JP2001003168A5 - - Google Patents

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Publication number
JP2001003168A5
JP2001003168A5 JP1999173350A JP17335099A JP2001003168A5 JP 2001003168 A5 JP2001003168 A5 JP 2001003168A5 JP 1999173350 A JP1999173350 A JP 1999173350A JP 17335099 A JP17335099 A JP 17335099A JP 2001003168 A5 JP2001003168 A5 JP 2001003168A5
Authority
JP
Japan
Prior art keywords
film forming
forming source
film
deposition
preventing plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP1999173350A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001003168A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP11173350A priority Critical patent/JP2001003168A/ja
Priority claimed from JP11173350A external-priority patent/JP2001003168A/ja
Publication of JP2001003168A publication Critical patent/JP2001003168A/ja
Publication of JP2001003168A5 publication Critical patent/JP2001003168A5/ja
Abandoned legal-status Critical Current

Links

JP11173350A 1999-06-18 1999-06-18 真空成膜装置 Abandoned JP2001003168A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11173350A JP2001003168A (ja) 1999-06-18 1999-06-18 真空成膜装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11173350A JP2001003168A (ja) 1999-06-18 1999-06-18 真空成膜装置

Publications (2)

Publication Number Publication Date
JP2001003168A JP2001003168A (ja) 2001-01-09
JP2001003168A5 true JP2001003168A5 (de) 2006-04-20

Family

ID=15958797

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11173350A Abandoned JP2001003168A (ja) 1999-06-18 1999-06-18 真空成膜装置

Country Status (1)

Country Link
JP (1) JP2001003168A (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4421980B2 (ja) * 2004-09-09 2010-02-24 株式会社神戸製鋼所 連続成膜装置
EP1713110B1 (de) 2005-04-08 2016-03-09 Applied Materials GmbH & Co. KG Anlage zum Beschichten eines Substrats und Modul
JP4702801B2 (ja) * 2006-07-26 2011-06-15 株式会社神戸製鋼所 連続成膜装置
JP4573272B2 (ja) * 2006-07-26 2010-11-04 株式会社神戸製鋼所 連続成膜装置
US20170005297A1 (en) * 2013-12-10 2017-01-05 Stefan Bangert Evaporation source for organic material, apparatus having an evaporation source for organic material, system having an evaporation deposition apparatus with an evaporation source for organic materials, and method for operating an evaporation source for organic material
DE102016107983A1 (de) * 2016-04-29 2017-11-02 Von Ardenne Gmbh Prozesskammeranordnung und Prozessieranordnung
CN110512185A (zh) * 2019-09-03 2019-11-29 肇庆宏旺金属实业有限公司 一种钢卷开收卷真空工作室

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