JP2000299470A5 - - Google Patents
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- JP2000299470A5 JP2000299470A5 JP2000033838A JP2000033838A JP2000299470A5 JP 2000299470 A5 JP2000299470 A5 JP 2000299470A5 JP 2000033838 A JP2000033838 A JP 2000033838A JP 2000033838 A JP2000033838 A JP 2000033838A JP 2000299470 A5 JP2000299470 A5 JP 2000299470A5
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000033838A JP4731655B2 (en) | 1999-02-12 | 2000-02-10 | Method for manufacturing semiconductor device |
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3451399 | 1999-02-12 | ||
| JP1999034513 | 1999-02-12 | ||
| JP11-34513 | 1999-02-12 | ||
| JP2000033838A JP4731655B2 (en) | 1999-02-12 | 2000-02-10 | Method for manufacturing semiconductor device |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000299470A JP2000299470A (en) | 2000-10-24 |
| JP2000299470A5 true JP2000299470A5 (en) | 2007-03-08 |
| JP4731655B2 JP4731655B2 (en) | 2011-07-27 |
Family
ID=26373333
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000033838A Expired - Fee Related JP4731655B2 (en) | 1999-02-12 | 2000-02-10 | Method for manufacturing semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4731655B2 (en) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003050405A (en) * | 2000-11-15 | 2003-02-21 | Matsushita Electric Ind Co Ltd | Thin film transistor array, its manufacturing method and display panel using the same array |
| EP1421607A2 (en) | 2001-02-12 | 2004-05-26 | ASM America, Inc. | Improved process for deposition of semiconductor films |
| JP4439794B2 (en) * | 2001-09-10 | 2010-03-24 | 株式会社半導体エネルギー研究所 | Method for manufacturing semiconductor device |
| JP3949564B2 (en) | 2001-11-30 | 2007-07-25 | 株式会社半導体エネルギー研究所 | Laser irradiation apparatus and method for manufacturing semiconductor device |
| TWI276179B (en) * | 2002-04-15 | 2007-03-11 | Adv Lcd Tech Dev Ct Co Ltd | Semiconductor device having semiconductor films of different crystallinity, substrate unit, and liquid crystal display, and their manufacturing method |
| US7186630B2 (en) | 2002-08-14 | 2007-03-06 | Asm America, Inc. | Deposition of amorphous silicon-containing films |
| US7220627B2 (en) | 2003-04-21 | 2007-05-22 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing a semiconductor device where the scanning direction changes between regions during crystallization and process |
| JP4940532B2 (en) * | 2003-09-25 | 2012-05-30 | カシオ計算機株式会社 | Manufacturing method of CMOS transistor |
| JP4573091B2 (en) * | 2003-10-31 | 2010-11-04 | ソニー株式会社 | THIN FILM TRANSISTOR AND ITS MANUFACTURING METHOD, DISPLAY DEVICE AND ITS MANUFACTURING METHOD |
| US8334536B2 (en) | 2007-03-16 | 2012-12-18 | Samsung Display Co., Ltd. | Thin film transistor, organic light emitting diode display device having the same, flat panel display device, and semiconductor device, and methods of fabricating the same |
| JP2011066243A (en) | 2009-09-17 | 2011-03-31 | Panasonic Corp | Method of forming crystalline silicon film, thin-film transistor using the same, and display device |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02208635A (en) * | 1989-02-08 | 1990-08-20 | Seiko Epson Corp | Semiconductor device |
| JP2925629B2 (en) * | 1990-02-26 | 1999-07-28 | 富士写真フイルム株式会社 | Image reading device |
| JPH0521340A (en) * | 1991-07-10 | 1993-01-29 | Ricoh Co Ltd | Thin film semiconductor device, method and apparatus for manufacturing the same |
| JPH0697196A (en) * | 1992-09-10 | 1994-04-08 | Nippon Sheet Glass Co Ltd | Semiconductor device and manufacture thereof |
| JPH0738110A (en) * | 1993-07-21 | 1995-02-07 | Toshiba Corp | Manufacture of semiconductor device |
| JP2734359B2 (en) * | 1993-12-27 | 1998-03-30 | 日本電気株式会社 | Thin film transistor and method of manufacturing the same |
| JPH08139335A (en) * | 1994-11-14 | 1996-05-31 | Casio Comput Co Ltd | Method of manufacturing thin film transistor |
| JPH09321313A (en) * | 1996-05-24 | 1997-12-12 | Semiconductor Energy Lab Co Ltd | Manufacture of semiconductor device |
| JP2697730B2 (en) * | 1996-09-10 | 1998-01-14 | セイコーエプソン株式会社 | Active matrix substrate manufacturing method |
| JPH10213775A (en) * | 1997-01-29 | 1998-08-11 | Dainippon Screen Mfg Co Ltd | Light beam scanner |
| JPH10189998A (en) * | 1996-12-20 | 1998-07-21 | Sony Corp | Thin-film semiconductor device for display and its manufacture |
| JP3753827B2 (en) * | 1997-01-20 | 2006-03-08 | 株式会社半導体エネルギー研究所 | Method for manufacturing semiconductor device |
| JP3032801B2 (en) * | 1997-03-03 | 2000-04-17 | 株式会社半導体エネルギー研究所 | Method for manufacturing semiconductor device |
| JP4090533B2 (en) * | 1997-04-25 | 2008-05-28 | 株式会社半導体エネルギー研究所 | Method for manufacturing semiconductor device |
| JP3844561B2 (en) * | 1997-06-10 | 2006-11-15 | 株式会社半導体エネルギー研究所 | Method for manufacturing semiconductor device |
| JPH114001A (en) * | 1997-06-11 | 1999-01-06 | Semiconductor Energy Lab Co Ltd | Semiconductor device and manufacture thereof |
| JP4027465B2 (en) * | 1997-07-01 | 2007-12-26 | 株式会社半導体エネルギー研究所 | Active matrix display device and manufacturing method thereof |
| JP3386713B2 (en) * | 1998-03-09 | 2003-03-17 | 株式会社半導体エネルギー研究所 | Method for manufacturing active matrix display device |
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2000
- 2000-02-10 JP JP2000033838A patent/JP4731655B2/en not_active Expired - Fee Related