|
US7838850B2
(en)
*
|
1999-12-13 |
2010-11-23 |
Semequip, Inc. |
External cathode ion source
|
|
EP1245036B1
(en)
*
|
1999-12-13 |
2013-06-19 |
Semequip, Inc. |
Ion implantation ion source
|
|
US7838842B2
(en)
*
|
1999-12-13 |
2010-11-23 |
Semequip, Inc. |
Dual mode ion source for ion implantation
|
|
US6452338B1
(en)
*
|
1999-12-13 |
2002-09-17 |
Semequip, Inc. |
Electron beam ion source with integral low-temperature vaporizer
|
|
EP1538655A3
(en)
*
|
1999-12-13 |
2009-06-03 |
Semequip, Inc. |
Ion implantation ion source
|
|
US6670623B2
(en)
*
|
2001-03-07 |
2003-12-30 |
Advanced Technology Materials, Inc. |
Thermal regulation of an ion implantation system
|
|
US20030030010A1
(en)
*
|
2001-08-07 |
2003-02-13 |
Perel Alexander S. |
Decaborane vaporizer having improved vapor flow
|
|
US20030111014A1
(en)
*
|
2001-12-18 |
2003-06-19 |
Donatucci Matthew B. |
Vaporizer/delivery vessel for volatile/thermally sensitive solid and liquid compounds
|
|
US7518124B2
(en)
*
|
2002-03-28 |
2009-04-14 |
Applied Materials, Inc. |
Monatomic dopant ion source and method
|
|
GB2387022B
(en)
*
|
2002-03-28 |
2005-12-21 |
Applied Materials Inc |
Monatomic boron ion source and method
|
|
US7138768B2
(en)
*
|
2002-05-23 |
2006-11-21 |
Varian Semiconductor Equipment Associates, Inc. |
Indirectly heated cathode ion source
|
|
JP4048837B2
(ja)
*
|
2002-05-24 |
2008-02-20 |
日新イオン機器株式会社 |
イオン源の運転方法およびイオン源装置
|
|
EP1808885A1
(en)
*
|
2002-06-26 |
2007-07-18 |
Semequip, Inc. |
A semiconductor device and method of fabricating a semiconductor device
|
|
US6686595B2
(en)
*
|
2002-06-26 |
2004-02-03 |
Semequip Inc. |
Electron impact ion source
|
|
JP2005531158A
(ja)
*
|
2002-06-26 |
2005-10-13 |
セムエキップ インコーポレイテッド |
半導体デバイス及び半導体デバイスの製造方法
|
|
KR100864048B1
(ko)
|
2002-06-26 |
2008-10-17 |
세미이큅, 인코포레이티드 |
이온 소스
|
|
US7300038B2
(en)
*
|
2002-07-23 |
2007-11-27 |
Advanced Technology Materials, Inc. |
Method and apparatus to help promote contact of gas with vaporized material
|
|
US6921062B2
(en)
|
2002-07-23 |
2005-07-26 |
Advanced Technology Materials, Inc. |
Vaporizer delivery ampoule
|
|
US6868869B2
(en)
*
|
2003-02-19 |
2005-03-22 |
Advanced Technology Materials, Inc. |
Sub-atmospheric pressure delivery of liquids, solids and low vapor pressure gases
|
|
US20080200020A1
(en)
*
|
2003-06-18 |
2008-08-21 |
Semequip, Inc. |
Semiconductor device and method of fabricating a semiconductor device
|
|
US6909839B2
(en)
*
|
2003-07-23 |
2005-06-21 |
Advanced Technology Materials, Inc. |
Delivery systems for efficient vaporization of precursor source material
|
|
JP4325852B2
(ja)
*
|
2003-09-19 |
2009-09-02 |
Ｏｋｉセミコンダクタ株式会社 |
イオンソース用ベーパライザ
|
|
US20080073559A1
(en)
*
|
2003-12-12 |
2008-03-27 |
Horsky Thomas N |
Controlling the flow of vapors sublimated from solids
|
|
US7791047B2
(en)
*
|
2003-12-12 |
2010-09-07 |
Semequip, Inc. |
Method and apparatus for extracting ions from an ion source for use in ion implantation
|
|
US7820981B2
(en)
|
2003-12-12 |
2010-10-26 |
Semequip, Inc. |
Method and apparatus for extending equipment uptime in ion implantation
|
|
US7342236B2
(en)
*
|
2004-02-23 |
2008-03-11 |
Veeco Instruments, Inc. |
Fluid-cooled ion source
|
|
US7741621B2
(en)
*
|
2004-07-14 |
2010-06-22 |
City University Of Hong Kong |
Apparatus and method for focused electric field enhanced plasma-based ion implantation
|
|
KR100620227B1
(ko)
*
|
2004-12-14 |
2006-09-08 |
동부일렉트로닉스 주식회사 |
이온 주입 장치의 증발기 조절 방법
|
|
CN101495190B
(zh)
*
|
2005-03-16 |
2013-05-01 |
高级技术材料公司 |
用于从固体源递送试剂的系统
|
|
US7446326B2
(en)
*
|
2005-08-31 |
2008-11-04 |
Varian Semiconductor Equipment Associates, Inc. |
Technique for improving ion implanter productivity
|
|
US20070178678A1
(en)
*
|
2006-01-28 |
2007-08-02 |
Varian Semiconductor Equipment Associates, Inc. |
Methods of implanting ions and ion sources used for same
|
|
US7473606B2
(en)
*
|
2006-02-22 |
2009-01-06 |
United Microelectronics Corp. |
Method for fabricating metal-oxide semiconductor transistors
|
|
WO2007146888A2
(en)
*
|
2006-06-12 |
2007-12-21 |
Semequip, Inc. |
Vapor delivery to devices under vacuum
|
|
US20080241805A1
(en)
|
2006-08-31 |
2008-10-02 |
Q-Track Corporation |
System and method for simulated dosimetry using a real time locating system
|
|
US8013312B2
(en)
*
|
2006-11-22 |
2011-09-06 |
Semequip, Inc. |
Vapor delivery system useful with ion sources and vaporizer for use in such system
|
|
US20080305598A1
(en)
*
|
2007-06-07 |
2008-12-11 |
Horsky Thomas N |
Ion implantation device and a method of semiconductor manufacturing by the implantation of ions derived from carborane molecular species
|
|
WO2009039382A1
(en)
*
|
2007-09-21 |
2009-03-26 |
Semequip. Inc. |
Method for extending equipment uptime in ion implantation
|
|
CN102047376A
(zh)
*
|
2008-05-30 |
2011-05-04 |
艾克塞利斯科技公司 |
注入硼烷时在半导体基片上的粒子控制
|
|
US7812321B2
(en)
*
|
2008-06-11 |
2010-10-12 |
Varian Semiconductor Equipment Associates, Inc. |
Techniques for providing a multimode ion source
|
|
US7759657B2
(en)
|
2008-06-19 |
2010-07-20 |
Axcelis Technologies, Inc. |
Methods for implanting B22Hx and its ionized lower mass byproducts
|
|
US20100019141A1
(en)
*
|
2008-07-25 |
2010-01-28 |
Varian Semiconductor Equipment Associates, Inc. |
Energy contamination monitor with neutral current detection
|
|
JP5220549B2
(ja)
*
|
2008-10-20 |
2013-06-26 |
本田技研工業株式会社 |
アウタロータ型多極発電機のステータ構造体
|
|
MY160165A
(en)
*
|
2009-04-10 |
2017-02-28 |
Applied Materials Inc |
Use special ion source apparatus and implant with molecular ions to process hdd (high density magnetic disks)with patterned magnetic domains
|
|
US8350236B2
(en)
*
|
2010-01-12 |
2013-01-08 |
Axcelis Technologies, Inc. |
Aromatic molecular carbon implantation processes
|
|
US8344337B2
(en)
|
2010-04-21 |
2013-01-01 |
Axcelis Technologies, Inc. |
Silaborane implantation processes
|
|
KR20200124780A
(ko)
|
2012-05-31 |
2020-11-03 |
엔테그리스, 아이엔씨. |
배취식 침착을 위한 고 물질 플럭스를 갖는 유체의 소스 시약-기반 수송
|
|
US9134074B2
(en)
|
2012-10-04 |
2015-09-15 |
Varian Semiconductor Equipment Associates, Inc. |
Method and apparatus for thermal control of ion sources and sputtering targets
|
|
TWI559355B
(zh)
*
|
2014-12-23 |
2016-11-21 |
漢辰科技股份有限公司 |
離子源
|
|
TWI590285B
(zh)
*
|
2015-02-09 |
2017-07-01 |
漢辰科技股份有限公司 |
具有蒸發器的離子源
|
|
KR101967145B1
(ko)
*
|
2017-04-06 |
2019-04-09 |
울박, 인크 |
이온원 및 이온 주입 장치
|