JP2001199955A5 - - Google Patents
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- JP2001199955A5 JP2001199955A5 JP2000336666A JP2000336666A JP2001199955A5 JP 2001199955 A5 JP2001199955 A5 JP 2001199955A5 JP 2000336666 A JP2000336666 A JP 2000336666A JP 2000336666 A JP2000336666 A JP 2000336666A JP 2001199955 A5 JP2001199955 A5 JP 2001199955A5
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000336666A JP4029558B2 (ja) | 1999-11-09 | 2000-11-02 | Ｎ−スルホニルオキシイミド化合物およびそれを用いた感放射線性樹脂組成物 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31765299 | 1999-11-09 | ||
| JP11-317652 | 1999-11-09 | ||
| JP2000336666A JP4029558B2 (ja) | 1999-11-09 | 2000-11-02 | Ｎ−スルホニルオキシイミド化合物およびそれを用いた感放射線性樹脂組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001199955A JP2001199955A (ja) | 2001-07-24 |
| JP2001199955A5 true JP2001199955A5 (enExample) | 2004-08-19 |
| JP4029558B2 JP4029558B2 (ja) | 2008-01-09 |
Family
ID=26569092
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000336666A Expired - Fee Related JP4029558B2 (ja) | 1999-11-09 | 2000-11-02 | Ｎ−スルホニルオキシイミド化合物およびそれを用いた感放射線性樹脂組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4029558B2 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6482567B1 (en) * | 2000-08-25 | 2002-11-19 | Shipley Company, L.L.C. | Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same |
| WO2003045915A1 (en) | 2001-11-30 | 2003-06-05 | Wako Pure Chemical Industries, Ltd. | Bisimide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition |
| JP4123920B2 (ja) * | 2001-12-20 | 2008-07-23 | Ｊｓｒ株式会社 | 共重合体、重合体混合物および感放射線性樹脂組成物 |
| KR100698444B1 (ko) | 2002-03-22 | 2007-03-23 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 화학 증폭 레지스트 재료용 광산 발생제, 및 이것을사용한 레지스트 재료 및 패턴 형성 방법 |
| WO2004078703A1 (ja) * | 2003-03-05 | 2004-09-16 | Jsr Corporation | 酸発生剤、スルホン酸、スルホニルハライド化合物および感放射線性樹脂組成物 |
| JP2004307387A (ja) * | 2003-04-07 | 2004-11-04 | Tosoh F-Tech Inc | ２−（ビシクロ［２．２．１］ヘプト−２−イル）−１，１−ジフルオロエチルスルフィン酸塩または２−（ビシクロ［２．２．１］ヘプト−２−イル）−１，１−ジフルオロエチルスルホン酸塩およびそれらの製造方法 |
| KR100574495B1 (ko) | 2004-12-15 | 2006-04-27 | 주식회사 하이닉스반도체 | 광산발생제 중합체, 그 제조방법 및 이를 함유하는상부반사방지막 조성물 |
| KR101442860B1 (ko) * | 2006-09-08 | 2014-09-22 | 제이에스알 가부시끼가이샤 | 감방사선성 조성물 및 이것에 사용되는 저분자량 화합물의 제조 방법 |
| WO2009057769A1 (ja) | 2007-11-01 | 2009-05-07 | Central Glass Company, Limited | 新規スルホン酸塩及びその誘導体、光酸発生剤並びにこれを用いたレジスト材料及びパターン形成方法 |
| JP4577354B2 (ja) * | 2007-12-18 | 2010-11-10 | Ｊｓｒ株式会社 | ポジ型感放射線性樹脂組成物およびネガ型感放射線性樹脂組成物 |
| US10365560B2 (en) * | 2015-03-31 | 2019-07-30 | Sumitomo Chemical Company, Limited | Resist composition and method for producing resist pattern |
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2000
- 2000-11-02 JP JP2000336666A patent/JP4029558B2/ja not_active Expired - Fee Related