alloy powder is 5 to 25% by weight based on the copper powder or copper alloy powder from the viewpoints of migration resistance, cost, and improvement in conductivity.
Is more preferable, and the range of 10 to 23% by weight is more preferable.

【0020】本発明に用いられる導電粉は、上記の銅粉
又は銅合金粉の一部を露出して表面が大略銀で被覆され
ている銀被覆銅粉又は銀被覆銅合金粉を用いることが好
ましい。もし銅粉又は銅合金粉の一部を露出させないで
全面に銀を被覆したものを用いるとはんだ付け性が悪く
なる傾向がある。また、全面に銀を被覆したものを用い
るとマイグレーション性も悪くなる傾向がある。
As the conductive powder used in the present invention, a silver-coated copper powder or a silver-coated copper alloy powder, which is partially exposed and whose surface is substantially covered with silver, is used as the conductive powder. preferable. If a copper powder or a copper alloy powder whose entire surface is coated with silver without exposing a part thereof is used, the solderability tends to deteriorate. In addition, the use of a material whose entire surface is covered with silver tends to deteriorate the migration property.

【0021】銅粉又は銅合金粉の露出面積は、はんだ付
け性、露出部の酸化、導電性等の点から10〜50%の
範囲が好ましく、10〜30%の範囲がさらに好まし
い。なお、上記の銅合金粉としては、銅とスズ、銅と亜
鉛等との合金を用いることが好ましい。
The exposed area of the copper powder or copper alloy powder is preferably in the range of 10 to 50%, more preferably 10 to 30%, from the viewpoints of solderability, oxidation of the exposed portion, conductivity and the like. Note that, as the copper alloy powder, an alloy of copper and tin, copper and zinc, or the like is preferably used.

【0022】導電粉は接触点が少ないと抵抗が高くなり
易い。導電粒子同士の接触面積を大きくして高導電性を
得るため、導電粉に衝撃を与えて粒子の形状を扁平状に
変形することが好ましいが、扁平状導電粉を使用した導
電ペーストは略球状導電粉を使用した導電ペーストより
も粘度が高くなる。本発明の導電ペーストは溶剤を含ま
ないものであるため、溶剤を加えて粘度を低下させるこ
とは行わない。そのため粘度が高いと埋め込み作業が困
難になる。作業性及び導電ペーストを孔に埋め込んだと
きの孔のY軸方向の導電性という点からも略球状導電粉
を使用した導電ペーストを用いることが好ましい。
If the conductive powder has few contact points, the resistance tends to increase. In order to obtain high conductivity by increasing the contact area between the conductive particles, it is preferable to apply an impact to the conductive powder to deform the shape of the particles into a flat shape, but the conductive paste using the flat conductive powder is substantially spherical. Viscosity is higher than conductive paste using conductive powder. Since the conductive paste of the present invention does not contain a solvent, the viscosity is not reduced by adding a solvent. Therefore, when the viscosity is high, the embedding work becomes difficult. From the viewpoint of workability and conductivity in the Y-axis direction of the hole when the conductive paste is embedded in the hole, it is preferable to use a conductive paste using substantially spherical conductive powder.

【0023】本発明における略球状導電粉としては、ア
スペクト比が1〜1.5及び長径の平均粒径が1〜20
μmの導電粉を用いることが好ましく、アスペクト比が
1〜1.3及び長径の平均粒径が1〜10μmの導電粉
を用いることがさらに好ましい。なお上記でいう平均粒
径は、レーザー散乱型粒度分布測定装置により測定する
ことができる。本発明においては、前記装置としてマス
ターサイザー(マルバン社製)を用いて測定した。
The substantially spherical conductive powder of the present invention has an aspect ratio of 1 to 1.5 and an average long particle diameter of 1 to 20.
It is preferable to use conductive powder of μm, and it is more preferable to use conductive powder having an aspect ratio of 1 to 1.3 and a long diameter having an average particle diameter of 1 to 10 μm. The average particle size mentioned above can be measured by a laser scattering type particle size distribution measuring device. In the present invention, the measurement was performed using a master sizer (manufactured by Malvern) as the device.

【0024】本発明におけるアスペクト比とは、導電粉
の粒子の長径と短径の比率(長径/短径)をいう。本発
明においては、粘度の低い硬化性樹脂中に導電粉の粒子
をよく混合し、静置して粒子を沈降させるとともにその
まま樹脂を硬化させ、得られた硬化物を垂直方向に切断
し、その切断面に現れる粒子の形状を電子顕微鏡で拡大
して観察し、少なくとも100の粒子について一つ一つ
の粒子の長径/短径を求め、それらの平均値をもってア
スペクト比とする。
The aspect ratio in the present invention refers to the ratio of the major axis to the minor axis (major axis / minor axis) of the particles of the conductive powder. In the present invention, the particles of the conductive powder are mixed well in the curable resin having a low viscosity, and the resin is cured while allowing the particles to settle by standing, and the obtained cured product is cut in the vertical direction. The shape of the particles appearing on the cut surface is observed under magnification with an electron microscope, and the major axis / minor axis of each particle is obtained for at least 100 particles, and the average value thereof is defined as the aspect ratio.

【0025】ここで、短径とは、前記切断面に現れる粒
子について、その粒子の外側に接する二つの平行線の組
み合わせ粒子を挟むように選択し、それらの組み合わせ
のうち最短間隔になる二つの平行線の距離である。一
方、長径とは、前記短径を決する平行線に直角方向の二
つの平行線であって、粒子の外側に接する二つの平行線
の組み合わせのうち、最長間隔になる二つの平行線の距
離である。これらの四つの線で形成される長方形は、粒
子がちょうどその中に納まる大きさとなる。なお、本発
明において行った具体的方法については後述する。
Here, the minor axis is selected such that particles appearing on the cut surface sandwich a combination particle of two parallel lines in contact with the outside of the particle, and two of the combinations having the shortest interval are selected. The distance between the parallel lines. On the other hand, the major axis is the two parallel lines perpendicular to the parallel line that determines the minor axis, and is the distance between the two parallel lines that are the longest among the combinations of the two parallel lines that contact the outside of the particle. is there. The rectangle formed by these four lines is sized to fit the particle exactly inside it. The specific method used in the present invention will be described later.

【0026】バインダと導電粉の配合割合は、導電ペー
ストの固形分に対して、バインダが5〜15重量%及び
導電粉が85〜95重量%の範囲が好ましく、バインダ
が7〜13重量%及び導電粉が87〜93重量%の範囲
がさらに好ましい。バインダが5重量%未満で、導電粉
が95重量%を越えると、ペーストと銅箔の接着力が低
下する傾向があり、バインダが15重量%を越え、導電
粉が85重量%未満であると、はんだ付け性及び導電性
が低下する傾向がある。
The mixing ratio of the binder and the conductive powder is preferably 5 to 15% by weight of the binder and 85 to 95% by weight of the conductive powder based on the solid content of the conductive paste, and 7 to 13% by weight of the binder. The conductive powder is more preferably in the range of 87 to 93% by weight. If the binder is less than 5% by weight and the conductive powder exceeds 95% by weight, the adhesive strength between the paste and the copper foil tends to decrease. If the binder exceeds 15% by weight and the conductive powder is less than 85% by weight. , Solderability and conductivity tend to decrease.

【0027】本発明の導電ペーストは、上記のバイン
ダ、導電粉及び必要に応じて添加されるチキソ剤、カッ
プリング剤、消泡剤、粉末表面処理剤、沈降防止剤等と
共に、らいかい機、ニーダー、三本ロール等で均一に混
合、分散して得ることができる。また本発明の導電ペー
ストは溶剤を含まないため、貫通孔又は非貫通孔内のボ
イドの発生を防止することができる。
The conductive paste of the present invention can be used together with the binder, conductive powder and, if necessary, a thixotropic agent, a coupling agent, an antifoaming agent, a powder surface treating agent, an anti-settling agent, etc. It can be obtained by uniformly mixing and dispersing with a kneader, three rolls or the like. Further, since the conductive paste of the present invention does not contain a solvent, it is possible to prevent the generation of voids in through holes or non-through holes.

【0028】[0028]

【実施例】以下、本発明を実施例により説明する。 実施例1 ビスフェノールA型エポキシ樹脂(油化シェルエポキシ
(株)製、商品名エピコート827)72重量部、脂肪族
ジグリシジルエーテル(旭電化工業(株)製、商品名ED
−503)18重量部、2−フェニル−4−メチル−5
−ヒドロキシメチルイミダゾール(四国化成(株)製、商
品名キュアゾール2P4MHZ)6重量部及びジシアン
ジアミド4重量部を加えて均一に混合してバインダとし
た。
The present invention will be described below with reference to examples. Example 1 Bisphenol A type epoxy resin (oiled shell epoxy)
72 parts by weight, manufactured by Asahi Denka Kogyo Co., Ltd., trade name: ED
-503) 18 parts by weight, 2-phenyl-4-methyl-5
6 parts by weight of hydroxymethylimidazole (manufactured by Shikoku Chemicals Co., Ltd., trade name: Curazole 2P4MHZ) and 4 parts by weight of dicyandiamide were added and uniformly mixed to obtain a binder.

【0029】次にアトマイズ法で作製した平均粒径が
5.1μmの球状銅粉(日本アトマイズ加工(株)製、商
品名SFR−Cu)を希塩酸及び純水で洗浄した後、水
1リットルあたりAgCN80g及びNaCN75gを
含むめっき溶液で球状銅粉に対して銀の量が18重量%
になるように置換めっきを行い、水洗、乾燥して銀めっ
き銅粉を得た。
Next, spherical copper powder (trade name: SFR-Cu, manufactured by Nippon Atomize Processing Co., Ltd.) having an average particle size of 5.1 μm produced by an atomizing method was washed with dilute hydrochloric acid and pure water. 18% by weight of silver based on spherical copper powder in a plating solution containing 80 g of AgCN and 75 g of NaCN
, And washed with water and dried to obtain silver-plated copper powder.

【0030】この後、2リットルのボールミル容器内に
上記で得た銀めっき銅粉750g及び直径が5mmのジル
コニアボール3kgを投入し、40分間回転させて、アス
ペクト比が平均1.3及び長径の平均粒径が5.5μm
の略球状銀めっき銅粉を得た。得られた略球状銀めっき
銅粉の粒子を5個取り出し、走査型オージェ電子分光分
析装置で定量分析して銅粉の露出面積について調べたと
ころ10〜50%の範囲で平均が20%であった。
Thereafter, 750 g of the silver-plated copper powder obtained above and 3 kg of zirconia balls having a diameter of 5 mm were put into a 2 liter ball mill container, and rotated for 40 minutes. Average particle size is 5.5 μm
Was obtained. Five particles of the obtained substantially spherical silver-plated copper powder were taken out and quantitatively analyzed by a scanning Auger electron spectrometer to examine the exposed area of the copper powder. The average was 20% in the range of 10 to 50%. Was.

【0031】上記で得たバインダ50gに上記の略球状
銀めっき銅粉450gを加えて撹拌らいかい機及び三本
ロールで均一に混合、分散して導電ペーストを得た。こ
の導電ペーストを170℃で90分間加熱処理して硬化
させた後、該硬化物のTgをセイコー電子工業製のTM
A120で荷重3g、昇温スピード5℃/分で測定した
結果、86℃であった。なおエポキシ樹脂と可撓性付与
剤の配合割合は、エポキシ樹脂が80重量%及び可撓性
付与剤が20重量%であり、またバインダと導電粉の配
合割合は、バインダが10重量%及び導電粉が90重量
%であった。
To 50 g of the above-obtained binder was added 450 g of the above-mentioned substantially spherical silver-plated copper powder, and the mixture was uniformly mixed and dispersed with a stirrer and a three-roll mill to obtain a conductive paste. The conductive paste was cured by heating at 170 ° C. for 90 minutes, and the Tg of the cured product was measured using a TM manufactured by Seiko Denshi Kogyo.
It was 86 ° C. as a result of measurement at A120 with a load of 3 g and a heating rate of 5 ° C./min. The mixing ratio of the epoxy resin and the flexibility-imparting agent is 80% by weight of the epoxy resin and 20% by weight of the flexibility-imparting agent, and the mixing ratio of the binder and the conductive powder is 10% by weight of the binder and the conductive powder. The powder was 90% by weight.

【0032】次に上記で得た導電ペーストを用いて、厚
さが0.8mmのガラスエポキシ銅張積層板(日立化成工
業(株)製、商品名MCL−E−670)に図2に示すよ
うに直径0.3mmのスルーホール5を形成し、このスル
ーホール5に導電ペーストを充填すると共にスルーホー
ル5間を印刷し、これを室温で10分間静置させた後、
170℃90分間加熱処理して配線板を得た。
Next, a 0.8 mm thick glass epoxy copper-clad laminate (manufactured by Hitachi Chemical Co., Ltd., trade name: MCL-E-670) is shown in FIG. 2 using the conductive paste obtained above. A through-hole 5 having a diameter of 0.3 mm is formed as described above, and the through-hole 5 is filled with a conductive paste and printed between the through-holes 5 and allowed to stand at room temperature for 10 minutes.
Heat treatment was performed at 170 ° C. for 90 minutes to obtain a wiring board.

【0033】次いで得られた配線板のスルーホール5上
の導電ペーストにはんだフラックスを塗布し、その上に
はんだ付けを行い、室温に放置し冷却した後、スルーホ
ール部のはんだ付けされている部分にテープ試験を実施
した。その結果、テープにはんだが付着しておらず、ス
ルーホール部の導電ペーストにはんだ付けされているこ
とが確認できた。
Next, a soldering flux is applied to the conductive paste on the through-hole 5 of the obtained wiring board, soldered thereon, left at room temperature and cooled, and then the soldered portion of the through-hole is soldered. The tape test was performed. As a result, it was confirmed that the solder was not attached to the tape and was soldered to the conductive paste in the through-hole portion.

【0034】なお、本実施例におけるアスペクト比の具
体的測定法を以下に示す。低粘度のエポキシ樹脂(ビュ
ーラー社製)の主剤(No.10−8130)8gと硬化
剤(No.10−8132)2gを混合し、ここへ導電粉
2gを混合して良く分散させ、そのまま30℃で真空脱
泡した後、10時間30℃で静置して粒子を沈降させ硬
化させた。その後、得られた硬化物を垂直方向に切断
し、切断面を電子顕微鏡で1000倍に拡大して切断面
に現れた150個の粒子について長径/短径を求め、そ
れらの平均値をもって、アスペクト比とした。
The specific method of measuring the aspect ratio in this embodiment will be described below. 8 g of a base material (No. 10-8130) of a low-viscosity epoxy resin (manufactured by Buehler) and 2 g of a curing agent (No. 10-8132) are mixed, and 2 g of conductive powder is mixed and dispersed well, and the mixture is left as it is. After defoaming in vacuo at 10 ° C., the particles were allowed to stand at 30 ° C. for 10 hours to settle and harden the particles. Thereafter, the obtained cured product was cut in the vertical direction, the cut surface was magnified 1000 times with an electron microscope, and the long diameter / short diameter of 150 particles that appeared on the cut surface was obtained. Ratio.

【0035】実施例2 実施例1で用いたビスフェノールA型エポキシ樹脂55
重量部、脂肪族ジグリシジルエーテル35重量部、2−
エチル−4−メチルイミダゾール(四国化成(株)製、商
品名キュアゾール2E4MZ)6重量部及びジシアンジ
アミド4重量部を加えて均一に混合してバインダとし
た。上記のバインダ35gに実施例1で得た略球状銀め
っき銅粉465gを加えて撹拌らいかい機及び三本ロー
ルで均一に混合、分散して導電ペーストを得た。
Example 2 Bisphenol A type epoxy resin 55 used in Example 1
Parts by weight, 35 parts by weight of aliphatic diglycidyl ether, 2-
Ethyl-4-methylimidazole (manufactured by Shikoku Chemicals Co., Ltd., trade name: Curesol 2E4MZ) (6 parts by weight) and dicyandiamide (4 parts by weight) were added and uniformly mixed to prepare a binder. 465 g of the substantially spherical silver-plated copper powder obtained in Example 1 was added to 35 g of the above-mentioned binder, and the mixture was uniformly mixed and dispersed with a stirrer and a three-roll mill to obtain a conductive paste.

【0036】得られた導電ペーストを実施例1と同様の
条件で硬化させた後、該硬化物のTgを実施例1と同様
の方法で測定した結果、65℃であった。なお、エポキ
シ樹脂と可撓性付与剤の配合割合は、エポキシ樹脂が6
1重量%及び可撓性付与剤が39重量%であり、またバ
インダと導電粉の配合割合は、バインダが10重量%及
び導電粉が90重量%であった。
After the obtained conductive paste was cured under the same conditions as in Example 1, the Tg of the cured product was measured by the same method as in Example 1, and the result was 65 ° C. The mixing ratio of the epoxy resin and the flexibility-imparting agent is 6 for the epoxy resin.
1% by weight and the flexibility imparting agent were 39% by weight, and the mixing ratio of the binder and the conductive powder was 10% by weight of the binder and 90% by weight of the conductive powder.

【0037】次に実施例1と同様の工程を経て配線板を
得た後、実施例1と同様の方法でテープ試験を実施した
結果、テープにはんだが付着しておらず、スルーホール
部の導電ペーストにはんだ付けされていることが確認で
きた。
Next, after a wiring board was obtained through the same steps as in Example 1, a tape test was performed in the same manner as in Example 1. As a result, no solder was attached to the tape, and It was confirmed that soldering was performed on the conductive paste.

【0038】比較例1 実施例1で用いたビスフェノールA型エポキシ樹脂90
重量部、2−フェニル−4−メチル−5−ヒドロキシメ
チルイミダゾール6重量部及びジシアンジアミド2重量
部を加えて均一に混合してバインダとした。上記のバイ
ンダ50gに実施例1で得た略球状銀めっき銅粉450
gを加えて撹拌らいかい機及び三本ロールで均一に混
合、分散して導電ペーストを得た。
Comparative Example 1 Bisphenol A type epoxy resin 90 used in Example 1
Parts by weight, 6 parts by weight of 2-phenyl-4-methyl-5-hydroxymethylimidazole and 2 parts by weight of dicyandiamide were added and uniformly mixed to obtain a binder. Approximately spherical silver-plated copper powder 450 obtained in Example 1 was added to 50 g of the above binder.
g was added, and the mixture was uniformly mixed and dispersed with a stirrer and a three-roll mill to obtain a conductive paste.

【0039】得られた導電ペーストを実施例1と同様の
条件で硬化させた後、該硬化物のTgを実施例1と同様
の方法で測定した結果、182℃であった。なお、バイ
ンダと導電粉の配合割合は、バインダが10重量%及び
導電粉が90重量%であった。
After the obtained conductive paste was cured under the same conditions as in Example 1, the Tg of the cured product was measured by the same method as in Example 1, and as a result, it was 182 ° C. The mixing ratio of the binder and the conductive powder was 10% by weight of the binder and 90% by weight of the conductive powder.

【0040】次に実施例1と同様の工程を経て配線板を
得た後、実施例1と同様の方法でテープ試験を実施した
結果、テープにはんだが付着し、スルーホール部の導電
ペーストにはんだ付けされていないことが確認できた。
Next, after a wiring board was obtained through the same steps as in Example 1, a tape test was performed in the same manner as in Example 1, and as a result, solder was attached to the tape, and the conductive paste in the through-hole portion was removed. It was confirmed that it was not soldered.

【0041】[0041]

【発明の効果】請求項1記載の発明の導電ペーストは、
はんだ付け性に優れる。請求項2及び3記載の発明の導
電ペーストは、層間接続用の貫通孔又は非貫通孔への埋
め込み性及びはんだ付け性の向上効果に優れる。請求項
4、5及び6記載の発明の導電ペーストは、導電性、マ
イグレーション性、層間接続用の貫通孔又は非貫通孔へ
の埋め込み性の向上効果及びはんだ付け性の向上効果に
優れる。
The conductive paste according to the first aspect of the present invention is
Excellent solderability. The conductive paste according to the second and third aspects of the present invention is excellent in the effect of improving the embedding property into a through hole or a non-through hole for interlayer connection and the solderability. The conductive paste according to the fourth, fifth, and sixth aspects of the invention is excellent in conductivity, migration property, an effect of improving embedding into a through hole or a non-through hole for interlayer connection, and an effect of improving solderability.

【図面の簡単な説明】[Brief description of the drawings]

【図1】(a)は多層プリント配線板の層間接続用の貫
通孔に銅めっきを施した状態を示す断面図及び(b)は
多層プリント配線板の層間接続用の貫通孔に導電ペース
トを埋め込んだ状態を示す断面図である。
FIG. 1A is a cross-sectional view showing a state in which copper plating is applied to a through hole for interlayer connection of a multilayer printed wiring board, and FIG. 1B is a view showing a state in which a conductive paste is applied to the through hole for interlayer connection of the multilayer printed wiring board. It is sectional drawing which shows the state which was embedded.

【図2】ガラスエポキシ銅張積層板に形成したスルーホ
ールに導電ペーストを充填すると共にスルーホール間を
印刷した状態を示す平面図である。
FIG. 2 is a plan view showing a state in which a conductive paste is filled in through holes formed in the glass epoxy copper clad laminate and a space between the through holes is printed.

【符号の説明】[Explanation of symbols]

1 銅めっき 2 導電ペースト 3 銅箔 4 ガラスエポキシ銅張積層板 5 スルーホール 1 copper plating 2 conductive paste 3 copper foil 4 glass epoxy copper clad laminate 5 through hole

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) H01B 1/00 H01B 1/00 H H05K 1/09 H05K 1/09 A 3/46 3/46 S N Fターム(参考) 4E351 DD04 DD21 DD52 EE02 EE16 GG16 4J002 CC032 CC162 CD011 CD021 CD051 CD061 CD131 CL002 DA077 DC007 EL028 EL136 EN036 EN076 ET006 EU116 FB077 FD117 FD142 FD146 GQ02 4J038 DB001 EA011 HA066 KA03 KA20 MA13 NA20 PB09 5E346 CC09 CC32 CC42 FF18 HH31 5G301 DA03 DA06 DA57 DD01 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) H01B 1/00 H01B 1/00 H H05K 1/09 H05K 1/09 A 3/46 3/46 SNF Terms (reference) 4E351 DD04 DD21 DD52 EE02 EE16 GG16 4J002 CC032 CC162 CD011 CD021 CD051 CD061 CD131 CL002 DA077 DC007 EL028 EL136 EN036 EN076 ET006 EU116 FB077 FD117 FD142 FD146 GQ02 4J038 DB001 EA0109B09 CC03 EA011 HA066 CC DA06 DA57 DD01

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 バインダ及び導電粉を含む導電ペースト
において、導電ペースト硬化物のガラス転移点が40〜
180℃である溶剤を含まない導電ペースト。
In a conductive paste containing a binder and a conductive powder, the cured product of the conductive paste has a glass transition point of 40 to 40.
A conductive paste containing no solvent at 180 ° C.
【請求項2】 バインダが、エポキシ樹脂組成物とその
硬化剤を含むものからなる請求項1記載の導電ペース
ト。
2. The conductive paste according to claim 1, wherein the binder comprises an epoxy resin composition and a curing agent thereof.
【請求項3】 エポキシ樹脂組成物が、常温で液状のエ
ポキシ樹脂又は常温で固形のエポキシ樹脂と可撓性付与
剤とを含み、かつエポキシ樹脂と可撓性付与剤の配合割
合が、エポキシ樹脂が50〜90重量%及び可撓性付与
剤が10〜50重量%である請求項1又は2記載の導電
ペースト。
3. The epoxy resin composition contains an epoxy resin which is liquid at room temperature or an epoxy resin which is solid at room temperature and a flexibility-imparting agent, and the mixing ratio of the epoxy resin and the flexibility-imparting agent is epoxy resin. The conductive paste according to claim 1, wherein the content of the conductive paste is 50 to 90% by weight and the content of the flexibility-imparting agent is 10 to 50% by weight.
【請求項4】 導電粉が、銅粉又は銅合金粉の一部を露
出して表面が大略銀で被覆され、かつ形状が略球状であ
る請求項1、2又は3記載の導電ペースト。
4. The conductive paste according to claim 1, wherein the conductive powder exposes a part of the copper powder or the copper alloy powder and has a surface substantially covered with silver, and has a substantially spherical shape.
【請求項5】 導電粉が、アスペクト比が1〜1.5及
び長径の平均粒径が1〜20μmで、かつ銅粉又は銅合
金粉の露出面積が10〜60%の略球状導電粉である請
求項1、2、3又は4記載の導電ペースト。
5. The conductive powder is an approximately spherical conductive powder having an aspect ratio of 1 to 1.5, an average long diameter of 1 to 20 μm, and an exposed area of copper powder or copper alloy powder of 10 to 60%. The conductive paste according to claim 1, 2, 3, or 4.
【請求項6】 バインダと導電粉の配合割合が、導電ペ
ーストの固形分に対して、バインダが5〜15重量%及
び導電粉が85〜95重量%である請求項1、2、3、
4又は5記載の導電ペースト。
6. The compounding ratio of the binder and the conductive powder is such that the binder is 5 to 15% by weight and the conductive powder is 85 to 95% by weight based on the solid content of the conductive paste.
6. The conductive paste according to 4 or 5.
JP2000052125A 2000-02-23 2000-02-23 Conductive paste Pending JP2001236827A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000052125A JP2001236827A (en) 2000-02-23 2000-02-23 Conductive paste

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000052125A JP2001236827A (en) 2000-02-23 2000-02-23 Conductive paste

Publications (1)

Publication Number Publication Date
JP2001236827A true JP2001236827A (en) 2001-08-31

Family

ID=18573692

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Link
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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005317491A (en) * 2004-04-01 2005-11-10 Hitachi Chem Co Ltd Conductive paste and electronic component mounting substrate using it
JP2005317490A (en) * 2004-04-01 2005-11-10 Hitachi Chem Co Ltd Conductive paste and electronic component mounting substrate using it
WO2006013793A1 (en) * 2004-08-03 2006-02-09 Hitachi Chemical Company, Ltd. Electroconductive paste and substrate using the same for mounting electronic parts
JP2014005531A (en) * 2012-01-17 2014-01-16 Dowa Electronics Materials Co Ltd Silver-coated copper alloy powder and method for producing the same
JP2016191042A (en) * 2015-03-30 2016-11-10 株式会社ノリタケカンパニーリミテド Thermosetting conductive paste for laser etching

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005317491A (en) * 2004-04-01 2005-11-10 Hitachi Chem Co Ltd Conductive paste and electronic component mounting substrate using it
JP2005317490A (en) * 2004-04-01 2005-11-10 Hitachi Chem Co Ltd Conductive paste and electronic component mounting substrate using it
WO2006013793A1 (en) * 2004-08-03 2006-02-09 Hitachi Chemical Company, Ltd. Electroconductive paste and substrate using the same for mounting electronic parts
KR100804840B1 (en) * 2004-08-03 2008-02-20 히다치 가세고교 가부시끼가이샤 Electroconductive paste and substrate using the same for mounting electronic parts
JP2014005531A (en) * 2012-01-17 2014-01-16 Dowa Electronics Materials Co Ltd Silver-coated copper alloy powder and method for producing the same
CN104066535A (en) * 2012-01-17 2014-09-24 同和电子科技有限公司 Silver-coated copper alloy powder and method for manufacturing same
JP2016191042A (en) * 2015-03-30 2016-11-10 株式会社ノリタケカンパニーリミテド Thermosetting conductive paste for laser etching

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