JP2000252396A - Semiconductor device and semiconductor chip - Google Patents

Semiconductor device and semiconductor chip

Info

Publication number
JP2000252396A
JP2000252396A JP5121199A JP5121199A JP2000252396A JP 2000252396 A JP2000252396 A JP 2000252396A JP 5121199 A JP5121199 A JP 5121199A JP 5121199 A JP5121199 A JP 5121199A JP 2000252396 A JP2000252396 A JP 2000252396A
Authority
JP
Japan
Prior art keywords
semiconductor chip
solid surface
semiconductor
space
chip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5121199A
Other languages
Japanese (ja)
Inventor
Junichi Hikita
純一 疋田
Kazutaka Shibata
和孝 柴田
Shigeyuki Ueda
茂幸 上田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm Co Ltd
Original Assignee
Rohm Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm Co Ltd filed Critical Rohm Co Ltd
Priority to JP5121199A priority Critical patent/JP2000252396A/en
Priority to US09/512,337 priority patent/US6376915B1/en
Publication of JP2000252396A publication Critical patent/JP2000252396A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/102Material of the semiconductor or solid state bodies
    • H01L2924/1025Semiconducting materials
    • H01L2924/10251Elemental semiconductors, i.e. Group IV
    • H01L2924/10253Silicon [Si]

Abstract

PROBLEM TO BE SOLVED: To eliminate a process of inserting resin into a space between a wiring board and the surface of a semiconductor chip, etc. SOLUTION: On the surface 21 of a semiconductor chip 2, a plurality of bumps B and an airtight wall section 22 are formed. The airtight wall section 22 is formed like a wall nearly in the same height as the bumps over the entire periphery of the surface 21. When mounting the semiconductor chip 2 on a wiring board 1, the work is performed in a gas atmosphere such as a nitrogen gas atmosphere, argon gas atmosphere, etc. As a result, the airtight wall section 22 can be tightly adhered to a plate-like body 11, and a space 30 between the wiring board 1 and the semiconductor chip 2 is insulated from the outer space, being filled with inactive gas.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】この発明は、たとえば、半導
体チップの表面を配線基板に対向させて接合するフリッ
プ・チップ・ボンディング構造や、半導体チップの表面
に他の半導体チップを重ね合わせて接合するチップ・オ
ン・チップ構造の半導体装置、およびこのような半導体
装置に適用される半導体チップに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to, for example, a flip chip bonding structure in which the surface of a semiconductor chip is bonded to a wiring substrate and a chip in which another semiconductor chip is superposed and bonded to the surface of a semiconductor chip. The present invention relates to a semiconductor device having an on-chip structure and a semiconductor chip applied to such a semiconductor device.

【0002】[0002]

【従来の技術】従来から、プリント配線基板上への半導
体チップの実装密度の向上および実装に要する時間の短
縮を図るための手法として、プリント配線基板などの表
面に半導体チップの表面を対向させて接合する、いわゆ
るフリップ・チップ・ボンディング(フェイスダウン・
ボンディング)構造が知られている。
2. Description of the Related Art Conventionally, as a technique for improving the mounting density of a semiconductor chip on a printed wiring board and shortening the time required for mounting, the surface of a semiconductor chip is opposed to the surface of a printed wiring board or the like. So-called flip chip bonding (face-down bonding)
Bonding) structures are known.

【0003】このフリップ・チップ・ボンディング構造
では、半導体チップの表面に複数個のバンプが設けられ
ており、このバンプを配線基板の表面に配置された電極
に接合させることにより、半導体チップと配線基板とが
所定間隔を保つように連結され、かつ、互いに電気的に
接続される。そして、半導体チップおよび配線基板は、
対向する表面間に樹脂が封入されてパッケージに収容さ
れる。これにより、半導体チップと外気とが遮断され、
外気中の湿気などによる半導体チップの性能劣化を防止
することができる。
In this flip chip bonding structure, a plurality of bumps are provided on the surface of a semiconductor chip, and the bumps are joined to electrodes arranged on the surface of the wiring board to thereby connect the semiconductor chip to the wiring board. Are connected so as to keep a predetermined interval, and are electrically connected to each other. And the semiconductor chip and the wiring board
Resin is sealed between the opposing surfaces and housed in a package. This shuts off the semiconductor chip from the outside air,
It is possible to prevent the performance of the semiconductor chip from deteriorating due to moisture in the outside air.

【0004】[0004]

【発明が解決しようとする課題】ところが、半導体チッ
プと配線基板との間に樹脂を封入する工程を省略できれ
ば、半導体装置の製造に要する時間を短縮することがで
き、半導体装置のコストを低減させることができる。ま
た、上記のフリップ・チップ・ボンディング構造の半導
体装置に限らず、半導体チップの表面に他の半導体チッ
プを重ね合わせて接合するチップ・オン・チップ構造の
半導体装置においても、半導体チップの性能劣化を防ぐ
ため、通常、半導体チップ間には樹脂が封入されてい
る。したがって、この半導体チップ間への樹脂封入工程
を省略することができれば、チップ・オン・チップ構造
の半導体装置の製造工程に要する時間を短縮でき、半導
体装置のコストを低減させることができる。
However, if the step of encapsulating the resin between the semiconductor chip and the wiring board can be omitted, the time required for manufacturing the semiconductor device can be reduced, and the cost of the semiconductor device can be reduced. be able to. In addition to the above-described semiconductor device having the flip-chip bonding structure, deterioration of the performance of the semiconductor chip is not limited to a semiconductor device having a chip-on-chip structure in which another semiconductor chip is superimposed on and bonded to the surface of the semiconductor chip. To prevent this, a resin is usually sealed between the semiconductor chips. Therefore, if the step of encapsulating the resin between the semiconductor chips can be omitted, the time required for the manufacturing process of the semiconductor device having the chip-on-chip structure can be reduced, and the cost of the semiconductor device can be reduced.

【0005】この発明は、上述のような背景の下になさ
れたものであり、その目的は、配線基板や他の半導体チ
ップなどの固体の表面との間への樹脂封入を省略できる
半導体装置および半導体チップを提供することである。
The present invention has been made in view of the above background, and has as its object to provide a semiconductor device and a semiconductor device which can omit resin encapsulation between a solid surface such as a wiring board and another semiconductor chip. It is to provide a semiconductor chip.

【0006】[0006]

【課題を解決するための手段および発明の効果】上記の
目的を達成するための請求項1記載の発明は、固体表面
に半導体チップを重ね合わせて接合して構成される半導
体装置であって、上記固体表面と上記半導体チップとの
対向する表面間に設けられ、上記半導体チップを上記固
体表面との間に所定間隔を保持した状態で支持するとと
もに、上記半導体チップと上記固体とを電気接続する接
続部と、上記固体表面と上記半導体チップとの対向する
表面間において、上記固体表面と上記半導体チップとの
間の空間を取り囲んで設けられて、上記空間を密閉する
密閉壁部とを含むことを特徴とする半導体装置である。
According to a first aspect of the present invention, there is provided a semiconductor device having a solid surface and a semiconductor chip formed by superimposing and bonding a semiconductor chip. Provided between the solid surface and the opposing surface of the semiconductor chip, supporting the semiconductor chip while maintaining a predetermined distance between the solid surface and the solid surface, and electrically connecting the semiconductor chip and the solid. A connecting portion, and a sealing wall portion provided between the opposed surfaces of the solid surface and the semiconductor chip so as to surround a space between the solid surface and the semiconductor chip and to seal the space; A semiconductor device characterized by the following.

【0007】なお、上記固体表面は、他の半導体チップ
の表面であってもよいし、配線基板の表面であってもよ
い。この発明によれば、他の半導体チップや配線基板な
どの固体の表面と半導体チップの表面との間の空間は、
密閉壁部によって密閉されているので、この空間内に外
気が入り込むおそれはない。ゆえに、上記固体と半導体
チップとの間に、半導体チップを外気から保護するため
の樹脂を封入する必要がないので、半導体装置の製造に
要する時間を短縮することができ、半導体装置のコスト
を低減させることができる。
[0007] The solid surface may be the surface of another semiconductor chip or the surface of a wiring board. According to the present invention, the space between the surface of the semiconductor chip and a solid surface such as another semiconductor chip or a wiring board is
Since the space is sealed by the sealing wall, there is no possibility that outside air enters into this space. Therefore, it is not necessary to enclose a resin for protecting the semiconductor chip from the outside air between the solid and the semiconductor chip, so that the time required for manufacturing the semiconductor device can be reduced, and the cost of the semiconductor device can be reduced. Can be done.

【0008】請求項2記載の発明は、上記密閉壁部によ
って密閉された空間内には、不活性ガスが充填されてい
ることを特徴とする請求項1記載の半導体装置である。
この発明によれば、上記固体表面と半導体チップの表面
との間の空間内は不活性ガスで満たされているので、半
導体チップの性能劣化を招くおそれはない。請求項3記
載の発明は、上記密閉壁部によって密閉された空間内
は、ほぼ真空に保たれていることを特徴とする請求項1
記載の半導体装置である。
According to a second aspect of the present invention, there is provided the semiconductor device according to the first aspect, wherein a space sealed by the sealing wall portion is filled with an inert gas.
According to the present invention, since the space between the solid surface and the surface of the semiconductor chip is filled with the inert gas, the performance of the semiconductor chip does not deteriorate. According to a third aspect of the present invention, the inside of the space sealed by the sealing wall is kept substantially at a vacuum.
It is a semiconductor device of the description.

【0009】この発明によれば、上記固体表面と半導体
チップの表面との間の空間内は真空に保たれているの
で、固体表面と半導体チップとの密着性を高めることが
でき、当該空間内に外気が入り込むことを良好に防止で
きる。請求項4記載の発明は、固体表面に接合される半
導体チップであって、上記固体表面に対向する表面に設
けられており、当該半導体チップを上記固体表面との間
に所定間隔を保持した状態で支持するとともに、当該半
導体チップと上記固体とを電気接続する接続部と、上記
固体表面に対向する表面の周縁部の全周に渡って設けら
れており、上記固体表面に接合して、当該半導体チップ
の表面と上記固体表面との間の空間を密閉する密閉壁部
とを含むことを特徴とする半導体チップである。
According to the present invention, since the space between the solid surface and the surface of the semiconductor chip is kept at a vacuum, the adhesion between the solid surface and the semiconductor chip can be improved, and the space within the space can be improved. It is possible to satisfactorily prevent outside air from entering the air. According to a fourth aspect of the present invention, there is provided a semiconductor chip to be bonded to a solid surface, the semiconductor chip being provided on a surface facing the solid surface, and maintaining the semiconductor chip at a predetermined distance from the solid surface. And a connection portion for electrically connecting the semiconductor chip and the solid, and provided over the entire periphery of the peripheral portion of the surface facing the solid surface, and joined to the solid surface, A semiconductor chip including a sealing wall for sealing a space between the surface of the semiconductor chip and the solid surface.

【0010】この発明によれば、請求項1の発明と同様
の効果を奏することができる。なお、上記密閉壁部は、
上記固体表面に対向する表面の最周縁に設けられている
ことが好ましいが、上記固体表面に対向する表面に設け
られた全接続部を包囲するように形成されていればよ
い。
According to the present invention, the same effect as that of the first aspect can be obtained. In addition, the said sealing wall part,
It is preferably provided at the outermost periphery of the surface facing the solid surface, but it is sufficient if it is formed so as to surround all the connecting portions provided on the surface facing the solid surface.

【0011】[0011]

【発明の実施の形態】以下では、この発明の実施の形態
を、添付図面を参照して詳細に説明する。図1は、この
発明の一実施形態に係る半導体装置の概略構成を示す図
解的な断面図であり、図2は、上記半導体装置に適用さ
れている半導体チップの斜視図である。この半導体装置
は、いわゆるフリップ・チップ・ボンディング構造の半
導体装置であって、配線基板1の表面に半導体チップ2
を重ね合わせて接合することにより構成されている。
Embodiments of the present invention will be described below in detail with reference to the accompanying drawings. FIG. 1 is an illustrative sectional view showing a schematic configuration of a semiconductor device according to an embodiment of the present invention, and FIG. 2 is a perspective view of a semiconductor chip applied to the semiconductor device. This semiconductor device is a semiconductor device having a so-called flip-chip bonding structure.
Are overlapped and joined.

【0012】配線基板1は、たとえば合成樹脂からなる
板状体11の表面12に、半導体チップ2との接続のた
めの複数個の電極13およびこれらの電極13間を接続
する薄膜配線(図示せず)がパターン形成されて構成さ
れている。半導体チップ2は、たとえばシリコンチップ
からなっている。半導体チップ2は、表面21を配線基
板1の表面に対向させた、いわゆるフェースダウン方式
で配線基板1に接合されている。半導体チップ2の表面
21は、半導体チップ2の基体をなす半導体基板におい
てトランジスタなどの機能素子が形成された活性表層領
域側の表面であり、最表面は、絶縁性を有する保護膜で
覆われている。この保護膜上には、内部回路と電気接続
された導電性のバンプBが隆起して形成されている。
The wiring board 1 has a plurality of electrodes 13 for connection to the semiconductor chip 2 and a thin film wiring (see FIG. 1) for connecting the electrodes 13 to a surface 12 of a plate 11 made of, for example, a synthetic resin. ) Is formed by pattern formation. The semiconductor chip 2 is made of, for example, a silicon chip. The semiconductor chip 2 is joined to the wiring board 1 by a so-called face-down method in which the front surface 21 faces the surface of the wiring board 1. The surface 21 of the semiconductor chip 2 is a surface on the active surface layer region side on which a functional element such as a transistor is formed on a semiconductor substrate serving as a base of the semiconductor chip 2, and the outermost surface is covered with a protective film having an insulating property. I have. On the protective film, a conductive bump B electrically connected to the internal circuit is formed so as to protrude.

【0013】また、半導体チップ2の周縁部には、バン
プBとほぼ同じ高さの壁状の密閉壁部22が全周に渡っ
て形成されている。この密閉壁部22は、バンプBと同
じ材料で形成されており、その形成工程においては、バ
ンプBと同時に形成することができる。半導体チップ2
の配線基板1への実装は、たとえば窒素ガスやアルゴン
ガスなどの不活性ガス雰囲気中において、複数個のバン
プBと配線基板1上の電極13とをそれぞれ位置合わせ
して接合させ、配線基板1と半導体チップ2とを圧着す
ることにより達成される。バンプBは、半導体チップ2
を配線基板1上に所定間隔を保って支持するとともに、
半導体チップ2と薄膜配線とを電気的に接続する。一
方、密閉壁部22は、板状体11の表面12に密着し
て、配線基板1と半導体チップ2との間の空間30を密
閉する。これにより、配線基板1と半導体チップ2との
間の空間30は、外部の空間から隔絶され、空間30内
は不活性ガスが充満した状態に維持される。
On the periphery of the semiconductor chip 2, a wall-shaped sealing wall 22 having substantially the same height as the bump B is formed over the entire periphery. The sealing wall 22 is formed of the same material as the bump B, and can be formed simultaneously with the bump B in the forming process. Semiconductor chip 2
Is mounted on the wiring board 1 by, for example, positioning and bonding the plurality of bumps B and the electrodes 13 on the wiring board 1 in an inert gas atmosphere such as nitrogen gas or argon gas. And the semiconductor chip 2 is crimped. Bump B is a semiconductor chip 2
Are supported on the wiring board 1 at a predetermined interval,
The semiconductor chip 2 and the thin film wiring are electrically connected. On the other hand, the sealing wall portion 22 is in close contact with the surface 12 of the plate-like body 11 to seal the space 30 between the wiring board 1 and the semiconductor chip 2. Thereby, the space 30 between the wiring substrate 1 and the semiconductor chip 2 is isolated from the external space, and the space 30 is maintained in a state filled with the inert gas.

【0014】以上のように、配線基板1と半導体チップ
2との間の空間30は、密閉壁部22によって外部から
隔絶されているので、この空間30内に外気が入り込む
おそれはない。また、配線基板1と半導体チップ2との
接合は不活性ガス雰囲気中で行われ、空間30内は不活
性ガスで満たされているから、半導体チップ2の性能劣
化を招くおそれはない。ゆえに、この実施形態の半導体
チップを用いたフリップ・チップ・ボンディング構造で
は、配線基板1と半導体チップ2との間に樹脂を封入す
る必要がないので、半導体装置の製造に要する時間を短
縮することができ、半導体装置のコストを低減させるこ
とができる。
As described above, since the space 30 between the wiring board 1 and the semiconductor chip 2 is isolated from the outside by the sealing wall 22, there is no possibility that outside air enters the space 30. In addition, since the bonding between the wiring substrate 1 and the semiconductor chip 2 is performed in an inert gas atmosphere, and the space 30 is filled with the inert gas, the performance of the semiconductor chip 2 does not deteriorate. Therefore, in the flip chip bonding structure using the semiconductor chip of this embodiment, it is not necessary to enclose a resin between the wiring board 1 and the semiconductor chip 2, so that the time required for manufacturing the semiconductor device can be reduced. And the cost of the semiconductor device can be reduced.

【0015】この発明の一実施形態の説明は以上のとお
りであるが、この発明は、他の形態でも実施することが
可能である。たとえば、上述の実施形態では、配線基板
1と半導体チップ2との接合は、不活性ガス雰囲気中で
行うとしたが、真空中で行われてもよい。この場合、配
線基板1と半導体チップ2との間の空間30内は真空と
なるから、配線基板1と半導体チップ2との密着性を高
めることができる。
Although the embodiment of the present invention has been described above, the present invention can be embodied in other forms. For example, in the above embodiment, the connection between the wiring substrate 1 and the semiconductor chip 2 is performed in an inert gas atmosphere, but may be performed in a vacuum. In this case, since the space 30 between the wiring board 1 and the semiconductor chip 2 is evacuated, the adhesion between the wiring board 1 and the semiconductor chip 2 can be improved.

【0016】また、上述の実施形態では、半導体チップ
2は、シリコンからなるチップであるとしたが、シリコ
ンの他にも、化合物半導体(たとえばガリウム砒素半導
体など)やゲルマニウム半導体などの他の任意の半導体
材料を用いたチップであってもよい。さらに、上述の実
施形態では、フリップ・チップ・ボンディング構造の半
導体装置を取り上げたが、この発明は、半導体チップの
表面に他の半導体チップを重ね合わせて接合するチップ
・オン・チップ構造の半導体装置にも適用できる。
In the above-described embodiment, the semiconductor chip 2 is a chip made of silicon. However, in addition to silicon, any other semiconductor compound such as a compound semiconductor (eg, a gallium arsenide semiconductor) or a germanium semiconductor may be used. A chip using a semiconductor material may be used. Further, in the above-described embodiment, the semiconductor device having the flip-chip bonding structure is taken up. However, the present invention relates to a semiconductor device having a chip-on-chip structure in which another semiconductor chip is overlapped and joined to the surface of the semiconductor chip. Also applicable to

【0017】その他、特許請求の範囲に記載された事項
の範囲で、種々の設計変更を施すことが可能である。
In addition, various design changes can be made within the scope of the matters described in the claims.

【図面の簡単な説明】[Brief description of the drawings]

【図1】この発明の一実施形態に係る半導体装置の概略
構成を示す図解的な断面図である。
FIG. 1 is an illustrative sectional view showing a schematic configuration of a semiconductor device according to an embodiment of the present invention.

【図2】上記半導体装置に適用された半導体チップの斜
視図である。
FIG. 2 is a perspective view of a semiconductor chip applied to the semiconductor device.

【符号の説明】[Explanation of symbols]

1 配線基板(固体) 2 半導体チップ 12 表面(固体表面) 21 表面(半導体チップの表面) 22 密閉壁部 30 空間(固体表面と半導体チップの表面との間の
空間) B バンプ
DESCRIPTION OF SYMBOLS 1 Wiring board (solid) 2 Semiconductor chip 12 Surface (solid surface) 21 Surface (surface of semiconductor chip) 22 Sealing wall 30 Space (space between solid surface and surface of semiconductor chip) B Bump

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】固体表面に半導体チップを重ね合わせて接
合して構成される半導体装置であって、 上記固体表面と上記半導体チップとの対向する表面間に
設けられ、上記半導体チップを上記固体表面との間に所
定間隔を保持した状態で支持するとともに、上記半導体
チップと上記固体とを電気接続する接続部と、 上記固体表面と上記半導体チップとの対向する表面間に
おいて、上記固体表面と上記半導体チップとの間の空間
を取り囲んで設けられて、上記空間を密閉する密閉壁部
とを含むことを特徴とする半導体装置。
1. A semiconductor device comprising a solid surface and a semiconductor chip superposed and joined to each other, said semiconductor device being provided between said solid surface and a surface facing said semiconductor chip, said semiconductor chip being attached to said solid surface. And a connection part for electrically connecting the semiconductor chip and the solid, and between the solid surface and the opposing surface of the semiconductor chip, the solid surface and the solid surface. A semiconductor device provided surrounding a space between the semiconductor chip and the semiconductor chip and sealing the space.
【請求項2】上記密閉壁部によって密閉された空間内に
は、不活性ガスが充填されていることを特徴とする請求
項1記載の半導体装置。
2. The semiconductor device according to claim 1, wherein a space sealed by said sealing wall is filled with an inert gas.
【請求項3】上記密閉壁部によって密閉された空間内
は、ほぼ真空に保たれていることを特徴とする請求項1
記載の半導体装置。
3. A vacuum system according to claim 1, wherein the space enclosed by said sealing wall is kept substantially in a vacuum.
13. The semiconductor device according to claim 1.
【請求項4】固体表面に接合される半導体チップであっ
て、 上記固体表面に対向する表面に設けられており、当該半
導体チップを上記固体表面との間に所定間隔を保持した
状態で支持するとともに、当該半導体チップと上記固体
とを電気接続する接続部と、 上記固体表面に対向する表面の周縁部の全周に渡って設
けられており、上記固体表面に接合して、当該半導体チ
ップの表面と上記固体表面との間の空間を密閉する密閉
壁部とを含むことを特徴とする半導体チップ。
4. A semiconductor chip bonded to a solid surface, provided on a surface facing the solid surface, and supporting the semiconductor chip while maintaining a predetermined distance from the solid surface. A connection portion for electrically connecting the semiconductor chip and the solid is provided, and is provided over the entire periphery of a peripheral portion of the surface opposed to the solid surface, and is connected to the solid surface to form the semiconductor chip. A semiconductor chip, comprising: a sealing wall for sealing a space between a surface and the solid surface.
JP5121199A 1999-02-26 1999-02-26 Semiconductor device and semiconductor chip Pending JP2000252396A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP5121199A JP2000252396A (en) 1999-02-26 1999-02-26 Semiconductor device and semiconductor chip
US09/512,337 US6376915B1 (en) 1999-02-26 2000-02-24 Semiconductor device and semiconductor chip

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5121199A JP2000252396A (en) 1999-02-26 1999-02-26 Semiconductor device and semiconductor chip

Publications (1)

Publication Number Publication Date
JP2000252396A true JP2000252396A (en) 2000-09-14

Family

ID=12880594

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5121199A Pending JP2000252396A (en) 1999-02-26 1999-02-26 Semiconductor device and semiconductor chip

Country Status (1)

Country Link
JP (1) JP2000252396A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6716667B2 (en) 2001-09-05 2004-04-06 Renesas Technology Corp. Semiconductor device manufacturing method, making negative pressure for fixing a chip on a substrate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6716667B2 (en) 2001-09-05 2004-04-06 Renesas Technology Corp. Semiconductor device manufacturing method, making negative pressure for fixing a chip on a substrate

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