JP2001003168A5 - - Google Patents
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- Publication number
- JP2001003168A5 JP2001003168A5 JP1999173350A JP17335099A JP2001003168A5 JP 2001003168 A5 JP2001003168 A5 JP 2001003168A5 JP 1999173350 A JP1999173350 A JP 1999173350A JP 17335099 A JP17335099 A JP 17335099A JP 2001003168 A5 JP2001003168 A5 JP 2001003168A5
- Authority
- JP
- Japan
- Prior art keywords
- film forming
- forming source
- film
- deposition
- preventing plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000010408 film Substances 0.000 description 7
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000002848 electrochemical method Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Description
３次元ステージ２７は、成膜源２８及び防着板２９をＸ方向、Ｙ方向及びＺ方向に移動自在に支持するとともに、Ｘ軸、Ｙ軸及びＺ軸回りに回転自在に支持して、これら成膜源２８及び防着板２９をメインロール１３に対して精密に位置決めする。成膜源２８は、詳細を省略するが、周知のように反応管から活性化された炭化水素を放出して樹脂フィルム原反２の表面上にカーボン層を成膜形成する。なお、成膜源２８は、成膜される薄膜に応じて被成膜体に対して所定の成膜物質を電気化学的な方法等によって放出する装置であればよく、上述したように例えばスバッタ法におけるスバッタカソードや蒸着法における蒸着るつぼ等も用いられる。 The three-dimensional stage 27 supports the film forming source 28 and the deposition-preventing plate 29 movably in the X, Y, and Z directions, and rotatably supports the X, Y, and Z axes. The film forming source 28 and the deposition preventing plate 29 are precisely positioned with respect to the main roll 13. Although the details are omitted, the film forming source 28 releases the activated hydrocarbon from the reaction tube to form a carbon layer on the surface of the raw resin film 2 as is well known. The film forming source 28 may be any device that discharges a predetermined film forming material to a film formation target according to a thin film to be formed by an electrochemical method or the like. A scatterer cathode in the vapor deposition method and a deposition crucible in the vapor deposition method are also used.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11173350A JP2001003168A (en) | 1999-06-18 | 1999-06-18 | Vacuum film forming device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11173350A JP2001003168A (en) | 1999-06-18 | 1999-06-18 | Vacuum film forming device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001003168A JP2001003168A (en) | 2001-01-09 |
| JP2001003168A5 true JP2001003168A5 (en) | 2006-04-20 |
Family
ID=15958797
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11173350A Abandoned JP2001003168A (en) | 1999-06-18 | 1999-06-18 | Vacuum film forming device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2001003168A (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4421980B2 (en) * | 2004-09-09 | 2010-02-24 | 株式会社神戸製鋼所 | Continuous film deposition system |
| EP1713110B1 (en) | 2005-04-08 | 2016-03-09 | Applied Materials GmbH & Co. KG | Device for coating a substrate and module |
| JP4573272B2 (en) * | 2006-07-26 | 2010-11-04 | 株式会社神戸製鋼所 | Continuous film deposition system |
| JP4702801B2 (en) * | 2006-07-26 | 2011-06-15 | 株式会社神戸製鋼所 | Continuous film deposition system |
| JP6328766B2 (en) * | 2013-12-10 | 2018-05-23 | アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ | Evaporation source for organic material, deposition apparatus for depositing organic material in vacuum chamber, and method for evaporating organic material |
| DE102016107983A1 (en) * | 2016-04-29 | 2017-11-02 | Von Ardenne Gmbh | Process chamber arrangement and processing arrangement |
| CN110512185A (en) * | 2019-09-03 | 2019-11-29 | 肇庆宏旺金属实业有限公司 | A kind of coil of strip opens winding vacuum workshop |
-
1999
- 1999-06-18 JP JP11173350A patent/JP2001003168A/en not_active Abandoned
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