JP2001198814A - Device and method for grinding plate-shaped object - Google Patents

Device and method for grinding plate-shaped object

Info

Publication number
JP2001198814A
JP2001198814A JP2000009149A JP2000009149A JP2001198814A JP 2001198814 A JP2001198814 A JP 2001198814A JP 2000009149 A JP2000009149 A JP 2000009149A JP 2000009149 A JP2000009149 A JP 2000009149A JP 2001198814 A JP2001198814 A JP 2001198814A
Authority
JP
Japan
Prior art keywords
plate
grinding
shaped object
support
support member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000009149A
Other languages
Japanese (ja)
Other versions
JP4549471B2 (en
Inventor
Shinichi Aoki
新一 青木
Koji Hanaoka
幸治 花岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Disco Corp
Original Assignee
Disco Abrasive Systems Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Disco Abrasive Systems Ltd filed Critical Disco Abrasive Systems Ltd
Priority to JP2000009149A priority Critical patent/JP4549471B2/en
Publication of JP2001198814A publication Critical patent/JP2001198814A/en
Application granted granted Critical
Publication of JP4549471B2 publication Critical patent/JP4549471B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
  • Grinding Of Cylindrical And Plane Surfaces (AREA)

Abstract

PROBLEM TO BE SOLVED: To reliably remove a distortion originally existing and a distortion produced during a grinding work, when grinding a plate-shaped object. SOLUTION: In this device for grinding a plate-shaped object, a supporting means 20 comprising a rotatable supporting table 21 to support the supporting surface of the plate-shaped object and a side supporting member 22 to support the side of the plate-shaped object are mounted, and the plate-shaped object can be supported by the side supporting member 22 without tightly fixing the plate-shaped object. In addition, in this method for grinding the plate-shaped object, the plate-shaped object is supported by the side supporting member 22 by using the plate-shaped object grinding device without tightly fixing the plate-shaped object, a grinding stone rotating while rotating the supporting table 21 is brought into contact with the surface of the plate-shaped object to be ground, and the plate-shaped object is ground so as to have a designated thickness.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、平面精度が要求さ
れる板状物を研削する板状物研削装置及び板状物研削方
法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plate grinding apparatus and a plate grinding method for grinding a plate having a high flatness.

【0002】[0002]

【従来の技術】超硬合金基板、ガラス、半導体ウェーハ
等の板状物を研削して所定の厚さとする際には、例え
ば、図5に示すような板状物研削装置70が用いられ
る。この板状物研削装置70は、垂直方向に配設された
一対のガイドレール53を支持板54が摺動し、それに
伴い支持板54に連結された研削手段55が上下動する
構成となっており、研削手段55においては、上下方向
に配設されたスピンドル57の下端に設けたマウンタ5
8に研削ホイール59が装着され、スピンドル57の回
転にともなって研削ホイール59が回転する構成となっ
ている。
2. Description of the Related Art When a plate-like material such as a cemented carbide substrate, glass, or a semiconductor wafer is ground to a predetermined thickness, for example, a plate-like material grinding apparatus 70 as shown in FIG. 5 is used. The plate-shaped object grinding device 70 is configured such that the support plate 54 slides on a pair of guide rails 53 arranged in the vertical direction, and the grinding means 55 connected to the support plate 54 moves up and down accordingly. In the grinding means 55, a mounter 5 provided at a lower end of a spindle 57 disposed in a vertical direction is provided.
8, a grinding wheel 59 is mounted, and with the rotation of the spindle 57, the grinding wheel 59 rotates.

【0003】一方、被研削物71は、支持手段72に固
定される。図示の例においては、支持手段72にはバキ
ュームテーブル73を備えており、被研削物71は、バ
キュームテーブル73に吸着されることによって支持さ
れる。また、バキュームテーブル73による吸着に代え
て、マグネットやワックスダウンによる固定によって支
持することもできる。
On the other hand, an object to be ground 71 is fixed to a support means 72. In the illustrated example, the support means 72 includes a vacuum table 73, and the workpiece 71 is supported by being attracted to the vacuum table 73. Further, instead of the suction by the vacuum table 73, it is also possible to support by fixing with a magnet or wax down.

【0004】このようにして被研削物71が支持手段7
2に支持されると、研削手段55が下降し、研削ホイー
ル59の下部に固定された研削砥石59aが回転しなが
ら被研削物71の研削面71aに接触することによっ
て、研削面71aが研削されて所定の厚さとなる。
[0004] In this way, the object to be ground 71 is supported by the supporting means 7.
2, the grinding means 55 descends, and the grinding wheel 59 a fixed to the lower portion of the grinding wheel 59 contacts the grinding surface 71 a of the workpiece 71 while rotating, whereby the grinding surface 71 a is ground. To a predetermined thickness.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、バキュ
ーム等で被研削物71を支持すると、被研削物71が支
持手段72に密着して固定されるため、被研削物71に
元来あった歪みが一時的に矯正されて保持され、保持さ
れた状態では歪みが研削面71aに現れない。従って、
そのような状態で表面を研削しても、元来生じていた歪
みを除去することができず、研削終了後に保持状態を解
除すると、リバウンドによって再び歪みが現れてしまう
という問題がある。
However, when the object to be ground 71 is supported by a vacuum or the like, the object to be ground 71 is fixed in close contact with the support means 72. It is temporarily corrected and held, and in the held state, no distortion appears on the ground surface 71a. Therefore,
Even if the surface is ground in such a state, the originally generated distortion cannot be removed, and when the holding state is released after the grinding is completed, there is a problem that the distortion appears again due to rebound.

【0006】また、研削によって歪みが生じた場合も、
支持手段72に支持された状態ではその歪みが自身の内
部に蓄えられてしまうため、研削面71aには現れな
い。従って、そのような状態で表面を研削しても、研削
終了後に保持状態を解除すると、リバウンドによって歪
みが現れてしまうという問題もある。
[0006] Also, when distortion occurs due to grinding,
In the state of being supported by the support means 72, the distortion is stored inside itself, and does not appear on the ground surface 71a. Therefore, even if the surface is ground in such a state, if the holding state is released after the completion of the grinding, there is a problem that distortion appears due to rebound.

【0007】このように、平面精度が要求される板状物
の研削においては、歪みを確実に除去できるようにする
ことに課題を有している。
As described above, in the grinding of a plate-like object requiring planar accuracy, there is a problem in that the distortion can be reliably removed.

【0008】[0008]

【課題を解決するための手段】上記課題を解決するため
の具体的手段として本発明は、板状物を支持する支持手
段と、支持手段に支持された板状物の研削面を研削する
研削ホイールを備えた研削手段とから少なくとも構成さ
れる研削装置であって、支持手段は、板状物の支持面を
支持する回転可能な支持テーブルと、板状物の側部を支
持する側部支持部材とを含み、側部支持部材は、支持テ
ーブルに固定され、板状物を密着固定せずに支持する板
状物研削装置を提供する。
SUMMARY OF THE INVENTION As specific means for solving the above-mentioned problems, the present invention provides a support means for supporting a plate-like object, and a grinding method for grinding a ground surface of the plate-like object supported by the support means. A grinding apparatus comprising at least a grinding unit having a wheel, wherein the supporting unit includes a rotatable support table for supporting a supporting surface of the plate-shaped object, and a side support for supporting a side portion of the plate-shaped object. And a side support member fixed to the support table and supporting the plate-shaped object without tightly fixing the plate-shaped object.

【0009】そしてこの板状物研削装置は、側部支持部
材が板状物を外周側から支持すること、板状物の中心部
に開口部を有する場合は、側部支持部材は板状物の開口
部に係合して板状物を内周側から支持すること、板状物
の側部と側部支持部材との間に形成されるクリアランス
は0.1mm〜1.0mmであること、側部支持部材の
厚みは板状物の仕上がり厚さより薄いこと、側部支持部
材と支持テーブルとは、ワックスダウン、ネジ止め、一
体形成のいずれかによって固定されることを付加的な要
件とする。
The plate-like object grinding apparatus is characterized in that the side support member supports the plate-like object from the outer peripheral side, and when the plate-like object has an opening in the center, the side support member is a plate-like object. That the plate-like object is supported from the inner peripheral side by engaging with the opening of the plate-like object, and the clearance formed between the side part of the plate-like object and the side part supporting member is 0.1 mm to 1.0 mm. The additional requirement is that the thickness of the side support member is thinner than the finished thickness of the plate-like material, and that the side support member and the support table are fixed by wax-down, screwing, or integral formation. I do.

【0010】また本発明は、上記の板状物研削装置を用
いた板状物の研削方法であって、支持テーブルにおいて
側部支持部材によって板状物を密着固定せずに支持し、
研削ホイールを構成する研削砥石を板状物に接触させ、
支持テーブルと研削ホイールとを回転させて板状物を所
定の厚さに研削する板状物研削方法を提供する。
[0010] The present invention is also a method for grinding a plate-like object using the above-mentioned plate-like object grinding apparatus, wherein the plate-like object is supported by a side support member on a support table without being closely fixed.
The grinding wheel that constitutes the grinding wheel is brought into contact with the plate-like object,
Provided is a plate-like object grinding method for grinding a plate-like object to a predetermined thickness by rotating a support table and a grinding wheel.

【0011】そしてこの板状物研削方法は、板状物が超
硬合金であることを付加的な要件とする。
The plate-like object grinding method has an additional requirement that the plate-like object is a cemented carbide.

【0012】このように構成される板状物研削装置及び
板状物研削方法によれば、支持手段において板状物を密
着固定せずに支持した状態で研削が行われ、板状物に予
め歪みがある場合でもその歪みが研削面に現れた状態で
研削することができるため、歪みが確実に除去されて平
らな面に仕上げることができる。また、研削により板状
物に一時的に歪みが生じたとしても、その歪みも研削面
に現れるため、その後の研削により除去することができ
る。
According to the plate-shaped object grinding apparatus and the plate-shaped object grinding method configured as described above, the grinding is performed in a state where the plate-shaped object is supported by the supporting means without being tightly fixed, and the plate-shaped object is preliminarily fixed. Even if there is a distortion, the grinding can be performed in a state where the distortion appears on the ground surface, so that the distortion can be surely removed and a flat surface can be finished. Further, even if the plate-like object is temporarily distorted by the grinding, the distortion also appears on the ground surface, and can be removed by the subsequent grinding.

【0013】[0013]

【発明の実施の形態】本発明の実施の形態として、図1
に示す超硬合金基板10の研削面11を研削する場合に
ついて説明する。この超硬合金基板10は、外周に刃が
刻まれて各種の硬質部材の切削に使用される丸鋸を製造
するにあたってベースとなる外周の加工前の基板であ
り、円形に形成されている。この超硬合金基板10は、
最終的には平滑に形成しなければならないが、研削前に
は歪みが生じている場合がある。
DESCRIPTION OF THE PREFERRED EMBODIMENTS As an embodiment of the present invention, FIG.
The case of grinding the ground surface 11 of the cemented carbide substrate 10 shown in FIG. The cemented carbide substrate 10 is a substrate before processing the outer periphery serving as a base in manufacturing a circular saw used for cutting various hard members by cutting a blade on the outer periphery, and is formed in a circular shape. This cemented carbide substrate 10
Ultimately, it must be formed smooth, but distortion may occur before grinding.

【0014】超硬合金基板10は、例えば図1に示すよ
うな支持手段20に支持された状態で研削される。この
支持手段20は、超硬合金基板10の裏面である支持面
を支持して回転可能な支持テーブル21と、支持テーブ
ル21に固定されたリング状の側部支持部材22とから
構成される。側部支持部材22はリング状に形成されて
おり、ワックスダウンやネジ止めによって支持テーブル
21に固定される。なお、支持テーブル21と側部支持
部材22とは一体に形成されていてもよい。
The cemented carbide substrate 10 is ground while being supported by, for example, support means 20 as shown in FIG. The support means 20 includes a support table 21 that can support and rotate a support surface, which is the back surface of the cemented carbide substrate 10, and a ring-shaped side support member 22 fixed to the support table 21. The side support member 22 is formed in a ring shape, and is fixed to the support table 21 by wax-down or screwing. Note that the support table 21 and the side support members 22 may be formed integrally.

【0015】側部支持部材22の内径は、超硬合金基板
11の外径に対応しており、超硬合金基板11を開口部
23に収容した際には、側部支持部材22によって超硬
合金基板10が外周側から支持される。即ち、この場合
は超硬合金基板10の外周が側部である。こうして支持
することで、吸着、マグネット、ワックスダウンのよう
な従来の支持手段は不要となる。
The inner diameter of the side support member 22 corresponds to the outer diameter of the cemented carbide substrate 11, and when the cemented carbide substrate 11 is accommodated in the opening 23, the side support member 22 The alloy substrate 10 is supported from the outer peripheral side. That is, in this case, the outer periphery of the cemented carbide substrate 10 is the side portion. This support eliminates the need for conventional support means such as suction, magnets, and wax down.

【0016】ここで、超硬合金基板11を側部支持部材
22の開口部23に収容した際は、超硬合金基板11の
外周部と側部支持部材22の内周部との間にはクリアラ
ンスが形成されるようにする。このクリアランスは、
0.1〜1.0mm程度とすることが望ましい。このよ
うにして、支持手段20によって密着固定されずに超硬
合金基板10が支持される。また、超硬合金基板10に
生じている歪みを完全に除去するために、側部支持部材
22の厚みは、研削後の超硬合金基板10の仕上がり厚
さより僅かに薄い程度が望ましい。
Here, when the cemented carbide substrate 11 is accommodated in the opening 23 of the side support member 22, there is a gap between the outer periphery of the cemented carbide substrate 11 and the inner periphery of the side support member 22. The clearance is formed. This clearance is
It is desirable to set it to about 0.1 to 1.0 mm. In this manner, the cemented carbide substrate 10 is supported by the support means 20 without being closely fixed. Further, in order to completely remove the distortion generated in the cemented carbide substrate 10, the thickness of the side support member 22 is desirably slightly smaller than the finished thickness of the cemented carbide substrate 10 after grinding.

【0017】なお、図2に示す如きリング状に形成され
た超硬合金基板30の研削面31を研削する場合は、支
持テーブル21及び支持テーブル21に固定された側部
支持部材41とからなる支持手段40を用いる。この場
合は、超硬合金基板30の中心部に形成された開口部3
2に側部支持部材41を係合させ、超硬合金基板30を
内周側から支持する。即ち、この場合は超硬合金基板3
0の内周が側部となる。
When the ground surface 31 of the cemented carbide substrate 30 formed in a ring shape as shown in FIG. 2 is ground, the surface comprises a support table 21 and side support members 41 fixed to the support table 21. The support means 40 is used. In this case, the opening 3 formed in the center of the cemented carbide substrate 30
2 engages the side support member 41 to support the cemented carbide substrate 30 from the inner peripheral side. That is, in this case, the cemented carbide substrate 3
The inner circumference of 0 is the side.

【0018】この場合も、超硬合金基板30の内周部と
側部支持部材41の外周部との間にはクリアランスが形
成される。このクリアランスは、0.1〜1.0mm程
度とすることが望ましい。このようにして、支持手段4
0によって密着固定されずに超硬合金基板30が支持さ
れる。またこの場合も、超硬合金基板30に生じている
歪みを完全に除去するために、側部支持部材41の厚み
は、研削後の超硬合金基板30の仕上がり厚さより僅か
に薄い程度が望ましい。なお、リング状の超硬合金基板
30は、図1の場合と同様に外周側から支持することも
可能である。
Also in this case, a clearance is formed between the inner peripheral portion of the cemented carbide substrate 30 and the outer peripheral portion of the side support member 41. This clearance is desirably about 0.1 to 1.0 mm. In this way, the support means 4
0 supports the cemented carbide substrate 30 without being closely fixed. Also in this case, in order to completely remove the distortion generated in the cemented carbide substrate 30, the thickness of the side support member 41 is desirably slightly smaller than the finished thickness of the cemented carbide substrate 30 after grinding. . In addition, the ring-shaped cemented carbide substrate 30 can be supported from the outer peripheral side as in the case of FIG.

【0019】図1に示した支持手段20、図2に示した
支持手段40は、例えば図3に示すような板状物研削装
置50に搭載される。ここでは、板状物研削装置50に
図1に示した支持手段20が搭載され、超硬合金基板1
0を研削する場合を例に挙げて説明する。また、図5に
示した従来の板状物研削装置70と同様に構成される部
位については同一の符号を付して説明する。
The support means 20 shown in FIG. 1 and the support means 40 shown in FIG. 2 are mounted on, for example, a plate-like object grinding apparatus 50 as shown in FIG. Here, the support means 20 shown in FIG.
The case of grinding 0 will be described as an example. Parts that are configured similarly to the conventional plate-shaped object grinding apparatus 70 shown in FIG. 5 will be described with the same reference numerals.

【0020】図3に示す板状物研削装置50において
は、基台51の端部から起立して設けられた壁部52の
内側の面に一対のレール53が垂直方向に配設され、レ
ール53に沿って支持板54が上下動するのにともなっ
て支持板54に取り付けられた研削手段55が上下動す
るよう構成されている。また、基台51上には、ターン
テーブル56が回転可能に配設され、ターンテーブル5
6上には、板状物を支持する支持テーブル21が回転可
能に配設されている。
In the plate grinding apparatus 50 shown in FIG. 3, a pair of rails 53 are vertically arranged on the inner surface of a wall 52 provided upright from the end of a base 51, The grinding means 55 attached to the support plate 54 moves up and down as the support plate 54 moves up and down along 53. On the base 51, a turntable 56 is rotatably disposed.
A support table 21 for supporting a plate-like object is rotatably disposed on the table 6.

【0021】研削手段55においては、垂直方向の軸心
を有するスピンドル57の先端に形成されたマウンタ5
8に研削ホイール59が装着されており、研削ホイール
59は、スピンドル57の回転に伴って回転する構成と
なっている。また、研削ホイール59の下部には、ダイ
ヤモンド等の砥粒からなる研削砥石59aが固着されて
いる。
In the grinding means 55, a mounter 5 formed at the tip of a spindle 57 having a vertical axis is provided.
A grinding wheel 59 is mounted on 8, and the grinding wheel 59 rotates with the rotation of the spindle 57. A grinding wheel 59a made of abrasive grains such as diamond is fixed to a lower portion of the grinding wheel 59.

【0022】図4に示すように、研削手段55は支持板
54に支持され、支持板54から壁部52を貫通したナ
ット54aが壁部52の後部側において垂直方向に配設
したボールスクリュー60に螺合している。このボール
スクリュー60はパルスモータ61に連結され、パルス
モータ61はパルスモータドライバ62を介して制御部
63に接続されている。そして、制御部63による制御
の下でパルスモータ61が駆動され、それに伴いボール
スクリュー60が回動することによりナット54ag上
下動して研削手段55が上下動する構成となっている。
また、研削手段55の上下方向の位置情報がリニアスケ
ール64によって計測され、その情報が制御部63に伝
達され、研削手段55の上下動の精密制御に供される。
As shown in FIG. 4, the grinding means 55 is supported by a support plate 54, and a nut 54a penetrating the wall 52 from the support plate 54 has a ball screw 60 vertically disposed at the rear side of the wall 52. Is screwed into. The ball screw 60 is connected to a pulse motor 61, and the pulse motor 61 is connected to a control unit 63 via a pulse motor driver 62. Then, the pulse motor 61 is driven under the control of the control unit 63, and the ball screw 60 is rotated accordingly, whereby the nut 54ag moves up and down, and the grinding means 55 moves up and down.
Further, the vertical position information of the grinding unit 55 is measured by the linear scale 64, and the information is transmitted to the control unit 63, and is used for precise control of the vertical movement of the grinding unit 55.

【0023】また、制御部63は、サーボドライバ65
を介して支持テーブル21に連結されたサーボモータ6
6及びエンコーダ67に接続され、制御部63による制
御の下で支持テーブル21の回転が制御される構成とな
っている。
The control unit 63 includes a servo driver 65
Servo motor 6 connected to the support table 21 through the
6 and the encoder 67, and the rotation of the support table 21 is controlled under the control of the control unit 63.

【0024】板状物研削装置50を用いて超硬合金基板
10の研削を行う際は、図3に示したように、超硬合金
基板10の形状、サイズに対応した側部支持部材22を
支持テーブル21に固定して支持手段20を構成する。
そして、開口部23に研削しようとする図1に示した超
硬合金基板10を収容し、支持手段20によって超硬合
金基板10を密着固定せずに支持する。なお、図2に示
したリング状の超硬合金基板30を研削する場合は、そ
の形状、サイズに対応した側部支持部材41を支持テー
ブル21に固定する。
When grinding the cemented carbide substrate 10 using the plate-shaped object grinding device 50, as shown in FIG. 3, the side support member 22 corresponding to the shape and size of the cemented carbide substrate 10 is used. The support means 20 is fixed to the support table 21.
Then, the cemented carbide substrate 10 shown in FIG. 1 to be ground is accommodated in the opening 23, and the cemented carbide substrate 10 is supported by the support means 20 without being tightly fixed. When the ring-shaped cemented carbide substrate 30 shown in FIG. 2 is ground, the side support members 41 corresponding to the shape and size are fixed to the support table 21.

【0025】こうして超硬合金基板10が支持手段20
によって密着固定されずに自由支持された状態で、研削
ホイール59を超硬合金基板10の直上に位置付け、ス
ピンドル57を回転させると共に、研削手段55を下降
させていく。そして、スピンドル57の回転に伴って研
削ホイール59が回転すると共に支持テーブル21が逆
方向に回転し、研削水供給ノズル68から研削水が供給
され、回転する研削砥石59aが超硬合金基板10の研
削面11に接触して押圧力が加えられることにより、そ
の研削面11が研削砥石59aによって研削される。
In this way, the cemented carbide substrate 10 is
The grinding wheel 59 is positioned immediately above the cemented carbide substrate 10 in a state where the grinding wheel 59 is freely supported without being fixedly adhered thereto, and the spindle 57 is rotated while the grinding means 55 is lowered. Then, with the rotation of the spindle 57, the grinding wheel 59 rotates and the support table 21 rotates in the opposite direction, grinding water is supplied from the grinding water supply nozzle 68, and the rotating grinding wheel 59a is When the pressing force is applied in contact with the grinding surface 11, the grinding surface 11 is ground by the grinding wheel 59a.

【0026】このとき、超硬合金基板10は支持手段2
0によって密着固定されず、超硬合金基板10の外周部
と側部支持部材22の内周部との間にはクリアランスが
形成されており、超硬合金基板10は開口部23におい
て自由な状態となる。また、側部支持部材22の厚み
は、研削後の超硬合金基板10の仕上がり厚さより薄い
ため、超硬合金基板10の研削面11は側部支持部材2
2の上面より上方に突出している。
At this time, the cemented carbide substrate 10 is
0, a clearance is formed between the outer peripheral portion of the cemented carbide substrate 10 and the inner peripheral portion of the side support member 22, and the cemented carbide substrate 10 is free at the opening 23. Becomes Since the thickness of the side support member 22 is smaller than the finished thickness of the cemented carbide substrate 10 after grinding, the ground surface 11 of the cemented carbide substrate 10 is
2 protrudes above the upper surface.

【0027】従って、側部支持部材22から上方に突出
した位置において、超硬合金基板10は垂直方向に拘束
されず、開口部23において自由な状態となっているた
め、超硬合金基板10の歪みがそのまま研削面11に現
れ、それが研削砥石59aによって研削されるため、歪
みが確実に除去されて平滑な面となる。そして、研削終
了後に開口部23から超硬合金基板10を取り出して支
持状態を解除しても、リバウンドにより歪みが再び現れ
るということがなく、平面精度を維持することができ
る。
Therefore, at the position projecting upward from the side support member 22, the cemented carbide substrate 10 is not restrained in the vertical direction and is free at the opening 23, so that the cemented carbide substrate 10 The distortion appears on the ground surface 11 as it is and is ground by the grinding wheel 59a, so that the distortion is reliably removed and the surface becomes smooth. Then, even if the cemented carbide substrate 10 is taken out from the opening 23 after the grinding is completed and the support state is released, distortion does not appear again due to rebound, and planar accuracy can be maintained.

【0028】また、研削することによって超硬合金基板
10に一時的に歪みが生じたとしても、その歪みが研削
面11に自由に現れ、その後の研削により除去すること
ができるため、この場合も超硬合金基板10を支持手段
20から取り外しても再び歪みが現れることがなく、平
面精度を維持することができる。
Also, even if the cemented carbide substrate 10 is temporarily distorted by grinding, the distortion appears freely on the ground surface 11 and can be removed by subsequent grinding. Even if the cemented carbide substrate 10 is removed from the support means 20, no distortion appears again, and the planar accuracy can be maintained.

【0029】このように、超硬合金基板10に元来生じ
ていた歪みや研削により生じた歪みを除去することがで
きるため、その後に歪みのない超硬合金基板10の外周
に刃を形成することにより、高精度な丸鋸を形成するこ
とができる。そして、高精度な丸鋸を用いて切削加工を
行うことにより、被切削物の品質を向上させることがで
きる。
As described above, since the strain originally caused in the cemented carbide substrate 10 and the strain caused by grinding can be removed, a blade is formed on the outer periphery of the unstrained cemented carbide substrate 10 thereafter. Thereby, a highly accurate circular saw can be formed. Then, by performing cutting using a high-precision circular saw, the quality of the workpiece can be improved.

【0030】なお、本実施の形態においては、超硬合金
基板を研削する場合を例に挙げて説明したが、被研削物
は、超硬合金基板には限定されず、金属、ガラス、セラ
ミックス、半導体ウェーハ等の平面精度が要求される種
々の板状物の研削に広く利用することができる。また、
被研削物の形状は、円形には限定されない。
In the present embodiment, the case of grinding a cemented carbide substrate has been described as an example. However, the object to be ground is not limited to a cemented carbide substrate, but may be a metal, glass, ceramic, It can be widely used for grinding various kinds of plate-like objects, such as semiconductor wafers, requiring planar accuracy. Also,
The shape of the object to be ground is not limited to a circle.

【0031】[0031]

【発明の効果】以上説明したように、本発明に係る板状
物研削装置及び板状物研削方法によれば、支持手段にお
いて板状物を密着固定せずに支持した状態で研削するた
め、板状物に予め歪みがある場合でもその歪みが研削面
に現れた状態で研削され、歪みが確実に除去されて平ら
な面に仕上げることができる。そして、板状物を支持手
段から取り外しても再び歪みが現れることがないため、
平面精度を維持することができる。
As described above, according to the plate-shaped object grinding apparatus and the plate-shaped object grinding method of the present invention, the plate is ground in a state where the plate is supported by the supporting means without being closely fixed. Even if the plate-like object has a distortion in advance, the plate-like object is ground in a state where the distortion appears on the ground surface, and the distortion can be surely removed and a flat surface can be finished. And since the distortion does not appear again even if the plate-like object is removed from the support means,
Plane accuracy can be maintained.

【0032】また、研削することにより板状物に一時的
に歪みが生じたとしても、その歪みが研削面に現れ、そ
の後の研削により除去することができるため、この場合
も板状物を支持手段から取り外しても再び歪みが現れる
ことがなく、平面精度を維持することができる。
Further, even if the plate-like object is temporarily distorted by the grinding, the distortion appears on the ground surface and can be removed by the subsequent grinding. Even if it is removed from the means, no distortion appears again, and the planar accuracy can be maintained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係る板状物研削装置を構成する支持手
段の第一の例を示す斜視図である。
FIG. 1 is a perspective view showing a first example of a supporting means constituting a plate-like object grinding apparatus according to the present invention.

【図2】同板状物研削装置を構成する支持手段の第二の
例を示す斜視図である。
FIG. 2 is a perspective view showing a second example of the support means constituting the plate-like object grinding apparatus.

【図3】同板状物研削装置の実施の形態の一例を示す斜
視図である。
FIG. 3 is a perspective view showing an example of the embodiment of the plate-like object grinding apparatus.

【図4】同板状物研削装置の構成を示す説明図である。FIG. 4 is an explanatory view showing a configuration of the plate-like object grinding apparatus.

【図5】従来の板状物研削装置を示す斜視図である。FIG. 5 is a perspective view showing a conventional plate-shaped object grinding apparatus.

【符号の説明】[Explanation of symbols]

10…超硬合金基板 11…研削面 20…支持手段 21…支持テーブル 22…側部支持部材 23…開口部 30…超硬合金基板 31…研削面 32…開口部 40…支持手段 41…側部支持部材 50…板状物研削装置 51…基台 52…壁部 53…レール 54…支持板 54a…ナット 55…研削手段 56…ターンテーブル 57…スピンドル 58…マウンタ 59…研削ホイール 59a…研削砥石 60…ボールスクリュー 61…パルスモータ 62…パルスモータドライバ 63…制御部 64…リニアスケール 65…サーボドライバ 66…サーボモータ 67…エンコーダ 68…研削水供給ノズル 70…板状物研削装置 71…被研削物 71a…研削面 72…支持手段 73…バキュームテーブル DESCRIPTION OF SYMBOLS 10 ... Cemented carbide substrate 11 ... Grinding surface 20 ... Support means 21 ... Support table 22 ... Side support member 23 ... Opening 30 ... Cemented carbide substrate 31 ... Grinding surface 32 ... Opening 40 ... Support means 41 ... Side Supporting member 50 ... Plate grinding apparatus 51 ... Base 52 ... Wall 53 ... Rail 54 ... Support plate 54a ... Nut 55 ... Grinding means 56 ... Turn table 57 ... Spindle 58 ... Mounter 59 ... Grinding wheel 59a ... Grinding grindstone 60 ... Ball screw 61 ... Pulse motor 62 ... Pulse motor driver 63 ... Control unit 64 ... Linear scale 65 ... Servo driver 66 ... Servo motor 67 ... Encoder 68 ... Grinding water supply nozzle 70 ... Plate-like object grinding device 71 ... Object to be ground 71a ... Grinding surface 72 ... Supporting means 73 ... Vacuum table

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】 板状物を支持する支持手段と、該支持手
段に支持された板状物の研削面を研削する研削ホイール
を備えた研削手段とから少なくとも構成される研削装置
であって、 該支持手段は、板状物の支持面を支持する回転可能な支
持テーブルと、該板状物の側部を支持する側部支持部材
とを含み、 該側部支持部材は、該支持テーブルに固定され、該板状
物を密着固定せずに支持する板状物研削装置。
1. A grinding apparatus comprising at least a support means for supporting a plate-like object and a grinding means provided with a grinding wheel for grinding a grinding surface of the plate-like object supported by the support means, The support means includes a rotatable support table for supporting a support surface of the plate-like object, and a side support member for supporting a side portion of the plate-like object, wherein the side support member is provided on the support table. A plate-like object grinding device that is fixed and supports the plate-like object without tightly fixing it.
【請求項2】 側部支持部材は、板状物を外周側から支
持する請求項1に記載の板状物研削装置。
2. The plate-shaped object grinding apparatus according to claim 1, wherein the side support member supports the plate-shaped object from an outer peripheral side.
【請求項3】 板状物の中心部に開口部を有する場合
は、側部支持部材は該板状物の開口部に係合して該板状
物を内周側から支持する請求項1に記載の板状物研削装
置。
3. When the plate-shaped object has an opening at the center, the side support member engages with the opening of the plate-shaped object to support the plate-shaped object from the inner peripheral side. 3. The plate-like object grinding device according to 1.
【請求項4】 板状物の側部と側部支持部材との間に形
成されるクリアランスは0.1mm〜1.0mmである
請求項1乃至3に記載の板状物研削装置。
4. The plate-shaped object grinding apparatus according to claim 1, wherein a clearance formed between a side portion of the plate-shaped object and the side support member is 0.1 mm to 1.0 mm.
【請求項5】 側部支持部材の厚みは、板状物の仕上が
り厚さより薄い請求項1乃至4に記載の板状物研削装
置。
5. The apparatus according to claim 1, wherein a thickness of the side support member is smaller than a finished thickness of the plate.
【請求項6】 側部支持部材と支持テーブルとは、ワッ
クスダウン、ネジ止め、一体形成のいずれかによって固
定される請求項1乃至5に記載の板状物研削装置。
6. The plate-like object grinding apparatus according to claim 1, wherein the side support member and the support table are fixed by any of wax down, screwing, and integral formation.
【請求項7】 請求項1乃至6に記載の板状物研削装置
を用いた板状物の研削方法であって、 支持テーブルにおいて側部支持部材によって板状物を密
着固定せずに支持し、研削ホイールを構成する研削砥石
を該板状物に接触させ、該支持テーブルと該研削ホイー
ルとを回転させて該板状物を所定の厚さに研削する板状
物研削方法。
7. A method for grinding a plate-like object using the plate-like object grinding apparatus according to claim 1, wherein the plate-like object is supported by a side support member on a support table without being tightly fixed. A plate grinding method for bringing a grinding wheel constituting a grinding wheel into contact with the plate, rotating the support table and the grinding wheel to grind the plate to a predetermined thickness.
【請求項8】 板状物は超硬合金である請求項7に記載
の板状物研削方法。
8. The method of claim 7, wherein the plate is a cemented carbide.
JP2000009149A 2000-01-18 2000-01-18 Plate-like object grinding apparatus and plate-like object grinding method Expired - Lifetime JP4549471B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000009149A JP4549471B2 (en) 2000-01-18 2000-01-18 Plate-like object grinding apparatus and plate-like object grinding method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000009149A JP4549471B2 (en) 2000-01-18 2000-01-18 Plate-like object grinding apparatus and plate-like object grinding method

Publications (2)

Publication Number Publication Date
JP2001198814A true JP2001198814A (en) 2001-07-24
JP4549471B2 JP4549471B2 (en) 2010-09-22

Family

ID=18537334

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000009149A Expired - Lifetime JP4549471B2 (en) 2000-01-18 2000-01-18 Plate-like object grinding apparatus and plate-like object grinding method

Country Status (1)

Country Link
JP (1) JP4549471B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008124292A (en) * 2006-11-14 2008-05-29 Disco Abrasive Syst Ltd Wafer positioning jig of processing apparatus

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106002514A (en) * 2016-05-31 2016-10-12 芜湖鸣人热能设备有限公司 Grinding device for tube plate for boiler

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6310060U (en) * 1986-07-07 1988-01-22
JPH0236067A (en) * 1988-07-25 1990-02-06 Toshiba Corp Method and device for polishing
JPH0811055A (en) * 1994-06-28 1996-01-16 Sony Corp Polishing device, holding method and holding structure of material to be polished in polishing device
JPH09223383A (en) * 1996-02-16 1997-08-26 Kioritz Corp Disk cleaner
WO1998022978A1 (en) * 1996-11-20 1998-05-28 Northrop Grumman Corporation Method of preparing silicon carbide wafers for epitaxial growth
JPH10229223A (en) * 1997-02-17 1998-08-25 Tekunisuko:Kk Thermoelectric element
JPH10284449A (en) * 1997-04-11 1998-10-23 Disco Abrasive Syst Ltd Method and system for rear-surface polishing of wafer and dicing

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6310060U (en) * 1986-07-07 1988-01-22
JPH0236067A (en) * 1988-07-25 1990-02-06 Toshiba Corp Method and device for polishing
JPH0811055A (en) * 1994-06-28 1996-01-16 Sony Corp Polishing device, holding method and holding structure of material to be polished in polishing device
JPH09223383A (en) * 1996-02-16 1997-08-26 Kioritz Corp Disk cleaner
WO1998022978A1 (en) * 1996-11-20 1998-05-28 Northrop Grumman Corporation Method of preparing silicon carbide wafers for epitaxial growth
JPH10229223A (en) * 1997-02-17 1998-08-25 Tekunisuko:Kk Thermoelectric element
JPH10284449A (en) * 1997-04-11 1998-10-23 Disco Abrasive Syst Ltd Method and system for rear-surface polishing of wafer and dicing

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008124292A (en) * 2006-11-14 2008-05-29 Disco Abrasive Syst Ltd Wafer positioning jig of processing apparatus

Also Published As

Publication number Publication date
JP4549471B2 (en) 2010-09-22

Similar Documents

Publication Publication Date Title
JP4441823B2 (en) Truing method and chamfering device for chamfering grindstone
US20090247050A1 (en) Grinding method for grinding back-surface of semiconductor wafer and grinding apparatus for grinding back-surface of semiconductor wafer used in same
JP2002200545A (en) Grinding device
JP5147417B2 (en) Wafer polishing method and polishing apparatus
JP6157229B2 (en) Grinding apparatus and grinding method
US7601615B2 (en) Method of grinding back surface of semiconductor wafer and semiconductor wafer grinding apparatus
JP5613439B2 (en) Cutting equipment
CN101564836A (en) Support flange disassembling tool and support flange disassembling method
JP2021094693A (en) Manufacturing method of chamfered baseboard and chamfering device used in the same
JP2004082319A (en) Grinding method of chip and ring frame fixing mechanism
JP4549471B2 (en) Plate-like object grinding apparatus and plate-like object grinding method
JP2001351890A (en) Chip polishing method
CN111216042A (en) Automatic grinding wheel spacing control system of precision grinding machine
JP5654365B2 (en) Grinding equipment
JP7413103B2 (en) Wafer grinding method
JP2018027597A (en) Measuring tool
JP2011224697A (en) Method of adjusting polishing pad
JP3801780B2 (en) Truing tool and wafer chamfering device with truing tool
JP3616329B2 (en) Spindle end face polishing machine
JPH1058320A (en) Grinding device and polishing device
JP2001071244A (en) Precise chamfering method for semiconductor wafer
JP2020075314A (en) Beveling device for wafer
JP5501129B2 (en) Method for forming container
JP7328099B2 (en) Grinding device and grinding method
JP2002192460A (en) Grinding device

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20061222

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20090618

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20090618

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090814

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100318

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100514

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20100608

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20100707

R150 Certificate of patent or registration of utility model

Ref document number: 4549471

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130716

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130716

Year of fee payment: 3

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

EXPY Cancellation because of completion of term