JP2000348380A - Optical recording medium - Google Patents

Optical recording medium

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Publication number
JP2000348380A
JP2000348380A JP11157787A JP15778799A JP2000348380A JP 2000348380 A JP2000348380 A JP 2000348380A JP 11157787 A JP11157787 A JP 11157787A JP 15778799 A JP15778799 A JP 15778799A JP 2000348380 A JP2000348380 A JP 2000348380A
Authority
JP
Japan
Prior art keywords
layer
transparent dielectric
recording
dielectric layer
oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11157787A
Other languages
Japanese (ja)
Inventor
Shigemasa Okuma
薫正 大隈
Makoto Sugawara
信 菅原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP11157787A priority Critical patent/JP2000348380A/en
Publication of JP2000348380A publication Critical patent/JP2000348380A/en
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To obtain an optical recording medium improved in C/N ratio and mechanical strength, excellent in jitter characteristic and chemical stability when heated and subsequently improved in durability to repeatedly recording, erasing and reproducing. SOLUTION: This optical recording medium is provided with a recording layer 3 to be amorphous or crystalline by phase transition corresponding to the output of irradiated light and a reflecting layer 5 formed successively on a transparent substrate. A first transparent dielectric layer 2 and a second transparent dielectric layer 4 based on the oxide having 1.5 or higher refractive index and zinc sulfide are laminated on at least one interface of the recording layer 3. By this constitution, the refractive indexes of the transparent dielectric layers are enlarged and the enhancement effect of the light is increased at the transparent dielectric layers. Since the signal intensity is enlarged when reproduced, the C/N ratio is improved and the jitter characteristic becomes excellent.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、照射するレーザ光
等の光線の出力に応じて非晶質又は結晶質の2状態に相
変化する記録層を有し、前記2状態における記録ビット
の光の反射率差を利用してデジタル情報を記録再生する
ものであって、書き換え可能な光記録媒体に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a recording layer having a phase change between an amorphous state and a crystalline state according to the output of a light beam such as a laser beam to be irradiated. The present invention relates to a rewritable optical recording medium which records and reproduces digital information by utilizing the difference in reflectance of the optical recording medium.

【0002】[0002]

【従来の技術】従来の相転移を利用した書き換え可能な
光記録媒体M1(以下、媒体M1という)の部分断面図
を図1に示す。同図において、1はポリカーボネート等
の樹脂,ガラス等から成るディスク状の基板、2はZn
S−SiO2 等から成る第一透明誘電体層、3はGeT
e等から成り非晶質又は結晶質の2状態に相変化可能な
記録層、4はZnS−SiO2 等から成る第二透明誘電
体層、5はAl等の高反射率材料から成る反射層であ
る。
2. Description of the Related Art FIG. 1 is a partial sectional view of a conventional rewritable optical recording medium M1 utilizing a phase transition (hereinafter referred to as a medium M1). In FIG. 1, reference numeral 1 denotes a disk-shaped substrate made of a resin such as polycarbonate, glass, or the like;
First transparent dielectric layer made of S-SiO 2 or the like, 3 GeT
e, a recording layer capable of phase-change into two states of amorphous or crystalline, 4 a second transparent dielectric layer made of ZnS-SiO 2 or the like, 5 a reflective layer made of a high reflectivity material such as Al It is.

【0003】このような書き換え可能な媒体M1におい
て、記録層3は結晶質状態と非結晶質状態とで光の反射
率が異なっており、一般的に結晶質状態の方が反射率が
高いものが多い。そして、媒体M1の動作原理は以下の
ようなものである。まず、記録層3の全ての記録ビット
を結晶化しておく。即ち、反射率が高い状態とし初期化
しておく。情報の書込には、媒体M1を回転させながら
2種のレーザパワーにパルス変調されたレーザビームを
照射し、高出力(10数〜20mW程度)のレーザビー
ムが照射された記録ビットでは記録層3材料の融点より
も高温になり、溶融して急冷され非晶質化する。一方、
中出力(5〜10mW程度)のレーザビームが照射され
た記録ビットでは、前記融点以下の結晶化可能温度範囲
まで昇温された後、冷却され結晶質状態になる。
In such a rewritable medium M1, the recording layer 3 has a different light reflectance between a crystalline state and an amorphous state, and generally has a higher reflectance in the crystalline state. There are many. The operating principle of the medium M1 is as follows. First, all the recording bits of the recording layer 3 are crystallized. That is, initialization is performed in a state where the reflectance is high. For writing information, a laser beam pulse-modulated to two types of laser power is irradiated while rotating the medium M1, and the recording layer is irradiated with a high-power (about 10 to 20 mW) laser beam. The material becomes higher than the melting points of the three materials, and is melted and rapidly cooled to become amorphous. on the other hand,
A recording bit irradiated with a laser beam of medium output (about 5 to 10 mW) is heated to a crystallization-possible temperature range equal to or lower than the melting point and then cooled to a crystalline state.

【0004】上記の書込動作は、古い情報が残留してい
る上から直接行うことができ、各記録ビットは新しい情
報に対応した状態に変化する。つまり、重ね書きによる
オーバーライト(Over Writeで、以下、OWと略す)が
可能である。再生は、読取用の低出力(1〜2mW程
度)のレーザビームを照射して、高反射率の結晶質相か
低反射率の非晶質相かを判読し、0,1のデジタル情報
として読み取る。
[0004] The above-mentioned writing operation can be performed directly after the old information remains, and each recording bit changes to a state corresponding to the new information. That is, overwriting by overwriting (Over Write, hereinafter abbreviated as OW) is possible. Reproduction is performed by irradiating a low-output (about 1 to 2 mW) laser beam for reading to determine whether the phase is a crystalline phase having a high reflectivity or an amorphous phase having a low reflectivity. read.

【0005】上記記録層3の材料としては、Te,S
e,Sのうちの1元素を含む材料のカルコゲン化物が適
しており、カルコゲン化物は非晶質になりやすいという
特徴がある。具体的には、GeTe系材料、GeSbT
e系材料、InSeTlCo系材料、InSbTe系材
料等がある。
The material of the recording layer 3 is Te, S
A chalcogenide of a material containing one element of e and S is suitable, and the chalcogenide has a feature that it easily becomes amorphous. Specifically, GeTe-based materials, GeSbT
e-based materials, InSeTlCo-based materials, InSbTe-based materials, and the like.

【0006】そして、従来このような相変化型の媒体M
1において、透明基板上に、第1誘電体保護層、相変化
型の記録層、第2誘電体保護層、反射層を順次形成した
光学的情報記録媒体において、第2誘電体保護層がZn
Sと酸化シリコン又は酸化タンタルとの混合膜であるこ
とにより、繰り返し特性、経時安定性に優れたものが提
案されている(従来例1:特開平4−358332号公
報参照)。
Conventionally, such a phase change type medium M
1, the optical information recording medium in which a first dielectric protective layer, a phase change type recording layer, a second dielectric protective layer, and a reflective layer are sequentially formed on a transparent substrate, wherein the second dielectric protective layer is formed of Zn.
A film which is excellent in repetition characteristics and stability over time by using a mixed film of S and silicon oxide or tantalum oxide has been proposed (conventional example 1: JP-A-4-358332).

【0007】また、従来例2として、透明基板上に、第
1誘電体保護層、相変化型の記録層、第2誘電体保護
層、反射層を順次形成した光学的情報記録媒体におい
て、第2誘電体保護層が記録層側の高圧縮応力層と低圧
縮応力層とで構成され、高圧縮応力層が酸化タンタルで
あり、低圧縮応力層がZnSと酸化シリコン又は酸化タ
ンタルとの混合物からなることにより、繰り返し特性、
経時安定性に優れたものが提案されている(従来例2:
特開平4−358334号公報参照)。
As a second conventional example, in an optical information recording medium in which a first dielectric protective layer, a phase-change recording layer, a second dielectric protective layer, and a reflective layer are sequentially formed on a transparent substrate, (2) The dielectric protective layer is composed of a high compressive stress layer and a low compressive stress layer on the recording layer side, the high compressive stress layer is tantalum oxide, and the low compressive stress layer is made of a mixture of ZnS and silicon oxide or tantalum oxide. By becoming, repetition characteristics,
A material having excellent aging stability has been proposed (conventional example 2:
JP-A-4-358334).

【0008】従来例3として、透明基板上に、第一の保
護膜、第二の保護膜、第三の保護膜、相変化型の記録薄
膜、第四の保護膜、第五の保護膜、第六の保護膜、反射
層を順次形成した光記録媒体であって、第一、第三、第
四、第六の保護膜はZnSとSiO2 との混合膜である
ことにより、記録消去のサイクル特性及び消去のパワー
マージンを広げることができるものが公知である(従来
例3:特開平5−144082号公報参照)。
As a third conventional example, a first protective film, a second protective film, a third protective film, a phase-change recording thin film, a fourth protective film, a fifth protective film, An optical recording medium in which a sixth protective film and a reflective layer are sequentially formed, wherein the first, third, fourth, and sixth protective films are a mixed film of ZnS and SiO 2 , so that recording and erasing can be performed. It is known that the cycle characteristics and the erasing power margin can be widened (conventional example 3: JP-A-5-144082).

【0009】従来例4として、透明基板上に、第一の保
護膜、相変化型の記録膜、第二の保護膜、反射膜を順次
形成した光記録媒体であって、第一,第二の保護膜がZ
nSとSiO2 との混合膜からなることにより、機械的
強度が向上して多数回の記録消去の繰り返しに対する効
果が大きいものが公知である(従来例4:特開平6−4
904号公報参照)。
Conventional Example 4 is an optical recording medium in which a first protective film, a phase-change recording film, a second protective film, and a reflective film are sequentially formed on a transparent substrate, Protective film is Z
It is known that a film composed of a mixed film of nS and SiO 2 is improved in mechanical strength and has a large effect on repetition of recording / erasing a large number of times (conventional example 4: JP-A-6-4 / 1994).
904).

【0010】従来例5として、基材と、光学活性層と、
光学活性層の一方の界面に設けた耐熱保護層とを備え、
耐熱保護層がZnS等の結晶質のカルコゲン化物と、S
iO2 等のガラス化した酸化物とを含むことにより、記
録時の入射光パワーに対する感度を上昇させ、また記録
消去の繰り返しの回数を増やすことができる光学式情報
記録部材が知られている(従来例5:特公平6−908
08号公報参照)。
As Conventional Example 5, a substrate, an optically active layer,
A heat-resistant protective layer provided on one interface of the optically active layer,
The heat-resistant protective layer is made of a crystalline chalcogenide such as ZnS;
There is known an optical information recording member which can increase the sensitivity to incident light power at the time of recording and increase the number of repetitions of recording / erasing by containing a vitrified oxide such as iO 2 ( Conventional Example 5: Japanese Patent Publication No. 6-908
No. 08).

【0011】従来例6として、透明基板、第一の保護
層、記録層、第二の保護層、反射層を順次形成した構成
で、少なくとも第一の保護層を硫化亜鉛とチタン酸化物
の混合物からなることにより、オーバーライト時の消去
率が改善され、ジッター値の低減が可能になると共に生
産性が良く、製造コストも低減される光情報記録媒体が
知られている(従来例6:特開平7−262615号公
報参照)。
As a conventional example 6, a transparent substrate, a first protective layer, a recording layer, a second protective layer, and a reflective layer are sequentially formed, and at least the first protective layer is a mixture of zinc sulfide and titanium oxide. There is known an optical information recording medium in which the erasing rate at the time of overwriting is improved, the jitter value can be reduced, the productivity is good, and the manufacturing cost is reduced (Conventional Example 6: See JP-A-7-262615).

【0012】従来例7として、基板上に、第1の誘電体
層、相変化型の記録層、第2の誘電体層を積層した光学
的情報記録媒体であって、第1の誘電体層と第2の誘電
体層の少なくとも一方がZnSとシリコン窒酸化物の混
合物からなることにより、機械的強度が高まりオーバー
ライトサイクルが向上するものが提案されている(従来
例7:特開平9−198712号公報参照)。
A prior art example 7 is an optical information recording medium in which a first dielectric layer, a phase change type recording layer, and a second dielectric layer are laminated on a substrate, wherein the first dielectric layer And at least one of the second dielectric layer and the second dielectric layer is made of a mixture of ZnS and silicon oxynitride, thereby increasing the mechanical strength and improving the overwrite cycle. 198712).

【0013】[0013]

【発明が解決しようとする課題】しかしながら、上記の
如くZnSと主にSiO2 とから成る誘電体層を用いた
光記録媒体は種々提案されているが、これらは以下のよ
うな問題点があった。上記従来例1では、ZnSと酸化
シリコン又はZnSと酸化タンタルから成る混合膜から
なる誘電体保護層を用いているが、ZnSと酸化シリコ
ンの場合記録ビットのジッター特性が不十分であり、Z
nSと酸化タンタルの場合酸化変質し易いために信頼性
が低下する。また、従来例2においても、ZnSと酸化
シリコン又はZnSと酸化タンタルから成る混合膜から
なる誘電体保護層を用いており、従来例1と同様の問題
点があった。
[SUMMARY OF THE INVENTION However, the optical recording medium using a dielectric layer made of ZnS and primarily SiO 2 Metropolitan as have been proposed, but they have the following problems Was. In the above conventional example 1, the dielectric protection layer made of a mixed film of ZnS and silicon oxide or ZnS and tantalum oxide is used. However, in the case of ZnS and silicon oxide, the jitter characteristic of the recording bit is insufficient,
In the case of nS and tantalum oxide, the quality is easily deteriorated by oxidation, so that the reliability is reduced. Further, also in Conventional Example 2, a dielectric protection layer made of a mixed film of ZnS and silicon oxide or ZnS and tantalum oxide was used, and had the same problems as Conventional Example 1.

【0014】従来例3では、保護膜はZnSとSiO2
から成り、かつ8層構成というかなりの多層構成である
ため、ジッター特性が不十分であると共に、製造コスト
が増大するという問題点があった。従来例4、従来例5
及び従来例7では、保護膜にZnSとSiO2 との混合
膜を用いており、ジッター特性が劣化するという問題が
あった。
In Conventional Example 3, the protective film is made of ZnS and SiO 2
, And has a considerable multilayer structure of eight layers, so that the jitter characteristics are insufficient and the manufacturing cost increases. Conventional Example 4, Conventional Example 5
Further, in the conventional example 7, a mixed film of ZnS and SiO 2 is used for the protective film, and there is a problem that the jitter characteristic is deteriorated.

【0015】従来例6においては、保護層を硫化亜鉛と
チタン酸化物の混合物から構成しており、硫化亜鉛及び
チタン酸化物の粒子径は大きいため再生時のノイズが大
きくなりC/N比が劣化するという問題点があった。
In the conventional example 6, the protective layer is composed of a mixture of zinc sulfide and titanium oxide. Since the particle diameter of zinc sulfide and titanium oxide is large, noise during reproduction is large and the C / N ratio is low. There was a problem of deterioration.

【0016】従って、本発明は上記事情に鑑みて完成さ
れたものであり、その目的は、機械的強度が向上し、化
学的安定性に優れ、また再生時の信号強度(振幅)が大
きくなるためC/N比、ジッター特性が向上し、更に繰
り返し記録再生に対する劣化が抑制されるものとするこ
とにある。
Accordingly, the present invention has been completed in view of the above circumstances, and aims to improve mechanical strength, improve chemical stability, and increase signal strength (amplitude) during reproduction. Therefore, the object is to improve the C / N ratio and the jitter characteristics, and to further suppress deterioration due to repeated recording and reproduction.

【0017】[0017]

【課題を解決するための手段】本発明の光記録媒体は、
透明基板上に、照射する光の出力に応じて非晶質又は結
晶質に相変化する記録層と反射層とが設けられ、該記録
層の少なくとも一方の界面に、屈折率が1.5以上の酸
化物と硫化亜鉛を主成分とする透明誘電体層を積層した
ことを特徴とする。
The optical recording medium of the present invention comprises:
On a transparent substrate, a recording layer and a reflective layer, which change into an amorphous or crystalline phase in accordance with the output of irradiation light, are provided, and at least one interface of the recording layer has a refractive index of 1.5 or more. And a transparent dielectric layer containing zinc oxide and zinc sulfide as main components.

【0018】本発明は、上記構成により、透明誘電体層
の屈折率が大きくなり、その結果透明誘電体層での光の
干渉効果によるエンハンスメント効果が増大し再生時の
信号強度(振幅)が大きくなるので、C/N比が向上
し、ジッター特性が良好になる。また機械的強度が向上
しかつ加熱時の化学的安定性に優れるため、繰り返し記
録、消去、再生に対する耐久性も高まる。
According to the present invention, the refractive index of the transparent dielectric layer is increased by the above configuration, and as a result, the enhancement effect due to the light interference effect in the transparent dielectric layer is increased, and the signal intensity (amplitude) at the time of reproduction is increased. Therefore, the C / N ratio is improved, and the jitter characteristics are improved. Further, since the mechanical strength is improved and the chemical stability at the time of heating is excellent, the durability against repeated recording, erasing and reproduction is also enhanced.

【0019】また本発明において、好ましくは、前記屈
折率が1.5以上の酸化物は酸化ジルコニウム、若しく
は酸化アルミニウムを主成分とすることを特徴とする。
In the present invention, preferably, the oxide having a refractive index of 1.5 or more contains zirconium oxide or aluminum oxide as a main component.

【0020】[0020]

【発明の実施の形態】本発明の媒体について以下に説明
する。本発明の媒体は、その基本構成は図1のものと同
様である。同図において、1はポリカーボネート,ポリ
オレフィン,エポキシ樹脂,アクリル樹脂,ガラス,樹
脂層を表面に形成した強化ガラス、透光性セラミック等
から成るディスク状の透明基板、2は屈折率が1.5以
上の酸化物と硫化亜鉛を主成分とする第一透明誘電体
層、3は相変化型の記録層、4は第一透明誘電体層2と
同じ材質の第二透明誘電体層、5はAl,Al−Ti合
金,Al−Cr合金等から成る反射層である。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The medium of the present invention will be described below. The basic configuration of the medium of the present invention is the same as that of FIG. In the figure, 1 is a disk-shaped transparent substrate made of polycarbonate, polyolefin, epoxy resin, acrylic resin, glass, tempered glass having a resin layer formed on the surface, translucent ceramic, etc., and 2 has a refractive index of 1.5 or more. Is a first transparent dielectric layer mainly composed of an oxide and zinc sulfide, 3 is a phase-change recording layer, 4 is a second transparent dielectric layer of the same material as the first transparent dielectric layer 2, and 5 is Al , Al-Ti alloy, Al-Cr alloy or the like.

【0021】本発明において、記録層3はGeTe,G
eSbTe,InSeTlCo,InSbTe等のカル
コゲン化物から成る材料がよく、なかでもGeTe,G
eSbTeが書き換え可能回数が大きく、結晶化する際
に短時間で結晶化が可能であり、非晶質状態の安定性も
高いという点で好ましい。
In the present invention, the recording layer 3 is made of GeTe, G
Materials made of chalcogenides such as eSbTe, InSeTlCo, InSbTe, etc. are preferred, and GeTe, G
eSbTe is preferable in that it can be rewritten a large number of times, can be crystallized in a short time when crystallized, and has high stability in an amorphous state.

【0022】また、Gea Sbb Tec (a+b+c=
100原子%)とした場合、5at(原子)%≦a≦7
0at%がよく、a<5at%では結晶化速度が遅く、
70at%<aでは非晶質状態が不安定になる。0at
%≦b≦50at%がよく、50at%<bでは非晶質
状態が不安定になる。40at%≦c≦70at%がよ
く、c<40at%では結晶化温度が高くなりすぎ、7
0at%<cのときも結晶化温度が高くなりすぎる。特
に、Ge2 Sb2 Te5 又はGeSb2 Te4が好まし
く、この場合結晶化速度が速く高線速度での消去特性が
良好である。
[0022] In addition, Ge a Sb b Te c ( a + b + c =
100 at%), 5 at (atomic)% ≦ a ≦ 7
0 at% is good, and when a <5 at%, the crystallization speed is low,
When 70 at% <a, the amorphous state becomes unstable. 0at
% ≦ b ≦ 50 at% is good, and if 50 at% <b, the amorphous state becomes unstable. 40 at% ≦ c ≦ 70 at% is good, and if c <40 at%, the crystallization temperature becomes too high, and
Even when 0 at% <c, the crystallization temperature is too high. In particular, Ge 2 Sb 2 Te 5 or GeSb 2 Te 4 is preferable, in which case the crystallization speed is high and the erasing characteristics at a high linear velocity are good.

【0023】また、記録層3の厚さは5〜50nmがよ
く、5nm未満では結晶質状態と非晶質状態間の反射率
差が小さくなり、50nmを超えると繰り返し記録再生
によるBER等の特性劣化が大きくなる。より好ましく
は10〜40nmである。
The thickness of the recording layer 3 is preferably 5 to 50 nm, and if it is less than 5 nm, the reflectance difference between the crystalline state and the amorphous state becomes small. Deterioration increases. More preferably, it is 10 to 40 nm.

【0024】上記第一透明誘電体層2及び第二透明誘電
体層4の組成は、屈折率1.5以上の酸化物と硫化亜鉛
(ZnS)を主成分とするが、好ましくはZnS・Zr
2,ZnS・Al2 3 である。(ZnS)d (Zr
2 e (d+e=100モル%)とした場合、d=5
0〜95モル%が良く、d<50モル%では屈折率が低
下し光の干渉によるエンハンスメント効果を出しにくく
なる。d>95モル%では(ZnS)d (ZrO2 e
粒子の粒径が大きくなり再生時のノイズが大きくなる。
また、e=5〜50モル%が良く、e<5モル%では
(ZnS)d (ZrO2 e 粒子の粒径が大きくなり再
生時のノイズが大きくなり、e>50モル%では屈折率
が低下しエンハンスメント効果が小さくなる。ZnS・
Al2 3の場合も同様である。
The composition of the first transparent dielectric layer 2 and the second transparent dielectric layer 4 is mainly composed of an oxide having a refractive index of 1.5 or more and zinc sulfide (ZnS).
O 2 , ZnS · Al 2 O 3 . (ZnS) d (Zr
When O 2 ) e (d + e = 100 mol%), d = 5
The content is preferably 0 to 95 mol%, and when d <50 mol%, the refractive index is reduced, and it becomes difficult to obtain an enhancement effect due to light interference. When d> 95 mol%, (ZnS) d (ZrO 2 ) e
The size of the particles increases, and noise during reproduction increases.
Further, it is preferable that e = 5 to 50 mol%, and when e <5 mol%, the particle size of the (ZnS) d (ZrO 2 ) e particle becomes large and the noise at the time of reproduction becomes large. And the enhancement effect is reduced. ZnS ・
The same applies to the case of Al 2 O 3 .

【0025】また、ZnS・ZrO2 に酸化物等から成
るMaを添加しても良く、ZnS・(ZrO2 Ma)と
表した場合、Maは酸化珪素(SiO2 ),酸化アルミ
ニウム(Al2 3 ),酸化チタン(TiO2 ),窒化
珪素(Si3 4 ),炭化珪素(SiC),窒化チタン
(TiN),炭化チタン(TiC),窒化アルミニウム
(AlN),炭化ジルコニウム(ZrC),酸化イット
リウム(Y2 3 ),酸化マグネシウム(MgO),酸
化ニッケル(NiO),酸化ホウ素(B2 3),酸化
クロム(Cr2 3 ),酸化カルシウム(CaO)のう
ちの少なくとも1種を含む。これらの物質Maを添加す
ると、繰り返し記録再生に対する耐久性が向上する。
Further it may be added Ma composed of an oxide such as ZnS · ZrO 2, when expressed as ZnS · (ZrO 2 Ma), Ma is silicon oxide (SiO 2), aluminum oxide (Al 2 O 3 ), titanium oxide (TiO 2 ), silicon nitride (Si 3 N 4 ), silicon carbide (SiC), titanium nitride (TiN), titanium carbide (TiC), aluminum nitride (AlN), zirconium carbide (ZrC), oxidation At least one of yttrium (Y 2 O 3 ), magnesium oxide (MgO), nickel oxide (NiO), boron oxide (B 2 O 3 ), chromium oxide (Cr 2 O 3 ), and calcium oxide (CaO) Including. The addition of these substances Ma improves the durability against repeated recording and reproduction.

【0026】一方、ZnS・Al2 3 の場合も同様
に、酸化アルミニウム(Al2 3 )を除く上記Maを
添加しても良い。
On the other hand, in the case of ZnS.Al 2 O 3 , similarly, the above-mentioned Ma except aluminum oxide (Al 2 O 3 ) may be added.

【0027】上記Maの添加量は、ZrO2 に対して
(ZrO2 100-f (Ma)f とした場合、f=0〜5
0モル%が好ましく、f>50モル%では第一透明誘電
体層2及び第二透明誘電体層4の屈折率が小さくなり、
再生時の信号強度が小さくなる。ZnS・Al2 3
場合も同様である。
The amount of the Ma, when the relative ZrO 2 and (ZrO 2) 100-f ( Ma) f, f = 0~5
0 mol% is preferable, and when f> 50 mol%, the refractive indices of the first transparent dielectric layer 2 and the second transparent dielectric layer 4 become small,
The signal strength during reproduction is reduced. The same applies to the case of ZnS.Al 2 O 3 .

【0028】本発明の第一透明誘電体層2の厚さは10
0〜2500Åが良く、100Å未満ではエンハンスメ
ント効果が小さくなり、2500Åを超えると成膜時間
が長くなり過ぎ生産性が低下する。第二透明誘電体層4
の厚さは10〜500Åが良く、10Å未満では均一な
成膜が困難になり、500Åを超えると繰り返し記録再
生に対する耐久性が劣化する。
The thickness of the first transparent dielectric layer 2 of the present invention is 10
0 ° to 2500 ° is good, and if it is less than 100 °, the enhancement effect becomes small, and if it exceeds 2500 °, the film forming time becomes too long and the productivity is lowered. Second transparent dielectric layer 4
The thickness is preferably from 10 to 500 °, and if it is less than 10 °, uniform film formation becomes difficult, and if it exceeds 500 °, the durability against repeated recording and reproduction deteriorates.

【0029】上記実施形態においては、光を透明基板1
側から入射する場合の構成について説明したが、図2に
示すように光を記録層3側から入射する媒体M2にも本
発明は適用できる。同図において、11はディスク状の
透明基板、12は反射層、13は第二透明誘電体層、1
4は相変化型の記録層、15は第一透明誘電体層であ
り、成膜順が図1の場合と異なるが、これらの材質及び
厚さ等については図1の場合と同様である。
In the above embodiment, light is transmitted to the transparent substrate 1.
Although the configuration in which light is incident from the side has been described, the present invention is also applicable to a medium M2 in which light is incident from the recording layer 3 side as shown in FIG. In the figure, 11 is a disk-shaped transparent substrate, 12 is a reflective layer, 13 is a second transparent dielectric layer, 1
Reference numeral 4 denotes a phase-change type recording layer, and reference numeral 15 denotes a first transparent dielectric layer. The order of film formation is different from that in FIG. 1, but the materials and thicknesses thereof are the same as those in FIG.

【0030】また、本発明の透明誘電体層の材料に係わ
るZnS,Al2 3 ,ZrO2 ,TiO2 ,Si
2 ,ZnS・ZrO2 ,ZnS・Al2 3 の屈折
率、融点、ヤング率について表1に示す。
Further, ZnS, Al 2 O 3 , ZrO 2 , TiO 2 , Si related to the material of the transparent dielectric layer of the present invention.
Table 1 shows the refractive index, melting point, and Young's modulus of O 2 , ZnS · ZrO 2 , and ZnS · Al 2 O 3 .

【0031】[0031]

【表1】 [Table 1]

【0032】表1より、ZnS,Al2 3 ,Zr
2 ,TiO2 の屈折率はSiO2 よりも大きく、Al
2 3 ,ZrO2 の融点及びヤング率はSiO2 よりも
高いことが判る。従って、ZnSにAl2 3 ,ZrO
2 等を混合することにより、結果的に上述した本発明の
効果が得られることになる。尚、表1でZnS・ZrO
2,ZnS・Al2 3 の屈折率、融点のデータがぶれ
ているのは、O等の組成比のずれ、及びスパッタリング
法により成膜する際の成膜条件による。
From Table 1, it can be seen that ZnS, Al 2 O 3 , Zr
O 2 and TiO 2 have a higher refractive index than SiO 2 and Al
It can be seen that the melting points and Young's modulus of 2 O 3 and ZrO 2 are higher than that of SiO 2 . Therefore, Al 2 O 3 and ZrO are added to ZnS.
By mixing 2 and the like, the effects of the present invention described above can be obtained as a result. In Table 1, ZnS / ZrO was used.
2. The data of the refractive index and the melting point of ZnS.Al 2 O 3 are blurred due to the deviation of the composition ratio of O and the like and the film forming conditions when the film is formed by the sputtering method.

【0033】かくして、本発明の光記録媒体は、透明誘
電体層の屈折率が大きくなり、その結果透明誘電体層で
の光のエンハンスメント効果が増大し再生時の信号強度
が大きくなるので、C/N比が向上し、ジッター特性が
良好になる。また機械的強度が向上しかつ加熱時の化学
的安定性に優れるため、繰り返し記録、消去、再生に対
する耐久性も高まるという作用効果を有する。
Thus, in the optical recording medium of the present invention, the refractive index of the transparent dielectric layer is increased, and as a result, the effect of enhancing light in the transparent dielectric layer is increased, and the signal intensity during reproduction is increased. / N ratio is improved, and jitter characteristics are improved. Further, since the mechanical strength is improved and the chemical stability at the time of heating is excellent, it has the effect of increasing the durability against repeated recording, erasing, and reproduction.

【0034】本発明において、上記各層を透明基板1の
両面に各々積層するか、片面に上記各層を積層した2枚
の透明基板1を貼り合わせることにより、2倍の記録容
量としてもよい。また、本発明は、レーザビームをパル
ス変調する光強度変調方式によるものに限らず、電子ビ
ーム、電磁波等のエネルギー線による加熱方式も応用可
能である。本発明の媒体M1,M2は相変化型の書き換
え可能な光ディスクであり、CD−RW(Compact Disc
ReWritable )、DVD−RW(Digital Versatile Di
sc ReWritable )等の光ディスクに適用できる。
In the present invention, the recording capacity may be doubled by laminating each of the above layers on both sides of the transparent substrate 1 or by bonding two transparent substrates 1 each having the above layer on one side. The present invention is not limited to the light intensity modulation method for pulse-modulating a laser beam, but may be applied to a heating method using energy beams such as an electron beam and an electromagnetic wave. The media M1 and M2 of the present invention are phase-change rewritable optical disks, and are CD-RW (Compact Disc).
ReWritable), DVD-RW (Digital Versatile Di)
It can be applied to optical disks such as sc ReWritable).

【0035】尚、本発明は上記の実施形態に限定される
ものではなく、本発明の要旨を逸脱しない範囲内で種々
の変更は何等差し支えない。
It should be noted that the present invention is not limited to the above embodiment, and various changes may be made without departing from the scope of the present invention.

【0036】[0036]

【実施例】本発明の実施例を以下に説明する。Embodiments of the present invention will be described below.

【0037】(実施例1)図1の媒体M1(光ディス
ク)を以下のようにして構成した。ポリカーボネートか
ら成る3.5インチ径のディスク状の透明基板1の主面
上に、以下の各層をマグネトロンスパッタリング法によ
り順次成膜した。
Example 1 The medium M1 (optical disk) shown in FIG. 1 was constructed as follows. The following layers were sequentially formed on the main surface of a 3.5-inch diameter disk-shaped transparent substrate 1 made of polycarbonate by magnetron sputtering.

【0038】膜厚約1200Å,各種材料(表2)から
成る第一透明誘電体層2、膜厚約200Å,Ge2 Sb
2 Te5 から成る記録層3、膜厚約200Å,第一透明
誘電体層2と同じ材料から成る第二透明誘電体層4、膜
厚約1500Å,Al−Cr合金から成る反射層16で
ある。
The first transparent dielectric layer 2 made of various materials (Table 2) having a thickness of about 1200 °, a thickness of about 200 °, and Ge 2 Sb
2 Te 5 recording layer 3 made of a film thickness of about 200 Å, the second transparent dielectric layer 4 made of the same material as the first transparent dielectric layer 2 is the reflective layer 16 made of a film thickness of about 1500 Å, Al-Cr alloy .

【0039】そして、表2の如く第一透明誘電体層2と
第二透明誘電体層4の材料を変化させた場合に、C/N
比(dB)、10回のOWを行った後のジッター
(%)、1万回のOWを行った後のジッター(%)につ
いて測定した結果を表2に示す。尚、C/N比(dB)
の測定は以下のようにして行った。光ディスクのトラッ
クの線速度を6.18m/sとし、光波長830nmで
13mW(非晶質に対応)と5mW(結晶質に対応)に
パルス変調されたレーザビームを照射し、4.91MH
zで記録し1mWのレーザビームで再生した場合の再生
信号強度から得たものである。またジッターの測定は、
上記と同様の記録を10回行った後の再生信号のジッタ
ーと、1万回行った後の再生信号のジッターを測定した
ものである。また表2において、Maの添加量はZrO
2 又はAl2 3 に対するモル%である。
When the materials of the first transparent dielectric layer 2 and the second transparent dielectric layer 4 are changed as shown in Table 2, the C / N
Table 2 shows the measurement results of the ratio (dB), the jitter (%) after performing the OW for 10 times, and the jitter (%) after performing the OW for 10,000 times. In addition, C / N ratio (dB)
Was measured as follows. The linear velocity of the track of the optical disc is set to 6.18 m / s, and a laser beam pulse-modulated to 13 mW (corresponding to amorphous) and 5 mW (corresponding to crystalline) at a light wavelength of 830 nm is emitted at 4.91 MH.
This is obtained from the reproduced signal intensity when recording was performed at z and reproduced with a 1 mW laser beam. Also, the measurement of jitter
This is a measurement of the jitter of the reproduced signal after performing the same recording 10 times and the jitter of the reproduced signal after performing 10,000 times. In Table 2, the amount of Ma added was ZrO
2 or mol% based on Al 2 O 3 .

【0040】更に、第一透明誘電体層2と第二透明誘電
体層4をZnS・(ZrO2 Ma),ZnS・(Al2
3 Ma)としMaの添加量を50モル%付近で50モ
ル%未満としたものについて、C/N比(dB)、10
回のOWを行った後のジッター(%)、1万回のOWを
行った後のジッター(%)を測定した結果を表3に示
す。また比較例として、第一透明誘電体層2と第二透明
誘電体層4をZnS・SiO2 としたもの、表3の場合
と同様にして、第一透明誘電体層2と第二透明誘電体層
4をZnS・(ZrO2 Ma),ZnS・(Al2 3
Ma)としMaの添加量を50モル%付近で50モル%
超としたものについて、C/N比、10回のOWを行っ
た後のジッター、1万回のOWを行った後のジッターを
測定した結果を表4に示す。
Further, the first transparent dielectric layer 2 and the second transparent dielectric layer 4 are made of ZnS. (ZrO 2 Ma) and ZnS. (Al 2
O 3 Ma) and the addition amount of Ma was less than 50 mol% at around 50 mol%, the C / N ratio (dB), 10
Table 3 shows the results of measuring the jitter (%) after performing OW for 10,000 times and the jitter (%) after performing OW for 10,000 times. As also comparative examples, a first transparent dielectric layer 2 and the second transparent dielectric layer 4 that a ZnS · SiO 2, in the same manner as in Table 3, a first transparent dielectric layer 2 second transparent dielectric The body layer 4 is made of ZnS · (ZrO 2 Ma) and ZnS · (Al 2 O 3
Ma) and the addition amount of Ma was set to 50 mol% at around 50 mol%.
Table 4 shows the result of measuring the C / N ratio and the jitter after performing OW for 10 times and the jitter after performing OW for 10,000 times.

【0041】[0041]

【表2】 [Table 2]

【0042】[0042]

【表3】 [Table 3]

【0043】[0043]

【表4】 [Table 4]

【0044】表2に示すように、本発明は、C/N比が
50.1dB以上、10回記録後のジッターが8.6%
以下、1万回記録後のジッターが9.8%以下と優れた
特性を示し、添加成分Maを含有するものの中には、M
aのないNO.1よりも優れた特性のものがあった。ま
た表3において、C/N比は47.1dB以上、10回
記録後のジッターが8.6%以下、1万回記録後のジッ
ターが9.9%以下であった。これに対し、表4の比較
例では、C/N比が45.8〜48.7dB、10回記
録後のジッターが9.6〜12.5%、1万回記録後の
ジッターが11.8〜15.6%と劣化した。
As shown in Table 2, in the present invention, the C / N ratio was 50.1 dB or more, and the jitter after recording 10 times was 8.6%.
Hereinafter, the jitter after recording 10,000 times shows an excellent characteristic of 9.8% or less, and among those containing the additive component Ma, M
NO without a. Some of the properties were better than 1. In Table 3, the C / N ratio was 47.1 dB or more, and the jitter after 10 times of recording was 8.6% or less, and the jitter after 10,000 times of recording was 9.9% or less. In contrast, in the comparative example of Table 4, the C / N ratio was 45.8 to 48.7 dB, the jitter after recording 10 times was 9.6 to 12.5%, and the jitter after recording 10,000 times was 11. It deteriorated to 8 to 15.6%.

【0045】[0045]

【発明の効果】本発明は、相変化型の記録層の少なくと
も一方の界面に、屈折率が1.5以上の酸化物と硫化亜
鉛を主成分とする透明誘電体層を積層したことにより、
透明誘電体層の屈折率が大きくなり、その結果透明誘電
体層での光のエンハンスメント効果が増大し再生時の信
号強度が大きくなるので、C/N比が向上し、ジッター
特性が良好になる。また機械的強度が向上しかつ高温時
の化学的安定性に優れるため、繰り返し記録、消去、再
生に対する耐久性も高まるという作用効果を有する。
According to the present invention, a transparent dielectric layer mainly composed of an oxide having a refractive index of 1.5 or more and zinc sulfide is laminated on at least one interface of a phase change type recording layer.
The refractive index of the transparent dielectric layer increases, and as a result, the effect of enhancing light in the transparent dielectric layer increases, and the signal intensity during reproduction increases, so that the C / N ratio improves and the jitter characteristics improve. . Further, since the mechanical strength is improved and the chemical stability at a high temperature is excellent, the effect of increasing the durability against repeated recording, erasing, and reproduction is also obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の光記録媒体M1の部分断面図である。FIG. 1 is a partial sectional view of an optical recording medium M1 of the present invention.

【図2】本発明の光記録媒体M2の部分断面図である。FIG. 2 is a partial cross-sectional view of the optical recording medium M2 of the present invention.

【符号の説明】[Explanation of symbols]

1:透明基板 2:第一透明誘電体層 3:記録層 4:第二透明誘電体層 5:反射層 1: transparent substrate 2: first transparent dielectric layer 3: recording layer 4: second transparent dielectric layer 5: reflective layer

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】透明基板上に、照射する光の出力に応じて
非晶質又は結晶質に相変化する記録層と反射層とが設け
られ、該記録層の少なくとも一方の界面に、屈折率が
1.5以上の酸化物と硫化亜鉛を主成分とする透明誘電
体層を積層したことを特徴とする光記録媒体。
A recording layer and a reflection layer, which change into an amorphous or crystalline phase in accordance with the output of irradiation light, are provided on a transparent substrate, and at least one interface of the recording layer has a refractive index. An optical recording medium characterized in that a transparent dielectric layer mainly composed of an oxide of at least 1.5 and zinc sulfide is laminated.
【請求項2】前記屈折率が1.5以上の酸化物は酸化ジ
ルコニウム、若しくは酸化アルミニウムを主成分とする
ことを特徴とする請求項1記載の光記録媒体。
2. An optical recording medium according to claim 1, wherein said oxide having a refractive index of 1.5 or more contains zirconium oxide or aluminum oxide as a main component.
JP11157787A 1999-06-04 1999-06-04 Optical recording medium Pending JP2000348380A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11157787A JP2000348380A (en) 1999-06-04 1999-06-04 Optical recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11157787A JP2000348380A (en) 1999-06-04 1999-06-04 Optical recording medium

Publications (1)

Publication Number Publication Date
JP2000348380A true JP2000348380A (en) 2000-12-15

Family

ID=15657293

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11157787A Pending JP2000348380A (en) 1999-06-04 1999-06-04 Optical recording medium

Country Status (1)

Country Link
JP (1) JP2000348380A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008210509A (en) * 2001-12-07 2008-09-11 Matsushita Electric Ind Co Ltd Information recording medium and its manufacturing method
JP2011018437A (en) * 2010-09-02 2011-01-27 Jx Nippon Mining & Metals Corp Sputtering target and thin film for optical information recording medium

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008210509A (en) * 2001-12-07 2008-09-11 Matsushita Electric Ind Co Ltd Information recording medium and its manufacturing method
JP4722960B2 (en) * 2001-12-07 2011-07-13 パナソニック株式会社 Information recording medium and manufacturing method thereof
JP2011018437A (en) * 2010-09-02 2011-01-27 Jx Nippon Mining & Metals Corp Sputtering target and thin film for optical information recording medium

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