JP2000231889A - Shadow mask plate material - Google Patents

Shadow mask plate material

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Publication number
JP2000231889A
JP2000231889A JP2000023625A JP2000023625A JP2000231889A JP 2000231889 A JP2000231889 A JP 2000231889A JP 2000023625 A JP2000023625 A JP 2000023625A JP 2000023625 A JP2000023625 A JP 2000023625A JP 2000231889 A JP2000231889 A JP 2000231889A
Authority
JP
Japan
Prior art keywords
shadow mask
surface roughness
adhesion
plate material
rsk
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000023625A
Other languages
Japanese (ja)
Other versions
JP3122442B2 (en
Inventor
Tsutomu Hatano
勉 羽田野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP2000023625A priority Critical patent/JP3122442B2/en
Publication of JP2000231889A publication Critical patent/JP2000231889A/en
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Publication of JP3122442B2 publication Critical patent/JP3122442B2/en
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Abstract

PROBLEM TO BE SOLVED: To stabilize the adhesion to a photoresist, enhance the adhesion to a negative pattern and increase quality and productivity by providing a specific surface roughness and the projection condition of the surface roughness on a shadow mask plate material used for a color picture tube. SOLUTION: In this shadow mask plate material, by limiting the surface roughness Ra of the shadow mask plate material and the projection condition Rsk of the surface roughness, the adhesion to a photoresist and the adhesion to a negative pattern are increased and the time of suction for the adhesion is reduced. The surface roughness Ra of the shadow mask plate material is 0.55-0.65 μm and the projection condition Rsk of the surface roughness is +0.7 or more. In this case, the projection condition Rsk of the surface roughness expresses the value of the relativity of an oscillation distribution curve with respect to an average line and is shown by the expression: Y(i) is a roughness curve when an average line is the X axis and the direction of vertical magnification is the Y axis in the reference length of a cross-sectional curve; Rq is square-average roughness; n=230; and j=2-5.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、カラー受像管に用いる
シャドウマスクの製造工程において、金属材料とフォト
レジストとの密着性を向上させ、また、ネガ原板との密
着性を向上させ、密着のための吸引時間を短縮して、生
産性の向上を図ることができ、かつ、ネガパターンを正
確に転写することができ、さらに、カラー受像管製造工
程におけるシャドウマスクの軟化焼鈍工程において、焼
鈍密着を起こさないシャドウマスク用板材に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a process for manufacturing a shadow mask used for a color picture tube, in which the adhesion between a metal material and a photoresist is improved, and the adhesion between a negative original plate is improved. The suction time can be shortened, the productivity can be improved, and the negative pattern can be accurately transferred. Furthermore, in the softening annealing process of the shadow mask in the color picture tube manufacturing process, the annealing adhesion The present invention relates to a shadow mask plate material that does not cause cracks.

【0002】[0002]

【従来の技術】従来、カラー受像管用シャドウマスクに
は、鉄を主成分とする低炭素アルミキルド冷延綱板や鉄
及びニッケルを主成分とする合金、例えば36ニッケル
−鉄アンバー合金板等が使用されている。これらの板材
においては、表面粗さの明確な規定は特にない。
2. Description of the Related Art Conventionally, a low carbon aluminum killed cold rolled steel plate mainly composed of iron or an alloy mainly composed of iron and nickel, for example, a 36 nickel-iron amber alloy plate has been used as a shadow mask for a color picture tube. Have been. In these plate materials, there is no particular definition of the surface roughness.

【0003】[0003]

【発明が解決しようとする課題】上記したように、従来
のシャドウマスク用板材においては、表面粗さの明確な
規定がないため、素材の板材よりシャドウマスクを製造
する工程において、金属板材とフォトレジストの密着性
が不安定になりやすく、また、ネガパターンの転写工程
において、フォトレジストを塗布した金属板材とネガパ
ターンとの密着性が不安定な状況となっている。さら
に、カラー受像管の製造工程におけるプレス成形可能な
変形能を与えるためのシャドウマスクの軟化焼鈍工程に
おいて、焼鈍密着を起こし、品質及び生産性に悪影響を
及ぼしている。
As described above, in the conventional plate material for a shadow mask, there is no clear definition of the surface roughness. Therefore, in the process of manufacturing a shadow mask from a plate material, a metal plate material and a photo plate are not used. The adhesiveness of the resist tends to be unstable, and the adhesiveness between the metal plate material coated with the photoresist and the negative pattern in the negative pattern transfer step is unstable. Furthermore, in the process of softening and annealing a shadow mask for providing deformability capable of being press-molded in a process of manufacturing a color picture tube, annealing and adhesion are caused, which adversely affects quality and productivity.

【0004】本発明はこのような状況に鑑みたなされた
ものであり、その目的は、シャドウマスク製造工程にお
いて、フォトレジストとの密着性を安定させ、ネガパタ
ーンとの密着性を良くして、品質及び生産性の向上を図
ることができ、また、カラー受像管の製造工程における
シャドウマスクの軟化焼鈍工程で、焼鈍密着を起こさな
い表面形状を有する、鉄を主成分あるいは鉄及びニッケ
ルを主成分とするシャドウマスク用板材を提供すること
である。
The present invention has been made in view of such a situation, and an object of the present invention is to stabilize adhesion with a photoresist and improve adhesion with a negative pattern in a shadow mask manufacturing process. It can improve quality and productivity, and has a surface shape that does not cause annealing adhesion in the softening and annealing process of the shadow mask in the color picture tube manufacturing process. To provide a shadow mask plate material.

【0005】[0005]

【課題を解決するための手段】本発明者は上記の目的を
達成すべく研究の結果、シャドウマスク用板材の表面粗
さRaと表面粗さの突起状態Rskを規制することによ
って、フォトレジストとの密着性を向上させ、ネガパタ
ーンとの密着性を向上させ、密着のための吸引時間を短
縮して生産性の向上が図れ、かつ、ネガパターンを正確
に転写することができ、品質の向上も図れ、さらに、カ
ラー受像管製造工程におけるシャドウマスクの軟化焼鈍
工程において、焼鈍密着を防止することができることを
見い出し、かかる知見にもとづいて本発明を完成したも
のである。
As a result of the research to achieve the above object, the present inventor has found that by regulating the surface roughness Ra and the projection state Rsk of the surface roughness of the shadow mask plate, the photoresist and The adhesion of the negative pattern is improved, the adhesion with the negative pattern is improved, the suction time for the adhesion is shortened, the productivity is improved, and the negative pattern can be transferred accurately, improving the quality. The present inventors have further found that in the softening and annealing step of the shadow mask in the color picture tube manufacturing process, it is possible to prevent annealing and adhesion, and based on such knowledge, the present invention has been completed.

【0006】すなわち、本発明のシャドウマスク用板材
は、シャドェウマスク用板材の表面粗さRaと表面粗さ
の突起状態Rskを下記のように規制することで、上記
の問題点の解決を図ったのものである。
That is, the plate material for shadow mask of the present invention solves the above-mentioned problems by regulating the surface roughness Ra and the projection state Rsk of the surface roughness of the plate material for shadow mask as follows. is there.

【0007】Ra :0.55〜0.65μm Rsk:+0.7 以上 ここで、Raは、JIS B0601において規定され
ている表面粗さ、Rskは、平均線に対しての振幅分布
曲線の相対性を示す値で、次式で示される突起状態、
Ra: 0.55 to 0.65 μm Rsk: +0.7 or more Here, Ra is the surface roughness specified in JIS B0601, and Rsk is the relativity of the amplitude distribution curve to the average line. Is a value indicating the projection state represented by the following equation,

【0008】[0008]

【数2】 Y(i) は、断面曲線の基準長さにおいて、平均線をX
軸、縦倍率の方向をY軸としたときの粗さ曲線、Rq
は、二乗平均粗さ、 n=230、 j=2〜5、を表す。
(Equation 2) Y (i) represents the average line at X in the reference length of the sectional curve.
Axis, the roughness curve when the direction of the vertical magnification is the Y axis, Rq
Represents the root mean square roughness, n = 230, j = 2-5.

【0009】この場合、シャドウマスク用板材は鉄を主
成分あるいは鉄及びニッケルを主成分とするものである
のが望ましい。
In this case, it is desirable that the plate material for the shadow mask is composed mainly of iron or mainly iron and nickel.

【0010】以下に本発明の各条件について、詳細に説
明する。
Hereinafter, each condition of the present invention will be described in detail.

【0011】研究の結果、シャドウマスク用板材の表面
粗さRaは、その上に塗布するフォトレジストの密着
性、及び、ネガパターンとの密着性に大きく影響を及ぼ
すことが分かった。フォトレジストの密着性が適切でな
いと、適正な感光特性が得られず、フォトレジストをマ
スクとしてエッチングされる孔形状が不均一となり、品
質の低下を招く。さらに、ネガパターンとの密着性が悪
いと、密着のための吸引時間が長時間に及び、生産性の
低下を引き起こす。また、ネガパターンとの密着性が悪
いと言うことは、ネガパターンの転写が正確に行えない
ということを意味し、品質の低下を引き起こす要因でも
ある。そこで、研究の結果、JIS B0601におい
て規定されている表面粗さRaを次のように規定する必
要があることが分かった。すなわち、表面粗さRaが
0.3μmより小さいと、シャドウマスク用板材とフォ
トレジストとの密着性が弱すぎるため、所定の孔形状が
均一に得られず、また、ネガパターンとの密着性も悪く
なり、シャドウマスク品質の低下を引き起こす。表面粗
さRaが0.8μmより大きいと、開孔後の孔形状にお
いて、丸孔パターンの場合真円度が悪くなり、スロット
パターンの場合スロットの直線性が悪くなり、ともにシ
ャドウマスク品質の低下を引き起こす。このため、表面
粗さRaは0.3〜0.8μmに規定する必要がある。
As a result of the study, it has been found that the surface roughness Ra of the plate material for the shadow mask greatly affects the adhesiveness of the photoresist applied thereon and the adhesiveness with the negative pattern. If the adhesiveness of the photoresist is not appropriate, appropriate photosensitivity cannot be obtained, and the shape of the hole to be etched using the photoresist as a mask becomes non-uniform, thereby deteriorating the quality. Further, if the adhesion to the negative pattern is poor, the suction time for the adhesion becomes long and the productivity is reduced. Poor adhesion to the negative pattern means that the transfer of the negative pattern cannot be performed accurately, which is a factor that causes deterioration in quality. Therefore, as a result of research, it has been found that the surface roughness Ra specified in JIS B0601 needs to be specified as follows. That is, if the surface roughness Ra is smaller than 0.3 μm, the adhesion between the shadow mask plate material and the photoresist is too weak, so that a predetermined hole shape cannot be obtained uniformly, and the adhesion with the negative pattern also decreases. It worsens, causing a decrease in shadow mask quality. When the surface roughness Ra is larger than 0.8 μm, the roundness of the hole after hole formation is poor in the roundness, and the slot pattern is poor in the linearity of the slot. cause. For this reason, the surface roughness Ra needs to be specified to be 0.3 to 0.8 μm.

【0012】しかしながら、上記表面粗さRaの規定だ
けでは、シャドウマスク製造工程での生産性の向上、つ
まり、ネガパターン密着工程における密着のための吸引
時間の短縮が充分に図れず、さらに、カラー受像管製造
工程におけるシャドウマスク軟化焼鈍工程において、焼
鈍密着を防止することはできないことが分かった。そこ
で、種々検討の結果、表面粗さの突起状態Rskの規定
が重要であることが分かった。Rskは、図1に示すよ
うに、基準長さL内における表面粗さ形状の平均線lに
対しての振幅分布曲線の相対性を示す値である。Rsk
が+であることは、図1(a)に示したように、粗さ形
状としては上に凸ということを意味し、突起が多くある
と言うことである。逆に、Rskが−であることは、図
1(b)に示したように、表面に平坦部が多くあると言
うことである。表面に突起が多くあると、ネガパターン
密着工程において、ネガパターンとシャドウマスク用板
材との間に吸引のための空気の通り道が多く形成される
こととなり、吸引時間の短縮が図れることになる。さら
に、シャドウマスク軟化焼鈍工程において、シャドウマ
スク用板材表面に突起があると言うことは、板材同士の
接触が点接触となり、焼鈍密着が防止されることにな
る。このため、表面粗さの突起状態Rskは+0.1以
上とする必要があることが分かった。
However, only by defining the surface roughness Ra, it is not possible to sufficiently improve the productivity in the shadow mask manufacturing process, that is, to shorten the suction time for the close contact in the negative pattern close contact process. It has been found that in the shadow mask softening and annealing process in the picture tube manufacturing process, it is not possible to prevent annealing adhesion. Therefore, as a result of various studies, it has been found that the definition of the projection state Rsk of the surface roughness is important. Rsk is a value indicating the relativity of the amplitude distribution curve to the average line 1 of the surface roughness shape within the reference length L, as shown in FIG. Rsk
Is +, which means that the roughness shape is upwardly convex as shown in FIG. 1A, which means that there are many protrusions. Conversely, the fact that Rsk is-means that there are many flat portions on the surface as shown in FIG. If there are many projections on the surface, a large number of air passages for suction are formed between the negative pattern and the plate material for the shadow mask in the negative pattern contact step, so that the suction time can be reduced. Furthermore, in the shadow mask softening and annealing step, the fact that the projections are present on the surface of the plate material for the shadow mask means that the contact between the plate materials becomes a point contact, thereby preventing annealing adhesion. For this reason, it turned out that the projection state Rsk of surface roughness needs to be +0.1 or more.

【0013】そして、後記の実施例の調査結果から、ネ
ガパターンとの密着性、ネガパターンの転写の正確さ、
焼鈍密着防止特性を同時に満たすためには、Raが0.
55〜0.65μmの範囲で、Rskが+0.7以上で
あることが特に好ましいことが分かった。
From the results of the investigations in the examples described later, the adhesion to the negative pattern, the accuracy of the transfer of the negative pattern,
In order to simultaneously satisfy the annealing adhesion preventing property, Ra is set to 0.1.
It was found that it is particularly preferable that Rsk is +0.7 or more in the range of 55 to 0.65 μm.

【0014】[0014]

【実施例】次に本発明の実施例を説明する。Next, an embodiment of the present invention will be described.

【0015】シャドウマスク材料としては、鉄を主成分
とする低炭素アルミキルド冷延鋼板と、鉄及びニッケル
を主成分とす36ニッケル−鉄アンバー合金を使用し
た。これらの材料を圧延により所定の板厚とし、ダル仕
上げにて表面粗さRaと表面粗さの突起状態Rskを調
整した。まず、圧延油及び防錆油を除くための脱脂処理
を行い、次に、板材の両面にフォトレジストを塗布し、
乾燥後、所定のドット形状あるいはスロット形状パター
ンが形成されたネガパターンを密着させ、露光、現像
後、バーニング処理を施した。その後、塩化第二鉄液に
よるエッチング加工にて所定の孔をあけ、残存するフォ
トレジストを除去して、シャドウマスクとした。このよ
うにして製造したシャドウマスクについて、フォトレジ
ストの密着性を、35%塩酸中でのフォトレジストの板
材からの剥離時間で比較し、ネガパターンとの密着性に
ついては、密着のための吸引時間の比較で行った。さら
に、ネガパターンの転写の正確さについては、シャドウ
マスクのムラ品位にて比較調査した。
As a shadow mask material, a low-carbon aluminum killed cold-rolled steel sheet containing iron as a main component and a 36 nickel-iron amber alloy containing iron and nickel as main components were used. These materials were rolled to a predetermined thickness, and the surface roughness Ra and the projection state Rsk of the surface roughness were adjusted by dull finishing. First, perform a degreasing treatment to remove rolling oil and rust-preventive oil, and then apply photoresist on both sides of the plate,
After drying, a negative pattern on which a predetermined dot-shaped or slot-shaped pattern was formed was brought into close contact, exposed, developed, and then subjected to a burning treatment. Thereafter, a predetermined hole was made by etching with a ferric chloride solution, and the remaining photoresist was removed to obtain a shadow mask. With respect to the shadow mask manufactured in this manner, the adhesiveness of the photoresist was compared with the peeling time of the photoresist from the plate material in 35% hydrochloric acid. The comparison was made. Further, the accuracy of the transfer of the negative pattern was compared and investigated with respect to the uneven quality of the shadow mask.

【0016】次に、カラー受像管製造工程において、プ
レス成型可能な変形能を付与するために軟化焼鈍を行う
が、この軟化焼鈍工程において、焼鈍密着の程度を比較
調査した。
Next, in the color picture tube manufacturing process, softening annealing is performed in order to impart deformability capable of being press-molded. In this softening annealing process, the degree of adhesion by annealing was comparatively investigated.

【0017】以上の調査結果を以下の第1表にあわせて
示す。 (注) ムラ品位: A ムラは全くなく良好 B ムラは殆どなく良好 C ムラが少しあるが実用上問題ない D ムラがあり実用不可 E ムラがかなり強い 焼鈍密着状況:a 密着が全くない b 外周部において少し密着がある c 密着が少し認められるが作業性に影響なし(剥離
が容易) d 密着の剥離が困難で作業性が損なわれる e 密着が強く、剥離できない 第1表において、本発明例1、2は焼鈍密着が若干認め
られるが、作業性に影響はなく実用上は問題はないレベ
ルである。本発明例3〜9はムラ品位も問題なく、焼鈍
密着においても問題がない。特に本発明例6〜8はムラ
品位も全く問題なく、また焼鈍密着も全くなく、さら
に、フォトレジストの密着性、ネガパターンとの密着性
においても優れており、特に良好なマスクが得られてい
る。この結果から、Raが0.55〜0.65μm、R
skが+0.7以上であるのが特に好ましいことが分か
る。
The results of the above investigation are shown in Table 1 below. (Note) Unevenness grade: A Good with no unevenness B Good with almost no unevenness C There is a little unevenness but no problem in practical use D Unevenness and unusable E Very strong unevenness Annealing adhesion: a No adhesion b Outer circumference There is a little adhesion in the part. C A little adhesion is observed, but there is no effect on the workability (easy peeling). D It is difficult to peel off the adhesion and the workability is impaired. In Nos. 1 and 2, slight adhesion to annealing was observed, but there was no effect on workability and there was no practical problem. Examples 3 to 9 of the present invention have no problem with uneven quality and no problem with annealing adhesion. Particularly, Examples 6 to 8 of the present invention have no problem with uneven quality, have no annealing adhesion, and are excellent in the adhesiveness of a photoresist and the adhesiveness with a negative pattern, and a particularly good mask can be obtained. I have. From these results, Ra was 0.55 to 0.65 μm, R
It is understood that sk is particularly preferably equal to or more than +0.7.

【0018】これに対して、比較例10〜15はRa、
Rskの何れか又は双方において本発明の規定範囲を外
れるものがあるため、ムラ品位が悪く、さらに、焼鈍密
着による作業性への影響が出ており、実用不可である。
On the other hand, Comparative Examples 10 to 15 have Ra,
Since one or both of Rsks are out of the specified range of the present invention, the quality of the unevenness is poor, and the workability due to the adhesion due to the annealing is exerted, which is not practical.

【0019】[0019]

【発明の効果】以上、詳述した通り、本発明によるシャ
ドウマスク用板材を用いれば、シャドウマスク製造工程
における生産性を向上させ、さらにムラ品位の良いシャ
ドウマスクを製造することが可能となる。また、カラー
受像管製造工程におけるシャドウマスクの軟化焼鈍工程
において、焼鈍密着の発生がなく、作業性を損なうこと
のないシャドウマスクを提供することが可能である。
As described above in detail, the use of the plate material for a shadow mask according to the present invention makes it possible to improve the productivity in the shadow mask manufacturing process and to manufacture a shadow mask having better uneven quality. Further, in the softening and annealing step of the shadow mask in the color picture tube manufacturing process, it is possible to provide a shadow mask which does not cause annealing adhesion and does not impair workability.

【図面の簡単な説明】[Brief description of the drawings]

【図1】表面粗さの突起状態Rskの説明図で、(a)
は突起状態が上に凸となったRskが+となる粗さ形状
を示すもので、(b)は表面に平坦部が多くあるRsk
が−となる粗さ形状を示すものである。
FIG. 1 is an explanatory view of a projection state Rsk of surface roughness, and FIG.
(B) shows a roughness shape in which Rsk, whose projection state is convex upward, becomes +, and (b) shows an Rsk in which the surface has many flat portions.
Indicates a roughness shape where-is indicated.

【符号の説明】[Explanation of symbols]

L: 基準長さ l: 平均線 L: Reference length l: Average line

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 カラー受像管に用いるシャドウマスク用
板材が、下記の表面粗さRa及び表面粗さの突起状態R
skを有することを特徴とするシャドウマスク用板材: Ra :0.55〜0.65μm Rsk:+0.7 以上 ここで、 Raは、JIS B0601において規定されている表
面粗さ、 Rskは、平均線に対しての振幅分布曲線の相対性を示
す値で、次式で示される突起状態、 【数1】 Y(i) は、断面曲線の基準長さにおいて、平均線をX
軸、縦倍率の方向をY軸としたときの粗さ曲線、 Rqは、二乗平均粗さ、 n=230、 j=2〜5、を表す。
A plate material for a shadow mask used for a color picture tube has a surface roughness Ra and a projection state R of the surface roughness described below.
Plate material for shadow mask characterized by having sk: Ra: 0.55 to 0.65 μm Rsk: +0.7 or more where Ra is the surface roughness specified in JIS B0601, and Rsk is the average line Is a value indicating the relativity of the amplitude distribution curve with respect to, and a projection state represented by the following equation: Y (i) represents the average line at X in the reference length of the sectional curve.
Rq represents a root-mean-square roughness, n = 230, and j = 2 to 5, when the direction of the axis and the vertical magnification is the Y axis.
JP2000023625A 2000-02-01 2000-02-01 Plate material for shadow mask Expired - Lifetime JP3122442B2 (en)

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