JP2000283733A - Method for measuring capability of deforming reference plate of reference plate holding frame for vertical interferometer, and method of selecting reference plate for vertical interferometer using this - Google Patents

Method for measuring capability of deforming reference plate of reference plate holding frame for vertical interferometer, and method of selecting reference plate for vertical interferometer using this

Info

Publication number
JP2000283733A
JP2000283733A JP11086345A JP8634599A JP2000283733A JP 2000283733 A JP2000283733 A JP 2000283733A JP 11086345 A JP11086345 A JP 11086345A JP 8634599 A JP8634599 A JP 8634599A JP 2000283733 A JP2000283733 A JP 2000283733A
Authority
JP
Japan
Prior art keywords
reference plate
sample
deformability
support frame
interferometer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11086345A
Other languages
Japanese (ja)
Inventor
Nobuaki Ueki
伸明 植木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujinon Corp
Original Assignee
Fuji Photo Optical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Optical Co Ltd filed Critical Fuji Photo Optical Co Ltd
Priority to JP11086345A priority Critical patent/JP2000283733A/en
Publication of JP2000283733A publication Critical patent/JP2000283733A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide method of measuring the capability of deforming a reference plate of a reference plate holding frame for a vertical interferometer, which can provide useful data for enhancing the measurement accuracy of an interference fringe of the vertical interferometer, by calculating the capability of deforming the reference plate of the reference plate holding frame according to a predetermined procedure using an interferometer device for inspecting the reference plate. SOLUTION: A reference plate 2, which is held by a reference plate holding frame 14, is horizontally placed as a sample reference plate, and a standard reference plate 16 is horizontally placed and opposed to the plate 2, where a first interference fringe measurement is done. Then, the sample plate 2, the standard plate 16 and the frame 14 are relatively rotated by a predetermined angle, where a second measurement is done. The capability of deforming the reference plate 2 of the frame 14 is calculated, by averaging the first and second interference fringe measurement data, removing the rotation asymmetric component of the sample reference plate 2, and removing the rotation symmetric component from the averaged data.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、基準板が水平に配
置される縦型干渉計に関するものであり、特に、その基
準板を支持する基準板支持枠の基準板変形能を測定する
方法およびこれを用いた縦型干渉計用基準板の選出方法
に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vertical interferometer in which a reference plate is arranged horizontally, and more particularly to a method for measuring a reference plate deformability of a reference plate supporting frame for supporting the reference plate. The present invention relates to a method of selecting a reference plate for a vertical interferometer using the same.

【0002】[0002]

【従来の技術】従来より、光学部材等の被検体の表面形
状を測定する手段として干渉計が知られている。この干
渉計は、光源からの可干渉光を2分割し、一方の光線束
を被検体の被検面に入射させてその反射光を物体光とす
るとともに他方の光線束を基準板の基準面に入射させて
その反射光を参照光とし、これら物体光および参照光の
光干渉により生じる干渉縞を測定するようになっている
が、その測定精度を高めるためには基準面の平面度を十
分に確保することが重要である。
2. Description of the Related Art Conventionally, an interferometer has been known as a means for measuring the surface shape of an object such as an optical member. This interferometer divides coherent light from a light source into two, makes one light beam incident on a surface to be inspected of a subject, makes the reflected light into object light, and uses the other light beam as a reference surface of a reference plate. And the reflected light is used as reference light, and interference fringes caused by the optical interference of these object light and reference light are measured. To improve the measurement accuracy, the flatness of the reference surface must be sufficient. It is important to secure

【0003】さらに、基準板が水平に配置される縦型干
渉計においては、たとえ基準板自体ではその基準面の平
面度が十分に確保されていたとしても、基準板が基準板
支持枠に対して全周均等に支持されていないと、基準板
支持枠との当接により変形してしまうこととなり、干渉
縞の測定精度を十分に高めることができないという問題
がある。
Further, in a vertical interferometer in which a reference plate is disposed horizontally, even if the reference plate itself has a sufficient flatness of its reference surface, the reference plate is positioned with respect to the reference plate support frame. If the support is not provided evenly over the entire circumference, it is deformed by contact with the reference plate support frame, and there is a problem that the measurement accuracy of interference fringes cannot be sufficiently increased.

【0004】そこで本出願人は、これを解消するための
手法として、特願平11-55113号明細書を開示している。
The present applicant has disclosed Japanese Patent Application No. 11-55113 as a method for solving this problem.

【0005】[0005]

【発明が解決しようとする課題】しかし、前述した先行
技術および上記明細書に記載された技術のいずれにおい
ても、その基本的な考え方は、基準板支持枠に対して基
準面を変形することなく固定するよう考慮したものであ
ったために、もともと基準板の平面度が十分に確保され
ていないものに関しては、干渉縞の測定精度を十分に高
めることができなかった。
However, in both the prior art described above and the technology described in the above specification, the basic idea is that the reference plane is not deformed with respect to the reference plate supporting frame. Because of the consideration of fixing, the measurement accuracy of the interference fringes could not be sufficiently improved for the reference plate whose flatness was not sufficiently ensured from the beginning.

【0006】本発明は、このような事情に鑑みてなされ
たものであって、基準板支持枠に対して基準板を固定す
る手法に特段の配慮を払わなくても、縦型干渉計におい
てその干渉縞の測定精度を高めるために有用なデータを
得ることができる縦型干渉計用基準板支持枠の基準板変
形能測定方法およびこれを用いた縦型干渉計用基準板の
選出方法を提供することを目的とするものである。
SUMMARY OF THE INVENTION The present invention has been made in view of such circumstances, and a vertical interferometer can be used in a vertical interferometer without paying special attention to a method of fixing a reference plate to a reference plate support frame. Provided is a method for measuring a reference plate deformability of a reference frame supporting frame for a vertical interferometer and a method for selecting a reference plate for a vertical interferometer using the same, which can obtain useful data for improving the measurement accuracy of interference fringes. It is intended to do so.

【0007】[0007]

【課題を解決するための手段】本発明の縦型干渉計用基
準板支持枠の基準板変形能測定方法は、基準板が水平に
配置される縦型干渉計において前記基準板を支持する基
準板支持枠の基準板変形能を測定する方法であって、前
記基準板を前記基準板支持枠に支持された状態でサンプ
ル基準板として水平に配置するとともに該サンプル基準
板と対向するようにして原器基準板を水平に配置した状
態で第1の干渉縞測定を行い、次に、前記サンプル基準
板および前記原器基準板に対し前記基準板支持枠を所定
角度だけ相対回転させた状態で第2の干渉縞測定を行
い、これら第1および第2の干渉縞測定データを平均化
し、この平均化されたデータに基づき、前記基準板支持
枠の基準板変形能を算出することを特徴とするものであ
る。
According to the present invention, there is provided a method for measuring the deformability of a reference plate of a reference plate supporting frame for a vertical interferometer, comprising the steps of: A method for measuring a reference plate deformability of a plate support frame, wherein the reference plate is horizontally arranged as a sample reference plate while being supported by the reference plate support frame, and is opposed to the sample reference plate. The first interference fringe measurement is performed in a state where the original reference plate is horizontally arranged, and then, in a state where the reference plate support frame is relatively rotated by a predetermined angle with respect to the sample reference plate and the original reference plate. Performing a second interference fringe measurement, averaging the first and second interference fringe measurement data, and calculating a reference plate deformability of the reference plate support frame based on the averaged data. Is what you do.

【0008】ここに「基準板変形能」とは、基準板支持
枠が基準板を支持している状態において該基準板支持枠
が基準板に対して全周均等でない状態で当接することに
より基準板を変形させる能力をいうものとする。
[0008] Here, the "reference plate deformability" means that the reference plate support frame abuts on the reference plate in a state where the reference plate support frame is not uniform all around the reference plate while the reference plate support frame supports the reference plate. It refers to the ability to deform a board.

【0009】上記方法を、より具体的に述べれば、例え
ば、基準板が水平に配置される縦型干渉計において前記
基準板を支持する基準板支持枠の基準板変形能を測定す
る方法であって、前記基準板を前記基準板支持枠に支持
された状態でサンプル基準板として水平に配置するとと
もに該サンプル基準板と対向するようにして原器基準板
を水平に配置した状態で第1の干渉縞測定を行い、次
に、前記サンプル基準板および前記原器基準板に対し前
記基準板支持枠を所定角度相対回転させた状態で第2の
干渉縞測定を行い、これら第1および第2の干渉縞測定
データを平均化して前記サンプル基準板の回転非対称成
分を除去し、この平均化されたデータから回転対称成分
を除去することにより前記基準板支持枠の基準板変形能
を算出するという方法である。
More specifically, the above method is, for example, a method for measuring the deformability of a reference plate supporting frame supporting a reference plate in a vertical interferometer in which the reference plate is horizontally arranged. The first reference plate is horizontally arranged as a sample reference plate while the reference plate is supported by the reference plate support frame, and the original reference plate is horizontally arranged so as to face the sample reference plate. An interference fringe measurement is performed, and then a second interference fringe measurement is performed with the reference plate supporting frame relatively rotated by a predetermined angle with respect to the sample reference plate and the prototype reference plate. Averaging the interference fringe measurement data to remove the rotationally asymmetric component of the sample reference plate, and removing the rotationally symmetric component from the averaged data to calculate the reference plate deformability of the reference plate support frame. One It is.

【0010】また、本発明の縦型干渉計用基準板の選出
方法は、上記記載の基準板変形能測定方法を用いて複数
の基準板支持枠の基準板変形能を測定するとともに複数
の基準板の基準面の形状を測定しておき、これら基準板
および基準板支持枠のうちから両者を組み合わせたとき
に該基準板の基準面形状が最も平面に近くなる基準板と
基準板支持枠との組合せを選出することを特徴とするも
のである。
Further, the method of selecting a reference plate for a vertical interferometer according to the present invention comprises measuring the reference plate deformability of a plurality of reference plate supporting frames using the above-described reference plate deformability measuring method, and selecting a plurality of reference plates. The shape of the reference surface of the plate is measured in advance, and when the reference plate and the reference plate support frame are combined from the reference plate and the reference plate support frame, the reference plate shape and the reference plate support frame become the closest to the flat surface. Is selected.

【0011】[0011]

【発明の実施の形態】以下、図面を用いて、本発明の実
施の形態について説明する。
Embodiments of the present invention will be described below with reference to the drawings.

【0012】図1は、本発明の一実施形態に係る縦型干
渉計用基準板支持枠の基準板変形能測定方法が適用され
る基準板検査用干渉計装置10を示す全体構成図であ
る。
FIG. 1 is an overall configuration diagram showing a reference plate inspection interferometer device 10 to which a method of measuring a reference plate deformability of a reference plate support frame for a vertical interferometer according to an embodiment of the present invention is applied. .

【0013】図示されるように、この基準板検査用干渉
計装置10は、フィゾー型の縦型干渉計12と、被検体
となるサンプル基準板2を水平に支持する基準板支持枠
14と、サンプル基準板2の下方において該サンプル基
準板2と対向するように水平に配置された原器基準板1
6と、コンピュータ18と、モニタ20とを備えてなっ
ている。
As shown in the figure, the reference plate inspection interferometer device 10 includes a Fizeau type vertical interferometer 12, a reference plate support frame 14 for horizontally supporting a sample reference plate 2 as an object, and A prototype reference plate 1 horizontally arranged below the sample reference plate 2 so as to face the sample reference plate 2
6, a computer 18, and a monitor 20.

【0014】縦型干渉計12は、その干渉計本体22に
より図示しない光源からの可干渉光を被検面となるサン
プル基準板2のサンプル基準面2aに入射させ、該サン
プル基準面2aにおいて透過光線束と反射光線束とに2
分割し、該サンプル基準面2aにおける反射光を物体光
とするとともに透過光線束を原器基準板16の原器基準
面16aに入射させてその反射光を参照光とし、これら
物体光および参照光の光干渉により生じる干渉縞を図示
しないCCDカメラに取り込むように構成されている。
The vertical interferometer 12 causes the coherent light from a light source (not shown) to be incident on the sample reference surface 2a of the sample reference plate 2 serving as a test surface by the interferometer main body 22, and transmitted through the sample reference surface 2a. 2 for ray bundle and reflected ray bundle
The light is divided, the reflected light on the sample reference surface 2a is used as object light, and the transmitted light beam is made incident on the original reference surface 16a of the original reference plate 16, and the reflected light is used as reference light. The interference fringes generated by the light interference are captured by a CCD camera (not shown).

【0015】また、この縦型干渉計12は、フリンジス
キャン解析機能を備えている。すなわち、サンプル基準
板2を基準板支持枠14と共に光軸Ax方向に移動させ
(あるいは原器基準板16を光軸Ax方向に移動さ
せ)、この移動により変化する干渉縞の画像データを干
渉計本体22からコンピュータ18に出力するようにな
っている。そして、コンピュータ18は、入力された干
渉縞の画像データに基づいてフリンジスキャニング法に
より干渉縞の自動解析を行い、サンプル基準面2aの形
状測定(凹凸判定および立体形状測定)を行うととも
に、干渉縞あるいは立体形状の画像データをモニタ20
に表示するようになっている。上記フリンジスキャニン
グ法は、サンプル基準面2aと原器基準面16aとの相
対距離を変化させながら所定のフリンジスキャンステッ
プ毎に取り込んだ干渉縞画像データからサンプル基準面
2aの各点における干渉縞強度を測定し、その測定結果
を用いて各点の位相計算等の干渉縞解析を行う手法であ
る。
The vertical interferometer 12 has a fringe scan analysis function. That is, the sample reference plate 2 is moved together with the reference plate support frame 14 in the direction of the optical axis Ax (or the reference plate 16 is moved in the direction of the optical axis Ax), and the image data of the interference fringe that changes due to this movement is interferometrically measured. The main body 22 outputs the data to the computer 18. Then, the computer 18 automatically analyzes the interference fringes based on the input interference fringe image data by the fringe scanning method to measure the shape of the sample reference surface 2a (determination of unevenness and measurement of the three-dimensional shape), Alternatively, three-dimensional image data is displayed on the monitor 20.
To be displayed. In the fringe scanning method, the interference fringe intensity at each point of the sample reference plane 2a is determined from the interference fringe image data captured at each predetermined fringe scan step while changing the relative distance between the sample reference plane 2a and the prototype reference plane 16a. This is a method of measuring and performing interference fringe analysis such as phase calculation of each point using the measurement result.

【0016】本実施形態においては、上記基準板検査用
干渉計装置10を用いて以下の手順で基準板支持枠14
の基準板変形能を測定するようになっている。
In the present embodiment, the reference plate support frame 14 is formed using the reference plate inspection interferometer device 10 in the following procedure.
The reference plate deformability is measured.

【0017】すなわち、まず、図1のA−A 線矢視図
である図2(a)に示すように、予め、基準板支持枠1
4に縦型干渉計12の光軸Axを中心として10°間隔
で目盛り14aを形成しておき、サンプル基準板2およ
び原器基準板16の外周面に目印2bおよび16bを形
成しておく。そして、サンプル基準板2の目印2bおよ
び原器基準板16の目印16bを基準板支持枠14の目
盛り14aに対して同一角度位置に合わせる。
That is, first, as shown in FIG. 2A, which is a view taken along the line AA in FIG.
4, scales 14 a are formed at intervals of 10 ° about the optical axis Ax of the vertical interferometer 12, and marks 2 b and 16 b are formed on the outer peripheral surfaces of the sample reference plate 2 and the prototype reference plate 16. Then, the mark 2b of the sample reference plate 2 and the mark 16b of the prototype reference plate 16 are aligned at the same angular position with respect to the scale 14a of the reference plate support frame 14.

【0018】そして、この状態で、サンプル基準板2の
サンプル基準面2aと原器基準板16の原器基準面16
aとの間に形成される干渉縞を測定する。
In this state, the sample reference surface 2a of the sample reference plate 2 and the prototype reference surface 16a of the prototype reference plate 16 are set.
Then, the interference fringes formed between the sample and a are measured.

【0019】次に、図2(b)に示すように、サンプル
基準板2および原器基準板16を10°回転させる。こ
のとき基準板支持枠14は回転させない。そして、この
状態で、再度サンプル基準面2aと原器基準面16aと
の間に形成される干渉縞を測定する。
Next, as shown in FIG. 2B, the sample reference plate 2 and the prototype reference plate 16 are rotated by 10 °. At this time, the reference plate support frame 14 is not rotated. Then, in this state, the interference fringe formed between the sample reference plane 2a and the prototype reference plane 16a is measured again.

【0020】以下同様にして、サンプル基準板2および
原器基準板16を10°回転させる毎にサンプル基準面
2aと原器基準面16aとの間に形成される干渉縞を測
定し、全周36箇所において干渉縞測定を行う。
Similarly, every time the sample reference plate 2 and the prototype reference plate 16 are rotated by 10 °, interference fringes formed between the sample reference surface 2a and the prototype reference surface 16a are measured. Interference fringe measurement is performed at 36 locations.

【0021】次に、このようにして測定された各角度位
置における干渉縞データ(干渉縞画像の各点の光強度デ
ータ)を平均化し、サンプル基準面2aと原器基準面1
6aとの相対形状による光軸Ax回りの回転非対称成分
を除去する。
Next, the interference fringe data (light intensity data at each point of the interference fringe image) at each angular position thus measured is averaged, and the sample reference plane 2a and the prototype reference plane 1 are averaged.
A rotationally asymmetric component around the optical axis Ax due to the relative shape to 6a is removed.

【0022】そして、この回転非対称成分が除去された
干渉縞データから公知の方法で光軸Ax回りの回転対称
成分を除去する。
Then, a rotationally symmetric component around the optical axis Ax is removed from the interference fringe data from which the rotationally asymmetric component has been removed by a known method.

【0023】このような演算は、具体的には例えば、干
渉縞データをツェルニケ多項式(べき級数多項式)等で
フィッティングして回転対称項と回転非対称項とからな
る関数式に展開し、この関数式から、上記平均化によ
り、サンプル基準面2aと原器基準面16aとの相対形
状による光軸Ax回りの回転非対称成分を除去し、次に
公知の方法で光軸Ax回りの回転対称成分を除去するこ
とにより、基準板支持枠14の基準板変形能を表す回転
非対称成分のみを算出する。
Specifically, such an operation is performed by, for example, fitting the interference fringe data with a Zernike polynomial (power series polynomial) or the like and developing it into a functional expression consisting of a rotationally symmetrical term and a rotationally asymmetrical term. From the above, the rotationally asymmetric component around the optical axis Ax due to the relative shape between the sample reference plane 2a and the prototype reference plane 16a is removed, and then the rotationally symmetric component around the optical axis Ax is removed by a known method. By doing so, only the rotationally asymmetric component representing the reference plate deformability of the reference plate support frame 14 is calculated.

【0024】このように本実施形態においては、縦型干
渉計においてその干渉縞の測定精度を高めるために有用
な基準板変形能に係るデータを得ることができる。
As described above, in the present embodiment, data relating to the deformability of the reference plate useful for improving the measurement accuracy of the interference fringes in the vertical interferometer can be obtained.

【0025】この基準板変形能は、具体的には、例えば
次のようにして活用することができる。
Specifically, the reference plate deformability can be utilized, for example, as follows.

【0026】すなわち、まず、上記基準板変形能測定方
法を用いて複数の基準板支持枠14についてその基準板
変形能を測定する。次に、図3に示すように、基準板変
形能が明らかになった複数の基準板支持枠14(1)、
14(2)、・・・、14(n)と、基準板変形能測定
の際に基準面形状が測定された複数のサンプル基準板2
(1)、2(2)、・・・、2(n)とを順次組み合わ
せ、各組合せにおけるサンプル基準板2の基準面形状を
算出する。こうして得られた算出データのうち、サンプ
ル基準板2と基準板支持枠14とを組み合わせたとき
に、図4に示すように基準面2aの形状が最も平面に近
くなる最適な組合せを選出する。そして、このようにし
て選出された1組の基準板2および基準板支持枠14を
実際の干渉縞測定を行う縦型干渉計に組み込むようにす
れば、干渉縞の測定精度を高めることができる。
That is, first, the reference plate deformability of a plurality of reference plate support frames 14 is measured using the above-described reference plate deformability measuring method. Next, as shown in FIG. 3, a plurality of reference plate support frames 14 (1) whose reference plate deformability has been clarified,
14 (2),..., 14 (n), a plurality of sample reference plates 2 whose reference surface shapes were measured during the measurement of the reference plate deformability.
(1), 2 (2),..., 2 (n) are sequentially combined, and the reference surface shape of the sample reference plate 2 in each combination is calculated. From the calculation data thus obtained, when the sample reference plate 2 and the reference plate support frame 14 are combined, an optimum combination in which the shape of the reference surface 2a is closest to a plane as shown in FIG. 4 is selected. If the set of the reference plate 2 and the reference plate support frame 14 thus selected is incorporated in a vertical interferometer that actually performs interference fringe measurement, the accuracy of interference fringe measurement can be improved. .

【0027】なお、本実施形態においては、基準板変形
能測定の際に同時に基準面形状が測定された複数のサン
プル基準板2(1)、2(2)、・・・、2(n)を複
数の基準板支持枠14(1)、14(2)、・・・、1
4(n)と順次組み合わせるようにしたが、このように
する代わりに、他の方法で基準面形状が測定された複数
のサンプル基準板を用いるようにしてもよい。
In this embodiment, a plurality of sample reference plates 2 (1), 2 (2),..., 2 (n) whose reference surface shapes are simultaneously measured when measuring the reference plate deformability. To a plurality of reference plate support frames 14 (1), 14 (2),.
4 (n) is sequentially combined, but instead of this, a plurality of sample reference plates whose reference surface shapes are measured by another method may be used.

【0028】また、本実施形態においては、基準板支持
枠14は回転させずにサンプル基準板2および原器基準
板16を10°ずつ回転させるようにしたが、このよう
にする代わりに、サンプル基準板2および原器基準板1
6は回転させずに基準板支持枠14を10°ずつ回転さ
せるようにしてもよい。この場合には、上記とは逆にサ
ンプル基準面2aと原器基準面16aとの相対形状によ
る光軸Ax回りの回転非対称成分と光軸Ax回りの回転
対称成分の和が求められることとなるが、この求められ
た結果を、上述のようにして得られた少なくとも1つの
干渉縞データから差し引けば、基準板支持枠14の基準
板変形能を表す回転非対称成分のみを算出することがで
きる。
In this embodiment, the sample reference plate 2 and the prototype reference plate 16 are rotated by 10 ° without rotating the reference plate support frame 14, but instead of this, the sample Reference plate 2 and prototype reference plate 1
The reference plate supporting frame 14 may be rotated by 10 ° without rotating the reference plate supporting frame 6. In this case, the sum of the rotationally asymmetric component around the optical axis Ax and the rotationally symmetric component around the optical axis Ax due to the relative shape between the sample reference plane 2a and the prototype reference plane 16a is determined. However, if the obtained result is subtracted from at least one interference fringe data obtained as described above, only a rotationally asymmetric component representing the reference plate deformability of the reference plate support frame 14 can be calculated. .

【0029】さらに、本実施形態においては、サンプル
基準板2および原器基準板16を10°ずつ回転させ、
全周36箇所において干渉縞測定を行うようにしたが、
この手法に限られるものではなく、例えば、本発明者が
既に開示している特開平10-325710号公報などに示され
た手法の如く、0°および90°の2箇所において干渉
縞測定を行うことによっても基準板支持枠14の基準板
変形能を算出することもできる。
Further, in the present embodiment, the sample reference plate 2 and the prototype reference plate 16 are rotated by 10 ° each,
Although interference fringe measurement was performed at all 36 locations,
The method is not limited to this method. For example, the interference fringe measurement is performed at two positions of 0 ° and 90 ° as in the method disclosed in Japanese Patent Laid-Open No. 10-325710, which has already been disclosed by the present inventors. In this way, the reference plate deformability of the reference plate support frame 14 can also be calculated.

【0030】ところで、サンプル基準板2および基準板
支持枠14を縦型干渉計に組み込む際、サンプル基準板
2が基準板支持枠14に直接支持されない宙吊り状態で
(すなわち例えばサンプル基準板2が接着剤等を介して
基準板支持枠14に支持された状態で)両者を縦型干渉
計に組み込む場合もある。
When the sample reference plate 2 and the reference plate support frame 14 are incorporated in the vertical interferometer, the sample reference plate 2 is suspended in a suspended state where the sample reference plate 2 is not directly supported by the reference plate support frame 14 (that is, the sample reference plate 2 Both may be incorporated into a vertical interferometer (while supported by the reference plate support frame 14 via an agent or the like).

【0031】このような場合において、上述したような
最適な組合せとして選出された1組のサンプル基準板2
および基準板支持枠14を縦型干渉計に組み込むと、サ
ンプル基準板2は基準板支持枠14の基準板変形能の影
響を受けないので、該サンプル基準板2は基準板変形能
を打ち消すような変形形状を帯有したままとなる。した
がって、この縦型干渉計を用いて干渉縞測定を行うと、
サンプル基準板2の変形分だけ干渉縞測定データの精度
が低下してしまうこととなる。
In such a case, one set of sample reference plates 2 selected as the optimum combination as described above
When the reference plate support frame 14 is incorporated in the vertical interferometer, the sample reference plate 2 is not affected by the reference plate deformability of the reference plate support frame 14, so that the sample reference plate 2 cancels the reference plate deformability. It remains with a band having a deformed shape. Therefore, when performing interference fringe measurement using this vertical interferometer,
The accuracy of the interference fringe measurement data is reduced by the deformation of the sample reference plate 2.

【0032】そこで、このような場合には、干渉縞測定
データから基準板支持枠14の基準板変形能によるサン
プル基準板2の変形分を差し引いて干渉縞測定データの
補正を行うようにすれば、干渉縞測定データの精度が低
下してしまうのを未然に防止することができる。
In such a case, the interference fringe measurement data is corrected by subtracting the deformation of the sample reference plate 2 due to the reference plate deformability of the reference plate support frame 14 from the interference fringe measurement data. In addition, it is possible to prevent the accuracy of the interference fringe measurement data from being lowered.

【0033】本実施形態においては、縦型干渉計12が
フィゾー型の縦型干渉計である場合について説明した
が、マイケルソン型やマッハツェンダ型の縦型干渉計で
ある場合においても、本実施形態と同様の構成を採用す
ることにより本実施形態と同様の作用効果を得ることが
できる。
In the present embodiment, the case where the vertical interferometer 12 is a Fizeau-type vertical interferometer has been described. However, even when the vertical interferometer 12 is a Michelson-type or Mach-Zehnder-type vertical interferometer, the present embodiment is also applicable. By adopting the same configuration as described above, the same operation and effect as in the present embodiment can be obtained.

【0034】[0034]

【発明の効果】本発明に係る縦型干渉計用基準板支持枠
の基準板変形能測定方法によれば、基準板を基準板支持
枠に支持された状態でサンプル基準板として水平に配置
するとともに該サンプル基準板と対向するようにして原
器基準板を水平に配置した状態で第1の干渉縞測定を行
い、次に、サンプル基準板および原器基準板に対し基準
板支持枠を所定角度相対回転させた状態で第2の干渉縞
測定を行い、これら第1および第2の干渉縞測定データ
を平均化し、この平均化されたデータに基づき基準板支
持枠の基準板変形能を算出するように構成されているの
で、縦型干渉計においてその干渉縞の測定精度を高める
ために有用なデータを得ることができる。
According to the method for measuring the deformability of a reference plate of a reference frame for a vertical interferometer according to the present invention, the reference plate is horizontally arranged as a sample reference plate while being supported by the reference plate support frame. In addition, the first interference fringe measurement is performed in a state where the prototype reference plate is horizontally arranged so as to face the sample reference plate, and then the reference plate support frame is fixed to the sample reference plate and the prototype reference plate. The second interference fringe measurement is performed in the state of being rotated relative to the angle, the first and second interference fringe measurement data are averaged, and the reference plate deformability of the reference plate support frame is calculated based on the averaged data. Therefore, it is possible to obtain useful data for improving the measurement accuracy of the interference fringes in the vertical interferometer.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施形態に係る縦型干渉計用基準板
支持枠の基準板変形能測定方法が適用される基準板検査
用干渉計装置を示す全体構成図
FIG. 1 is an overall configuration diagram showing a reference plate inspection interferometer apparatus to which a method of measuring a reference plate deformability of a reference plate support frame for a vertical interferometer according to an embodiment of the present invention is applied.

【図2】図1のA-A線矢視図FIG. 2 is a view taken along the line AA of FIG. 1;

【図3】上記基準板変形能測定方法の活用例を説明する
ための図
FIG. 3 is a diagram for explaining an example of utilization of the above-described reference plate deformability measuring method.

【図4】上記活用例において選出されるサンプル基準板
と基準板支持枠との最適な組合せの例を示す図
FIG. 4 is a diagram showing an example of an optimal combination of a sample reference plate and a reference plate support frame selected in the above utilization example.

【符号の説明】[Explanation of symbols]

2、2(1)、2(2)、・・・、2(n) サンプル
基準板(基準板) 2a サンプル基準面 2b 目印 10 基準板検査用干渉計装置 12 縦型干渉計 14、14(1)、14(2)、・・・、14(n)
基準板支持枠 14a 目盛り 16 原器基準板 16a 原器基準面 16b 目印 18 コンピュータ 22 干渉計本体 Ax 光軸
2, 2 (1), 2 (2),..., 2 (n) Sample reference plate (reference plate) 2a Sample reference surface 2b Mark 10 Reference plate inspection interferometer device 12 Vertical interferometer 14, 14 ( 1), 14 (2), ..., 14 (n)
Reference plate support frame 14a Scale 16 Standard reference plate 16a Standard reference surface 16b Mark 18 Computer 22 Interferometer body Ax Optical axis

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 基準板が水平に配置される縦型干渉計に
おいて前記基準板を支持する基準板支持枠の基準板変形
能を測定する方法であって、 前記基準板を前記基準板支持枠に支持された状態でサン
プル基準板として水平に配置するとともに該サンプル基
準板と対向するようにして原器基準板を水平に配置した
状態で第1の干渉縞測定を行い、 次に、前記サンプル基準板および前記原器基準板に対し
前記基準板支持枠を所定角度だけ相対回転させた状態で
第2の干渉縞測定を行い、 これら第1および第2の干渉縞測定データを平均化し、 この平均化されたデータに基づき、前記基準板支持枠の
基準板変形能を算出することを特徴とする縦型干渉計用
基準板支持枠の基準板変形能測定方法。
1. A method for measuring the deformability of a reference plate supporting frame for supporting a reference plate in a vertical interferometer in which the reference plate is horizontally disposed, the method comprising: The first interference fringe measurement is performed in a state in which the sample reference plate is horizontally arranged in a state where the sample is supported and the prototype reference plate is horizontally arranged so as to face the sample reference plate. A second interference fringe measurement is performed in a state where the reference plate support frame is relatively rotated by a predetermined angle with respect to the reference plate and the prototype reference plate, and the first and second interference fringe measurement data are averaged. A method for measuring a reference plate deformability of a reference plate support frame for a vertical interferometer, comprising calculating a reference plate deformability of the reference plate support frame based on the averaged data.
【請求項2】 基準板が水平に配置される縦型干渉計に
おいて前記基準板を支持する基準板支持枠の基準板変形
能を測定する方法であって、 前記基準板を前記基準板支持枠に支持された状態でサン
プル基準板として水平に配置するとともに該サンプル基
準板と対向するようにして原器基準板を水平に配置した
状態で第1の干渉縞測定を行い、 次に、前記サンプル基準板および前記原器基準板に対し
前記基準板支持枠を所定角度相対回転させた状態で第2
の干渉縞測定を行い、 これら第1および第2の干渉縞測定データを平均化して
前記サンプル基準板の回転非対称成分を除去し、 この平均化されたデータから回転対称成分を除去するこ
とにより前記基準板支持枠の基準板変形能を算出するこ
とを特徴とする縦型干渉計用基準板支持枠の基準板変形
能測定方法。
2. A method for measuring a reference plate deformability of a reference plate supporting frame supporting a reference plate in a vertical interferometer in which the reference plate is horizontally disposed, wherein the reference plate is connected to the reference plate supporting frame. The first interference fringe measurement is performed in a state in which the sample reference plate is horizontally arranged in a state where the sample is supported and the prototype reference plate is horizontally arranged so as to face the sample reference plate. With the reference plate support frame rotated relative to the reference plate and the prototype reference plate by a predetermined angle, the second
By averaging the first and second interference fringe measurement data to remove the rotationally asymmetric component of the sample reference plate, and removing the rotationally symmetric component from the averaged data, A method for measuring a reference plate deformability of a reference plate support frame for a vertical interferometer, comprising calculating a reference plate deformability of the reference plate support frame.
【請求項3】 請求項1または2記載の基準板変形能測
定方法を用いて複数の基準板支持枠の基準板変形能を測
定するとともに複数の基準板の基準面の形状を測定して
おき、 これら基準板および基準板支持枠のうちから両者を組み
合わせたときに該基準板の基準面形状が最も平面に近く
なる基準板と基準板支持枠との組合せを選出することを
特徴とする縦型干渉計用基準板の選出方法。
3. The reference plate deformability of the plurality of reference plate supporting frames is measured using the reference plate deformability measuring method according to claim 1 and the shape of the reference plane of the plurality of reference plates is measured. A combination of a reference plate and a reference plate supporting frame whose reference surface shape is closest to a plane when both are combined from the reference plate and the reference plate supporting frame. Method for selecting the reference plate for the interferometer.
JP11086345A 1999-03-29 1999-03-29 Method for measuring capability of deforming reference plate of reference plate holding frame for vertical interferometer, and method of selecting reference plate for vertical interferometer using this Pending JP2000283733A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11086345A JP2000283733A (en) 1999-03-29 1999-03-29 Method for measuring capability of deforming reference plate of reference plate holding frame for vertical interferometer, and method of selecting reference plate for vertical interferometer using this

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11086345A JP2000283733A (en) 1999-03-29 1999-03-29 Method for measuring capability of deforming reference plate of reference plate holding frame for vertical interferometer, and method of selecting reference plate for vertical interferometer using this

Publications (1)

Publication Number Publication Date
JP2000283733A true JP2000283733A (en) 2000-10-13

Family

ID=13884286

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11086345A Pending JP2000283733A (en) 1999-03-29 1999-03-29 Method for measuring capability of deforming reference plate of reference plate holding frame for vertical interferometer, and method of selecting reference plate for vertical interferometer using this

Country Status (1)

Country Link
JP (1) JP2000283733A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106247967A (en) * 2016-08-18 2016-12-21 京东方科技集团股份有限公司 The measurement apparatus of a kind of substrate warp amount and method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106247967A (en) * 2016-08-18 2016-12-21 京东方科技集团股份有限公司 The measurement apparatus of a kind of substrate warp amount and method

Similar Documents

Publication Publication Date Title
US6707559B2 (en) Method of detecting posture of object and apparatus using the same
JP4583619B2 (en) Method for detecting fringe image analysis error and method for correcting fringe image analysis error
JP3871309B2 (en) Phase shift fringe analysis method and apparatus using the same
Trivedi et al. Measurement of focal length using phase shifted moiré deflectometry
JPH1096679A (en) Apparatus for measuring wavefront aberration
JP2000283733A (en) Method for measuring capability of deforming reference plate of reference plate holding frame for vertical interferometer, and method of selecting reference plate for vertical interferometer using this
TWM552096U (en) Device measuring residual stress of optical thin film
Leelawattananon et al. Surface roughness measurement application using multi-frame techniques
JP4049349B2 (en) Double-sided shape and thickness unevenness measuring device
JP4100663B2 (en) Absolute thickness measuring device
Zheng et al. Parasitic reflection separation deflectometry based on harmonic analysis
JP3146590B2 (en) Shape measuring method and shape measuring system
JP6196841B2 (en) Transmitted wavefront measuring apparatus and transmitted wavefront measuring method
JP2005055221A (en) Scanning type surface shape measuring device and surface shape measuring method
JP3845286B2 (en) Shape measuring apparatus and shape measuring method
JP3599921B2 (en) Method and apparatus for measuring refractive index distribution
JP2002131035A (en) Absolute calibration method, information processor, computer readable storage medium, instrumentation measuring method and optical member
Wang et al. Subfringe integration profilometry of three-dimensional diffuse objects
JP3998844B2 (en) Interferometer device using fringe scan
JP4187124B2 (en) Interferometer device using fringe scan
JP2753545B2 (en) Shape measurement system
JPS6082804A (en) Shape detecting method of running belt shaped body
JP2004184194A (en) Device and method for measuring shape
JP2006090950A (en) Measuring system of inclination of surface to be tested
JP2001050727A (en) Form measuring method using fringe modulation

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20060222

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20071210

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20080110

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20080508