JP2000314804A - Color filter and its production - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obtain a color filter having excellent display quality without irregularity in brightness and colors on which a uniform liquid crystal layer can be easily formed, by forming a black matrix having both of a light-shielding function and a spacer function. SOLUTION: A light-shielding photosensitive resin compsn. layer 12 is formed on the whole face of a transparent substrate 10 on which red (R), green (G) and blue (B) pixels are formed. By exposing and patterning the light-shielding photosensitive resin compsn. layer 12 through a photomask 14 in the region to form spacers, the region to form spacers is hardened with light. Then by developing the light-shielding photosensitive resin compsn. layer 12 in this state, only the peripheral part 12a of each pixel and a spacer part 12s remains. Therefore, a part which constitutes the peripheral part 12a of each pixel and develops a light-shielding function, and a part which constitutes the spacer part 12s and develops a function of spacers are both formed in the black matrix.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a color filter and a method of manufacturing the same, and more particularly, to a color filter having a black matrix having a light shielding film having a high optical density and a spacer function, and the color filter. And a method for manufacturing a color filter that can be easily and accurately manufactured.

[0002]

2. Description of the Related Art Conventionally, a liquid crystal display device has a predetermined particle size between two substrates consisting of a color filter substrate and a counter electrode substrate in order to maintain the thickness (cell gap) of a liquid crystal layer at a constant interval. Spacer beads such as plastic beads and ceramic beads are scattered to bond the two substrates together. However, in the method described above,
There is a problem that it is difficult to uniformly disperse the spacer beads, and the cell gap cannot be made constant over the entire display area. Also, if a large amount of spacer beads is used, the cell gap is kept constant, but the aperture ratio of the display area decreases due to the spacers existing in the display area. There have been problems such as damage to the film and the transparent electrode and display defects.

In order to solve such a problem, JP-A-63-8254 and JP-A-5-196946 propose to form a spacer by laminating two or three colored layers of a color filter substrate. ing. In this method, in order to form a spacer having a thickness corresponding to the required thickness (cell gap) of the liquid crystal layer, sufficient thickness and thickness accuracy of each colored layer are required.

[0004] As a method of forming a color filter,
1) printing method, 2) ink jet method, 3) micelle electrodeposition method,
4) A pigment dispersion method and the like are known. However, in the printing method, there is a concern that overlaying with high accuracy is difficult,
The problem with the ink jet method is that it is difficult to stably control the height of the overlapping portion of the colored layers. There is a concern that the micelle electrodeposition method requires a step of forming an electrodeposition pattern, and that it is difficult to stably produce a pigment-charged micelle dispersion solution and to stably manufacture a color filter.

At present, the most common method is the pigment dispersion method. The pigment dispersion method is carried out by repeating the application, exposure and development of a colored photosensitive resin liquid, and the thickness of the colored layer usually produced by this method makes it possible to obtain the required height of the spacer even by superposition. I can't. In addition, if the coating thickness of the colored layer is increased, unevenness in the thickness of the substrate in the central portion and the peripheral portion tends to occur.
Since the application of the second and subsequent colors is performed on the pattern of the color that has already been formed, thickness unevenness is likely to occur at that portion, and uniform control of the thickness is difficult.

In order to solve these problems, JP-A-9-43425 and JP-A-10-177109 disclose a method of laminating a colored layer composed of three primary colors on a resin matrix composed of a resin and a light-shielding agent. In addition, a method of laminating a resist layer and the like have been proposed, but all require a lamination of four or more layers, and it is difficult to precisely control the height of the spacer.

[0007]

SUMMARY OF THE INVENTION It is an object of the present invention to solve the above-mentioned problems and to provide a color filter provided with a black matrix having a high optical density light-shielding film and a spacer function. An object of the present invention is to provide a method for manufacturing a color filter that can easily and accurately manufacture a color filter.

[0008]

An object of the present invention is to provide a color filter in which a colored layer having three primary colors and a plurality of black matrices are arranged on a transparent substrate, wherein the black matrix has a light-shielding function and a spacer function. This is achieved by a color filter characterized by having The black matrix having the light-shielding function and the spacer function is a black matrix having a light-shielding region constituting a peripheral portion of each pixel and a spacer region protruding from at least a part of at least one of these light-shielding regions. It is desirable. Also, the purpose mentioned above is
(1) a step of providing a light-shielding photosensitive resin composition layer on the entire surface of a surface having pixels of red, green and blue on a transparent substrate; and (2) a step of exposing from the transparent substrate side And (3) selectively exposing from the light-shielding photosensitive resin composition layer side;
And (4) a step of developing the light-shielding photosensitive resin composition layer which has been selectively exposed to light. Further, the step (1) desirably comprises a step of transferring the light-shielding photosensitive resin composition layer provided on the temporary support to a surface having red, green, and blue pixels on a transparent substrate, The light-shielding photosensitive resin composition contains (1) an alkali-soluble binder, (2) a photopolymerization initiator, (3) an addition-polymerizable monomer having an ethylenically unsaturated double bond, and (4) a light-shielding agent. It is desirable.
In the present invention, when the light-shielding photosensitive resin composition layer obtained in the step (1) is exposed from the transparent substrate side, each pixel part functions as a light-shielding film, and the light-shielding photosensitive The resin composition layer cures. Next, when selective exposure is performed from the light-shielding photosensitive resin composition layer side, for example, only a portion corresponding to a region for forming a spacer portion is exposed, only this region is cured. After the development processing, the region excluding the light-shielding photosensitive resin composition layer in the peripheral portion of each pixel and the light-shielding photosensitive resin composition layer in the spacer portion is removed, and only the peripheral portion and the spacer portion of each pixel remain. I do. Therefore,
A black matrix having a light-shielding function and a spacer function is easily and accurately manufactured.

[0009]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a preferred embodiment of the present invention will be described. The method for manufacturing a color filter of the present invention will be described with reference to the drawings. The step (1) includes a step of providing a light-shielding photosensitive resin composition layer on the entire surface of a transparent substrate on which a surface having red, green, and blue pixels is formed. In this step, first, as shown in FIG. 1A, a surface having red (R), green (G), and blue (B) pixels is formed on the transparent substrate 10.

As the transparent substrate, a known substrate used for a color filter can be used. Specifically, in addition to glass such as quartz glass, Pyrex glass, and synthetic quartz glass, a transparent resin film, an optical Resin plate and the like. There is no particular limitation on the method of forming red (R), green (G), and blue (B) pixels on the surface of such a transparent substrate 10, and a photosensitive resin composition containing a colorant was used. Known methods such as a pigment dispersion method, a printing method, an electrodeposition method, and an electroless plating method can be adopted, but a transfer material provided with a photosensitive resin composition layer containing each colorant on a temporary support can be used. It is preferable to use a method of providing each pixel by a transfer method in terms of simplicity and uniformity of thickness.

Next, as shown in FIG.
The light-shielding photosensitive resin composition layer 12 is provided on the entire surface of each of the pixels 0 on which the respective pixels are formed. The light-shielding photosensitive resin composition constituting the light-shielding photosensitive resin composition layer 12 includes an alkali-soluble binder, (2) a photopolymerization initiator, and (3) an addition-polymerizable resin having an ethylenically unsaturated double bond. monomer,
(4) Those containing a light-shielding agent are desirable.

As the alkali-soluble binder, a polymer having a carboxylic acid group in a side chain, for example, JP-A-59
-44615, JP-B-54-34327, JP-B-5
Methacrylic acid copolymers and acrylic acid copolymers described in the specifications of JP-A-8-12577, JP-B-54-25957, JP-A-59-53836 and JP-A-59-71048. Examples include an itaconic acid copolymer, a crotonic acid copolymer, a maleic acid copolymer, a partially esterified maleic acid copolymer, and a cellulose derivative having a carboxylic acid group in a side chain. In addition, those obtained by adding a cyclic acid anhydride to a polymer having a hydroxyl group are also useful. Particularly preferably, a copolymer of benzyl (meth) acrylate and (meth) acrylic acid or a multi-component copolymer of benzyl (meth) acrylate, (meth) acrylic acid and another monomer described in US Pat. No. 4,139,391 Can be mentioned. Although the above-mentioned ones are exemplified by water-insoluble binders, examples of water-soluble polymers include polyvinylpyrrolidone, polyethylene oxide, polyvinyl alcohol and the like.

In addition to the above, in order to improve various performances, for example, the strength of a cured film, an alkali-insoluble polymer can be added in a range that does not adversely affect developability and the like.
These polymers include alcohol-soluble nylon or epoxy resin.

The solid content of the binder in the solid content of the light-shielding photosensitive resin composition is from 10 to 95% by weight, more preferably from 20 to 90% by weight. If it is less than 10% by weight, the tackiness of the photosensitive resin layer is too high, and if it exceeds 95% by weight, the formed image is inferior in strength and light sensitivity.

As the photopolymerization initiator, US Pat.
No. 7660, a vicinal polyketaldonyl compound disclosed in U.S. Pat. No. 2,448,828, an acyloin ether compound described in U.S. Pat.
No. 7,246,127 A-hydrocarbon-substituted aromatic acyloin compounds described in U.S. Pat. No. 3,046,127
And the combination of triaryl imidazole dimer and p-amino ketone described in U.S. Pat. No. 3,549,367, and JP-B-51-48516. Benzothiazole compounds and trihalomethyl-s-triazine compounds, trihalomethyl-s-triazine compounds described in U.S. Pat. No. 4,239,850, trihalomethyl oxadiazole compounds described in U.S. Pat. No. 4,221,976 And the like. Particularly preferred are trihalomethyl-s-triazine, trihalomethyloxadiazole and triarylimidazole dimer. Among them, compounds having substantially no sensitivity to light of 400 nm or more can be appropriately selected. The fact that the photopolymerization initiator has substantially no sensitivity is determined by the spectral sensitivity spectrum of the photopolymerization initiator and the spectral characteristics of the substrate on which the light-shielding film is formed. And the transmittance of the substrate is 10%
It is defined by the ratio (A / B) of the area (B) of 400 nm or less from the minimum wavelength described above, and means that the value of A / B is 0.1 or less. For example, when borosilicate glass is used as the substrate, the wavelength at which the light transmittance is 10% or more is 290 n.
m, and in this case, the area B is 290 nm.
From 400 nm. Preferred specific examples of the photopolymerization initiator are described in JP-A-7-15992.

The solid content of the photopolymerization initiator in the solid content of the photopolymerizable composition is 0.5 to 20% by weight, more preferably 1 to 15% by weight. If the amount is less than 0.5% by weight, the light sensitivity and the strength of the image are low, and if it exceeds 20% by weight, no good effect on the performance is recognized.

The addition polymerizable monomer having an ethylenically unsaturated double bond includes at least one addition-polymerizable ethylenically unsaturated group in the molecule and has a boiling point of 10 at normal pressure.
It is a compound at 0 ° C. or higher. For example, monofunctional acrylates and monofunctional methacrylates such as polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate, and phenoxyethyl (meth) acrylate. Polyethylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate, trimethylolethane triacrylate, trimethylolpropane triacrylate, trimethylolpropane diacrylate, neopentyl glycol di (meth) acrylate, pentaerythritol tetra (meth) acrylate Pentaerythritol tri (meth) acrylate, dipentaerythritol hexa (meth) acrylate, dipentaerythritol penta (meth) acrylate, hexanediol di (meth) acrylate, trimethylolpropane tri (acryloyloxypropyl) ether, tri (acryloyloxy) Ethyl) isocyanurate, tri (acryloyloxyethyl) cyanurate, glycerin tri Meth) acrylate, ethylene oxide or propylene O to a polyfunctional alcohol such as trimethylolpropane or glycerol; After addition reaction Kishido (meth) those acrylated;
Japanese Patent Publication No. 48-41708, Japanese Patent Publication No. 50-6034,
Urethane acrylates described in JP-A-51-37193; polyester acrylates described in JP-A-48-64183, JP-B-49-43191 and JP-B-52-30490. Kind,
Examples include polyfunctional acrylates and methacrylates such as epoxy acrylates, which are reaction products of an epoxy resin and (meth) acrylic acid. More preferred are trimethylolpropane tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate, and dipentaerythritol penta (meth) acrylate.

The solid content of the addition-polymerizable monomer having an ethylenically unsaturated double bond in the solid content of the light-shielding photosensitive resin composition is 5 to 50% by weight, and more preferably 10 to 4% by weight.
0% by weight. If the amount is less than 5% by weight, the photosensitivity and the strength of the image are low, and if it exceeds 50% by weight, the tackiness of the photosensitive resin layer becomes excessive, which is not preferable.

The light-shielding photosensitive resin composition preferably contains at least one or more colorants.
As the coloring agent, various coloring agents described in Japanese Patent Application No. 5-110487 are used. Above all, the mixing of a pigment having high transmittance in the ultraviolet region described in the same specification is particularly preferable. The solid content of the colorant in the light-shielding photosensitive resin composition is preferably 1 to 50% by weight.

It is preferable to add a thermal polymerization inhibitor in addition to the above components. Examples thereof include hydroquinone, p-methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t-butylcatechol, benzoquinone, 4,4′-thiobis (3-methyl-6-t-
Butylphenol), 2,2′-methylenebis (4-methyl-6-t-butylphenol), 2-mercaptobenzimidazole, phenothiazine and the like.

Further, known additives such as a plasticizer, a surfactant and a solvent can be added to the light-shielding photosensitive resin composition, if necessary.

Then, as shown in FIG. 1B, a light-shielding photosensitive resin composition layer 12 is provided on the entire surface on which the pixels are formed. As a means for providing the light-shielding photosensitive resin composition layer 12, specifically, using a spinner, a wheeler, a roller coater, a curtain coater, a knife coater, a wire bar coater, an extruder, and the like, drying and drying. Although a transparent resin layer can be provided, it is particularly preferable to use a light-shielding photosensitive transfer material having a light-shielding photosensitive resin composition layer on a temporary support, and transfer the image onto a substrate. Specific transfer materials include Japanese Patent Application No. 2-4000.
47, Japanese Patent Application No. 3-9292, Japanese Patent Application No. 3-120223,
The transfer materials described in Japanese Patent Application Nos. 3-153227, 4-64870, and 5-110487 are used.

The temporary support in the transfer material is desirably a material that is flexible and does not deform, shrink, or expand under pressure or under pressure and heat. Examples include polyethylene terephthalate, cellulose triacetate film, polystyrene film, and polycarbonate film, and biaxially stretched polyethylene terephthalate is particularly preferable. In addition, it is desirable to provide a colored light-shielding photosensitive resin composition layer directly on the support or via an intermediate layer having ultraviolet transmittance and low oxygen permeability. Further, it is desirable to provide a thermoplastic composition resin layer for the purpose of preventing air bubbles from being mixed when the light-shielding photosensitive resin composition layer is transferred to the surface on which each pixel is formed. In this case, it is preferable to laminate the temporary support, the thermoplastic composition resin layer, the intermediate layer, and the light-shielding photosensitive resin composition layer in this order.

It is desirable that the surface of the light-shielding photosensitive resin composition layer of the transfer material is covered with a cover sheet until transfer, and after the transfer, the cover sheet is peeled off from the light-shielding photosensitive resin composition layer. As the covering sheet, a resin film such as polypropylene is preferably used.

After the light-shielding photosensitive resin layer on the transfer material is transferred onto each pixel surface, exposure is performed from the transparent substrate 10 side. At the time of this exposure, the light source is selected according to the photosensitivity of the light-shielding photosensitive resin layer, and a known material such as an ultra-high pressure mercury lamp, a xenon lamp, a carbon arc lamp, and an argon laser can be used.
The exposure conditions are 1 to 300 mj / cm ² , preferably 10 to 200 mj / cm ² . When the exposure condition is less than 10 mj / cm ^2, no sufficient light-shielding property is obtained, and when it exceeds 200 mj / cm ^2, there is a R, G, light-shielding film on the B pixel remains a problem. In this case, the red, green and blue pixels formed on the substrate in advance are disclosed in Japanese Patent Application No.
As described in 0691, it is preferable that the light transmittance of each pixel in the photosensitive wavelength region of the light-shielding photosensitive resin composition layer be 2% or less, and when exposed under such conditions, each pixel is formed. The light-shielding photosensitive resin composition layer 12 on the surface is
Since each pixel functions as a light shielding film, it is not cured by light. On the other hand, in the light-shielding photosensitive resin composition layer 12 provided directly on the surface of the transparent substrate 10, only the area close to the surface of the transparent substrate 10 is cured by light (mirror curing). Other regions in the thickness direction of the material layer 12 are not cured. Therefore, the thickness of each pixel and the thickness of the light-cured portion of the light-shielding photosensitive resin composition layer 12 are substantially the same.

Next, as shown in FIG. 1 (c), when a portion of a region for forming a spacer portion is pattern-exposed from the light-shielding photosensitive resin composition layer 12 side via a photomask 14, the spacer portion is exposed. The part of the region to be formed is light-cured. Thereafter, when the light-shielding photosensitive resin composition layer 12 is developed in this state, the light-shielding photosensitive resin composition layer 1 is developed.
2, only the peripheral portion 12a and the spacer portion 12s of each pixel remain as shown in FIG. Therefore, in the black matrix, a portion that functions as a light-shielding function forming the peripheral portion 12a of each pixel and a portion that functions as a spacer forming the spacer portion 12s are formed.

FIG. 2 is a schematic perspective view of the essential parts shown to make the state at this time easier to illustrate. In FIG. 2, the black matrix is composed of a light-shielding region 12a forming a peripheral portion of each pixel (R, G, B), and a spacer region (spacer portion) protruding from at least one of the light-shielding regions. ) 12 s.
The place where the spacer portion 12s is provided is appropriately selected depending on the size of each liquid crystal filling region, ease of liquid crystal injection, and the like.

The thickness (height) of the spacer portion 12s
Is arbitrarily selected according to the thickness of the cell gap. Therefore, the thickness of the light-shielding photosensitive resin composition layer 12 provided on the surface on which each pixel is formed is determined by the thickness (high ). Usually, the thickness of each pixel is preferably 1 to 3 μm. If the thickness of each pixel is less than 1 μm, the pigment concentration in the light-shielding film increases to obtain the required optical density, and the developability deteriorates. If it exceeds 3 μm, problems such as deterioration of developability and deterioration of reproducibility of image formation occur. The thickness of the light-shielding film can be arbitrarily set within the above range.

The thickness (height) of the spacer portion is preferably from 1 to 10 μm, more preferably from 2 to 8 μm, within a range larger than the thickness of each pixel.

Therefore, the thickness of the light-shielding photosensitive resin composition layer 12 provided on each pixel surface is preferably 1 to 10 μm, more preferably 2 to 8 μm, and if it is less than 1 μm, it is sufficient to fill the cell gap. Spacer part 12
a cannot be formed, and if the height exceeds 10 μm, the spacer portion 1 is exposed when exposed through the photomask 14.
Photocuring of the region corresponding to 2a becomes insufficient, and the cell gap is too large, which causes a problem that the liquid crystal is unnecessarily used.

When the light-shielding photosensitive resin composition layer 12 is subjected to pattern exposure through a photomask 14, the transparent substrate 10
The same light source as in the case where the entire surface is exposed can be used.

Hereinafter, the present invention will be described in more detail with reference to Examples, but the present invention is not limited thereto.

Example 1 (Preparation of a light-shielding photosensitive transfer material) A coating solution having the following formulation H1 was applied on a 100 μm-thick polyethylene terephthalate film temporary support and dried to obtain a dried film having a dry film thickness of 20 μm. A thermoplastic resin layer was provided.

Thermoplastic resin layer formulation H1: methyl methacrylate / 2-ethylhexyl acrylate / benzyl methacrylate / methacrylic acid copolymer (copolymer composition ratio (molar ratio) = 55 / 28.8 / 11.7 / 4.5) , Weight average molecular weight = 80000) 15.0 parts by weight-BPE-500 (polyfunctional acrylate manufactured by Shin-Nakamura Chemical Co., Ltd.) 7.0 parts by weight-F177P (fluorinated surfactant manufactured by Dainippon Ink and Chemicals) 0.3 parts by weight -Methanol 30.0 parts by weight-Methyl ethyl ketone 19.0 parts by weight-1-methoxy-2-propanol 10.0 parts by weight

Next, the following formulation B1 was placed on the thermoplastic resin layer.
And dried to a dry film thickness of 1.6 μm.
An intermediate layer having a thickness of m was provided.

Separation layer formulation B1: 130 parts by weight of polyvinyl alcohol (PVA205 manufactured by Kuraray Co., Ltd., saponification rate = 80%) 60 parts by weight of polyvinylpyrrolidone (PVP, K-30 manufactured by GAF Corporation) 2110 parts by weight of distilled water Parts ・ Methanol 1750 parts by weight

On a temporary support having the thermoplastic resin layer and the intermediate layer, a coating solution having the following formulation C1 was applied.
After drying, a light-shielding photosensitive resin composition layer having a dry film thickness of 7 μm was formed.

Formulation C1: ・ Benzyl methacrylate / methacrylic acid copolymer (molar ratio = 70/30, intrinsic viscosity = 0.12) 11.00 parts by weight ・ Dipentaerythritol hexaacrylate 10.60 parts by weight ・ Bis [4 -[N- [4- (4,6-bistrichloromethyl-S-triazin-2-yl) phenyl] carbamoyl] phenyl] sebacate (photopolymerization initiator) 0.52 parts by weight Pigment Red 177 4.00 parts by weight Parts: Pigment Blue 15: 6 2.86 parts by weight Pigment Yellow 139 2.27 parts by weight Pigment Violet 23 0.39 parts by weight Carbon black 1.70 parts by weight Hydroquinone monomethyl ether 0.01 parts by weight F177P ( 0.07 parts by weight ・ Methyl cello Rubu acetate 40.00 parts by weight ・ Methyl ethyl ketone 80.00 parts by weight

Further, a cover sheet of polypropylene (12 μm thick) was pressed on the light-shielding photosensitive resin layer to prepare a light-shielding photosensitive transfer material.

Borosilicate glass substrate (1.1 mm thick)
The same 2 as in Example 1 described in Japanese Patent Application No. 4-150691.
A color filter having R, G, and B pixels having a thickness of μm was prepared. In this case, the light transmittance of the B pixel at 400 nm or more was 10% or more. The covering sheet of the light-shielding photosensitive transfer material is peeled off on the R, G, B color filters, and the light-shielding photosensitive resin layer surface is applied to the color filter surface using a laminator (VP-II, manufactured by Taisei Laminator Co., Ltd.). Bonding was performed by applying pressure (0.8 kg / cm 2) and heating (130 ° C.), and then peeled off at the interface between the temporary support and the thermoplastic resin layer to remove the temporary support.

Next, from the side opposite to the color filter surface (transparent substrate side), using a super-high pressure mercury lamp, the exposure amount was 100 mj / c.
The entire surface was exposed at m ² . Next, pattern exposure was performed from the color filter surface using a spacer mask at an exposure amount of 50 mj / cm ² . Thereafter, development was performed with a 1% aqueous solution of sodium carbonate to remove unnecessary portions, and a heat treatment was further performed at 220 ° C. for 120 minutes to form a light-shielding film and a spacer portion forming peripheral portions of each of the R, G, and B pixels. The height of this spacer
(Height from the transparent substrate surface) was 6.3 μm. In addition, there was no overlap between the light-shielding film and the RGB layers, and the light-shielding film had a high optical density with a Y value of 0.2 in the CIE colorimetric method. In addition, the variation in the thickness of the light shielding film portion and the variation in the thickness of the spacer portion were both as small as ± 0.1 μm.

[0041]

The color filter of the present invention has a structure in which the black matrix has a light-shielding function and a spacer function. Since the black matrix exerts the spacer function, it is compared with a spacer having a colored layer laminated thereon. As a result, it is possible to provide a color filter that can form a uniform liquid crystal layer easily and has excellent display quality without luminance unevenness and color unevenness. Further, according to the method for manufacturing a color filter of the present invention, a color filter having the above characteristics can be easily and accurately manufactured.

[Brief description of the drawings]

FIG. 1 is a process chart showing a preferred embodiment of a method for producing a color filter of the present invention.

FIG. 2 is a schematic perspective view showing a main part of an embodiment of the color filter of the present invention.

[Explanation of symbols]

 R pixel (red) G pixel (green) B pixel (blue) 10 Transparent substrate 12 Light-blocking photosensitive resin composition layer 12a Peripheral portion (light-blocking region) 12s Spacer portion (spacer region) 14 Photomask

Claims (5)

[Claims] 1. A color filter in which a colored layer having three primary colors and a plurality of black matrices are arranged on a transparent substrate, wherein the black matrix has a light-shielding function and a spacer function. 2. In the color filter, a black matrix forms a light-shielding region forming a peripheral portion of each pixel;
The color filter according to claim 1, further comprising a spacer region protruding from a part of at least one of the light-shielding regions. 3. A step of providing a light-shielding photosensitive resin composition layer on the entire surface of a transparent substrate on which a surface having red, green and blue pixels is formed; and (2) a transparent substrate. (3) selectively exposing from the light-shielding photosensitive resin composition layer side, and (4) developing the selectively exposed light-shielding photosensitive resin composition layer. A method for producing a color filter, comprising: 4. The method according to claim 1, wherein the step (1) comprises a step of transferring the light-shielding photosensitive resin composition layer provided on the temporary support to a surface having red, green and blue pixels on the transparent substrate. The method for producing a color filter according to claim 3, wherein: 5. A light-shielding photosensitive resin composition comprising: (1) an alkali-soluble binder, (2) a photopolymerization initiator, (3) an addition-polymerizable monomer having an ethylenically unsaturated double bond,
(4) The method for producing a color filter according to (3) or (4), further comprising a light-shielding agent.