JP2001196641A - Surface mount semiconductor device - Google Patents

Surface mount semiconductor device

Info

Publication number
JP2001196641A
JP2001196641A JP2000005531A JP2000005531A JP2001196641A JP 2001196641 A JP2001196641 A JP 2001196641A JP 2000005531 A JP2000005531 A JP 2000005531A JP 2000005531 A JP2000005531 A JP 2000005531A JP 2001196641 A JP2001196641 A JP 2001196641A
Authority
JP
Japan
Prior art keywords
wire
electrode
light emitting
plating layer
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000005531A
Other languages
Japanese (ja)
Inventor
Kazuhiro Ishibashi
和博 石橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP2000005531A priority Critical patent/JP2001196641A/en
Publication of JP2001196641A publication Critical patent/JP2001196641A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors

Landscapes

  • Led Device Packages (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a surface mount semiconductor device capable of assuring a conductive structure without giving adverse influence over a soldered bonding wire on mounting by soldering. SOLUTION: A light emitting element 4 is conductively mounted on an electrode 2 of two paired electrodes 2, 3 on an insulating substrate 1, and bonded to another electrode 3 with a wire 5. Further, the light emitting element 4 is sealed with a resin package 6 including the wire 5. A cut out groove 7 is formed between the bonding portion of the light emitting element 4 and the outer periphery of the package for exposing Cu plated layer 3b of a laminated plating layer in the electrode 3. A solder is prevented from creeping into the bonding side by reducing the wettability by using an oxide film on the surface of the plated layer 3b in the case of soldering, resulting in avoiding the floating wire 5 and assuring the conductivity.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半導体発光素子ま
たは受光素子などを備える半導体装置に係り、特にプリ
ント配線基板などの表面に実装されて半田付けにより固
定される表面実装型の半導体装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device having a semiconductor light-emitting element or a light-receiving element, and more particularly to a surface-mounted semiconductor device which is mounted on a surface of a printed wiring board and fixed by soldering.

【0002】[0002]

【従来の技術】半導体発光素子を使用した半導体発光装
置には、リードフレームのマウント部に発光素子を実装
してワイヤボンディングするとともにエポキシ樹脂によ
り封止した砲弾型のLEDランプと、プリント配線基板
の上に半田付けにより導通実装が可能な表面実装型のも
のがある。表面実装型の半導体発光装置は、LEDラン
プに比べて小型薄型化できるため、各種の小型電子機器
に多用されている。
2. Description of the Related Art A semiconductor light emitting device using a semiconductor light emitting element includes a shell type LED lamp in which a light emitting element is mounted on a mounting portion of a lead frame, wire-bonded and sealed with an epoxy resin, and a printed wiring board. There is a surface mount type that can be electrically mounted by soldering. Surface-mount type semiconductor light emitting devices can be made smaller and thinner than LED lamps, and are therefore frequently used in various small electronic devices.

【0003】図4の(a)は従来の表面実装型の半導体
発光装置の概略を示す透視図、(b)はプリント配線基
板上への実装状態を示す概略縦断面図である。
FIG. 4A is a perspective view schematically showing a conventional surface-mount type semiconductor light emitting device, and FIG. 4B is a schematic longitudinal sectional view showing a state of mounting on a printed wiring board.

【0004】表面実装型の半導体発光装置は、図示のよ
うに絶縁性の樹脂などを利用した基板1とその両端に形
成された一対の電極2,3と、一方の電極2の上に導通
搭載された発光素子4と、この発光素子4の上端の電極
と他方の電極3との間をボンディング接続するワイヤ5
と、このワイヤ5を含んで封止するエポキシ系の樹脂を
使用した樹脂パッケージ6とから構成されたものであ
る。
As shown in the figure, a surface-mount type semiconductor light emitting device has a substrate 1 using an insulating resin or the like, a pair of electrodes 2 and 3 formed at both ends thereof, and a conductive mounting on one electrode 2. And a wire 5 for bonding connection between the upper electrode of the light emitting element 4 and the other electrode 3.
And a resin package 6 using an epoxy-based resin for sealing including the wire 5.

【0005】電極2,3はウエハ状態の基材に開けたス
リットを利用して基板の表面から側面及び底面にかけて
めっき法によって形成され、発光素子4の搭載、ワイヤ
5のボンディング及び樹脂封止の後にダイシングされ同
図の(a)の形状に成形される。そして、電極2,3は
図5に拡大して示すように、基板1の表面と底面を皮膜
する銅箔2a,3a、この銅箔2a,3a及び基板1の
側面を被膜するCuめっき層2b,3b、このCuめっ
き層2b,3bを被膜するNiめっき層2c,3c及び
表面の全体に形成されるAuめっき層2d,3dとによ
る積層構造を持つ。
The electrodes 2 and 3 are formed by plating from the surface of the substrate to the side and bottom surfaces using slits opened in the base material in a wafer state, and are used for mounting the light emitting element 4, bonding the wires 5, and sealing with resin. Thereafter, it is diced and formed into the shape shown in FIG. As shown in FIG. 5, the electrodes 2 and 3 are copper foils 2a and 3a that cover the surface and bottom of the substrate 1, a Cu plating layer 2b that covers the copper foils 2a and 3a and the side surfaces of the substrate 1. , 3b, Ni plating layers 2c, 3c covering the Cu plating layers 2b, 3b, and Au plating layers 2d, 3d formed on the entire surface.

【0006】このような構成の表面実装型の半導体発光
装置は、図4の(b)に示すようにプリント配線基板の
上に導通実装される。この導通実装はプリント配線基板
51の表面に形成された配線パターン51a,51bに
半導体発光装置の電極2,3を位置合わせして搭載し、
それぞれ半田52,53付けによって固定される。これ
により、発光素子4は電源側と導通し通電によって発光
する。
The surface-mount type semiconductor light-emitting device having such a configuration is electrically mounted on a printed wiring board as shown in FIG. In this conductive mounting, the electrodes 2 and 3 of the semiconductor light emitting device are aligned and mounted on wiring patterns 51a and 51b formed on the surface of the printed wiring board 51.
They are fixed by soldering 52, 53, respectively. Thereby, the light emitting element 4 conducts with the power supply side and emits light when energized.

【0007】[0007]

【発明が解決しようとする課題】錫と鉛の合金による半
田52,53は、約250℃で溶融したものをソルダリ
ングして電極2,3をそれぞれ配線パターン51a,5
1bに導通固定する。ところが、250℃程度の高温に
樹脂パッケージ6が曝されるので、図4の(b)に示す
ように半田52,53が樹脂パッケージ6の中まで浸潤
しやすい。
The solders 52 and 53 made of an alloy of tin and lead are melted at about 250 ° C. and soldered to form electrodes 2 and 3 on wiring patterns 51 a and 5, respectively.
1b. However, since the resin package 6 is exposed to a high temperature of about 250 ° C., the solders 52 and 53 easily penetrate into the resin package 6 as shown in FIG.

【0008】一方、ワイヤ5は発光素子4の上面の電極
にダイボンディングされた後に電極3のボンディングエ
リア3eにウェッジボンディングされる。このウェッジ
ボンディングは、ワイヤ5の一端側をボンディングエリ
ア3eの表面にこすり付けるようにして接合する手法で
ある。
On the other hand, the wire 5 is die-bonded to the electrode on the upper surface of the light emitting element 4 and then wedge bonded to the bonding area 3e of the electrode 3. The wedge bonding is a method of bonding such that one end of the wire 5 is rubbed against the surface of the bonding area 3e.

【0009】ところが、半田53が樹脂パッケージ6の
中まで浸潤してくると、ウェッジボンディングされたワ
イヤ5の先端部分の樹脂パッケージ6の樹脂が高温にな
って軟化したり膨張したりする。このような樹脂の軟化
や膨張は、ワイヤ5のウェッジボンディングを上に持ち
上げるように作用し、ワイヤ5の先端がボンディングエ
リア3eから浮き上がってしまうことがある。このた
め、ワイヤ5と電極3との導通が切れてしまい、発光素
子4への通電ができなくなる。
However, when the solder 53 infiltrates into the resin package 6, the resin of the resin package 6 at the tip of the wedge-bonded wire 5 becomes hot and softens or expands. Such softening or expansion of the resin acts to lift the wedge bonding of the wire 5 upward, and the tip of the wire 5 may rise from the bonding area 3e. For this reason, the conduction between the wire 5 and the electrode 3 is cut off, and the light emitting element 4 cannot be energized.

【0010】このように、一方の電極3にワイヤ5をウ
ェッジボンディングするものでは、プリント配線基板5
1への実装時に半田53の影響を受けて発光素子4への
通電に影響を及ぼす。したがって、実装製品の歩留りの
低下などの問題を引き起こすことになる。そして、半導
体発光装置の分野だけでなく受光装置などのようにワイ
ヤボンディングしたものを樹脂封止して半田付けによっ
て表面実装する全ての半導体装置についても同様の問題
がある。
As described above, when the wire 5 is wedge-bonded to one electrode 3, the printed wiring board 5
When the light emitting element 4 is mounted on the light emitting element 4, it is affected by the solder 53. Therefore, a problem such as a decrease in the yield of mounted products is caused. The same problem occurs not only in the field of semiconductor light emitting devices but also in all semiconductor devices in which a wire-bonded device such as a light receiving device is resin-sealed and surface-mounted by soldering.

【0011】そこで、本発明は、半田付けによる実装の
際に半田がボンディングされたワイヤに影響を及ぼさな
いようにして導通構造の保全が可能な表面実装型の半導
体装置を提供することを目的とする。
SUMMARY OF THE INVENTION It is an object of the present invention to provide a surface-mount type semiconductor device capable of maintaining a conductive structure by preventing solder from affecting a wire to which solder is attached at the time of mounting by soldering. I do.

【0012】[0012]

【課題を解決するための手段】本発明の表面実装型の半
導体装置は、半導体素子と、電源側に導通接続した電極
と、前記半導体素子と前記電極との間をボンディングに
よって導通させるワイヤとを備え、前記電極の基層にC
uめっき層を含ませた積層めっき構造とした半導体装置
において、前記電極には、前記ワイヤをボンディングす
る位置と半田付けする外縁との間に前記Cuめっき層を
露出させた切欠溝を形成したことを特徴とする。
A surface-mount type semiconductor device according to the present invention comprises a semiconductor element, an electrode electrically connected to a power supply side, and a wire for electrically connecting the semiconductor element and the electrode by bonding. And C on the base layer of the electrode.
In a semiconductor device having a laminated plating structure including a u-plated layer, a cutout groove exposing the Cu-plated layer is formed in the electrode between a position where the wire is bonded and an outer edge where the wire is soldered. It is characterized by.

【0013】また、絶縁性の基板と、前記基板に形成し
た一対の電極と、前記基板または前記一対の電極のうち
の一方に搭載される半導体素子と、前記半導体素子と前
記電極の少なくとも一方との間をボンディングするワイ
ヤと、前記半導体素子及びワイヤを封止する樹脂パッケ
ージとを備え、前記電極の基層にCuめっき層を含ませ
た積層めっき構造とした半導体装置において、前記電極
には、前記ワイヤをボンディングする位置と半田付けす
る外縁との間に前記Cuめっき層を露出させためっき層
を形成したものとしてもよい。
[0013] Also, an insulating substrate, a pair of electrodes formed on the substrate, a semiconductor element mounted on one of the substrate or the pair of electrodes, and at least one of the semiconductor element and the electrode. A semiconductor device having a laminated plating structure including a wire for bonding between the wires, and a resin package for sealing the semiconductor element and the wire, and including a Cu plating layer in a base layer of the electrode; A plating layer exposing the Cu plating layer may be formed between a position where a wire is bonded and an outer edge where soldering is performed.

【0014】[0014]

【発明の実施の形態】請求項1に記載の発明は、半導体
素子と、電源側に導通接続した電極と、前記半導体素子
と前記電極との間をボンディングによって導通させるワ
イヤとを備え、前記電極の基層にCuめっき層を含ませ
た積層めっき構造とした半導体装置において、前記電極
には、前記ワイヤをボンディングする位置と半田付けす
る外縁との間に前記Cuめっき層を露出させた切欠溝を
形成したことを特徴とする表面実装型の半導体装置であ
り、切欠溝によって露出するCuめっき層は空気に触れ
て酸化しやすく酸化膜を形成するので半田の塗れ性が悪
くなり、半田の流れを阻んでワイヤのボンディング点へ
の侵入を防止するという作用を有する。
The invention according to claim 1 comprises a semiconductor element, an electrode electrically connected to a power supply side, and a wire for electrically connecting the semiconductor element and the electrode by bonding. In a semiconductor device having a laminated plating structure in which a Cu plating layer is included in a base layer of the semiconductor device, the electrode has a cutout groove exposing the Cu plating layer between a position where the wire is bonded and an outer edge for soldering. This is a surface-mount type semiconductor device characterized by being formed, and the Cu plating layer exposed by the notch groove is easily oxidized by contacting with air to form an oxide film. This has the effect of preventing the wire from entering the bonding point.

【0015】請求項2に記載の発明は、絶縁性の基板
と、前記基板に形成した一対の電極と、前記基板または
前記一対の電極のうちの一方に搭載される半導体素子
と、前記半導体素子と前記電極の少なくとも一方との間
をボンディングするワイヤと、前記半導体素子及びワイ
ヤを封止する樹脂パッケージとを備え、前記電極の基層
にCuめっき層を含ませた積層めっき構造とした半導体
装置において、前記電極には、前記ワイヤをボンディン
グする位置と半田付けする外縁との間に前記Cuめっき
層を露出させためっき層を形成したことを特徴とする表
面実装型の半導体装置であり、切欠溝によって露出する
Cuめっき層は空気に触れて酸化しやすく酸化膜を形成
するので半田の塗れ性が悪くなり、ワイヤのボンディン
グ点への進行を阻止するという作用を有する。
According to a second aspect of the present invention, there is provided an insulating substrate, a pair of electrodes formed on the substrate, a semiconductor element mounted on one of the substrate and the pair of electrodes, and A semiconductor device having a laminated plating structure including a wire for bonding between at least one of the electrode and the electrode, and a resin package for sealing the semiconductor element and the wire, wherein a Cu plating layer is included in a base layer of the electrode. A surface mounting type semiconductor device, wherein a plating layer exposing the Cu plating layer is formed between a position where the wire is bonded and an outer edge where soldering is performed on the electrode; The exposed Cu plating layer is easily oxidized when exposed to air, and forms an oxide film, so that the solderability deteriorates and the progress of the wire to the bonding point is prevented. It has the effect of.

【0016】請求項3に記載の発明は、前記切欠溝を前
記樹脂パッケージの封止領域に含ませたことを特徴とす
る請求項2記載の表面実装型の半導体装置であり、樹脂
パッケージによってCuめっき層の表面が被覆されるの
で、Cuめっき層の表面の過剰な酸化を防止するという
作用を有する。
According to a third aspect of the present invention, in the surface-mount type semiconductor device according to the second aspect, the cutout groove is included in a sealing region of the resin package. Since the surface of the plating layer is covered, it has an effect of preventing excessive oxidation of the surface of the Cu plating layer.

【0017】以下、本発明の実施の形態を図面に基づい
て説明する。なお、本実施の形態では半導体発光装置を
例として説明し、図4で示した従来例と同じ構成部材に
ついては共通の符号で指示する。
An embodiment of the present invention will be described below with reference to the drawings. In this embodiment, a semiconductor light emitting device will be described as an example, and the same components as those in the conventional example shown in FIG.

【0018】図1は本発明の実施の形態における半導体
発光装置の概略を示す透視図、図2はプリント配線基板
上への実装時の概略縦断面図である。
FIG. 1 is a perspective view schematically showing a semiconductor light emitting device according to an embodiment of the present invention, and FIG. 2 is a schematic vertical sectional view when the semiconductor light emitting device is mounted on a printed wiring board.

【0019】図1及び図2において、半導体発光装置は
従来例と同様に、絶縁性の樹脂などを利用した基板1と
その両端に形成された一対の電極2,3と、一方の電極
2の上に導通搭載された発光素子4と、この発光素子4
の上端の電極と他方の電極3のボンディングエリア3e
との間をボンディング接続するワイヤ5と、このワイヤ
5を含んで封止するエポキシ系の樹脂を使用した樹脂パ
ッケージ6とから構成されている。なお、電極2,3は
図5で示したように、基板1の表面と底面を皮膜する銅
箔2a,3a、この銅箔2a,3a及び基板1の側面を
被膜するCuめっき層2b,3b、このCuめっき層2
b,3bを被膜するNiめっき層2c,3c及び表面の
全体に形成されるAuめっき層2d,3dとによる積層
構造としたものである。そして、図2から明らかなよう
に、ワイヤ5をウェッジボンディングする電極3の表面
側であって樹脂パッケージ6によって封止された部分に
は、切欠溝7が形成されている。この切欠溝7は、めっ
き工程の後にたとえばエッチングによって形成されたも
ので、電極3の全幅部分からボンディングエリア3eま
でにかけてを占めている。
Referring to FIGS. 1 and 2, the semiconductor light emitting device has a substrate 1 using an insulating resin or the like, a pair of electrodes 2 and 3 formed at both ends thereof, and a semiconductor light emitting device. A light emitting element 4 conductively mounted on the light emitting element 4;
Area 3e between the upper electrode and the other electrode 3
And a resin package 6 using an epoxy resin for sealing including the wire 5. The electrodes 2 and 3 are, as shown in FIG. 5, copper foils 2a and 3a covering the top and bottom surfaces of the substrate 1, Cu plating layers 2b and 3b covering the copper foils 2a and 3a and the side surfaces of the substrate 1. , This Cu plating layer 2
The laminated structure is composed of Ni plating layers 2c and 3c covering the layers b and 3b and Au plating layers 2d and 3d formed on the entire surface. As is apparent from FIG. 2, a cutout groove 7 is formed on the surface side of the electrode 3 to which the wire 5 is to be wedge bonded and sealed by the resin package 6. The cutout groove 7 is formed by, for example, etching after the plating step, and occupies from the entire width of the electrode 3 to the bonding area 3e.

【0020】図3の(a)は切欠溝7の深さを説明する
ための側面図、(b)は切欠溝7の形成範囲を示す概略
平面図である。
FIG. 3A is a side view for explaining the depth of the cutout groove 7, and FIG. 3B is a schematic plan view showing the formation range of the cutout groove 7. As shown in FIG.

【0021】切欠溝7は図3の(a)から明らかなよう
に、Cuめっき層3bが露出する深さとなるように、N
iめっき層3cとAuめっき層3dとをエッチングによ
って除去して形成されている。すなわち、図5を借りて
示せば、切欠溝7は銅箔3aとCuめっき層3bとを基
板1側に残して切開されたものである。
As is apparent from FIG. 3A, the notch groove 7 is formed so that the Cu plating layer 3b is exposed to a depth such that it has a depth.
It is formed by removing the i-plated layer 3c and the Au-plated layer 3d by etching. That is, as shown in FIG. 5, the cutout groove 7 is formed by leaving the copper foil 3a and the Cu plating layer 3b on the substrate 1 side.

【0022】以上の構成において、半導体発光装置を図
2のようにプリント配線基板51の上に実装搭載すると
き、電極2,3を配線パターン51a,51bに位置合
わせして搭載し、半田52,53によって導通固定す
る。一方、切欠溝7を形成した後にはCuめっき層3b
は空気に触れるので、直ぐに表面が酸化して表面酸化膜
が形成される。したがって、250℃程度の高温の半田
53が樹脂パッケージ6の中に浸潤してきても、Cuの
酸化膜と半田の組成金属でPbとの塗れ性が悪いので、
溶融半田の流れは切欠溝7によって阻まれる。このた
め、半田53がボンディングエリア3e側に浸潤してい
くことが防止され、樹脂パッケージ6の樹脂の軟化及び
膨張が阻止される。したがって、ウェッジボンディング
されているワイヤ5がボンディングエリア3eから浮き
上がることがなく、ワイヤ5と電極3との間の導通構造
が確実に保全される。
In the above configuration, when the semiconductor light emitting device is mounted and mounted on the printed wiring board 51 as shown in FIG. 2, the electrodes 2 and 3 are mounted in alignment with the wiring patterns 51a and 51b, and the solder 52 and the solder 52 are mounted. The conduction is fixed by 53. On the other hand, after the notch groove 7 is formed, the Cu plating layer 3b is formed.
Since the surface comes into contact with air, the surface is immediately oxidized to form a surface oxide film. Therefore, even if the solder 53 at a high temperature of about 250 ° C. infiltrates into the resin package 6, the Cu oxide film and the composition metal of the solder have poor wettability with Pb.
The flow of the molten solder is blocked by the notch groove 7. Therefore, the solder 53 is prevented from infiltrating into the bonding area 3e, and the softening and expansion of the resin of the resin package 6 is prevented. Therefore, the wedge-bonded wire 5 does not rise from the bonding area 3e, and the conduction structure between the wire 5 and the electrode 3 is reliably maintained.

【0023】このように、電極3の一部の表面に切欠溝
7を形成するだけで、発光素子4への導通構造を確保で
き、プリント配線基板51への実装後の製品の歩留まり
を大幅に向上させることができる。
As described above, a conductive structure to the light emitting element 4 can be ensured only by forming the cutout groove 7 on a part of the surface of the electrode 3, and the yield of the product after mounting on the printed wiring board 51 is greatly reduced. Can be improved.

【0024】なお、以上の例では半導体発光装置につい
て説明したが、受光素子を含むフォトカプラーやその他
の半導体装置にも本発明が適用できることは無論であ
る。
Although the semiconductor light emitting device has been described in the above example, it is a matter of course that the present invention can be applied to a photocoupler including a light receiving element and other semiconductor devices.

【0025】[0025]

【発明の効果】本発明では、電極に切欠溝を設けてCu
めっき層を露出させ、この切欠溝を挟んでワイヤのボン
ディング点と半田付けする外縁とを区分けするようにし
ているので、高温溶融の半田付けするときでもCuめっ
き層の酸化膜との間での半田の塗れ性が悪いことからボ
ンディング点側への半田の進行を阻むことができる。こ
のため、樹脂パッケージでワイヤを封止する場合にボン
ディング点近くでの樹脂の軟化や膨張がなくワイヤの浮
き上がりが防止される。したがって、表面実装のときの
導通構造が保全され、歩留まりの高い製造が可能とな
る。
According to the present invention, a notch groove is provided in an electrode to reduce Cu
Since the plating layer is exposed and the bonding point of the wire and the outer edge to be soldered are separated by sandwiching the cutout groove, even when soldering at a high temperature, the gap between the wire and the oxide film of the Cu plating layer can be reduced. Since the solderability is poor, the progress of the solder toward the bonding point can be prevented. Therefore, when the wire is sealed with the resin package, the resin is not softened or expanded near the bonding point, and the wire is prevented from floating. Therefore, the conductive structure at the time of surface mounting is preserved, and high-yield manufacturing becomes possible.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の表面実装型の半導体装置であって半導
体発光装置の例とした概略透視図
FIG. 1 is a schematic perspective view of a surface-mounted semiconductor device of the present invention as an example of a semiconductor light-emitting device.

【図2】図1の半導体発光装置をプリント配線基板に搭
載実装したときの要部を示す概略縦断面図
FIG. 2 is a schematic vertical sectional view showing a main part when the semiconductor light emitting device of FIG. 1 is mounted and mounted on a printed wiring board;

【図3】(a)は図1及び図2の半導体発光装置におい
て切欠の深さを説明するための側面図 (b)は平面図
FIG. 3A is a side view for explaining a depth of a notch in the semiconductor light emitting device of FIGS. 1 and 2; FIG.

【図4】従来例の概略であって、 (a)は概略透視図 (b)はプリント配線基板に実装搭載したときの概略縦
断面図
4A and 4B are schematic views of a conventional example, in which FIG. 4A is a schematic perspective view, and FIG. 4B is a schematic longitudinal sectional view when mounted and mounted on a printed wiring board.

【図5】基板の表面に形成するめっき層の詳細を本発明
における切欠溝の形成状況とともに示す要部の拡大縦断
面図
FIG. 5 is an enlarged longitudinal sectional view of a main part showing details of a plating layer formed on the surface of the substrate together with a formation state of a notch groove in the present invention.

【符号の説明】[Explanation of symbols]

1 基板 2,3 電極 2a,3a 銅箔 2b,3b Cuめっき層 2c,3c Niめっき層 2d,3d Auめっき層 3e ボンディングエリア 4 発光素子 5 ワイヤ 6 樹脂パッケージ 7 切欠溝 51 プリント配線基板 51a,51b 配線パターン 52,53 半田 DESCRIPTION OF SYMBOLS 1 Substrate 2, 3 Electrode 2a, 3a Copper foil 2b, 3b Cu plating layer 2c, 3c Ni plating layer 2d, 3d Au plating layer 3e Bonding area 4 Light emitting element 5 Wire 6 Resin package 7 Notch groove 51 Printed wiring board 51a, 51b Wiring pattern 52, 53 Solder

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 半導体素子と、電源側に導通接続した電
極と、前記半導体素子と前記電極との間をボンディング
によって導通させるワイヤとを備え、前記電極の基層に
Cuめっき層を含ませた積層めっき構造とした半導体装
置において、前記電極には、前記ワイヤをボンディング
する位置と半田付けする外縁との間に前記Cuめっき層
を露出させた切欠溝を形成したことを特徴とする表面実
装型の半導体装置。
1. A laminated structure comprising a semiconductor element, an electrode electrically connected to a power supply side, and a wire for electrically connecting the semiconductor element and the electrode by bonding, wherein a Cu plating layer is included in a base layer of the electrode. In the semiconductor device having a plating structure, the electrode has a cutout groove exposing the Cu plating layer between a position where the wire is bonded and an outer edge where the wire is soldered. Semiconductor device.
【請求項2】 絶縁性の基板と、前記基板に形成した一
対の電極と、前記基板または前記一対の電極のうちの一
方に搭載される半導体素子と、前記半導体素子と前記電
極の少なくとも一方との間をボンディングするワイヤ
と、前記半導体素子及びワイヤを封止する樹脂パッケー
ジとを備え、前記電極の基層にCuめっき層を含ませた
積層めっき構造とした半導体装置において、前記電極に
は、前記ワイヤをボンディングする位置と半田付けする
外縁との間に前記Cuめっき層を露出させためっき層を
形成したことを特徴とする表面実装型の半導体装置。
2. An insulating substrate, a pair of electrodes formed on the substrate, a semiconductor element mounted on one of the substrate and the pair of electrodes, and at least one of the semiconductor element and the electrode. A semiconductor device having a laminated plating structure including a wire for bonding between the wires, and a resin package for sealing the semiconductor element and the wire, and including a Cu plating layer in a base layer of the electrode; A surface-mounted semiconductor device, wherein a plating layer exposing the Cu plating layer is formed between a position where a wire is bonded and an outer edge where soldering is performed.
【請求項3】 前記切欠溝を前記樹脂パッケージの封止
領域に含ませたことを特徴とする請求項2記載の表面実
装型の半導体装置。
3. The surface-mounted semiconductor device according to claim 2, wherein said notched groove is included in a sealing region of said resin package.
JP2000005531A 2000-01-14 2000-01-14 Surface mount semiconductor device Pending JP2001196641A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000005531A JP2001196641A (en) 2000-01-14 2000-01-14 Surface mount semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000005531A JP2001196641A (en) 2000-01-14 2000-01-14 Surface mount semiconductor device

Publications (1)

Publication Number Publication Date
JP2001196641A true JP2001196641A (en) 2001-07-19

Family

ID=18534188

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP2001196641A (en)

Cited By (10)

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Publication number Priority date Publication date Assignee Title
US7053421B2 (en) * 2003-12-15 2006-05-30 Lighthouse Technology Co., Ltd Light-emitting diode
US7332862B2 (en) * 2003-04-14 2008-02-19 Toyoda Gosei Co., Ltd. Led lamp including a resist bonded to a copper film
JP2008091864A (en) * 2006-09-08 2008-04-17 Nichia Chem Ind Ltd Light emitting device
US8089092B2 (en) 2007-03-30 2012-01-03 Rohm Co., Ltd. Semiconductor light emitting device
JP2013254937A (en) * 2012-05-09 2013-12-19 Rohm Co Ltd Semiconductor light emitting device
US8633506B2 (en) 2008-03-11 2014-01-21 Rohm Co., Ltd. Semiconductor light emitting device and method for manufacturing the same
US9224915B2 (en) 2010-09-17 2015-12-29 Rohm Co., Ltd. Semiconductor light-emitting device, method for producing same, and display device
JP2019208033A (en) * 2012-05-09 2019-12-05 ローム株式会社 Light-emitting device
JP2020096091A (en) * 2018-12-13 2020-06-18 日亜化学工業株式会社 Light emitting device and method of manufacturing the same
US11702752B2 (en) * 2019-09-13 2023-07-18 Toyota Jidosha Kabushiki Kaisha Method for forming metal plating film

Cited By (20)

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US7332862B2 (en) * 2003-04-14 2008-02-19 Toyoda Gosei Co., Ltd. Led lamp including a resist bonded to a copper film
US7053421B2 (en) * 2003-12-15 2006-05-30 Lighthouse Technology Co., Ltd Light-emitting diode
JP2008091864A (en) * 2006-09-08 2008-04-17 Nichia Chem Ind Ltd Light emitting device
US8089092B2 (en) 2007-03-30 2012-01-03 Rohm Co., Ltd. Semiconductor light emitting device
US9953901B2 (en) 2008-03-11 2018-04-24 Rohm Co., Ltd. Semiconductor light emitting device and method for manufacturing the same
US10861778B2 (en) 2008-03-11 2020-12-08 Rohm Co., Ltd. Semiconductor light emitting device and method for manufacturing the same
US8921874B2 (en) 2008-03-11 2014-12-30 Rohm Co., Ltd. Semiconductor light emitting device and method for manufacturing the same
US11777068B2 (en) 2008-03-11 2023-10-03 Rohm Co., Ltd. Semiconductor light emitting device and method for manufacturing the same
US8633506B2 (en) 2008-03-11 2014-01-21 Rohm Co., Ltd. Semiconductor light emitting device and method for manufacturing the same
US9634212B2 (en) 2008-03-11 2017-04-25 Rohm Co., Ltd. Semiconductor light emitting device and method for manufacturing the same
US11444008B2 (en) 2008-03-11 2022-09-13 Rohm Co., Ltd. Semiconductor light emitting device and method for manufacturing the same
US10305009B2 (en) 2008-03-11 2019-05-28 Rohm Co., Ltd. Semiconductor light emitting device and method for manufacturing the same
US10446475B2 (en) 2008-03-11 2019-10-15 Rohm Co., Ltd. Semiconductor light emitting device and method for manufacturing the same
US9608187B2 (en) 2010-09-17 2017-03-28 Rohm Co., Ltd. Semiconductor light-emitting device, method for producing same, and display device
US10593846B2 (en) 2010-09-17 2020-03-17 Rohm Co., Ltd. Semiconductor light-emitting device, method for producing same, and display device
US9224915B2 (en) 2010-09-17 2015-12-29 Rohm Co., Ltd. Semiconductor light-emitting device, method for producing same, and display device
JP2019208033A (en) * 2012-05-09 2019-12-05 ローム株式会社 Light-emitting device
JP2013254937A (en) * 2012-05-09 2013-12-19 Rohm Co Ltd Semiconductor light emitting device
JP2020096091A (en) * 2018-12-13 2020-06-18 日亜化学工業株式会社 Light emitting device and method of manufacturing the same
US11702752B2 (en) * 2019-09-13 2023-07-18 Toyota Jidosha Kabushiki Kaisha Method for forming metal plating film

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