JP2001202914A - 集束イオンビーム装置による二次荷電粒子像の観察方法 - Google Patents

集束イオンビーム装置による二次荷電粒子像の観察方法

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Publication number
JP2001202914A
JP2001202914A JP2000343920A JP2000343920A JP2001202914A JP 2001202914 A JP2001202914 A JP 2001202914A JP 2000343920 A JP2000343920 A JP 2000343920A JP 2000343920 A JP2000343920 A JP 2000343920A JP 2001202914 A JP2001202914 A JP 2001202914A
Authority
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Japan
Prior art keywords
ion beam
focused ion
secondary charged
amplifier
charged particle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2000343920A
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English (en)
Japanese (ja)
Other versions
JP2001202914A5 (enExample
Inventor
Yasuhiko Sugiyama
安彦 杉山
Mitsuto Asao
光人 朝生
Katsumi Suzuki
勝美 鈴木
Katsunori Nakazawa
勝則 中沢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Priority to JP2000343920A priority Critical patent/JP2001202914A/ja
Publication of JP2001202914A publication Critical patent/JP2001202914A/ja
Publication of JP2001202914A5 publication Critical patent/JP2001202914A5/ja
Withdrawn legal-status Critical Current

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  • Analysing Materials By The Use Of Radiation (AREA)
JP2000343920A 1999-11-12 2000-11-10 集束イオンビーム装置による二次荷電粒子像の観察方法 Withdrawn JP2001202914A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000343920A JP2001202914A (ja) 1999-11-12 2000-11-10 集束イオンビーム装置による二次荷電粒子像の観察方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP32246099 1999-11-12
JP11-322460 1999-11-12
JP2000343920A JP2001202914A (ja) 1999-11-12 2000-11-10 集束イオンビーム装置による二次荷電粒子像の観察方法

Publications (2)

Publication Number Publication Date
JP2001202914A true JP2001202914A (ja) 2001-07-27
JP2001202914A5 JP2001202914A5 (enExample) 2006-08-03

Family

ID=26570829

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000343920A Withdrawn JP2001202914A (ja) 1999-11-12 2000-11-10 集束イオンビーム装置による二次荷電粒子像の観察方法

Country Status (1)

Country Link
JP (1) JP2001202914A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012140874A1 (ja) * 2011-04-15 2012-10-18 株式会社日立ハイテクノロジーズ 荷電粒子顕微鏡装置および画像撮像方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012140874A1 (ja) * 2011-04-15 2012-10-18 株式会社日立ハイテクノロジーズ 荷電粒子顕微鏡装置および画像撮像方法
JP2012226842A (ja) * 2011-04-15 2012-11-15 Hitachi High-Technologies Corp 荷電粒子顕微鏡装置および画像撮像方法
US9460889B2 (en) 2011-04-15 2016-10-04 Hitachi High-Technologies Corporation Charged particle microscope device and image capturing method

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