JP2001171249A5 - - Google Patents

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Publication number
JP2001171249A5
JP2001171249A5 JP2000315953A JP2000315953A JP2001171249A5 JP 2001171249 A5 JP2001171249 A5 JP 2001171249A5 JP 2000315953 A JP2000315953 A JP 2000315953A JP 2000315953 A JP2000315953 A JP 2000315953A JP 2001171249 A5 JP2001171249 A5 JP 2001171249A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000315953A
Other languages
Japanese (ja)
Other versions
JP2001171249A (ja
JP4820482B2 (ja
Filing date
Publication date
Priority claimed from US09/419,680 external-priority patent/US6294308B1/en
Application filed filed Critical
Publication of JP2001171249A publication Critical patent/JP2001171249A/ja
Publication of JP2001171249A5 publication Critical patent/JP2001171249A5/ja
Application granted granted Critical
Publication of JP4820482B2 publication Critical patent/JP4820482B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2000315953A 1999-10-15 2000-10-16 画像固定を利用した熱画像形成方法および製品 Expired - Fee Related JP4820482B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/419,680 US6294308B1 (en) 1999-10-15 1999-10-15 Thermal imaging process and products using image rigidification
US09/419680 1999-10-15

Publications (3)

Publication Number Publication Date
JP2001171249A JP2001171249A (ja) 2001-06-26
JP2001171249A5 true JP2001171249A5 (https=) 2007-12-06
JP4820482B2 JP4820482B2 (ja) 2011-11-24

Family

ID=23663291

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000315953A Expired - Fee Related JP4820482B2 (ja) 1999-10-15 2000-10-16 画像固定を利用した熱画像形成方法および製品

Country Status (5)

Country Link
US (3) US6294308B1 (https=)
EP (3) EP1634720B1 (https=)
JP (1) JP4820482B2 (https=)
AU (1) AU780111B2 (https=)
DE (3) DE60026245T2 (https=)

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KR101058977B1 (ko) * 2002-05-13 2011-08-23 이 아이 듀폰 디 네모아 앤드 캄파니 내구성 어셈블리지를 제공하는 화상형성 방법 및 생산물
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JP2007525011A (ja) * 2003-06-26 2007-08-30 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 基材上に充填誘電体材料のパターンを形成するための方法
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US8652574B2 (en) * 2010-01-19 2014-02-18 Xerox Corporation Ink compositions
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US9645502B2 (en) * 2011-04-08 2017-05-09 Asml Netherlands B.V. Lithographic apparatus, programmable patterning device and lithographic method
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