JP2001201844A - 半導体集積回路装置の製造方法およびフォトマスクの製造方法 - Google Patents

半導体集積回路装置の製造方法およびフォトマスクの製造方法

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Publication number
JP2001201844A
JP2001201844A JP2000013168A JP2000013168A JP2001201844A JP 2001201844 A JP2001201844 A JP 2001201844A JP 2000013168 A JP2000013168 A JP 2000013168A JP 2000013168 A JP2000013168 A JP 2000013168A JP 2001201844 A JP2001201844 A JP 2001201844A
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JP
Japan
Prior art keywords
pattern
photomask
integrated circuit
formation region
measurement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000013168A
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English (en)
Japanese (ja)
Other versions
JP2001201844A5 (enExample
Inventor
Katsuya Hayano
勝也 早野
Norio Hasegawa
昇雄 長谷川
Naoko Asai
尚子 浅井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
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Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP2000013168A priority Critical patent/JP2001201844A/ja
Publication of JP2001201844A publication Critical patent/JP2001201844A/ja
Publication of JP2001201844A5 publication Critical patent/JP2001201844A5/ja
Pending legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP2000013168A 2000-01-21 2000-01-21 半導体集積回路装置の製造方法およびフォトマスクの製造方法 Pending JP2001201844A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000013168A JP2001201844A (ja) 2000-01-21 2000-01-21 半導体集積回路装置の製造方法およびフォトマスクの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000013168A JP2001201844A (ja) 2000-01-21 2000-01-21 半導体集積回路装置の製造方法およびフォトマスクの製造方法

Publications (2)

Publication Number Publication Date
JP2001201844A true JP2001201844A (ja) 2001-07-27
JP2001201844A5 JP2001201844A5 (enExample) 2005-02-03

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ID=18540794

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JP2000013168A Pending JP2001201844A (ja) 2000-01-21 2000-01-21 半導体集積回路装置の製造方法およびフォトマスクの製造方法

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JP (1) JP2001201844A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012181426A (ja) * 2011-03-02 2012-09-20 Toshiba Corp フォトマスク及びその製造方法
JP2017083906A (ja) * 2017-02-03 2017-05-18 ルネサスエレクトロニクス株式会社 マスクおよびその製造方法、ならびに半導体装置
KR20190046680A (ko) * 2017-10-26 2019-05-07 칼 짜이스 에스엠티 게엠베하 마이크로리소그라픽 마스크, 그러한 마스크의 구조의 이미지의 에지 위치를 결정하기 위한 방법 및 그러한 방법을 실행하기 위한 시스템
KR20230120090A (ko) 2022-02-08 2023-08-16 가부시키가이샤 에스케이 일렉트로닉스 Fpd용의 포토마스크, fpd용의 포토마스크에 있어서의 위치 계측용 마크의 형성 방법 및 fpd용의 포토마스크의 제조 방법
US20230259039A1 (en) * 2022-02-16 2023-08-17 Nanya Technology Corporation Method of determining overlay error during semiconductor fabrication

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012181426A (ja) * 2011-03-02 2012-09-20 Toshiba Corp フォトマスク及びその製造方法
US8778570B2 (en) 2011-03-02 2014-07-15 Kabushiki Kaisha Toshiba Photomask and method for manufacturing the same
JP2017083906A (ja) * 2017-02-03 2017-05-18 ルネサスエレクトロニクス株式会社 マスクおよびその製造方法、ならびに半導体装置
KR20190046680A (ko) * 2017-10-26 2019-05-07 칼 짜이스 에스엠티 게엠베하 마이크로리소그라픽 마스크, 그러한 마스크의 구조의 이미지의 에지 위치를 결정하기 위한 방법 및 그러한 방법을 실행하기 위한 시스템
JP2019082684A (ja) * 2017-10-26 2019-05-30 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィマスク、そのようなマスクの構造の画像のエッジ位置を決定する方法、及びそのような方法を実施するためのシステム
JP7390104B2 (ja) 2017-10-26 2023-12-01 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィマスク、そのようなマスクの構造の像のエッジ位置を決定する方法、及びそのような方法を実施するためのシステム
KR102663061B1 (ko) * 2017-10-26 2024-05-07 칼 짜이스 에스엠티 게엠베하 마이크로리소그라픽 마스크, 그러한 마스크의 구조의 이미지의 에지 위치를 결정하기 위한 방법 및 그러한 방법을 실행하기 위한 시스템
KR20230120090A (ko) 2022-02-08 2023-08-16 가부시키가이샤 에스케이 일렉트로닉스 Fpd용의 포토마스크, fpd용의 포토마스크에 있어서의 위치 계측용 마크의 형성 방법 및 fpd용의 포토마스크의 제조 방법
JP2023115863A (ja) * 2022-02-08 2023-08-21 株式会社エスケーエレクトロニクス Ｆｐｄ用のフォトマスク、ｆｐｄ用のフォトマスクにおける位置計測用マークの形成方法及びｆｐｄ用のフォトマスクの製造方法
TWI866050B (zh) * 2022-02-08 2024-12-11 日商Ｓｋ電子股份有限公司 平板顯示器用光罩、平板顯示器用光罩的位置測量用標記的形成方法及平板顯示器用光罩的製造方法
US20230259039A1 (en) * 2022-02-16 2023-08-17 Nanya Technology Corporation Method of determining overlay error during semiconductor fabrication
US12117735B2 (en) * 2022-02-16 2024-10-15 Nanya Technology Corporation Method of determining overlay error during semiconductor fabrication

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