JP2001144420A - Hole-plugging liquid-shaped resin for printed-wiring board, and build-up wiring board - Google Patents

Hole-plugging liquid-shaped resin for printed-wiring board, and build-up wiring board

Info

Publication number
JP2001144420A
JP2001144420A JP32284699A JP32284699A JP2001144420A JP 2001144420 A JP2001144420 A JP 2001144420A JP 32284699 A JP32284699 A JP 32284699A JP 32284699 A JP32284699 A JP 32284699A JP 2001144420 A JP2001144420 A JP 2001144420A
Authority
JP
Japan
Prior art keywords
hole
wiring board
filling
resin
build
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP32284699A
Other languages
Japanese (ja)
Inventor
Tadashi Tokiwa
忠史 常盤
Yutaka Yoshino
裕 吉野
Takashi Kawahara
隆志 川原
Takahiro Nakano
隆博 中野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon CMK Corp
CMK Corp
Nippon Paint Co Ltd
Original Assignee
Nippon CMK Corp
CMK Corp
Nippon Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon CMK Corp, CMK Corp, Nippon Paint Co Ltd filed Critical Nippon CMK Corp
Priority to JP32284699A priority Critical patent/JP2001144420A/en
Publication of JP2001144420A publication Critical patent/JP2001144420A/en
Pending legal-status Critical Current

Links

Landscapes

  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a thermosetting resin system hole-plugging resin for small diameter with an improved continuous filling property to through holes and inner via holes with small diameter and high density and an improved polishing property after curing, and a build-up wiring board with an improved adhesion property and hence an improved connection reliability. SOLUTION: The thermosetting resin system hole-plugging resin for small diameter as a yield value of 100-800 Pa in the CASSON viscosity expression and a residual viscosity of 0.5-8.0 Pa.s. In the build-up wiring board, the hole- plugging resin has been filled into a through hole and an inner via hole.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明はプリント配線基板用
穴埋め液状樹脂及びビルドアップ配線基板、更に詳細に
は量産規模での連続充填性に優れ、にじみ(充填時の隣
り合う穴間の樹脂の基板表面での接続)がなく、硬化後
の研磨性に優れる熱硬化性樹脂系小径用穴埋め液状樹
脂、及びこの熱硬化性樹脂系小径用穴埋め液状樹脂を、
基板に設けたスルーホール又は/及びバイアホールに充
填せしめたビルドアップ配線基板に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid resin and a build-up wiring board for filling a hole in a printed wiring board, and more particularly, to a resin board between adjacent holes at the time of filling which is excellent in continuous filling on a mass production scale. No connection on the surface), and a thermosetting resin-based small-diameter hole-filling liquid resin having excellent polishing properties after curing, and this thermosetting resin-based small-diameter hole-filling liquid resin,
The present invention relates to a build-up wiring board in which through holes and / or via holes provided in a board are filled.

【0002】[0002]

【従来の技術】近年、電子装置の小径高密度化に伴い、
該電子装置に使用されている配線基板もその小径高密度
化が要求されるようになってきている。また半導体素子
もエリア実装方式になり、0.8mm〜0.5mmピッチC
SPが大量に使用できるようになり、その動きを加速し
ている。このような小径高密度化を実現させるための配
線基板として、例えばビルドアップ多層配線基板が多用
されるようになっている。
2. Description of the Related Art In recent years, as electronic devices have become smaller in diameter and higher in density,
Wiring boards used in such electronic devices are also required to have smaller diameters and higher densities. In addition, semiconductor elements are also area-mounted, with 0.8mm to 0.5mm pitch C
SPs have become available in large quantities and are accelerating their movement. For example, a build-up multilayer wiring board has been frequently used as a wiring board for realizing such a small diameter and high density.

【0003】このようなビルドアップ多層配線基板にお
いて、コア基板にはスルーホールやインナーバイアホー
ルを含む導体回路が形成され、窪み部が生じる。そのた
めコア基板に設けたスルーホールや該基板表面に生じる
バイアホールを含む導体回路間の窪み部をそのままの状
態で表面に層間絶縁材を塗布すると、形成された層間絶
縁材層表面にはスルーホールの位置や前記窪み部に窪み
が発生する。この窪みは多層配線基板の表面にも現わ
れ、最外層の回路形成時に、回路形成用レジスト膜の密
着性が充分でないなどの不具合が発生し、また回路形成
されたとしても電子部品を搭載した場合に連続不良の原
因となることが多かった。
In such a build-up multilayer wiring board, a conductor circuit including a through hole and an inner via hole is formed in a core substrate, and a recess is formed. For this reason, when the interlayer insulating material is applied to the surface of the core substrate with the hollow portions between the conductor circuits including the through holes provided in the core substrate and the via holes formed on the surface of the substrate being left as they are, the through holes are formed in the surface of the formed interlayer insulating material layer. And a dent is generated at the position of the dent and the dent portion. This dent also appears on the surface of the multilayer wiring board, causing problems such as insufficient adhesion of the resist film for circuit formation during the formation of the outermost circuit, and when electronic components are mounted even if the circuit is formed In many cases, it caused continuous failure.

【0004】これに対し、上述した窪みの発生を解消す
るための手段として、例えば特開平6−260756号
公報に開示されているように、気泡を混入させることな
く、スルーホールにペースト状の充填材を圧入する方法
や、特開平10−224034号公報に開示されている
ように、添加成分としてシラン系カップリング剤でコー
ティングされた無機粒子を含む樹脂充填材やその樹脂充
填材を充填した多層プリント配線板が提案されている。
[0004] On the other hand, as means for solving the above-mentioned generation of dents, for example, as disclosed in Japanese Patent Application Laid-Open No. Hei 6-260756, a paste-like filling of through holes is performed without mixing air bubbles. A resin filler containing inorganic particles coated with a silane-based coupling agent as an additional component, or a multilayer filled with the resin filler, as disclosed in Japanese Patent Application Laid-Open No. H10-224034. Printed wiring boards have been proposed.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、特開平
6−260756号公報の方法では、粘度調整のために
メチルエチルケトン、メチルセルソルブなどの溶剤が使
用されているため、充填材を硬化する際に溶剤除去が必
要となるが、充填された樹脂から完全に溶剤を除去する
ことは極めて困難である。その結果、樹脂充填材中に溶
剤が残留すると、ビルドアップ多層配線基板のように、
コア基材に設けたスルーホール等に充填した樹脂充填材
の層表面に層間絶縁材を塗布して層間絶縁材層を形成す
る場合、前記樹脂充填材中の残留溶剤が揮発して層間絶
縁材層を押し上げ、層間剥離が生じるという問題があっ
た。
However, in the method disclosed in JP-A-6-260756, a solvent such as methyl ethyl ketone or methyl cellosolve is used for adjusting the viscosity. Although removal is required, it is extremely difficult to completely remove the solvent from the charged resin. As a result, when the solvent remains in the resin filler, like a build-up multilayer wiring board,
When forming an interlayer insulating material layer by applying an interlayer insulating material to a surface of a resin filler filled in a through hole or the like provided in a core base material, a residual solvent in the resin filler is volatilized and the interlayer insulating material is volatilized. There is a problem that the layers are pushed up and delamination occurs.

【0006】また、特開平10−224034号公報で
提案された樹脂充填材を用いて充填した多層プリント配
線板は、その樹脂充填材が高温多湿条件下でもクラック
の発生を抑制するためにシラン系カップリング剤でコー
ティングされた無機粒子を添加成分として含むものであ
るが、充填材の無機粒子をシラン系カップリング剤でコ
ーティングすると樹脂とのぬれ性は向上するものの、粘
度調節が容易でないため、同一条件での連続した印刷が
難しくなる結果、連続充填作業性が問題となっていた。
また、粘度調節が充分でないと、印刷時ににじみ(充填
時の隣り合う穴間の樹脂の基板表面での接続)が生じ、
充填材が基板上に拡がった形状で硬化される結果、硬化
後の研磨時の研磨性が問題となっていた。
Further, the multilayer printed wiring board filled with a resin filler proposed in Japanese Patent Application Laid-Open No. H10-224034 has a silane-based resin in which the resin filler suppresses cracking even under high temperature and high humidity conditions. Although inorganic particles coated with a coupling agent are included as an additive component, coating inorganic particles of a filler with a silane-based coupling agent improves wettability with a resin, but viscosity adjustment is not easy. As a result, it becomes difficult to perform continuous printing with the printer, resulting in a problem of continuous filling workability.
In addition, if the viscosity adjustment is not sufficient, bleeding during printing (connection of the resin between adjacent holes on the substrate surface at the time of filling) occurs,
As a result of the filler being cured in a shape spread on the substrate, the polishing property during polishing after curing has been a problem.

【0007】本発明は、上記従来技術が抱える問題を解
消するためになされたものであり、その主な目的はプリ
ント配線基板、就中ビルドアップ多層配線基板におい
て、該基板に設けた小径高密度、すなわち穴径が300
μm以下の小径高密度のスルーホールやインナーバイア
ホールに充填して基板表面を平滑化することにより、密
着性に優れ、接続信頼性に優れる基板を製造するための
穴埋め液状樹脂、特に量産規模での連続充填性に優れ、
にじみ(充填時の隣り合う穴間の樹脂の基板表面での接
続)がなく、しかも硬化後の研磨性に優れ、好適に使用
される穴埋め液状樹脂を提供することにあり、また、そ
のような接続信頼性に優れるビルドアップ配線基板を提
供することにある。
SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems of the prior art, and a main object of the present invention is to provide a printed wiring board, especially a build-up multilayer wiring board, with a small-diameter high-density board provided on the board. That is, the hole diameter is 300
Filling small-diameter or less high-density through holes or inner via holes and smoothing the surface of the substrate to provide a substrate with excellent adhesion and excellent connection reliability. Excellent continuous filling of
There is no bleeding (connection of the resin between the adjacent holes at the surface of the substrate at the time of filling), and the polishing resin after curing is excellent. An object of the present invention is to provide a build-up wiring board having excellent connection reliability.

【0008】[0008]

【課題を解決するための手段】本発明者らは、上記目的
を達成するために種々研究を重ねた。その結果、CAS
SON粘度式の降伏値及び残留粘度が特定範囲にある熱
硬化性樹脂系穴埋め液状樹脂を用いれば、極めて良い結
果が得られることを見出し、発明を完成するに至った。
Means for Solving the Problems The present inventors have conducted various studies to achieve the above object. As a result, CAS
The present inventors have found that an extremely good result can be obtained by using a thermosetting resin-based filling liquid resin in which the yield value and the residual viscosity of the SON viscosity formula are within specific ranges, and have completed the invention.

【0009】すなわち、本発明はプリント配線基板に形
成された穴径が300μm以下の小径高密度穴用の熱硬
化性樹脂系穴埋め液状樹脂であって、CASSON粘度
式における降伏値が100〜800Pa、残留粘度が0.
5〜8.0Pa・s であることを特徴とするプリント配線
基板用穴埋め液状樹脂により上記目的を達成したもので
ある。
That is, the present invention relates to a thermosetting resin-based filling liquid resin for a small-diameter high-density hole having a hole diameter of 300 μm or less formed in a printed wiring board, wherein the yield value in a CASSON viscosity formula is 100 to 800 Pa; Residual viscosity is 0.
The above object has been achieved by a liquid resin for filling holes in a printed wiring board, which has a pressure of 5 to 8.0 Pa · s.

【0010】また、本発明はビルドアップ配線基板、特
に電気回路接続用銅メッキを施した第1のバイアホール
又は/及びスルーホールを有する第1の絶縁層と、上記
第1の絶縁層上に接して形成された第2の電気回路接続
用銅メッキを施したバイアホールを有する第2の絶縁層
とを含み、該第2の電気回路接続用銅メッキを施したバ
イアホールが上記第1の電気回路接続用銅メッキを施し
たバイアホール又は/及びスルーホールの直上又はその
近傍に形成されたビルドアップ基板であって、基板に設
けたバイアホール又は/及びスルーホールに、前記穴埋
め液状樹脂を充填せしめたことを特徴とするビルドアッ
プ基板により上記目的を達成したものである。
The present invention also provides a first insulating layer having a first via hole and / or a through hole plated with copper for use in a build-up wiring board, particularly, an electric circuit, and a first insulating layer formed on the first insulating layer. A second insulating layer having a second copper plated via hole for electrical circuit connection formed in contact therewith, and the second copper plated via hole for the second electrical circuit connection is provided with the first insulating layer. A build-up board formed immediately above or in the vicinity of via holes and / or through-holes subjected to copper plating for electric circuit connection, wherein the filling resin is filled in via holes or / and through-holes provided in the board. The above object has been achieved by a build-up substrate characterized by being filled.

【0011】本発明において連続充填性に優れ、にじみ
(充填時の隣り合う穴間の樹脂の基板表面での接続)が
なく、硬化後の研磨性に優れ、好適に使用できるために
は、CASSON粘度式における降伏値が100〜80
0Paであり、残留粘度が0.5〜8.0Pa・s であるこ
とが必要である。
In the present invention, in order to be excellent in continuous filling property, free from bleeding (connection of resin between adjacent holes on the substrate surface at the time of filling), excellent in polishing property after curing, and suitable for use, it is necessary to use CASSON. The yield value in the viscosity equation is 100 to 80
0 Pa and a residual viscosity of 0.5 to 8.0 Pa · s.

【0012】ここに、CASSON粘度式とは、τ1/2
=τc 1/2+(μc・γ)1/2で表される式であり、式中の
τ、τc、μc、γはそれぞれせん断応力、降伏値、残留
粘度、せん断速度である。本発明の熱硬化性樹脂系小径
用穴埋め液状樹脂は、非ニュートン性の流動特性を示
し、擬塑性流動であり、チクソトロピー(揺変性)を有
している。したがって本発明の穴埋め液状樹脂は、粘度
特性が充填条件(せん断速度)により変化する。
Here, the CASSON viscosity equation is τ 1/2
= Τ c 1/2 + (μ c · γ) 1/2 where τ, τ c , μ c , and γ are the shear stress, yield value, residual viscosity, and shear rate, respectively. is there. The thermosetting resin-based small-diameter hole filling liquid resin of the present invention exhibits non-Newtonian flow characteristics, is pseudoplastic flow, and has thixotropic (thixotropic). Therefore, in the liquid filling resin of the present invention, the viscosity characteristic changes depending on the filling conditions (shear rate).

【0013】一般にスクリーン印刷などにより充填時に
穴埋め液状樹脂に加わるせん断速度γは、103〜104
[1/秒]の範囲とされており、このときの穴埋め液状
樹脂の流動特性を把握することが、重要となる。つま
り、せん断速度γが、103〜104[1/秒]のときの
粘度が低いほど、穴への充填が容易に実施できる。
Generally, the shear rate γ applied to the filling resin during filling by screen printing or the like is 10 3 to 10 4
[1 / sec], and it is important to grasp the flow characteristics of the filling resin at this time. In other words, the lower the viscosity when the shear rate γ is 10 3 to 10 4 [1 / sec], the easier it is to fill the holes.

【0014】しかしながら、せん断速度γが、103
104[1/秒]の範囲のときの粘度は現在の粘度測定
器を用いての測定が不可能であり、実際に測定可能なせ
ん断速度範囲の結果から、測定不可能な充填時の粘度
(せん断速度γが、103〜104[1/秒]での粘度)
を予測する必要がある。
However, if the shear rate γ is 10 3 to
The viscosity in the range of 10 4 [1 / sec] cannot be measured using a current viscometer, and the viscosity at the time of filling cannot be measured from the result of the shear rate range that can be actually measured. (Viscosity at a shear rate γ of 10 3 to 10 4 [1 / sec])
Need to predict.

【0015】而して、実際に測定したせん断応力、せん
断速度、粘度よりCASSON粘度式を用いてフィッテ
ィングを行い、降伏値及び残留粘度を求めることができ
る。ここで、残留粘度とは、せん断速度が無限大の時の
粘度であるが、この残留粘度により測定不可能な充填時
の粘度(せん断速度γが、103〜104[1/秒]での
粘度)の予測、つまり実際の充填時のせん断速度におけ
る粘度を予測できる。
The yield value and the residual viscosity can be determined by performing fitting from the actually measured shear stress, shear rate, and viscosity using the CASSON viscosity equation. Here, the residual viscosity is the viscosity at the time when the shear rate is infinite, and the viscosity at the time of filling that cannot be measured due to the residual viscosity (shear rate γ is 10 3 to 10 4 [1 / sec]. ), That is, the viscosity at the actual shear rate at the time of filling can be predicted.

【0016】残留粘度が大きすぎると、穴内への充填が
困難となる。残留粘度が小さいほど穴への充填が容易に
実施できる。しかし、あまり低すぎるとスクリーン印刷
などのときの印刷抜け性が悪くなるので、残留粘度は前
記の如く、0.5〜8.0Pa・s の範囲にあることが必
要である。
If the residual viscosity is too large, it is difficult to fill the hole. The smaller the residual viscosity is, the easier it is to fill the holes. However, if it is too low, the print-out property during screen printing or the like will deteriorate, so that the residual viscosity must be in the range of 0.5 to 8.0 Pa · s as described above.

【0017】また、降伏値とはせん断速度が0に近いと
きのせん断応力の値であり、穴埋め液状樹脂がせん断に
よる移動をするために必要なせん断応力の最小限度値で
ある。降伏値が高すぎるとスクリーン印刷などの充填初
期時に印刷機やスクリーンに大きな負荷がかかってしま
い、生産性が問題となる。しかし降伏値が低すぎると、
印刷抜け時に容易に流動し、隣り合う穴の樹脂と繋が
り、印刷にじみが発生しやすくなる。にじみが発生する
と、充填材が基板上に拡がった形状で硬化されるから、
硬化後の研磨時の研磨性が問題となる。したがって、降
伏値は前記の如く、100〜800Paの範囲にあること
が必要である。
The yield value is the value of the shear stress when the shear rate is close to 0, and is the minimum value of the shear stress required for the filling resin to move by shearing. If the yield value is too high, a large load is applied to the printing machine and the screen at the initial stage of filling such as screen printing, and the productivity becomes a problem. But if the yield value is too low,
It easily flows at the time of printing omission, is connected to the resin of the adjacent hole, and printing bleeding is likely to occur. When bleeding occurs, the filler is cured in a shape spread on the substrate,
Abrasion at the time of polishing after curing becomes a problem. Therefore, the yield value needs to be in the range of 100 to 800 Pa as described above.

【0018】因に、本発明に於て当該せん断応力、せん
断速度、粘度の測定はコーンプレート型のE型粘度計を
用いて行った。また、本発明の穴埋め液状樹脂は、前記
の如く非ニュートン性の流動特性、チクソトロピー(揺
変性)を示し、粘度測定時にいわゆるヒステリシスルー
プを示すので、降伏値及び残留粘度はせん断速度を低せ
ん断速度から高せん断速度へ上昇させた時に測定したせ
ん断応力値とせん断速度よりCASSON粘度式のフィ
ッティングを行って求めた。
In the present invention, the measurement of the shear stress, the shear rate and the viscosity was carried out using a cone plate type E-type viscometer. In addition, the liquid filling resin of the present invention exhibits non-Newtonian flow characteristics and thixotropy (thixotropic) as described above, and exhibits a so-called hysteresis loop during viscosity measurement. From a shear stress value measured when the shear rate was increased to a high shear rate and a shear rate, and determined by performing a CASSON viscosity equation fitting.

【0019】[0019]

【発明の実施の形態】CASSON粘度式における降伏
値が100〜800Pa、残留粘度が0.5〜8.0Pa・
s の穴埋め液状樹脂を得るためには、不溶性フィラーを
添加混入し、調整するのが望ましい。不溶性フィラーと
しては、無機系フィラーのみでもよいし、有機系フィラ
ーと無機系フィラー併用でもよいし、有機系フィラーの
みでもよい。揺変剤を用いると更に調整が容易となる。
BEST MODE FOR CARRYING OUT THE INVENTION In the CASSON viscosity formula, the yield value is 100 to 800 Pa, and the residual viscosity is 0.5 to 8.0 Pa.
In order to obtain a liquid resin for filling in s, it is preferable to add and mix an insoluble filler. As the insoluble filler, only an inorganic filler may be used, an organic filler and an inorganic filler may be used in combination, or only an organic filler may be used. The use of a thixotropic agent facilitates further adjustment.

【0020】このような無機系フィラーとしては、該C
ASSON粘度式における降伏値を100〜800Pa、
残留粘度を0.5〜8.0Pa・s に調整できるものであ
れば特に限定されないが、例えばシリカやアルミナ、ム
ライト、ジルコニア等が好ましいものとして挙げられ
る。また、難燃性付与のために水酸化マグネシウム等の
水酸化物を用いてもよい。斯かる無機系フィラーは、最
大粒径が20μm以下のものを用いるのが好ましい。大
きすぎると表面の平滑性がなくなり、表面処理がしにく
くなったり、ボイドをかみやすくなったり、接続信頼性
が低下するなどの問題が生じやすくなる。また、当該無
機系フィラーの配合量は、熱硬化性樹脂成分100重量
部に対して2〜50重量部の範囲であることが望まし
い。2重量部未満であると、フィラー添加効果が薄く、
50重量部より多いと、残留粘度が8.0Pa・s より大
きくなり、穴内への充填が困難となりやすい。因に、熱
硬化性樹脂成分100重量部に対して2〜50重量部の
配合量であれば、該CASSON粘度式における降伏値
を100〜800Pa、残留粘度を0.5〜8.0Pa・s
に容易に調整できる。
Examples of such an inorganic filler include C
The yield value in the ASSON viscosity formula is 100 to 800 Pa,
There is no particular limitation as long as the residual viscosity can be adjusted to 0.5 to 8.0 Pa · s. For example, silica, alumina, mullite, zirconia and the like are preferred. Further, a hydroxide such as magnesium hydroxide may be used for imparting flame retardancy. It is preferable to use such an inorganic filler having a maximum particle size of 20 μm or less. If it is too large, the smoothness of the surface will be lost, and the surface treatment will be difficult, the voids will be easily bitten, and the connection reliability will be reduced. The amount of the inorganic filler is preferably in the range of 2 to 50 parts by weight based on 100 parts by weight of the thermosetting resin component. If it is less than 2 parts by weight, the effect of adding filler is thin,
If the amount is more than 50 parts by weight, the residual viscosity will be higher than 8.0 Pa · s, and it will be difficult to fill the holes. If the amount is 2 to 50 parts by weight with respect to 100 parts by weight of the thermosetting resin component, the yield value in the CASSON viscosity formula is 100 to 800 Pa, and the residual viscosity is 0.5 to 8.0 Pa · s.
Can be easily adjusted.

【0021】また、有機系フィラーとしては、該CAS
SON粘度式における降伏値を100〜800Pa、残留
粘度を0.5〜8.0Pa・s に調整できるのであれば特
に限定されないが、例えばアクリルポリマー、エポキシ
ポリマー、スチレンポリマー等が好ましいものとして挙
げられる。また、ハロゲン系有機難燃剤やノンハロゲン
系有機難燃剤など、難燃性の有機系フィラーの添加も、
穴埋め樹脂が難燃性を有することにより、基板としての
難燃性にも貢献することになるから、より好ましい。斯
かる有機系フィラーは最大粒径が20μm以下のものを
用いるのが好ましい。大きすぎると表面の平滑性がなく
なり、表面処理がしにくくなったり、ボイドをかみやす
くなったり、接続信頼性が低下するなどの問題が生じや
すくなる。また、当該有機系フィラーの配合量は、熱硬
化性樹脂成分100重量部に対して2〜50重量部の範
囲であることが望ましい。2重量部未満であると、フィ
ラー添加効果が薄く、50重量部より多いと、残留粘度
が8.0Pa・s より大きくなり、穴内への充填が困難と
なりやすい。因に、熱硬化性樹脂成分100重量部に対
して2〜50重量部の配合量であれば該CASSON粘
度式における降伏値を100〜800Pa、残留粘度を
0.5〜8.0Pa・s に容易に調整できる。
As the organic filler, the CAS
There is no particular limitation as long as the yield value in the SON viscosity formula can be adjusted to 100 to 800 Pa, and the residual viscosity can be adjusted to 0.5 to 8.0 Pa · s. For example, acrylic polymers, epoxy polymers, styrene polymers, and the like are preferred. . In addition, addition of flame-retardant organic fillers, such as halogen-based organic flame retardants and non-halogen-based organic flame retardants,
Since the filling resin has flame retardancy, it also contributes to the flame retardancy of the substrate, and is more preferable. It is preferable to use such an organic filler having a maximum particle size of 20 μm or less. If it is too large, the smoothness of the surface will be lost, and the surface treatment will be difficult, the voids will be easily bitten, and the connection reliability will be reduced. The amount of the organic filler is preferably in the range of 2 to 50 parts by weight based on 100 parts by weight of the thermosetting resin component. If the amount is less than 2 parts by weight, the effect of adding the filler is thin, and if it is more than 50 parts by weight, the residual viscosity becomes larger than 8.0 Pa · s, and it becomes difficult to fill the hole. If the blending amount is 2 to 50 parts by weight with respect to 100 parts by weight of the thermosetting resin component, the yield value in the CASSON viscosity formula is 100 to 800 Pa and the residual viscosity is 0.5 to 8.0 Pa · s. Easy to adjust.

【0022】本発明において、CASSON粘度式の降
伏値と残留粘度の調整には揺変剤を用いると更に効果的
である。揺変剤は、チクソトロピー付与剤ともいわれ、
塗料などのチクソトロピー(揺変性)を付与する場合に
用いられる。斯かる揺変剤としては、微粉ケイ酸、ベン
トナイト、スメクタイト、カーボンブラック等が挙げら
れ、特に微粉ケイ酸を用いるのが、調整が容易であり好
ましいが、CASSON粘度式における降伏値を100
〜800Pa、残留粘度を0.5〜8.0Pa・sに調整で
きる揺変剤であれば特に限定されない。
In the present invention, it is more effective to use a thixotropic agent to adjust the yield value and residual viscosity in the CASSON viscosity formula. Thixotropic agents are also referred to as thixotropic agents,
It is used when imparting thixotropic properties (thixotropic) of paints and the like. Examples of such thixotropic agents include finely divided silica, bentonite, smectite, carbon black, and the like. In particular, it is preferable to use finely divided silica because it is easy to adjust and preferably has a yield value of 100 in the CASSON viscosity formula.
It is not particularly limited as long as it is a thixotropic agent capable of adjusting the viscosity to 800 Pa and the residual viscosity to 0.5 to 8.0 Pa · s.

【0023】本発明の小径用穴埋め液状樹脂としては、
硬化時の揮発分が1.5重量%以下、特に0.5%以下
の揮発性を有するものが望ましい。揮発分が1.5重量
%より大きいとボイドが発生しやすく、硬化後の樹脂の
収縮が大きくなり、密着性や層間剥離や、信頼性低下な
どの問題を生じやすい。
As the liquid resin for filling holes for small diameter of the present invention,
Those having a volatile content of 1.5% by weight or less, particularly 0.5% or less at the time of curing are desirable. If the volatile content is more than 1.5% by weight, voids are liable to be generated, the resin shrinks after curing is increased, and problems such as adhesion, delamination, and reduction in reliability are likely to occur.

【0024】本発明において、熱硬化性樹脂系小径用穴
埋め液状樹脂の樹脂成分としては、例えばエポキシ樹
脂、フェノール樹脂、メラミン樹脂、尿素樹脂、ポリエ
ステル樹脂、アルキド樹脂、グアナミン樹脂、ケイ素樹
脂などからなる群より選ばれる1種類又は2種類以上の
熱硬化性樹脂が使用できる。基板の耐熱性の問題によ
り、エポキシ樹脂が好適に使用される。また硬化剤は特
に限定されない。換言すれば、CASSON粘度式にお
ける降伏値が100〜800Pa、残留粘度が0.5〜
8.0Pa・s であり、配合した不溶性フィラーの最大粒
径が20μm以下で、硬化時の揮発分が1.5重量%以
下であることを満足する樹脂成分・硬化剤であればよ
い。
In the present invention, the resin component of the thermosetting resin-based liquid filling resin for small-diameter holes is, for example, an epoxy resin, a phenol resin, a melamine resin, a urea resin, a polyester resin, an alkyd resin, a guanamine resin, a silicon resin, or the like. One or more thermosetting resins selected from the group can be used. Due to the problem of heat resistance of the substrate, epoxy resin is preferably used. The curing agent is not particularly limited. In other words, the yield value in the CASSON viscosity equation is 100 to 800 Pa, and the residual viscosity is 0.5 to
Any resin component / curing agent that satisfies 8.0 Pa · s, the maximum particle size of the insoluble filler compounded is 20 μm or less, and the volatile matter during curing is 1.5% by weight or less.

【0025】本発明に係るビルドアップ配線基板、すな
わちバイアホールやスルーホールに、前記本発明穴埋め
液状樹脂を充填せしめたビルドアップ多層配線板は、例
えば(1)配線基板に設けたバイアホールやスルーホー
ルに本発明の穴埋め液状樹脂を充填する工程、(2)前
記(1)で充填した穴埋め液状樹脂を熱硬化する工程、
(3)前記(2)で熱硬化した穴埋め液状樹脂表面を研
磨する工程、を経て製造される。
The build-up wiring board according to the present invention, that is, the build-up multilayer wiring board in which the via hole or the through-hole is filled with the liquid resin for filling the hole-filling of the present invention is, for example, (1) a via-hole or a through-hole provided in the wiring board. Filling the holes with the filling resin of the present invention, (2) thermally curing the filling resin filled in (1),
(3) a step of polishing the surface of the liquid resin filling the hole that has been thermoset in the step (2).

【0026】[0026]

【実施例】実施例1 図1は、本発明に係る穴埋め液状樹脂を用いたビルドア
ップ配線基板の製造工程例を示す図である。以下該図1
に基づいて本発明を更に説明する。
Embodiment 1 FIG. 1 is a view showing an example of a manufacturing process of a build-up wiring board using a filling resin according to the present invention. The following FIG.
The present invention will be further described based on the following.

【0027】(1)ガラスエポキシ樹脂からなる基板1
0の両面に厚さ18μmの銅箔がラミネートされている
銅張積層板を用いて、該両面に前処理、フォトラミネー
ト、露光、現像、エッチング工程を実施することによ
り、回路20形成を行った(図1(a)参照)。
(1) Substrate 1 made of glass epoxy resin
The circuit 20 was formed by performing a pretreatment, photolaminating, exposing, developing, and etching steps on both sides of a copper-clad laminate in which a copper foil having a thickness of 18 μm was laminated on both sides of No. 0. (See FIG. 1A).

【0028】(2)前記(1)の基板10の両面に、プ
リプレグ30及び銅箔40を積層プレスした(図1
(b)参照)。
(2) A prepreg 30 and a copper foil 40 were laminated and pressed on both sides of the substrate 10 of (1) (FIG. 1).
(B)).

【0029】(3)前記(2)の基板10に300μm
の貫通穴80を、その隣り合う穴の距離が600μmで
500個あけ、その後デスミア・メッキを行い、20μ
m厚の銅メッキ60により穴内の導通処理を実施し、防
錆剤処理を行なった(図1(c)参照)。
(3) 300 μm on the substrate 10 of the above (2)
500 holes are formed at a distance of 600 μm between the adjacent holes, and then desmear plating is performed.
Conduction treatment in the hole was performed by m-thick copper plating 60, and rust preventive treatment was performed (see FIG. 1 (c)).

【0030】(4)エポキシ樹脂としてビスフェノール
F型エポキシ樹脂「エピコート807」(油化シェル
製)100重量部に、硬化剤としてアミンアダクトタイ
プの「アミキュアPN−23」(味の素ファインテクノ
製)10重量部を配合し、最大粒径10μmのSiO2粒子
30重量部、揺変剤として微粉ケイ酸を7重量部加えロ
ールミルで混合分散し、穴埋め液状樹脂を得た。得られ
た穴埋め液状樹脂の粘度とせん断速度γ及びせん断応力
の関係を表1に示す。測定はコーンプレートタイプのE
型回転式粘度計(HAAKE社製ビスコテスターVT5
50)を用いて23℃で行った。この値を利用して、C
ASSON粘度式における降伏値及び残留粘度を求める
ためにCASSONプロットを行った。結果を図3に示
す。図3より、得られた穴埋め液状樹脂の降伏値は47
0Paであり、残留粘度は3.7Pa・sであった。
(4) 100 parts by weight of bisphenol F type epoxy resin "Epicoat 807" (manufactured by Yuka Shell) as an epoxy resin and 10 parts by weight of amine adduct type "Amicure PN-23" (manufactured by Ajinomoto Fine Techno) as a curing agent Were mixed, and 30 parts by weight of SiO 2 particles having a maximum particle diameter of 10 μm and 7 parts by weight of finely divided silica as a thixotropic agent were mixed and dispersed by a roll mill to obtain a liquid filling resin. Table 1 shows the relationship among the viscosity, shear rate γ, and shear stress of the obtained filling resin. Measurements were made using a cone plate type E
Type viscometer (Visco Tester VT5 manufactured by HAAKE)
50) at 23 ° C. Using this value, C
A CASSON plot was performed to determine the yield value and residual viscosity in the ASSON viscosity equation. The results are shown in FIG. From FIG. 3, the yield value of the obtained filling resin is 47.
It was 0 Pa, and the residual viscosity was 3.7 Pa · s.

【0031】[0031]

【表1】 [Table 1]

【0032】(5)図1(c)に示す基板10の穴80
内の洗浄及び防錆剤除去のために、希硫酸による洗浄を
行った。洗浄後、前記(4)で得られた穴埋め液状樹脂
50を、基板10の穴80内にスクリーン印刷法により
充填した。印刷はメッシュサイズ♯120、開口径0.
6mmのステンレスメッシュ版を用いた。次に、140
℃、90分の加熱処理を行って穴埋め液状樹脂を硬化さ
せた(図1(d)参照)。
(5) The hole 80 of the substrate 10 shown in FIG.
Cleaning with dilute sulfuric acid was carried out for cleaning the inside and removing the rust inhibitor. After the washing, the filling resin 50 obtained in the above (4) was filled into the holes 80 of the substrate 10 by a screen printing method. Printing is mesh size # 120, opening diameter 0.
A 6 mm stainless mesh plate was used. Next, 140
A heat treatment was performed at 90 ° C. for 90 minutes to harden the filling liquid resin (see FIG. 1D).

【0033】(6)前記(5)で硬化させた図1(d)
の穴両面に突出した硬化穴埋め液状樹脂50を、バフ研
磨した。更に、該バフ研磨により発生した傷を取り除く
ため、より細かい砥粒のバフを使用してバフ研磨し、両
面が平滑な基板10を作成し、希硫酸による洗浄を行っ
た(図1(e)参照)。
(6) FIG. 1 (d) cured in the above (5)
The liquid resin 50 filling the cured hole protruding from both sides of the hole was buffed. Further, in order to remove the scratches generated by the buff polishing, the substrate 10 was buff-polished using a finer buff of abrasive grains to prepare a substrate 10 having both surfaces smooth and washed with dilute sulfuric acid (FIG. 1 (e)). reference).

【0034】(7)前記(6)で研磨された図1(e)
の基板10にデスミア処理を行い、その後無電解メッ
キ、電解メッキを実施して15μmのメッキ61を基板
10表面に析出させた(図1(f)参照)。
(7) FIG. 1 (e) polished in the above (6)
The substrate 10 was subjected to a desmear treatment, and then electroless plating and electrolytic plating were performed to deposit a 15 μm plating 61 on the surface of the substrate 10 (see FIG. 1F).

【0035】(8)前記(7)でメッキされた図1
(f)の基板10の両面に、前処理、フォトラミネー
ト、露光、現像、エッチング工程を実施することによ
り、回路21形成を行った(図1(g)参照)。
(8) FIG. 1 plated in (7)
A circuit 21 was formed by performing a pretreatment, photolaminating, exposing, developing, and etching steps on both surfaces of the substrate 10 (f) (see FIG. 1 (g)).

【0036】(9)前記(8)で回路21が形成された
基板10の両面に層間絶縁材70と銅箔41を積層し、
ビルドアップ層を作製した(図1(h)参照)。
(9) An interlayer insulating material 70 and a copper foil 41 are laminated on both surfaces of the substrate 10 on which the circuit 21 is formed in (8),
A build-up layer was produced (see FIG. 1 (h)).

【0037】(10)前記(9)でビルドアップ層が形
成された基板10に貫通穴81明けを行った(図1
(i)参照)。
(10) A through hole 81 was formed in the substrate 10 on which the build-up layer was formed in (9) (FIG. 1).
(See (i)).

【0038】(11)前記(10)で貫通穴81明けを
行った基板10の両面に、前記(8)で作製された回路
の真上にウインドウエッチングを行った(図1(j)参
照)。
(11) On both surfaces of the substrate 10 on which the through holes 81 were drilled in the above (10), window etching was performed directly on the circuit fabricated in the above (8) (see FIG. 1 (j)). .

【0039】(12)前記(11)で両面にウインドウ
エッチングされた基板10のエッチング部分に、レーザ
ー加工により内層のメッキがなされている穴の上まで、
穴をあけた後、デスミアを行い、20μmのメッキ62
を基板1の全面につけた(図1(k)参照)。
(12) The etched portion of the substrate 10 window-etched on both sides in (11) above the hole where the inner layer is plated by laser processing.
After drilling holes, desmearing is performed and a 20 μm plating 62
Was applied to the entire surface of the substrate 1 (see FIG. 1 (k)).

【0040】(13)前記(12)でメッキ処理まで実
施された基板10の両面に外層回路22を形成し、ソル
ダーレジスト90を塗布、乾燥、露光、現像、ポストキ
ュアすることにより、6層ビルドアップ配線基板を製造
した(図1(l)参照)。
(13) An outer layer circuit 22 is formed on both sides of the substrate 10 which has been subjected to the plating process in (12), and a solder resist 90 is applied, dried, exposed, developed, and post-cured to form a six-layer build. An up-wiring board was manufactured (see FIG. 1 (l)).

【0041】実施例2 図2は、本発明に係るビルドアップ配線基板の他の製造
工程例を示す図である。以下該図2に基づいて本発明を
更に説明する。
Embodiment 2 FIG. 2 is a diagram showing another example of a manufacturing process of a build-up wiring board according to the present invention. Hereinafter, the present invention will be further described with reference to FIG.

【0042】(7−2)図1の(1)〜(6)と同様の
工程を実施して両面が平滑な基板10を作成し、希硫酸
による洗浄を行って得られた基板10の充填材(穴埋め
液状樹脂)を含んだ上下面にドライフィルムレジスト9
5を塗布した(図2(e−2)参照)。
(7-2) The same steps as (1) to (6) in FIG. 1 are carried out to form a substrate 10 having smooth surfaces on both sides, and the substrate 10 obtained by washing with dilute sulfuric acid is filled. Dry film resist 9 on the upper and lower surfaces containing material (liquid filling resin)
5 (see FIG. 2 (e-2)).

【0043】(8−2)前記(7−2)の基板10の両
面に、露光、現像、エッチング工程を実施することによ
り、回路23形成を行った(図2(g−2)参照)。
(8-2) A circuit 23 was formed by performing exposure, development, and etching steps on both surfaces of the substrate 10 of (7-2) (see FIG. 2 (g-2)).

【0044】(9−2)前記(8−2)で回路23が形
成された基板10の両面に層間絶縁材71と銅箔42を
積層し、ビルドアップ層を作製した(図2(h−2)参
照)。
(9-2) An interlayer insulating material 71 and a copper foil 42 were laminated on both surfaces of the substrate 10 on which the circuit 23 was formed in the above (8-2) to form a build-up layer (FIG. 2 (h- 2)).

【0045】(10−2)前記(8−2)で作製された
回路の真上にウインドウエッチングを行い、その後ウイ
ンドウエッチングされた基板10のエッチング部分に、
レーザー加工により内層のメッキがなされている穴の上
まで、穴をあけた(図1(k−2)参照)。
(10-2) Window etching is performed immediately above the circuit fabricated in (8-2), and then the window-etched portion of the substrate 10 is etched.
Holes were drilled up to the holes where the inner layer was plated by laser processing (see FIG. 1 (k-2)).

【0046】(11−2)前記(10−2)で作製され
た穴のデスミアを行い、20μmのメッキ62を基板1
0の全面につけ、その両面に外層回路24を形成し、ソ
ルダーレジスト91を塗布、乾燥、露光、現像、ポスト
キュアすることにより、6層ビルドアップ基板を作成し
た(図2(l−2)参照)。
(11-2) Desmearing of the hole prepared in the above (10-2) is performed, and a plating 62 of 20 μm is applied to the substrate 1.
0, an outer layer circuit 24 is formed on both sides thereof, a solder resist 91 is applied, dried, exposed, developed, and post-cured to form a six-layer build-up substrate (see FIG. 2 (l-2)). ).

【0047】試験例1 実施例1に準じ、表2記載の降伏値及び残留粘度を有す
るサンプル1〜5の穴埋め液状樹脂を作成した。この各
穴埋め液状樹脂を用いた以外は実施例1と同様にしてビ
ルドアップ配線基板を、各サンプルにつき100枚ずつ
製造した。各配線基板の製造工程に於ける穴埋め液状樹
脂の連続充填性と研磨性を表3記載の評価基準に従って
評価した。その結果は表2の通りであった。
Test Example 1 In accordance with Example 1, liquid-filled liquid resins of Samples 1 to 5 having a yield value and a residual viscosity shown in Table 2 were prepared. Except for using each of the filling resin, 100 build-up wiring boards were manufactured for each sample in the same manner as in Example 1. The continuous filling property and polishing property of the filling resin in the manufacturing process of each wiring board were evaluated according to the evaluation criteria shown in Table 3. Table 2 shows the results.

【0048】[0048]

【表2】 [Table 2]

【0049】[0049]

【表3】 [Table 3]

【0050】試験例2 実施例1に準じて作成した表4記載の降伏値及び残留粘
度を有するサンプル6〜10の穴埋め液状樹脂を用いた
以外は、試験例1と同様にして連続充填性と研磨性を評
価した。その結果は表4の通りであった。
Test Example 2 Except for using the filling resin of Samples 6 to 10 having a yield value and a residual viscosity shown in Table 4 prepared in accordance with Example 1, the continuous filling property was improved in the same manner as in Test Example 1. The polishing property was evaluated. Table 4 shows the results.

【0051】[0051]

【表4】 [Table 4]

【0052】試験例3 実施例1に準じて作成した表5記載の揮発性、降伏値及
び残留粘度を有するサンプル11〜13の穴埋め樹脂を
用いた以外は実施例1と同様にしてビルドアップ配線基
板を、各サンプルにつき100枚ずつ製造した。得られ
た各配線基板の層間剥離性を表6記載の評価基準に従っ
て評価した。その結果は表5の通りであった。
Test Example 3 Build-up wiring was carried out in the same manner as in Example 1 except that the filling resin of Samples 11 to 13 having the volatility, yield value and residual viscosity shown in Table 5 and prepared according to Example 1 was used. 100 substrates were manufactured for each sample. The delamination property of each of the obtained wiring boards was evaluated according to the evaluation criteria shown in Table 6. Table 5 shows the results.

【0053】[0053]

【表5】 [Table 5]

【0054】[0054]

【表6】 [Table 6]

【0055】試験例4 表7記載の最大粒径を有するフィラー(SiO2粒子)を配
合した以外は実施例1と同様にして降伏値200Pa、残
留粘度6.5Pa・s を有するサンプル14〜16の穴埋
め液状樹脂を作成し、試験例1と同様にして連続充填性
と研磨性を評価した。その結果は表7の通りであった。
Test Example 4 Samples 14 to 16 having a yield value of 200 Pa and a residual viscosity of 6.5 Pa · s in the same manner as in Example 1 except that the filler (SiO 2 particles) having the maximum particle size shown in Table 7 was blended. And a continuous filling property and an abrasive property were evaluated in the same manner as in Test Example 1. Table 7 shows the results.

【0056】[0056]

【表7】 [Table 7]

【0057】[0057]

【発明の効果】本発明穴埋め液状樹脂は、量産規模での
小径高密度、特に穴径が300μm以下の小径高密度の
スルーホールやインナーバイヤホールへの連続充填性に
優れ、にじみ(充填時の隣り合う穴間の樹脂の基板表面
での接続)がなく、しかも硬化後の研磨性に優れるた
め、密着性に優れ、従ってまた接続信頼性に優れるビル
ドアップ配線基板を効率良く製造することができる。
The liquid filling resin of the present invention is excellent in continuous filling into small-diameter, high-density through holes and inner via holes having a small diameter of 300 μm or less, especially in a mass production scale, and is excellent in bleeding. There is no connection between adjacent holes on the substrate surface of the resin), and since it has excellent polishing properties after curing, it is possible to efficiently manufacture a build-up wiring board having excellent adhesion and therefore excellent connection reliability. .

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明ビルドアップ配線基板の製造工程例を示
す概略断面説明図。
FIG. 1 is a schematic cross-sectional explanatory view showing an example of a manufacturing process of a build-up wiring board of the present invention.

【図2】本発明ビルドアップ配線基板の他の製造工程例
を示す概略断面説明図。
FIG. 2 is a schematic sectional explanatory view showing another example of the manufacturing process of the build-up wiring board of the present invention.

【図3】CASSON粘度式における降伏値及び残留粘
度を求めるためのCASSONプロット図。
FIG. 3 is a CASSON plot for obtaining a yield value and a residual viscosity in a CASSON viscosity equation.

【符号の説明】[Explanation of symbols]

10:基板 20,21,22,23,24:回路 30:プリプレグ 40,41,42:銅箔 50:穴埋め液状樹脂 60,61,62:メッキ 70,71:層間絶縁材 80,81:貫通穴 90,91:ソルダーレジスト 95:ドライフィルムレジスト 10: Substrate 20, 21, 22, 23, 24: Circuit 30: Prepreg 40, 41, 42: Copper foil 50: Filling liquid resin 60, 61, 62: Plating 70, 71: Interlayer insulating material 80, 81: Through hole 90, 91: Solder resist 95: Dry film resist

───────────────────────────────────────────────────── フロントページの続き (72)発明者 吉野 裕 東京都新宿区西新宿六丁目5番1号 日本 シイエムケイ株式会社内 (72)発明者 川原 隆志 大阪府寝屋川市池田中町19−17 日本ペイ ント株式会社内 (72)発明者 中野 隆博 大阪府寝屋川市池田中町19−17 日本ペイ ント株式会社内 Fターム(参考) 4J002 AA021 BC032 BG002 CC031 CC161 CC181 CC191 CD001 CD002 CF001 CF011 CP031 DE076 DE096 DE146 DJ016 FD012 FD016 GQ00 5E314 AA25 AA32 AA33 BB06 CC07 EE02 FF08 GG11 5E346 AA43 CC09 CC13 EE09 EE33 FF15 GG15 GG18 GG19 GG28 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Hiroshi Yoshino 6-5-1, Nishi-Shinjuku, Shinjuku-ku, Tokyo Japan CMK Co., Ltd. (72) Inventor Takashi Kawahara 19-17 Ikedanakamachi, Neyagawa-shi, Osaka Japan Paint (72) Inventor Takahiro Nakano 19-17 Ikedanakamachi, Neyagawa-shi, Osaka F-term (reference) 4J002 AA021 BC032 BG002 CC031 CC161 CC181 CC191 CD001 CD002 CF001 CF011 CP031 DE076 DE096 DE146 DJ016 FD012 FD016 GQ00 5E314 AA25 AA32 AA33 BB06 CC07 EE02 FF08 GG11 5E346 AA43 CC09 CC13 EE09 EE33 FF15 GG15 GG18 GG19 GG28

Claims (9)

【特許請求の範囲】[Claims] 【請求項1】 プリント配線基板に形成された穴径が3
00μm以下の小径高密度穴用の熱硬化性樹脂系穴埋め
液状樹脂であって、CASSON粘度式における降伏値
が100〜800Pa、残留粘度が0.5〜8.0Pa・s
であることを特徴とするプリント配線基板用穴埋め液状
樹脂。
1. A printed circuit board having a hole diameter of 3
A thermosetting resin-based filling liquid resin for small-diameter, high-density holes of not more than 00 μm, having a yield value of 100 to 800 Pa and a residual viscosity of 0.5 to 8.0 Pa · s in the CASSON viscosity formula.
A liquid filling resin for printed wiring boards, characterized in that:
【請求項2】 硬化時の揮発分が1.5重量%以下の揮
発性を有することを特徴とする請求項1に記載の穴埋め
液状樹脂。
2. The filling resin according to claim 1, wherein a volatile component at the time of curing has a volatility of 1.5% by weight or less.
【請求項3】 不溶性フィラーを含有し、かつ該含有不
溶性フィラーの最大粒径が20μm以下であることを特
徴とする請求項1又は2に記載の穴埋め液状樹脂。
3. The filling resin according to claim 1, further comprising an insoluble filler, wherein the maximum particle diameter of the insoluble filler is 20 μm or less.
【請求項4】 不溶性フィラーが、無機系フィラーであ
ることを特徴とする請求項3に記載の穴埋め液状樹脂。
4. The filling resin according to claim 3, wherein the insoluble filler is an inorganic filler.
【請求項5】 不溶性フィラーが、有機系フィラーと無
機系フィラーからなることを特徴とする請求項3に記載
の穴埋め液状樹脂。
5. The filling resin according to claim 3, wherein the insoluble filler comprises an organic filler and an inorganic filler.
【請求項6】 不溶性フィラーが、有機系フィラーであ
ることを特徴とする請求項3に記載の穴埋め液状樹脂。
6. The filling resin according to claim 3, wherein the insoluble filler is an organic filler.
【請求項7】 不溶性フィラー成分として、揺変剤を含
有することを特徴とする請求項1〜6の何れか1項に記
載の穴埋め液状樹脂。
7. The filling resin according to claim 1, further comprising a thixotropic agent as an insoluble filler component.
【請求項8】 基板に設けたバイアホール又は/及びス
ルーホールに、請求項1〜7の何れか1項に記載の穴埋
め液状樹脂を充填せしめたことを特徴とするビルドアッ
プ配線基板。
8. A build-up wiring board, characterized in that via-holes and / or through-holes provided in the board are filled with the filling resin liquid according to any one of claims 1 to 7.
【請求項9】 ビルドアップ配線基板が、電気回路接続
用銅メッキを施した第1のバイアホール又は/及びスル
ーホールを有する第1の絶縁層と、該第1の絶縁層上に
接して形成された第2の電気回路接続用銅メッキを施し
たバイアホールを有する第2の絶縁層とを含み、該第2
の電気回路接続用銅メッキを施したバイアホールが前記
第1の電気回路接続用銅メッキを施したバイアホール又
は/及びスルーホールの直上又はその近傍に形成されて
いることを特徴とする請求項8に記載のビルドアップ配
線基板。
9. A build-up wiring board is formed in contact with a first insulating layer having a first via hole and / or a through-hole plated with copper for electric circuit connection and on the first insulating layer. A second insulating layer having a copper-plated via hole for connection to a second electric circuit.
The via hole plated with copper plating for electrical circuit connection is formed immediately above or near the via hole and / or through hole plated with copper for the first electrical circuit connection. 9. The build-up wiring board according to 8.
JP32284699A 1999-11-12 1999-11-12 Hole-plugging liquid-shaped resin for printed-wiring board, and build-up wiring board Pending JP2001144420A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32284699A JP2001144420A (en) 1999-11-12 1999-11-12 Hole-plugging liquid-shaped resin for printed-wiring board, and build-up wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32284699A JP2001144420A (en) 1999-11-12 1999-11-12 Hole-plugging liquid-shaped resin for printed-wiring board, and build-up wiring board

Publications (1)

Publication Number Publication Date
JP2001144420A true JP2001144420A (en) 2001-05-25

Family

ID=18148263

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32284699A Pending JP2001144420A (en) 1999-11-12 1999-11-12 Hole-plugging liquid-shaped resin for printed-wiring board, and build-up wiring board

Country Status (1)

Country Link
JP (1) JP2001144420A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100997803B1 (en) * 2008-11-18 2010-12-02 삼성전기주식회사 Manufacturing method of PCB

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100997803B1 (en) * 2008-11-18 2010-12-02 삼성전기주식회사 Manufacturing method of PCB

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