JPH0910712A - Method and device for wet treatment - Google Patents

Abstract

PURPOSE: To provide a wet treatment method and a wet treatment device which minimizes the consumptions chemicals and ultrapure water, can treat a waste liquid easily without needing a high temperature process, and also can remove hydrocarbons at an extremely high efficiency. CONSTITUTION: This wet treatment method is to treat a component part to be treated in a solution such as a semiconductor substrate, a glass substrate, an electronic part or a part for a manufacturing device for these component parts, using ultrapure water containing ozone or together with a trace of rare gas. In addition, the component parts are treated in a solution with a concurrent action to irradiate them with an ultrasonic wave at 20kHz or higher.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION The present invention is required to obtain an extremely clean surface such as a semiconductor substrate or a glass substrate for a liquid crystal display device, and particularly to obtain a completely hydrocarbon-free surface at room temperature. The present invention relates to a wet processing method and a processing apparatus for an object to be processed such as an electronic component.

[0002]

2. Description of the Related Art Conventionally, as a method for cleaning the above-mentioned object to be wet-processed, an RCA cleaning method and an RCA cleaning method which is performed while irradiating ultrasonic waves are known. However, the above cleaning methods and have the following problems. A large amount of chemicals and ultrapure water are used.

This results in a high temperature process. Waste liquid treatment is difficult. It is difficult to remove hydrocarbons. On the other hand, although APM and SPM have been used for removing hydrocarbons, complete removal of hydrocarbons was impossible. In the prior art, since high-temperature thermal oxidation was performed, some residual hydrocarbons were decomposed into CO ₂ in the high-temperature thermal oxidation process and the problem did not surface.
Hydrocarbon pollution is becoming more and more focused as low temperature processes are increasingly introduced.

Conventionally, ultrasonic waves typified by megasonics have been widely used for the purpose of removing particles. However, if ultrasonic power is increased, the effect of removing particles is improved, but the physical properties of ultrasonic waves are increased. The device pattern was damaged due to force (shock wave and acceleration due to cavitation generation), so the power is actually reduced. The lower the power, the worse the removal rate of hydrocarbons.

[0005]

DISCLOSURE OF THE INVENTION The present invention uses a small amount of chemicals and ultrapure water and does not undergo a high temperature process.
It is an object of the present invention to provide a wet treatment method and a wet treatment apparatus that can easily treat a waste liquid and have an extremely high hydrocarbon removal rate.

[0006]

SUMMARY OF THE INVENTION The gist of the present invention is that a wet-processed object such as a semiconductor substrate, a glass substrate, an electronic component and a component for manufacturing these components contains ozone or ozone and a trace amount of a rare gas in water. There is a method of treating with ultrapure water, which is characterized in that the object to be treated is wet-treated while irradiating it with ultrasonic waves of 20 kHz or more.

Another aspect of the present invention is an ultrapure water producing apparatus for removing at least impurities in water, and ozone or ozone and a rare gas for dissolving ozone or ozone and a rare gas in the ultrapure water. Gas dissolving means, ultrasonic irradiating means for irradiating dissolved ozone or ozone and rare gas dissolved water with ultrasonic waves of 20 kHZ or more, and wet object to be cleaned with ultrasonic wave irradiating dissolved ozone or ozone and rare gas water A wet processing unit comprising a wet processing unit for processing, a seal structure for preventing gas components such as oxygen, nitrogen and carbon dioxide from entering the atmosphere, and a pipe system connecting them. Exists in.

[0008]

[Function] When ultra-pure ozone water is irradiated with megasonics, F
It is possible to remove carbon up to the detection limit with T-1R. He, Ne, Ar, Kr, X in ozone ultrapure water
When a small amount of the rare gas of e is mixed, a great effect of removing hydrocarbon is obtained along with the generation of hydrogen radicals.

Therefore, even if the ultrasonic power is lowered to the minimum level at which particles can be removed and the device is not damaged, it is possible to completely remove hydrocarbons at room temperature, chemicals and ultrapure water. The efficiency of ultrasonic energy utilization is improved by adding a rare gas. Furthermore, in addition to the significant generation of hydrogen radicals and the simple vibration effect, the cluster of water itself is broken into smaller pieces, which reduces the viscosity of water and improves the effect up to the microstructured parts of the chip. Although it is known that the removal effect can be improved by additionally using ultrasonic waves represented by megasonics.

[0010]

According to the present invention, the following various effects are achieved. The amount of chemicals and ultrapure water used is small. It is a low temperature process. Waste liquid treatment is easy.

Hydrocarbons can be removed very efficiently.

Claims (21)

[Claims] 1. A method for treating an object to be wet-processed such as a semiconductor substrate, a glass substrate, an electronic component and a component for manufacturing these thereof with ultrapure water containing ozone or ozone and a trace amount of a rare gas in water. A wet treatment method characterized by subjecting an object to be treated to wet treatment while irradiating ultrasonic waves of 20 kHz or higher. 2. The dissolved ozone concentration of the dissolved ozone water is 2
The wet treatment method according to claim 1, which is at least ppm. 3. The wet treatment method according to claim 1, wherein the raw water of the dissolved rare gas water dissolves at least 0.01 ppm or more of at least one kind of rare gas. 4. A means for dissolving ozone in ultrapure water reduces the ozone ions in the raw water by electrolyzing the raw water of the dissolved ozone water to generate ozone, and at the same time, ozone in the raw water. The wet treatment method according to any one of claims (1) to (3), wherein the wet treatment method is performed by a means for dissolving. 5. A means for dissolving ozone or ozone and rare gas in ultrapure water injects ozone gas or ozone and rare gas from outside the system through a gas permeable film to dissolve ozone or ozone and rare gas. The method according to any one of claims (1) to (4), characterized in that it is by means of means. 6. The means for dissolving ozone or ozone and a rare gas in ultrapure water is a means for dissolving ozone gas or ozone and a rare gas by bubbling from outside the system into the raw water. Claim (1) to
(5) The wet treatment method described in 7. A means for dissolving ozone or ozone and a noble gas in ultrapure water electrolyzes raw water of the dissolved ozone water to reduce ozone ions in the raw water to generate ozone, and at the same time. A means for dissolving ozone in the raw water is provided, wherein the method is characterized in that (1) to
(6) The wet treatment method described in 8. The dissolved ozone or the raw water of ozone and rare gas water contains at least 10 ppm of dissolved gas other than rare gas.
The wet treatment method according to any one of claims 1 to 7, wherein the water is degassed as described below. 9. A method of degassing a dissolved gas other than a rare gas in the raw water of the dissolved ozone or ozone and a rare gas water,
The wet treatment method according to any one of claims 1 to 8, which is a method of degassing under vacuum through a gas permeable film. 10. The wet processing method according to any one of claims 1 to 9, wherein the dissolved gas is oxygen. 11. The wet treatment method according to any one of claims 1 to 10, wherein the dissolved gas is nitrogen. Noble gas type 12. The method according to claim 1, wherein at least one of the rare gases is Xe.
1) The wet treatment method described above. 13. The method according to claim 1, wherein at least one kind of the rare gas is Kr.
1) The wet treatment method described above. 14. The (1) to (1), wherein at least one kind of the rare gas is Ar.
1) The wet treatment method described above. 15. The method according to claim 1, wherein at least one kind of the rare gas is Ne.
1) The wet management method described. 16. The method according to claim 1, wherein at least one kind of the rare gases is He.
1) The wet processing method and processing apparatus according to 1). Ultrasonic irradiation means 17. The wet treatment method is a wet treatment method carried out in a state in which a material to be wetted is immersed in a container for storing or circulating the dissolved ozone or ozone and rare gas water, and the ultrasonic wave irradiating means. Irradiating the dissolved ozone or ozone and rare gas water in a state where the article to be wet treated is immersed in the container.
~ The wet treatment method according to (16). 18. The wet treatment method is a wet treatment method in which the dissolved ozone or ozone and rare gas water are continuously sprayed or dropped from a predetermined nozzle toward the object to be wet treated. The wet according to any one of claims 1 to 16, wherein the ultrasonic wave irradiating unit irradiates the dissolved ozone or ozone and the rare gas water in at least a part of the piping system at least upstream of the predetermined nozzle. Processing method and processing apparatus. 19. The wet treatment method is a wet treatment method performed in a state in which a material to be wetted is immersed in a container for storing or circulating the dissolved ozone or ozone and rare gas water, wherein the ultrasonic wave irradiating means is used. Irradiating the dissolved ozone or ozone and rare gas water with the article to be wetted immersed in the container.
~ The wet treatment method according to (16). 20. The wet treatment method is a wet treatment method in which the dissolved ozone or ozone and rare gas water are continuously jetted or dropped from a predetermined nozzle toward a target object to be treated, The wet treatment method according to any one of claims 1 to 16, wherein the sound wave irradiates the dissolved ozone or ozone and noble gas water in at least a part of the piping system at least upstream of the predetermined nozzle. Processing equipment. 21. An apparatus for producing ultrapure water for removing at least impurities in water, ozone or ozone and rare gas dissolving means for dissolving ozone or ozone and a rare gas in the ultrapure water, dissolved ozone or 20 for ozone and rare gas dissolved water
an ultrasonic wave irradiating means for irradiating an ultrasonic wave of kHZ or higher, and a wet processing part for performing a wet process on an object to be cleaned with dissolved ozone or ozone and an rare gas water irradiated with the ultrasonic wave,
And a seal structure for preventing gas components such as oxygen, nitrogen, and carbon dioxide from entering the atmosphere, and a pipe system for connecting them.