JP2001230172A5 - - Google Patents

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Publication number
JP2001230172A5
JP2001230172A5 JP2000039158A JP2000039158A JP2001230172A5 JP 2001230172 A5 JP2001230172 A5 JP 2001230172A5 JP 2000039158 A JP2000039158 A JP 2000039158A JP 2000039158 A JP2000039158 A JP 2000039158A JP 2001230172 A5 JP2001230172 A5 JP 2001230172A5
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JP
Japan
Prior art keywords
plate
substrate
heat
processing apparatus
substrate processing
Prior art date
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Granted
Application number
JP2000039158A
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English (en)
Japanese (ja)
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JP2001230172A (ja
JP3998389B2 (ja
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Priority to JP2000039158A priority Critical patent/JP3998389B2/ja
Priority claimed from JP2000039158A external-priority patent/JP3998389B2/ja
Publication of JP2001230172A publication Critical patent/JP2001230172A/ja
Publication of JP2001230172A5 publication Critical patent/JP2001230172A5/ja
Application granted granted Critical
Publication of JP3998389B2 publication Critical patent/JP3998389B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2000039158A 2000-02-17 2000-02-17 基板処理装置 Expired - Fee Related JP3998389B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000039158A JP3998389B2 (ja) 2000-02-17 2000-02-17 基板処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000039158A JP3998389B2 (ja) 2000-02-17 2000-02-17 基板処理装置

Publications (3)

Publication Number Publication Date
JP2001230172A JP2001230172A (ja) 2001-08-24
JP2001230172A5 true JP2001230172A5 (enrdf_load_stackoverflow) 2005-09-02
JP3998389B2 JP3998389B2 (ja) 2007-10-24

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ID=18562769

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000039158A Expired - Fee Related JP3998389B2 (ja) 2000-02-17 2000-02-17 基板処理装置

Country Status (1)

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JP (1) JP3998389B2 (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3996845B2 (ja) * 2002-12-27 2007-10-24 大日本スクリーン製造株式会社 基板処理装置
JP4410147B2 (ja) 2005-05-09 2010-02-03 東京エレクトロン株式会社 加熱装置、塗布、現像装置及び加熱方法
JP4606355B2 (ja) * 2006-03-14 2011-01-05 東京エレクトロン株式会社 熱処理装置、熱処理方法及び記憶媒体
JP6301044B1 (ja) * 2017-08-21 2018-03-28 堺ディスプレイプロダクト株式会社 蒸着装置、蒸着方法及び有機ｅｌ表示装置の製造方法

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