JP2001236641A - Vapor deposition device for thin film magnetic tape - Google Patents

Vapor deposition device for thin film magnetic tape

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Publication number
JP2001236641A
JP2001236641A JP2000045839A JP2000045839A JP2001236641A JP 2001236641 A JP2001236641 A JP 2001236641A JP 2000045839 A JP2000045839 A JP 2000045839A JP 2000045839 A JP2000045839 A JP 2000045839A JP 2001236641 A JP2001236641 A JP 2001236641A
Authority
JP
Japan
Prior art keywords
crucible
base film
thin film
width
vapor deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000045839A
Other languages
Japanese (ja)
Inventor
Masaru Segawa
勝 瀬川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Victor Company of Japan Ltd
Original Assignee
Victor Company of Japan Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Victor Company of Japan Ltd filed Critical Victor Company of Japan Ltd
Priority to JP2000045839A priority Critical patent/JP2001236641A/en
Publication of JP2001236641A publication Critical patent/JP2001236641A/en
Pending legal-status Critical Current

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  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

PROBLEM TO BE SOLVED: To enhance the yield of a product and the utilization efficiency of a vapor deposition material when a metal magnetic thin film is formed on a base film. SOLUTION: A vapor deposition device 1B for thin film magnetic tape wherein the belt-like base film 8 runs along the peripheral surface of a cooling can roll 7 in a vacuum vessel 2 and a metal magnetic material 10 melted in a crucible 9B provided along the direction of the width of the base film 8 below the cooling can roll 7 is vaporized from the opening part of the crucible 9B to form the metal magnetic thin film on one surface of the base film 8 is characterized in that the width of the opening part of the crucible 9B is formed so that a nearly central part in the longitudinal direction, which corresponds to a nearly central part in the direction of the width of the base film 9, is narrow and further formed gradually widely towards both ends from the nearly central part in the longitudinal direction.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、斜方蒸着法を適用
した薄膜磁気テープ用蒸着装置において、とくに、ルツ
ボの開口部の形状に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vapor deposition apparatus for a thin film magnetic tape to which an oblique vapor deposition method is applied, and more particularly to a shape of an opening of a crucible.

【0002】[0002]

【従来の技術】近年、ディジタル・ビデオ・テープレコ
ーダなどに適用される磁気テープは、高密度及び薄膜化
を達成するために、とくに、薄膜磁気テープ,垂直磁気
テープなどが注目されている。
2. Description of the Related Art In recent years, thin-film magnetic tapes, perpendicular magnetic tapes, and the like have attracted attention as magnetic tapes applied to digital video tape recorders and the like in order to achieve high density and thin film.

【0003】図5は斜方蒸着法を適用した一般的な薄膜
磁気テープ用蒸着装置の構成を示した構成図、図6は一
般的な薄膜磁気テープ蒸着装置内の冷却キャンロール近
傍を示した斜視図、図7(a)〜(c)は一般的な薄膜
磁気テープ用蒸着装置内に設置したルツボの開口部の形
状を説明するための斜視図,平面図、縦断面図である。
FIG. 5 is a structural view showing the structure of a general thin film magnetic tape vapor deposition apparatus to which the oblique vapor deposition method is applied, and FIG. 6 shows the vicinity of a cooling can roll in a general thin film magnetic tape vapor deposition apparatus. FIGS. 7A to 7C are a perspective view, a plan view, and a vertical cross-sectional view for explaining the shape of the opening of the crucible installed in a general thin film magnetic tape evaporation apparatus.

【0004】図5に示した如く、斜方蒸着法を適用した
一般的な薄膜磁気テープ用蒸着装置1Aの真空槽2内は
真空状態に保たれている。この真空槽2内には、供給ロ
ール3と、巻取ロール4と、ガイドロール5,6と、冷
却キャンロール7とが回転自在に配置されている。
As shown in FIG. 5, a vacuum chamber 2 of a general thin film magnetic tape vapor deposition apparatus 1A to which the oblique vapor deposition method is applied is kept in a vacuum state. In this vacuum chamber 2, a supply roll 3, a take-up roll 4, guide rolls 5, 6, and a cooling can roll 7 are rotatably arranged.

【0005】そして、真空槽2内で、供給ロール3に巻
回した帯状のベースフィルム8は、供給側のガイドロー
ル5、冷却キャンロール7の周面、巻取側のガイドロー
ル6に沿いながら巻取ロール4に向かって矢印方向に走
行している。
[0005] Then, in the vacuum chamber 2, the strip-shaped base film 8 wound around the supply roll 3 is moved along the guide roll 5 on the supply side, the peripheral surface of the cooling can roll 7, and the guide roll 6 on the winding side. It is running in the direction of the arrow toward the winding roll 4.

【0006】ここで、ベースフィルム8はポリエチレン
テレフタレート(PET)フィルムなどを使用してお
り、このベースフィルム8は供給ロール3にロール状に
数千〜数万m巻いたものを真空槽2内にセットし、ベー
スフィルム8の一方の面に冷却キャンロール7の下方に
設置した後述のルツボ9Aから蒸発した金属磁性材料1
0を連続して1ロール蒸着を行う方法が一般的に取られ
ている。
Here, the base film 8 is made of a polyethylene terephthalate (PET) film or the like. The metal magnetic material 1 which has been set and is evaporated from a crucible 9A, which will be described later, installed below the cooling can roll 7 on one surface of the base film 8
Generally, a method of performing one-roll evaporation in which 0 is continuously performed is adopted.

【0007】即ち、冷却キャンロール7の斜め下方に
は、ルツボ材料としてMgO(マグネシア)を用いて箱
状に形成したルツボ9Aが設置されている。このルツボ
9A内には、Co又はCoNiなどの強磁性材料(以
下、金属磁性材料と記す)10が収容されている。
That is, a crucible 9A formed in a box shape using MgO (magnesia) as a crucible material is installed diagonally below the cooling can roll 7. A ferromagnetic material (hereinafter, referred to as a metal magnetic material) 10 such as Co or CoNi is accommodated in the crucible 9A.

【0008】また、真空槽2の側壁2aには、ルツボ9
A内に収容した金属磁性材料10を溶融させて、このル
ツボ9Aの開口部から溶融した金属磁性材料10を蒸発
させるピアス型電子銃11が取り付けられている。この
ピアス型電子銃11は、ルツボ9A内の金属磁性材料1
0に向かって電子ビーム12が出射されており、金属磁
性材料10を溶融してベースフィルム8の一方の面側に
蒸発させている。
A crucible 9 is provided on the side wall 2a of the vacuum chamber 2.
A pierce-type electron gun 11 for melting the metal magnetic material 10 accommodated in A and evaporating the molten metal magnetic material 10 from the opening of the crucible 9A is attached. The pierce-type electron gun 11 is provided with a metal magnetic material 1 in a crucible 9A.
The electron beam 12 is emitted toward 0, and the metal magnetic material 10 is melted and evaporated on one surface side of the base film 8.

【0009】また、冷却キャンロール7の下方部位に沿
って入射角規制マスク部材13がルツボ9A側と対向し
て取り付けられており、この入射角規制マスク部材13
は、ベースフィルム8が冷却キャンロール7に沿って走
行する時に、ルツボ9Aから蒸着した金属磁性材料10
のベースフィルム8に対する最大入射角θmax及び最
小入射角θminを規制している。
An incident angle regulating mask member 13 is mounted along the lower portion of the cooling can roll 7 so as to face the crucible 9A side.
The metal magnetic material 10 deposited from the crucible 9A when the base film 8 runs along the cooling can roll 7
The maximum incident angle θmax and the minimum incident angle θmin with respect to the base film 8 are regulated.

【0010】また、冷却キャンロール7の下方部位に沿
い、且つ、入射角規制マスク部材13のうちで最小入射
角θmin側の内側には酸素ガス導入パイプ14が取り
付けられている。そして、酸素ガス導入パイプ14に導
入した酸素ガスが、ベースフィルム8の幅方向に沿って
複数形成した酸素ガス吹き出し用の微細孔から蒸発した
金属磁性材料10に向かって吹き出されており、この酸
素ガスにより蒸発した金属磁性材料10を酸化させるこ
とにより後述の金属磁性薄膜に対して静磁気特性の向上
と信頼性(耐久性や耐食性)とを確保することが主流に
なっている。
An oxygen gas introduction pipe 14 is mounted along the lower part of the cooling can roll 7 and inside the incident angle regulating mask member 13 on the side of the minimum incident angle θmin. The oxygen gas introduced into the oxygen gas introduction pipe 14 is blown out toward the evaporated metal magnetic material 10 from the plurality of oxygen gas blowing fine holes formed in the width direction of the base film 8. The mainstream is to oxidize the metal magnetic material 10 evaporated by the gas to ensure the improvement of the magnetostatic property and the reliability (durability and corrosion resistance) of the metal magnetic thin film described later.

【0011】また、ピアス型電子銃11から出射される
電子ビーム12は、軌道に偏向磁界を印加するための偏
向用マグネット15と、ルツボ9Aに近設した偏向用マ
グネット16とにより制御されている。従って、ルツボ
9Aの長手方向に電子ビーム12を走査することにより
ベースフィルム8の幅方向にスキャンされて、蒸発した
Co又はCoNiなどの金属磁性材料10がベースフィ
ルム8の幅方向にCoO又はCoNiOなどの金属磁性
薄膜として成膜され、これをベースフィルム8の長さ方
向に繰り返すことにより長尺な薄膜磁気テープが巻取ロ
ール4側に巻き取れている。
The electron beam 12 emitted from the pierce-type electron gun 11 is controlled by a deflection magnet 15 for applying a deflection magnetic field to the orbit and a deflection magnet 16 provided near the crucible 9A. . Accordingly, the electron beam 12 is scanned in the longitudinal direction of the crucible 9A, thereby being scanned in the width direction of the base film 8, and the evaporated metal magnetic material 10 such as Co or CoNi is deposited in the width direction of the base film 8 such as CoO or CoNiO. By repeating this in the length direction of the base film 8, a long thin film magnetic tape is wound up on the take-up roll 4 side.

【0012】ここで、ルツボ9Aから蒸発した金属磁性
材料10をベースフィルム8上に金属磁性薄膜として成
膜する際、ベースフィルム8への耐熱性を考慮して、図
6に示したように、矢印方向に回転する冷却キャンロー
ル7の内部には、冷却器(図示せず)が設置され、蒸着
時にベースフィルム8の温度上昇による変形などを抑制
している。そして、この様な斜方蒸着方法では、冷却し
た回転自在な冷却キャンロール7の周面にルツボ9Aか
らの金属磁性材料10が付着しない様に、ベースフィル
ム8のエッジ部分を入射角規制マスク部材13によって
覆っており、ベースフィルム8の幅寸法に対して入射角
規制マスク部材13の幅方向の開口寸法が狭く設定され
ている。
Here, when the metal magnetic material 10 evaporated from the crucible 9A is formed as a metal magnetic thin film on the base film 8, in consideration of heat resistance to the base film 8, as shown in FIG. A cooler (not shown) is installed inside the cooling can roll 7 rotating in the direction of the arrow, and suppresses deformation and the like of the base film 8 due to a rise in temperature during vapor deposition. In such an oblique deposition method, the edge portion of the base film 8 is provided with an incident angle regulating mask member so that the metal magnetic material 10 from the crucible 9A does not adhere to the peripheral surface of the cooled rotatable cooling can roll 7. The opening dimension of the incident angle regulating mask member 13 in the width direction is set to be smaller than the width dimension of the base film 8.

【0013】また、図6及び図7に示した如く、ルツボ
9Aの開口部の形状は、ベースフィルム8の幅方向に沿
ってこのベースフィルム8の幅Bによりも僅かに長い長
さLに設定され、且つ、この長さ方向と直角な方向が一
定の幅Wに設定されており、ルツボ9Aの開口部はL×
Wの矩形状に形成されている。
As shown in FIGS. 6 and 7, the shape of the opening of the crucible 9A is set to a length L slightly longer than the width B of the base film 8 along the width direction of the base film 8. The direction perpendicular to the length direction is set to a constant width W, and the opening of the crucible 9A is L ×
W is formed in a rectangular shape.

【0014】[0014]

【発明が解決しようとする課題】ところで、斜方蒸着法
を適用した一般的な薄膜磁気テープ用蒸着装置1Aを用
いて、ルツボ9Aから蒸発したCo又はCoNiなどの
金属磁性材料10をベースフィルム8上に金属磁性薄膜
として成膜する場合に、上述したように入射角規制マス
ク部材13のマスク開口部はかなり狭く制限が加えられ
るため、蒸発した金属磁性材料(蒸発金属磁性材料)1
0の利用効率は10〜15%程度で残りの大部分は不要
な付着物となっていた。このため、この入射角規制マス
ク部材13のマスク開口部を少しでも最小入射角側に広
げ、蒸発金属磁性材料の利用効率を向上させるには静磁
気特性の更なる向上が必要となっていた。
By using a general thin film magnetic tape evaporation apparatus 1A to which the oblique evaporation method is applied, a metal magnetic material 10 such as Co or CoNi evaporated from a crucible 9A is used as a base film 8. When a metal magnetic thin film is formed thereon, the mask opening of the incident angle restricting mask member 13 is considerably narrow as described above, so that the evaporated metal magnetic material (evaporated metal magnetic material) 1 is used.
The utilization efficiency of No. 0 was about 10 to 15%, and most of the remaining parts were unnecessary deposits. For this reason, it is necessary to further improve the magnetostatic properties in order to widen the mask opening of the incident angle regulating mask member 13 to the minimum incident angle side even slightly and to improve the utilization efficiency of the evaporated metal magnetic material.

【0015】また、斜方蒸着法ではベースフィルム8の
一方の面への蒸発飛来粒子の入射角度が諸特性を概ね決
定しており、特に金属磁性薄膜の初期成長層の入射角度
のバラツキや分布はベースフィルム8の幅方向に対する
金属磁性薄膜への特性分布に多大な影響を及ぼしてい
た。とくに、ルツボ9Aの開口部の形状がベースフィル
ム8の幅方向に対して長さ方向と直角な幅寸法が一定の
幅Wに形成されているため、電子ビーム12をルツボ9
Aの長さ方向に沿って走査した時に、ルツボ9Aの長さ
方向の端部ではこの端部で蒸発した蒸発飛来粒子の入射
角度が略一定の方向に揃うものの、ルツボ9Aの長さ方
向の略中央部ではこの部位から蒸発した蒸発飛来粒子と
両端部から蒸発した蒸発飛来粒子とが混在してしまい蒸
発飛来粒子の入射角度が略一定の方向に揃わないなどの
問題が発生している。このため、金属磁性薄膜を成膜し
た後に、薄膜磁気テープの良品歩留まりが悪く、また、
品質上安全を確保するため、静磁気特性の分布やバラツ
キを考慮して膜厚を厚めに製造する必要があり、蒸着金
属磁性材料の利用効率の更なる低下に伴う製造コストの
上昇につながっていた。
Further, in the oblique deposition method, the incident angle of the evaporated flying particles on one surface of the base film 8 largely determines various characteristics. In particular, the dispersion and distribution of the incident angle of the initial growth layer of the metal magnetic thin film. Has had a great influence on the characteristic distribution of the metal magnetic thin film in the width direction of the base film 8. In particular, since the shape of the opening of the crucible 9A is formed so that the width dimension perpendicular to the length direction with respect to the width direction of the base film 8 is a constant width W, the electron beam 12 is supplied to the crucible 9A.
When scanning along the length direction of the crucible 9A, the incident angle of the evaporative flying particles evaporated at this end at the end in the length direction of the crucible 9A is aligned in a substantially constant direction. At the substantially central portion, there are problems such that the evaporative flying particles evaporated from this portion and the evaporative flying particles evaporating from both ends are mixed, and the incident angle of the evaporative flying particles is not aligned in a substantially constant direction. For this reason, after the metal magnetic thin film is formed, the yield of non-defective thin film magnetic tape is poor, and
In order to ensure safety in quality, it is necessary to manufacture thicker films in consideration of the distribution and variation of magnetostatic characteristics, leading to an increase in manufacturing costs due to a further decrease in the use efficiency of the deposited metal magnetic material. Was.

【0016】[0016]

【課題を解決するための手段】本発明は上記課題に鑑み
てなされたものであり、真空槽内で帯状のベースフィル
ムを冷却キャンロールの周面に沿って走行させ、且つ、
前記冷却キャンロールの下方で前記ベースフィルムの幅
方向に沿って設置したルツボ内で溶融させた金属磁性材
料を該ルツボの開口部から蒸発させて、前記ベースフィ
ルムの一方の面に金属磁性薄膜を成膜する薄膜磁気テー
プ用蒸着装置において、前記ルツボの開口部は、前記ベ
ースフィルムの幅方向の略中央部と対応する長さ方向の
略中央部を幅狭く形成し、且つ、前記長さ方向の略中央
部から両端部に向かって徐々に幅広く形成したことを特
徴とする薄膜磁気テープ用蒸着装置を提供する。
SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and has a belt-shaped base film running along the peripheral surface of a cooling can roll in a vacuum chamber;
A metal magnetic material melted in a crucible installed along the width direction of the base film below the cooling can roll is evaporated from an opening of the crucible, and a metal magnetic thin film is formed on one surface of the base film. In the vapor deposition device for a thin film magnetic tape for forming a film, the opening of the crucible is formed such that a substantially central portion in a length direction corresponding to a substantially central portion in a width direction of the base film is formed to be narrow, and the longitudinal direction is reduced. The present invention provides a thin film magnetic tape vapor deposition apparatus characterized in that the width is gradually increased from substantially the center to both ends.

【0017】[0017]

【発明の実施の形態】以下に本発明に係る薄膜磁気テー
プ用蒸着装置の一実施例を図1乃至図4を参照して詳細
に説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of a thin film magnetic tape vapor deposition apparatus according to the present invention will be described below in detail with reference to FIGS.

【0018】図1は本発明に係る薄膜磁気テープ用蒸着
装置内の冷却キャンロール近傍を示した斜視図、図2
(a)〜(c)は本発明に係る薄膜磁気テープ用蒸着装
置内に設置したルツボの開口部の形状を説明するための
斜視図,平面図,縦断面図、図3はルツボ中央部の幅寸
法と静磁気特性の関係を示した図、図4はフィルム基材
(ベースフィルム)幅方向の静磁気特性分布を示した図
である。
FIG. 1 is a perspective view showing the vicinity of a cooling can roll in a thin film magnetic tape vapor deposition apparatus according to the present invention.
(A) to (c) are perspective views, plan views, and vertical cross-sectional views for explaining the shape of the opening of the crucible installed in the thin film magnetic tape vapor deposition apparatus according to the present invention, and FIG. FIG. 4 is a view showing the relationship between the width dimension and the magnetostatic property, and FIG. 4 is a view showing the magnetostatic property distribution in the width direction of the film base (base film).

【0019】尚、説明の都合上、先に従来例で説明した
構成部材と同じ機能の構成部材について同一の符号を付
して適宜説明し、且つ、従来例と異なる構成部材に新た
な符号を付す共に、この実施例では従来例と異なる点を
中心に説明する。
For convenience of explanation, components having the same functions as the components described in the prior art are denoted by the same reference numerals and will be described as appropriate, and new components will be assigned to components different from those in the conventional example. In addition, this embodiment will be described focusing on points different from the conventional example.

【0020】図1に示した如く、本発明に係る薄膜磁気
テープ用蒸着装置1Bでは、斜方蒸着法を適用して真空
槽2内でベースフィルム8の一方の面に金属磁性薄膜を
成膜する際に、先に図5〜図7を用いて説明した一般的
な薄膜磁気テープ用蒸着装置1Aの真空槽2内に設置し
たルツボ9Aに代えて、新たに開発したルツボ9Bを冷
却キャンロール7の斜め下方に設置したことが特徴であ
る。
As shown in FIG. 1, in the thin film magnetic tape evaporation apparatus 1B according to the present invention, a metal magnetic thin film is formed on one surface of the base film 8 in the vacuum chamber 2 by applying an oblique evaporation method. At this time, a newly developed crucible 9B is replaced with a crucible 9B instead of the crucible 9A installed in the vacuum chamber 2 of the general thin film magnetic tape vapor deposition apparatus 1A described above with reference to FIGS. 7 is characterized by being installed diagonally below.

【0021】ここで、新たに開発したルツボ9Bの形状
は図2(a)に拡大して示した如く、溶融した金属磁性
材料10を蒸発させるためのルツボ9Bの開口部は、ベ
ースフィルム8(図1)の幅方向の略中央部と対応する
長さ方向の略中央部を幅狭く形成し、且つ、長さ方向の
略中央部から両端部に向かって徐々に幅広く形成してい
る。すなわち、ルツボ9Bの開口部の長さLはベースフ
ィルム8の幅B(図1)によりも僅かに長く設定されて
おり、且つ、開口部の長さ方向の略中央部の幅Wcは幅
狭く形成され、略中央部から両端部に向かって徐々に幅
広くなり、両端部の幅Wは従来例と同じ広い幅寸法に形
成されている。
Here, the shape of the newly developed crucible 9B is shown in an enlarged manner in FIG. 2A, and the opening of the crucible 9B for evaporating the molten metal magnetic material 10 is formed on the base film 8 ( A substantially central portion in the length direction corresponding to a substantially central portion in the width direction of FIG. 1) is formed to be narrow, and is gradually widened from the substantially central portion in the length direction to both end portions. That is, the length L of the opening of the crucible 9B is set slightly longer than the width B (FIG. 1) of the base film 8, and the width Wc of the substantially central portion in the length direction of the opening is narrow. The width W is gradually increased from the substantially central portion to both ends, and the width W of both ends is formed to be the same as the conventional example.

【0022】また、上記した薄膜磁気テープ用蒸着装置
1Bの概要を説明すると、冷却キャンロール7の直径は
1000mm,冷却キャンロール7の幅は600mm,
ベースフィルム8の幅は560mm,ベースフィルム8
への成膜幅は500mm,ルツボ9B内の強磁性材料
(純Co)の溶融,蒸着は出力300kWの90゜偏向
ピアス型電子銃11(図5)を用いた。入射角規制マス
ク部材13は15mm厚さのステンレス製で成膜エリア
外周を囲んでいる。また、ルツボ9Bの付近には電子ビ
ームの適正な入射に必要な偏向用マグネット16(図
5)を設置した。更に、ルツボ9Bの片端部分からは連
続的に強磁性材料(純Co)が一定量供給されるように
供給機(図示せず)を設置した。この装置1Bを用いて
以下の実験を行った。
The outline of the vapor deposition device 1B for a thin film magnetic tape will be described. The diameter of the cooling can roll 7 is 1000 mm, the width of the cooling can roll 7 is 600 mm, and
The width of the base film 8 is 560 mm,
The ferromagnetic material (pure Co) in the crucible 9B was melted in a film width of 500 mm, and a 90 ° deflection piercing electron gun 11 (FIG. 5) having an output of 300 kW was used for vapor deposition. The incident angle regulating mask member 13 is made of stainless steel having a thickness of 15 mm and surrounds the outer periphery of the film forming area. In addition, a deflecting magnet 16 (FIG. 5) necessary for proper incidence of the electron beam was provided near the crucible 9B. Further, a feeder (not shown) was provided so that a constant amount of ferromagnetic material (pure Co) was continuously supplied from one end of the crucible 9B. The following experiment was performed using this apparatus 1B.

【0023】[実験]図2(b),(c)に示すよう
に、ルツボ9Bの開口部の長さ:Lは700mm、ルツ
ボ9Bの両端部の幅:Wは140mmとし、ルツボ9B
の略中央部の幅:Wcが電子ビーム径φ10mmから考
慮して限度と推定される30mmから120mmまで寸
法を可変して、両端部から略中央部に向かって徐々に幅
狭くした7種類のルツボ9Bを用意した。
[Experiment] As shown in FIGS. 2 (b) and 2 (c), the length of the opening of the crucible 9B: L is 700 mm, the width of both ends of the crucible 9B: W is 140 mm, and the crucible 9B
Approximately central portion width: Seven types of crucibles in which Wc is varied in size from 30 mm to 120 mm, which is estimated to be a limit in consideration of the electron beam diameter φ10 mm, and gradually narrows from both ends toward the approximate central portion. 9B was prepared.

【0024】一方、図7(b),(c)に示すように、
比較の為に従来のルツボ9Aを用意し、ルツボ9Aの略
中央部の幅:Wcがルツボ9Aの両端部の幅:Wと同じ
140mmに設定した。
On the other hand, as shown in FIGS. 7B and 7C,
For comparison, a conventional crucible 9A was prepared, and the width Wc at the substantially central portion of the crucible 9A was set to 140 mm, which is the same as the width W at both ends of the crucible 9A.

【0025】上記7種類のルツボ9Bと,従来のルツボ
9Aを使用して、ルツボ9B,9A内で溶融させたCo
(金属磁性材料)を開口部から蒸発させて、最小入射角
側からの酸素ガス導入量1800ccmで、CoO膜を
膜厚0.2μmになるよう透過型膜厚モニターで制御し
ながら処理長5000mをそれぞれ成膜した。
By using the above seven types of crucibles 9B and a conventional crucible 9A, Co was melted in the crucibles 9B and 9A.
(Metallic magnetic material) is evaporated from the opening, and the processing length of 5000 m is controlled by controlling the CoO film to a thickness of 0.2 μm with a transmission type film thickness monitor at an oxygen gas introduction amount of 1800 ccm from the minimum incident angle side. Each film was formed.

【0026】そして、上記7種類のルツボ9Bと,従来
のルツボ9Aとを使用して成膜したそれぞれ5000m
のロールからサンプリングし、希硝酸にてCoO膜の一
部分をエッチングした後、接触型段差計(タリステッ
プ)によりCoO膜の成膜幅センター部の膜厚が約0.
2μmになっていることを確かめた。
Then, the above-mentioned seven types of crucibles 9B and a conventional crucible 9A were used to form films of 5000 m each.
Sampled from the roll, and a part of the CoO film was etched with dilute nitric acid.
It was confirmed that the thickness was 2 μm.

【0027】その後、各サンプルのエッチングしていな
い残り部分の静磁気特性を振動型磁力計(VSM)によ
り測定した。その結果を図3に示す。Hcは保磁力、M
sは飽和磁化量、Rsは角形比を示す。
Thereafter, the magnetostatic properties of the remaining unetched portions of each sample were measured by a vibrating magnetometer (VSM). The result is shown in FIG. Hc is the coercive force, M
s indicates the saturation magnetization, and Rs indicates the squareness ratio.

【0028】図3より明らかなように、ルツボ中央部の
幅:Wcが140mmの場合は従来例のルツボ9Aの形
状に対応した特性であり、ルツボ中央部の幅:Wcを狭
めた場合が本発明による特性である。ここでは、ルツボ
中央部の幅:Wcが80mm以下では飽和磁化量Msの
変化がないにも関わらず、保磁力Hcが向上し、特に角
形比Rsが良好な値を示している。
As is clear from FIG. 3, when the width Wc of the central portion of the crucible is 140 mm, the characteristic corresponds to the shape of the crucible 9A of the conventional example, and when the width Wc of the central portion of the crucible is reduced. This is a characteristic according to the invention. Here, when the width Wc of the central portion of the crucible: Wc is 80 mm or less, the coercive force Hc is improved, and the squareness ratio Rs shows a good value, in spite of no change in the saturation magnetization Ms.

【0029】これは、ルツボ中央部に近づくほどその幅
を狭くしたことにより、ベースフィルム8のへの蒸発飛
来粒子の入射角度の分散が小さくなって入射角度が略中
央部でも揃うようになり、とくに、ルツボ中央部の幅を
80mm以下にすることで顕著な効果が得られ、良好な
CoO膜の初期成長層および粒成長が形成された結果と
考えられる。
This is because, as the width becomes narrower as it approaches the central portion of the crucible, the dispersion of the incident angle of the vaporized flying particles to the base film 8 becomes small, and the incident angle becomes uniform even in the substantially central portion. In particular, it is considered that a remarkable effect is obtained by setting the width of the central portion of the crucible to 80 mm or less, and that a good initial growth layer and grain growth of the CoO film are formed.

【0030】また、同様のサンプルのフィルム基材(ベ
ースフィルム)幅方向の静磁気特性分布を、VSMによ
り測定した結果の一部を図4に示す。この図4におい
て、ルツボ中央部の幅:Wcを140mmに設定した従
来例のルツボ9Aでは略中央部で保磁力Hc及び角形比
Rsが急激に落ち込むの対して、ルツボ中央部の幅:W
cを狭めて80mm以下では良好な静磁気特性分布を示
すことが判った。
FIG. 4 shows a part of the result of measuring the distribution of magnetostatic properties of the same sample in the width direction of the film base material (base film) by VSM. In FIG. 4, in the conventional crucible 9A in which the width Wc at the center of the crucible is set to 140 mm, the coercive force Hc and the squareness ratio Rs drop sharply at the approximate center, whereas the width W at the center of the crucible is W.
It was found that a good magnetostatic property distribution was exhibited when c was narrowed to 80 mm or less.

【0031】[0031]

【発明の効果】以上詳述した本発明に係る薄膜磁気テー
プ用蒸着装置によれば、とくに、ルツボの開口部は、ベ
ースフィルムの幅方向の略中央部と対応する長さ方向の
略中央部を幅狭く形成し、且つ、長さ方向の略中央部か
ら両端部に向かって徐々に幅広く形成したため、ベース
フィルムの一方の面上に金属磁性薄膜を良好に成膜で
き、且つ、金属磁性薄膜の静磁気特性をも向上でき、更
に、フィルム基材(ベースフィルム)幅方向の静磁気特
性分布も大幅に改善される。これにより、薄膜磁気テー
プの歩留まりと蒸発した磁性金属材料の利用効率を向上
することができ、薄膜磁気テープを低コストで提供でき
るようになる。
According to the vapor deposition apparatus for a thin-film magnetic tape according to the present invention described in detail above, the opening of the crucible particularly has a substantially central portion in the length direction corresponding to a substantially central portion in the width direction of the base film. Is formed to be narrow and gradually wide from substantially the center to both ends in the longitudinal direction, so that the metal magnetic thin film can be formed well on one surface of the base film, and the metal magnetic thin film can be formed. Can be improved, and the distribution of the magnetostatic property in the width direction of the film substrate (base film) can be greatly improved. As a result, the yield of the thin film magnetic tape and the utilization efficiency of the evaporated magnetic metal material can be improved, and the thin film magnetic tape can be provided at low cost.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係る薄膜磁気テープ用蒸着装置内の冷
却キャンロール近傍を示した斜視図である。
FIG. 1 is a perspective view showing the vicinity of a cooling can roll in a thin film magnetic tape vapor deposition apparatus according to the present invention.

【図2】(a)〜(c)は本発明に係る薄膜磁気テープ
用蒸着装置内に設置したルツボの開口部の形状を説明す
るための斜視図,平面図,縦断面図である。
2 (a) to 2 (c) are a perspective view, a plan view, and a longitudinal sectional view for explaining the shape of an opening of a crucible installed in the vapor deposition apparatus for a thin film magnetic tape according to the present invention.

【図3】ルツボ中央部の幅寸法と静磁気特性の関係を示
した図である。
FIG. 3 is a diagram showing a relationship between a width dimension of a crucible center portion and magnetostatic characteristics.

【図4】フィルム基材(ベースフィルム)幅方向の静磁
気特性分布を示した図である。
FIG. 4 is a diagram showing a distribution of magnetostatic characteristics in a width direction of a film base (base film).

【図5】斜方蒸着法を適用した一般的な薄膜磁気テープ
用蒸着装置の構成を示した構成図である。
FIG. 5 is a configuration diagram showing a configuration of a general thin film magnetic tape evaporation apparatus to which an oblique evaporation method is applied.

【図6】一般的な薄膜磁気テープ蒸着装置内の冷却キャ
ンロール近傍を示した斜視図である。
FIG. 6 is a perspective view showing the vicinity of a cooling can roll in a general thin film magnetic tape evaporation apparatus.

【図7】(a)〜(c)は一般的な薄膜磁気テープ用蒸
着装置内に設置したルツボの開口部の形状を説明するた
めの斜視図,平面図、縦断面図である。
FIGS. 7A to 7C are a perspective view, a plan view, and a vertical sectional view for explaining the shape of an opening of a crucible installed in a general thin-film magnetic tape vapor deposition apparatus.

【符号の説明】[Explanation of symbols]

1B…本発明に係る薄膜磁気テープ用蒸着装置、2…真
空槽、7…冷却キャンロール、8…ベースフィルム、9
B…ルツボ、10…金属磁性材料、11…ピアス型電子
銃、12…電子ビーム、13…入射角規制マスク部材。
1B: Vapor deposition device for thin-film magnetic tape according to the present invention, 2: vacuum tank, 7: cooling can roll, 8: base film, 9
B: Crucible, 10: Metal magnetic material, 11: Pierce type electron gun, 12: Electron beam, 13: Incident angle regulating mask member.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】真空槽内で帯状のベースフィルムを冷却キ
ャンロールの周面に沿って走行させ、且つ、前記冷却キ
ャンロールの下方で前記ベースフィルムの幅方向に沿っ
て設置したルツボ内で溶融させた金属磁性材料を該ルツ
ボの開口部から蒸発させて、前記ベースフィルムの一方
の面に金属磁性薄膜を成膜する薄膜磁気テープ用蒸着装
置において、 前記ルツボの開口部は、前記ベースフィルムの幅方向の
略中央部と対応する長さ方向の略中央部を幅狭く形成
し、且つ、前記長さ方向の略中央部から両端部に向かっ
て徐々に幅広く形成したことを特徴とする薄膜磁気テー
プ用蒸着装置。
1. A belt-shaped base film is run along a peripheral surface of a cooling can roll in a vacuum chamber, and is melted in a crucible provided along the width direction of the base film below the cooling can roll. The metal magnetic material is evaporated from the opening of the crucible, a thin film magnetic tape vapor deposition apparatus for forming a metal magnetic thin film on one surface of the base film, the opening of the crucible, the opening of the base film A thin film magnet, wherein a substantially central portion in the length direction corresponding to the substantially central portion in the width direction is formed to be narrow, and the width is gradually increased from the substantially central portion in the length direction to both end portions. Vapor deposition equipment for tape.
JP2000045839A 2000-02-23 2000-02-23 Vapor deposition device for thin film magnetic tape Pending JP2001236641A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000045839A JP2001236641A (en) 2000-02-23 2000-02-23 Vapor deposition device for thin film magnetic tape

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000045839A JP2001236641A (en) 2000-02-23 2000-02-23 Vapor deposition device for thin film magnetic tape

Publications (1)

Publication Number Publication Date
JP2001236641A true JP2001236641A (en) 2001-08-31

Family

ID=18568369

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000045839A Pending JP2001236641A (en) 2000-02-23 2000-02-23 Vapor deposition device for thin film magnetic tape

Country Status (1)

Country Link
JP (1) JP2001236641A (en)

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