JPH02133104A - Manufacture of shadow mask stock - Google Patents

Manufacture of shadow mask stock

Info

Publication number
JPH02133104A
JPH02133104A JP29939488A JP29939488A JPH02133104A JP H02133104 A JPH02133104 A JP H02133104A JP 29939488 A JP29939488 A JP 29939488A JP 29939488 A JP29939488 A JP 29939488A JP H02133104 A JPH02133104 A JP H02133104A
Authority
JP
Japan
Prior art keywords
shadow mask
slitting
cold rolling
stock
mask material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP29939488A
Other languages
Japanese (ja)
Other versions
JPH0669567B2 (en
Inventor
Morinori Kamio
守則 神尾
Kiyoaki Nishikawa
西川 清明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Nippon Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mining Co Ltd filed Critical Nippon Mining Co Ltd
Priority to JP63299394A priority Critical patent/JPH0669567B2/en
Publication of JPH02133104A publication Critical patent/JPH02133104A/en
Publication of JPH0669567B2 publication Critical patent/JPH0669567B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Metal Rolling (AREA)
  • Heat Treatment Of Sheet Steel (AREA)

Abstract

PURPOSE:To improve vacuum adhesion of a pattern and to prevent fouling of a shadow mask stock by performing cold rerolling the coil-shaped shadow mask stock after slitting. CONSTITUTION:A shadow mask stock is slitted to have a product width, cold rolled, and is introduced to an etching line after shape straightening. In the etching line, a flat mask is produced by adhering patterns after degreasing and applying resist, and the performing exposure, development and etching. An evacuation time is reduced and adhesion is improved by cold rolling the stock after slitting.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、カラーテレビブラウン管用シャドウマスク素
材の製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method for manufacturing a shadow mask material for a color television cathode ray tube.

〔発明の背景〕[Background of the invention]

カラーテレビジョンブラウン管には色選別電極としてシ
ャドウマスクが使用されている.シャドウマスク用の材
料としては、低炭素Alキルド鋼やリムド鋼が使用され
てきたが、最近では低熱膨張特性を有するアンバー合金
材(Fe − 36%Ni)も使われはじめている。
Shadow masks are used as color selection electrodes in color television cathode ray tubes. Low carbon Al-killed steel and rimmed steel have been used as materials for shadow masks, but recently an amber alloy material (Fe-36%Ni) with low thermal expansion characteristics has also begun to be used.

シャドウマスクの製造工程は概ね次の通りである。先ず
、材料の溶解及び鋳造後適宜の圧延等の工程を経由し、
そして最終冷間加工にて所定の厚さを有するシャドウマ
スク素材が製造される。シャドウマスク素材はエッチン
グ穿孔加工されてフラットマスクとなる。フラットマス
クは焼鈍されてプレス成形性を付与され、その後プレス
により球面成形される。球面成形されたマスクは、黒化
処理を施されてシャドウマスクとなる。プレス成形性を
付与する焼鈍を最終圧延直後に実施する方式もあり、こ
れはプレアニール法と呼ばれている。
The manufacturing process of the shadow mask is generally as follows. First, through processes such as melting and casting of the material and appropriate rolling,
Then, a shadow mask material having a predetermined thickness is manufactured by final cold working. The shadow mask material is etched and perforated to form a flat mask. The flat mask is annealed to give it press formability, and is then pressed into a spherical shape. The spherical mask is subjected to a blackening process to become a shadow mask. There is also a method in which annealing to impart press formability is performed immediately after final rolling, and this is called a pre-annealing method.

もう少し詳しく説明すると、先ずシャドウマスク素材の
製造方法として低炭素Alキルド鋼を例に挙げると、鋼
を転炉で溶製後インゴットに鋳造し、鋳造後熱間圧延及
び冷間圧延し、オープンコイル焼鈍により脱炭処理し、
その後所定の厚みまで最終冷間圧延が施される。その後
、スリットして所定板幅としてシャドウマスク素材を得
る。アンバー材の場合は、同じく溶製後鋳造しそして鍛
造した後熱間圧延を行い、その後冷間圧延と焼鈍とを適
時繰返し、最終冷間圧延により所定板厚とし,同じくス
リットして所定板幅のシャドウマスク素材が得られる. シャドウマスク素材は脱脂後、フォトレジストを両面に
塗布しパターンを真空引きで素材に完全密着後露光して
焼付け現像後、塩化第2鉄を主とするエッチング液にて
エッチング穿孔加工され、個々に切断されてフラットマ
スクとなる。
To explain in more detail, first, taking low-carbon Al-killed steel as an example of a method for producing a shadow mask material, the steel is melted in a converter and then cast into an ingot.After casting, hot rolling and cold rolling are performed to form an open coil. Decarburized by annealing,
Thereafter, final cold rolling is performed to a predetermined thickness. Thereafter, it is slit to obtain a shadow mask material having a predetermined width. In the case of invar material, it is similarly melted, then cast, forged, and then hot rolled. After that, cold rolling and annealing are repeated at appropriate times, and the final cold rolling is made to a specified thickness, and the same is slit to a specified width. You can obtain the shadow mask material. After degreasing, the shadow mask material is coated with photoresist on both sides, the pattern is vacuumed to completely adhere to the material, exposed to light, baked and developed, then etched and perforated with an etching solution mainly containing ferric chloride. Cut into flat masks.

フラットマスクは、非酸化性雰囲気中で焼鈍されてプレ
ス成形性を付与される(ブレアニール法ではこの焼鈍が
エッチング前に最終冷間圧延材に行われる)。レベラー
加工を経た後、プレスによりマスク形態に球面成形され
る。
The flat mask is annealed in a non-oxidizing atmosphere to impart press formability (in Blair Annealing this annealing is performed on the final cold rolled material before etching). After leveling, it is spherically molded into a mask shape using a press.

そして、最後に、球面成形されたマスクは脱脂後、水蒸
気又は燃焼ガス雰囲気中で黒化処理を施されて表面に黒
色酸化膜を形成する。こうしてシャドウマスクが作製さ
れる。
Finally, the spherical mask is degreased and then subjected to a blackening treatment in a steam or combustion gas atmosphere to form a black oxide film on the surface. In this way, a shadow mask is produced.

〔従来技術とその問題点〕[Prior art and its problems]

以上が一般的なシャドウマスクの製造工程であるが、最
近このシャドウマスクの製造工程を高効率化しようとす
る動きがでてきており、特にフラットマスクの製造にお
ける効率の向上が強く要請されている。
The above is the general manufacturing process for shadow masks, but recently there has been a movement to improve the efficiency of this shadow mask manufacturing process, and there is a strong demand for improved efficiency in the manufacturing of flat masks in particular. .

従来は、シャドウマスク素材を製造するにあたり 0.
3mm以下の板厚にまで圧延後、フラットマスクの製造
に適した製品幅にスリットし、その後、シャドウマスク
材に電子ビーム通過用の孔を穿孔するためのエッチング
を施していた。ところがこのスリット工程においてスリ
ット端面にパリと呼ばれるかえりや突起が出てしまい、
この突起が脱脂、レジスト塗布工程後のパターンの真空
引きによる密着に障害となるうえに、各製造工程で使わ
れるゴムロール等を削り取り、その削りくずが汚れの原
因となる重大な問題が生じた。特にひどい場合は、パタ
ーンのガラスが割れてしまうこともあった. パリの発生はスリットの条件にもよるものであるからス
リッターの刃の交換頻度を上げたり、製品ごとの細かい
条件設定を行ってやれば、ある程度は減少するものであ
るが、これでは素材製造上著しく非効率であり、生産性
の低下は否めないものであった. 〔発明の構成〕 本発明はかかる点に鑑みなされたものであり、従来にな
いシャドウマスク素材の製造方法を提供するものである
Conventionally, when manufacturing shadow mask materials, 0.
After rolling to a thickness of 3 mm or less, the material was slit to a product width suitable for manufacturing a flat mask, and then the shadow mask material was etched to form holes for electron beam passage. However, during this slitting process, burrs or protrusions called paris appeared on the slit end surface.
These protrusions not only obstructed the adhesion of the pattern by vacuuming after the degreasing and resist coating processes, but also caused a serious problem in that the rubber rolls used in each manufacturing process were scraped off, and the scraps caused stains. In particularly severe cases, the patterned glass could even break. The occurrence of cracks also depends on the slitting conditions, so if you increase the frequency of replacing the slitter blades or set detailed conditions for each product, it can be reduced to a certain extent, but this does not affect the material manufacturing. It was extremely inefficient and the drop in productivity was undeniable. [Structure of the Invention] The present invention has been made in view of the above points, and provides a method for manufacturing a shadow mask material that is unprecedented.

すなわち本発明は、コイル状のシャドウマスク素材をス
リット後再冷間圧延を行うことを特徴とするシャドウマ
スク材の製造方法及びコイル状のシャドウマスク素材を
スリット後トータルで10%以上の圧下率の再冷間圧延
を行うことを特徴とするシャドウマスク材の製造方法に
関する。
That is, the present invention provides a method for producing a shadow mask material characterized by performing re-cold rolling of a coiled shadow mask material after slitting, and a method for producing a shadow mask material with a total rolling reduction of 10% or more after slitting the coiled shadow mask material. The present invention relates to a method for producing a shadow mask material, which is characterized by performing re-cold rolling.

〔発明の具体的説明〕[Specific description of the invention]

次に本発明のシャドウマスク素材の製造方法について述
べる。
Next, a method for manufacturing the shadow mask material of the present invention will be described.

第1図に代表的なスリット上りの断面状況を示す。第1
図に示すパリ(突起)がパターン密着時の真空引きのさ
またげになったり、途中で切断,剥離してシャドウマス
ク素材の傷や汚れの原因となっていた. 第2図はスリット後圧下率でトータル50%の冷間圧延
後の端面の断面状況であるが、端面ば丸くなっておリバ
リ等の突起状の異物は見られない。
Figure 1 shows a typical slit-up cross-section. 1st
The protrusions shown in the figure obstructed the vacuuming process when the pattern was adhered, or were cut or peeled off midway through, causing scratches and stains on the shadow mask material. FIG. 2 shows a cross-sectional view of the end face after cold rolling with a total reduction of 50% after slitting, and the end face is rounded and no protruding foreign matter such as ribs is observed.

しかも,冷間圧延により端面部はエッチドロップによる
板厚減少を幅中央部より大きく受けており、端部の板厚
が薄いことも各種のトラブルの要因を小さくすると考え
られる. この様にスリット後のパリが冷間圧延により減少させる
ためにはトータルで10%以上の圧下率が望ましく、そ
の効果が大きい。圧下率の上限はトータルで90%まで
とする。その理由は、これを超えると幅ちぢみを生じ、
幅精度の管理が難しくなるためである.また、この圧下
率も途中で熱処理が入っても良く、例えばスリット−1
次冷間圧延一熱処理−2次冷間圧延工程で製造する場合
も1次冷間圧延と2次冷間圧延を加えた圧下率が10%
以上あれば良い. 以下に本発明材料を実施例をもって説明する。
Furthermore, due to cold rolling, the end faces are subject to a greater reduction in plate thickness due to etch drop than the center of the width, and the thinner plate thickness at the edges is thought to reduce the causes of various problems. In order to reduce the fringing after slitting by cold rolling, a total rolling reduction of 10% or more is desirable and has a great effect. The upper limit of the rolling reduction rate is 90% in total. The reason is that if the width is exceeded, the width will shrink.
This is because it becomes difficult to manage width accuracy. Also, heat treatment may be performed in the middle of this rolling reduction, for example, slit -1
Even when manufacturing in the process of 1st cold rolling, 1st heat treatment and 2nd cold rolling, the reduction ratio of 1st cold rolling and 2nd cold rolling is 10%.
More than that is fine. The material of the present invention will be explained below with reference to Examples.

〔実施例〕〔Example〕

材料としてアンバー材(Fe−36%Ni)を用い、第
1表に示す様に種々の板厚でスリットを行い製品幅とし
た後に冷間圧延(一部については途中で熱処理を入れた
)を行い全て0.15mmの板厚とし、形状矯正後エッ
チングラインに投入した。
Using an amber material (Fe-36%Ni) as the material, slits were made in various thicknesses as shown in Table 1 to obtain the product width, and then cold rolling (heat treatment was applied in some cases). All the plates were made to have a thickness of 0.15 mm, and after shape correction, they were put into an etching line.

エッチングラインでは、脱脂、レジスト塗布後パターン
を密着させ露光現像、エッチングを行いフラットマスク
を製造した.その際の結果を第1表に併記した。
On the etching line, after degreasing and applying resist, the pattern was adhered, exposed, developed, and etched to produce a flat mask. The results are also listed in Table 1.

第1表より明らかな様にスリット後冷間圧延を施すこと
により真空引きの時間は短縮され密着良好となる. これは本発明例Nα1〜6に示すように圧下率が10%
以上でより効果がある。
As is clear from Table 1, cold rolling after slitting shortens the evacuation time and improves adhesion. This means that the rolling reduction is 10% as shown in Inventive Examples Nα1 to 6.
The above is more effective.

比較例&8はスリット後エッチングに供したものである
が、パターンの真空密着時にガラスが割れてしまった. 〔発明の効果〕 このようにシャドウマスク素材をエッチング工程前に冷
間圧延を行ってパリを除去することにより、パターンの
真空引き密着が良好となり、シャドウマスク素材の汚れ
もなくなった。カラーテレビブラウン管用シャドウマス
ク材の製造における効率化と品質の向上に大きく貢献で
きる.第  1  表
Comparative Example &8 was subjected to etching after slitting, but the glass broke when the pattern was vacuum-adhered. [Effects of the Invention] As described above, by cold rolling the shadow mask material before the etching process to remove paris, the vacuum adhesion of the pattern was improved and the shadow mask material was free from stains. This can greatly contribute to improving efficiency and quality in the production of shadow mask materials for color television cathode ray tubes. Table 1

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はスリット後の端部断面の状況を示す概略説明図
、第2図はスリット後圧下率50%の冷間圧延を行った
後の端部断面の状況を示す概略説明図である。 図中1はパリ(かえり)、2は材料自体である。 茅 / l’E) ¥ 2m
FIG. 1 is a schematic explanatory diagram showing the state of the end cross section after slitting, and FIG. 2 is a schematic explanatory diagram showing the state of the end cross section after cold rolling with a post-slitting reduction ratio of 50%. In the figure, 1 is the burr, and 2 is the material itself. Chilled grass / l'E) ¥ 2m

Claims (2)

【特許請求の範囲】[Claims] (1)コイル状のシャドウマスク素材をスリット後再冷
間圧延を行うことを特徴とするシャドウマスク材の製造
方法。
(1) A method for producing a shadow mask material, which comprises slitting a coiled shadow mask material and then cold rolling it again.
(2)コイル状のシャドウマスク素材をスリット後トー
タルで10%以上の圧下率の再冷間圧延を行うことを特
徴とするシャドウマスク材の製造方法。
(2) A method for producing a shadow mask material, which comprises slitting the coiled shadow mask material and then cold rolling it again at a total rolling reduction of 10% or more.
JP63299394A 1988-11-11 1988-11-11 Method for manufacturing shadow mask material Expired - Lifetime JPH0669567B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63299394A JPH0669567B2 (en) 1988-11-11 1988-11-11 Method for manufacturing shadow mask material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63299394A JPH0669567B2 (en) 1988-11-11 1988-11-11 Method for manufacturing shadow mask material

Publications (2)

Publication Number Publication Date
JPH02133104A true JPH02133104A (en) 1990-05-22
JPH0669567B2 JPH0669567B2 (en) 1994-09-07

Family

ID=17871987

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63299394A Expired - Lifetime JPH0669567B2 (en) 1988-11-11 1988-11-11 Method for manufacturing shadow mask material

Country Status (1)

Country Link
JP (1) JPH0669567B2 (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5830929A (en) * 1981-07-31 1983-02-23 大日本印刷株式会社 Method of sterilizing vessel for "sake"

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5830929A (en) * 1981-07-31 1983-02-23 大日本印刷株式会社 Method of sterilizing vessel for "sake"

Also Published As

Publication number Publication date
JPH0669567B2 (en) 1994-09-07

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