JP2001119083A - Semiconductor magnetism detection element - Google Patents

Semiconductor magnetism detection element

Info

Publication number
JP2001119083A
JP2001119083A JP29505199A JP29505199A JP2001119083A JP 2001119083 A JP2001119083 A JP 2001119083A JP 29505199 A JP29505199 A JP 29505199A JP 29505199 A JP29505199 A JP 29505199A JP 2001119083 A JP2001119083 A JP 2001119083A
Authority
JP
Japan
Prior art keywords
semiconductor
substrate
magnetic sensing
sensing element
extraction electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP29505199A
Other languages
Japanese (ja)
Inventor
Satoshi Ouchi
智 大内
Akihiro Korechika
哲広 是近
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP29505199A priority Critical patent/JP2001119083A/en
Publication of JP2001119083A publication Critical patent/JP2001119083A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To reduce strain stresses applied on a magnetism-sensing part, when temperatures change in a semiconductor magnetism detection element for use in detection of rotation, displacement, or the like of a magnetic body. SOLUTION: A protective substrate 5 is structured, so that an opening gap is formed with respect to a magnetism sensing part comprising a semiconductor magnetism resisting effect film 2 and a short-circuit electrode 3 provided on a semiconductor substrate 1, whereby strain stresses applied on the magnetism sensing part is reduced, when temperatures change, and a magnetism sensitivity of a semiconductor magnetism detection element is enhanced.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、磁性体の回転や直
線移動などの変位検出に用いられる半導体磁気検出素子
に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor magnetic detecting element used for detecting displacement such as rotation or linear movement of a magnetic material.

【0002】[0002]

【従来の技術】半導体磁気検出素子は、InSb,In
Sb−NiSb,InAs等のキャリア移動度が高い半
導体に対し、磁界を作用させたときの電圧や抵抗値が変
化するという性質を利用したものであり、特開平5−1
47422号公報に記載されているように、InSb等
の磁気抵抗膜をSi等の配向基板に直接ヘテロエピタキ
シャル成長させたものである。
2. Description of the Related Art Semiconductor magnetic sensing elements include InSb, In
Japanese Patent Application Laid-Open No. Hei 5-1 is to utilize a property that a voltage and a resistance value when a magnetic field is applied to a semiconductor having a high carrier mobility such as Sb-NiSb and InAs.
As described in Japanese Patent No. 47422, a magnetoresistive film such as InSb is directly heteroepitaxially grown on an oriented substrate such as Si.

【0003】図6に従来の半導体磁気検出素子の構造を
示す。図6において、1は電気的な絶縁性を示す半導体
基板であり、たとえばSi、サファイヤ等が用いられ
る。2は前記半導体基板1上に形成されたInSb,I
nSb−NiSb,InAs等の半導体磁気抵抗効果膜
である。3は短絡電極で、4は取り出し電極であり、そ
れぞれ半導体磁気抵抗効果膜2に電気的に接続され、一
般的に同一材料で形成されている。10はエポキシ樹
脂、ポリイミド樹脂等の保護膜であり、半導体磁気抵抗
効果膜2と短絡電極3に密着するように設けられてお
り、それらから構成される感磁部を保護している。
FIG. 6 shows the structure of a conventional semiconductor magnetic sensing element. In FIG. 6, reference numeral 1 denotes a semiconductor substrate having electrical insulation, for example, Si, sapphire, or the like. Reference numeral 2 denotes InSb, I formed on the semiconductor substrate 1.
It is a semiconductor magnetoresistive film of nSb-NiSb, InAs or the like. Reference numeral 3 denotes a short-circuit electrode, and reference numeral 4 denotes an extraction electrode, each of which is electrically connected to the semiconductor magnetoresistive film 2 and generally formed of the same material. Reference numeral 10 denotes a protective film made of an epoxy resin, a polyimide resin, or the like, which is provided so as to be in close contact with the semiconductor magnetoresistive film 2 and the short-circuit electrode 3, and protects a magnetically sensitive portion formed from these.

【0004】[0004]

【発明が解決しようとする課題】このような半導体磁気
検出素子においては、保護膜10が半導体磁気抵抗効果
膜2と短絡電極3とからなる感磁部に接触している為、
温度が変化すると、保護膜10の熱膨張や熱収縮による
ひずみ応力が感磁部に生じ、そのひずみ応力により半導
体磁気検出素子の抵抗値が変化し、半導体磁気検出素子
の検出精度が低下するという問題があった。
In such a semiconductor magnetic detecting element, since the protective film 10 is in contact with the magnetically sensitive portion formed by the semiconductor magnetoresistive film 2 and the short-circuit electrode 3,
When the temperature changes, a strain stress due to thermal expansion and contraction of the protective film 10 is generated in the magnetic sensing portion, and the strain stress changes the resistance value of the semiconductor magnetic sensing element, thereby lowering the detection accuracy of the semiconductor magnetic sensing element. There was a problem.

【0005】さらに、通常2素子を差動検出するように
用いるため、各素子での保護膜10の形成状態が異なる
と、ひずみ量に差異が生じ、検出精度が悪くなるという
問題があった。
Further, since two elements are normally used for differential detection, if the formation state of the protective film 10 in each element is different, a difference occurs in the amount of distortion, and there is a problem that the detection accuracy is deteriorated.

【0006】従って、近年熱によって生じる感磁部への
ひずみを少なくすることが要求されている。
[0006] Therefore, in recent years, it has been required to reduce distortion to the magnetic sensing portion caused by heat.

【0007】本発明は、このような課題に鑑み、半導体
磁気検出素子の感磁部にひずみをかかりにくくすること
で検出精度を向上した半導体磁気検出素子を提供するこ
とを目的とするものである。
The present invention has been made in view of the above-mentioned problems, and has as its object to provide a semiconductor magnetic detection element having improved detection accuracy by preventing the magnetic sensing portion of the semiconductor magnetic detection element from being easily distorted. .

【0008】[0008]

【課題を解決するための手段】この課題を解決するため
に、本発明の半導体磁気検出素子は、実質的に電気的な
絶縁性を示す半導体基板上に設けたIII−V族化合物よ
りなる半導体磁気抵抗効果膜およびこの半導体磁気抵抗
効果膜上に設けた短絡電極を含む感磁部に対して空隙を
形成するように保護基板を備えたものである。これによ
り、半導体磁気検出素子の感磁部への熱によるひずみが
少なくなり、検出精度を向上することができる。
In order to solve this problem, a semiconductor magnetic sensing element according to the present invention comprises a semiconductor comprising a group III-V compound provided on a semiconductor substrate having substantially electrical insulation. A protective substrate is provided so as to form a gap with respect to the magneto-sensitive portion including the magneto-resistance effect film and the short-circuit electrode provided on the semiconductor magneto-resistance effect film. Thereby, the distortion of the magnetic sensing portion of the semiconductor magnetic sensing element due to heat is reduced, and the detection accuracy can be improved.

【0009】[0009]

【発明の実施の形態】本発明の請求項1に記載の発明
は、実質的に電気的な絶縁性を示す半導体基板と、この
半導体基板上に設けたIII−V族化合物よりなる半導体
磁気抵抗効果膜と、この半導体磁気抵抗効果膜上の中央
部分に設けた短絡電極を含む感磁部と、上記半導体磁気
抵抗効果膜上の端部に設けた取り出し電極と、上記感磁
部に対して空隙を形成するように上記半導体基板の周辺
部に接合した保護基板を備え、上記保護基板の外側に上
記取り出し電極を露出させた半導体磁気検出素子であ
り、感磁部に対して空隙が形成されるように保護基板が
備えられている為、半導体磁気検出素子の感磁部への熱
によるひずみが少なくなり、検出精度が向上するという
作用を有する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The invention according to claim 1 of the present invention is directed to a semiconductor magnetoresistive device comprising a semiconductor substrate having substantially electrical insulation and a III-V compound provided on the semiconductor substrate. An effect film, a magnetically sensitive portion including a short-circuit electrode provided at a central portion on the semiconductor magnetoresistive effect film, an extraction electrode provided at an end portion on the semiconductor magnetoresistive effect film, and a magnetic sensitive portion. A semiconductor magnetic sensing element comprising a protection substrate joined to a peripheral portion of the semiconductor substrate so as to form a gap, and exposing the extraction electrode outside the protection substrate, wherein a gap is formed with respect to the magnetically sensitive portion. Since the protective substrate is provided as described above, the distortion of the magnetic sensing portion of the semiconductor magnetic sensing element due to heat is reduced, and the detection accuracy is improved.

【0010】請求項2に記載の発明は、請求項1におい
て、半導体層と保護基板との接合にスペーサを用いた半
導体磁気検出素子であり、請求項1記載の発明と同様の
作用を有する。
According to a second aspect of the present invention, there is provided a semiconductor magnetic sensing element according to the first aspect, wherein a spacer is used for joining the semiconductor layer and the protective substrate, and has the same function as the first aspect.

【0011】請求項3に記載の発明は、請求項2におい
て、スペーサを感磁部の形成プロセスによって構成した
半導体磁気検出素子であり、請求項1記載の発明と同様
の作用を有する。
According to a third aspect of the present invention, there is provided a semiconductor magnetic sensing element according to the second aspect, wherein the spacer is formed by a process of forming a magnetically sensitive portion, and has the same operation as the first aspect of the present invention.

【0012】請求項4に記載の発明は、実質的に電気的
な絶縁性を示す半導体基板と、この半導体基板上に設け
たIII−V族化合物よりなる半導体磁気抵抗効果膜と、
この半導体磁気抵抗効果膜上の中央部分に設けた短絡電
極を含む感磁部と、上記半導体磁気抵抗効果膜上の端部
に設けた取り出し電極と、上記感磁部に対して空隙を形
成するように上記半導体基板の周辺部に接合した保護基
板を備え、前記保護基板の内側に取り出し電極を配置
し、その保護基板に上記取り出し電極に電気的に接続さ
れた導出電極を設けた半導体磁気検出素子であり、請求
項1記載の発明と同様の作用を有する。
According to a fourth aspect of the present invention, there is provided a semiconductor substrate having substantially electrical insulation, a semiconductor magnetoresistive film made of a group III-V compound provided on the semiconductor substrate,
A magnetic sensing portion including a short-circuit electrode provided at a central portion on the semiconductor magneto-resistance effect film, an extraction electrode provided at an end portion on the semiconductor magneto-resistance effect film, and a gap is formed with respect to the magnetic sensing portion. And a protection substrate joined to a peripheral portion of the semiconductor substrate, an extraction electrode is arranged inside the protection substrate, and a lead-out electrode electrically connected to the extraction electrode is provided on the protection substrate. It is an element and has the same function as the first aspect of the present invention.

【0013】請求項5に記載の発明は、実質的に電気的
な絶縁性を示す半導体基板と、この半導体基板上に設け
たIII−V族化合物よりなる半導体磁気抵抗効果膜と、
この半導体磁気抵抗効果膜上の中央部分に設けた短絡電
極を含む感磁部と、上記半導体磁気抵抗効果膜上の端部
に設けた取り出し電極とより構成された検出素子部、前
記検出素子部のパターン裏面と相対するように配置され
た絶縁基板および前記検出素子部のパターン面と相対
し、当該検出素子部のパターン面上に空隙を形成するよ
うに配置された保護基板を備え、上記絶縁基板と保護基
板を接合し、上記絶縁基板または保護基板のいずれか一
方に上記取り出し電極に電気的に接続された導出電極を
設けた半導体磁気検出素子であり、請求項1記載の発明
と同様の作用を有する。
According to a fifth aspect of the present invention, there is provided a semiconductor substrate having substantially electrical insulation, a semiconductor magnetoresistive film made of a group III-V compound provided on the semiconductor substrate,
A detecting element section comprising a magnetic sensing portion including a short-circuit electrode provided at a central portion on the semiconductor magnetoresistive film, and an extraction electrode provided at an end on the semiconductor magnetoresistive film; An insulating substrate disposed so as to face the back surface of the pattern and a protective substrate disposed so as to form a gap on the pattern surface of the detection element portion, facing the pattern surface of the detection element portion, A semiconductor magnetic sensing element in which a substrate and a protection substrate are joined, and a lead electrode electrically connected to the extraction electrode is provided on one of the insulating substrate and the protection substrate. Has an action.

【0014】請求項6に記載の発明は、請求項5におい
て、絶縁基板と保護基板との接合にスペーサを用いた半
導体磁気検出素子であり、請求項1記載の発明と同様の
作用を有する。
According to a sixth aspect of the present invention, there is provided a semiconductor magnetic sensing element according to the fifth aspect, wherein a spacer is used for joining the insulating substrate and the protective substrate, and has the same function as the first aspect of the present invention.

【0015】以下、本発明の実施の形態について、図1
〜図5を用いて説明する。
FIG. 1 shows an embodiment of the present invention.
This will be described with reference to FIG.

【0016】(実施の形態1)図1は、本発明の半導体
磁気検出素子の第1の実施の形態を示す斜視図である。
(First Embodiment) FIG. 1 is a perspective view showing a first embodiment of a semiconductor magnetic sensing element according to the present invention.

【0017】図1において、1はSi、サファイア、S
OI等の電気的な絶縁性を示す半導体基板、2はInS
b,InSb−NiSb,InAs等のキャリア移動度
が高い半導体磁気抵抗効果膜であり、前記半導体基板1
上に蒸着等の薄膜で直接形成されている。
In FIG. 1, 1 is Si, sapphire, S
A semiconductor substrate showing electrical insulation such as OI;
b, InSb—NiSb, InAs, etc., a semiconductor magnetoresistive film having a high carrier mobility.
It is formed directly on top of a thin film by vapor deposition or the like.

【0018】3はAu/Ni,Al/Cr,Cu/T
i,Cu/Cr,Cu/Ti/Cr等の材料よりなる多
数の短絡電極であり、4は前記短絡電極3と同様の材料
を用いて前記半導体磁気抵抗膜2からの電気信号を取り
出す取り出し電極である。上記短絡電極3は半導体磁気
抵抗膜2の中央部に、上記取り出し電極4は半導体磁気
抵抗膜2の端部に夫々設けられている。
3 is Au / Ni, Al / Cr, Cu / T
A number of short-circuit electrodes made of a material such as i, Cu / Cr, Cu / Ti / Cr, etc., and 4 is an extraction electrode for extracting an electric signal from the semiconductor magnetoresistive film 2 using the same material as the short-circuit electrode 3 It is. The short-circuit electrode 3 is provided at the center of the semiconductor magnetoresistive film 2, and the extraction electrode 4 is provided at the end of the semiconductor magnetoresistive film 2.

【0019】5は半導体磁気抵抗膜2及び短絡電極3か
らなる感磁部に対して空隙を形成するように設けられた
保護基板であり、半導体基板1と直接接合されている。
Reference numeral 5 denotes a protective substrate provided so as to form a gap with respect to a magnetically sensitive portion comprising the semiconductor magnetoresistive film 2 and the short-circuit electrode 3, and is directly bonded to the semiconductor substrate 1.

【0020】なお、保護基板5の材料としては、半導体
基板1と熱膨張係数がほぼ等しい材料を用いることが望
ましく、たとえば半導体基板1にSi基板、保護基板5
にガラス基板を用いる。
It is desirable to use a material having a thermal expansion coefficient substantially equal to that of the semiconductor substrate 1 as the material of the protection substrate 5.
A glass substrate is used.

【0021】本例で作成した半導体磁気検出素子は、感
磁部と保護基板との間に空隙がある為、感磁部へのひず
み応力が軽減され、感磁部の磁気感度が向上する。
In the semiconductor magnetic sensing element manufactured in this embodiment, since there is a gap between the magnetically sensitive part and the protective substrate, the strain stress on the magnetically sensitive part is reduced, and the magnetic sensitivity of the magnetically sensitive part is improved.

【0022】(実施の形態2)図2は、本発明の半導体
磁気検出素子の第2の実施の形態を示す断面図である。
(Embodiment 2) FIG. 2 is a sectional view showing a second embodiment of the semiconductor magnetic sensing element of the present invention.

【0023】図2において、図1に示す部分と同一部分
については、同一番号を付して説明を省略する。図1と
異なるところは、半導体基板1と保護基板5との間にガ
ラス等のスペーサ6を設けることにより、感磁部と保護
基板5との間に所定の空隙が確保されることである。
In FIG. 2, parts that are the same as the parts shown in FIG. 1 are given the same reference numerals, and descriptions thereof will be omitted. The difference from FIG. 1 is that by providing a spacer 6 such as glass between the semiconductor substrate 1 and the protection substrate 5, a predetermined gap is secured between the magnetically sensitive part and the protection substrate 5.

【0024】なお、スペーサは感磁部の形成プロセスに
よって構成されるポリイミド樹脂等であっても同様の効
果を示す。
The same effect can be obtained even if the spacer is made of a polyimide resin or the like formed by the process of forming the magnetically sensitive portion.

【0025】(実施の形態3)図3は、本発明の半導体
磁気検出素子の第3の実施形態を示す断面図である。
(Embodiment 3) FIG. 3 is a sectional view showing a third embodiment of the semiconductor magnetic sensing element of the present invention.

【0026】図3において、図1に示す部分と同一部分
については、同一番号を付して説明を省略する。
In FIG. 3, the same portions as those shown in FIG. 1 are denoted by the same reference numerals and description thereof will be omitted.

【0027】図1と異なるところは、保護基板5上に設
けられた導出電極7を有することであり、材料は取り出
し電極4と同じでも良い。前記導出電極7は、保護基板
5に設けられたスルーホール8を通して取り出し電極4
と電気的に接続されている。
1 is different from FIG. 1 in that it has a lead-out electrode 7 provided on a protective substrate 5, and the material may be the same as that of the extraction electrode 4. The lead-out electrode 7 is taken out through a through-hole 8 provided in the protective substrate 5,
Is electrically connected to

【0028】なお、スルーホール8には導電性ペースト
等を用いる為、取り出し電極4と保護基板5との間に空
隙が無いように半導体基板1と保護基板5を接合する。
Since a conductive paste or the like is used for the through hole 8, the semiconductor substrate 1 and the protection substrate 5 are joined so that there is no gap between the extraction electrode 4 and the protection substrate 5.

【0029】また、半導体基板1上からの取り出し電極
1の高さを短絡電極3の高さよりも高くなるように構成
することにより、感磁部と保護基板との間に空隙を形成
することが出来る。
Further, by forming the height of the extraction electrode 1 above the semiconductor substrate 1 to be higher than the height of the short-circuit electrode 3, it is possible to form a gap between the magnetic sensing portion and the protection substrate. I can do it.

【0030】(実施の形態4)図4は、本発明の半導体
磁気検出素子の第4の実施の形態を示す断面図である。
(Embodiment 4) FIG. 4 is a sectional view showing a fourth embodiment of the semiconductor magnetic sensing element of the present invention.

【0031】図4において、図1、図3に示す部分と同
一部分については、同一番号を付して説明を省略する。
図1と異なるところは、検出素子部のパターン裏面に配
置されたガラス等の絶縁基板9に対して保護基板5を直
接接合することにより、感磁部上に空隙を形成したこと
である。
In FIG. 4, parts that are the same as the parts shown in FIGS. 1 and 3 are given the same reference numerals, and descriptions thereof will be omitted.
The difference from FIG. 1 is that the protection substrate 5 is directly bonded to an insulating substrate 9 made of glass or the like disposed on the back surface of the pattern of the detection element portion, thereby forming a gap on the magnetic sensing portion.

【0032】(実施の形態5)図5は、本発明の半導体
磁気検出素子の第5の実施の形態を示す断面図である。
(Embodiment 5) FIG. 5 is a sectional view showing a fifth embodiment of the semiconductor magnetic sensing element of the present invention.

【0033】図5において、図1、図3、図4に示す部
分と同一部分については、同一番号を付して説明を省略
する。図1と異なるところは、検出素子部のパターン裏
面に配置された絶縁基板9と保護基板5との間に設けら
れたスペーサ6により、感磁部上に空隙を形成したこと
である。
In FIG. 5, the same parts as those shown in FIGS. 1, 3 and 4 are denoted by the same reference numerals and description thereof is omitted. The difference from FIG. 1 is that a gap is formed on the magneto-sensitive part by the spacer 6 provided between the insulating substrate 9 and the protective substrate 5 arranged on the back surface of the pattern of the detection element part.

【0034】[0034]

【発明の効果】以上のように本発明の半導体磁気検出素
子は、感磁部上に直接保護膜を形成する従来の半導体磁
気検出素子に比べて、温度変化があった場合の感磁部の
ひずみによる応力が除去できる為、磁気感度が向上し検
出精度があがるという利点を有する。
As described above, the semiconductor magnetic sensing element according to the present invention has a larger sensitivity than the conventional semiconductor magnetic sensing element in which a protective film is formed directly on the magnetic sensing part when there is a temperature change. Since stress due to strain can be removed, there is an advantage that magnetic sensitivity is improved and detection accuracy is improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の半導体磁気検出素子の第1の実施の形
態を示した斜視図
FIG. 1 is a perspective view showing a first embodiment of a semiconductor magnetic sensing element of the present invention.

【図2】同第2の実施の形態を示した断面図FIG. 2 is a cross-sectional view showing the second embodiment.

【図3】同第3の実施の形態を示した断面図FIG. 3 is a sectional view showing the third embodiment.

【図4】同第4の実施の形態を示した断面図FIG. 4 is a sectional view showing the fourth embodiment.

【図5】同第5の実施の形態を示した断面図FIG. 5 is a sectional view showing the fifth embodiment.

【図6】従来の磁気検出素子の断面図FIG. 6 is a sectional view of a conventional magnetic sensing element.

【符号の説明】[Explanation of symbols]

1 半導体基板 2 半導体磁気抵抗効果膜 3 短絡電極 4 取り出し電極 5 保護基板 6 スペーサ 7 導出電極 8 スルーホール 9 絶縁基板 10 保護膜 REFERENCE SIGNS LIST 1 semiconductor substrate 2 semiconductor magnetoresistive film 3 short-circuit electrode 4 extraction electrode 5 protective substrate 6 spacer 7 lead electrode 8 through hole 9 insulating substrate 10 protective film

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 実質的に電気的な絶縁性を示す半導体基
板と、この半導体基板上に設けたIII−V族化合物より
なる半導体磁気抵抗効果膜と、この半導体磁気抵抗効果
膜上の中央部分に設けた短絡電極を含む感磁部と、上記
半導体磁気抵抗効果膜上の端部に設けた取り出し電極
と、上記感磁部に対して空隙を形成するように上記半導
体基板の周辺部に接合した保護基板を備え、上記保護基
板の外側に上記取り出し電極を露出させた半導体磁気検
出素子。
1. A semiconductor substrate exhibiting substantially electrical insulation, a semiconductor magnetoresistive effect film made of a group III-V compound provided on the semiconductor substrate, and a central portion on the semiconductor magnetoresistive effect film A magnetic sensing portion including a short-circuit electrode provided on the semiconductor substrate; an extraction electrode provided at an end on the semiconductor magnetoresistive film; and a peripheral portion of the semiconductor substrate so as to form a gap with respect to the magnetic sensing portion. A semiconductor magnetic sensing element comprising: a protective substrate, wherein the extraction electrode is exposed outside the protective substrate.
【請求項2】 前記半導体磁気抵抗効果膜と保護基板と
の接合にスペーサを用いた請求項1記載の半導体磁気検
出素子。
2. The semiconductor magnetic sensing element according to claim 1, wherein a spacer is used for joining the semiconductor magnetoresistive film and the protective substrate.
【請求項3】 前記スペーサは感磁部の形成プロセスに
よって構成した請求項2記載の半導体磁気検出素子。
3. The semiconductor magnetic sensing element according to claim 2, wherein said spacer is formed by a process of forming a magnetically sensitive portion.
【請求項4】 実質的に電気的な絶縁性を示す半導体基
板と、この半導体基板上に設けたIII−V族化合物より
なる半導体磁気抵抗効果膜と、この半導体磁気抵抗効果
膜上の中央部分に設けた短絡電極を含む感磁部と、上記
半導体磁気抵抗効果膜上の端部に設けた取り出し電極
と、上記感磁部に対して空隙を形成するように上記半導
体基板の周辺部に接合した保護基板を備え、前記保護基
板の内側に取り出し電極を配置し、その保護基板に上記
取り出し電極に電気的に接続された導出電極を設けた半
導体磁気検出素子。
4. A semiconductor substrate exhibiting substantially electrical insulation, a semiconductor magnetoresistive effect film made of a group III-V compound provided on the semiconductor substrate, and a central portion on the semiconductor magnetoresistive effect film A magnetic sensing portion including a short-circuit electrode provided on the semiconductor substrate; an extraction electrode provided at an end on the semiconductor magnetoresistive film; and a peripheral portion of the semiconductor substrate so as to form a gap with respect to the magnetic sensing portion. A semiconductor magnetic sensing element comprising: a protective substrate formed as described above; an extraction electrode disposed inside the protection substrate; and a lead electrode electrically connected to the extraction electrode on the protection substrate.
【請求項5】 実質的に電気的な絶縁性を示す半導体基
板と、この半導体基板上に設けたIII−V族化合物より
なる半導体磁気抵抗効果膜と、この半導体磁気抵抗効果
膜上の中央部分に設けた短絡電極を含む感磁部と、上記
半導体磁気抵抗効果膜上の端部に設けた取り出し電極と
より構成された検出素子部、前記検出素子部のパターン
裏面と相対するように配置された絶縁基板および前記検
出素子部のパターン面と相対し、当該検出素子部のパタ
ーン面上に空隙を形成するように配置された保護基板を
備え、上記絶縁基板と保護基板を接合し、上記絶縁基板
または保護基板のいずれか一方に上記取り出し電極に電
気的に接続された導出電極を設けた半導体磁気検出素
子。
5. A semiconductor substrate having substantially electrical insulation, a semiconductor magnetoresistive film made of a group III-V compound provided on the semiconductor substrate, and a central portion on the semiconductor magnetoresistive film A sensing element portion including a magnetic sensing portion including a short-circuit electrode provided on the substrate, and an extraction electrode provided at an end portion of the semiconductor magnetoresistive film, and is arranged so as to face a pattern back surface of the sensing element portion. A protection substrate disposed so as to form an air gap on the pattern surface of the detection element portion, facing the insulation substrate and the pattern surface of the detection element portion, and joining the insulation substrate and the protection substrate, A semiconductor magnetic sensing element in which a lead electrode electrically connected to the extraction electrode is provided on one of a substrate and a protection substrate.
【請求項6】 前記絶縁基板と保護基板との接合にスペ
ーサを用いた請求項5記載の半導体磁気検出素子。
6. The semiconductor magnetic sensing element according to claim 5, wherein a spacer is used for joining the insulating substrate and the protection substrate.
JP29505199A 1999-10-18 1999-10-18 Semiconductor magnetism detection element Pending JP2001119083A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29505199A JP2001119083A (en) 1999-10-18 1999-10-18 Semiconductor magnetism detection element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29505199A JP2001119083A (en) 1999-10-18 1999-10-18 Semiconductor magnetism detection element

Publications (1)

Publication Number Publication Date
JP2001119083A true JP2001119083A (en) 2001-04-27

Family

ID=17815694

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29505199A Pending JP2001119083A (en) 1999-10-18 1999-10-18 Semiconductor magnetism detection element

Country Status (1)

Country Link
JP (1) JP2001119083A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006128213A (en) * 2004-10-26 2006-05-18 Denso Corp Semiconductor device
US7786726B2 (en) 2005-08-05 2010-08-31 Kabushiki Kaisha Tokai Rika Denki Seisakusho Sensor
JP2014192241A (en) * 2013-03-26 2014-10-06 Asahi Kasei Electronics Co Ltd Magnetic sensor and production method of the same

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006128213A (en) * 2004-10-26 2006-05-18 Denso Corp Semiconductor device
JP4496918B2 (en) * 2004-10-26 2010-07-07 株式会社デンソー Semiconductor device
US7786726B2 (en) 2005-08-05 2010-08-31 Kabushiki Kaisha Tokai Rika Denki Seisakusho Sensor
JP2014192241A (en) * 2013-03-26 2014-10-06 Asahi Kasei Electronics Co Ltd Magnetic sensor and production method of the same

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