JP2001200361A - Observatory apparatus in hot vacuum vapor deposition apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an observatory apparatus having a camera to observe the condition of a target inside a vacuum container in a hot vacuum vapor deposition apparatus which is also applicable to the large vacuum container, capable of continuously operating for a long time by reducing the leakage of vapor. SOLUTION: In the observatory apparatus having the camera 2 to observer the condition of the target inside the vacuum container 1 in the hot vacuum vapor deposition apparatus, a crucible 6 provided with a water-cooling block 8 therearound is arranged on a bottom of the vacuum container 1, the target 7 placed in the crucible 1 is irradiated with a electron beam to generate the vapor. The observatory apparatus has a camera body 21 to eject the high-speed purge gas from a pin hole 23 at a tip portion, and the camera 2 is stored in the camera body 21 so that the pin hole 23 forms an optical path H. The camera body 21 is arranged in the vacuum container 1.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a high-temperature vacuum vapor deposition apparatus in which a water-cooled block is provided around the periphery and an electron beam is applied to a target placed in a crucible arranged at the bottom of a vacuum vessel to generate steam. The present invention relates to an observation device provided with a camera for observing a state of a target inside the vacuum vessel.

[0002]

2. Description of the Related Art FIGS. 6 and 7 schematically show a conventional observation apparatus for observing the inside of a vacuum vessel in a high-temperature vacuum vapor deposition apparatus. In FIG. 6, a crucible 113 in which a target 112 is placed is installed inside a sealed vacuum vessel 111. And this vacuum container 111
Is provided with an electron gun 115 for irradiating the target 112 in the crucible 113 with the electron beam A, and a vacuum exhaust system 116 for evacuating the inside of the vacuum vessel 111.

In the vacuum vessel 111, an observation unit 121 is provided at a position where the irradiation position of the electron beam A and the state of the target 112 can be checked from the outside. Conventionally,
The observation unit 121 is a crucible 113 in the vacuum vessel 111.
Is provided diagonally above. That is, the vacuum container 11
An opening 122 is formed at an oblique upper part of
Is connected to a cylindrical holding portion 123 for maintaining a pressure difference between the inside and outside of the vacuum vessel 111, and an observation window for vacuum isolation 124 is attached to an end of the holding portion 123 to form an observation portion 121.

A video camera 125 is provided so that the inside of the vacuum vessel 111 can be photographed from the observation window 124. On the other hand, a part of the steam B generated by heating and melting the target 112 in the crucible 113
22 and may be deposited on the observation window 124. In order to reduce the amount of vapor B deposited on the observation window 124 and the amount of radiant heat flowing into the observation window 124, the observation unit 12 is used.
1 has the following structure.

[0005] That is, the holding section 123 has a partition plate 12 with an opening, which is separated into the observation window 124 side and the vacuum vessel 111 side.
6 are attached. A gas inlet comprising a needle valve 127 for adjusting gas inflow, a trap 128 for capturing moisture in the gas, an inert gas supply source 129, and the like is introduced into the holding portion 123 on the observation window 124 side separated by the partition plate 126. A system 130 is connected, and a differential exhaust system 131 for evacuating the vacuum is connected to the holding unit 123 on the vacuum vessel 111 side separated by the partition plate 126. The inside of the holding section 123 on the 111 side can be evacuated.

A conical nozzle 132 is mounted on the partition plate 126 concentrically with the opening so as to be tapered toward the vacuum vessel 111, and the holding portion on the observation window 124 side separated by the partition plate 126. The inert gas introduced from the gas introduction system 130 into the 123 can be injected into the holding portion 123 on the vacuum vessel 111 side through the nozzle 132. The holding portion 123 on the vacuum vessel 111 side separated by the partition plate 126 is maintained in a high vacuum state by a differential evacuation system 131.

The inert gas diffused in the holding portion 123 on the observation window 124 side separated by the partition plate 126 is
Through the supersonic flow through the holding unit 1 on the vacuum vessel 111 side.
Injected into 23. That is, the nozzle 1 of the partition plate 126
The vicinity of the opening 32 is assumed to be in a state in which the introduced gas is ejected in a high-density state, so that deposition on the observation window 124 is avoided. Further, a protection gate valve 133 is provided between the vacuum vessel 111 and the holding unit 123, and the observation unit 12
1 (holding portion 123) can protect the inside of the vacuum vessel 111 when a vacuum break or the like occurs.

The inside of the vacuum vessel 111 is evacuated to a vacuum exhaust system 116.
The target 1 in the crucible 113 is brought into a vacuum state by
12 is irradiated with an electron beam A from an electron gun 115 and heated. At this time, from the target 112, depending on the type of target used and the vapor pressure corresponding to the surface temperature thereof,
Steam B is generated from the crucible 113. This vapor B adheres to the vapor deposition plate 114 above the crucible 113. At this time, the irradiation position of the electron beam A to the target 112 in the crucible 113 is confirmed, and the target 1 in the crucible 113 is checked.
Confirmation of the state of 12 and the like is performed from the outside of the vacuum vessel 111 through the observation window 124 and photographed by the video camera 125.

At this time, the differential pumping system 131 is operated together with the vacuum pumping system 116 to operate the vacuum vessel 111 and the holding unit 12.
3 is evacuated, the gas introduction system 130 is operated, and the inert gas introduced into the holding portion 123 on the observation window 124 side separated by the partition plate 126 is diffused. Opening of partition plate 126 and nozzle 132
Flows into the holding portion 123 on the vacuum vessel 111 side separated by the partition plate 126.

As described above, in the conventional observation device, the partition plate 126 for separating the holding portion 123 constituting the observation portion 121 provided diagonally above the vacuum vessel 111 into the observation window 124 side and the vacuum vessel 111 side, A gas introduction system 130 for introducing an inert gas into the holding portion 123 on the observation window 124 side separated by the plate 126, and the inert gas is supplied to the vacuum vessel 1.
The partition plate 126 is provided with a nozzle 132 for ejecting it to the eleventh side.

A differential pumping system 13 for evacuating the holding section 123 on the vacuum vessel 111 side separated by the partition plate 126.
1 and a holding unit 12 constituting the observation unit 121.
A protection gate valve 133 for protecting the inside of the vacuum vessel 111 is provided between the vacuum vessel 3 and the vacuum vessel 111. Further, when the inert gas is ejected at a supersonic speed toward the vacuum vessel 111 through the nozzle 132 of the partition plate 126, the vapor B in the vacuum vessel 111 is scattered with the inert gas, and the vapor B is separated from the partition plate 126. Opening and nozzle 13
It is supposed that the vapor B hardly flows into the observation window 124 after passing through the second window 2, so that the vapor adhesion to the observation window 124 can be avoided. Therefore, by reducing the maintenance of the observation window 124 as much as possible by preventing the vapor from adhering to the observation window 124, the operation time of the vacuum evaporation apparatus is not limited.

Conventionally, in addition to the above observation technique, as shown in FIG. 7, a crucible 1 in which a target 142 is placed at the bottom of a vapor enclosing device 144 provided in a vacuum vessel 141.
43, an observation camera 145 for observing the evaporation surface of the target 142 is installed outside (atmospheric pressure) of the vacuum vessel 141, and passes through the optical path H concentrically connecting the observation camera 145 and the evaporation surface of the target 142. Then, an opening is provided in the water cooling block 151 provided above the water cooling plate 149, the heat shielding plate 150, and the crucible 143, and the rotary shutter 146 provided at the passage position of the optical path H of the vacuum shielding unit 147 during imaging is turned. There is also a type in which the evaporation surface of the target 142 is observed.

However, in the prior arts such as the two examples described above, since the observation section is provided outside the vacuum vessel, the adhesion of vapor to the observation camera side can be reduced. Observation required that the vacuum vessel be relatively small, and the observation time was limited to tens of hours. On the other hand, it is necessary to increase the size of the vacuum vessel main body and to make it operate continuously for a long time.

[0014]

SUMMARY OF THE INVENTION The present invention is to solve the above-mentioned problem in the observation apparatus of the high-temperature vacuum evaporation apparatus, and a water-cooling block is provided around the observation apparatus in a crucible arranged at the bottom of the vacuum vessel. In an observation apparatus having a camera for observing a state of a target inside the vacuum vessel in a high-temperature vacuum deposition apparatus in which an electron beam is applied to a placed target to generate vapor, the present invention is also applicable to a large vacuum vessel. It is an object of the present invention to provide a fuel cell that is capable of reducing steam leakage and enabling continuous operation for a long time.

[0015]

According to the present invention, there is provided a crucible provided with a water-cooling block around the bottom of a vacuum vessel, and an electron beam is applied to a target placed in the crucible. In a high-temperature vacuum deposition apparatus configured to generate steam by using a camera that observes the state of a target inside the vacuum vessel, a pinhole is provided at the tip and a high-speed purge gas is injected from the pinhole. A gas purge pinhole camera housing a camera inside the gas purge pinhole camera body configured as described above so that the pinhole forms an optical path is arranged in the vacuum container, and the water cooling block is provided with an opening serving as an optical path of the camera. And an observation device for a high-temperature vacuum vapor deposition apparatus having a configuration in which an optical path duct covering the optical path is provided from the opening. To.

According to the observation apparatus of the present invention having the above configuration, since the gas purge pinhole camera is installed in the vacuum vessel, an opening serving as an optical path of the camera provided in the water-cooling block around the crucible is provided with water-cooling. Since it can be provided at the bottom of the block and its opening can be made smaller, it is possible to keep the leakage of steam into the vacuum vessel low. Further, according to the observation device of the present invention, the camera is housed in the gas purge pinhole camera main body, which is provided with a pinhole at the distal end portion and configured to eject a high-speed purge gas from the pinhole. Gas purging prevents vapor from entering the camera optical path from outside.

Further, in the apparatus according to the present invention, since the optical path duct is provided to cover the optical path of the camera from the opening of the water-cooling block, vapor intrusion into the pinhole of the camera body of the gas purge pinhole camera is further reduced. Also, since the purge gas is only emitted from the pinhole of the gas purge pinhole camera body, the amount of the purge gas used is reduced as compared with the prior art.

The present invention has been made in order to solve the above-mentioned problems.
In addition to the above-described configuration, quartz glass is arranged between the pinhole and the camera, and a viewing rotary shutter made of a rotating body is provided on the front surface of the quartz glass, and the viewing rotary shutter is provided outside the vacuum vessel. The present invention also provides an observation device in a high-temperature vacuum vapor deposition device having a configuration provided with an operation mechanism that operates from the position.

With the observation apparatus thus configured, in addition to the above-described functions and effects, quartz glass is arranged in front of the camera, and a viewing rotary shutter is provided on the front surface of the quartz glass to provide the view. The ing rotary shutter is rotated by an operation mechanism from outside the vacuum vessel, so that vapor is prevented from adhering to the quartz glass. Therefore, according to the present invention, there is provided an observation apparatus capable of performing continuous observation for a long time with a reduced number of camera maintenance operations.

[0020]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail with reference to the embodiments shown in FIGS.

(First Embodiment) First, the observation apparatus according to the first embodiment shown in FIGS. 1 and 2 will be described. In FIG. 1, reference numeral 1 denotes a sealed vacuum vessel, in which a crucible 6 in which a target 7 is placed is installed inside the vacuum vessel 1, and a water-cooling block 8 is installed around the upper part of the crucible 6. Above the crucible 6, a vapor enclosing device 14 is provided, and an electron gun (not shown) is attached to the target 7 in the crucible 6.
Then, an electron beam (not shown) is irradiated to heat and generate steam (not shown), and the steam is deposited on a deposition plate (not shown) provided in the steam enclosing device 14.

In FIG. 1, reference numeral 2 denotes a gas purge pinhole camera, which is installed in the vacuum vessel 1 for confirming the irradiation position of the electron beam to the target 7 in the crucible 6, the state of the target 7, and the like. The gas purge pinhole camera 2 operates the Ar gas filling amount adjustment mechanism 3 and the movement and filter rotation of the gas purge pinhole camera 2 outside (atmospheric pressure) of the vacuum vessel 1 in which the gas purge pinhole camera 2 is installed. The observation can be performed by a camera moving / filter turning operation mechanism 4 and an observation mechanism 5 that images while observing the liquid level of the target 7 placed in the crucible 6.

Also, a gas purge pinhole camera 2
The position of the gas purge pinhole camera 2 is set so that the optical path H connecting the observation surface of the target 7 placed in the crucible 6 passes through the lower part of the water cooling block 8.
In order to minimize the leakage of steam by reducing the opening of the water cooling block 8 and minimize the entry of steam into the range of the optical path H from the opening of the water cooling block 8, an appropriate optical path duct 1
1 is provided. Gas purge pinhole camera 2
A camera cooling mechanism 12 is provided for cooling the camera.

In FIG. 2 showing the details of the gas purge pinhole camera 2, the distal end of the gas purge pinhole camera body 21 constituting the gas purge pinhole camera 2 is concentric with the optical path H of the CCD camera 22 disposed inside. A pinhole 23 is provided on the upper side, and the position of the pinhole 23 is formed so as to coincide with the focal position through which the optical path H imaged by the CCD camera 22 when observing the evaporation surface of the target 7 in FIG. 1 passes. I have. Further, inside the front end 25 (vacuum system) of the gas purge pinhole camera main body 21, a rear end 26 of the gas purge pinhole camera main body 21 is provided.
(Atmospheric pressure) and a quartz glass 24 using packings 31, 32 and the like.

The Ar gas filling amount adjusting mechanism 3 installed outside the vacuum vessel 1 shown in FIG.
Ar gas can be injected to the front end 25 side (vacuum system) of the gas purge pinhole camera body 21 through the. Further, a flexible hose 27 is used at the rear end (in the atmosphere) of the gas purge pinhole camera body 21 separated by the quartz glass 24 to isolate the vacuum system from the atmospheric pressure. Ar gas ejected from the observation hole 34 toward the front end 25 side (vacuum system) of the gas purge pinhole camera body 21 configured as described above passes through the pinhole 23 toward the inside of the vacuum vessel 1 at a sonic flow. .

The pinhole 2 in the gas purge pinhole camera body 21 employed in the observation apparatus according to this embodiment
3 was evaluated as follows on the effect of suppressing the adhesion of vapor to the quartz glass 24 by injecting Ar gas.

(A) Evaluation Formula The mean free path of the Ar gas (purge gas) at the exit of the pinhole 23 is given by the following formula (1).

[0028]

(Equation 1)

The pressure between the binhole 23 and the quartz glass 24 when the flow of the Ar gas is choked (to be a sonic flow) at the pinhole 23 is given by the following equation (2).

[0030]

(Equation 2)

(B) Evaluation Conditions It is considered that the adhesion of the vapor to the quartz glass 24 can be suppressed under the condition that the gas to be purged from the pinhole 23 becomes a continuous flow. For that purpose, the representative length of the flow field is larger than the mean free path of Ar gas, that is, the mean free path λc of Ar gas given by the following equation (3) is:
Representative length of the flow field (here, the diameter of the pinhole (the d _p)) smaller than that of the condition.

[0032]

(Equation 3)

(C) Evaluation Results If the distance between the pinhole 23 and the quartz glass 24 (dense material) placed in front of the CCD camera 22 is sufficiently higher than about 0.15 Torr, the equations (1) and (2) indicate The condition 3) is satisfied, and the jet flow from the pinhole 23 can be regarded as a continuum. That is, it is considered that adhesion of steam to the quartz glass 24 can be suppressed.

The gas purge pinhole camera body 2
1, a target 7 and a vapor enclosing device 14 and the like, which are heated to a high temperature in the vacuum vessel 1 and a vapor enclosing plate 1 as shown in FIG.
0 and water cooling plate 9
In order to prepare for long-term observation in a considerably high temperature area,
A camera cooling mechanism 12 is provided outside, and a cooling liquid is injected from a cooling pipe 29, and a water jacket is formed in the outer shell of the gas purge pinhole camera body 21 for cooling.
It can be discharged from zero.

In the observation apparatus in the high-temperature vacuum vapor deposition apparatus according to the first embodiment described above, a gas purge pinhole camera is installed in the vacuum vessel 1, and the opening of the water-cooling block 8 through which the optical path H passes is located at the lower part. As a result, the opening can be made small, and an optical path duct 11 surrounding the camera optical path H is provided as appropriate from the opening of the water cooling block 8, thereby effectively preventing vapor from entering the optical path range.

Further, a gas purge pinhole mechanism 3 attached to the camera body 21 for monitoring the inside of the vacuum vessel 1 outside the vacuum vessel 1, a camera moving / filter turning operation mechanism 4, and an observation mechanism 5 and the like, a necessary operation can be performed from outside the vacuum vessel 1 to the gas purge pinhole camera body 21 installed inside the vacuum vessel 1 to perform desired observation.

In the gas purge pinhole camera 2 in the observation apparatus according to the present embodiment, a pinhole 23 is provided at the end of the camera body 21 concentrically with the optical axis of the camera.
Ar gas is emitted from the inside of the camera body 21 to the pinhole 23 at a sonic flow to prevent the vapor from flowing into the gas purge pinhole camera 2, so that the problem due to the vapor adhesion can be avoided. In addition, a high temperature inside the vacuum vessel 1 is prepared by configuring a camera cooling mechanism 12 for cooling the gas purge pinhole camera body 21.

(Second Embodiment) Next, an observation apparatus according to a second embodiment shown in FIGS. 3 to 5 will be described. In the second embodiment, it is intended to further reduce the adhesion of steam to the front surface (vacuum system side) of the quartz glass 24 in the gas purge pinhole camera body 21 described in the first embodiment.

The observation gas purge pinhole camera body 21 in the vacuum vessel according to the first embodiment has
By operating the gas filling amount adjusting mechanism 3, the front end of the gas purge pinhole camera body 21 (the front end 25- in FIG. 2).
Invasion of vapor into the vacuum system can be prevented as much as possible. However, if vapor flows into the front end 25, an observation hole (24 in FIG. 2) provided on the vacuum system side of quartz glass (24 in FIG. 2). 3
4) and adheres to the front surface (vacuum system side) of the quartz glass (24 in FIG. 2), and obstruction of camera observation in the vacuum vessel 1 is expected.

Therefore, in this embodiment, the quartz glass 24
As shown in FIG. 4, the observation is performed in the front end portion 25 (vacuum system) of the observation gas purge pinhole camera body 52 in order to more reliably prevent the vapor from adhering to the front surface (vacuum system side) of the camera. Rotary shutter provided, vacuum vessel 1
A viewing rotary shutter operation mechanism 54 for operating the viewing rotary shutter outside (atmospheric pressure) is provided.

Next, the structure will be described with reference to FIGS. 3 to 5, but in the following description, the description of the same mechanism and function as the device according to the first embodiment will be omitted, and the first embodiment will be described. When explaining the same mechanism as the device of
The same reference numerals as those used in the first embodiment are used. FIG. 3-
In FIG. 5, the gas purge pinhole camera 42 in the observation device of the second embodiment is installed at the same position in the vacuum vessel 1 as the gas purge pinhole camera 2 employed in the first embodiment, and Mechanism and Function (Ar) of the Gas Purge Pinhole Camera 2 of the First Embodiment
The same mechanisms and functions as the gas filling amount adjusting mechanism 3, camera moving / filter turning operation mechanism 4, observation mechanism 5, camera cooling mechanism 12, etc.) are provided.

A viewing rotary shutter 53 is provided at the front end 25 (vacuum system) of the gas purge pinhole camera body 52. The viewing rotary shutter 53 is provided at a position closest to an observation hole 57 provided on the vacuum system side of the quartz glass 24 in the gas purge pinhole camera main body 52, and operates a viewing rotary shutter provided outside the vacuum vessel 1. It is configured to be operated by the mechanism 54.

The viewing rotary shutter 53 is
As shown in FIG. 5, a drive motor 5 having a plurality of openings 55 and built in the gas purge pinhole camera body 52
The target 8 rotates at a high speed via a gear 56 so that the state of the target 7 placed in the crucible 6 can be seen through. Other structures and operations are substantially the same as those of the device of the first embodiment, and the description thereof is omitted.

The observation apparatus according to the second embodiment shown in FIGS. 3 to 5 is configured as described above, and has a front end 25 (atmospheric pressure) inside the gas purge pinhole camera main body 52 in the vacuum vessel 1. Ar gas is injected into the vacuum system (vacuum system), and the Ar gas passes through the pinhole 23 provided at the tip of the gas purge pinhole camera body 52 at a sonic flow, so that the gas purge pinhole camera body 52 from the vacuum vessel 1 is discharged. Prevents steam from flowing into the system.

The gas purge pinhole camera 4 having the viewing rotary shutter 53 according to the present embodiment.
According to 2, the viewing rotary shutter 53 further prevents vapor from entering the observation hole 57 on the front surface (vacuum system side) of the quartz glass 24, thereby preventing adhesion to the quartz glass 24 (vacuum system side). The effect can be expected. Also,
Since the viewing rotary shutter 53 is rotatable, the state of the target 7 placed in the crucible 6 can be seen through. With the above configuration, according to the present embodiment, the maintenance work of the observation camera is also reduced,
More effective observation can be performed continuously for a long time.

As described above, the present invention has been specifically described based on the illustrated embodiments. However, the present invention is not limited to these embodiments, and specific structures within the scope of the present invention shown in the claims are set forth. Needless to say, various changes may be made to the configuration.

For example, in the above embodiment, the pinhole 2
Ar gas is used as the gas to be injected from 3,
Other inert gases may be used.

[0048]

As described above, according to the present invention, a crucible provided with a water-cooling block around the crucible is disposed at the bottom of the vacuum vessel, and the target placed in the crucible is irradiated with an electron beam to generate steam. In a high-temperature vacuum vapor deposition apparatus having the above-mentioned configuration, an observation device equipped with a camera for observing a state of a target inside the vacuum vessel is provided with a pinhole at a tip end thereof and a high-speed purge gas injected from the pinhole. A gas purge pinhole camera containing a camera inside the pinhole camera main body so that the pinhole serves as an optical path is arranged in the vacuum container, and an opening serving as an optical path of the camera is provided in the water-cooling block, and from the opening. Provided is an observation device in a high-temperature vacuum vapor deposition device having a configuration in which an optical path duct that covers the optical path is provided.

In the observation device of the present invention, since the gas purge pinhole camera is installed in the vacuum vessel, the opening serving as the optical path of the camera provided in the water cooling block around the crucible may be provided at the bottom of the water cooling block. In addition to this, the opening can be reduced, so that the leakage of steam into the vacuum vessel can be suppressed. In the observation device of the present invention, a pinhole is provided at the tip, and a camera is housed in a gas purge pinhole camera body configured to eject a high-speed purge gas from the pinhole. ,
Vapors are prevented from entering the camera optical path.

Further, in the apparatus according to the present invention, since the optical path duct which covers the optical path of the camera from the opening of the water cooling block is provided, vapor intrusion into the pinhole of the gas purge pinhole camera body is further reduced.

In addition to the above-described structure, quartz glass is disposed between the pinhole and the camera, and a viewing rotary shutter made of a rotating body is provided on the front surface of the quartz glass. In the configuration in which the operation mechanism operated from the outside of the vacuum vessel is provided, in addition to the above-described functions and effects, quartz glass is disposed in front of the camera, and a viewing rotary shutter is provided on the front surface of the quartz glass. Since the viewing rotary shutter is rotated by an operation mechanism from the outside of the vacuum vessel, adhesion of vapor to the quartz glass is prevented, and continuous observation for a long time can be performed.

[Brief description of the drawings]

FIG. 1 is a longitudinal sectional view showing a state in which an observation device in a high-temperature vacuum evaporation apparatus according to a first embodiment of the present invention is installed in a vacuum vessel.

FIG. 2 is a longitudinal sectional view of a gas purge pinhole camera used in the observation device of FIG.

FIG. 3 is a longitudinal sectional view showing a state in which an observation device in a high-temperature vacuum deposition apparatus according to a second embodiment of the present invention is installed in a vacuum vessel.

FIG. 4 is a longitudinal sectional view of a gas purge pinhole camera used in the observation device of FIG. 2;

FIG. 5 is a sectional view taken along line AA of the front end of the gas purge pinhole camera of FIG. 4;

FIG. 6 is a cross-sectional view showing a state in which a conventional observation device is installed outside a vacuum vessel.

FIG. 7 is a cross-sectional view showing a state in which another conventional observation device is installed outside a vacuum vessel.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Vacuum container 2 Gas purge pinhole camera 3 Ar gas filling amount adjustment mechanism 4 Camera moving / filter turning operation mechanism 5 Observation mechanism 6 Crucible 7 Target 8 Water cooling block 9 Water cooling plate 10 Steam filling plate 11 Optical path duct 12 Camera cooling mechanism 14 Steam filling Instrument 21 Gas purge pinhole camera body 22 CCD camera 23 Pinhole 24 Quartz glass 25 Front end 26 Rear end 27 Flexible hose 28 Ar gas pipe 29 Cooling pipe 30 Cooling pipe 31 Packing 32 Packing 34 Observation hole 42 Gas purge pinhole camera 52 Gas purge pinhole camera body 53 Viewing rotary shutter 54 Viewing rotary shutter operating mechanism 55 Opening 56 Gear 57 Observation hole 58 Drive motor

Claims (2)

[Claims] 1. A vacuum crucible in a high-temperature vacuum vapor deposition apparatus in which a crucible having a water-cooling block around the crucible is arranged at the bottom of a vacuum vessel, and an electron beam is applied to a target placed in the crucible to generate steam. In an observation device equipped with a camera for observing the state of a target inside the container, a pinhole is provided at the tip and a gas purge pinhole configured to eject a high-speed purge gas from the pinhole has the pinhole in the camera body. A gas purge pinhole camera accommodating a camera so as to form an optical path is disposed in the vacuum container, and an opening serving as an optical path of the camera is provided in the water cooling block, and an optical path duct that covers the optical path from the opening is provided. An observation device in a high-temperature vacuum vapor deposition device, characterized in that: 2. A quartz glass is disposed between the pinhole and the camera, a viewing rotary shutter comprising a rotating body is provided on a front surface of the quartz glass, and the viewing rotary shutter is moved from outside the vacuum vessel. 2. An observation device in a high-temperature vacuum vapor deposition device according to claim 1, further comprising an operation mechanism for operating.