JP2001127304A5 - - Google Patents
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- Publication number
- JP2001127304A5 JP2001127304A5 JP2000242575A JP2000242575A JP2001127304A5 JP 2001127304 A5 JP2001127304 A5 JP 2001127304A5 JP 2000242575 A JP2000242575 A JP 2000242575A JP 2000242575 A JP2000242575 A JP 2000242575A JP 2001127304 A5 JP2001127304 A5 JP 2001127304A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000242575A JP4919530B2 (ja) | 1999-08-18 | 2000-08-10 | 半導体装置の作製方法 |
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11-231165 | 1999-08-18 | ||
| JP23116599 | 1999-08-18 | ||
| JP1999231165 | 1999-08-18 | ||
| JP2000242575A JP4919530B2 (ja) | 1999-08-18 | 2000-08-10 | 半導体装置の作製方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001127304A JP2001127304A (ja) | 2001-05-11 |
| JP2001127304A5 true JP2001127304A5 (enExample) | 2007-09-06 |
| JP4919530B2 JP4919530B2 (ja) | 2012-04-18 |
Family
ID=26529732
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000242575A Expired - Fee Related JP4919530B2 (ja) | 1999-08-18 | 2000-08-10 | 半導体装置の作製方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4919530B2 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4660074B2 (ja) * | 2003-05-26 | 2011-03-30 | 富士フイルム株式会社 | レーザアニール装置 |
| KR101484296B1 (ko) | 2007-06-26 | 2015-01-19 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 기판의 제작방법 |
| CN104282539A (zh) * | 2013-07-04 | 2015-01-14 | 上海和辉光电有限公司 | 一种多晶硅制作方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04364031A (ja) * | 1991-06-10 | 1992-12-16 | Ii & S:Kk | レーザアニール方法およびレーザアニール装置 |
| JP3778456B2 (ja) * | 1995-02-21 | 2006-05-24 | 株式会社半導体エネルギー研究所 | 絶縁ゲイト型薄膜半導体装置の作製方法 |
| JPH09260676A (ja) * | 1996-03-26 | 1997-10-03 | Sharp Corp | 薄膜トランジスタの製造方法 |
| JP3343492B2 (ja) * | 1997-04-02 | 2002-11-11 | シャープ株式会社 | 薄膜半導体装置の製造方法 |
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2000
- 2000-08-10 JP JP2000242575A patent/JP4919530B2/ja not_active Expired - Fee Related