JP2001071511A - Method for forming liquid chamber in ink jet printer head - Google Patents

Method for forming liquid chamber in ink jet printer head

Info

Publication number
JP2001071511A
JP2001071511A JP25118499A JP25118499A JP2001071511A JP 2001071511 A JP2001071511 A JP 2001071511A JP 25118499 A JP25118499 A JP 25118499A JP 25118499 A JP25118499 A JP 25118499A JP 2001071511 A JP2001071511 A JP 2001071511A
Authority
JP
Japan
Prior art keywords
adhesive
substrate
substrates
bonding
liquid chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP25118499A
Other languages
Japanese (ja)
Other versions
JP4155481B2 (en
Inventor
Kunihiro Yamanaka
邦裕 山中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP25118499A priority Critical patent/JP4155481B2/en
Publication of JP2001071511A publication Critical patent/JP2001071511A/en
Application granted granted Critical
Publication of JP4155481B2 publication Critical patent/JP4155481B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Particle Formation And Scattering Control In Inkjet Printers (AREA)

Abstract

PROBLEM TO BE SOLVED: To execute heat-bonding of substrates in a short time in the case where a substrate laminated body for forming a liquid chamber of an ink jet printer head is produced. SOLUTION: A layer of an adhesive that represents and adhesive force by heating is interposed between substrates and the adhesive layer is heated by a lamp light source and then the substrates are bonded to form a substrate laminated body. When the silicon substrate 1, 3 are bonded with each other, a thermoplastic polyimide series adhesive 2 (organic solvent) is coated on the surface of the substrate 1 to be bonded and leveling, preliminary drying and making of film is applied to the adhesive 2. The substrate 1 is loaded on a support member 7 of quartz and the substrate 3 is aligned to be loaded in contact with the substrate 1. While these substrates 1, 3 are pressed by a pressing plate 8, the adhesive 2 (together with the substrates) is concentratively heated by a halogen lamp 4a, thereby achieving the bonding of the substrates 1, 3.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、インクジェットプ
リンタヘッドの液室を構成するための、複数の基板を接
合積層してなる基板積層体の作製方法に関し、更に詳し
くは、上記基板同士の接着方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a substrate laminate formed by joining and laminating a plurality of substrates for forming a liquid chamber of an ink-jet printer head. It is about.

【0002】[0002]

【従来の技術】従来、インクジェットプリンタヘッドの
液室構成用の基板積層体を得る場合において、基板同士
を接着により貼り合わせる方法としては、接着フィルム
がラミネートされているか、または接着剤が塗布されて
いる基板を、被接合基板に重ね合わせて熱圧着する方法
が一般的に採用されている。
2. Description of the Related Art Conventionally, when a substrate laminate for forming a liquid chamber of an ink jet printer head is obtained, a method of bonding substrates by bonding is to laminate an adhesive film or apply an adhesive. In general, a method of superimposing a substrate on a substrate to be joined and thermocompression bonding is adopted.

【0003】近年、インクジェットプリンタの高解像度
化に伴い、インクジェットプリンタヘッドを構成する部
材では構造の微細化が進んでおり、このため熱圧着に際
しては、高精度のアラインメントが要求される。この熱
圧着方法には、基板を加圧治具にアラインメントして設
置した後、この加圧治具を加熱炉へ投入する方法や、ヒ
ーター内蔵のプレス機を用い、ヒーター内蔵のステージ
にて接合基板を加圧(プレス)する方法がある。
In recent years, as the resolution of an ink jet printer has been increased, the structure of members constituting the ink jet printer head has been miniaturized. Therefore, high precision alignment is required for thermocompression bonding. In this thermocompression bonding method, the substrate is aligned with a pressing jig and installed, and then this pressing jig is put into a heating furnace. There is a method of pressing (pressing) the substrate.

【0004】[0004]

【発明が解決しようとする課題】しかし、前者の熱圧着
方法においては、加圧治具が所望の温度に到達するのに
時間を要し、特に所望の温度が高い(例えぱ200℃以
上)ほどプロセスタイムの増加し、この処理時間の増加
は、プロセスコストとして無視できなくなるという問題
があった。
However, in the former thermocompression bonding method, it takes time for the pressing jig to reach a desired temperature, and particularly when the desired temperature is high (for example, 200 ° C. or higher). As the process time increases, there is a problem that the increase in the processing time cannot be ignored as a process cost.

【0005】後者の熱圧着方法では、上記ヒーターが所
望の温度まで到達するのに時間を要する。また、ステー
ジをあらかじめ所望の温度にしておく場合、アラインメ
ント方法によっては不具合が生じていた。また、前述し
たように、基板を加圧する前に高精度のアラインメント
が必要であるから、CCDカメラを用いる場合には、カ
メラの軸ぶれや熱による像のゆらぎなどがアラインメン
トの妨げになるし、カメラの寿命が短くなるという問題
もあった。
In the latter thermocompression bonding method, it takes time for the heater to reach a desired temperature. In addition, when the stage is set to a desired temperature in advance, a problem has occurred depending on the alignment method. Also, as described above, since high-precision alignment is required before the substrate is pressed, when a CCD camera is used, camera shake and image fluctuation due to heat hinder the alignment, There is also a problem that the life of the camera is shortened.

【0006】本発明は、上記問題点に鑑みなされたもの
で、その目的は、基板同士の接合によりインクジェット
プリンタヘッドの液室構成用の基板積層体を作製するに
際し、基板接合時の加熱をランプ加熱によって行うこと
で、基板および接着剤のみを効率良く加熱し(基板およ
び接着剤を選択的に集中加熱する)、それにより基板同
士の加熱接合を短時間に実現することにある。
SUMMARY OF THE INVENTION The present invention has been made in view of the above-described problems, and has as its object to produce a substrate laminate for forming a liquid chamber of an ink jet printer head by bonding substrates, and to heat the substrate at the time of substrate bonding with a lamp. By performing the heating, only the substrate and the adhesive are efficiently heated (selective concentrated heating of the substrate and the adhesive), thereby realizing the heat bonding between the substrates in a short time.

【0007】[0007]

【課題を解決するための手段】請求項1に記載のインク
ジェットプリンタヘッドの液室作製方法は、複数の基板
を接合積層してなる基板積層体によりインクジェットプ
リンタヘッドの液室を作製するに際し、接合するべき基
板間に、加熱により接着力を発現する接着剤の層を介在
させ、該接着剤層をランプ光源で加熱して基板同士を接
合することにより基板積層体を得ることを特徴とする。
According to a first aspect of the present invention, there is provided a method for manufacturing a liquid chamber of an ink jet printer head, comprising the steps of: forming a liquid chamber of an ink jet printer head by using a substrate laminate formed by bonding and laminating a plurality of substrates; A substrate laminate is obtained by interposing an adhesive layer exhibiting adhesive force by heating between substrates to be bonded, heating the adhesive layer with a lamp light source, and joining the substrates to each other.

【0008】請求項1の液室作製方法において、接合す
るべき基板間に上記接着剤の層を介在させる方法として
は、(1)基板間に上記接着剤層のみを介在させるも
の、(2)両面に上記接着剤層を形成した接着フィルム
(例えば、プラスチックフィルム基材の両面に熱可塑性
樹脂系の接着剤を積層してなるラミネートフィルム)を
基板間に介在させるものなどが挙げられる。
In the liquid chamber manufacturing method of the first aspect, the method of interposing the adhesive layer between the substrates to be joined includes: (1) interposing only the adhesive layer between the substrates; (2) An adhesive film having the above-described adhesive layer formed on both surfaces thereof (for example, a laminate film obtained by laminating a thermoplastic resin-based adhesive on both surfaces of a plastic film substrate) is provided between substrates.

【0009】請求項2に記載の液室作製方法は、請求項
1において、複数の基板がシリコンからなる(すなわち
シリコン基板)ことを特徴とする。
A liquid chamber manufacturing method according to a second aspect is characterized in that, in the first aspect, the plurality of substrates are made of silicon (ie, a silicon substrate).

【0010】請求項3に記載の液室作製方法は、請求項
2において、ランプ光源として短波長アークランプを用
いることを特徴とする。
A third aspect of the present invention is directed to the liquid chamber manufacturing method according to the second aspect, wherein a short wavelength arc lamp is used as a lamp light source.

【0011】請求項4に記載の液室作製方法は、請求項
1,2または3において、接着剤として熱可塑性ポリイ
ミド系接着剤を用いることを特徴とする。
A liquid chamber manufacturing method according to a fourth aspect is characterized in that, in the first, second or third aspect, a thermoplastic polyimide adhesive is used as the adhesive.

【0012】請求項5に記載の液室作製方法は、請求項
4において、熱可塑性ポリイミド系接着剤として、ガラ
ス転移温度が120℃以上のものを用いることを特徴と
する。
A liquid chamber manufacturing method according to a fifth aspect is characterized in that in the fourth aspect, a thermoplastic polyimide adhesive having a glass transition temperature of 120 ° C. or more is used.

【0013】請求項6に記載の液室作製方法は、請求項
4または5において、基板同士の接合工程がランプ光源
を用いる短時間の仮接合工程と、その後のランプ光源を
用いる本接合工程とを含むものであり、該本接合工程で
は仮接合工程よりも長時間または高温の加熱を行うこと
を特徴とする。
According to a sixth aspect of the present invention, in the liquid chamber manufacturing method according to the fourth or fifth aspect, the step of bonding the substrates includes a short-time temporary bonding step using a lamp light source and a subsequent main bonding step using a lamp light source. In the final bonding step, heating is performed for a longer time or at a higher temperature than in the temporary bonding step.

【0014】請求項7に記載の液室作製方法は、請求項
1,2または3において、接着剤として熱硬化性ポリイ
ミド系接着剤を用いることを特徴とする。
[0014] In a seventh aspect of the invention, there is provided a method for producing a liquid chamber, wherein a thermosetting polyimide adhesive is used as the adhesive.

【0015】請求項1〜7に係る製造方法では、接合時
の加熱にランプ加熱を用いるので、基板同士の接合を短
時間に行うことができる。また、基板材料の基礎吸収波
長に合ったランプ光源を用いることによって、基板を高
い加熱効率で加熱し、より短時間で接合を完了させるこ
とが可能となる。また、基板として微細加工が可能なシ
リコン基板を用いた場合には、ランプ光源に短波長アー
クランプ(波長が1μm程度)を用いることで、基板を
効率良く加熱することができ、短時間での接合が可能に
なる。さらに、ポリイミド樹脂系の接着剤を用いること
により、インク耐性が高く、しかも高ヤング率の接合が
可能となる。
In the manufacturing method according to the first to seventh aspects, since the lamp heating is used for heating at the time of bonding, the bonding between the substrates can be performed in a short time. In addition, by using a lamp light source that matches the fundamental absorption wavelength of the substrate material, the substrate can be heated with high heating efficiency, and the bonding can be completed in a shorter time. When a silicon substrate that can be finely processed is used as a substrate, the substrate can be efficiently heated by using a short-wavelength arc lamp (wavelength is about 1 μm) as a lamp light source. Joining becomes possible. Furthermore, by using a polyimide resin-based adhesive, bonding with high ink resistance and a high Young's modulus becomes possible.

【0016】とくに、請求項6に係る作製方法では、熱
可塑性ポリイミド系接着剤の有機溶剤溶液を塗布した
後、該塗布膜から有機溶剤を乾燥・蒸発により除去して
一次硬化させる(フィルム化する)ことでタック性をな
くすことができる。また、このタック性排除後に上記フ
ィルム状の接着剤層によって基板同士の接合を行うこと
ができるため、耐ダスト性および搬送性に優れた接合工
程が実現できる。また、接着剤が熱可塑性樹脂系のもの
であるためブリーディングが発生しないので、接着剤の
「はみ出し」が抑制される。上記「ブリーディング」と
は、融点が異なる主剤と副剤(添加剤)のどちらかが先
にメルトし、流動拡散することである。
In particular, in the manufacturing method according to the sixth aspect, after applying an organic solvent solution of a thermoplastic polyimide-based adhesive, the organic solvent is removed from the applied film by drying and evaporating so as to be primarily cured (to form a film). ) Can eliminate tackiness. Further, since the bonding between the substrates can be performed by the film-like adhesive layer after removing the tackiness, a bonding process excellent in dust resistance and transportability can be realized. In addition, since the adhesive is of a thermoplastic resin type, bleeding does not occur, so that "adhesion" of the adhesive is suppressed. The above-mentioned "bleeding" means that either one of the main agent and the auxiliary agent (additive) having different melting points melts first and flows and diffuses.

【0017】一方、上記熱硬化性ポリイミド系接着剤の
使用方法としては、(1)熱可塑性ポリイミド系接着剤
の場合と同じように、熱硬化性ポリイミドを主体とする
接着剤を有機溶剤に溶解して使用するものや、(2)ポ
リイミドの前駆体であるポリアミド酸の有機溶剤溶液を
基板表面に塗布した後、このポリアミド酸をベーキング
(ランプ加熱)によりポリイミド化させるものなどが採
用できる。
On the other hand, the method of using the thermosetting polyimide-based adhesive is as follows: (1) As in the case of the thermoplastic polyimide-based adhesive, an adhesive mainly composed of a thermosetting polyimide is dissolved in an organic solvent. And (2) an organic solvent solution of a polyamic acid, which is a precursor of polyimide, is applied to the substrate surface, and then the polyamic acid is converted into a polyimide by baking (lamp heating).

【0018】[0018]

【実施例】本発明に係る液室作製方法の実施例を、図面
を参照して工程順に説明する。 実施例1(請求項1,2,4に対応する) 工程1:インクジェットプリンタヘッドの液室(の一
部)を構成するための基板1および基板3を用意し、図
1に示すように基板1(または基板3)の接合面に、熱
可塑性ポリイミド系の接着剤2を塗布した。この接着剤
2としては、主体である熱可塑性ポリイミドを適当な有
機溶剤に溶解した液状のものを採用した。本実施例で
は、日東電工(株)製の可塑剤としてシリコンが添加さ
れた変性ポリイミド樹脂をNMP(n−メチルピロリド
ン)に溶解した接着剤を採用した。また上記基板1,3
はシリコンからなり、あかじめ所定の微細加工が施され
ているものである。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of a method for producing a liquid chamber according to the present invention will be described in the order of steps with reference to the drawings. Example 1 (corresponding to claims 1, 2 and 4) Step 1: A substrate 1 and a substrate 3 for constituting (a part of) a liquid chamber of an ink jet printer head are prepared, and as shown in FIG. A thermoplastic polyimide adhesive 2 was applied to the bonding surface of the substrate 1 (or the substrate 3). As the adhesive 2, a liquid obtained by dissolving thermoplastic polyimide as a main component in an appropriate organic solvent was used. In this example, an adhesive made by dissolving a modified polyimide resin to which silicon was added as a plasticizer in NMP (n-methylpyrrolidone) manufactured by Nitto Denko Corporation was used. In addition, the substrates 1 and 3
Is made of silicon and has been subjected to predetermined fine processing in advance.

【0019】工程2:基板1上の接着剤2のレベリング
を50℃・10分の条件で行った後、予備乾燥を170
℃で20分間行い、さらに250℃・10分の条件で接
着剤中の溶剤の均一蒸発と接着剤層のフィルム化とを行
った。
Step 2: After leveling the adhesive 2 on the substrate 1 at 50 ° C. for 10 minutes, pre-drying is performed at 170 ° C.
At 20 ° C. for 20 minutes, the solvent in the adhesive was evenly evaporated and the adhesive layer was formed into a film at 250 ° C. for 10 minutes.

【0020】工程3:図2に示すように、ハロゲンラン
プ4aとその背面側に設けた反射板4bとからなるラン
プ光源4の上方に、支持板5と支持具6とからなる支持
部材7を配置し、支持具6上に、フィルム状の接着剤層
を形成した基板1を載せた。ついで、基板1上に基板3
をアラインメント(位置合わせ)して載置・接触させ
た。上記支持板5および支持具6は、波長4μm以下の
可視光の殆どが透過する石英で構成した。ついで、基板
3上に加圧板8を重ね、2kgf/cm2 の圧力で基板
1,3を加圧した。
Step 3: As shown in FIG. 2, a support member 7 composed of a support plate 5 and a support member 6 is placed above a lamp light source 4 composed of a halogen lamp 4a and a reflection plate 4b provided on the back side thereof. The substrate 1 on which the film-shaped adhesive layer was formed and placed on the support 6 was placed. Then, the substrate 3 is placed on the substrate 1.
Were aligned (positioned) and placed and contacted. The support plate 5 and the support 6 were made of quartz through which almost all visible light having a wavelength of 4 μm or less was transmitted. Then, the pressure plate 8 was placed on the substrate 3 and the substrates 1 and 3 were pressed at a pressure of 2 kgf / cm 2 .

【0021】工程4:上記加圧状態を維持しながらハロ
ゲンランプ4aの出力を上げ、基板およびフィルム状接
着剤を加熱した。この場合、およそ20秒で250℃ま
で昇温させ、250℃で30秒間保持した後、ランプ出
力を下げて基板同士の接合を完了させた。
Step 4: The output of the halogen lamp 4a was increased while maintaining the above-mentioned pressurized state, and the substrate and the film adhesive were heated. In this case, the temperature was raised to 250 ° C. in about 20 seconds, held at 250 ° C. for 30 seconds, and then the lamp output was lowered to complete the bonding between the substrates.

【0022】工程5:支持部材7から接合後の基板1,
3を取り出して室温まで放冷し、工程1〜4を繰り返す
ことにより基板3上に別のシリコン基板を接合すること
で、3枚の基板からなる基板接合体を得た。以下同様に
して、インクジェットプリンタヘッドの液室構成に必要
な枚数の基板を接合して所望の基板積層体を得た。
Step 5: Substrate 1 joined from supporting member 7
3 was taken out, allowed to cool to room temperature, and steps 1 to 4 were repeated to join another silicon substrate onto the substrate 3 to obtain a substrate joined body composed of three substrates. Thereafter, in the same manner, a desired number of substrates were joined to form a desired substrate laminate for the liquid chamber configuration of the ink jet printer head.

【0023】実施例2(請求項3に対応する) シリコン基板として基礎吸収波長が1μm前後のものを
採用するとともに、ランプ光源として短波長アークラン
プ(波長1μm)を用いた。実施例1の工程1〜3と同
様に処理した後、上記工程4と同様に、アークランプの
出力を上げて基板およびフィルム状接着剤層を加熱する
ことで基板同士の接合を行った。この場合、10秒間で
250℃まで昇温させ、250℃で30秒間保持した
後、ランプ出力を下げて接合を完了させた。この実施例
では、基板の吸収波長に合った波長のランプ光源を用い
ることにより、基板を効率良く、しかもより均一に加熱
することができた。
Example 2 (corresponding to claim 3) A silicon substrate having a fundamental absorption wavelength of about 1 μm was used as a silicon substrate, and a short-wavelength arc lamp (1 μm in wavelength) was used as a lamp light source. After processing in the same manner as in Steps 1 to 3 of Example 1, the output of the arc lamp was increased and the substrate and the film-like adhesive layer were heated to bond the substrates as in Step 4 above. In this case, the temperature was raised to 250 ° C. in 10 seconds, held at 250 ° C. for 30 seconds, and then the lamp output was lowered to complete the bonding. In this example, the substrate could be efficiently and more uniformly heated by using a lamp light source having a wavelength matching the absorption wavelength of the substrate.

【0024】実施例3 図3に示すように、実施例1で得た基板積層体10(1
0a,10b)を振動板13に接着して液室11を作製
した。この場合、接着剤12としてガラス転移温度(T
G)が80℃の熱可塑性ポリイミド系接着剤を用い、実
施例1と同様の工程に従った。
Example 3 As shown in FIG. 3, the substrate laminate 10 (1
0a and 10b) were adhered to the diaphragm 13 to form the liquid chamber 11. In this case, the glass transition temperature (T
G) was carried out in the same manner as in Example 1 using a thermoplastic polyimide-based adhesive at 80 ° C.

【0025】実施例4(請求項5に対応する) 実施例3と同様の方法で図4に示す液室11を作製し
た。ただしこの場合、接着剤12としてTGが130℃
の熱可塑性ポリイミド系接着剤を用いた。
Example 4 (corresponding to claim 5) A liquid chamber 11 shown in FIG. 4 was prepared in the same manner as in Example 3. However, in this case, TG is 130 ° C. as the adhesive 12.
Was used.

【0026】〔実施例3,4で作製した液室の評価〕図
3に示すように、実施例3で作製した液室11に圧電素
子20を、エポキシ系接着剤21を用いて接着した。こ
の接着は、振動板13と圧電素子20とを圧力3kgf
/cm2 で加圧しながら、接着剤21を110℃に加熱
することにより行った。別に、実施例4で得た液室に図
3と同じ圧電素子20を、上記と同一条件で接着した。
[Evaluation of Liquid Chambers Produced in Examples 3 and 4] As shown in FIG. 3, a piezoelectric element 20 was bonded to the liquid chamber 11 prepared in Example 3 using an epoxy adhesive 21. This bonding applies a pressure of 3 kgf between the diaphragm 13 and the piezoelectric element 20.
This was performed by heating the adhesive 21 to 110 ° C. while applying a pressure of / cm 2 . Separately, the same piezoelectric element 20 as in FIG. 3 was bonded to the liquid chamber obtained in Example 4 under the same conditions as above.

【0027】その結果、実施例3の液室11と圧電素子
20との接着体では、基板積層体10aの(図3におい
て右側への)位置ずれが発生し、基板積層体10bで
は、上記位置ずれと逆向きの接着剤12の「はみ出し」
12aが観られた。これらは、圧電素子20の接着時に
接着剤12が軟化した(TGが80℃と低いため)こと
に起因していると考えられる。これに対し実施例4で作
製した液室11と圧電素子20との接着体では、図4に
示すように、上記不具合は観られなかった。
As a result, in the bonded body of the liquid chamber 11 and the piezoelectric element 20 according to the third embodiment, the displacement of the substrate laminate 10a (to the right in FIG. 3) occurs. "Overhang" of the adhesive 12 in the opposite direction to the slip
12a was watched. It is considered that these are caused by the softening of the adhesive 12 during the bonding of the piezoelectric element 20 (because the TG is as low as 80 ° C.). On the other hand, in the bonded body of the liquid chamber 11 and the piezoelectric element 20 manufactured in Example 4, as shown in FIG. 4, the above problem was not observed.

【0028】実施例5(請求項6に対応する) 図1に示す実施例1では、ランプ加熱時に基板1のうち
支持具6で支持された部分(支持具6と接触する部分)
や、基板外周部の温度が低くなるため、これらの部分の
接着が不完全になる場合がある。これを防止するための
対策としては、仮接合と、その後の本接合とを組み合わ
せた接合方法が有効である。以下、この方法の実施例に
ついて説明する。
Embodiment 5 (corresponding to claim 6) In Embodiment 1 shown in FIG. 1, a portion of the substrate 1 supported by the support 6 during heating of the lamp (a portion in contact with the support 6).
In addition, since the temperature of the outer peripheral portion of the substrate is low, the bonding of these portions may be incomplete. As a countermeasure for preventing this, a joining method combining temporary joining and subsequent main joining is effective. Hereinafter, an embodiment of this method will be described.

【0029】基板同士のアラインメントを行った後、仮
接合工程では、基板を低圧(0.5kgf/cm2 )で
加圧しながら200℃・5秒間保持した。こうすること
で、接着面において接着不完全な箇所が残るものの、ハ
ンドリングに十分耐えるだけの接着力が得られた。この
低圧・短時間の接着プロセスである仮接合を繰り返すこ
とにより、インクジェットプリンタヘッドの液室構成に
必要な枚数の基板を仮接着して仮積層体とした。そして
最後に一回、本接合工程として、この仮積層体を圧力3
kgf/cm2 で加圧しながら250℃・3分間加熱す
ることで、仮接合時の接着不完全な箇所の接着を補償す
ることができ、これにより短時間で、信頼性の高い接合
を実現することができた。この本接合には、ヒーター内
蔵の加圧基板を持つ圧着装置を使用したが、別の方法と
して、仮積層体を加圧治具で加圧し、この加圧治具を加
熱炉に挿入することで基板同士の加熱圧着を行う方法も
採用できる。
After the alignment of the substrates, in the temporary bonding step, the substrates were kept at 200 ° C. for 5 seconds while applying a low pressure (0.5 kgf / cm 2 ). In this way, although an incompletely bonded portion remains on the bonding surface, an adhesive force enough to withstand handling was obtained. By repeating the temporary bonding, which is a low-pressure, short-time bonding process, the number of substrates required for the liquid chamber configuration of the inkjet printer head was temporarily bonded to form a temporary laminate. Lastly, as a final bonding step, the temporary laminate is subjected to a pressure of 3%.
By heating at 250 ° C. for 3 minutes while applying a pressure of kgf / cm 2 , it is possible to compensate for the adhesion of the incompletely bonded portion during the temporary bonding, thereby realizing a highly reliable bonding in a short time. I was able to. For this main bonding, a pressure bonding apparatus having a pressure substrate with a built-in heater was used. Alternatively, the temporary laminate was pressed with a pressure jig, and this pressure jig was inserted into a heating furnace. A method of performing thermal compression bonding between substrates can also be adopted.

【0030】[0030]

【発明の効果】以上の説明で明らかなように、本発明に
よれば以下の効果が得られる。 (1)請求項1〜7の発明の効果 インクジェットプリンタヘッドの液室を構成するための
基板同士を接着するに際し、基板間に接着剤層を介在さ
せ、基板をランプ加熱で集中的に加熱することにより、
上記接着剤層を加熱して接着力を発現させるようにした
ので、基板同士の接合を短時間に効率良く行うことがで
きる。また、基板材料の基礎吸収波長に合ったランプ光
源を用いることにより、より高い加熱効率で基板を加熱
し、より短時間で接合を完了させることが可能となる。
As apparent from the above description, the following effects can be obtained according to the present invention. (1) Effects of the Inventions of Claims 1 to 7 When bonding substrates for forming a liquid chamber of an ink jet printer head, an adhesive layer is interposed between the substrates, and the substrates are intensively heated by lamp heating. By doing
Since the adhesive layer is heated to develop the adhesive force, the bonding between the substrates can be efficiently performed in a short time. In addition, by using a lamp light source that matches the fundamental absorption wavelength of the substrate material, the substrate can be heated with higher heating efficiency, and the bonding can be completed in a shorter time.

【0031】(2)請求項2の発明の効果 基板としてシリコン基板を用いるので、高密度ヘッドに
対応した微細加工が可能になる。
(2) Effect of the Second Invention Since a silicon substrate is used as a substrate, fine processing corresponding to a high-density head can be performed.

【0032】(3)請求項3の発明の効果 上記基板として基礎吸収波長が1μm前後であるシリコ
ン基板を、ランプ光源として短波長(1μm)であるア
ークランプをそれぞれ用いることで、基板を、したがっ
て接着剤層を効率良く加熱することができ、短時間での
接合が可能になる。
(3) Advantageous Effects of Claim 3 By using a silicon substrate having a fundamental absorption wavelength of about 1 μm as the substrate and an arc lamp having a short wavelength (1 μm) as the lamp light source, the substrate can be used. The adhesive layer can be efficiently heated, and bonding can be performed in a short time.

【0033】(4)請求項4の発明の効果 接着剤として熱可塑性ポリイミド系接着剤を用いること
で、耐インク性が良好なうえ高ヤング率の接合を容易に
実現することができる。また、上記接着剤を有機溶剤に
溶解した液状接着剤を基板表面に塗布後、上記有機溶剤
を蒸発除去して一次硬化(フィルム化)させることによ
りタック性をなくした後に基板同士を接合することが可
能であるから、耐ダスト性・搬送性に優れた接合工程が
実現できる。また、接着剤が熱可塑性のものであるた
め、ブリーディング(メルトして流動すること)や、接
着剤のはみ出しを抑制することができる。
(4) Effect of the Invention of Claim 4 By using a thermoplastic polyimide-based adhesive as the adhesive, it is possible to easily realize bonding with good ink resistance and high Young's modulus. Further, after applying the liquid adhesive obtained by dissolving the adhesive in an organic solvent to the surface of the substrate, the organic solvent is removed by evaporation and primary curing (film formation) is performed to eliminate tackiness, and then the substrates are joined to each other. Therefore, a bonding process excellent in dust resistance and transportability can be realized. In addition, since the adhesive is a thermoplastic, bleeding (melting and flowing) and protrusion of the adhesive can be suppressed.

【0034】(5)請求項5の発明の効果 上記ポリイミド接着剤として、ガラス転移温度が120
℃以上のものを用いることで、その後の工程(圧電素子
の接着)時にポリイミド接着剤が軟化することがなくな
るため、後工程後の接合不良が抑制される。
(5) Effect of the invention of claim 5 The polyimide adhesive has a glass transition temperature of 120.
By using a material having a temperature of not less than ° C., the polyimide adhesive is not softened in the subsequent step (adhesion of the piezoelectric element), so that the bonding failure after the subsequent step is suppressed.

【0035】(6)請求項6の発明の効果 仮接合をランプ光源を用いて行うので、短時間での仮接
合が可能である。また、基板の接合枚数に応じて必要回
数だけ仮接合を繰り返し、最後に一回、本接合を行うこ
とにより、仮接合時の接着不完全な箇所が的確に接着さ
れるので、信頼性の高い接合を短時間で行うことができ
る。
(6) Effect of the Invention of Claim 6 Since temporary joining is performed using a lamp light source, temporary joining can be performed in a short time. In addition, the temporary bonding is repeated a required number of times according to the number of substrates to be bonded, and finally, the final bonding is performed once, so that the incompletely bonded portion at the time of the temporary bonding is accurately bonded, so that high reliability is achieved. Bonding can be performed in a short time.

【図面の簡単な説明】[Brief description of the drawings]

【図1】実施例1に係るもので、互いに接合するべき2
枚の基板のうち一方の基板表面に接着剤を塗布した状態
を示す断面図である。
FIG. 1 relates to a first embodiment, in which two to be joined to each other
It is sectional drawing which shows the state which applied the adhesive agent to one substrate surface among one board | substrate.

【図2】実施例1に係るもので、2枚の基板を加圧・加
熱して接合する工程を示す断面図である。
FIG. 2 is a cross-sectional view illustrating a step of bonding two substrates under pressure and heat according to the first embodiment.

【図3】実施例3において基板積層体により構成した液
室を示す断面図であって、接着剤としてTGが80℃の
熱可塑性ポリイミド系接着剤を用いた場合を示すもので
ある。
FIG. 3 is a cross-sectional view showing a liquid chamber formed of a substrate laminate in Example 3, showing a case where a thermoplastic polyimide adhesive having a TG of 80 ° C. is used as an adhesive.

【図4】実施例4において基板積層体により構成した液
室を示す断面図であって、接着剤としてTGが130℃
の熱可塑性ポリイミド系接着剤を用いた場合を示すもの
である。
FIG. 4 is a cross-sectional view showing a liquid chamber formed of a substrate laminate in Example 4, where TG is 130 ° C. as an adhesive;
1 shows a case where the thermoplastic polyimide adhesive of the present invention is used.

【符号の説明】[Explanation of symbols]

1,3 基板 2 熱可塑性ポリイミド系接着剤 4 ランプ光源 4a ハロゲンランプ 4b 反射板 5 支持板 6 支持具 7 支持部材 8 加圧板 10 基板積層体 10a 基板積層体 10b 基板積層体 11 液室 12 接着剤 12a 接着剤のはみ出し 13 振動板 20 圧電素子 21 エポキシ系接着剤 1, 3 Substrate 2 Thermoplastic polyimide adhesive 4 Lamp light source 4a Halogen lamp 4b Reflector 5 Support plate 6 Support 7 Support member 8 Pressing plate 10 Substrate laminate 10a Substrate laminate 10b Substrate laminate 11 Liquid chamber 12 Adhesive 12a Extrusion of adhesive 13 Vibration plate 20 Piezoelectric element 21 Epoxy adhesive

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 複数の基板を接合積層してなる基板積層
体によりインクジェットプリンタヘッドの液室を作製す
るに際し、接合するべき基板間に、加熱により接着力を
発現する接着剤の層を介在させ、該接着剤層をランプ光
源で加熱することにより前記基板同士を接合して前記基
板積層体を得ることを特徴とするインクジェットプリン
タヘッドの液室作製方法。
When producing a liquid chamber of an ink jet printer head using a substrate laminate formed by joining and laminating a plurality of substrates, an adhesive layer which develops adhesive force by heating is interposed between substrates to be joined. And heating the adhesive layer with a lamp light source to bond the substrates to each other to obtain the substrate laminate.
【請求項2】 前記複数の基板がシリコンからなること
を特徴とする請求項1に記載のインクジェットプリンタ
ヘッドの液室作製方法。
2. The method according to claim 1, wherein the plurality of substrates are made of silicon.
【請求項3】 前記ランプ光源として短波長アークラン
プを用いることを特徴とする請求項2に記載のインクジ
ェットプリンタヘッドの液室作製方法。
3. The method according to claim 2, wherein a short wavelength arc lamp is used as the lamp light source.
【請求項4】 前記接着剤として熱可塑性ポリイミド系
接着剤を用いることを特徴とする請求項1,2または3
に記載のインクジェットプリンタヘッドの液室作製方
法。
4. The adhesive according to claim 1, wherein said adhesive is a thermoplastic polyimide adhesive.
3. The method for producing a liquid chamber of an ink jet printer head according to item 1.
【請求項5】 前記熱可塑性ポリイミド系接着剤とし
て、ガラス転移温度が120℃以上のものを用いること
を特徴とする請求項4に記載のインクジェットプリンタ
ヘッドの液室作製方法。
5. The method according to claim 4, wherein the thermoplastic polyimide-based adhesive has a glass transition temperature of 120 ° C. or higher.
【請求項6】 前記基板同士の接合工程がランプ光源を
用いる短時間の仮接合工程と、その後のランプ光源を用
いる本接合工程とを含むものであり、該本接合工程では
前記仮接合工程よりも長時間または高温の加熱を行うこ
とを特徴とする請求項4または5に記載のインクジェッ
トプリンタヘッドの液室作製方法。
6. The bonding step between the substrates includes a short-time temporary bonding step using a lamp light source and a subsequent main bonding step using a lamp light source. 6. The method according to claim 4, wherein heating is performed for a long time or at a high temperature.
【請求項7】 前記接着剤として熱硬化性ポリイミド系
接着剤を用いることを特徴とする請求項1,2または3
に記載のインクジェットプリンタヘッドの液室作製方
法。
7. The method according to claim 1, wherein a thermosetting polyimide adhesive is used as said adhesive.
3. The method for producing a liquid chamber of an ink jet printer head according to item 1.
JP25118499A 1999-09-06 1999-09-06 Liquid chamber manufacturing method for ink jet printer head Expired - Fee Related JP4155481B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25118499A JP4155481B2 (en) 1999-09-06 1999-09-06 Liquid chamber manufacturing method for ink jet printer head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25118499A JP4155481B2 (en) 1999-09-06 1999-09-06 Liquid chamber manufacturing method for ink jet printer head

Publications (2)

Publication Number Publication Date
JP2001071511A true JP2001071511A (en) 2001-03-21
JP4155481B2 JP4155481B2 (en) 2008-09-24

Family

ID=17218941

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25118499A Expired - Fee Related JP4155481B2 (en) 1999-09-06 1999-09-06 Liquid chamber manufacturing method for ink jet printer head

Country Status (1)

Country Link
JP (1) JP4155481B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7535506B2 (en) 2003-02-14 2009-05-19 Canon Kabushiki Kaisha Solid-state image pickup device and radiation image pickup device suitable for use in a flat panel detector

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7535506B2 (en) 2003-02-14 2009-05-19 Canon Kabushiki Kaisha Solid-state image pickup device and radiation image pickup device suitable for use in a flat panel detector
US8154641B2 (en) 2003-02-14 2012-04-10 Canon Kabushiki Kaisha Solid-state image pickup device and radiation image pickup device

Also Published As

Publication number Publication date
JP4155481B2 (en) 2008-09-24

Similar Documents

Publication Publication Date Title
JPS60183156A (en) Ink jet recording head
US6919646B2 (en) Semiconductor device with contacting electrodes
JP3881751B2 (en) Semiconductor chip mounting structure and mounting method
WO2018113247A1 (en) Display substrate, method for manufacturing same, display panel, and crimping apparatus
JP4585196B2 (en) Electronic component bonding method and apparatus
JP2001071511A (en) Method for forming liquid chamber in ink jet printer head
JP2002118147A (en) Method of mounting semiconductor chip to printed circuit board, and mounting sheet used for embodying the method
CN110707197A (en) LED substrate and manufacturing method of LED display panel
JP4195541B2 (en) Method of mounting a semiconductor chip on a printed circuit board and mounting sheet used for carrying out the method
JP4441090B2 (en) Method of mounting a semiconductor chip on a printed wiring board
JPH05109838A (en) Repair method for bare chip
CN111315142A (en) Processing technology of MPI foam cotton mixed pressing plate
JP2002353601A (en) Electronic component mounted body and method for mounting electronic component
JP7453035B2 (en) Crimping head, mounting device using the same, and mounting method
JP4649852B2 (en) Electronic component joining method and electronic component joining structure
JPH09266227A (en) Bonding method of electronic parts
JP2003133707A (en) Method and apparatus for placing electronic component
JP2667744B2 (en) Display device electrode connection method
JP2006229106A (en) Semiconductor device and method and apparatus for mounting the same
JPH1140607A (en) Manufacture of semiconductor device and sealing member
JPH1022344A (en) Bonding method for work with bumps
JP2003077954A (en) Method of mounting semiconductor device
JP3992367B2 (en) Semiconductor mounting method and mounting structure
JP2024089442A (en) Method for processing laminated substrate, method for processing substrate for recording head, and recording head
JPH0428289A (en) Connecting method of terminal train

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20050125

RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20050216

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20070611

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20070626

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070824

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20080701

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20080704

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110718

Year of fee payment: 3

R150 Certificate of patent (=grant) or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120718

Year of fee payment: 4

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120718

Year of fee payment: 4

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130718

Year of fee payment: 5

LAPS Cancellation because of no payment of annual fees