JP2001179268A - Substrate treatment apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus capable of preventing the corrosion of a drain route or the leakage of ozone gas by removing ozone from a waste liquid of an ozone-containing solution. SOLUTION: A substrate treatment apparatus is constituted of a treatment unit 2 for treating a substrate with ozone water and an ozone removing unit 3 for removing ozone from the ozone-containing waste liquid discharged from the treatment unit 2. The treatment unit 2 treats the substrate with ozone water supplied from an ozone water generating unit 7. The ozone removing unit 2 is provided in order to mix aqueous hydrogen peroxide supplied from a hydrogen peroxide storage tank 5 with the ozone-containing waste liquid discharged from the treatment unit 2 to decompose ozone in the waste liquid.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a substrate processing apparatus for processing a substrate such as a semiconductor wafer, a glass substrate for a liquid crystal display panel, or a mask substrate for a semiconductor manufacturing apparatus with an ozone-containing solution.

[0002]

2. Description of the Related Art Conventionally, in a cleaning process for cleaning a substrate, for the purpose of growing an oxide film, removing particles, removing metals, removing organic substances, etc., ozone water in which ozone is dissolved in pure water or ozone water in a chemical solution is used. The substrate is treated with an ozone-containing solution such as an ozone solution in which is dissolved. The concentration of the ozone-containing solution used in such a processing step is gradually increasing with the development of an ozone-containing solution manufacturing apparatus.

[0003]

In such a substrate processing apparatus using an ozone-containing solution, the ozone-containing solution used for processing the substrate is discharged as a drain. Since the drainage from the ozone-containing solution has a high reactivity, the piping and the packing constituting the drainage route are corroded by the drainage of the ozone-containing solution, and ozone gas leaks from the drainage route to adversely affect the environment. Or may be affected.

SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and it is an object of the present invention to remove ozone from a drain of an ozone-containing solution, thereby preventing corrosion of a drain passage and leakage of ozone gas. It is intended to provide a device.

[0005]

According to a first aspect of the present invention, there is provided a processing unit for processing a substrate with an ozone-containing solution, and an ozone removing unit for removing ozone from a wastewater containing ozone discharged from the processing unit. And characterized in that:

According to a second aspect of the present invention, in the first aspect of the invention, the ozone removing unit mixes an ozone decomposing agent for decomposing ozone into a waste liquid containing ozone discharged from the processing unit. It comprises an ozone decomposing unit that decomposes ozone in the effluent.

According to a third aspect of the present invention, in the second aspect of the present invention, hydrogen peroxide is used as the ozonolysis agent.

According to a fourth aspect of the present invention, in the second or third aspect of the present invention, an alkaline solution mixing for mixing an alkaline solution with a waste liquid containing ozone discharged from the processing unit. Means are further provided.

According to a fifth aspect of the present invention, in the fourth aspect of the present invention, a pH sensor for measuring a pH of a waste liquid containing ozone discharged from the processing unit is further provided, and the alkali solution mixing means is provided. When the measured value of the pH by the pH sensor is equal to or less than a certain value, an alkaline solution is mixed with the ozone-containing effluent discharged from the processing unit.

According to a sixth aspect of the present invention, in the first aspect of the present invention, the ozone removing unit dissolves a gas other than ozone into a waste liquid containing ozone discharged from the processing unit. And an ozone degassing unit for degassing ozone from the waste liquid.

[0011]

Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a schematic diagram of a substrate processing apparatus 1 according to a first embodiment of the present invention.

The substrate processing apparatus 1 includes a processing unit 2 for processing a substrate with ozone water as an ozone-containing solution.
And an ozone removal unit 3 for removing ozone from the wastewater containing ozone discharged from the processing unit 2. The processing unit 2 is connected to an ozone water generation unit 7 for producing ozone water. Further, the ozone removing unit 3 is connected to a hydrogen peroxide solution storage tank 5 for storing hydrogen peroxide solution.

The processing unit 2 has an overflow tank (not shown) for storing the ozone water supplied from the ozone water generation unit 7. In this processing unit, the ozone water supplied from the ozone water generation unit 2 is jetted from a supply pipe arranged at the bottom of the overflow tank toward the substrate in the overflow tank, and the substrate is subjected to a cleaning process by the ozone water. Is done. Then, the ozone water supplied to the processing of the substrate overflows from the upper end of the overflow tank, and is then sent to the ozone removal unit 3 as drainage.

On the other hand, the ozone removing unit 3 is an ozone decomposing unit that decomposes ozone in the effluent by mixing aqueous solution of ozone discharged from the processing unit 2 with hydrogen peroxide as an ozone decomposing agent. Consists of

FIG. 2 is a schematic diagram showing the configuration of the ozone removing unit 3. As shown in FIG.

The ozone removing unit 3 introduces an introduction path 32 for introducing a waste liquid containing ozone discharged from the processing unit 2 and a hydrogen peroxide solution stored in a hydrogen peroxide solution storage tank 5. And an introduction path 33 for the operation. The ends of these introduction paths 32 and 33 are arranged in the mixing chamber 31. Further, a mixing path 34 formed by a plurality of partition walls 35 is arranged on the side of the mixing chamber 31.
The end of the mixing path 34 is a discharge section 36 for discharging the waste liquid after the ozonolysis.

The waste liquid containing ozone discharged from the processing unit 2 is sent into the mixing chamber 31 via the introduction path 32. Then, the hydrogen peroxide solution stored in the hydrogen peroxide solution storage tank 5 is mixed into the drainage through the introduction path 33. The wastewater and hydrogen peroxide containing these ozone
Mixing is sufficiently performed while passing through the mixing path 34.

At the time of mixing the waste liquid containing ozone and the hydrogen peroxide solution, the ozone and the hydrogen peroxide react to decompose the ozone and the hydrogen peroxide into oxygen and water. For this reason, the highly reactive ozone hardly remains in the waste liquid discharged from the discharge part 36.

As described above, in the substrate processing apparatus 1 according to this embodiment, the ozone removal unit 3 decomposes ozone in the wastewater containing ozone discharged from the processing unit 2 and then decomposes it. With this configuration, it is possible to prevent corrosion of the drainage path and leakage of ozone gas.

Next, another embodiment of the present invention will be described. FIG. 3 is a schematic diagram of a substrate processing apparatus 1 according to the second embodiment of the present invention. In addition, about the member similar to 1st Embodiment mentioned above, the same code | symbol is attached | subjected and detailed description is abbreviate | omitted.

The substrate processing apparatus 1 according to the second embodiment
In this method, a substrate is treated with a mixed solution of ozone water and hydrofluoric acid as an ozone-containing solution. In the substrate processing apparatus 1, the processing unit 2 is connected to an ozone water generating unit 7 for producing ozone water and a hydrofluoric acid storage tank 9 for storing hydrofluoric acid. The ozone removal unit 3 is connected to a hydrogen peroxide storage tank 5 for storing hydrogen peroxide and an ammonia storage tank 8 for storing ammonia. Further, between the processing unit 2 and the ozone removing unit 3, a pH sensor 10 for measuring the pH (pH) of a waste liquid containing ozone discharged from the processing unit 2 is provided.

In the substrate processing apparatus 1 according to the second embodiment, the substrate is cleaned by an ozone-containing solution composed of a mixed solution of ozone water and hydrofluoric acid. Then, the ozone-containing solution provided for the processing of the substrate is sent to the ozone removing unit 3 as a waste liquid. At this time, the pH of the drainage containing ozone is measured by the pH sensor 10.

In the wastewater containing ozone sent to the ozone removing unit 3, as in the first embodiment, a hydrogen peroxide solution is mixed, and the ozone in the wastewater is decomposed.

At this time, if the pH value of the waste liquid containing ozone is 5.5 or less, the decomposition reaction of ozone by the action of the hydrogen peroxide solution does not sufficiently proceed. On the other hand, in the substrate processing apparatus 1 according to the second embodiment, since the substrate is treated with a mixed solution of ozone water and hydrofluoric acid, the pH value of the drainage liquid may be 5.5 or less. is there.

For this reason, in the substrate processing apparatus 1 according to the second embodiment, the pH
When the measured value of the pH is 5.5 or less, ammonia as an alkaline solution is supplied from the ammonia storage tank 8 to the ozone removing unit 3 so that the wastewater containing ozone and the ammonia are discharged. By adopting a configuration in which the pH value of the mixed solution is 5.5 or more, a configuration for promoting the ozone decomposition reaction is employed.

As the ammonia stored in the ammonia storage tank 8, a waste liquid of ammonia generated from the substrate processing line may be used. Further, an alkaline solution other than ammonia may be used.

If the pH value of the waste liquid composed of a mixed solution of ozone water and hydrofluoric acid is always 5.5 or less, the pH value of the waste liquid is not measured by the pH sensor 10 and the ammonia value is always measured. May be supplied.

Also in the substrate processing apparatus 1 according to the second embodiment, after the ozone in the wastewater containing the ozone discharged from the processing unit 2 is decomposed by the ozone removing unit 3, the ozone is discharged as the wastewater. Because it is a configuration,
Corrosion of the drainage path and leakage of ozone gas can be prevented.

Next, still another embodiment of the present invention will be described. FIG. 4 is a schematic diagram of a substrate processing apparatus 1 according to a third embodiment of the present invention. In addition, about the member similar to 1st and 2nd embodiment mentioned above, the same code | symbol is attached | subjected and detailed description is abbreviate | omitted.

The substrate processing apparatus 1 according to the third embodiment
Comprises a processing unit 2 for processing a substrate with ozone water as an ozone-containing solution, and an ozone removing unit 4 for removing ozone from a wastewater containing ozone discharged from the processing unit 2. The processing unit 2 comprises a first
As in the case of the embodiment, it is connected to an ozone water generation unit 7 for producing ozone water. On the other hand, the ozone removing unit 4 is connected to a supply source 6 of a nitrogen gas as an inert gas.

The processing unit 2 has a configuration similar to that of the first embodiment. On the other hand, the ozone removal unit 4 includes an ozone degassing unit that degass ozone from wastewater by dissolving nitrogen gas in wastewater containing ozone discharged from the processing unit 2.

FIG. 5 is a schematic diagram showing the configuration of the ozone removing unit 4. As shown in FIG.

The ozone removal unit 4 temporarily stores the ozone-containing waste liquid introduced from the introduction pipe 42 and the introduction passage 42 for introducing the ozone-containing waste liquid discharged from the processing unit 2. A storage tank 41, a bubbling nozzle 43 for bubbling the nitrogen gas supplied from the nitrogen gas supply source 6 into the wastewater containing ozone temporarily stored in the storage tank 41, and a gas from above the storage tank 41. An exhaust port 44 for discharging and a discharge unit 45 for discharging the drained liquid after ozone degassing are provided.

The waste liquid containing ozone discharged from the processing unit 2 is sent into the mixing chamber 31 through the introduction path 42 and is temporarily stored in the storage tank 41. Then, the nitrogen gas supplied from the nitrogen gas supply source 6 is supplied to the storage tank 4 through a bubbling nozzle 43 having a large number of nitrogen discharge holes.
1 is bubbled in the drainage temporarily stored.

As a result, the nitrogen gas dissolves in the waste liquid temporarily stored in the storage tank 41, and accordingly, ozone is degassed from the waste liquid. Ozone degassed from the wastewater, together with nitrogen gas that did not dissolve in the wastewater,
Air is exhausted through the exhaust port 44. Due to the ozone degassing effect of the nitrogen gas, highly reactive ozone hardly remains in the waste liquid discharged from the discharge part 45.

In this embodiment, nitrogen gas is used as a gas for degassing ozone, but any other gas can be used as long as it is a gas other than ozone. However, it is preferable to use an inert gas in consideration of safety and the like.

As described above, in the substrate processing apparatus 1 according to the third embodiment, after the ozone in the wastewater containing the ozone discharged from the processing unit 2 is degassed by the ozone removing unit 4, the ozone is removed. Is discharged as a liquid, it is possible to prevent corrosion of the liquid drain path and leakage of ozone gas.

[0038]

According to the first aspect of the present invention, there is provided a processing unit for processing a substrate with an ozone-containing solution, and an ozone removing unit for removing ozone from a wastewater containing ozone discharged from the processing unit. Therefore, by removing ozone from the drainage of the ozone-containing solution, it becomes possible to prevent corrosion of the drainage path and leakage of ozone gas.

According to the second aspect of the present invention, the ozone removing unit mixes the ozone-decomposing agent with the ozone-containing effluent discharged from the processing unit to decompose ozone in the effluent. With this configuration, ozone can be removed from wastewater containing ozone by decomposing ozone with a simple configuration.

According to the third aspect of the present invention, ozone can be decomposed by using a hydrogen peroxide solution frequently used in a substrate processing apparatus as an ozone decomposing agent.

According to the fourth aspect of the present invention, since an alkaline solution mixing means for mixing the alkaline solution with the ozone-containing waste liquid discharged from the processing unit is further provided, the pH of the ozone-containing waste liquid is adjusted. Even when the value is low, the decomposition reaction of ozone can be sufficiently promoted.

According to the fifth aspect of the present invention, there is further provided a pH sensor for measuring the pH of the wastewater containing ozone discharged from the processing unit, and the alkaline solution mixing means has a pH sensor.
Since the alkaline solution is mixed with the ozone-containing effluent discharged from the processing unit when the measured value of the pH by the sensor is equal to or less than a certain value, the alkaline solution is supplied only when necessary for promoting the decomposition reaction of ozone. It is possible to do.

According to the sixth aspect of the invention, the ozone removing unit dissolves a gas other than ozone into the wastewater containing ozone discharged from the processing unit, thereby degassing ozone from the wastewater. Since it is composed of the degassing unit, it is possible to remove ozone from the wastewater containing ozone by degassing ozone with a simple configuration.

[Brief description of the drawings]

FIG. 1 is a substrate processing apparatus 1 according to a first embodiment of the present invention.
FIG.

FIG. 2 is a schematic diagram showing a configuration of an ozone removing unit 3.

FIG. 3 shows a substrate processing apparatus 1 according to a second embodiment of the present invention.
FIG.

FIG. 4 shows a substrate processing apparatus 1 according to a third embodiment of the present invention.
FIG.

FIG. 5 is a schematic diagram showing a configuration of the ozone removing unit 4.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Substrate processing apparatus 2 Processing unit 3 Ozone removal unit 4 Ozone removal unit 5 Hydrogen peroxide water storage tank 6 Nitrogen gas supply source 7 Ozone water generation unit 8 Ammonia storage tank 9 Hydrofluoric acid storage tank 10 pH sensor 31 Mixing chamber 32 Introduction Path 33 Introducing path 34 Mixing path 35 Partition wall 36 Discharging part 41 Storage tank 42 Introducing path 43 Bubbling nozzle 44 Exhaust port 45 Discharging part

 ────────────────────────────────────────────────── ─── Continuing on the front page (72) Inventor Noriyuki Hayashi 4-chome Tenjin Kitamachi 1-chome, Horikawa-dori-Terauchi, Kamigyo-ku, Kyoto F-term in the Dainippon Screen Mfg. Co., Ltd. 4D037 AA13 AB11 BA23 BB05 4D050 AA13 AB32 BB09 BC10 BD02 BD08 CA13 5F043 BB27 DD30 EE06 EE27 EE32 EE33 EE37 EE40 GG10

Claims (6)

[Claims] 1. A substrate processing apparatus, comprising: a processing unit for processing a substrate with an ozone-containing solution; and an ozone removing unit for removing ozone from a wastewater containing ozone discharged from the processing unit. 2. The substrate processing apparatus according to claim 1, wherein the ozone removing unit mixes an ozone decomposing agent that decomposes ozone into a waste liquid containing ozone discharged from the processing unit, so that the ozone removing unit mixes the waste water with the ozone decomposing agent. A substrate processing apparatus that is an ozone decomposing unit that decomposes ozone. 3. The substrate processing apparatus according to claim 2, wherein the ozonolysis agent is a hydrogen peroxide solution. 4. The substrate processing apparatus according to claim 2, further comprising an alkaline solution mixing means for mixing an alkaline solution with a waste liquid containing ozone discharged from the processing unit. Substrate processing equipment. 5. The substrate processing apparatus according to claim 4, wherein the drainage liquid containing ozone discharged from the processing unit is p.
Further comprising a pH sensor for measuring H;
A substrate processing apparatus for mixing an alkaline solution with a wastewater containing ozone discharged from the processing unit when a measured value of H is equal to or less than a predetermined value. 6. The substrate processing apparatus according to claim 1, wherein the ozone removing unit dissolves a gas other than ozone into a wastewater containing ozone discharged from the processing unit, thereby removing the wastewater from the wastewater. A substrate processing apparatus that is an ozone degassing unit that degass ozone.