JP2001153564A - Continuous heating furnace for substrate, utilizing radiant tube burner - Google Patents

Continuous heating furnace for substrate, utilizing radiant tube burner

Info

Publication number
JP2001153564A
JP2001153564A JP2000278816A JP2000278816A JP2001153564A JP 2001153564 A JP2001153564 A JP 2001153564A JP 2000278816 A JP2000278816 A JP 2000278816A JP 2000278816 A JP2000278816 A JP 2000278816A JP 2001153564 A JP2001153564 A JP 2001153564A
Authority
JP
Japan
Prior art keywords
heating
furnace
temperature
radiant tube
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000278816A
Other languages
Japanese (ja)
Inventor
Hifuo Noiri
一二夫 野入
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NGK Insulators Ltd
Original Assignee
NGK Insulators Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NGK Insulators Ltd filed Critical NGK Insulators Ltd
Priority to JP2000278816A priority Critical patent/JP2001153564A/en
Publication of JP2001153564A publication Critical patent/JP2001153564A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a continuous heating furnace, capable of facilitating mass production, by a method wherein an energy cost is reduced while securing a temperature control accuracy required for the drying and firing of a substrate. SOLUTION: The continuous heating furnace for a substrate is provided with a plurality of heating chambers, having heating means at the upper part and the lower part of the same as well as a transfer means for transferring a matter to be heated into a neighboring heating chamber, and is constituted so as to be capable of effecting pre-heating, temperature raising, even heat retaining and cooling in accordance with a desired temperature curve by controlling the temperatures of respective heating chambers individually so that a substrate temperature enters within a predetermined temperature range. In the heating furnace 30, radiant tube burners 20 are employed for at least one side of the heating means at the upper part and the lower part of respective heating chambers 1-18 while electric heaters 21 are employed for the remaining heating means.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】 本発明は、プラズマディス
プレイパネル用ガラス基板等の基板を加熱するための連
続加熱炉に関する。
[0001] The present invention relates to a continuous heating furnace for heating a substrate such as a glass substrate for a plasma display panel.

【0002】[0002]

【従来の技術】 近年、壁掛けテレビやマルチメディア
用ディスプレイとして利用できる大画面フラットパネル
ディスプレイ(以下、「FPD」という。)の実用化が
着々と進行しつつある。このような大画面FPDとして
は、自発光型で広い視野角を持ち、品質表示が良いとい
う品質面のメリットと、作製プロセスが簡単で大型化が
容易という製造面でのメリットを兼ね備えた、プラズマ
ディスプレイパネル(以下、「PDP」という。)が最
有力候補として挙げられている。
2. Description of the Related Art In recent years, large-screen flat panel displays (hereinafter, referred to as “FPDs”) that can be used as wall-mounted televisions and multimedia displays have been steadily put into practical use. Such a large-screen FPD is a self-luminous type having a wide viewing angle and good quality display, and has a quality advantage of a plasma manufacturing method that has a simple manufacturing process and is easy to increase in size. A display panel (hereinafter, referred to as “PDP”) is listed as a leading candidate.

【0003】 PDPの製造は、例えば図3に示すよう
に、前面ガラス、背面ガラスと称する大型ガラス基板の
表面に、印刷、乾燥、焼成の工程を複数回繰り返す厚膜
法により、電極、誘導体、蛍光体等の種々の部材を逐次
形成して行き、最終的に前面ガラスと背面ガラスとを封
着することにより行われる。
As shown in FIG. 3, for example, a PDP is manufactured by using a thick film method in which printing, drying, and firing steps are repeated a plurality of times on the surface of a large glass substrate called a front glass or a rear glass, by using a thick film method. This is performed by sequentially forming various members such as phosphors and finally sealing the front glass and the rear glass.

【0004】 この場合において、ガラス基板の乾燥と
焼成は、炉内環境をクリーンに保つとともに、ガラス基
板の表面温度ができる限り均一となるように精密に温度
制御した状態で行うことが要求される。ガラス基板表面
の温度分布が大きい状態で乾燥、焼成を行うと、基板や
基板上に形成した部材が歪むことに起因して、割れ、欠
け等の欠陥を生じ、製品の歩留まりが低下する等の不具
合を生じるからである。
[0004] In this case, it is required that the drying and firing of the glass substrate be performed in a state where the environment in the furnace is kept clean and the temperature of the glass substrate is precisely controlled so as to be as uniform as possible. . When drying and baking are performed in a state where the temperature distribution on the surface of the glass substrate is large, defects such as cracks, chips, and the like occur due to distortion of the substrate and the members formed on the substrate, and the yield of the product is reduced. This is because a defect occurs.

【0005】 このため、従来、PDPに使用されるガ
ラス基板のような大型の基板の乾燥、焼成は、セラミッ
クファイバーモールド内にFe-Cr-Al系の電熱コイ
ルを埋め込んだ構造の電気ヒーターを加熱手段として有
する複数の加熱室と、隣接する加熱室へ被加熱体を搬送
するための搬送手段とを備えた連続加熱炉を使用し、基
板温度が所定の温度範囲に入るよう各加熱室を個別に温
度制御することにより、所望の温度曲線に従って、予
熱、昇温、均熱保持及び冷却する方法で行われてきた。
加熱手段として使用される電気ヒーターは、通常、各加
熱室の上部(炉天井)と下部(炉床)とに、マトリック
ス状に複数に分割された状態で配置され、基板表面の温
度分布が所定の範囲に収まるように、分割された各ヒー
ターを個別に温度制御していた。
For this reason, conventionally, drying and firing of a large substrate such as a glass substrate used for a PDP is performed by heating an electric heater having a structure in which an Fe—Cr—Al-based electric heating coil is embedded in a ceramic fiber mold. A continuous heating furnace equipped with a plurality of heating chambers as means and a transfer means for transferring an object to be heated to an adjacent heating chamber is used, and each heating chamber is individually set so that the substrate temperature falls within a predetermined temperature range. By controlling the temperature in accordance with a desired temperature curve, preheating, heating, soaking, and cooling have been performed.
Electric heaters used as heating means are usually arranged in a matrix at the upper part (furnace ceiling) and the lower part (furnace floor) of each heating chamber so that the temperature distribution on the substrate surface is a predetermined value. The temperature of each of the divided heaters was individually controlled so as to fall within the range.

【0006】[0006]

【発明が解決しようとする課題】 ところで、今後、P
DPを普及させるにあたっては、そのブラウン管に比し
て高いコストを下げることと、量産性を向上させること
とが当面の課題となっている。しかしながら、炉の全域
において加熱手段に電気ヒーターを用いた従来の加熱炉
では、エネルギーコストが高くなるとともに、大掛かり
な工場用設備電源が必要になるため、前記課題を解決す
ることが困難である。
[Problems to be solved by the invention] By the way, P
In disseminating the DP, it is an immediate task to reduce the cost higher than the CRT and to improve the mass productivity. However, in a conventional heating furnace using an electric heater as a heating means in the entire area of the furnace, energy costs are increased and a large-scale power supply for a factory is required, so that it is difficult to solve the above problem.

【0007】 本発明は、このような従来の事情に鑑み
てなされたものであり、その目的とするところは、PD
Pに使用されるガラス基板のような大型の基板の乾燥、
焼成に要求される温度管理精度と炉内環境のクリーン度
を確保しつつ、エネルギーコストを下げ、大量生産をよ
り容易とすることが可能な基板用連続加熱炉を提供する
ことにある。
The present invention has been made in view of such a conventional situation, and an object thereof is to provide a PD
Drying of large substrates such as glass substrates used for P,
An object of the present invention is to provide a continuous heating furnace for a substrate capable of lowering energy costs and facilitating mass production while securing temperature control accuracy and cleanness of a furnace environment required for firing.

【0008】[0008]

【課題を解決するための手段】 本発明によれば、上部
と下部とに加熱手段を有する複数の加熱室と、隣接する
加熱室へ被加熱体を搬送するための搬送手段とを備え、
基板温度が所定の温度範囲に入るよう各加熱室を個別に
温度制御することにより、所望の温度曲線に従って、予
熱、昇温、均熱保持及び冷却を行えるように構成された
基板用の連続加熱炉であって、予熱と昇温とを行う予熱
・昇温域の加熱室には、上部と下部の加熱手段の少なく
とも一方にラジアントチューブバーナーを使用し、同加
熱室の残りの加熱手段に電気ヒーターを使用したことを
特徴とするラジアントチューブバーナーを利用した基板
用連続加熱炉、が提供される。
Means for Solving the Problems According to the present invention, there are provided a plurality of heating chambers having heating means at an upper part and a lower part, and conveying means for conveying an object to be heated to an adjacent heating chamber,
By individually controlling the temperature of each heating chamber so that the substrate temperature falls within a predetermined temperature range, continuous heating for the substrate configured to perform preheating, heating, soaking, and cooling according to a desired temperature curve. In the heating chamber in the preheating / heating zone where preheating and heating are performed, a radiant tube burner is used in at least one of the upper and lower heating means, and the remaining heating means in the heating chamber are electrically powered. A continuous heating furnace for a substrate using a radiant tube burner characterized by using a heater is provided.

【0009】[0009]

【発明の実施の形態】 前記のように、本発明の基板用
連続加熱炉は、予熱と昇温とを行う予熱・昇温域の加熱
室については、上部と下部の加熱手段の少なくとも一方
にラジアントチューブバーナーを使用し、従来は加熱手
段の全てに使用していた電気ヒーターを同加熱室の残り
の部分にのみ使用するようにした。このように、予熱・
昇温域の加熱室の加熱手段の半数以上にランニングコス
トの安いラジアントチューブバーナーを使用することに
より、炉全体としてのエネルギーコストを半減させるこ
とが可能となる。また、電気ヒーターを部分的に用いる
ようにしたことで、従来のような大掛かりな工場用電源
設備を準備する必要が無くなり、大量生産がより容易と
なる。
As described above, in the continuous heating furnace for a substrate according to the present invention, a heating chamber in a preheating / heating region for performing preheating and temperature rising is provided in at least one of upper and lower heating means. A radiant tube burner was used, and the electric heater which was conventionally used for all the heating means was used only for the rest of the heating chamber. Thus, preheating
By using a radiant tube burner with a low running cost for more than half of the heating means in the heating chamber in the temperature increasing region, it is possible to reduce the energy cost of the entire furnace by half. In addition, since the electric heater is partially used, it is not necessary to prepare a large-scale factory power supply equipment as in the related art, and mass production becomes easier.

【0010】 更に、ラジアントチューブバーナーは、
燃焼がチューブ内で行われるので、PDP用大型ガラス
基板等の乾燥や焼成に必要な炉内環境のクリーン度を容
易に確保することができる。更にまた、ラジアントチュ
ーブバーナーは二酸化炭素(CO2)の排出量が電気ヒ
ーターに比して少ないので、今後問題になると予想され
るCO2排出量の点でも有利である。
Further, the radiant tube burner is
Since the combustion is performed in the tube, the cleanness of the furnace environment required for drying and firing the large glass substrate for PDP can be easily ensured. Furthermore, since the radiant tube burner emits less carbon dioxide (CO 2 ) than the electric heater, the radiant tube burner is also advantageous in terms of CO 2 emission which is expected to become a problem in the future.

【0011】 なお、本発明においては、以下の例に示
すように、予熱と昇温とを行う予熱・昇温域の加熱室に
ついては、上部と下部との両方の加熱手段にラジアント
チューブバーナーを使用し、均熱保持を行う均熱保持域
の加熱室及び徐冷を行う冷却域の加熱室については、上
部の加熱手段に電気ヒーターを使用し、同加熱室の下部
の加熱手段にラジアントチューブバーナー又は電気ヒー
ターを使用することが好ましい。
In the present invention, as shown in the following example, a radiant tube burner is provided for both upper and lower heating means in a preheating / heating area heating chamber for performing preheating and heating. For the heating chamber in the soaking zone and the cooling zone in the cooling zone for slow cooling, an electric heater is used for the upper heating means and a radiant tube is used for the lower heating means of the heating chamber. It is preferred to use a burner or an electric heater.

【0012】 図1は、本発明に係る連続加熱炉の構造
の一例をPDP用大型ガラス基板の焼成時の温度曲線
(ヒートパターン)に対応させて示した概略説明図であ
る。本例の連続加熱炉30は、1〜18の18個の加熱
室を備え、これらのうち1〜5が予熱と昇温とを行う予
熱・昇温域の加熱室、6〜10が均熱保持を行う均熱保
持域の加熱室、残る11〜18が徐冷を行う冷却域の加
熱室である。
FIG. 1 is a schematic explanatory view showing an example of the structure of a continuous heating furnace according to the present invention in correspondence with a temperature curve (heat pattern) at the time of firing a large glass substrate for PDP. The continuous heating furnace 30 of the present example includes 18 heating chambers 1 to 18, of which 1 to 5 are heating chambers in a preheating / heating zone where preheating and heating are performed, and 6 to 10 are soaking chambers. The remaining heating chambers in the soaking zone for maintaining the temperature and the remaining heating zones 11 to 18 are the heating chambers in the cooling zone for performing the slow cooling.

【0013】 被加熱体である大型ガラス基板は、セッ
ター等に載置された状態で連続加熱炉の入口から炉内に
送り込まれ、搬送手段によって出口側に隣接する加熱室
へと順次搬送される。前記の各加熱室1〜18は、それ
ぞれその上部(炉天井)と下部(炉床)とに加熱手段を
有し、これら加熱手段の制御系にて、基板温度が所定の
温度範囲に入るよう各加熱室を個別に温度制御すること
により、所望の温度曲線に従って、大型ガラス基板の予
熱、昇温、均熱保持及び冷却を行えるようになってい
る。なお、予熱・昇温域、均熱保持域、冷却域の各々の
加熱室の個数及び全体の加熱室の個数は特に制限される
ものではない。
The large glass substrate as the object to be heated is sent from the inlet of the continuous heating furnace into the furnace while being placed on a setter or the like, and is sequentially conveyed to the heating chamber adjacent to the outlet side by the conveying means. . Each of the above-mentioned heating chambers 1 to 18 has a heating means at an upper part (furnace ceiling) and a lower part (furnace floor), respectively, and a control system of these heating means makes a substrate temperature fall within a predetermined temperature range. By individually controlling the temperatures of the respective heating chambers, it is possible to preheat, raise the temperature, maintain a uniform temperature, and cool the large glass substrate according to a desired temperature curve. The number of heating chambers in the preheating / heating zone, the soaking zone, and the cooling zone and the total number of heating chambers are not particularly limited.

【0014】 また、前記搬送手段には、隣接する加熱
室へ被加熱体を間欠的に搬送する間欠送り方式の搬送手
段を用いることが好ましい。ここで、「間欠的に搬送す
る」とは、入口側からn番目の加熱室にて被加熱体を静
止させて所定時間加熱を行った後、当該被加熱体を可及
的速やかに隣接する入口からn+1番目の加熱室に移動
し、再び被加熱体を静止させて所定時間加熱を行うとい
う操作を繰り返す搬送方法をいう。このような搬送方法
が可能な限りにおいて、搬送手段の種類は特に限定され
ず、例えばウォーキングビームを用いたり、ローラーや
コンベアを間欠的に駆動させてもよい。
Further, it is preferable to use an intermittent feeding type conveying means for intermittently conveying the object to be heated to an adjacent heating chamber. Here, “convey intermittently” means that the object to be heated is kept stationary in the n-th heating chamber from the entrance side and heated for a predetermined time, and then the object to be heated adjoins as quickly as possible. This is a transport method in which the operation of moving from the entrance to the (n + 1) th heating chamber, heating the object to be stopped again, and heating for a predetermined time is repeated. The type of the transporting means is not particularly limited as long as such a transporting method is possible. For example, a walking beam may be used, or a roller or a conveyor may be intermittently driven.

【0015】 本例では、予熱・昇温域の加熱室1〜5
については、上部と下部との両方の加熱手段にラジアン
トチューブバーナー20を使用し、均熱保持域の加熱室
6〜10及び冷却域の加熱室11〜18については、上
部の加熱手段に電気ヒーター21、下部の加熱手段にラ
ジアントチューブバーナー20をそれぞれ使用してい
る。
In the present embodiment, heating chambers 1 to 5 in a preheating / heating region
The radiant tube burner 20 is used for both the upper and lower heating means, and the heating chambers 6 to 10 in the soaking zone and the heating chambers 11 to 18 in the cooling area are electrically heated by the upper heater. 21, a radiant tube burner 20 is used for the lower heating means.

【0016】 PDPに使用されるガラス基板のような
大型の基板の乾燥や焼成は、前述のとおり、基板表面の
温度ができる限り均一になるように、精密に温度制御し
た状態で行うことを要求されるが、実際には、加熱の全
行程において同等の精密さが要求されるわけではなく、
均熱保持及び徐冷の際に比して、予熱、昇温の際に求め
られる温度管理の精度は幾分緩やかである。
As described above, drying and baking of a large-sized substrate such as a glass substrate used for a PDP must be performed in a state where the temperature of the substrate surface is precisely controlled so as to be as uniform as possible. However, in practice, equal precision is not required for all heating steps,
The accuracy of temperature control required for preheating and temperature raising is somewhat less strict than for soaking and gradual cooling.

【0017】 具体的には、50〜60インチのPDP
用大型ガラス基板の基板表面の各部分における最高温度
と最低温度との許容される温度差Δtは、常温〜500
℃の予熱・昇温域ではΔ20℃以内、500〜600℃
の均熱保持域ではΔ6℃以内、望ましくはΔ3℃以内、
600〜400℃の冷却域ではΔ6℃以内となってい
る。
Specifically, a PDP of 50 to 60 inches
Temperature difference Δt between the maximum temperature and the minimum temperature at each part of the substrate surface of the large glass substrate for
Within 2020 ° C, 500-600 ° C in preheating / heating region of ℃
In the soaking zone, within Δ6 ° C, preferably within Δ3 ° C,
In the cooling range of 600 to 400 ° C., the temperature is within Δ6 ° C.

【0018】 そこで、本例においては、求められる温
度管理の精度が比較的緩やかで、かつ、最もエネルギー
を消費する予熱・昇温域の加熱室1〜5については、電
気ヒーターに比して温度管理の精度は劣るものの加熱に
要するランニングコストが安いラジアントチューブバー
ナー20を上部及び下部の両方の加熱手段に使用するこ
とにした。また、厳しい温度管理精度が求められる均熱
保持域の加熱室6〜10と冷却域の加熱室11〜18に
ついては、上部の加熱手段にのみ電気ヒーター21を使
用し、下部の加熱手段には予熱・昇温域の加熱室と同様
にラジアントチューブバーナー20を使用することとし
た。
Therefore, in the present embodiment, the required accuracy of the temperature management is relatively moderate, and the heating chambers 1 to 5 in the preheating / heating region, which consume the most energy, have a higher temperature than the electric heater. The radiant tube burner 20, which is inferior in management accuracy but has low running cost required for heating, is used for both upper and lower heating means. In addition, for the heating chambers 6 to 10 in the soaking zone and the heating chambers 11 to 18 in the cooling zone where strict temperature control accuracy is required, the electric heater 21 is used only for the upper heating means, and the lower heating means is used for the lower heating means. The radiant tube burner 20 was used similarly to the heating chamber in the preheating / heating region.

【0019】 この均熱保持域の加熱室6〜10と冷却
域の加熱室11〜18においては、下部のラジアントチ
ューブバーナー20で大まかな加熱を行いつつ、上部の
電気ヒーター21で細かな温度制御を行うことにより、
基板の乾燥や焼成に必要な温度管理精度を確保する。
In the heating chambers 6 to 10 in the soaking zone and the heating chambers 11 to 18 in the cooling zone, the lower radiant tube burner 20 performs rough heating while the upper electric heater 21 performs fine temperature control. By doing
Ensure the temperature control accuracy required for drying and firing the substrate.

【0020】 図2は、予熱・昇温域における加熱室の
一例を示す概略説明図である。加熱室は隔壁23によっ
て仕切られている。当該隔壁23は、セッター24に載
置した基板25を隣接する加熱室へ搬送するときに、基
板25の搬送に差し支えない最小の開口部を有すること
が好ましい。また、本発明においては、予熱・昇温域の
加熱室の加熱手段に使用しているラジアントチューブバ
ーナー20を、加熱室の中心部よりも炉の入口側に設置
することが好ましい。
FIG. 2 is a schematic explanatory view showing an example of a heating chamber in a preheating / heating region. The heating chamber is partitioned by a partition 23. The partition 23 preferably has a minimum opening that does not hinder the transfer of the substrate 25 when the substrate 25 placed on the setter 24 is transferred to an adjacent heating chamber. Further, in the present invention, it is preferable that the radiant tube burner 20 used as a heating means of the heating chamber in the preheating / heating zone be installed on the inlet side of the furnace with respect to the center of the heating chamber.

【0021】 すなわち、予熱・昇温域においては、炉
の入口に近い加熱室ほど低温に設定されており、また、
各加熱室にはより低温の加熱室から被加熱体が搬送され
てくるため、隣接する加熱室の温度の影響を受けて、各
加熱室内は入口側の温度が低く、出口側の温度が高くな
る傾向にある。前記のように、ラジアントチューブバー
ナー20を、加熱室の中心部よりも炉の入口側に設置し
て、低温となりやすい各加熱室の入口側に加熱源を近づ
けることにより、各加熱室内の温度分布を小さくするこ
とができる。
That is, in the preheating / heating region, the temperature of the heating chamber closer to the inlet of the furnace is set lower, and
Since the object to be heated is conveyed from a lower temperature heating chamber to each heating chamber, the temperature of the inlet side is low and the temperature of the outlet side is high in each heating chamber under the influence of the temperature of the adjacent heating chamber. Tend to be. As described above, the radiant tube burner 20 is installed closer to the inlet side of the furnace than the center of the heating chamber, and the heating source is brought closer to the inlet side of each heating chamber where the temperature tends to be low, so that the temperature distribution in each heating chamber can be improved. Can be reduced.

【0022】 本発明の連続加熱炉においては、加熱手
段と被加熱体の移動領域との間に、マッフルを配置する
ことが好ましい。マッフルとしては、加熱手段としてラ
ジアントチューブバーナーを使用した部分には、光非透
過性で高熱伝導性の材質よりなるものを用いることが好
ましい。具体的な材質としては、黒体に近い材質が望ま
しく、例えば、炭化珪素と炭素を主成分とする成形体
を、金属珪素が存在する減圧の不活性ガス雰囲気又は真
空中にて、金属珪素を含浸させながら焼成することによ
り得られるSi含浸SiCが挙げられる。このような材
質からなるマッフルで、ラジアントチューブバーナーか
ら発せられる熱を、一旦受けることにより、マッフルか
ら遠赤外線若しくは近赤外線が照射されるため、被加熱
体をより迅速に加熱することが可能となる。
In the continuous heating furnace of the present invention, it is preferable that a muffle is arranged between the heating means and the moving area of the object to be heated. As for the muffle, it is preferable to use a material made of a light non-transmissive material having high thermal conductivity in a portion where a radiant tube burner is used as a heating means. As a specific material, a material close to a black body is desirable.For example, a molded body containing silicon carbide and carbon as main components is formed by reducing a metallic silicon in a reduced-pressure inert gas atmosphere or vacuum where metallic silicon is present. Si-impregnated SiC obtained by firing while impregnating is included. With a muffle made of such a material, since far-infrared rays or near-infrared rays are irradiated from the muffle by once receiving the heat generated from the radiant tube burner, it is possible to heat the object to be heated more quickly. .

【0023】 一方、加熱手段として電気ヒーターを使
用した部分には、前記と同様に光非透過性で高熱伝導性
の材質よりなるマッフルを用いてもよいが、光透過性の
材質よりなるマッフルを用いることが好ましい。具体的
な材質としては、例えば、結晶化ガラスが挙げられる。
このような光透過性の材質よりなるマッフルを用いる
と、電気ヒーターにて被加熱体を迅速に加熱することが
できる。また、これらのようなマッフルで加熱手段と被
加熱体とを気密的に隔離することにより、被加熱体の移
動領域におけるクリーン度を向上させる効果も得られ
る。
On the other hand, a muffle made of a light-impermeable and high-thermal-conductivity material may be used for the portion where the electric heater is used as the heating means, as described above. Preferably, it is used. A specific material is, for example, crystallized glass.
When a muffle made of such a light-transmitting material is used, an object to be heated can be quickly heated by an electric heater. Further, by airtightly separating the heating means and the object to be heated by such a muffle, an effect of improving the cleanliness in the moving region of the object to be heated can be obtained.

【0024】[0024]

【発明の効果】 以上説明したように、ラジアントチュ
ーブバーナーを利用した本発明の基板用連続加熱炉は、
加熱手段に電気ヒーターのみを使用していた従来の連続
加熱炉に比して、基板の乾燥、焼成に必要なエネルギー
コストが半減するので、結果的にPDP用ガラス基板等
の基板をより安価に提供することが可能となる。また、
電気ヒーターは部分的に用いるだけで済むので、従来の
ような大掛かりな工場用電源設備を準備する必要が無く
なり、大量生産がより容易となる。
As described above, the continuous heating furnace for a substrate of the present invention using a radiant tube burner has the following features.
The energy cost required for drying and firing the substrate is halved compared to a conventional continuous heating furnace that uses only an electric heater as the heating means. As a result, substrates such as glass substrates for PDPs can be made more inexpensive. Can be provided. Also,
Since the electric heater only needs to be partially used, it is not necessary to prepare a large-scale power supply for a factory as in the related art, and mass production becomes easier.

【0025】 更に、本発明において、電気ヒーター以
外の加熱手段として使用されるラジアントチューブバー
ナーは、燃焼がチューブ内で行われるので、クリーンな
炉内環境を容易に確保することができるとともに、CO
2排出量が電気ヒーターに比して少ないので、今後問題
になると予想されるCO2排出量の点でも従来の加熱炉
より有利である。
Furthermore, in the present invention, the radiant tube burner used as a heating means other than the electric heater can burn the inside of the tube, so that a clean furnace environment can be easily ensured and CO 2
(2) Since the amount of emission is smaller than that of the electric heater, it is more advantageous than the conventional heating furnace in terms of the amount of CO 2 emission which is expected to be a problem in the future.

【0026】 更にまた、ラジアントチューブバーナー
を、予熱・昇温域の加熱室において中心部よりも炉の入
口側に設置することにより、各加熱室内の温度分布及び
基板表面の温度分布を小さくして、基板の歪みとそれに
起因する割れ、欠け等の欠陥を防止し、製品の歩留まり
を向上させることができる。
Furthermore, by installing the radiant tube burner in the heating chamber in the preheating / heating zone at a position closer to the inlet of the furnace than the center, the temperature distribution in each heating chamber and the temperature distribution on the substrate surface can be reduced. In addition, it is possible to prevent the substrate from being distorted and defects such as cracks and chips resulting therefrom, thereby improving the product yield.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明に係る連続加熱炉の構造の一例をPD
P用大型ガラス基板の焼成時の温度曲線(ヒートパター
ン)に対応させて示した概略説明図である。
FIG. 1 shows an example of a structure of a continuous heating furnace according to the present invention using a PD.
It is the schematic explanatory drawing shown corresponding to the temperature curve at the time of baking of the large glass substrate for P (heat pattern).

【図2】 予熱・昇温域における加熱室の一例を示す概
略説明図である。
FIG. 2 is a schematic explanatory view showing an example of a heating chamber in a preheating / heating region.

【図3】 PDPの製造工程を示す工程図である。FIG. 3 is a process diagram showing a PDP manufacturing process.

【符号の説明】[Explanation of symbols]

1〜5…予熱・昇温域の加熱室、6〜10…均熱保持域
の加熱室、11〜18…冷却域の加熱室、20…ラジア
ントチューブバーナー、21…電気ヒーター、23…隔
壁、24…セッター、25…基板、30…連続加熱炉。
1-5: Preheating / heating zone, 6-10: Heating zone, 11-18: Cooling zone, 20: Radiant tube burner, 21: Electric heater, 23: Partition wall, 24: setter, 25: substrate, 30: continuous heating furnace.

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 上部と下部とに加熱手段を有する複数の
加熱室と、隣接する加熱室へ被加熱体を搬送するための
搬送手段とを備え、基板温度が所定の温度範囲に入るよ
う各加熱室を個別に温度制御することにより、所望の温
度曲線に従って、予熱、昇温、均熱保持及び冷却を行え
るように構成された基板用の連続加熱炉であって、 予熱と昇温とを行う予熱・昇温域の加熱室には、上部と
下部の加熱手段の少なくとも一方にラジアントチューブ
バーナーを使用し、同加熱室の残りの加熱手段に電気ヒ
ーターを使用したことを特徴とするラジアントチューブ
バーナーを利用した基板用連続加熱炉。
A plurality of heating chambers each having heating means at an upper portion and a lower portion; and a transporting device for transporting an object to be heated to an adjacent heating chamber, wherein each substrate has a temperature within a predetermined temperature range. A continuous heating furnace for a substrate configured to perform preheating, heating, soaking, and cooling according to a desired temperature curve by individually controlling the temperature of the heating chamber, wherein the preheating and the heating are performed. The radiant tube is characterized in that a radiant tube burner is used for at least one of the upper and lower heating means in the heating chamber in the preheating / heating area to be performed, and an electric heater is used for the remaining heating means in the heating chamber. Continuous heating furnace for substrates using burners.
【請求項2】 予熱と昇温とを行う予熱・昇温域の加熱
室には、上部と下部との両方の加熱手段にラジアントチ
ューブバーナーを使用し、均熱保持を行う均熱保持域の
加熱室及び徐冷を行う冷却域の加熱室には、上部の加熱
手段に電気ヒーターを使用し、同加熱室の下部の加熱手
段にラジアントチューブバーナー又は電気ヒーターを使
用した請求項1記載の基板用連続加熱炉。
2. A heating chamber in a preheating / heating area for performing preheating and temperature raising, wherein a radiant tube burner is used for both upper and lower heating means, and a soaking area for heat equalization is provided. 2. The substrate according to claim 1, wherein an electric heater is used for an upper heating means in the heating chamber and a heating chamber in a cooling zone for performing slow cooling, and a radiant tube burner or an electric heater is used for a lower heating means in the heating chamber. For continuous heating furnace.
【請求項3】 加熱手段と被加熱体の移動領域との間に
光非透過性で高熱伝導性の材質よりなるマッフルを配置
した請求項1又は2に記載の基板用連続加熱炉。
3. The continuous heating furnace for a substrate according to claim 1, wherein a muffle made of a light-impermeable and high-thermal-conductivity material is arranged between the heating means and the moving area of the object to be heated.
【請求項4】 加熱手段としてラジアントチューブバー
ナーを使用した部分には、当該加熱手段と被加熱体の移
動領域との間に光非透過性で高熱伝導性の材質よりなる
マッフルを配置し、加熱手段として電気ヒーターを使用
した部分には、当該加熱手段と被加熱体の移動領域との
間に光透過性の材質よりなるマッフルを配置した請求項
1又は2に記載の基板用連続加熱炉。
4. A muffle made of a light non-transmissive and high heat conductive material is disposed between the heating means and the moving area of the object to be heated in a portion where a radiant tube burner is used as the heating means. 3. The continuous heating furnace for a substrate according to claim 1, wherein a muffle made of a light-transmitting material is disposed between the heating means and a moving area of the object to be heated in a portion where the electric heater is used as the means.
【請求項5】 ラジアントチューブバーナーが、予熱・
昇温域の加熱室において中心部よりも炉の入口側に設置
された請求項1ないし4のいずれか1項に記載の基板用
連続加熱炉。
5. The radiant tube burner has a preheat
The continuous heating furnace for a substrate according to any one of claims 1 to 4, wherein the continuous heating furnace is provided on a heating chamber in a temperature-raising region closer to an entrance of the furnace than a center portion.
【請求項6】 前記搬送手段が、隣接する加熱室へ被加
熱体を間欠的に搬送する間欠送り方式の搬送手段である
請求項1ないし5のいずれか1項に記載の基板用連続加
熱炉。
6. A continuous heating furnace for a substrate according to claim 1, wherein said transfer means is a transfer means of an intermittent feed system for transferring a heated object intermittently to an adjacent heating chamber. .
JP2000278816A 1999-09-17 2000-09-13 Continuous heating furnace for substrate, utilizing radiant tube burner Pending JP2001153564A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000278816A JP2001153564A (en) 1999-09-17 2000-09-13 Continuous heating furnace for substrate, utilizing radiant tube burner

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP11-264067 1999-09-17
JP26406799 1999-09-17
JP2000278816A JP2001153564A (en) 1999-09-17 2000-09-13 Continuous heating furnace for substrate, utilizing radiant tube burner

Publications (1)

Publication Number Publication Date
JP2001153564A true JP2001153564A (en) 2001-06-08

Family

ID=26546331

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000278816A Pending JP2001153564A (en) 1999-09-17 2000-09-13 Continuous heating furnace for substrate, utilizing radiant tube burner

Country Status (1)

Country Link
JP (1) JP2001153564A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008249297A (en) * 2007-03-30 2008-10-16 Nec Corp Carriable heating device and method
US7877895B2 (en) * 2006-06-26 2011-02-01 Tokyo Electron Limited Substrate processing apparatus
US8007275B2 (en) 2008-01-25 2011-08-30 Micron Technology, Inc. Methods and apparatuses for heating semiconductor wafers
JP2011174155A (en) * 2010-02-25 2011-09-08 Sumitomo Electric Sintered Alloy Ltd Method for manufacturing sintered compact

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7877895B2 (en) * 2006-06-26 2011-02-01 Tokyo Electron Limited Substrate processing apparatus
US8181356B2 (en) 2006-06-26 2012-05-22 Tokyo Electron Limited Substrate processing method
JP2008249297A (en) * 2007-03-30 2008-10-16 Nec Corp Carriable heating device and method
US8007275B2 (en) 2008-01-25 2011-08-30 Micron Technology, Inc. Methods and apparatuses for heating semiconductor wafers
JP2011174155A (en) * 2010-02-25 2011-09-08 Sumitomo Electric Sintered Alloy Ltd Method for manufacturing sintered compact

Similar Documents

Publication Publication Date Title
KR20060117794A (en) Heating apparatus for manufacturing of plasma display panel
TWI636227B (en) Sintering facility and sintering method for a cylindrical target using sputtering
KR101169106B1 (en) Multi-stage baking apparatus for plasma display panel
JP3683166B2 (en) Substrate heat treatment method and continuous heat treatment furnace used therefor
JP2004218956A (en) Method of heat-treating substrate and heat treatment furnace
JP2001241855A (en) Continuous heating oven
JP2001153564A (en) Continuous heating furnace for substrate, utilizing radiant tube burner
JP2010159463A (en) In-line type plasma cvd method, and apparatus thereof
JP2007205592A (en) Baking device for substrate
JP2005114284A (en) Kiln
KR100484562B1 (en) Roller Hearth Type Continuous Glass Board Sealing Furnace
JPH11311484A (en) Atmosphere-in-furnace circulation type roller hearth type continuous baking furnace
JP2002206863A (en) Continuously heat treating furnace
JP3953687B2 (en) Baking treatment method and baking furnace
JP2004354043A (en) Heat treatment method for substrate, and continuous heat treatment furnace used therefor
KR200318436Y1 (en) Roller Hearth kiln for forming paste film in PDP
JP3662893B2 (en) Heat treatment equipment
JP2001012860A (en) Continuous heating furnace for large size glass substrate
JP4338936B2 (en) Sealing and heating device for FPD
JPS62202828A (en) Molding of glassware
JP4266073B2 (en) Shelf assembly method
JP2003077398A (en) Manufacturing method of plasma display panel and furnace equipment for same
KR101358358B1 (en) Degreasing sintering furnace
JP2003279268A (en) Cooling method of glass substrate
JP2004037044A (en) Vacuum heating furnace for flat panel display

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20060223

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20071012

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20071023

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20080304