JP2001133979A5 - - Google Patents
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- Publication number
- JP2001133979A5 JP2001133979A5 JP2000249269A JP2000249269A JP2001133979A5 JP 2001133979 A5 JP2001133979 A5 JP 2001133979A5 JP 2000249269 A JP2000249269 A JP 2000249269A JP 2000249269 A JP2000249269 A JP 2000249269A JP 2001133979 A5 JP2001133979 A5 JP 2001133979A5
- Authority
- JP
- Japan
- Prior art keywords
- polymer compound
- resist material
- group
- compound according
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000249269A JP3915870B2 (ja) | 1999-08-25 | 2000-08-21 | 高分子化合物、化学増幅レジスト材料及びパターン形成方法 |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23879399 | 1999-08-25 | ||
JP11-238793 | 1999-08-25 | ||
JP2000249269A JP3915870B2 (ja) | 1999-08-25 | 2000-08-21 | 高分子化合物、化学増幅レジスト材料及びパターン形成方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2001133979A JP2001133979A (ja) | 2001-05-18 |
JP2001133979A5 true JP2001133979A5 (hu) | 2004-10-28 |
JP3915870B2 JP3915870B2 (ja) | 2007-05-16 |
Family
ID=26533898
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000249269A Expired - Lifetime JP3915870B2 (ja) | 1999-08-25 | 2000-08-21 | 高分子化合物、化学増幅レジスト材料及びパターン形成方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3915870B2 (hu) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6461789B1 (en) * | 1999-08-25 | 2002-10-08 | Shin-Etsu Chemical Co., Ltd. | Polymers, chemical amplification resist compositions and patterning process |
AU2001244719A1 (en) | 2000-04-04 | 2001-10-15 | Daikin Industries Ltd. | Novel fluoropolymer having acid-reactive group and chemical amplification type photoresist composition containing the same |
DE60108874T2 (de) * | 2000-06-13 | 2005-12-29 | Asahi Glass Co., Ltd. | Resistzusammensetzung |
EP1302813A4 (en) | 2000-06-21 | 2005-02-23 | Asahi Glass Co Ltd | RESIST COMPOSITION |
JP4449176B2 (ja) * | 2000-06-30 | 2010-04-14 | 住友化学株式会社 | 化学増幅型レジスト組成物 |
JP3945200B2 (ja) * | 2001-09-27 | 2007-07-18 | 信越化学工業株式会社 | 化学増幅レジスト材料及びパターン形成方法 |
JP2003140345A (ja) * | 2001-11-02 | 2003-05-14 | Fuji Photo Film Co Ltd | ポジ型レジスト組成物 |
US6723488B2 (en) * | 2001-11-07 | 2004-04-20 | Clariant Finance (Bvi) Ltd | Photoresist composition for deep UV radiation containing an additive |
KR100498464B1 (ko) * | 2002-11-22 | 2005-07-01 | 삼성전자주식회사 | 불소 함유 감광성 폴리머, 이를 포함하는 레지스트 조성물및 레지스트 조성물을 이용한 패턴 형성 방법 |
JP4222850B2 (ja) | 2003-02-10 | 2009-02-12 | Spansion Japan株式会社 | 感放射線性樹脂組成物、その製造法並びにそれを用いた半導体装置の製造方法 |
JP5750476B2 (ja) * | 2013-07-22 | 2015-07-22 | 東京応化工業株式会社 | レジストパターン形成方法 |
-
2000
- 2000-08-21 JP JP2000249269A patent/JP3915870B2/ja not_active Expired - Lifetime
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