JP2001199955A5 - - Google Patents
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- JP2001199955A5 JP2001199955A5 JP2000336666A JP2000336666A JP2001199955A5 JP 2001199955 A5 JP2001199955 A5 JP 2001199955A5 JP 2000336666 A JP2000336666 A JP 2000336666A JP 2000336666 A JP2000336666 A JP 2000336666A JP 2001199955 A5 JP2001199955 A5 JP 2001199955A5
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Description
【０１５３】
【化４８】
[0153] 
[Image 48]
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000336666A JP4029558B2 (en) | 1999-11-09 | 2000-11-02 | N-sulfonyloxyimide compound and radiation-sensitive resin composition using the same |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31765299 | 1999-11-09 | ||
| JP11-317652 | 1999-11-09 | ||
| JP2000336666A JP4029558B2 (en) | 1999-11-09 | 2000-11-02 | N-sulfonyloxyimide compound and radiation-sensitive resin composition using the same |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001199955A JP2001199955A (en) | 2001-07-24 |
| JP2001199955A5 true JP2001199955A5 (en) | 2004-08-19 |
| JP4029558B2 JP4029558B2 (en) | 2008-01-09 |
Family
ID=26569092
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000336666A Expired - Fee Related JP4029558B2 (en) | 1999-11-09 | 2000-11-02 | N-sulfonyloxyimide compound and radiation-sensitive resin composition using the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4029558B2 (en) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6482567B1 (en) * | 2000-08-25 | 2002-11-19 | Shipley Company, L.L.C. | Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same |
| US7374857B2 (en) | 2001-11-30 | 2008-05-20 | Wako Pure Chemical Industries Ltd. | Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition |
| JP4123920B2 (en) * | 2001-12-20 | 2008-07-23 | Ｊｓｒ株式会社 | Copolymer, polymer mixture and radiation-sensitive resin composition |
| US6916591B2 (en) | 2002-03-22 | 2005-07-12 | Shin-Etsu Chemical Co., Ltd. | Photoacid generators, chemically amplified resist compositions, and patterning process |
| WO2004078703A1 (en) * | 2003-03-05 | 2004-09-16 | Jsr Corporation | Acid generators, sulfonic acids, sulfonyl halides, and radiation-sensitive resin compositions |
| JP2004307387A (en) * | 2003-04-07 | 2004-11-04 | Tosoh F-Tech Inc | 2-(bicyclo[2.2.1]hept-2-yl)-1,1-difluoroethylsulfinate or 2-(bicyclo[2.2.1]hept-2-yl)-1,1-difluoroethylsulfonate and method for producing them |
| KR100574495B1 (en) | 2004-12-15 | 2006-04-27 | 주식회사 하이닉스반도체 | Photoacid generator polymer, its preparation method and top anti-reflective coating composition comprising the same |
| US8361691B2 (en) * | 2006-09-08 | 2013-01-29 | Jsr Corporation | Radiation-sensitive composition and process for producing low-molecular compound for use therein |
| WO2009057769A1 (en) | 2007-11-01 | 2009-05-07 | Central Glass Company, Limited | Novel sulfonic acid salt and derivative thereof, photoacid generator agent, and resist material and pattern formation method using the photoacid generator agent |
| JP4577354B2 (en) * | 2007-12-18 | 2010-11-10 | Ｊｓｒ株式会社 | Positive radiation-sensitive resin composition and negative radiation-sensitive resin composition |
| JP6843515B2 (en) * | 2015-03-31 | 2021-03-17 | 住友化学株式会社 | Method for manufacturing resist composition and resist pattern |
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2000
- 2000-11-02 JP JP2000336666A patent/JP4029558B2/en not_active Expired - Fee Related