JP2003149431A - Color filter - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a color filter having a spacer part obtained by laminating colored layers for holding the thickness (cell gap) of a liquid crystal layer at a fixed interval and having high height accuracy and a light shielding layer. SOLUTION: In the color filter consisting of colored parts of a plurality of colors having respectively different spectral characteristics, the spacer part obtained by partially superposing two colors having respectively different spectral characteristics is laminated so as to be superposed to a TFT electrode. The light transmission factor of wavelength <=550 nm through the spacer part is preferably 10% and less.

Description

Detailed Description of the Invention

[0001]

TECHNICAL FIELD The present invention relates to a color filter suitable for a liquid crystal color display or the like.

[0002]

2. Description of the Related Art Conventionally, a liquid crystal display device has a predetermined particle size between two substrates, which are a color filter substrate and a counter electrode substrate, in order to keep the thickness (cell gap) of a liquid crystal layer constant. Spacer beads such as plastic beads and ceramic beads are scattered to bond the two substrates together. However, with the method as described above,
It is difficult to uniformly disperse the spacer beads, and there is a problem that the cell gap cannot be made uniform over the entire display area. Also, if a large amount of spacer beads are used, the cell gap is kept constant, but the aperture ratio of the liquid crystal layer portion is reduced due to the spacers present in the display area.
There has been a problem that the spacer beads damage the alignment film and the transparent electrode when the substrates are laminated, and display defects occur.

In order to solve such a problem, JP-A-63-825405 and JP-A-5-196946 propose to form a spacer by laminating a plurality of colored layers on a color filter substrate. Has been done. In this method, in order to form the spacer having a thickness corresponding to the required thickness (cell gap) of the liquid crystal layer, sufficient thickness and thickness accuracy of each colored layer are required.

As a method of forming a color filter,
1) printing method, 2) ink jet method, 3) micelle electrodeposition method,
4) The pigment dispersion method and the like are known. However, in the printing method, there is a concern that it is difficult to overlay with high accuracy,
The ink jet method has a problem that it is difficult to stably control the height of the overlapping portion of the colored layers. The micelle electrodeposition method has a concern that a step of forming an electrodeposition pattern is required and that the stability of the pigment-charged micelle dispersion solution is difficult and that it is difficult to stably manufacture a color filter.

Currently, the most popular method is the pigment dispersion method. The pigment dispersion method is performed by repeating the application of a colored photosensitive resin liquid, exposure, and development. A method of forming spacers by superimposing colored layers by this method is proposed in JP-A-9-43425 and JP-A-10-177109. However, in the case of stacking 3 to 4 layers, 3 is used.
Since the coating after the color is applied on the spacer pattern having a small area previously formed, unevenness in the thickness easily occurs due to the flow, and it is difficult to control the thickness uniformly.

On the other hand, in the color liquid crystal display, there is a problem that the switching characteristics of the TFT are adversely affected by the light incident from the outside, and the display characteristics are deteriorated accordingly. In particular, when light incident from the outside is reflected by the light-shielding film on the color filter substrate and is incident on the TFT, the light adversely affects the TFT and deteriorates the TFT characteristics. As a result, the voltage of the unit pixel portion is reduced. There is a problem in that display defects such as display unevenness occur due to changes in the light transmittance of the pixel portion.

On the other hand, in Japanese Unexamined Patent Publication No. 6-331975, one of the two transparent substrates facing each other has at least a light-shielding film formed in a predetermined pattern on the transparent substrate, and a light-shielding film on the transparent substrate. There has been proposed a color liquid crystal display having a red, green, and blue colored layer and a transparent electrode, each of which is formed so as to cover a part of the colored layer and has a portion overlapping with another colored layer.

According to this, since projections or independent colored layers of islands are overlapped under the light-shielding film only in the portion facing the TFT element, the three layers of the colored layers overlap each other so that the inside of the TFT element from the light-shielding film. Since the reflected light to the TFT element is reduced and the photocurrent generated in the TFT element is reduced, the reverse voltage of the gate electrode necessary for suppressing the color unevenness due to the photocurrent can be reduced.

However, in the color liquid crystal display proposed in Japanese Patent Laid-Open No. 6-331975, since a plurality of colored layers of red, green and blue are formed on the light shielding film, the entire colored layer is There is a problem that the film thickness becomes thick and causes disclination due to a step (defective display due to abnormal alignment of liquid crystal) and non-uniform cell gap, which causes display defects such as display unevenness. .

Further, as the thickness of the colored layer becomes thicker, it becomes indispensable to form an overcoat layer for flattening the unevenness of the colored layer, which causes a problem that the manufacturing process becomes complicated.

[0011]

SUMMARY OF THE INVENTION In view of the above problems, an object of the present invention is to efficiently and inexpensively provide a color filter having a spacer portion having a high height accuracy and a light shielding layer of a TFT electrode. To provide.

[0012]

In order to achieve such an object, the present invention <1> provides a color filter including colored portions of a plurality of colors having different spectral characteristics, wherein
A color filter having a spacer part formed by partially overlapping colors, and a part or all of the spacer part is formed at a position overlapping the TFT electrode when viewed from the front of the display. <2> The color filter according to <1>, wherein the spacer part in which two colors having different spectral characteristics are partially overlapped has a light transmittance of 10% or less at a wavelength of 550 nm or less. <3> A step of forming a colored pattern on the substrate by transferring the photosensitive colored resin composition layer formed on the temporary support to the substrate by transfer, exposing it with a predetermined pattern, and then developing <1> or <2 produced by the production method
> Is a color filter. <4> The color filter according to any one of <1> to <3>, wherein the color filter including the colored portions of a plurality of colors having different spectral characteristics is formed on a substrate on which TFT electrodes are arranged. is there.

[0013]

BEST MODE FOR CARRYING OUT THE INVENTION Preferred embodiments of the present invention will be described below. (Coloring Layer) First, the coloring layer of the color filter of the present invention will be described. The colored layer of the color filter contains a colorant and a binder resin as main components. The method for forming the colored layer is not particularly limited, but examples of the method usually used include a printing method, an ink jet method, a micelle electrodeposition method, a pigment dispersion method and the like. Among them, the pigment dispersion method is preferable for the purpose of forming a spacer by partially laminating colored layers. The production of a color filter by the pigment dispersion method is usually carried out by forming a photosensitive resin composition layer containing a colorant such as a pigment, a binder, a photopolymerizable compound, a photopolymerization initiator on a substrate and exposing it in a predetermined pattern. After that, it can be achieved by developing and forming a colored pattern on the substrate.

The preferred constituents of the colored layer will be described in more detail. (Colorant) As the colorant, an organic pigment, a dye or the like is used. Particularly, a pigment having good heat resistance can be preferably used. Preferable examples of these include PB1 as a blue pigment.
5: 6, PB15: 3, PB76, PG as a green pigment
36, PG7, PY120, PY12 as yellow pigment
8, PY138, PY139, PY150, PY15
5, PY180, PY185, and PR as a red pigment
149, PR177, PR179, PR208, PR2
09, PR224, PR254, PR255 and the like are used. The content of the pigment in the colored transfer layer is preferably 0.1 to 45% by mass. More preferably, it is 1 to 35 mass%.

(Binder) The binder is not particularly limited, and a usual film-forming polymer can be used. However, a polymer having a polar group such as a carboxylic acid group or a carboxylic acid group in its side chain is advantageously used as the binder in the present invention. Examples thereof include JP-A-59-44615 and JP-B-54-34.
Methacrylic acid copolymers as described in Japanese Patent Publication No. 327, Japanese Patent Publication No. 58-12577, Japanese Patent Publication No. 54-25957, Japanese Patent Publication No. 59-53836, and Japanese Patent Publication No. 59-71048. , Acrylic acid copolymers, itaconic acid copolymers, crotonic acid copolymers, maleic acid copolymers, partially esterified maleic acid copolymers, and the like. Moreover, the cellulose derivative which has a carboxylic acid group in a side chain can also be mentioned. In addition, a polymer having a hydroxyl group and a cyclic acid anhydride added thereto can be preferably used. In particular, US Pat. No. 413
Examples thereof include copolymers of benzyl (meth) acrylate and (meth) acrylic acid and multi-component copolymers of benzyl (meth) acrylate, (meth) acrylic acid and other monomers described in Japanese Patent No. 9391. . These polar group-containing binder polymers may be used alone or in the form of a composition used in combination with a usual film-forming polymer.

(Photopolymerizable Compound) The photopolymerizable compound is preferably a monomer or oligomer having an ethylenically unsaturated double bond and capable of addition polymerization by irradiation with light. Examples of such a monomer include compounds having at least one addition-polymerizable ethylenically unsaturated group in the molecule and having a boiling point of 100 ° C. or higher at normal pressure. Examples thereof include monofunctional acrylates and monofunctional methacrylates such as polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate and phenoxyethyl (meth) acrylate; polyethylene glycol di (meth) acrylate, polypropylene glycol di (meth). ) Acrylate, trimethylolethane triacrylate, trimethylolpropane triacrylate, trimethylolpropane diacrylate, neopentyl glycol di (meth) acrylate, pentaerythritol tetra (meth) acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol hexa (Meth) acrylate, dipentaerythritol penta (meth) acrylate, hexanedio Di (meth) acrylate, trimethylolpropane tri (acryloyloxypropyl) ether, tri (acryloyloxyethyl) isocyanurate, tri (acryloyloxyethyl) cyanurate, glycerin Tri (meth) acrylate; polyfunctional such as trimethylolpropane and glycerin Examples thereof include polyfunctional acrylates and polyfunctional methacrylates such as those obtained by adding propylene oxide to ethylene oxide to alcohol and then converting to (meth) acrylate.

Further, Japanese Patent Publication No. 48-41708, Japanese Patent Publication No. 50-6034 and Japanese Patent Publication No. 51-3719.
Urethane acrylates described in JP-A No. 3-43; JP-A-48-64183 and JP-B-49-43191.
Examples thereof include polyester acrylates described in JP-B No. 52-30490 and JP-B No. 52-30490; and polyfunctional acrylates and methacrylates such as epoxy acrylates which are reaction products of an epoxy resin and (meth) acrylic acid. Of these, trimethylolpropane tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate and dipentaerythritol penta (meth) acrylate are preferable.

These monomers or oligomers may be used alone or in admixture of two or more, and the content of the coloring composition for a color filter with respect to the total solid content is generally 5 to 60% by mass. , 10 to 50 mass% is preferable.

(Photopolymerization Initiator) As the photopolymerization initiator, vicinal polyketaldonyl compounds disclosed in US Pat. No. 2,376,660 and US Pat.
Acyloin ether compounds described in US Pat. No. 8,828, α described in US Pat. No. 2,722,512.
-Hydrocarbon-substituted aromatic acyloin compounds, U.S. Pat. Nos. 3,046,127 and 295,175.
A polynuclear quinone compound described in US Pat.
No. 49367, a combination of a triarylimidazole dimer and p-aminoketone, JP-B-51-
Benzothiazole compounds and trihalomethyl-s-triazine compounds described in Japanese Patent No. 48516, US Pat. No. 42.
Trihalomethyl-described in 39850
Examples thereof include s-triazine compounds and trihalomethyloxadiazole compounds described in U.S. Pat. No. 4,212,976. Particularly, trihalomethyl-s-triazine, trihalomethyloxadiazole and triarylimidazole dimer are preferable. The content of the photopolymerization initiator with respect to the total solid content of the coloring composition for a color filter is generally 0.5 to 20% by mass,
1 to 15 mass% is preferable.

(Thermal Polymerization Inhibitor) The coloring composition for a color filter of the present invention preferably further contains a thermal polymerization inhibitor in addition to the above components. Examples of the thermal polymerization inhibitor include:
Hydroquinone, p-methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t-butylcatechol, benzoquinone, 4,4'-thiobis (3-methyl-6-t-butylphenol), 2,2'-methylenebis (4-methyl-6-t-butylphenol), 2-
Examples thereof include mercaptobenzimidazole and phenothiazine.

(Other Additives) If desired, known additives such as plasticizers, surfactants, adhesion promoters, ultraviolet absorbers and solvents can be added to the coloring composition for color filters. .

The coloring composition for a color filter of the present invention is prepared as a coating solution prepared by dissolving each of the above solid components in a solvent, and is used for forming a coloring layer on the surface of a temporary support or substrate. To do.

Examples of the organic solvent used for preparing the coloring composition for the color filter include methyl ethyl ketone,
Examples thereof include propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, cyclohexanone, cyclohexanol, ethyl lactate, methyl lactate and caprolactam.

The film thickness of the colored layer is set so as to match the cell thickness of the finally manufactured liquid crystal panel. Considering the cell thickness of a normal liquid crystal panel, the thickness of the colored layer is 2
μm to 8 μm, preferably 2.6 μm to 6 μm, and more preferably 2.8 μm to 5.5 μm.

(Formation of photosensitive resin composition layer) As a method for forming the photosensitive resin composition layer on the substrate, a solution containing the photosensitive resin composition is applied on the substrate by using a spinner or a slit coater. A method of applying and drying or a method of forming a photosensitive resin composition layer previously formed on a temporary support on a substrate by transfer (transfer method) is used. When the thickness of the photosensitive resin composition layer is 2 μm or more, coating with a slit coater or a transfer method is preferable, and a transfer method is particularly preferable from the viewpoint of thickness accuracy.

Next, the transfer material used in the transfer method suitable for producing the color filter of the present invention will be described. The transfer material for a color filter is an image forming material in which a colored photosensitive resin composition layer is provided on a temporary support. As a temporary support for the colored photosensitive resin composition layer used in the present invention, it is necessary that it has flexibility and does not cause significant deformation, shrinkage or elongation even under pressure or under pressure and heating. Is. Examples of such a support include polyethylene terephthalate film, cellulose triacetate film, polystyrene film, and polycarbonate film. Biaxially oriented polyethylene terephthalate film is particularly preferred.

On the temporary support, it is desirable to provide a colored photosensitive resin composition layer directly or via an intermediate layer having ultraviolet ray permeability and low oxygen permeability. Further, it is preferable to provide a thermoplastic resin layer for the purpose of avoiding inclusion of bubbles during transfer. In that case, it is preferable to laminate the temporary support, the thermoplastic resin layer, the intermediate layer, and the photosensitive resin composition layer in this order. These layers can be prepared by dissolving the materials constituting the layers in a suitable solvent, coating and drying. At this time, in the case of multilayer coating on the already formed layer, it is necessary that the solvent does not attack the lower layer, but these solvents can be appropriately selected by those skilled in the art. .

The intermediate layer is a photocuring reaction in the colored photosensitive resin composition layer when the colored photosensitive resin composition layer is adhered to the transparent substrate, the temporary support is peeled off, and pattern exposure is carried out. It is provided as a barrier layer for preventing the diffusion of oxygen from the air that inhibits the above-mentioned phenomenon and for preventing the thermoplastic resin layer and the photosensitive resin composition layer from being mixed when two layers are laminated. Therefore, it is preferable that the colored photosensitive resin composition layer cannot be mechanically peeled off, and the oxygen blocking ability is high.

Such an intermediate layer is formed by applying a solution of the polymer onto the temporary support directly or via a thermoplastic resin layer. Suitable polymers for use in the intermediate layer include JP-B-46-32714 and JP-B-5640.
Polyvinyl ether / maleic anhydride polymers, water-soluble salts of carboxyalkyl cellulose, water-soluble cellulose ethers, water-soluble salts of carboxyalkyl starch, polyvinyl alcohol, polyvinylpyrrolidone, and various types described in JP-A No. 824. Polyacrylamides, various water-soluble polyamides, water-soluble salts of polyacrylic acid, gelatin, ethylene oxide polymers, water-soluble salts of the group consisting of various starches and the like, styrene / maleic acid copolymers, And maleinate resins, and these two
A combination of two or more species can be used. Particularly preferred is a combination of polyvinyl alcohol and polyvinyl pyridone, and the polyvinyl alcohol preferably has a saponification rate of 80% or more.

The content of the polymer such as polyvinylpyrrolidone is preferably 1% by mass to 75% by mass of the solid content of the intermediate layer,
It is more preferably 1% by mass to 60% by mass, and further preferably 10% by mass to 50% by mass. If it is less than 1% by mass, sufficient adhesion with the photosensitive resin layer cannot be obtained, and if it exceeds 75% by mass, the oxygen blocking ability is lowered. The thickness of the intermediate layer is very thin, about 0.1 to 5 μm, especially 0.2 to μm. When the thickness of the intermediate layer is less than 0.1 μm, the oxygen permeability of the intermediate layer is too high, and when it exceeds 5 μm, it takes too much time during development or removal of the intermediate layer.

The resin constituting the thermoplastic resin layer preferably has a substantial softening point of 80 ° C. or lower. As the alkali-soluble thermoplastic resin having a softening point of 80 ° C. or lower,
Saponification product of ethylene / acrylic acid ester copolymer, saponification product of styrene / (meth) acrylic acid ester copolymer, saponification product of vinyltoluene / (meth) acrylic acid ester copolymer, poly (meth) acrylic acid It is preferable that at least one is selected from esters, butyl (meth) acrylate and saponified products of (meth) acrylic acid ester copolymers such as vinyl acetate, and further, "Plastic Performance Handbook" (Japan Plastics Industry Federation, All Japan Edited by Japan Federation of Plastic Molding Industries, published by Industrial Research Board, 1968, 10
Among the organic polymers having a softening point of about 80 ° C. or less (issued on May 25th), those soluble in an alkaline aqueous solution can be used. Further, even in the case of an organic polymer substance having a softening point of higher than 80 ° C., various plasticizers compatible with the polymer substance are added to the organic polymer substance so that the substantial softening point becomes 80%.
It is also possible to lower the temperature below ℃.

Further, in order to adjust the adhesive force between these organic polymer substances and the temporary support, the substantial softening point is 80.
It is possible to add various polymers, supercooling substances, adhesion improvers or surfactants, release agents, etc. within the range of not exceeding ° C. Specific examples of preferable plasticizers include polypropylene glycol, polyethylene glycol, dioctyl phthalate, diheptyl phthalate, dibutyl phthalate, tricresyl phosphate, cresyl diphenyl phosphate, and biphenyl diphenyl phosphate. Thickness of thermoplastic resin layer is 6μ
m or more is preferable. The reason for this is that if the thickness of the thermoplastic resin layer is less than 6 μm, it is not possible to completely absorb the irregularities of the base of 1 μm or more, and it is easy for bubbles to form between the base and the base during transfer. The upper limit is 100 μm or less, preferably 50 μm in view of developability and production suitability.
m or less.

The photosensitive resin composition layer preferably has a dynamic viscosity (η ′) within a certain range at a temperature (T ° C.) when the photosensitive resin composition layer is transferred to a substrate.
The temperature for transferring the ordinary photosensitive resin composition layer to the substrate is 3
0 ° C <T <200 ° C, preferably 50 ° C <T <1
It is 60 ° C. At such a transfer temperature, the dynamic viscosity (η ′) of the photosensitive resin composition is 4 × 10 <η ′.
<5 × 10 ⁵ (Pa.s) is preferable, and more preferably 5 × 10 <η ′ <1 × 10 ⁵ (Pa.s). When the dynamic viscosity (η ′) is smaller than 4 × 10 (Pa.s), the photosensitive resin composition layer easily flows when transferring the photosensitive resin composition layer to the substrate, and a predetermined viscosity It becomes difficult to form a thick photosensitive resin composition layer. On the other hand, when the dynamic viscosity (η ′) is larger than 5 × 10 ⁵ (Pa.s), when the photosensitive resin composition layer is transferred onto the substrate,
The fluidity of the photosensitive resin composition layer becomes extremely low, and voids are easily generated between the photosensitive resin composition layer and the lower layer.

As the photosensitive resin composition, there are known one which can be developed with an alkaline aqueous solution and one which can be developed with an organic solvent. From the viewpoint of preventing pollution and ensuring work safety, an aqueous alkaline solution is known. It is preferably developable.

(Production of Color Filter) Next, a method for producing a color filter using the image forming material (transfer material for color filter) produced by the above-mentioned method will be described. The photosensitive resin composition layer formed on the temporary support is attached to a glass substrate having a thickness of about 1 mm under pressure and heating. A conventionally known laminator or a vacuum laminator can be used for bonding, and an auto-cut laminator can also be used for higher productivity. After that, the temporary support is peeled off, and then exposed and developed through a predetermined photomask, a thermoplastic resin layer, and an intermediate layer. It is also possible to expose before the temporary support is peeled off, and then peel off the temporary support for development, but in order to obtain high resolution, it is preferable to peel before the exposure.

Development is carried out by a known method by immersing in a solvent or an aqueous developing solution, especially an aqueous alkali solution, applying a developing solution spray from a spray, rubbing with a brush, or irradiating with ultrasonic waves. It is done by that.

The manufacturing method of the color filter of the present invention is as follows.
There is a step of forming color patterns of three primary colors by a transfer method using the above-mentioned color filter transfer material, and a spacer portion in which two color patterns of these color patterns are laminated is formed. In a color filter, usually, 1) a black matrix is formed and then a color pattern is formed, or 2) a color pattern is formed and then a black matrix is formed, but the formation of the black matrix is omitted in the drawing. .

In the present invention, the black matrix is not necessarily limited to the transfer method using the color filter transfer material of the present invention, and can be formed by applying the following method. These methods include, for example, 1) a method of forming a metal thin film by a sputtering method, a vacuum deposition method, etc., and then patterning this thin film to form black matrix, 2) containing light-shielding particles such as carbon black. Method of forming a resin layer and patterning the resin layer to form black matrix 3) Forming a photosensitive resin layer containing light-shielding particles such as carbon black and patterning the photosensitive resin layer Then, there is a method of forming a black matrix. Among these methods, in the method 3), the method of forming the photosensitive resin composition layer on the substrate by the transfer method using the transfer material for a color filter of the present invention is simple and can reduce the thickness of the black matrix. It is particularly preferable in terms of control.

(Production of Spacer Section) A method for producing the spacer section of the color filter will be described below with reference to the drawings. FIG. 1 is a process drawing showing a preferred embodiment of the method for producing a color filter of the present invention. First, the photosensitive resin composition layer (R) 10 laminated on a temporary support (not shown) is laminated on the substrate 12 on the surface on which the black matrix is formed, and the temporary support is made of a photosensitive resin. It is peeled off from the composition layer 10. In this state, pattern exposure is performed through the photomask 14.

Next, as shown in FIG. 1 (b), when the surface side of the photosensitive resin composition layer (R) 10 is developed, a pattern of the first color (R pattern) formed in the exposed region is formed. 16
Is formed. Thereafter, as shown in FIG. 1C, a photosensitive resin composition layer (G) 18 laminated on a temporary support (not shown) is laminated on the first color pattern (R pattern) 16. , The temporary support is the photosensitive resin composition layer (G) 1
Stripped from 8. In this state, pattern exposure is performed through a photomask.

Next, as shown in FIG. 1 (d), when the surface side of the photosensitive resin composition layer (G) 18 is developed, a pattern of the second color (G pattern) formed in the exposed area is developed. 20
Is formed. Thereafter, as shown in FIG. 1E, the photosensitive resin composition layer (B) 22 laminated on the temporary support (not shown) is laminated on the second color pattern (G pattern) 20. , The temporary support is the photosensitive resin composition layer (B) 2
It is peeled off from 2. When pattern exposure is performed through a photomask in this state, a third color pattern (B pattern) 24 is formed on the first color pattern (R) as shown in FIG.

In this way, the R pattern 16, the G pattern 20, and the B pattern 24 are formed, and the spacer portion (indicated by S in the drawing) in which these patterns are partially laminated is the surface of the color filter. Many are formed at predetermined intervals. In the figure, an example of the spacer portion (S) in which the R pattern 16 and the B pattern 24 are partially laminated is shown. There is no particular limitation on the combination of the two colors to be accumulated, but the semiconductor film is likely to absorb light on the short wavelength side of about 550 nm or less, and one of the causes of the bad influence on the TFT characteristics due to the reflected light is on the short wavelength side. Because of the absorption of light, the R pattern and G pattern, or the combination of the R pattern and B pattern, which has a low transmittance of light on the short wavelength side of 550 nm or less, is preferable. The shape of the formed spacer is not particularly limited, and it can pass through various shapes such as a square shape, a cylindrical shape, and an elliptical shape. Further, if necessary, a notch may be partially formed or a hollow donut shape may be formed.

The method for producing a color filter of the present invention comprises:
In a substrate having a TFT electrode as shown in FIG.
By partially laminating the patterns of each color so as to overlap the FT electrode, a color filter which is a light shielding layer of the TFT electrode and has a spacer portion can be formed. 2 and 3, the gate 32, the insulating film 34, the semiconductor layer 36, the source 38, the drain 40, the source electrode 42, the drain electrode 44, and the source electrode 46 are provided on the transparent substrate 30, and the column electrode (source electrode) is provided. The wiring) 48 and the column electrode (source wiring) 50 are connected. As shown in FIG. 2, the transparent substrate 3 surface is exposed and developed by a transfer method so as to be overlapped with the TFT electrode, thereby forming an R pattern,
A G pattern and a B pattern are respectively formed, and a spacer portion in which these patterns are partially laminated is formed so as to cover the TFT electrode. In FIG. 3, 54 is a pixel electrode (transparent electrode), 56 is an alignment film, 58 is a liquid crystal layer, and 60 is a liquid crystal layer.
Is a counter electrode.

In the color filter in which the thin film transistors are arranged as described above, the height of the spacer portion can be easily controlled, and since the spacer portion does not exist in the pixel portion, the area of the display region is not reduced. Moreover, since the spacer portion has a light-shielding property, the contrast ratio does not decrease. Furthermore, in the color filter of the present invention, since the thickness of the colored layer is 2.6 microns or more,
In addition to having good insulation properties, it is possible to reduce the capacitance between the electrode and the TFT element, and when a liquid crystal display element is manufactured with a color filter in which the TFTs of the present invention are arranged, there is no defect Display characteristics can be obtained.

Further, a black matrix is formed of a metal thin film on a transparent substrate and patterned into a matrix by photolithography, and then the colored photosensitive resin layer provided on the temporary support is transferred onto the metal thin film layer, By repeating pattern exposure and development, it is possible to manufacture a color filter which has no light leakage and has a smooth surface in a simple process. Therefore, the breakage of the transparent electrode is unlikely to occur, and it is possible to obtain a color filter free from gap irregularity and short circuit due to contact with a counter substrate even in a narrow gap such as a ferroelectric liquid crystal panel.

Further, if necessary, a protective layer for the purpose of physical and chemical protection and flattening of the color filter surface may be laminated on the color filter. As the protective layer, an acrylic, urethane, or silicone resin coating or a highly transparent coating such as a metal oxide such as silicon oxide is used. The resin coating is formed by spin coating. In addition to the roll coating, the printing method, and the like, it can be formed by transfer like the above-mentioned image forming material. The inorganic coating such as metal oxide can be provided by a sputtering method, a vacuum vapor deposition method or the like.

As described above, since the light shielding layer is formed of a metal thin film and the color filter is formed by transfer from the image forming material, there is no light leakage between the light shielding layer and the color filter, and the light shielding is prevented. It is possible to manufacture a color filter having a small step between the layer and the overlapping portion of the color filter by a simple process.

[0048]

EXAMPLES The present invention will be specifically described below with reference to examples of the present invention, but the present invention is not limited thereto. (Embodiment 1) FIG. 2 is a plan view showing the structure of a liquid crystal panel according to Embodiment 1 of the present invention. 3 is a sectional view taken along the line AA of FIG.

(Substrate) First, the thickness is 1.1 mm and 400 mm
On the transparent glass substrate 1 of × 300 mm, the gate, the insulating film,
A semiconductor layer, a source, a drain, a source electrode, a drain electrode, and a source electrode are provided, and a column electrode (source wiring) 48
A substrate on which thin film transistors are arranged, to which the column electrodes (source wiring) 50 are connected, is used. The substrate was washed and a silane coupling agent (Shin-Etsu Chemical KBM-603) 1
% Aqueous solution for 3 minutes, then washed with water for 30 seconds to wash away excess silane coupling agent, drained and heat-treated in an oven at 110 ° C. for 20 minutes.

(Thermoplastic resin layer) A coating solution having the following formulation H1 was applied onto a polyethylene terephthalate film temporary support having a thickness of 75 μm and dried to give a dry film thickness of 20.
A μm thermoplastic resin layer was provided.

[0051] Thermoplastic resin layer formulation H1: Methyl methacrylate / 2-ethylhexyl acrylate / benzyl methacrylate Rate / methacrylic acid copolymer (copolymerization composition ratio (molar ratio) = 55 / 28.8 / 11.7 / 4.5, weight average molecular weight = 90000)                                                              15 parts by mass Polypropylene glycol diacrylate (average molecular weight = 822)                                                             6.5 parts by mass Tetraethylene glycol dimethacrylate 1.5 parts by mass p-toluenesulfonamide 0.5 parts by mass Benzophenone 1.0 part by mass Methyl ethyl ketone 30 parts by mass

(Intermediate Layer) Next, a coating solution having the following formulation B1 was applied onto the thermoplastic resin layer and dried to form an intermediate layer.

[0053] Intermediate layer formulation B1: Polyvinyl alcohol (PVA205 manufactured by Kuraray Co., saponification rate = 80%)                                                            130 parts by mass Polyvinylpyrrolidone (GAF Corporation PVP, K-90)                                                              60 parts by mass Fluorine-based surfactant (Asahi Glass Co., Ltd. Surflon S-131) 10 parts by mass Distilled water 3350 parts by mass

(Colored Photosensitive Resin Composition Layer) On the temporary support having the above-mentioned thermoplastic resin layer and intermediate layer, Table 1 was prepared.
Of three colors of red (for R layer), green (for G layer), and blue (for B layer) having the above formula, and dried to give a colored photosensitivity of 4.6 μm in dry film thickness. A resin composition layer was formed. In the table, numerical values indicate parts by mass.

[0055]

[Table 1]

(Preparation of Color Filter) Further, polypropylene (thickness: 12 μm) was formed on the photosensitive resin composition layer.
The coating sheet of 1 was pressure-bonded to prepare red, blue, green and black image forming material materials. Using this image forming material, a color filter was prepared by the following method. The coating sheet of the red image-forming material is peeled off, and a pressure is applied (10 kg / cm) to the transparent glass substrate using a laminator (Auto Cut Laminator ASL-24 manufactured by Somar Co., Ltd.), heating is performed, and then temporary bonding is performed. The temporary support was removed by peeling at the interface between the support and the thermoplastic resin layer. Next, after exposing through a predetermined photomask, developing, and removing unnecessary portions,
Ultraviolet rays were irradiated at 500 mj / cm ² from the side opposite to the color filter formation surface using an ultra-high pressure mercury lamp to form a red pixel pattern at a predetermined position on the transparent glass substrate. Subsequently, the green image forming material is adhered and peeled off in the same manner as above on the glass substrate on which the red pixel pattern is formed,
Exposure, development, and post-exposure were performed to form a green pixel pattern. The same process was repeated with a blue image forming material to form a color filter in which red pixel patterns and green pixel patterns were laminated so as to overlap the TFT electrodes on the transparent glass substrate. The conditions of exposure, development, post exposure, and post bake are as shown in Table 2.

[0057]

[Table 2]

Other conditions and supplementary explanation of Table 2 are as follows. 1. Development 1 is development for dissolving and removing the thermoplastic resin layer and the intermediate layer, and triethanolamine 1% is used as a developing solution.
Shower development was performed at 33 ° C. using an aqueous solution. 2. In Development 2, the colored photosensitive resin composition layer was developed, and shower development was performed at 33 ° C. using a 1% aqueous solution of Color Mosaic Developer CD-1000 (manufactured by Fuji Hunt Electronics Technology Co., Ltd.) as a developer. The color filter formed under the above conditions had no pixel omission (white omission), and the side etch of each pixel was small, and had sufficient performance as a color filter. Further, heat treatment was performed at 250 ° C. for 1 hour. The spacer portion produced by laminating two colored layers of R and B of the color filter thus produced is a square of 20 × 30 μm and has a height of 3.7.
was μm.

(Example 2) In Example 1, instead of the transparent glass substrate, a gate, an insulating film, a semiconductor layer, a source, a drain, a source electrode, a drain electrode, and
A thin film transistor in which a source electrode is provided and connected to the column electrode (source wiring) 48 and the column electrode (source wiring) 50 and an interlayer insulating film (planarization layer) is formed on these surfaces is arranged. A color filter was produced in the same manner as in Example 1 except that the substrate was used. The spacer portion manufactured by laminating two colored layers of R and B of the color filter thus manufactured has a size of 20 × 30.
It was a square of μm and the height was 3.7 μm.

The liquid crystal panel using the color filter obtained in the present invention showed good switching characteristics in both Example 1 and Example 2.

[0061]

According to the color filter of the present invention, the photosensitive resin composition layer of each color having a sufficient film thickness is formed on the TFT.
When the color patterns are formed by patterning by forming the elements on a substrate on which the elements are arranged, a photosensitive resin composition layer of the second color is laminated on a part of the pattern previously formed and colored. Since the spacer portion is formed with the thickness of one layer, the height of the spacer portion can be controlled according to the required thickness of the liquid crystal layer, so that a uniform liquid crystal layer can be formed. By forming the TFT element so as to overlap with the arrayed substrate, the colored layer functions as a light-shielding layer, and a liquid crystal panel having good switching characteristics can be efficiently and inexpensively obtained.

[Brief description of drawings]

FIG. 1 is a process drawing showing a preferred embodiment of a method for producing a color filter of the present invention.

FIG. 2 is a plan view showing an embodiment of a color filter of the present invention.

3 is a sectional view taken along the line AA of FIG.

[Explanation of symbols]

10 Photosensitive resin composition layer (R) 12 substrates 14 Photomask 16 R pattern 18 Photosensitive resin composition layer (G) 20 G pattern 22 Photosensitive resin composition layer (B) 24 B pattern S spacer part

   ─────────────────────────────────────────────────── ─── Continued front page    F-term (reference) 2H025 AB11 AB13                 2H048 BA02 BA45 BB02 BB03 BB08                       BB14 BB28 BB37 BB43                 2H089 LA10 LA11 LA12 NA12 QA14                       TA09                 2H091 FA02Y FD04 GA02 GA08                       GA13 LA13

Claims (4)

[Claims] 1. A color filter comprising a colored portion of a plurality of colors having different spectral characteristics, having a spacer portion formed by partially overlapping two colors having different spectral characteristics, and a part of the spacer portion, Alternatively, the color filter is formed so as to entirely overlap the TFT electrode when viewed from the front of the display. 2. The color filter according to claim 1, wherein the spacer portion in which the two colors having different spectral characteristics are partially overlapped has a light transmittance of 10% or less at a wavelength of 550 nm or less. 3. A process of forming a colored pattern on the substrate by forming a photosensitive colored resin composition layer formed on a temporary support on a substrate by transfer, exposing it with a predetermined pattern, and then developing it. The color filter according to claim 1 or 2, which is manufactured by a manufacturing method including. 4. The color filter according to any one of claims 1 to 3, wherein the color filter composed of colored portions of a plurality of colors having different spectral characteristics is formed on a substrate on which TFT electrodes are arranged.