JP2001005168A5 - - Google Patents

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Publication number
JP2001005168A5
JP2001005168A5 JP1999175631A JP17563199A JP2001005168A5 JP 2001005168 A5 JP2001005168 A5 JP 2001005168A5 JP 1999175631 A JP1999175631 A JP 1999175631A JP 17563199 A JP17563199 A JP 17563199A JP 2001005168 A5 JP2001005168 A5 JP 2001005168A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1999175631A
Other languages
Japanese (ja)
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JP2001005168A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP17563199A priority Critical patent/JP2001005168A/ja
Priority claimed from JP17563199A external-priority patent/JP2001005168A/ja
Priority to US09/598,452 priority patent/US6338924B1/en
Publication of JP2001005168A publication Critical patent/JP2001005168A/ja
Publication of JP2001005168A5 publication Critical patent/JP2001005168A5/ja
Pending legal-status Critical Current

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JP17563199A 1999-06-22 1999-06-22 近接場光露光用マスクおよびその作製方法 Pending JP2001005168A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP17563199A JP2001005168A (ja) 1999-06-22 1999-06-22 近接場光露光用マスクおよびその作製方法
US09/598,452 US6338924B1 (en) 1999-06-22 2000-06-22 Photomask for near-field exposure having opening filled with transparent material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17563199A JP2001005168A (ja) 1999-06-22 1999-06-22 近接場光露光用マスクおよびその作製方法

Publications (2)

Publication Number Publication Date
JP2001005168A JP2001005168A (ja) 2001-01-12
JP2001005168A5 true JP2001005168A5 (enExample) 2005-06-09

Family

ID=15999470

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17563199A Pending JP2001005168A (ja) 1999-06-22 1999-06-22 近接場光露光用マスクおよびその作製方法

Country Status (1)

Country Link
JP (1) JP2001005168A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3715973B2 (ja) 2002-05-07 2005-11-16 キヤノン株式会社 近接場光露光用のフォトマスク、該フォトマスクを用いたパターン作製方法およびパターン作製装置
JP4522068B2 (ja) * 2003-09-12 2010-08-11 キヤノン株式会社 近接場光を発生させる構造体、近接場光の発生方法、及び、近接場露光装置
JP5774536B2 (ja) * 2012-03-30 2015-09-09 株式会社東芝 近接場露光用マスクおよびパターン形成方法
JP2016018139A (ja) * 2014-07-10 2016-02-01 株式会社ディスコ 露光マスクの製造方法

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